CN2612535Y - Uniformly pressure device for nanometer transfer printing - Google Patents
Uniformly pressure device for nanometer transfer printing Download PDFInfo
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- CN2612535Y CN2612535Y CN 03257536 CN03257536U CN2612535Y CN 2612535 Y CN2612535 Y CN 2612535Y CN 03257536 CN03257536 CN 03257536 CN 03257536 U CN03257536 U CN 03257536U CN 2612535 Y CN2612535 Y CN 2612535Y
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Abstract
The utility model relates to an even pressing device for nanometer transfer printing, which comprises an outer cover with at least a first flange. A carring unit, which carries a carring transfer printing mould, has at least a second flange. The second flange is unfixed arranged on the first flange. A placode is carried by a second carring unit. At least an even pressing device is connected with a transfer path of transfer printing force. The cover or the second carring unit is driven by a force source. According to the connection between the first flange and the second flange, the transfer printing mould is contacted with the placode freely. Nanometer transfer printing with good parallelism and even-pressing is completed by pressing the even pressing device. The device is characterized in that parallelism is good, and structure is simple. Cost is low, and operation system is easy. Forming is fast.
Description
Technical field
The utility model is the even device for exerting that is used for the nanometer transfer printing about a kind of, particularly freely contacts with the substrate generation about a kind of mould that can make, to reach the even device for exerting of the good depth of parallelism.
Background technology
In the conventional semiconductors processing procedure, mostly lithographic printing (Lithography) processing procedure is to adopt photolithography techniques, and with required conductive trace (Trace) on this technology formation chip or the substrate, just this method is owing to be subjected to the restriction of the light source diffraction limit, when processing live width when 100 nanometers are following, be difficult to utilization optical microswitch shadow and finish, the development on the circuit live width is restricted; Therefore, nanometer transfer printing lithographic techniques (the Nano-imprint Lithography that development in recent years goes out, NIL) owing to can break through this live width limit, and have characteristics such as resolution ratio height, manufacturing speed is fast, production cost is low, now become the most popular lithographic printing process technology.
Be the operational flowchart of nanometer transfer printing lithography technique transfer process shown in Fig. 6 A to Fig. 6 C, it is by intensification-transfer printing-cooling-demoulding step, finishes whole transfer process.The intensification action of Fig. 6 A is the formable material layer 32 that makes coating on this substrate 31, reaches the required operating temperature of transfer printing; The transfer printing action then is shown in Fig. 6 B, utilization is fixed on the mould 22 of cope match-plate pattern 20 ' go up and have nanostructured 23, and by power source 50 promotions, to be fixed on lower bolster 30 ' substrate 31 move, when mould 22 with promptly begin to exert pressure after formable material layer 32 on the substrate 31 contacts, make feature transfer printing on this mould 22 on this formable material layer 32; After making this formable material layer 32 reduce to a proper temperature again, shown in Fig. 6 C, this mould 22 is separated with formable material layer 32, carry out demoulding, promptly finish the transfer printing program of nanometer transfer technique.
This technology is owing to have the precision of nano-scale, therefore the quality control of its transfer process can generally hot forming (Hot Embossing) processing procedure be more accurate, just from above-mentioned flow process, in the nanometer transfer process, if the pressure executed of transfer printing is inhomogeneous, can cause the transfer printing degree of depth shown in Fig. 7 A to differ and mould 22 the torsional deflection phenomenon occurs with nanostructured 23 parts; And for example shown in Fig. 7 B, when the depth of parallelism between mould 22 and the substrate 31 is bad, the nanostructured 23 in the transfer area will present heeling condition, significantly reduce the transfer printing quality.Both of these case all may cause the damage of nanostructured 23 when the demoulding; Therefore, in sum, the transfer printing power of transfer process is inhomogeneous can not to cause variety of issue with the depth of parallelism is good, if and the depth of parallelism when carrying out transfer printing is all inequality at every turn, be difficult to control the quality of shaping especially, cause the restriction on the volume production and be difficult to meet commercial needs, these problems are because the design of transfer apparatus or part processing assembling cause mostly, obviously also need to solve by the improvement of transfer apparatus.
