CS169180B1 - - Google Patents

Info

Publication number
CS169180B1
CS169180B1 CS839273A CS839273A CS169180B1 CS 169180 B1 CS169180 B1 CS 169180B1 CS 839273 A CS839273 A CS 839273A CS 839273 A CS839273 A CS 839273A CS 169180 B1 CS169180 B1 CS 169180B1
Authority
CS
Czechoslovakia
Application number
CS839273A
Other languages
Czech (cs)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of CS169180B1 publication Critical patent/CS169180B1/cs

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563Gas nozzles
    • C23C16/45576Coaxial inlets for each gas
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
CS839273A 1972-12-27 1973-12-05 CS169180B1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD16806572A DD106417A1 (https=) 1972-12-27 1972-12-27

Publications (1)

Publication Number Publication Date
CS169180B1 true CS169180B1 (https=) 1976-07-29

Family

ID=5489648

Family Applications (1)

Application Number Title Priority Date Filing Date
CS839273A CS169180B1 (https=) 1972-12-27 1973-12-05

Country Status (7)

Country Link
CH (1) CH597362A5 (https=)
CS (1) CS169180B1 (https=)
DD (1) DD106417A1 (https=)
DE (1) DE2355058A1 (https=)
FR (1) FR2221535B3 (https=)
GB (1) GB1451643A (https=)
PL (1) PL89600B1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3869793D1 (de) * 1987-01-27 1992-05-14 Asahi Glass Co Ltd Gaszufuehrungsrohr fuer die reaktive abscheidung aus der gasphase.
DE3741708A1 (de) * 1987-12-09 1989-06-22 Asea Brown Boveri Einrichtung zur materialabscheidung aus der gasphase
DE102005056322A1 (de) * 2005-11-25 2007-06-06 Aixtron Ag VPE-Reaktor mit koaxial zueinander angeordneten Quellgasrohren

Also Published As

Publication number Publication date
DE2355058A1 (de) 1974-07-11
FR2221535B3 (https=) 1976-10-22
FR2221535A1 (https=) 1974-10-11
DD106417A1 (https=) 1974-06-12
PL89600B1 (https=) 1976-11-30
GB1451643A (https=) 1976-10-06
CH597362A5 (https=) 1978-03-31

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