CN2891271Y - Wafer positioning and control system for ion implantation machine - Google Patents

Wafer positioning and control system for ion implantation machine Download PDF

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Publication number
CN2891271Y
CN2891271Y CNU2006200081796U CN200620008179U CN2891271Y CN 2891271 Y CN2891271 Y CN 2891271Y CN U2006200081796 U CNU2006200081796 U CN U2006200081796U CN 200620008179 U CN200620008179 U CN 200620008179U CN 2891271 Y CN2891271 Y CN 2891271Y
Authority
CN
China
Prior art keywords
wafer
motor
platform
control system
transducer
Prior art date
Application number
CNU2006200081796U
Other languages
Chinese (zh)
Inventor
王迪平
罗宏洋
许波涛
易文杰
Original Assignee
北京中科信电子装备有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 北京中科信电子装备有限公司 filed Critical 北京中科信电子装备有限公司
Priority to CNU2006200081796U priority Critical patent/CN2891271Y/en
Application granted granted Critical
Publication of CN2891271Y publication Critical patent/CN2891271Y/en

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Abstract

The utility model discloses a wafer-location control system for ion implantation apparatus comprising a wafer, a motor, a light source, a feeler unit, a feedback circuit, a coded circle and a flat base, wherein, the flat base and the motor are linked by the drive axle, a coded circle is connected with the bottom motor, the coded circle gain the data of the driving motor, the wafer is fixed on the flat base and rotated with the flat base, the light source is provided on the feeler unit and send the light signal to the feeler unit, the feedback circuit is provided under the feeler unit and accept the light signal from the feeler unit then change the light signal to the electronic signal. The device has the advantages of simple structure and handiness. The located wafer notch can be distinguished quickly and accuracy. The operated time is short.

Description

Ion implantor wafer positioning control system

Technical field

The utility model relates to a kind of control system, relates in particular to a kind of semiconductor that is used for and makes the used brilliant garden otch positioning control system of intermediate ion implanter, belongs to field of manufacturing semiconductor devices.

Background technology

In the existing semiconductor integrated circuit manufacturing technology, ion implantor is as one of key equipment of semiconductor ion doping processing line, very high requirement has also been proposed, the requirement ion implantor has: the otch of discerning wafer fast and accurately, be reference with wafer with the otch simultaneously, rotate to assigned address.It is all closely related that the otch location technology of wafer is injected quality to performance such as the production efficiency that improves complete machine, Automatic Control and brilliant garden technology.

Brilliant garden positioning control be in the ion implantor control system required precision than higher, and one of the control technology that is difficult to grasp, locating accuracy directly influences the implant angle in brilliant garden, and is related to the injection technology quality of wafer and the productivity ratio of ion implantor.

Summary of the invention

The purpose of this utility model provides a kind of positioning control accuracy height, can discern the ion implantor wafer positioning control system of wafer otch fast and accurately.

The technical solution of the utility model is to realize like this, a kind of ion implantor wafer positioning control system, by wafer, motor, light source, transducer, feedback circuit, coding disk and platform are formed, wherein platform is connected by power transmission shaft with motor, following connection one coding disk of motor, coding disk obtains each data of motor operation, wafer places on the platform, and rotate with platform, light source places the top of transducer, and to transducer generation light signal, feedback circuit places the below of transducer, acceptance is from the light signal of transducer, and changes light signal into the signal of telecommunication.

Described wafer is the single wafer that is used to carry out PROCESS FOR TREATMENT;

Described motor is the electric drive part that wafer is rotated the location;

Described light source is the part that is used for transmitting illuminant;

Described transducer is to obtain because the light that wafer movement causes changes sensing unit;

Described feedback circuit is the unit that light signal is changed into the signal of telecommunication;

Described coding disk is each data of obtaining the motor operation;

Described platform is to make wafer obtain the platform of motion;

Compared with prior art, the beneficial effects of the utility model are: this apparatus structure is simple, and is easy to operate, can discern the otch of location wafer fast and accurately, and the used time of whole operation process is short.

Description of drawings

Fig. 1 is the utility model structural representation.

Embodiment

Below in conjunction with the drawings and specific embodiments the utility model is described in further detail.

