CN220553441U - Packaging structure of power chip - Google Patents

Packaging structure of power chip Download PDF

Info

Publication number
CN220553441U
CN220553441U CN202322193779.0U CN202322193779U CN220553441U CN 220553441 U CN220553441 U CN 220553441U CN 202322193779 U CN202322193779 U CN 202322193779U CN 220553441 U CN220553441 U CN 220553441U
Authority
CN
China
Prior art keywords
copper
metal layer
power chip
ubm
utility
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202322193779.0U
Other languages
Chinese (zh)
Inventor
陈义
洪涛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuxi Xindong Semiconductor Technology Co ltd
Original Assignee
Wuxi Xindong Semiconductor Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wuxi Xindong Semiconductor Technology Co ltd filed Critical Wuxi Xindong Semiconductor Technology Co ltd
Priority to CN202322193779.0U priority Critical patent/CN220553441U/en
Application granted granted Critical
Publication of CN220553441U publication Critical patent/CN220553441U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Wire Bonding (AREA)

Abstract

The utility model discloses a packaging structure of a power chip, which comprises the power chip, wherein a top metal layer is arranged on a wafer of the power chip, a UBM metal layer is deposited on the top metal layer, a copper column is arranged on the UBM metal layer, and a copper bonding wire or a copper clamp is bonded on the top surface of the copper column. According to the utility model, the UBM metal layer is arranged on the top metal layer, the copper column is arranged on the UBM layer, and the copper bonding wires are bound on the copper column, so that the problems in the prior art can be solved, the damage to the power chip is reduced, the binding yield is improved, the copper column is favorable for reducing the dynamic thermal impedance of the package, the current sharing performance is better, the heat conduction is faster, and the temperature difference of a single chip is smaller; the problem of fatigue of the welding points of the aluminum welding lines in the prior art is avoided, and the reliability and consistency are greatly improved; compared with the scheme of binding copper bonding wires on the DTS in the prior art, electromigration of copper columns cannot occur, and reliability and consistency are greatly improved; the sealing process of the utility model greatly reduces the difficulty and the cost in the aspects of equipment, process, materials and the like.