Fig. 8 is the U.S. the 5th, 993, the micro-structural hot press forming device of No. 189 patent case propositions, wherein, carry by inside and outside two carriers 61,62 that can carry out relative motion respectively with substrate 64 in order to the mould 63 that carries out transfer printing, and the thrust of borrowing a power source, make this two carriers, 61,62 closures, the special micro-structural on this mould 63 is pressed into formable material layer on this substrate 64; Because this device is not provided with parallelism adjustment function, only be to reach its required depth of parallelism with assembling by its member manufacturing processing, the variable that has many part processing and assembling in its design, obviously be difficult to reach the needs of nanometer transfer printing, also difficult equipment volume production of carrying out same quality, in addition, its strength transmission mode also is difficult to reach the required requirement of evenly exerting pressure of nanometer transfer printing, and the quality discrepancy of formed thereby is also very big.
Fig. 9 is the U.S. the 6th, 482, the fluid pressure transfer printing micro-image device of No. 742 patent case propositions, it is after mould 72 and the substrate 73 that is coated with the formable material layer are sealed, insert in the confined chamber 74, and after being heated to a forming temperature of being scheduled to, pouring into fluid mould 72 is exerted pressure, the transfer printing of carrying out nanostructured is shaped; This design is owing to need carry out the storehouse and the sealing of mould 72, substrate 73 in advance before transfer printing, and after transfer printing is shaped, also must remove the sealing state and just can carry out the demoulding, not only increase the cost of forward and backward processing, also can prolong forming period, be unfavorable for the volume production of nanometer transfer printing; In addition, owing to need earlier before its transfer printing,, transfer printing quality and precision are declined to a great extent so also be difficult to carry out between the two contraposition (Alignment) with this mould 72 and substrate 73 sealings.
Figure 10 is nanometer transfer device and the method that PCT patent WO0142858 case proposes, it is configuration one pressure chamber 82, pass in and out the pressure cave 83 of this pressure chamber 82 by the control fluid, make mould 81 because of the distortion of elastic membrane 84 to substrate 85 move or away from, and then finish transfer printing or demoulding action; If this mould 81 does not place the centre of this elastic membrane 84, when fluid poured into this pressure cave 83, the elastic membrane 84 around this mould 81 had an asymmetric expansion in this method, and then made the mould 81 of successful contraposition originally and 85 of substrates produce skew.
Therefore, how to develop a kind of even device for exerting that can be used for the nanometer transfer printing, significantly to promote its nanometer transfer printing quality, have simultaneously that the depth of parallelism is good, simple for structure, with low cost, operation sequence is simple and the effect such as quick that is shaped, and is the problem that relevant research and development field urgently faces really.
The utility model content
For overcoming the shortcoming of above-mentioned prior art, the purpose of this utility model is to provide a kind of the have depth of parallelism of nanometer roller mould and substrate and the device of evenly exerting pressure.
A purpose more of the present utility model is to provide a kind of mould that makes to produce the even device for exerting that freely contacts with substrate.
Another purpose of the present utility model is to provide a kind of even device for exerting simple in structure and with low cost.
Another purpose of the present utility model is to provide a kind of previous operations and even device for exerting simple to operate of not needing.
Therefore, for reaching above-mentioned and other purpose, the even device for exerting that is used for the nanometer transfer printing that the utility model provides comprises: outer cover have at least one opening, and this around openings is to be formed with first flange part that extends to a first direction; Carrying transfer printing first load bearing unit of mould, at least be formed with second flange part to the reverse extension of this first direction, but be overlapped on this first flange part with making this second flange part on-fixed, this outer cover is driven when mobile, can drive this first load bearing unit and move in the lump; Second load bearing unit of bearing substrate, and it is relative with mould with this transfer printing to be coated with the surface of formable material layer on this substrate; At least one unit of evenly exerting pressure comprises the fluid of an airtight elastic membrane and coating thereof, and connects on the bang path that is located at transfer printing power; And at least one power source, in order to drive at least one in this outer cover and second load bearing unit, make this transfer printing contact with this formable material layer with mould, and borrow its contact make this first flange part and this second flange portion from, and then make this unit pressurized of evenly exerting pressure finish the nanometer transfer printing of evenly exerting pressure.
