CN221116327U - Constant adjustable tension control mechanism of IC lead frame seamless exposure machine - Google Patents
Constant adjustable tension control mechanism of IC lead frame seamless exposure machine Download PDFInfo
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- CN221116327U CN221116327U CN202322856175.XU CN202322856175U CN221116327U CN 221116327 U CN221116327 U CN 221116327U CN 202322856175 U CN202322856175 U CN 202322856175U CN 221116327 U CN221116327 U CN 221116327U
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- control mechanism
- exposure machine
- guide rod
- tension control
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- 238000003754 machining Methods 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 26
- 229910052802 copper Inorganic materials 0.000 abstract description 26
- 239000010949 copper Substances 0.000 abstract description 26
- 238000004804 winding Methods 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 2
- 238000005530 etching Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 230000001174 ascending effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
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Abstract
The utility model discloses a constant adjustable tension control mechanism of an Integrated Circuit (IC) lead frame seamless exposure machine, which comprises a processing platform, a first large roller and a second guide rod, wherein the top of the processing platform is fixedly connected with two groups of support plates, the first large roller is rotationally connected between the two groups of support plates, the outer side surface of the top of each group of support plates is rotationally connected with two groups of belt pulleys, the outer side surface of each support plate is provided with the first guide rod at the bottom of each belt pulley, the two groups of second large rollers are rotationally used for providing motion support for a copper strip, the copper strip can be pulled to move when the two groups of second large rollers are rotationally, constant tension can be provided for materials through the dead weight of the first large roller, and when the tension of the copper strip needs to be adjusted, the sliding block can be used for driving the first large roller to move up and down to adjust the tension of the copper strip, so that the problem of winding looseness is avoided when the copper strip is moved and wound.
Description
Technical Field
The utility model belongs to the technical field of IC lead frames, and particularly relates to a constant and adjustable tension control mechanism of an IC lead frame seamless exposure machine.
Background
The IC lead frame photoetching machine is one of key equipment in the manufacturing process of a circuit board, and exposure is required to be carried out on a dry film of a lead frame before etching copper strips so as to facilitate etching of a required circuit on the lead frame by etching liquid.
Currently, when an IC lead frame photoetching machine exposes a copper strip through an exposure machine, the copper strip is generally pulled by a winding roller and guided by the winding roller, two groups of guiding rollers are arranged, the copper strip penetrates through between the two groups of guiding rollers, the winding roller pulls the copper strip, the surface of the copper strip is flattened through the two groups of guiding rollers, and the exposure effect is avoided.
Disclosure of utility model
The utility model aims to provide a constant and adjustable tension control mechanism of an IC lead frame seamless exposure machine, so as to solve the problems in the background technology.
In order to achieve the above purpose, the present utility model provides the following technical solutions: a constant adjustable tension control mechanism for an IC leadframe seamless exposure machine, comprising:
The top of the processing platform is fixedly connected with two groups of support plates;
The first large idler wheels are rotationally connected between two groups of support plates, the outer side face of the top of each group of support plates is rotationally connected with two groups of belt pulleys, the outer side face of each support plate and the bottom of each belt pulley are provided with first guide rods, and sliding blocks are sleeved on the surfaces of the first guide rods in a sliding manner;
The second guide rod is arranged on one side of the first guide rod, connecting blocks are sleeved on the surfaces of the second guide rod in a sliding mode, belts are arranged on the surfaces of the connecting blocks, and the belts are connected to the surfaces of the two groups of belt pulleys in a driving mode and are connected with the sliding blocks in a rolling mode.
Preferably, the spring is sleeved on the lower surface of the first guide rod, the round block is sleeved on the surface of the first guide rod in a sliding manner, and two ends of the spring are fixedly connected with the round block and the short plate at the bottom of the first guide rod respectively.
Preferably, a connecting rod is fixedly connected between the two groups of connecting blocks, and the connecting rod can drive the other group of connecting blocks to move along when one group of connecting blocks is manually moved.
Preferably, the two ends of the first large roller are respectively connected with the two groups of sliding blocks in a rotating way, the surface of the supporting plate is positioned on the two sides of the first large roller, the second large roller is connected with the two sides of the first large roller in a rotating way, and the copper strip is guided to move through the rotation of the second large roller.
Preferably, a plurality of connecting rods are fixedly connected between the two groups of supporting plates.
Compared with the prior art, the utility model has the beneficial effects that:
(1) The two groups of second large rollers rotate to provide motion support for the copper strip, the two groups of second large rollers rotate and can pull the copper strip to move, constant tension can be provided for materials through the dead weight of the first large rollers, when the tension of the copper strip needs to be adjusted, the sliding block moves up and down on the surface of the first guide rod to drive the first large rollers to move up and down, the tension of the copper strip can be adjusted, and the problem that winding is loose when the copper strip moves and winds is avoided.
(2) The connecting strength between the two groups of support plates can be enhanced through the plurality of connecting rods fixedly connected between the two groups of support plates, so that the copper strip winding and processing process is more stable.
Drawings
FIG. 1 is a schematic diagram of the structure of the present utility model;
Fig. 2 is a top view of the present utility model.
In the figure: 1. a processing platform; 2. a support plate; 3. a first large roller; 4. a belt pulley; 5. a first guide bar; 6. a sliding block; 7. a second guide bar; 8. a connecting block; 9. a belt; 10. a spring; 11. round blocks; 12. a connecting rod; 13. a second large roller; 14. and (5) connecting a rod.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
The utility model provides a constant adjustable tension control mechanism of an IC lead frame seamless exposure machine, as shown in figures 1-2, comprising:
The machining platform 1 is characterized in that the top of the machining platform 1 is fixedly connected with two groups of support plates 2;
The first large idler wheels 3 are rotatably connected between two groups of support plates 2, the outer side face of the top of each group of support plates 2 is rotatably connected with two groups of belt pulleys 4, the outer side face of each support plate 2 and the bottom of each belt pulley 4 are provided with first guide rods 5, and sliding blocks 6 are sleeved on the surfaces of the first guide rods 5 in a sliding mode;
the second guide rod 7, first guide rod 5 one side is located to the second guide rod 7, connecting block 8 has all been cup jointed in the slip of second guide rod 7 surface, connecting block 8 surface is equipped with belt 9, belt 9 transmission is connected in two sets of belt pulley 4 surfaces and is connected with sliding block 6 roll, drives belt 9 and removes when removing through connecting block 8, and belt 9 passes through the transmission with belt pulley 4 surface, can drive belt pulley 4 rotation when belt 9 removes, provides a fulcrum for belt 9 and makes belt 9 drive sliding block 6 and remove.
The spring 10 has been cup jointed on the lower surface of first guide bar 5, the round block 11 has been cup jointed in the slip of first guide bar 5 surface, the both ends of spring 10 respectively with the short board fixed connection of round block 11 and first guide bar 5 bottom, the bottom of sliding block 6 slides to first guide bar 5 bottom to with round block 11 contact, round block 11 can compress spring 10 downwards.
Connecting rods 12 are fixedly connected between the two groups of connecting blocks 8, and the connecting rods 12 can drive the other group of connecting blocks 8 to move along when one group of connecting blocks 8 are manually moved.
The two ends of the first large roller 3 are respectively connected with the two groups of sliding blocks 6 in a rotating way, and the surface of the supporting plate 2 is positioned on the two sides of the first large roller 3 and is connected with a second large roller 13 in a rotating way.
A plurality of connecting rods 14 are fixedly connected between the two groups of support plates 2, and the connecting strength between the two groups of support plates 2 can be enhanced through the plurality of connecting rods 14 fixedly connected between the two groups of support plates 2, so that the copper strip winding and processing process is more stable.
