CN2783534Y - Laser cleaning device for micro nano grain - Google Patents
Laser cleaning device for micro nano grain Download PDFInfo
- Publication number
- CN2783534Y CN2783534Y CN 200420112502 CN200420112502U CN2783534Y CN 2783534 Y CN2783534 Y CN 2783534Y CN 200420112502 CN200420112502 CN 200420112502 CN 200420112502 U CN200420112502 U CN 200420112502U CN 2783534 Y CN2783534 Y CN 2783534Y
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- laser
- utility
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- cleaning device
- laser cleaning
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Abstract
The utility model relates to a laser cleaning device for micro nanometer particles, which comprises a sample platform, a laser controlling platform and a digital oscillograph, wherein a platinum resistor is arranged on the sample platform surface; the laser controlling platform is connected with a laser generator, and the laser of the laser generator aligns the sample platform; the digital oscillograph is connected with the platinum resistor on the sample platform and is connected with a computer. The laser cleaning device of the utility model can effectively remove micro nanometer particles. The laser cleaning device of the utility model has the advantages of high efficiency and no secondary pollution. The utility model can only clean polluted areas without the consumption of chemical medicaments and without environmental pollution.
Description
Technical field
The utility model relates to a kind of device that is used for the micro-nano granules of cleaning objects surface contamination, relates to a kind of laser cleaner of micro-nano granules particularly.
Background technology
Micro-nano granules can cause very lagre scale integrated circuit (VLSIC), the short circuit of miniature high density memory device or reduce performance greatly; make the micromachine surface produce fatal damages such as cut even crackle; greatly reducing the resolution of precision optics equipment, is to need the urgent problem that solves in the new and high technologies such as semiconductor, microelectronics, micromachine, precision optics.It is generally acknowledged that the 0.1-0.25 that the admissible minimum contamination particle size of equipment surface such as semiconductor, microelectronics is its minimum characteristics size doubly.Along with more and more littler (characteristic dimension is little of 100nm) of semiconductor and microelectronic device size, the particle that needs to remove has reached 10-25nm.More and more littler along with particle diameter removed the very difficulty that becomes.For example, the Al of diameter 1 μ m
2O
3Particle is at Al
2O
3Van der Waals power on the matrix is 107 times of its gravity, and this makes for the prevailing conventional removal method of gravity, as mechanical cleaning brush, chemical cleaning and ultrasonic cleaning etc., seems unable to do what one wishes.Simultaneously, machinery is scrubbed easy damage matrix surface, and etched the matrix and produce secondary pollution (chemical reagent is difficult to filter micro-nano granules) easily such as chemical cleaning, ultrasonic cleaning, has not only wasted resource but also free from environmental pollution.
The utility model content
The purpose of this utility model is to provide a kind of micro-nano granules laser cleaner.Can effectively remove micro-nano granules by device of the present utility model, efficient height, non-secondary pollution, and can only clean, and chemical agent consumption not to Polluted area, free from environmental pollution.
For achieving the above object, the device that provides of the utility model comprises:
One sample stage is placed with platinum resistance on the table top;
One laser controlling platform connects a laser generator, the laser alignment sample stage of this laser generator;
One digital oscilloscope is connected with platinum resistance on the sample stage, and is connected with a computer.
Description of drawings
Fig. 1 is the annexation schematic diagram of the utility model device.
Fig. 2 is to use the object surface effect schematic diagram after the utility model device cleans.
Embodiment
See also Fig. 1, shown device of the present utility model, wherein:
One sample stage 3 is used to place sample to be cleaned, as silicon or aluminium flake etc., a platinum resistance is installed between sample and the sample stage, and this platinum resistance is connected with digital oscilloscope 4 described later.
One laser controlling platform 2 connects a laser generator 1, regulates the output parameter and the pulse number of laser 1 by laser controlling platform 2 control switching.Sample on the laser alignment sample stage 3 that this laser 1 produces.
One digital oscilloscope 4 is connected with laser controlling platform 2 and computer 5 respectively.
For device of the present utility model and effect are described, be illustrated for an embodiment in conjunction with the accompanying drawings, but this embodiment be not be used to limit of the present utility model.