This power source also can be distinguished into a feeding power source and a transfer printing power source, make this feeding power source drive in this outer cover and second load bearing unit at least one, this transfer printing is contacted with this formable material layer with mould, and make this transfer printing power source after this second flange part breaks away from this first flange part, make this unit pressurized of evenly exerting pressure finish the nanometer transfer printing of evenly exerting pressure; Simultaneously, in the configuration of the present utility model, also can carry out an equivalence and replace, make this first load bearing unit carry this substrate, make this second load bearing unit carry this transfer printing mould.
This unit of evenly exerting pressure comprises the fluid of an airtight elastic membrane and coating thereof, and it is can connect on the transfer printing power bang path that is located at this first load bearing unit side or the second load bearing unit side; If it is to connect to be located at this first load bearing unit side, then it is between this outer cover and this first load bearing unit, and if it is to connect to be located at this second load bearing unit side, then is between this second load bearing unit and this substrate.
Therefore, the even device for exerting that the utility model proposed, it is the design that utilizes this first flange part and this second flange part, borrow its on-fixed ground contraposition bonding relation to reach freely contacting between this mould and substrate, can promptly obtain a splendid depth of parallelism in the moment of its contact, and can be again by the transfer printing power transmission of this unit of evenly exerting pressure, the nanostructured of this mould can be transferred in this formable material layer equably, and also because each point pressure in this transfer area is equal, in transfer process, continue to keep this depth of parallelism, and then the shaping quality of lifting nanometer transfer printing, improve transfer printing power skewness in the existing equipment to a great extent, the depth of parallelism is not good, problems such as complex structure and forming period are tediously long.
Description of drawings
Fig. 1 is the schematic diagram of even device for exerting embodiment 1 of the present utility model;
Fig. 2 A to Fig. 2 D is embodiment illustrated in fig. 11 operational flowchart;
Fig. 3 A to Fig. 3 D is the operational flowchart of the utility model embodiment 2;
Fig. 4 A to Fig. 4 D is the operational flowchart of the utility model embodiment 3;
Fig. 5 A to Fig. 5 D is the operational flowchart of the utility model embodiment 4;
Fig. 6 A to Fig. 6 C is the action flow chart of nanometer transfer technique;
Fig. 7 A and Fig. 7 B are the existing issue example schematic of nanometer transfer technique;
Fig. 8 is the nanometer transfer device schematic diagram of the 5th, 993, No. 189 patent cases of the U.S.;
Fig. 9 is the nanometer transfer device schematic diagram of the 6th, 482, No. 742 patent cases of the U.S.;
Figure 10 is the nanometer transfer device schematic diagram of PCT patent WO0142858 case.
The specific embodiment
The even device for exerting 1 that is used for the nanometer transfer printing of the present utility model, the preferred embodiment of its structure configuration is as shown in Figure 1, it comprises an outer cover 10, first load bearing unit 20, second load bearing unit 30, evenly exert pressure unit 40 and power source 50, wherein, this outer cover 10 is a hollow, and tool one opening, to define an accommodation space 12, this around openings place is formed with at least one group of first flange part 11 (Flange) that extends internally, and this first load bearing unit 20 is overlapped on a side of this outer cover 10, be formed with at least one group with respect to this first flange part 11 and outward extending second flange part 21, make this first load bearing unit 20 can borrow this second flange part 21, be overlapped on this first flange part 11 on-fixed, and make this second flange part 21 be positioned at the accommodation space 12 of this outer cover 10 all the time, this first load bearing unit 20 can not fallen outside this outer cover 10, and can with its generation one relative motion freely, when making this outer cover 10 driven by a power source 50, can drive this first load bearing unit 20 and move in the lump.
