CS216270B1 - Sintered glass for preparation of the ground enamel for the dry coating in the electrostatic field - Google Patents
Sintered glass for preparation of the ground enamel for the dry coating in the electrostatic field Download PDFInfo
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- CS216270B1 CS216270B1 CS259680A CS259680A CS216270B1 CS 216270 B1 CS216270 B1 CS 216270B1 CS 259680 A CS259680 A CS 259680A CS 259680 A CS259680 A CS 259680A CS 216270 B1 CS216270 B1 CS 216270B1
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- oxide
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- electrostatic field
- dry coating
- sintered glass
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Description
Vynález sa týká frity pre přípravu základného smaltu k nanášaniu za sucha v elektrostiatiókom poli, vhodnej najma pre sposob nanášania základného a krycieho smaltu s jednym vypalováním.The invention relates to a frit for the preparation of a base enamel for dry deposition in an electrostate field, suitable in particular for the method of applying single-firing base and top enamel.
Všetky známe frity tohto druhu podlá súčasného stavu techniky obsahujú vždy ako prífdržný prostriedok kysličník kobaltu a ich nevýhodou je vysoká cena a všeobecný nedostatek kysličníka kobaltu.All known frits of this kind according to the prior art always contain cobalt oxide as a holding agent and have the disadvantage of the high cost and general lack of cobalt oxide.
Túto nevýhodu odstraňuje frita podfa vynálezu, ktorej zloženie dané v hmotnostněj koncentrácii je:This disadvantage is overcome by a frit according to the invention, the composition of which is given in weight concentration:
Kysličník křemičitý SiO2 26 až 30 %Silicon dioxide SiO 2 26 to 30%
Kysličník boritý B2O3 20 až 24 %Boron oxide B 2 O 3 20 to 24%
Kysličník sodný Na2O 19 až 23 %Sodium oxide Na 2 O 19 to 23%
Kysličník draselný K2O 3,7 až 4,5 %Potassium oxide K 2 O 3.7 to 4.5%
Kysličník hlinitý A12C>3 3,7 až 4,3 %Aluminum oxide A1 2 C> 3 3.7 to 4.3%
Kysličník barnatý BaO 3,7 až 5,3 %Barium oxide BaO 3.7 to 5.3%
Kysličník vápenatý CaO 4,5 až 5,4 %Calcium oxide CaO 4.5 to 5.4%
Kysličník železí tý Fe2O3 1,3 až 1,6 %Fe 2 O 3 1,3 - 1,6% iron oxide
Fluorid vápenatý CaF2 6,2 až 6,8 %Calcium fluoride CaF 2 6.2 to 6.8%
Kysličník fosforečný P2Os 0,9 až 1,2 %Phosphorus Oxygen P 2 Os 0,9 to 1,2%
Kysličník nikelnatý NiO 2,2 až 3,0 %Nickel oxide NiO 2,2 to 3,0%
Kysličník manganičitý MnO2 1,2 až 1,4%Manganese dioxide MnO 2 1.2 to 1.4%
Výhodou frity podfa vynálezu popři tom, iďs o Mtu vhodnú pře nanášanie úkladného a krycieho smaltu v procese s jedným vypalováním je v tom, že neobsahuje prídržný deficitný kysličník kobaltu a i bez něho pri nanesení na bežne povrchovo predupravený plech si smalt zachovává rovnocennú prídržnosť.The advantage of the frit according to the invention is that, if Mtu is suitable for the application of primer and topcoat in a single-firing process, it does not contain a cobalt oxide deficient holding agent and retains the same adhesion even when applied to a conventional surface pretreated sheet.
V ďalšom je uvedený jeden z příkladov zloženia frity, ktorej zložky sú vyjádřené v hmotnostnej koncentrácii :The following is an example of a frit composition whose components are expressed in weight concentration:
Kysličník křemičitý SiO2 28 %Silicon dioxide SiO 2 28%
Kysličník boritý B2O3 22 %Boron oxide B 2 O 3 22%
Kysličník sodný Na2O 21 %Sodium oxide Na 2 O 21%
Kysličník draselný K2O 4 %Potassium oxide K 2 O 4%
Kysličník hlinitý A12O3 4 %Aluminum oxide A1 2 O 3 4%
Kysličník barnatý BaO 4 %Barium oxide BaO 4%
Kysličník vápenatý CaO 5 % .Kysličník železitý Fe2O3 1,5 %Calcium oxide CaO 5% .Ferric oxide Fe 2 O 3 1,5%
Fluorid vápenatý CaF2 6,4 %Calcium Fluoride CaF 2 6.4%
Kysličník fosforečný P2O51,0 %Phosphorus pentoxide P 2 O 5 1,0%
Kysličník nikelnatý NiO 2,3 %Nickel oxide NiO 2,3%
Kysličník manganičitý MnO2 1,3 %Manganese dioxide MnO 2 1,3%
Sposob aplikácie frity podfa vynálezu je nasledovný: Frita sa zomelie na prášok pre elektrostatické nanášanie s vhodným hydrofobizačným prostriedkom, t. j. obafovadlom na konečnú jemnost mletia so zvyškom 2,3 až 8 % hmotnosti na site 63 ^m, alebo so zvyškom 1,3 až 4,9 % hmotnosti na site 78 μτη a preoseje sa cez šito 250 ^m. Měrný elek2 16270The method of application of the frit of the invention is as follows: The frit is ground to a powder for electrostatic deposition with a suitable hydrophobizing agent, i.e. a finish grinding finisher with a residue of 2.3 to 8% by weight on a 63 µm sieve or a residue of 1.3 to 4 9% by weight on a sieve of 78 μτη and sieved through a 250 µm sieve. Specific elec2 16270
300 g/m2. Potom sa obidve vrstvy naraz vypália pri teplote 800 až 820 °C.300 g / m 2 . The two layers are then baked at a temperature of 800 to 820 ° C.
Ako podkladový materiál možno použiť plech z neukíudnenej ocele, valcovanej za studená.As a base material, cold rolled stainless steel sheet can be used.
trický odpor prášku musí mať hodnotu minimálně ΙΟ12 Ω . m a vhodnú fluiditu. Prášok tohto smaltu sa nastrieka tak, že sa vytvoří vrstva o plošnej hustotě nánosu 75 až 125 g/ /m2 a na túto vrstvu sa nanesie vhodný krycí titaničitý smalt o plošnej hustotě 250 ažthe powder resistance shall be at least ΙΟ 12 hodnotu. has suitable fluidity. The powder of this enamel is sprayed to form a layer with a surface density of 75 to 125 g / m @ 2 and a suitable titanium enamel covering surface with a surface density of 250 to 125 g is applied to this layer.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS259680A CS216270B1 (en) | 1980-04-15 | 1980-04-15 | Sintered glass for preparation of the ground enamel for the dry coating in the electrostatic field |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS259680A CS216270B1 (en) | 1980-04-15 | 1980-04-15 | Sintered glass for preparation of the ground enamel for the dry coating in the electrostatic field |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CS216270B1 true CS216270B1 (en) | 1982-10-29 |
Family
ID=5363545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS259680A CS216270B1 (en) | 1980-04-15 | 1980-04-15 | Sintered glass for preparation of the ground enamel for the dry coating in the electrostatic field |
Country Status (1)
| Country | Link |
|---|---|
| CS (1) | CS216270B1 (en) |
-
1980
- 1980-04-15 CS CS259680A patent/CS216270B1/en unknown
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