CN2712947Y - Plating bath with double anode - Google Patents
Plating bath with double anode Download PDFInfo
- Publication number
- CN2712947Y CN2712947Y CN 200420077973 CN200420077973U CN2712947Y CN 2712947 Y CN2712947 Y CN 2712947Y CN 200420077973 CN200420077973 CN 200420077973 CN 200420077973 U CN200420077973 U CN 200420077973U CN 2712947 Y CN2712947 Y CN 2712947Y
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- CN
- China
- Prior art keywords
- anode
- plating tank
- double
- plating bath
- power supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Electroplating Methods And Accessories (AREA)
Abstract
The utility model discloses a plating bath with double anode. In a plating bath (1), a workpiece (2) to be plated is connected with the cathode of a power supply as a negative electrode. Two anodes (3) are arranged in the plating bath (1), and respectively connected with the anode of the power supply. The plating bath with double anodes of the utility model, for increasing an anode on an anterior plating bath, enlarges the plating power, makes the plated surface even, smooth and clean, and effectively improves the plating quality.
Description
Technical field
The utility model relates to a kind of plating tank, particularly a kind of double anode plating tank.
Background technology
At present in electroplating industry, the electrode of plating tank is single anode, in electrolytic plating pool, contain metal ion solutions such as chromium, as negative electrode, under the effect of electric field between the two poles of the earth, metal ions such as chromium are directed to be moved by galvanized workpiece, be adsorbed on by on the galvanized workpiece, the shortcoming of single anodization groove is: electroplate length consuming time, electroplate not exclusively, by electronplate surface spottiness.
Summary of the invention
The utility model has overcome the shortcoming of prior art, and a kind of plating power height is provided, the double anode plating tank that plate surface is even, bright and clean.
In order to achieve the above object, double anode plating tank of the present utility model in plating tank, is linked to each other with the negative pole of power supply by galvanized workpiece, as negative electrode, two anodes is set in described plating tank, links to each other with the positive pole of power supply respectively.
Double anode plating tank of the present utility model owing to increased an anode on the basis of former plating tank, so increased plating power, makes plate surface even, bright and clean, has improved galvanized quality effectively.
Description of drawings
Fig. 1 represents the structural representation of the utility model embodiment;
Fig. 2 represents the anodic structure iron of the utility model embodiment.
Embodiment
With reference to accompanying drawing 1 and Fig. 2, will be described in detail embodiment of the present utility model.
Double anode plating tank of the present utility model as described in Figure 1, in plating tank 1, is linked to each other with the negative pole of power supply by galvanized workpiece 2, as negative electrode, in a side of described workpiece 2 two anodes 3 is set, and links to each other with the positive pole of power supply respectively.
Described two anodes 3 preferably be arranged in parallel.
The area of described each anode 3 can guarantee to form uniform electric field like this more than or equal to the size of workpiece 2 at the maximum cross-section area that parallels with anode 3 between anode 3 and workpiece 2.
Described two anodes 3 also can divide the both sides that are located at described workpiece 2.
The structure of described anode 3 can be made up of a plurality of anode strips 31 side by side as shown in Figure 2, and described each anode strip 31 surface form a plane; Described anode strip 31 can hang on the conductor that links to each other with the positive pole of power supply, according to the size of workpiece 2, can increase or reduce the quantity of anode strip 31, to adapt to need of work.
Claims (6)
1, a kind of double anode plating tank in plating tank (1), is linked to each other with the negative pole of power supply by galvanized workpiece (2), as negative electrode, it is characterized in that, two anodes (3) are set in described plating tank (1), links to each other with the positive pole of power supply respectively.
2, double anode plating tank according to claim 1 is characterized in that, described two anodes (3) be arranged in parallel.
3, double anode plating tank according to claim 1 and 2 is characterized in that, described two anodes (3) are arranged on the one or both sides of workpiece (2).
4, double anode plating tank according to claim 3 is characterized in that, the area of described anode (3) is more than or equal to the size of workpiece (2) at the maximum cross-section area that parallels with anode (3).
5, double anode plating tank according to claim 4 is characterized in that, the structure of described anode (3) is made up of a plurality of anode strips (31) side by side, and described each anode strip (31) surface forms a plane.
6, double anode plating tank according to claim 5 is characterized in that, described anode strip (31) hangs on the conductor that links to each other with the positive pole of power supply.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200420077973 CN2712947Y (en) | 2004-07-20 | 2004-07-20 | Plating bath with double anode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200420077973 CN2712947Y (en) | 2004-07-20 | 2004-07-20 | Plating bath with double anode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2712947Y true CN2712947Y (en) | 2005-07-27 |
Family
ID=34874493
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200420077973 Expired - Fee Related CN2712947Y (en) | 2004-07-20 | 2004-07-20 | Plating bath with double anode |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2712947Y (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103255460A (en) * | 2013-05-15 | 2013-08-21 | 浙江建设职业技术学院 | Aluminum anode oxidation dual-test-piece experiment device |
| CN103510115A (en) * | 2012-06-29 | 2014-01-15 | 沈阳铝镁设计研究院有限公司 | Cross beam steel claw and anode guide rod combined structure |
| CN103526225A (en) * | 2013-10-10 | 2014-01-22 | 武汉远大弘元股份有限公司 | Double-layer meshy negative electrode electrolytic bath |
| CN104152959A (en) * | 2013-05-14 | 2014-11-19 | 新光电气工业株式会社 | Plating film manufacturing method |
-
2004
- 2004-07-20 CN CN 200420077973 patent/CN2712947Y/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103510115A (en) * | 2012-06-29 | 2014-01-15 | 沈阳铝镁设计研究院有限公司 | Cross beam steel claw and anode guide rod combined structure |
| CN103510115B (en) * | 2012-06-29 | 2017-02-08 | 沈阳铝镁设计研究院有限公司 | Cross beam steel claw and anode guide rod combined structure |
| CN104152959A (en) * | 2013-05-14 | 2014-11-19 | 新光电气工业株式会社 | Plating film manufacturing method |
| CN104152959B (en) * | 2013-05-14 | 2018-11-13 | 新光电气工业株式会社 | Film-plating method |
| CN103255460A (en) * | 2013-05-15 | 2013-08-21 | 浙江建设职业技术学院 | Aluminum anode oxidation dual-test-piece experiment device |
| CN103526225A (en) * | 2013-10-10 | 2014-01-22 | 武汉远大弘元股份有限公司 | Double-layer meshy negative electrode electrolytic bath |
| CN103526225B (en) * | 2013-10-10 | 2017-01-18 | 武汉远大弘元股份有限公司 | Double-layer meshy negative electrode electrolytic bath |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |