CN2848872Y - Equipment used for vacuum plating metal film on micro particle surface - Google Patents

Equipment used for vacuum plating metal film on micro particle surface Download PDF

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Publication number
CN2848872Y
CN2848872Y CN 200520026799 CN200520026799U CN2848872Y CN 2848872 Y CN2848872 Y CN 2848872Y CN 200520026799 CN200520026799 CN 200520026799 CN 200520026799 U CN200520026799 U CN 200520026799U CN 2848872 Y CN2848872 Y CN 2848872Y
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CN
China
Prior art keywords
vacuum
vacuum chamber
sample rack
utility
model
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN 200520026799
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Chinese (zh)
Inventor
沈志刚
徐政
俞晓正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Micro-Nami Super Skin Material Co Ltd
NATIONAL NANO-TECH INDUSTRIAL BASE
Beihang University
Original Assignee
Shenzhen Micro-Nami Super Skin Material Co Ltd
NATIONAL NANO-TECH INDUSTRIAL BASE
Beihang University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen Micro-Nami Super Skin Material Co Ltd, NATIONAL NANO-TECH INDUSTRIAL BASE, Beihang University filed Critical Shenzhen Micro-Nami Super Skin Material Co Ltd
Priority to CN 200520026799 priority Critical patent/CN2848872Y/en
Application granted granted Critical
Publication of CN2848872Y publication Critical patent/CN2848872Y/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

The utility model relates to equipment used for vacuum plating metal films on surfaces of particles. The utility model comprises a vacuum chamber, a splash target rack, a sample rack, a sample dish, a heater, an observation window, a deflating valve, a sealing ring and a vacuum evacuating device, wherein the inner upper part of the vacuum chamber is provided with the splash target rack, the inner lower part is provided with the sample rack correspondingly, the sample rack is provided with the sample dish, the heater is arranged under the sample rack, and the vacuum chamber is also provided with the observation window, the deflation valve and the sealing ring, is provided the with the vacuum evacuating device communicated with the vacuum chamber through a pipe passage, is correspondingly connected with a flow meter, a molecular pump and a mechanical pump and is assembled with an electric appliance controlling and cooling circular water system simultaneously. The utility model is characterized in that the sample rack is connected and provided with a vibration generator. Through regulating the oscillation frequency of the sample rack and the vibration power of ultrasonic waves or a mechanical vibration generator, the surface of every particle is fully exposed, and the purity, the uniformity, the compactness and the adhesive force of metal films plated on the surfaces of particles are obviously increased. The utility model has the advantages of simple structure, simple and convenient operation, no waste water pollution, no exhaust air pollution, energy saving, consumption reduction and wide application.

Description

The equipment that is used for vacuum metal film plating on microparticle surface
Technical field
The utility model relates to a kind of vacuum coating film equipment, particularly a kind of equipment that is used for vacuum metal film plating on microparticle surface.
Background technology
At present, microparticle is compared with the block of same material, and noticeable change has taken place for its physics, chemical property, has the excellent specific property of the optics, electricity, magnetics, calorifics, mechanics and the chemical aspect that are different from conventional material.The microparticle surface film then is to be coated with the type material that the single or multiple lift laminated film combines on the different particulate material surfaces of several classes such as inorganic non-metallic, metal or organic polymers on its surface by certain technology, it can keep the main characteristic of former composition material, can obtain the not available performance of stock blend by complex effect again, it is also associated with each other the performance of each component to be complemented each other by the material design, thereby obtains new high-performance.Therefore, be very important and necessary at microparticle plating metal on surface film.
Because microparticle specific surface area and surface energy are all bigger, and radius-of-curvature is very little, reunite easily between them, so have certain degree of difficulty at the uniform metal-coated films in microparticle surface.Technology at the block materials surface coating is a lot, as vacuum-evaporation, vacuum sputtering, ion plating, electroless plating and chemical vapour deposition etc.But the technology that is used for the microparticle surface coating is few, and commonly used is the method for electroless plating at present, and CN 1198972A is described to be to utilize the plating metal on surface nickel of the method for electroless plating at nickel-base alloy powder; CN 1440951A is described to be to utilize the plating metal on surface nickel of the method for ultrasonic chemistry at powder; CN2508957Y is described to be to utilize the method for electroless plating at cenosphere plating metal on surface nickel.Microparticle surface adopts the method plated film of electroless plating to be out of question, but there is following shortcoming in existing filming equipment, as uneven coating is even, compactness is poor, voidage height, purity are low, a little less than the sticking power, contaminate environment and operation sequence complexity etc.
The utility model content
The purpose of this utility model is to overcome above-mentioned weak point, and a kind of equipment that is used for vacuum metal film plating on microparticle surface is provided.
The technical scheme that the utility model adopted is for achieving the above object: a kind of equipment that is used for vacuum metal film plating on microparticle surface, this equipment comprise vacuum chamber, sputter target holder, specimen holder, planchet, well heater, viewing window, purging valve, sealing-ring and vacuum suction device; The vacuum chamber internal upper part is provided with the sputter target holder, its underpart correspondence is provided with specimen holder, is provided with planchet above the specimen holder, is provided with well heater below the specimen holder, vacuum chamber also is provided with viewing window, purging valve, sealing-ring, is provided with vacuum suction device by pipeline and vacuum chamber UNICOM; And corresponding connection traffic meter, molecular pump and mechanical pump, dispose electrical equipment control and cooling circulating water system simultaneously; It is characterized in that specimen holder is connected with vibration machine.
Described vibration machine is ultrasonic vibrator or mechanical vibrator.
The beneficial effects of the utility model are: adopt this equipment by the hunting frequency of adjusting specimen holder and the oscillation power of ultrasonic wave or mechanical vibrator generator, allow each microparticle all have an opportunity fully to expose its surface, therefore utilize ultrasonic wave or mechanical vibration aid magnetron sputtering can significantly improve homogeneity, purity, compactness and the sticking power of microparticle surface coating.The utility model is simple in structure, easy and simple to handle, no waste water, exhaust emission, and water-saving and electricity-saving, energy-saving and cost-reducing, and the scope of application is very extensive.The micro particulate materials that for example is suitable for plated film can be inorganic materials, organic materials and biomaterial etc.; Shape can also be that hollow, porous or other are various irregularly shaped except that regular shapes such as sphere; Sputtering target material mainly comprises metallic substance such as silver, copper, aluminium, cobalt and nickel.
Description of drawings
Accompanying drawing 1 is the utility model structural representation;
Among the figure: 1 vacuum chamber, 2 sputter target holders, 3 specimen holders, 4 planchets, 5 well heaters, 6 vacuum suction devices, 7 viewing windows, 8 purging valves, 9 sealing-rings, 10 vibration machines.
Embodiment
Below in conjunction with figure and preferred embodiment, details are as follows to embodiment, structure, feature that foundation the utility model provides:
As shown in Figure 1, this equipment comprises vacuum chamber 1, sputter target holder 2, specimen holder 3, planchet 4, well heater 5, vacuum suction device 6, viewing window 7, purging valve 8 and sealing-ring 9; Vacuum chamber 1 internal upper part is provided with sputter target holder 2, its underpart correspondence is provided with specimen holder 3, is provided with planchet 4 above the specimen holder 3, is provided with well heater 5 below the specimen holder 3, vacuum chamber 1 also is provided with viewing window 7, purging valve 8, sealing-ring 9, is provided with vacuum suction device 6 by pipeline and vacuum chamber 1 UNICOM; And corresponding connection traffic meter, molecular pump and mechanical pump, dispose Electric Appliance Cabinet control and cooling circulating water system (not shown) simultaneously; It is characterized in that specimen holder 3 is connected with vibration machine 10.
Described vibration machine 10 is ultrasonic vibrator or mechanical vibrator.
Pass through to regulate the hunting frequency of this equipment sample frame 3 and the oscillation power of vibration machine 10 (ultrasonic vibration or mechanical vibration) during plated film, each microparticle in the planchet 4 can also constantly be vibrated when rolling, allow each microparticle all have an opportunity fully to expose its surface, pass through to change the processing condition such as operating air pressure, sputtering power, temperature and sputtering time in the vacuum chamber 1 during plated film again, at microparticle surface deposition last layer or multiple layer metal film.

