CN220709542U

CN220709542U - Parallel light source control mechanism of Integrated Circuit (IC) lead frame seamless exposure machine

Info

Publication number: CN220709542U
Application number: CN202322513190.4U
Authority: CN
Inventors: 刘保华; 徐小龙; 管燕彬
Original assignee: Kunshan Jiangaoyuan Automation Technology Co ltd
Current assignee: Kunshan Jiangaoyuan Automation Technology Co ltd
Priority date: 2023-09-15
Filing date: 2023-09-15
Publication date: 2024-04-02
Anticipated expiration: 2033-09-15

Abstract

The utility model discloses a parallel light source control mechanism of an Integrated Circuit (IC) lead frame seamless exposure machine, which comprises a support, a fixed plate and a rotary adjusting component, wherein an upper group of projection light sources and a lower group of projection light sources are arranged on the support, the fixed plate is provided with two groups of projection light sources and is connected inside the support, the fixed plate is rotationally connected with a parallel light mirror, two groups of exposure glass platforms are arranged between the two groups of the parallel light mirrors and are connected with the support, the rotary adjusting component is connected between the support and the parallel light mirror and is used for adjusting the angle of the parallel light mirror, the light emitted by the projection light sources is reflected through a reflector and the parallel light mirror, the exposure range of the projection light sources is increased, the exposure effect is improved, the angle of the parallel light mirror can be changed by using the rotary adjusting component, the light irradiated onto the exposure glass platforms can be adjusted, the irradiation direction of the projection light sources can be adjusted by screwing a first nut and a second nut, the operation is simple, and the debugging efficiency is improved.

Description

Parallel light source control mechanism of Integrated Circuit (IC) lead frame seamless exposure machine

Technical Field

The utility model relates to the technical field of exposure machines, in particular to a parallel light source control mechanism of an Integrated Circuit (IC) lead frame seamless exposure machine.

Background

With the development of electronic technology, circuit boards (PCBs and FPCs) are increasingly used, and the technical requirements for processing and manufacturing the circuit boards are increasing. The exposure of the surface of the circuit board to ink is an important step in the circuit board manufacturing process, which determines the final quality of the circuit board. The light source mechanism of the traditional exposure machine basically adopts mercury lamps as light sources and adopts a single light source mode, the light sources adjust light rays such as fly eye lenses and the like through a certain adjusting mechanism, then the light rays pass through a plane mirror in intermediate transition, one path of the light rays are reflected to one mirror to irradiate the exposure position, and the other path of the light rays pass through the plane mirror to irradiate the other mirror to reflect to the exposure position.

However, the conventional light source arrangement manner has a major disadvantage that, firstly, the energy of the single light source is not enough, the energy is attenuated after passing through the transition of the plane mirror, and the energy is attenuated again after passing through reflection and reflection for a longer distance, so that the illumination energy finally reaching the exposure position is obviously reduced, the exposure efficiency is low, and a longer time is required for completing one exposure, for example, the exposure time for completing one frame is generally more than 15 seconds.

The exposure machine that still adopts two LED parallel light sources to expose, this just requires the installation of two LED parallel light sources more accurate, and the angle of illumination is difficult for appearing the mistake, and ordinary two LED parallel light source mechanisms can't adjust, leads to the irradiation scope of light source very single, has restricted the result of use of exposure machine, makes the function singleness of exposure machine.

Disclosure of Invention

The utility model aims to provide a parallel light source control mechanism of an IC lead frame seamless exposure machine, which solves the problems in the background technology.

In order to achieve the above purpose, the present utility model provides the following technical solutions: the parallel light source control mechanism of the IC lead frame seamless exposure machine comprises a bracket, wherein an upper group of projection light sources and a lower group of projection light sources are arranged on the bracket, a lens bracket is arranged between the two groups of projection light sources, two reflectors are arranged on the lens bracket and are obliquely arranged, and light rays are ensured to be smoothly reflected onto the parallel light reflectors;

the fixing plate is provided with two groups and is connected inside the bracket, parallel light mirrors are rotationally connected to the fixing plate, two groups of exposure glass platforms are arranged between the two groups of parallel light mirrors, and the two groups of exposure glass platforms are connected with the bracket;

the fixing plate supports the parallel light mirror, so that the stability of the parallel light mirror after position adjustment is ensured, and the stability of exposure is further improved;

and the rotation adjusting assembly is connected between the bracket and the parallel light mirror and used for adjusting the angle of the parallel light mirror so as to ensure that light rays are irradiated on the exposure glass platform in parallel.