This first load bearing unit 20 is with respect to the opposite side of this second flange part 21, carry transfer printing mould 22, be formed with nanostructured 23 on this mould 22 in order to carry out transfer printing, simultaneously, on this second load bearing unit 30, with this transfer printing carry a substrate 31 with mould 22 facing surfaces, the surface of this substrate 31 is coated with a formable material layer 32, it for example is macromolecule polymer material, make this formable material layer 32 towards this transfer printing mould 22, and can in transfer process, carry out the transfer printing of nanostructured 23; In addition, this unit 40 of evenly exerting pressure is as shown in the figure, be configured on this first load bearing unit 20, and be installed with in this accommodation space 12, just be arranged on the transfer printing power bang path of transfer process first load bearing unit 20 sides, this unit 40 of evenly exerting pressure comprises the fluid 40b of elastomeric material sealing adventitia 40a and its inner filling, because the fluid 40b in this sealing adventitia 40a has the advantages that each point pressure equates, the effect of even power transmission can be provided, reach the purpose of evenly exerting pressure, also can keep the depth of parallelism between this mould 22 and the substrate 31 simultaneously; This power source then is to be configured in this outer cover 10 1 sides, driving this outer cover 10 moves to this second load bearing unit 30, and drive this first load bearing unit 20 in the lump with contacting of second flange part 21 by this first flange part 11, make the transfer printing on this first load bearing unit 20 move to the substrate 31 that contacts on this second load bearing unit 30 with mould 22, and carry out transfer printing, simultaneously, this power source 50 in addition can be in order to provide a transfer printing power in this transfer process.
In addition, be that this unit 40 of evenly exerting pressure is configured between this first load bearing unit 20 and this outer cover 10 in Fig. 1, and be installed with in this accommodation space 12, just this unit 40 of evenly exerting pressure not is only to be configured in this first load bearing unit, 20 sides, also configurable on the transfer printing power bang path of these second load bearing unit, 30 sides, for example be configured between this second load bearing unit 30 and this substrate 31, also can be by this substrate 31 and the transfer printing that contacts of transfer printing with mould 22, and make this unit 40 pressurizeds of evenly exerting pressure, and utilize this elastic membrane 40a and the design that coats fluid 40b, given play to the function of evenly exerting pressure.
Below promptly at the flange part shown in Figure 1 11,21 and unit 40 design of evenly exerting pressure, by the position and the function of the difference configuration of this power source 50, with its institute respectively four embodiment of formation transfer printing flow process of the present utility model is described.
Embodiment 1
Fig. 2 A to Fig. 2 D is the operational flowchart of Fig. 1, at first as Fig. 2 A, makes this substrate 31 carry out horizontal alignment with mould 22 in advance; Fig. 2 B for another example, drive this outer cover 10 with this power source 50, and together with this first load bearing unit 20 and the mould 22 on it, substrate 31 on second load bearing unit 30 moves, make the formable material layer 32 of nanostructured 23 these substrates 31 of contact on this mould 22, owing to be one freely to contact between this first flange part 11 and second flange part 21, so this mould 22 does not have any constraint when contacting with substrate 31, therefore can obtain between the two the best depth of parallelism in the moment of contact, as shown in the figure, can borrow its contact force to back down this second flange part 21, make this first flange part 11 separate with this second flange part 21, this moment, this outer cover 10 still continued to be subjected to this power source 50 to drive and move down; Fig. 2 C for another example, after treating that this first flange part 11 breaks away from second flange part 21, this outer cover 10 will continue to move to its closing end 13 these unit 40 of evenly exerting pressure of contact, this power source 50 will continue the application of force and be compressed and transmit required transfer printing power to one preset value until this unit 40 of evenly exerting pressure, the transfer printing action during the professional etiquette of going forward side by side is drawn this moment; Finally, after finishing transfer printing, as Fig. 2 D, this power source 50 moves up this outer cover 10 reverse drive, and its closing end 13 and this unit 40 of evenly exerting pressure is broken away from, can again first flange part 11 be lifted, and this second flange part 21 of jack-up, drive this first load bearing unit 20 and move up, this mould 22 was separable with substrate 31 and carried out the demoulding action this moment, finished all transfer printing programs.
