CN2552161Y

CN2552161Y - External combustion type hydrogen and oxygen synthesis oxidizing device

Info

Publication number: CN2552161Y
Application number: CN 02224095
Authority: CN
Inventors: 袁章其
Original assignee: Electronic Inst No48 Ministry Of Information Industry
Current assignee: Electronic Inst No48 Ministry Of Information Industry
Priority date: 2002-05-23
Filing date: 2002-05-23
Publication date: 2003-05-21
Anticipated expiration: 2012-05-23

Abstract

The utility model relates to an external combustion type hydrogen and oxygen synthesis oxidizing device. The utility model has the main structure that one end of a synthetic cavity 4 is communicated with a working tube 5, and the other end is a tubular oxygen inlet cavity 2 with a connecting joint 7. The cavity 2 internally has a tubular hydrogen inlet cavity 9 with a connecting joint 8, and an exhaust port 11 of the cavity 9 is positioned in the cavity 2. The cavity 9 is internally provided with a thermocoupler 1 which is arranged in a shell 10. The external profile of the cavity 2 is provided with an igniting furnace 4. One side of the synthetic cavity 4 has a flame sensor 6. The utility model is used for forming a silicon dioxide film at the bottom of a silicon lining in the working procedure before the production of semiconductor apparatuses or integrated circuits. Moreover, the utility model can control the process of hydrogen-oxygen synthetic oxidation so as to make the film of good quality and uniformity grow safely.

Description

The external-burning hydrogen-oxygen synthesizes oxidation unit

Technical field

The utility model relates to and is used for semiconductor device, integrated circuit is made preceding operation generates silicon dioxide film on silicon substrate the synthetic oxidation unit of hydrogen-oxygen.

Background technology

Before semiconductor device, integrated circuit are made in the operation, must be on silicon substrate the growthing silica film.General three secondary growths that divide of silicon dioxide, promptly so-called dried, wet, dried technology; It grows ground floor for sending oxygen earlier, carries pure water with oxygen again and grows the second layer, send three layers of oxygen growth regulations at last again; This defective workmanship of carrying pure water with oxygen has: the film quality of silicon dioxide that grows is not good, impurity content is high, can not satisfy the requirement of present device because of the purification difficult of water; Film thickness uniformity is bad, in the sheet, between sheet, batch between uniformity can only reach ± 5-± 10%, this is that modern VLSI technology institute is unacceptable.

In order to address the above problem, once developed the synthetic mode of oxidizing of internal combustion type hydrogen-oxygen.Introduce hydrogen and oxygen simultaneously at quartzy operation pipe afterbody, utilize the focus combustion hydrogen of diffusion furnace burner hearth, synthesize generation water smoke (replacement pure water) in reative cell inside with hydrogen-oxygen, carry out the growth of second layer silicon dioxide film, this is for solving φ 3, and " and the oxidation of the silicon substrate of following size is effective.The film quality of silicon dioxide that grows is good, evenly performance be controlled at ± 5% in, satisfied 3 μ m lines technological requirements at that time; Its shortcoming is because the hydrogen-oxygen building-up process is to finish in airtight high quartz reactor, synthetic beginning, and whether hydrogen is lighted, and situation be can't see also bad detection; Whether long-time synthesizing also is difficult to grasp because of extinguishing unusually, and the easy like this technology that causes is failed, and more dangerous is that meeting occurs because of the hydrogen accumulation, and causes bigger personnel, equipment breakdown.

Technology contents

The purpose of this utility model is, design the synthetic oxidation unit of a kind of external-burning hydrogen-oxygen, it is controlled the synthetic energy of oxidation of hydrogen-oxygen, can grow silicon dioxide mould best in quality, good uniformity safely, to satisfy the technological requirement of modernized large scale integrated circuit production line.

The technical solution of the utility model is, the synthetic oxidation unit of described external-burning hydrogen-oxygen has synthetic chamber, one end in described synthetic chamber is connected with the operation pipe, its design feature is, the other end in described synthetic chamber connects the tubular type oxygen inlet chamber of chewing for the air inlet of band oxygen, be provided with also in this chamber that the hydrogen air inlet of a band connects the tubular type hydrogen inlet chamber chewed and the exhaust outlet of this hydrogen inlet chamber is arranged in described tubular type oxygen inlet chamber, be equipped with the thermocouple that is contained in the shell in the described tubular type hydrogen inlet chamber, ignition furnace is equipped with in the described oxygen inlet chamber outside, in the outside, described synthetic chamber flame sensor is housed.

Below make and further specifying.

Fig. 1 is a kind of practical structures of the present utility model.As shown in Figure 1, the utility model has synthetic chamber 4, one end in described synthetic chamber 4 is communicated with operation pipe 5, its design feature is, the other end in described synthetic chamber 4 is chewed 7 tubular type oxygen inlet chamber 2 for the air inlet of band oxygen connects, being provided with the hydrogen air inlet of a band in this chamber 2 connects and chews 8 tubular type hydrogen inlet chamber 9 and the exhaust outlet 11 of this inlet chamber 9 is arranged in described tubular type oxygen inlet chamber 2, be equipped with the thermocouple 1 that is contained in the shell 10 in the described tubular type hydrogen inlet chamber 9, ignition furnace 3 is equipped with in oxygen inlet chamber 2 outsides, in 4 outsides, synthetic chamber flame sensor 6 is housed.