Embodiment:
For the effect before and after cleaning is done one relatively, earlier the surface is observed under ESEM (SEM) by the test specimen of micro-/ nano particle contamination and being taken pictures, place it in then on the sample stage 3, and, also be placed with a platinum resistance (figure does not show) between test specimen and the sample stage 3 at surface coverage one deck thin liquid film.The laser generator 1 that adopts is high strength Nd
3+: YAG programmable pulse laser, its wavelength are 1.06 μ m, and pulse duration is 1～30 μ s, and spot diameter is 1～10mm, and the power density of pulsatile once reaches as high as 1.0 * 10
4MW/m
2, the sample on the laser alignment sample stage 3 that this laser produces.On laser control desk 2 (such as but not limited to the PC486 computer), set the output parameter of laser 1 again, control the output parameter and the pulse number of laser 1 by control desk.Send triggering signal in laser output laser, triggered digital oscilloscope 4 records are at the resistance variations signal on the test specimen surface under pulsed laser irradiation of the platinum resistance between sample and the sample stage, and this signal is converted to temperature signal by computer 5.
Seeing also Fig. 2 a and Fig. 2 b, is the test specimen surface before cleaning shown in Fig. 2 a, is through the test specimen surface after cleaning shown in Fig. 2 b.
Device of the present utility model can be widely used in the removal of micro-/ nano particle and the temperature survey in the removal process thereof.
Claims (2)
1. a micro-nano granules laser cleaner is characterized in that, comprising:
One sample stage is placed with platinum resistance on the table top;
One laser controlling platform connects a laser generator, the laser alignment sample stage of this laser generator;
One digital oscilloscope is connected with platinum resistance on the sample stage, and is connected with a computer.
2. the device of claim 1 is characterized in that, laser is the programmable pulse laser.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200420112502 CN2783534Y (en) | 2004-11-05 | 2004-11-05 | Laser cleaning device for micro nano grain |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200420112502 CN2783534Y (en) | 2004-11-05 | 2004-11-05 | Laser cleaning device for micro nano grain |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2783534Y true CN2783534Y (en) | 2006-05-24 |
Family
ID=36768515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200420112502 Expired - Lifetime CN2783534Y (en) | 2004-11-05 | 2004-11-05 | Laser cleaning device for micro nano grain |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2783534Y (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102989720A (en) * | 2012-10-16 | 2013-03-27 | 江苏大学 | Method and device for eliminating nanoparticles on surfaces of substrates under assistance of laser |
| CN103357621A (en) * | 2013-07-12 | 2013-10-23 | 江苏大学 | Method and device of cleaning microparticles on surface of metal workpiece with laser shock waves |
| CN107470276A (en) * | 2017-08-29 | 2017-12-15 | 江苏大学 | A kind of apparatus and method for realizing laser cavitation cleaning material surface micronano particle |
| CN109570151A (en) * | 2019-01-25 | 2019-04-05 | 中国工程物理研究院激光聚变研究中心 | The device and cleaning method of liquid stream ULTRASONIC COMPLEX auxiliary laser cleaning optical element |
| CN110773518A (en) * | 2019-11-06 | 2020-02-11 | 哈尔滨工业大学 | Laser cleaning real-time monitoring device and method |
-
2004
- 2004-11-05 CN CN 200420112502 patent/CN2783534Y/en not_active Expired - Lifetime
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102989720A (en) * | 2012-10-16 | 2013-03-27 | 江苏大学 | Method and device for eliminating nanoparticles on surfaces of substrates under assistance of laser |
| CN103357621A (en) * | 2013-07-12 | 2013-10-23 | 江苏大学 | Method and device of cleaning microparticles on surface of metal workpiece with laser shock waves |
| CN103357621B (en) * | 2013-07-12 | 2015-10-28 | 江苏大学 | A kind of method of laser blast wave clean metal surface of the work microparticle |
| CN107470276A (en) * | 2017-08-29 | 2017-12-15 | 江苏大学 | A kind of apparatus and method for realizing laser cavitation cleaning material surface micronano particle |
| CN109570151A (en) * | 2019-01-25 | 2019-04-05 | 中国工程物理研究院激光聚变研究中心 | The device and cleaning method of liquid stream ULTRASONIC COMPLEX auxiliary laser cleaning optical element |
| CN109570151B (en) * | 2019-01-25 | 2023-12-22 | 中国工程物理研究院激光聚变研究中心 | Device and method for cleaning optical element by liquid flow ultrasonic composite auxiliary laser |
| CN110773518A (en) * | 2019-11-06 | 2020-02-11 | 哈尔滨工业大学 | Laser cleaning real-time monitoring device and method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CX01 | Expiry of patent term |
Expiration termination date: 20141105 Granted publication date: 20060524 |