CN2823274Y - Multi-unit CVD cavity - Google Patents
Multi-unit CVD cavity Download PDFInfo
- Publication number
- CN2823274Y CN2823274Y CN 200520004586 CN200520004586U CN2823274Y CN 2823274 Y CN2823274 Y CN 2823274Y CN 200520004586 CN200520004586 CN 200520004586 CN 200520004586 U CN200520004586 U CN 200520004586U CN 2823274 Y CN2823274 Y CN 2823274Y
- Authority
- CN
- China
- Prior art keywords
- sidewall
- cavity
- metal sheet
- chemical vapor
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052751 metal Inorganic materials 0.000 claims abstract description 28
- 239000002184 metal Substances 0.000 claims abstract description 28
- 238000000034 method Methods 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 21
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 20
- 238000005229 chemical vapour deposition Methods 0.000 claims description 16
- 238000000151 deposition Methods 0.000 claims description 11
- 230000008021 deposition Effects 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 238000007789 sealing Methods 0.000 claims description 3
- 239000007769 metal material Substances 0.000 description 6
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 6
- 238000005755 formation reaction Methods 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
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- Chemical Vapour Deposition (AREA)
Abstract
The utility model relates to a multi-unit CVD cavity which is used for treating a basal plate and is provided with a table seat for supporting the basal plate, a cavity cover and a diffuser, wherein the table set can be vertically moved in the multi-unit CVD cavity; the cavity cover is used for covering the multi-unit CVD cavity to form closed space; the diffuser is arranged in the cavity cover and is used for diffusing program creating gas into the multi-unit CVD cavity. The utility model is characterized in that the multi-unit CVD cavity is provided with a rectangular bottom and a side wall having preset height, wherein the bottom is made of a metal sheet, a hole is formed on the bottom and is used for a shaft of the table seat to pass through; the side wall is combined with the bottom, is used for surrounding the periphery of the bottom and is made of at least one metal sheet.
Description
Technical field
The utility model relates to a kind of multi-piece type chemical vapor deposition cavity, especially is applicable to the multi-piece type chemical vapor deposition cavity that carries out chemical vapor deposition on large-size substrate.
Background technology
In the processing procedure of flat-panel screens,, therefore in processing procedure, need to plate different materials, such as films such as SiNx, a-Si and n+a-Si owing to need on substrate, make transistor component.Adopt PECVD (Plasma Enhanced Chemical Vapor Deposition) plasma enhanced CVD system to grow at present more.PECVD is in a vacuum system, activates its reaction with a plasma body board activated plasma, the process gas that dissociates after feeding process gas, and quickens processing procedure speed because of the process gas ion after dissociating can utilize electric field etc. to make it have directivity.
The employed PECVD system architecture of flat-panel screens is mainly clustered (Clusters) at present, as shown in Figure 5.
In clustered system 100 frameworks of Fig. 5, comprise a load chamber (Loading Chamber) 110, substrate at first enters load chamber 110 by load port (Load Port), load port generally includes two or three drawable parts, self is stacked, and each part has a plurality of slotted eyes, be used for mounting substrate, then load chamber is vacuumized, by the mechanical arm 140 in the transmission cavity (Transfer Chamber) 130 substrate is passed to preheating cavity (Heating Chamber) 150 by load chamber, substrate preheating in this chamber is heated in deposition chamber the preceding time to the substrate heating to reduce.Then substrate imports into according to its processing procedure needs and carries out in the chemical vapor deposition chamber (Process Chamber) 200 together or several film-plating process.Finish processing procedure by the load port taking-up after at last substrate being passed back load chamber 110, removal vacuum.The characteristics of this system are that it has a plurality of processing procedures chamber, can make substrate carry out multiple tracks differing materials film-plating process with program, for equipment provides preferable processing procedure elasticity.
The structure in one known chemical vapor deposition chamber 200 as shown in Figure 6, this chemical vapor deposition chamber 200 is provided with a process gas source of supply 210 usually, the supply process gas to deposition chamber 200.Generally speaking, process gas directly is excited into plasma body in the deposition chamber of placing base material.Through making as having the flat board of many apertures as the shower nozzle, it is called scatterer (diffuser) 215, and is arranged in the cavity lid 250 or is fixed to cavity and cover 250 bottom sides, makes the plasma body of process gas arrive substrate surface and its reaction.Because scatterer 215 structures can be distributed process gas equably, therefore suitable especially to the application of flat-panel screens equipment, in addition, one pedestal (susceptor) 220 is set in the deposition chamber 200, be used to place substrate 230, this pedestal 220 is generally had by a platform (platen) 221 and adjusts platform 222 formations of pedestal axle of the function of height up and down, cavity lid 250) covers this cavity 200, to form an enclosed space, one bleeding point 240 is provided in the deposition chamber 200, remaining process gas is detached.
The method for making of the cavity of the general deposition chamber of handling the small size substrate is to remove the middle part of a single aluminium block is whole, to form a single component deposit cavity.When substrate size strengthened, the cost of not only obtaining single aluminium block increased, and also can waste wide variety of materials when removing whole middle part with acquisition single component deposit cavity.
The utility model content
In order to solve the deposition chamber that this manufacturing is applicable to large size flat-panel screens deposit processing procedure, the problem that may waste lot of materials that manufacture exists, the utility model provides a kind of multi-piece type deposit cavity, it is made by many metal bases, thereby the chemical vapor deposition chamber that can use less material to obtain to be suitable for.
The technical scheme that its technical problem that solves the utility model adopts is: at an a kind of multi-piece type deposit cavity that is used for treatment substrate, have a pedestal that supports this substrate, this pedestal can carry out vertical direction along a pedestal axle and move in this deposit cavity; One cavity lid is used to cover this cavity to form an enclosed space; And a scatterer, be arranged in this cavity lid and be used for process gas is diffused to this cavity, it is characterized in that having: a rectangular bottom, this bottom is made by a metal sheet, and formation one hole it on supplies this pedestal axle to pass setting; One has the sidewall of a predetermined height, be bonded to this bottom and surround this bottom around, this sidewall is made by at least one metal sheet.
According to the utility model, described sidewall is made by four metal sheets, and wherein each tinsel is to be bonded to the adjacent metal sheet with this sidewall of common formation.
According to the utility model, described sidewall also can be made by a slice metal sheet, and this metal sheet surrounds this bottom periphery to form this sidewall.
According to the utility model, be bonded to each other with bolt between described bottom and sidewall, and also be provided with O shape ring therebetween with the sealing interface therebetween.
According to the utility model, between described bottom and sidewall, promptly the metal sheet of this each sidewall is to combine with welding process with the adjacent metal sheet.
According to the utility model, on deposition chamber bottom side, pedestal axle, fix a bottom support platform and be used to support the bottom that is removed.
According to the utility model, this bottom and sidewall can be made by the aluminum metal sheet material.
The utility model has the advantages that because cavity made by no metal material sheet, even thereby substrate size to be processed strengthen, do not need to use expensive metal block yet, or the waste metallic substance, promptly can be made into desired cavity size, reach and save cost and easily manufactured purpose.
Below in conjunction with drawings and Examples the utility model is further specified.
Description of drawings
Fig. 1 is the wherein sectional view of an embodiment of the present utility model.
Fig. 2 is the wherein three-dimensional exploded view of an embodiment of the present utility model.
Fig. 3 is the three-dimensional exploded view of another embodiment of the present utility model.
Fig. 4 is the utility model sectional view of an embodiment again.
Fig. 5 is the floor map of a clustered PECVD system.
Fig. 6 is the diagrammatic cross-section in a known deposition chamber.
Description of reference numerals
10. multi-piece type deposit cavity; 12. pedestal;
14. pedestal axle; 15. cavity lid;
16. scatterer; 20. bottom;
22. hole; 30. sidewall;
31.32.33.34. metal sheet;
35. rectangle framework; 40. bolt;
50.O shape ring; 60. bottom support platform.
Embodiment
Fig. 1 is the sectional view of an embodiment of the present utility model.In the multi-piece type deposit cavity 10 of Fig. 1, it has a pedestal 12 that is used for supporting substrate 13, and this pedestal 12 can carry out vertical direction along a pedestal axle 14 and move in this deposit cavity 10.One cavity lid (15) covers this cavity 10 to form an enclosed space.One scatterer 16 is used for process gas is diffused to this cavity 10.
According to the utility model, described deposit cavity 10 comprises a roughly rectangular bottom 20, and this bottom 20 is to be made by a metal sheet.Form a hole 22 on the bottom 20, pass setting for this pedestal axle 14.Deposit cavity 10 comprises that in addition one has the sidewall 30 of a predetermined height, be bonded to this bottom 20 and surround this bottom 20 around, but these sidewall 30 a slices or more the metal sheet of multi-disc make.These metal sheets can be aluminum metal, or the metal sheet of other rust protection.
As shown in Figure 2, according to a kind of embodiment of the present utility model, described sidewall 30 is to be made by four metal sheets 31,32,33,34, and wherein each tinsel is to be bonded to the adjacent metal sheet with this sidewall 30 of common formation.Sidewall among Fig. 3 then is to forge into a rectangle framework 35 by a single metal material, or after opposite end 36 combinations with a single metal material, to form a rectangle framework.
31,32,33,34 of bottom 20 among Fig. 2 and side-wall metallic sheet materials, or among Fig. 3 bottom 20 and 35 of rectangle frameworks can by the mode that is welded to one another in conjunction with after, carry out surface treatment again.
Fig. 4 is the utility model sectional view of an embodiment again.Among this embodiment, 20 of sidewall 30 and bottoms are to be bonded to each other with bolt 40, and are provided with O shape ring 50 therebetween in addition with the sealing interface therebetween.When using this embodiment, because O shape ring 50 may be because of the permanent poor qualityization of using, therefore, can set firmly a bottom support platform 60 (with reference to figure 1) on the pedestal axle 14, by means of this in the deposition chamber bottom side, when needs replacing O shape encircles 50, bolt 40 can be unclamped, bottom 20 is descended, be supported by bottom support platform 60.Behind the O shape ring 50 that more renews, again bottom 20 is lifted, and combine with sidewall 30 with bolt 40.
By above-mentioned utility model embodiment as can be known, the utility model has the advantages that, because cavity is made by no metal material sheet, even thereby the substrate size that desire is handled strengthens, do not need to use expensive metal block yet, or the waste metallic substance, promptly can be made into needed cavity size, reach and reduce cost and easily manufactured purpose.
Though with the open the utility model of aforesaid preferred embodiment; yet be not in order to limit the utility model; any person skilled in the art; in not breaking away from design of the present utility model and scope; should do various changes and improvement, therefore protection domain of the present utility model should be as the criterion with claims.
Claims (8)
1. a multi-piece type chemical vapor deposition cavity is used to handle a substrate, has the pedestal of the described substrate of a support, and this pedestal can carry out vertical direction along a pedestal axle and move in this deposit cavity; One cavity lid is used to cover this cavity to form an enclosed space; And a scatterer, be arranged in this cavity lid and be used for process gas is diffused to this cavity, it is characterized in that: have,
One rectangular bottom, this bottom is made by a metal sheet, forms a hole on it, passes setting for this pedestal axle;
One sidewall, have one the height, and be bonded to this bottom and surround this bottom around, this sidewall is made by at least one metal sheet.
2. multi-piece type chemical vapor deposition cavity according to claim 1 is characterized in that described sidewall is made by four metal sheets, and wherein each tinsel is bonded to the adjacent metal sheet with this sidewall of common formation.
3. multi-piece type chemical vapor deposition cavity according to claim 1 is characterized in that described sidewall is made by a slice metal sheet, this metal sheet surround described bottom periphery and in two opposite ends in conjunction with to form this sidewall.
4. multi-piece type chemical vapor deposition cavity according to claim 1 is characterized in that, is bonded to each other with bolt between described bottom and sidewall, and also is provided with O shape ring therebetween with the sealing interface therebetween.
5. multi-piece type chemical vapor deposition cavity according to claim 1 is characterized in that, is welded to one another between described bottom and sidewall.
6. multi-piece type chemical vapor deposition cavity according to claim 4 is characterized in that, fixes a bottom support platform and be used to support the bottom that is removed on described deposition chamber bottom side, pedestal axle.
7. multi-piece type chemical vapor deposition cavity according to claim 2 is characterized in that, is to be welded to one another with the adjacent metal sheet between the metal sheet of described each sidewall.
8. multi-piece type chemical vapor deposition cavity according to claim 1 is characterized in that described bottom and sidewall are made by the aluminum metal sheet material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200520004586 CN2823274Y (en) | 2005-04-06 | 2005-04-06 | Multi-unit CVD cavity |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200520004586 CN2823274Y (en) | 2005-04-06 | 2005-04-06 | Multi-unit CVD cavity |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2823274Y true CN2823274Y (en) | 2006-10-04 |
Family
ID=37032388
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200520004586 Expired - Lifetime CN2823274Y (en) | 2005-04-06 | 2005-04-06 | Multi-unit CVD cavity |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2823274Y (en) |
-
2005
- 2005-04-06 CN CN 200520004586 patent/CN2823274Y/en not_active Expired - Lifetime
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP01 | Change in the name or title of a patent holder |
Address after: American California Patentee after: Applied Materials Inc. Address before: American California Patentee before: Applied Materials Inc. |
|
| C17 | Cessation of patent right | ||
| CX01 | Expiry of patent term |
Expiration termination date: 20150406 Granted publication date: 20061004 |