Embodiment 2
Embodiment 2 of the present utility model is as shown in Figure 3A, comprise an outer cover 10, first load bearing unit 20, evenly exert pressure unit 40, second load bearing unit 30 and power source 50 equally, just the allocation position of its power source 50 is to be positioned at this second load bearing unit, 30 sides, driving this second load bearing unit 30 moves to first load bearing unit 20, and transfer printing power is provided in transfer process, it is to move the contact that is caused by this substrate 31 towards this nanostructured 23 to carry out transfer printing; Fig. 3 A to Fig. 3 D promptly is the operational flowchart of this embodiment 2.At first, make this substrate 31 carry out horizontal alignment with mould 22 as Fig. 3 A in advance; Fig. 3 B for another example, drive this second load bearing unit 30 and the substrate 31 on it with this power source 50, make it move towards this first load bearing unit 20 and the mould 22 on it, and borrow freely contacting of this first flange part 11 and second flange part 21, make this substrate 31 and mould 22 when contacting, obtain a best depth of parallelism, after treating that this second flange part 21 breaks away from the position of this first flange part 11, make this second load bearing unit 30 continue start, be moved upward to the closing end 13 of this outer cover 10 of contact until this unit 40 of evenly exerting pressure; Also, continue to exert pressure by this power source 50 as Fig. 3 C, make this evenly exert pressure unit 40 by compression after, transmit required transfer printing power to one setting value, the transfer printing action in planning; Finally, Fig. 3 D for another example, this power source 50 is with reverse drive, this second load bearing unit 30 is moved down, make the closing end 13 of this evenly exert pressure unit 40 and this outer cover 10 break away from, and when this second flange part 21 is moved downward to this first flange part 11 of contact, be subjected to keeping out of this first flange part 11, this mould 22 is separated with substrate 31 and carry out demoulding action, finish all transfer printing programs.
Embodiment 3
Embodiment 3 of the present utility model is shown in Fig. 4 A, comprise an outer cover 10, first load bearing unit 20, evenly exert pressure unit 40, second load bearing unit 30, feeding power source 50a and transfer printing power source 50b, it has identical configuration with the foregoing description 1, just change this power source 50 one-tenth one feeding power sources 50a and transfer printing power source 50b, just drive this outer cover 10 and move, exert pressure and drive this unit 40 of evenly exerting pressure with this transfer printing power source 50b towards this second load bearing unit 30 with this feeding power source 50a; Fig. 4 A to Fig. 4 D is the operational flowchart of this embodiment 3, at first as Fig. 4 A, makes this substrate 31 carry out horizontal alignment with mould 22 in advance; Fig. 4 B for another example, 50a drives this outer cover 10 with this feeding power source, it is moved down together with this first load bearing unit 20 and mould 22, and, make this mould 22 promptly obtain a best depth of parallelism in the moment that contacts with substrate 31 by the free contact relation of this first flange part 11 and second flange part 21; Fig. 4 C for another example, treat that this outer cover 10 continues to move down, after making this first flange part 11 break away from this second flange part 21, make this transfer printing power source 50b be exerted pressure in this unit 40 of evenly exerting pressure, make this evenly exert pressure unit 40 by compression after, transmit required transfer printing power to one setting value, the transfer printing action in planning; Finally, Fig. 4 D for another example makes this transfer printing power source 50b and feeding power source 50a oppositely start in regular turn, makes this first flange part 11 keep out this second flange part 21, makes this mould 22 separate with substrate 31 and carries out demoulding action, finishes all transfer printing programs.