As shown in Figure 1, ion implantor wafer positioning control system comprises wafer 1, motor 2, light source 3, transducer 4, feedback circuit 5, coding disk 6 and platform 7, wherein platform 7 and motor 2 are connected by power transmission shaft, motor 2 drives platform 7 and rotates, following connection one coding disk 6 of motor 2, coding disk 6 obtains each data of motor 2 operations, wafer 1 places on the platform 7, and with platform 7 rotations, light source 3 places the top of transducer 4, to transducer 4 light signal takes place, and feedback circuit 5 places the below of transducer 4, acceptance is from the light signal of transducer 4, and changes light signal into the signal of telecommunication.

Need determine the otch of wafer during work, as shown in Figure 2, manipulator is sent to wafer 1 on the detent mechanism platform 7, motor 2 drives platform and is rotated, therefore the wafer that drives on the platform rotates, light source 3 sends constant light signal, because the off-centre of wafer 1 on detent mechanism platform 7, the constant light signal generating that light source 3 is sent stopping in various degree, make transducer 4 obtain the light signal that changes, simultaneously feedback circuit 5 is delivered to control system with the variable quantity of real-time monitor signal, judges and handles, and the fluctuation of detection signal is that wafer 1 off-centre on detent mechanism platform 7 causes.Control system is monitored the run location of motor in real time by coding disk 6, in case the signal that feedback circuit 5 acquisitions are satisfied the demand, control system also obtains the ad-hoc location of motor 2 operations simultaneously, determined the incision site of wafer 1 like this, and with it reference signal as setting, according to this reference signal, control system calculates the rotational angle of compensation, the output appointed positions, rotate by the brilliant garden 1 that motor 2 drives on the platform, make brilliant garden 1 rotate to the angle that sets, finish whole process 6 second time only.

Claims (1)

1, ion implantor wafer positioning control system, form by wafer, motor, light source, transducer, feedback circuit, coding disk and platform, it is characterized in that platform is connected by power transmission shaft with motor, following connection one coding disk of motor, wafer places on the platform, and rotate with platform, light source places the top of transducer, and to transducer generation light signal, feedback circuit places the below of transducer, acceptance is from the light signal of transducer, and changes light signal into the signal of telecommunication.
CNU2006200081796U 2006-03-17 2006-03-17 Wafer positioning and control system for ion implantation machine CN2891271Y (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNU2006200081796U CN2891271Y (en) 2006-03-17 2006-03-17 Wafer positioning and control system for ion implantation machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNU2006200081796U CN2891271Y (en) 2006-03-17 2006-03-17 Wafer positioning and control system for ion implantation machine

Publications (1)

Publication Number Publication Date
CN2891271Y true CN2891271Y (en) 2007-04-18

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CNU2006200081796U CN2891271Y (en) 2006-03-17 2006-03-17 Wafer positioning and control system for ion implantation machine

Country Status (1)

Country Link
CN (1) CN2891271Y (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101498940B (en) * 2008-01-31 2011-01-19 中芯国际集成电路制造(上海)有限公司 Method and apparatus for protecting bottom electrode component in plasma etching equipment
CN102324366A (en) * 2011-09-15 2012-01-18 清华大学 Multi-wafer positioning system for ion implanter and positioning method thereof
CN103811387A (en) * 2012-11-08 2014-05-21 沈阳新松机器人自动化股份有限公司 Wafer pre-alignment method and apparatus
WO2016095282A1 (en) * 2014-12-19 2016-06-23 北京北方微电子基地设备工艺研究中心有限责任公司 Wafer positioning device and method
WO2018227668A1 (en) * 2017-06-16 2018-12-20 上海集成电路研发中心有限公司 Ion implantation system

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101498940B (en) * 2008-01-31 2011-01-19 中芯国际集成电路制造(上海)有限公司 Method and apparatus for protecting bottom electrode component in plasma etching equipment
CN102324366A (en) * 2011-09-15 2012-01-18 清华大学 Multi-wafer positioning system for ion implanter and positioning method thereof
CN102324366B (en) * 2011-09-15 2013-06-26 清华大学 Multi-wafer positioning system for ion implanter and positioning method thereof
CN103811387A (en) * 2012-11-08 2014-05-21 沈阳新松机器人自动化股份有限公司 Wafer pre-alignment method and apparatus
WO2016095282A1 (en) * 2014-12-19 2016-06-23 北京北方微电子基地设备工艺研究中心有限责任公司 Wafer positioning device and method
WO2018227668A1 (en) * 2017-06-16 2018-12-20 上海集成电路研发中心有限公司 Ion implantation system

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GR01 Patent grant
C19 Lapse of patent right due to non-payment of the annual fee
CF01 Termination of patent right due to non-payment of annual fee