The constant adjustable tension control mechanism of the IC lead frame seamless exposure machine comprises a processing platform 1, wherein two groups of support plates 2 are fixedly connected to the top of the processing platform 1, copper strips pass through the bottom of a first large roller 3 from the surface of a group of second large rollers 13 and then are fixed with the other group of second large rollers 13, the second large rollers 13 are driven to rotate through an external motor to guide the copper strips to move, when the copper strips can be provided with constant tension by the dead weight of the first large rollers 3, the bottom of a sliding block 6 slides towards the bottom of a first guide rod 5 and contacts with a round block 11, and the round block 11 downwards compresses a spring 10 to enable the first large rollers 3 to provide tension for the copper strips through the dead weight;
When the tension of the copper strip needs to be adjusted, the connecting block 8 on the second guide rod 7 is adjusted up and down, the connecting block 8 drives the belt 9 to move, the sliding block 6 on the first guide rod 5 can be driven to descend through the belt 9 when the connecting block 8 ascends, and the sliding block 6 on the first guide rod 5 can be driven to ascend through the belt 9 when the connecting block 8 descends, so that the tension of the copper strip is adjusted by descending or ascending the first large idler wheel 3, and the phenomenon that the copper strip loosens in the winding process is avoided.
Finally, it should be noted that: the foregoing description is only illustrative of the preferred embodiments of the present utility model, and although the present utility model has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described, or equivalents may be substituted for elements thereof, and any modifications, equivalents, improvements or changes may be made without departing from the spirit and principles of the present utility model.
Claims (5)
1. A constant adjustable tension control mechanism for an IC leadframe seamless exposure machine, comprising:
The machining device comprises a machining platform (1), wherein two groups of support plates (2) are fixedly connected to the top of the machining platform (1);
The large first idler wheels (3), the large first idler wheels (3) are rotationally connected between two groups of support plates (2), the outer side face of the top of each group of support plates (2) is rotationally connected with two groups of belt pulleys (4), the outer side face of each support plate (2) and the bottom of each belt pulley (4) are provided with a first guide rod (5), and sliding blocks (6) are sleeved on the surfaces of the first guide rods (5) in a sliding mode;
The second guide rod (7), first guide rod (5) one side is located to second guide rod (7), connecting block (8) have all been cup jointed in the slip of second guide rod (7) surface, connecting block (8) surface is equipped with belt (9), belt (9) transmission is connected in two sets of belt pulley (4) surfaces and is connected with sliding block (6) roll.
2. The constant adjustable tension control mechanism of an IC leadframe seamless exposure machine of claim 1, wherein: the spring (10) has been cup jointed on first guide bar (5) lower part surface, circle piece (11) has been cup jointed in first guide bar (5) surface slip, the both ends of spring (10) respectively with circle piece (11) and the short board fixed connection of first guide bar (5) bottom.
3. The constant adjustable tension control mechanism of an IC leadframe seamless exposure machine of claim 1, wherein: a connecting rod (12) is fixedly connected between the two groups of connecting blocks (8).
4. The constant adjustable tension control mechanism of an IC leadframe seamless exposure machine of claim 1, wherein: the two ends of the first large roller (3) are respectively connected with the two groups of sliding blocks (6) in a rotating way, and the surfaces of the supporting plates (2) are positioned on the two sides of the first large roller (3) in a rotating way and are connected with the second large roller (13).
5. The constant adjustable tension control mechanism of an IC leadframe seamless exposure machine of claim 1, wherein: a plurality of connecting rods (14) are fixedly connected between the two groups of supporting plates (2).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202322856175.XU CN221116327U (en) | 2023-10-24 | 2023-10-24 | Constant adjustable tension control mechanism of IC lead frame seamless exposure machine |
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CN202322856175.XU CN221116327U (en) | 2023-10-24 | 2023-10-24 | Constant adjustable tension control mechanism of IC lead frame seamless exposure machine |
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Publication Number | Publication Date |
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CN221116327U true CN221116327U (en) | 2024-06-11 |
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CN202322856175.XU Active CN221116327U (en) | 2023-10-24 | 2023-10-24 | Constant adjustable tension control mechanism of IC lead frame seamless exposure machine |
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2023
- 2023-10-24 CN CN202322856175.XU patent/CN221116327U/en active Active
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