Embodiment 4
Embodiment 4 of the present utility model is shown in Fig. 5 A, comprise an outer cover 10, first load bearing unit 20, evenly exert pressure unit 40, second load bearing unit 30, feeding power source 50a and transfer printing power source 50b, it is to have identical configuration with the foregoing description 2, just change this power source 50 one-tenth one feeding power sources 50a and transfer printing power source 50b, just drive this second load bearing unit 30 and move, drive this unit 40 of evenly exerting pressure with this transfer printing power source 50b and exert pressure towards this first load bearing unit 20 with this feeding power source 50a; Fig. 5 A to Fig. 5 D promptly is the operational flowchart of this embodiment 4, at first shown in Fig. 5 A, makes this substrate 31 carry out horizontal alignment with mould 22 in advance; Also as Fig. 5 B, 50a drives this second load bearing unit 30 with this feeding power source, make it move up, and borrow freely contacting of this first flange part 11 and second flange part 21, make this substrate 31 promptly obtain a best depth of parallelism in the moment that contacts with mould 22 together with this substrate 31; Fig. 5 C for another example, after treating that this second flange part 21 breaks away from these first flange parts 11, this transfer printing power source 50b promptly exerts pressure to this unit 40 of evenly exerting pressure so that this is evenly exerted pressure unit 40 by compression after, transmit required transfer printing power to one setting value, the transfer printing action in planning; Finally, Fig. 5 D for another example, make this transfer printing power source 50b and feeding power source 50a oppositely start in regular turn, make this second flange part 21 be moved downward to this first flange part 11 of contact, and be subjected to keeping out of this first flange part 11, this substrate 31 is separated with mould 22 and carry out demoulding action, finish all transfer printing programs.
Therefore, explanation by the various embodiments described above, the utility model promptly is the free contact relation by this first flange part 11 and second flange part 21 as can be known, make this mould 22 promptly reach the required best depth of parallelism in the moment that contacts with substrate 31, and by the pressurized of this unit 40 of evenly exerting pressure, make this mould 22 and substrate 31 during its transfer printing, keep uniform-compression relation, thereby reach effect of evenly exerting pressure with the good depth of parallelism of the present utility model.
In the even device for exerting 1 of the present utility model, can keep a predetermined transfer printing planning for making its course of exerting pressure, can be provided with one in order to the exert pressure pressure sensor (mark) of pressure of detection, it is to be installed on this unit 40 of evenly exerting pressure, be subjected to pressure pressure when detecting that this mould 22 contacts with formable material layer 32 in the nanometer transfer process, and real-time pressure monitoring carrying out transfer printing control whereby, its practice can be by a pressure-time operating curve of planning in advance, contact with formable material layer 32 at this mould 22, and when pressure rises to certain value, order pressure between the two remains on this definite value and keeps the several seconds, discharge after finishing transfer printing and carry out the demoulding, visual transfer materials of the numerical relation of its pressure and time and accuracy requirement obtain by experiment; Simultaneously, this first load bearing unit 20 or second load bearing unit 30 also can connect to be put on a pair of bit platform (not mark), with the horizontal alignment relation before borrowing it to finish transfer printing; In addition, above-mentioned feeding power source 50a and transfer printing power source 50b, be to be selected from power sources such as fluid power system, air pressure drive system or motor transmission component, this transfer printing is to be fixed on this first load bearing unit 20 and second load bearing unit 30 in modes such as vacuum adsorption force, mechanical force or electromagnetic forces respectively with mould 22 with substrate 31.
In the design of the present utility model, also can carry out the space change of any equivalence, for example this mould 22 and the position collocation of substrate 31 are exchanged, make this have first load bearing unit, 20 these substrates 31 of carrying of second flange part 21, make this second load bearing unit, 30 these moulds 22 of carrying, can carry out transfer printing according to above-mentioned same steps as equally, and reach the purpose of this utility model and effect.
In sum, the even device for exerting that is used for the nanometer transfer printing of the present utility model, really have and to adjust the best depth of parallelism and the effect of evenly exerting pressure, and can improve because of the problem that the depth of parallelism is not good and pressure is uneven of processing and assembly error causes, and can avoid vibrating the problem that causes because of power source, simultaneously, also have simple for structure, with low cost, operation sequence simple with the advantage such as quick that is shaped.