Claims (2)

1, a kind of equipment that is used for vacuum metal film plating on microparticle surface, this equipment comprises vacuum chamber, sputter target holder, specimen holder, planchet, well heater, viewing window, purging valve, sealing-ring and vacuum suction device; The vacuum chamber internal upper part is provided with the sputter target holder, its underpart correspondence is provided with specimen holder, is provided with planchet above the specimen holder, is provided with well heater below the specimen holder, vacuum chamber also is provided with viewing window, purging valve, sealing-ring, is provided with vacuum suction device by pipeline and vacuum chamber UNICOM; And corresponding connection traffic meter, molecular pump and mechanical pump, dispose electrical equipment control and cooling circulating water system simultaneously; It is characterized in that specimen holder is connected with vibration machine.
2, the equipment that is used for vacuum metal film plating on microparticle surface according to claim 1, described vibration machine is ultrasonic vibrator or mechanical vibrator.
CN 200520026799 2005-07-26 2005-07-26 Equipment used for vacuum plating metal film on micro particle surface Expired - Lifetime CN2848872Y (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200520026799 CN2848872Y (en) 2005-07-26 2005-07-26 Equipment used for vacuum plating metal film on micro particle surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200520026799 CN2848872Y (en) 2005-07-26 2005-07-26 Equipment used for vacuum plating metal film on micro particle surface

Publications (1)

Publication Number Publication Date
CN2848872Y true CN2848872Y (en) 2006-12-20

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200520026799 Expired - Lifetime CN2848872Y (en) 2005-07-26 2005-07-26 Equipment used for vacuum plating metal film on micro particle surface

Country Status (1)

Country Link
CN (1) CN2848872Y (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100343416C (en) * 2005-07-26 2007-10-17 北京航空航天大学 Technology of vacuum metal film plating on microparticle surface and its equipment
CN101805893A (en) * 2010-03-22 2010-08-18 北京航空航天大学 Drum-type sample stage and method for magnetron sputtering coating on powder particles by using same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100343416C (en) * 2005-07-26 2007-10-17 北京航空航天大学 Technology of vacuum metal film plating on microparticle surface and its equipment
CN101805893A (en) * 2010-03-22 2010-08-18 北京航空航天大学 Drum-type sample stage and method for magnetron sputtering coating on powder particles by using same
CN101805893B (en) * 2010-03-22 2012-05-16 北京航空航天大学 Drum-type sample stage and method for magnetron sputtering coating on powder particles by using same

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C14 Grant of patent or utility model
GR01 Patent grant
AV01 Patent right actively abandoned

Effective date of abandoning: 20050726

C25 Abandonment of patent right or utility model to avoid double patenting