Further, the rotation adjusting assembly comprises a threaded rod, the upper end and the lower end of the threaded rod are both in threaded connection with a first nut and a second nut, the threaded rod is sleeved with a first right angle plate, the first right angle plate is positioned between the first nut and the second nut, the surface of the first right angle plate is rotationally connected with a second right angle plate, and the second right angle plate is fixedly connected with the bracket;

can press from both sides tightly fixedly to first right angle plate through first nut and second nut, twist the angle that first right angle plate can adjust the parallel mirror, and keep parallel mirror's stability, easy operation, and not fragile.

Further, the jack is all equipped with on first right angle plate and second right angle plate surface, the inside pin that inserts of jack, the pin makes first right angle plate and second right angle plate laminating be in the same place to make first right angle plate and second right angle plate can rotate relatively.

Compared with the prior art, the utility model has the beneficial effects that:

(1) The light that sends the projection light source is reflected through reflector and parallel mirror, increases the exposure scope of projection light source to improve exposure effect, use the angle that rotation adjusting part can change parallel mirror, make the light that shines on the exposure glass platform can adjust, help adjusting projection light source's irradiation direction, screw up first nut and second nut and can adjust, easy operation has improved debugging efficiency.

(2) The two exposure glass platforms are irradiated by the upper and lower groups of projection light sources, so that the illumination intensity of the two exposure glass platforms is ensured to be uniform, the two surfaces of the circuit board are exposed identically, the exposure error is reduced, and the exposure stability and reliability are ensured.

Drawings

FIG. 1 is a schematic view of the overall structure of the present utility model;

FIG. 2 is a top view of the present utility model;

fig. 3 is a schematic structural view of the rotation adjusting assembly of the present utility model.

In the figure: 1. a fixed bottom plate; 2. a projection light source; 3. a reflective mirror; 4. a frame; 5. a parallel light mirror; 6. a fixing plate; 7. a rotation adjustment assembly; 8. exposing the glass platform; 9. a bracket; 10. an assembly seat; 11. a threaded rod; 12. a first nut; 13. a second nut; 14. a first right angle plate; 15. a pin; 16. and a second right angle plate.

Detailed Description

The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

Examples:

referring to fig. 1-3, the present utility model provides a technical solution: the parallel light source control mechanism of the IC lead frame seamless exposure machine comprises a bracket 9, wherein an upper group of projection light sources 2 and a lower group of projection light sources 2 are arranged on the bracket 9, a lens frame 4 is arranged between the two groups of projection light sources 2, and two reflectors 3 are arranged on the lens frame 4;

the support 9 is arranged in the exposure machine, the support 9 is parallel to the exposure machine, and the projection light source 2 provides a light source when the exposure machine exposes light;

the fixing plate 6 is provided with two groups and is connected inside the bracket 9, the fixing plate 6 is rotationally connected with the parallel mirrors 5, two groups of exposure glass platforms 8 are arranged between the two groups of parallel mirrors 5, the two groups of exposure glass platforms 8 are connected with the bracket 9, and the two groups of exposure glass platforms 8 are kept horizontal, so that light reflected by the parallel mirrors 5 is ensured to face the exposure glass platforms 8;

and the rotation adjusting assembly 7 is connected between the bracket 9 and the parallel light mirror 5, and is used for adjusting the angle of the parallel light mirror 5, adjusting the upper and lower parallel light mirrors 5 to a reasonable reflection angle and providing secondary reflection for the emitted light.

Specifically, as shown in fig. 1, the surface of the projection light source 2 is connected with a fixing base plate 1, the fixing base plate 1 is fixedly connected with a bracket 9, the fixing base plate 1 connects the projection light source 2 with the bracket 9, and the upper and lower groups of projection light sources 2 are arranged symmetrically up and down, so that the illumination stability of the projection light source 2 is improved.

In this embodiment, as shown in fig. 2, the surface of the fixing plate 6 is rotatably connected with an assembling seat 10, the assembling seat 10 is fixedly connected with the parallel mirror 5, and the parallel mirror 5 rotates along the fixing plate 6 with the assembling seat 10 as a fulcrum, so that the reflection angle of the parallel mirror 5 can be adjusted.