Claims (18)
1. even device for exerting that is used for the nanometer transfer printing is characterized in that this device comprises:
Outer cover has at least one opening, is provided with first flange part that extends to first direction in this around openings;
Carrying transfer printing first load bearing unit of mould, be provided with second flange part to the reverse extension of this first direction, but be overlapped on this first flange part with making this second flange part on-fixed, and when making the action of this outer cover, can drive this first load bearing unit and move in the lump;
Second load bearing unit of bearing substrate is coated with the formable material layer on this substrate, and makes this formable material layer relative with mould with this transfer printing;
At least one unit of evenly exerting pressure comprises the fluid of an airtight elastic membrane and coating thereof, and connects on the bang path that is located at transfer printing power; And
Driver element, can carry out feeding and and then drive in this outer cover and second load bearing unit at least one, make this transfer printing contact with this formable material layer with mould, and borrow its contact make this first flange part and this second flange portion from, and then can carry out transfer printing, make this unit pressurized of evenly exerting pressure, finish the nanometer transfer printing of evenly exerting pressure.
2. even device for exerting as claimed in claim 1 is characterized in that, this driver element is one can be used for the power source of feeding and transfer printing.
3. even device for exerting as claimed in claim 1 is characterized in that, this driver element is a feeding power source that can be respectively applied for feeding and the combination that is used for the transfer printing power source of transfer printing.
4. even device for exerting as claimed in claim 1 is characterized in that, a kind of in the cohort that this driver element is made up of fluid power system, air pressure drive system, motor transmission component and other power source.
5. even device for exerting as claimed in claim 1, it is characterized in that, on-fixed ground between this first flange part and second flange part overlap joint contraposition mode, a kind of in the cohort of forming by plane contact, inclined-plane contact, pushing face-drawing contact, sphere contact and other form way of contact.
6. even device for exerting as claimed in claim 1 is characterized in that, this unit of evenly exerting pressure is to connect to be located at this first load bearing unit and this second load bearing unit wherein on any transfer printing power bang path.
7. even device for exerting as claimed in claim 1 is characterized in that, this transfer printing is in vacuum adsorption force, mechanical force and electromagnetic force any mode wherein with mould and substrate, is separately fixed on this first load bearing unit and this second load bearing unit.
8. even device for exerting as claimed in claim 1 is characterized in that, this first load bearing unit and second load bearing unit wherein at least one, be to connect to put on a pair of bit platform the contraposition effect when reaching transfer printing.
9. even device for exerting as claimed in claim 1 is characterized in that, this nanometer transfer device also can comprise in order to detect the sensing unit of transfer process pressure or strength, be used to carry out pressure or strength circuit controls.
10. even device for exerting that is used for the nanometer transfer printing is characterized in that this device comprises:
Outer cover has at least one opening, is provided with first flange part that extends to first direction in this around openings;
Carrying is coated with first load bearing unit of the substrate of formable material layer, be provided with second flange part to the reverse extension of this first direction, but be overlapped on this first flange part with making this second flange part on-fixed, when making this outer cover action, can drive this first load bearing unit and move in the lump;
Carrying transfer printing second load bearing unit of mould, and make this transfer printing relative with this formable material layer with mould;
At least one unit of evenly exerting pressure comprises the fluid of an airtight elastic membrane and coating thereof, and connects on the bang path that is located at transfer printing power; And
Driver element, can carry out feeding so drive this outer cover and second load bearing unit at least one, make this transfer printing contact with this formable material layer with mould, and borrow its contact make this first flange part and this second flange portion from, and then can carry out transfer printing and make this unit pressurized of evenly exerting pressure, finish the nanometer transfer printing of evenly exerting pressure.
11. even device for exerting as claimed in claim 8 is characterized in that, this driver element is one can be used for the power source of feeding and transfer printing.