Description

Packaging structure of power chip
Technical Field
The utility model relates to the technical field of power modules, in particular to a packaging structure of a power chip.
Background
In the current power module or power device package structure, as shown in fig. 2, most of the package structure is bonded by aluminum wires/aluminum strips or copper wires or soldered by copper clips. Because Al pad is softer, binding a blister copper wire is easy to damage a chip, so that the Al pad is bound with an aluminum wire or an aluminum belt or an aluminum-clad copper wire, and because the resistivity of aluminum is larger, the current carrying capacity of the aluminum binding wire is not better than that of the copper binding wire, and the application of the aluminum binding wire in high current density is limited. In addition, the bonding of aluminum bond wires to Al pads is prone to solder joint fatigue at power cycling (seconds), resulting in reliability problems.
In response to the problems associated with the structure of FIG. 2, some manufacturers (e.g., heraeus et al) have proposed hot press sintering DTS (a copper foil and sintered silver structure) on power chips, as shown in FIG. 3, followed by roughening copper wires (5-20 mils). But face the following technical problems: 1. the hot-pressed sintering DTS process is immature, and DTS is easy to fall off or deviate during sintering, so that the yield is reduced; 2. the Pad with smaller size such as Gate and the like can not sinter DTS and bind copper wires, and is still bound by aluminum wires, so that the reliability problem exists; 3. the DTS size is generally smaller than the Al pad size, and sintered silver at the edge of the DTS after sintering is not compact enough, so that the effective area of a bonding wire is reduced, the number or the wire diameter of the bonding wire is reduced, and the current carrying capacity is reduced; 4. the sintered silver is subjected to high-temperature high-humidity high-current density for a long time, and electromigration of silver ions between top metal layers can occur, so that leakage or short circuit failure can be caused; 5. the high thermal compression sintering equipment and DTS result in higher packaging costs.
Disclosure of Invention
The utility model aims to: the utility model aims to provide a packaging structure of a power chip so as to solve the problems in the prior art.
The technical scheme is as follows: the utility model discloses a packaging structure of a power chip, which comprises the power chip, wherein a top metal layer is arranged on a wafer of the power chip, a UBM metal layer is deposited on the top metal layer, a copper column is arranged on the UBM metal layer, and a copper bonding wire or a copper clamp is bonded on the top surface of the copper column.
Wherein the top metal layer is one of aluminum, copper, silver and gold, or one of alloys of aluminum, copper, silver and gold.
Wherein the thickness of the copper column is 5-300 microns.
Wherein the diameter of the copper bonding wire is 50-500 micrometers.
The beneficial effects are that: compared with the prior art, the utility model has the following beneficial effects:
1. by arranging the UBM metal layer on the top metal layer and arranging the copper column on the UBM layer, and binding copper bonding wires on the copper column, the problems in the prior art can be solved, the damage to the power chip is reduced, and the binding yield is improved;
2. the copper column is beneficial to reducing the dynamic thermal impedance of the package, has better flow equalization property, faster heat conduction and smaller temperature difference of a single chip;
3. the problem of fatigue of the welding points of the aluminum welding lines in the prior art is avoided, and the reliability and consistency are greatly improved;
4. compared with the scheme of binding copper bonding wires on the DTS in the prior art, electromigration of copper columns cannot occur, and reliability and consistency are greatly improved;
5. compared with the scheme of binding copper wires on DTS in the prior art, the sealing process disclosed by the utility model has the advantages that the difficulty is greatly reduced, and the cost is also greatly reduced in the aspects of equipment, process, materials and the like.
Drawings
FIG. 1 is a schematic diagram of the structure of the present utility model;
FIG. 2 is a schematic diagram of a conventional power module package;
fig. 3 is a schematic structural diagram of a conventional power module package.
Detailed Description
The technical scheme of the utility model is further described below with reference to specific embodiments.
Term interpretation: UBM metal layer: an under bump metal layer is deposited.
Example 1
As shown in fig. 1, the package structure of a power chip of the present utility model includes a power chip 1, a top metal layer 2 is disposed on a wafer of the power chip 1, a UBM metal layer 3 is deposited on the top metal layer 2, a copper pillar 4 is disposed on the UBM metal layer 3, a copper wire 5 is bonded to a top surface of the copper pillar 4, and a diameter of the copper wire 5 is 50-500 micrometers. The top metal layer 2 may be a metal or alloy of aluminum, copper, silver, gold, etc., and the copper pillars 4 have a thickness of 5-300 microns.
The top surface of the copper column 4 can be bonded with a copper clamp to replace the copper bonding wire 5.
Example 2
The top metal layer 2 may be sputter formed on the wafer; the UBM metal layer is a titanium tungsten alloy or copper metal layer formed by sputtering, the thickness is not more than 1 micrometer, and the UBM metal layer has the functions of: as a seed layer for electroplating copper pillars 4. Subsequent unwanted UBM regions may be etched away; the copper pillars 4 are usually electroplated with copper, and the electroplated copper structure can be used as a powerful support for bonding copper bonding wires to prevent the bonding process from damaging the chip. The cost of forming the copper column 4 by electroplating is low, the process is mature, and the modes of chemical plating, sputtering and the like can also be adopted, but the method does not comprise a DTS (Die top system) hot-pressing sintering mode; the copper bonding wires 5 with the diameter of 50-500 microns can bear large current, the process is mature, the reliability is good, and the modes of carrying out laser copper welding clips (clips) on the copper columns 4 and the like are not excluded to replace the copper bonding wires; in addition, the upper surface of the copper column 4 can be plated with an oxidation-resistant layer such as Ag, ni/Au or Ni/Pd/Au, so as to prevent the surface oxidation of the copper column 4 from affecting the bonding quality.
The foregoing is only a preferred embodiment of the present utility model, but the scope of the present utility model is not limited thereto, and any changes or substitutions easily contemplated by those skilled in the art within the technical scope of the present utility model should be included in the scope of the present utility model.