Design principle of the present utility model is, its key technology is to be arranged on the reative cell outside with hydrogen-oxygen is synthetic, and the advantage of doing like this has: the synthetic heat of emitting of hydrogen-oxygen is not impacted the flat-temperature zone; Can near the close silicon chip of air inlet one end, not form highdensity water vapour zone; Whether hydrogen-oxygen is synthetic is carrying out always, not only can observe, and be to be in to be subjected in the monitor state; Safety and reliability.

As shown in Figure 1, at the tail end of operation pipe 5 synthetic chamber 4 of a special hydrogen-oxygen and ignition furnace 3 (can adopt the resistance-heated furnace of prior art) are set, inlet chamber 2 is all made with pure quartz glass with synthetic chamber 4, and the taper ground is tightly connected.The spy point of thermocouple 1 is arranged near the hydrogen outlet, be used for the hydrogen flashing temperature (the hydrogen ignition point is 585 ℃) of monitored position, have only when this temperature is higher than 600 ℃, hydrogen could import, otherwise self-locking, in 4 bottoms, synthetic chamber, flame sensor 6 is housed, when hydrogen-oxygen is synthetic when carrying out, it collects flare up fire, drive on the display floater green LED bright (otherwise be that red light emitting diodes is bright, omit among the figure), monitoring whether hydrogen is lighted and whether burnt always.Because volume sharply increased when hydrogen-oxygen was synthetic, so can being designed to cylinder, synthetic chamber 4 adds sphere (two ends) formation, it is a kind of explosion-proof type design, its length is based on the globule that the hydrone polymerization forms certain mass and makes level throw motion by hydrogen outlet speed and drop in this chamber, do not enter operation pipe 5, and the water smoke that only allows to be close to molecular state goes to participate in oxidation reaction.

Hydrogen and oxygen import respectively, and the heat that is provided by ignition furnace 3 makes hydrogen reach the flashing temperature burning.Like this, the superheated vapour of generation in hydrogen constantly burns, is sent in the operation pipe 5 equably, does not form along the water vapour a fluid stream of operation pipe 5 axis high-speed cruisings, impacts very little to the flat-temperature zone; Can near the close silicon chip of air inlet one end, not form high density water vapour zone yet.In the oxidation technology of carrying out more than 1000 ℃ commonly used, reach in the uniformity sheet of thickness ± 1%, between sheet, batch between reach ± 2%; Best Times reaches ± 0.7%, between sheet, batch between reach ± 1.5%, do not produce the thick film spot of getting as the sort of globule in the pure water oxidation.The more important thing is, when carrying out oxidation for 800-1000 ℃, the silicon dioxide film that grows, uniformity reaches ± and 3%.And this low temperature oxidation technology often will be used in the modern just VLSI technology.

As known from the above, the utility model is the synthetic oxidation unit of external-burning hydrogen-oxygen, it carries out the synthetic energy of oxidation of hydrogen-oxygen under control, can grow silicon dioxide film best in quality, good uniformity safely, satisfies the technological requirement of modernized large scale integrated circuit production line thus.

Description of drawings

Fig. 1 is a kind of practical structures of the present utility model.In the drawings:

The 1-thermocouple, 5-operation pipe,

2-tubular type oxygen inlet chamber, the 6-flame sensor,

The 3-ignition furnace, the air inlet of 7-oxygen connects chews,

4-synthesizes the chamber, and the air inlet of 8-hydrogen connects chews,

9-tubular type hydrogen inlet chamber, the 11-exhaust outlet.

The 10-shell,

Embodiment

The utility model device according to accompanying drawing and said structure, inlet chamber 2 and synthetic chamber 4 usefulness pure quartz glasses are made, the main body in synthetic chamber 4 is a cylindricality and two ends are sphere, and ignition furnace 3 adopts existing resistance-heated furnace technology, and thermocouple 1 and transducer 6 also adopt the commercially available prod.In the actual production, should control the reaction ratio of hydrogen and oxygen, press H ₂: O ₂=1.8 is the air feed ratio upper limit, and the super upper limit can't be supplied gas or be cut off hydrogen automatically, and control hydrogen ignition temperature is not less than 600 ℃, guarantees to import hydrogen and lights; Transducer 6 is set monitors after hydrogen is lighted whether burning, in addition, add stainless steel cage, establish stainless steel door always at reative cell import position at 4 positions, synthetic chamber; At the cabinet top, source at synthetic 4 places, chamber dress hydrogen alarm, with the fail safe that guarantees to produce.

Claims

1, a kind of external-burning hydrogen-oxygen synthesizes oxidation unit, synthetic chamber (4) is arranged, one end in described synthetic chamber (4) is communicated with operation pipe (5), it is characterized in that, the other end in described synthetic chamber (4) connects the tubular type oxygen inlet chamber (2) of chewing (7) for the air inlet of band oxygen, be provided with in this chamber (2) that the hydrogen air inlet of a band connects the tubular type hydrogen inlet chamber (9) of chewing (8) and the exhaust outlet (11) of this inlet chamber (9) is arranged in described tubular type oxygen inlet chamber (2), be equipped with the thermocouple (1) that is contained in the shell (10) in the described tubular type hydrogen inlet chamber (9), ignition furnace (3) is equipped with in oxygen inlet chamber (2) outside, in the outside, synthetic chamber (4) flame sensor (6) is housed.