12. even device for exerting as claimed in claim 8 is characterized in that, this driver element is a feeding power source that can be respectively applied for feeding and the combination that is used for the transfer printing power source of transfer printing.
13. even device for exerting as claimed in claim 8 is characterized in that, this driver element is formed a kind of in the cohort by fluid power system, air pressure drive system, motor transmission component and other power source.
14. even device for exerting as claimed in claim 8, it is characterized in that, overlap joint contraposition mode in on-fixed ground between this first flange part and second flange part is formed a kind of in the cohort by plane contact, inclined-plane contact, pushing face-drawing contact, sphere contact and other form way of contact.
15. even device for exerting as claimed in claim 8 is characterized in that, this unit of evenly exerting pressure is to connect on any the transfer printing power bang path that is located in this first load bearing unit and this second load bearing unit.
16. even device for exerting as claimed in claim 8 is characterized in that, this substrate and transfer printing mould are with any mode in vacuum adsorption force, mechanical force and the electromagnetic force, are separately fixed on this first load bearing unit and this second load bearing unit.
17. even device for exerting as claimed in claim 8 is characterized in that, at least one can be overlapped on a pair of bit platform in this first load bearing unit and second load bearing unit, the contraposition effect when reaching transfer printing.
18. even device for exerting as claimed in claim 8 is characterized in that, this nanometer transfer device also can comprise the sensing unit in order to pressure or strength in the detection transfer process, to carry out pressure or strength circuit controls.
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| CN 03257536 CN2612535Y (en) | 2003-05-12 | 2003-05-12 | Uniformly pressure device for nanometer transfer printing |
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| CN 03257536 CN2612535Y (en) | 2003-05-12 | 2003-05-12 | Uniformly pressure device for nanometer transfer printing |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101380824B (en) * | 2007-09-07 | 2010-09-29 | 洪荣崇 | Pressure-equalizing device for microstructure transfer printing |
| CN102922888A (en) * | 2012-11-15 | 2013-02-13 | 苏州合亚信息技术有限公司 | Self-balancing constant-pressure seal seat used for high-speed automatic stamping machine |
| CN111390465A (en) * | 2020-01-20 | 2020-07-10 | 武汉高芯科技有限公司 | Hydraulic device for flip-chip welding |
| CN113619275A (en) * | 2020-08-14 | 2021-11-09 | 友达光电股份有限公司 | Printing apparatus and printing method |
| CN114889223A (en) * | 2022-06-02 | 2022-08-12 | 重庆市渝北区中央公园小学校 | Automatic hydraulic forming device for pattern hand tissue |
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2003
- 2003-05-12 CN CN 03257536 patent/CN2612535Y/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101380824B (en) * | 2007-09-07 | 2010-09-29 | 洪荣崇 | Pressure-equalizing device for microstructure transfer printing |
| CN102922888A (en) * | 2012-11-15 | 2013-02-13 | 苏州合亚信息技术有限公司 | Self-balancing constant-pressure seal seat used for high-speed automatic stamping machine |
| CN111390465A (en) * | 2020-01-20 | 2020-07-10 | 武汉高芯科技有限公司 | Hydraulic device for flip-chip welding |
| CN111390465B (en) * | 2020-01-20 | 2022-03-22 | 武汉高芯科技有限公司 | Hydraulic device for flip-chip welding |
| CN113619275A (en) * | 2020-08-14 | 2021-11-09 | 友达光电股份有限公司 | Printing apparatus and printing method |
| CN113619275B (en) * | 2020-08-14 | 2024-01-12 | 友达光电股份有限公司 | Printing apparatus and printing method |
| CN114889223A (en) * | 2022-06-02 | 2022-08-12 | 重庆市渝北区中央公园小学校 | Automatic hydraulic forming device for pattern hand tissue |
| CN114889223B (en) * | 2022-06-02 | 2023-11-07 | 重庆市渝北区中央公园小学校 | Automatic pattern manual paper water pressure forming device |
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Expiration termination date: 20130512 Granted publication date: 20040421 |