In this embodiment, as shown in fig. 3, the rotation adjusting component 7 includes a threaded rod 11, the upper end and the lower end of the threaded rod 11 are both screwed with a first nut 12 and a second nut 13, the threaded rod 11 is sleeved with a first right angle plate 14, the first right angle plate 14 is located between the first nut 12 and the second nut 13, the surface of the first right angle plate 14 is rotationally connected with a second right angle plate 16, the second right angle plate 16 is fixedly connected with the bracket 9, and the amplitude of the threaded rod 11 passing through the first nut 12 and the second nut 13 can be adjusted by screwing the first nut 12 and the second nut 13, so that the angle of the collimator 5 is changed.

In this embodiment, as shown in fig. 3, the surfaces of the first right angle plate 14 and the second right angle plate 16 are provided with insertion holes, and the pins 15 are inserted into the insertion holes, so that the first right angle plate 14 and the second right angle plate 16 are tightly attached together by the pins 15, and the first right angle plate 14 and the second right angle plate 16 are not loosened after being connected together.

Specifically, when in use, the projection light source 2 emits light, the light irradiates the surface of the reflector 3, the light irradiates the surface of the parallel mirror 5 after being reflected by the reflector 3, the irradiation path of the light is shown by an arrow in fig. 1, the light irradiates the exposure glass platform 8 vertically after being reflected by the parallel mirror 5, and the irradiation range of the light is enlarged after being reflected twice, so that the exposure of the exposure machine is realized;

when the angle of the parallel light mirror 5 is adjusted, the first nut 12 is screwed firstly, then the second nut 13 is screwed, the distance between the first right angle plate 14 and the first nut 12 and the second nut 13 is adjusted, the first right angle plate 14 is clamped again by the first nut 12 and the second nut which are screwed down afterwards, and the first right angle plate 14 and the second right angle plate 16 are connected in a rotating way, so that after the threaded rod 11 is adjusted, the threaded rod 11 can drive the parallel light mirror 5 to rotate, and the angle adjustment of the parallel light mirror 5 is realized.

Although embodiments of the present utility model have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the utility model, the scope of which is defined in the appended claims and their equivalents.

Claims

1. A parallel light source control mechanism of an IC leadframe seamless exposure machine, comprising:

the device comprises a bracket (9), wherein an upper group of projection light sources (2) and a lower group of projection light sources (2) are arranged on the bracket (9), a lens bracket (4) is arranged between the two groups of projection light sources (2), and two reflectors (3) are arranged on the lens bracket (4);

the fixing plate (6), the fixing plate (6) is provided with two groups and is connected inside the bracket (9), the parallel mirrors (5) are rotationally connected on the fixing plate (6), two groups of exposure glass platforms (8) are arranged between the two groups of parallel mirrors (5), and the two groups of exposure glass platforms (8) are connected with the bracket (9);

and the rotation adjusting assembly (7) is connected between the bracket (9) and the parallel mirror (5) and is used for adjusting the angle of the parallel mirror (5).

2. The parallel light source control mechanism of an IC leadframe seamless exposure machine according to claim 1, wherein: the surface of the projection light source (2) is connected with a fixed bottom plate (1), and the fixed bottom plate (1) is fixedly connected with a bracket (9).

3. The parallel light source control mechanism of an IC leadframe seamless exposure machine according to claim 1, wherein: the surface of the fixed plate (6) is rotationally connected with an assembly seat (10), and the assembly seat (10) is fixedly connected with the parallel light mirror (5).

4. The parallel light source control mechanism of an IC leadframe seamless exposure machine according to claim 1, wherein: the rotary adjusting assembly (7) comprises a threaded rod (11), a first nut (12) and a second nut (13) are respectively screwed at the upper end and the lower end of the threaded rod (11), a first right angle plate (14) is sleeved on the threaded rod (11), the first right angle plate (14) is located between the first nut (12) and the second nut (13), a second right angle plate (16) is connected to the surface of the first right angle plate (14) in a rotating mode, and the second right angle plate (16) is fixedly connected with the support (9).

5. The parallel light source control mechanism of an IC leadframe seamless exposure machine of claim 4, wherein: the surfaces of the first right angle plate (14) and the second right angle plate (16) are respectively provided with a jack, and pins (15) are inserted into the jacks.