Claims (5)

1. The utility model provides a packaging structure of power chip, includes power chip, its characterized in that: and a top metal layer is arranged on the wafer of the power chip, a UBM metal layer is deposited on the top metal layer, a copper column is arranged on the UBM metal layer, and a copper bonding wire or a copper clamp is bonded on the top surface of the copper column.
2. The package structure of a power chip according to claim 1, wherein: and an oxidation prevention layer is arranged on the upper surface of the copper column.
3. The package structure of a power chip according to claim 1, wherein: the top metal layer is one of aluminum, copper, silver and gold or one of alloys of aluminum, copper, silver and gold.
4. The package structure of a power chip according to claim 1, wherein: the thickness of the copper column is 5-300 microns.
5. The package structure of a power chip according to claim 1, wherein: the diameter of the copper bonding wire is 50-500 microns.
CN202322193779.0U 2023-08-15 2023-08-15 Packaging structure of power chip Active CN220553441U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202322193779.0U CN220553441U (en) 2023-08-15 2023-08-15 Packaging structure of power chip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202322193779.0U CN220553441U (en) 2023-08-15 2023-08-15 Packaging structure of power chip

Publications (1)

Publication Number Publication Date
CN220553441U true CN220553441U (en) 2024-03-01

Family

ID=90009502

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202322193779.0U Active CN220553441U (en) 2023-08-15 2023-08-15 Packaging structure of power chip

Country Status (1)

Country Link
CN (1) CN220553441U (en)

Similar Documents

Publication Publication Date Title
CN100565857C (en) The dual metal stud projection that forms by covered wire that is used for flip-chip
US8409929B2 (en) Forming a semiconductor package including a thermal interface material
US5260234A (en) Method for bonding a lead to a die pad using an electroless plating solution
US8309395B2 (en) Method of fabricating a high-temperature compatible power semiconductor module
US9087827B2 (en) Mixed wire semiconductor lead frame package
CN100440493C (en) Semiconductor integrated circuit device
EP1748480B1 (en) Connection structure for attaching a semiconductor chip to a metal substrate, semiconductor chip and electronic component including the connection structure and methods for producing the connection structure
EP2040289A2 (en) Packaging substrate structure and method for manufacturing the same
CN103811449A (en) Solder ball bump structure and method for forming the same
US7874475B2 (en) Method for the planar joining of components of semiconductor devices and a diffusion joining structure
CN1282645A (en) Nickel alloy film used for reducting the formation of compound between metals in soldering flux
JPH0936186A (en) Power semiconductor module and its mounting method
CN220553441U (en) Packaging structure of power chip
TWI775075B (en) Ceramic substrate assemblies and components with metal thermally conductive bump pads
US20160126216A1 (en) Method of forming an interconnection and arrangement for a direct interconnect chip assembly
US20230126663A1 (en) Layer structure and chip package that includes the layer structure
US8110931B2 (en) Wafer and semiconductor package
CN109590633A (en) Lead welding filler metal and its preparation method and application for integrated antenna package
TWI706857B (en) Ceramic substrate assembly and element with metal thermal conductive bump pads and manufacturing method thereof
EP0470210A1 (en) Low inductance encapsulated package including a semiconductor chip
US20230298982A1 (en) Electronic device with improved board level reliability
US20210118842A1 (en) Method of Forming an Interconnection between an Electric Component and an Electronic Component
CN218101252U (en) Pre-attached solder copper transition piece
CN219642826U (en) Multilayer metal transition piece for high Wen Houmo HIC power supply
TWI224376B (en) Flip-chip bonding process

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant