CN220490906U

CN220490906U - Four-probe resistance measuring instrument

Info

Publication number: CN220490906U
Application number: CN202321729766.4U
Authority: CN
Inventors: 相宇阳; 俞胜武; 陈剑
Original assignee: Wuxi Zhuohai Technology Co ltd
Current assignee: Wuxi Zhuohai Technology Co ltd
Priority date: 2023-07-04
Filing date: 2023-07-04
Publication date: 2024-02-13
Anticipated expiration: 2033-07-04

Abstract

The utility model relates to the technical field of resistance measuring instruments, and provides a four-probe resistance measuring instrument which comprises a supporting platform, a probe arm and a monitoring assembly. The object stage of the supporting platform is connected with the base through the connecting component, the object stage and the base can rotate together, and the connecting component can adjust the inclination angle of the object stage relative to the base; the probe arm and the objective table are arranged at intervals along the first direction, the opposite objective table is positioned at one side opposite to the base, the probe arm is provided with a probe, and the probe can be contacted with a wafer; the monitoring assembly comprises two attitude sensors, one of which is positioned on one side of the probe arm close to the probe and used for monitoring the included angle between the probe and the first direction, and the other of which is fixed at the axial center position of the objective table and used for monitoring the included angle between the objective table and the first direction. By the arrangement, the four-probe resistance measuring instrument can timely find out the abnormal state between the probe and the objective table and adjust the abnormal state.

Description

Four-probe resistance measuring instrument

Technical Field

The utility model relates to the technical field of resistance measuring instruments, in particular to a four-probe resistance measuring instrument.

Background

Ideally, the four-probe resistance measuring instrument is used with the probe arm parallel to the stage so that the distance between the probe and the wafer remains constant, i.e., relatively horizontal, throughout the testing process.

However, in the actual use process, the following two situations occur:

1. before testing, the probe arm and the objective table do not finish leveling work, and are not kept relatively parallel, or when testing is performed, position change occurs between the probe arm and the objective table, so that a preset state that the probe arm and the objective table are parallel to each other is destroyed, and the contact depths of the probe at different positions on the surface of a wafer during measurement are inconsistent, so that the measurement result is influenced.

2. Because the probe arm is in a cantilever structure, the motor drives the probe arm to generate thrust in the up-and-down movement process and when the probe is abutted against the wafer, the probe arm can slightly swing, if the part of the probe arm is loose, the vibration amplitude can be enhanced, and the probe arm repeatedly knocks the wafer with the probe; similarly, if the supporting platform has a loose part, after the wafer is subjected to the abutting force of the probe, the supporting platform can vibrate, so that the probe and the wafer collide more severely.

The two conditions not only affect the accuracy of the test, but also cause a certain degree of loss to the wafer and the probe.

Currently, four-probe resistance measuring instruments on the market mainly control levelness, movement precision and the like through the design of reinforcing mechanical structures. When the equipment is used for a long time, the equipment is basically monitored by adopting a method of periodic spot inspection, and the equipment is inspected when obvious abnormality occurs in the test result. Such a method cannot know the state of the device in real time, and cannot find the device at the first time when a problem occurs, so that the loss is quite huge. Therefore, a four-probe resistance measuring instrument is needed to solve the above technical problems.

Disclosure of Invention

The utility model aims to provide a four-probe resistance measuring instrument which can timely find out and adjust abnormal states between a probe and an objective table.

To achieve the purpose, the utility model adopts the following technical scheme:

a four-probe resistance measuring instrument comprising:

the wafer supporting device comprises a supporting platform, a supporting device and a supporting device, wherein the supporting platform comprises a base and an objective table which are arranged at intervals along a first direction, the base can rotate around an axis of the base, the objective table is used for placing a wafer, the objective table is connected with the base through a connecting component, the objective table can rotate together with the base, and the connecting component can adjust the inclination angle of the objective table relative to the base;

a probe arm which is provided at a distance from the stage in a first direction and is located on a side opposite to the base with respect to the stage, and which is provided with a probe capable of contacting the wafer;

and the monitoring assembly comprises two attitude sensors, one of the two attitude sensors is positioned on one side of the probe arm close to the probe and used for monitoring an included angle between the probe and the first direction, and the other one of the two attitude sensors is fixed at the axial center position of the objective table and used for monitoring an included angle between the objective table and the first direction.

As a preferred technical solution of the four-probe resistance measuring instrument, the connecting assembly includes a plurality of active connecting rods, the plurality of active connecting rods are distributed at intervals around the axis of the base and located on the same circumference, the active connecting rods include a first supporting rod and a second supporting rod, one end of the first supporting rod is movably connected with one end of the second supporting rod, the other end of the first supporting rod is hinged with the objective table ball, and the other end of the second supporting rod is hinged with the base ball.

As a preferable technical scheme of the four-probe resistance measuring instrument, the first supporting rod and the second supporting rod are connected in a sliding manner through a hydraulic device.

As a preferable embodiment of the four-probe resistance measuring instrument, the first support rod is hinged to the second support rod.

As a preferable technical solution of the four-probe resistance measuring apparatus, the connecting assembly further includes a plurality of passive links, the passive links are distributed at intervals around the axis of the base and are located on a same peripheral line as the active links, one end of each of the passive links is ball-hinged with the stage, the other end of each of the passive links is ball-hinged with the base, the active links are mounted on one side of the base, the passive links are mounted on the other side of the base, and the active links and the passive links are in one-to-one correspondence and are symmetrically arranged on the axis of the base.

As a preferable embodiment of the four-probe resistance measuring instrument, the active link and/or the passive link is connected to the base and/or the stage via a knuckle bearing.

As a preferable embodiment of the four-probe resistance measuring instrument, the posture sensor is at least a 9-axis posture sensor.

As a preferable embodiment of the four-probe resistance measuring instrument, a mounting groove is formed in a side of the probe arm facing away from the probe, and the attitude sensor is fixed to the mounting groove.

As a preferable technical scheme of the four-probe resistance measuring instrument, the four-probe resistance measuring instrument further comprises a bracket, wherein the bracket comprises a base frame and a supporting arm, the supporting arm is connected with the base frame in a sliding manner along the first direction, and the probe arm is connected with the supporting arm in a sliding manner along the second direction; the first direction and the second direction are perpendicular to each other.

As a preferable technical scheme of the four-probe resistance measuring instrument, the bracket further comprises a supporting seat, and the base frame is rotatably connected with the supporting seat.

The utility model has the beneficial effects that:

the base can rotate around the axis of the base, the objective table can be driven to rotate with the base through the connecting component, and the end face of the objective table, which is opposite to the base, is provided with a wafer to be tested; along the first direction, the probe arm is arranged opposite to the base opposite to the objective table, so that the probe can be close to the wafer to be tested. Before the leveling work is performed, a worker can obtain the relative position relation between the probe arm and the objective table at the moment by means of the numerical values of the two attitude sensors, and then the leveling work is performed through the debugging connecting assembly; in the testing process, the acceleration change in the first direction is obtained through the attitude sensor, so that vibration of the probe arm and the objective table is known, and the loosening phenomenon of parts of the probe arm and the objective table can be timely found. The staff can also pause the test in time, and test again after debugging the equipment.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the following description will briefly explain the drawings needed in the description of the embodiments of the present utility model, and it is obvious that the drawings in the following description are only some embodiments of the present utility model, and other drawings may be obtained according to the contents of the embodiments of the present utility model and these drawings without inventive effort for those skilled in the art.

FIG. 1 is a schematic diagram of a four-probe resistance measuring instrument according to an embodiment of the present utility model;

fig. 2 is a top view of a four-probe resistance measuring instrument according to an embodiment of the present utility model.

In the figure:

10. a support platform; 11. a base; 12. an objective table; 13. a drive link; 131. a first strut; 132. a second strut; 133. a hydraulic device; 14. a passive link; 15. a knuckle bearing;

20. a probe arm; 21. a probe; 22. a mounting groove;

30. an attitude sensor.

Detailed Description

The utility model is described in further detail below with reference to the drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the utility model and are not limiting thereof. It should be further noted that, for convenience of description, only some, but not all of the structures related to the present utility model are shown in the drawings.

In the description of the present utility model, unless explicitly stated and limited otherwise, the terms "connected," "connected," and "fixed" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present utility model will be understood in specific cases by those of ordinary skill in the art.

In the present utility model, unless expressly stated or limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, as well as the first and second features not being in direct contact but being in contact with each other through additional features therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly under and obliquely below the second feature, or simply means that the first feature is less level than the second feature.

In the description of the present embodiment, the terms "upper", "lower", "right", etc. orientation or positional relationship are based on the orientation or positional relationship shown in the drawings, and are merely for convenience of description and simplicity of operation, and do not indicate or imply that the apparatus or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the utility model. Furthermore, the terms "first," "second," and the like, are used merely for distinguishing between descriptions and not for distinguishing between them.

As shown in fig. 1 and 2, the four-probe resistance measuring instrument includes a support platform 10, a probe arm 20, and a monitoring assembly. The supporting platform 10 comprises a base 11 and an objective table 12 which are arranged at intervals along a first direction, the base 11 can rotate around the axis of the base, the objective table 12 is used for placing a wafer, the objective table 12 is connected with the base 11 through a connecting component, the objective table 12 and the base 11 can rotate together, and the connecting component can adjust the inclination angle of the objective table 12 relative to the base 11; the probe arm 20 and the stage 12 are arranged at intervals along the first direction, and are positioned on the opposite side of the stage 12 to the base 11, the probe arm 20 is provided with a probe 21, and the probe 21 can be contacted with a wafer; the monitoring assembly includes two attitude sensors 30, one of which is located on one side of the probe arm 20 near the probe 21 for monitoring an angle between the probe 21 and the first direction, and the other of which is fixed to the axial position of the stage 12 for monitoring an angle between the stage 12 and the first direction.

Specifically, the base 11 can rotate around the axis thereof, and the objective table 12 can be driven to rotate with the base through the connecting component, and the end surface of the objective table 12 opposite to the base 11 is provided with a wafer to be tested; in the first direction, the probe arm 20 is disposed opposite the stage 12 and opposite the base 11, so that the probe 21 can approach the wafer to be tested.

Ideally, the probe arm 20 is parallel to the stage 12 so that the distance between the probe 21 and the wafer remains constant and relatively horizontal throughout the test.

However, in the actual use process, the following two situations occur:

1. before the test, the probe arm 20 and the stage 12 are not leveled, and are not kept relatively parallel, or when the test is performed, the probe arm 20 and the stage 12 are changed in position, so that the preset parallel state of the probe arm 20 and the stage 12 is destroyed, and the contact depths of the probe 21 at different positions on the wafer surface during the measurement are inconsistent, thereby affecting the measurement result.

2. Because the probe arm 20 is in a cantilever structure, the motor drives the probe arm to generate thrust in the up-and-down movement process and when the probe 21 is abutted against the wafer, the probe arm 20 can slightly swing, if the part of the probe arm 20 is loose, the vibration amplitude can be enhanced, and the probe arm 20 drives the probe 21 to repeatedly strike the wafer; similarly, if the supporting platform 10 has loose parts, after the wafer is contacted by the probe 21, the supporting platform 10 will vibrate, so that the probe 21 collides with the wafer more severely.

Both of these conditions affect the accuracy of the test and cause some loss to both the wafer and the probe 21.

Based on this, in this embodiment, the four-probe resistance measuring apparatus further includes a connection assembly and a monitoring assembly, the monitoring assembly is composed of at least two attitude sensors 30, at least one attitude sensor 30 is installed on each of the probe arm 20 and the stage 12, and the attitude sensor 30 can monitor the object in real time, so as to obtain the position state and the motion state of the object in space at this time. In addition to being able to connect the stage 12 to the base 11 so that both can rotate together, the connection assembly is able to adjust the angle between the base 11 and the stage 12 so that the stage 12 and the probe 21 remain relatively horizontal.

For convenience of description, in the present embodiment, the monitoring assembly includes only two attitude sensors 30, and the probe arm 20 and the stage 12 are respectively mounted with one attitude sensor 30.

Before the leveling work, the staff can obtain the relative position relation between the probe arm 20 and the objective table 12 at the moment by means of the numerical values of the two attitude sensors 30, and then perform the leveling work through the debugging connecting component; in the testing process, the acceleration change in the first direction is obtained through the gesture sensor 30 so as to learn the vibration of the probe arm 20 and the objective table 12, and the loosening phenomenon of parts of the probe arm and the objective table can be timely found. The staff can also pause the test in time, and test again after debugging the equipment.

It should be noted that, the attitude sensor 30 is in the prior art, and the specific structure and the working principle thereof are not described herein.

Further, the four-probe resistance measuring instrument further comprises a controller and an alarm device, wherein the controller is in communication connection with the base 11 of the supporting platform 10, the alarm device, the monitoring assembly and the connecting assembly. The controller is preset with a set value, after receiving and comparing the transmitted information of the two gesture sensors 30, the controller compares the deviation value of the two information with the set value, when the deviation value is smaller than the set value, the probe arm 20 and the objective table 12 are regarded as being horizontal, i.e. the probe 21 is vertical to the end surface of the wafer, and when the deviation value is larger than the set value, the controller controls the connecting component to perform leveling work. When the uploading information of the gesture sensor 30 is reflected in the testing process, the acceleration curve of the monitored object in the first direction has abrupt change, the controller stops the rotation of the base 11 of the supporting platform 10, and starts the alarm device to inform relevant staff to overhaul, and the parts are fastened.

Further, the alarm device comprises two indicator lamps respectively installed on the probe arm 20 and the objective table 12, and the controller clearly and specifically loosens the parts of the probe arm 20 and/or the support platform 10 according to the feedback signals of the two gesture sensors 30, and the corresponding indicator lamps are lightened.

Optionally, the connecting assembly includes a plurality of driving connecting rods 13, the plurality of driving connecting rods 13 are distributed at intervals around the axis of the base 11 and located on the same circumference, the driving connecting rods 13 include a first supporting rod 131 and a second supporting rod 132, one end of the first supporting rod 131 is movably connected with one end of the second supporting rod 132, the other end of the first supporting rod 131 is in ball hinge joint with the objective table 12, and the other end of the second supporting rod 132 is in ball hinge joint with the base 11. Through swing joint between first branch 131 and the second branch 132 to change the interval of two branches one end that is on the back mutually, and then adjust the interval between base 11 and the objective table 12, and a plurality of initiative connecting rod 13 are arranged along circumference, can adjust the contained angle of base 11 and the different directions of objective table 12, and the both ends of initiative connecting rod 13 are articulated with base 11 and objective table 12 ball respectively, increase the degree of freedom, prevent to appear interfering in the debugging process.

Specifically, the first strut 131 and the second strut 132 are slidably connected by a hydraulic device 133. So that first branch 131 and second branch 132 can follow axial relative movement, realize flexible effect.

In other embodiments, the first strut 131 is hinged to the second strut 132. By changing the included angle between the first supporting rod 131 and the second supporting rod 132, the distance between the other ends of the two supporting rods is changed.

Optionally, the connecting assembly further includes a plurality of passive links 14, the passive links 14 are distributed at intervals around the axis of the base 11 and located on the same circumference as the active link 13, one end of each passive link 14 is ball-hinged with the objective table 12, and the other end is ball-hinged with the base 11. The passive connecting rod 14 has supporting and connecting functions between the base 11 and the objective table 12, the passive connecting rod 14 and the active connecting rod 13 are mixed for use, the use of the active connecting rod 13 can be reduced, and the adjustment is convenient.

Further, the plurality of active links 13 are mounted on one side of the base 11, the plurality of passive links 14 are mounted on the other side of the base 11, and the active links 13 and the passive links 14 are symmetrically arranged on the axis of the base 11 in one-to-one correspondence.

Optionally, the active link 13 and/or the passive link 14 are connected to the base 11 and/or the stage 12 via a knuckle bearing 15. So set up, joint bearing 15 has replaced ball articulated sliding friction with rolling friction, has further reduced frictional resistance for the coupling assembling is when carrying out leveling operation, and is more sensitive.

Optionally, a mounting groove 22 is formed on a side of the probe arm 20 facing away from the probe 21, and the attitude sensor 30 is fixed in the mounting groove 22. Firstly, the mass of the end of the probe arm 20 with the probe 21 is reduced by grooving, and furthermore, the attitude sensor 30 is mounted in the mounting groove 22 to provide more directional support for the probe arm 20, so that the attitude sensor 30 is prevented from falling off during the movement of the probe arm 20.

Alternatively, the attitude sensor 30 is at least a 9-axis attitude sensor 30. The use of the attitude sensor 30 with higher accuracy can improve the accuracy of the monitored values.

Optionally, the four-probe resistance measuring instrument further comprises a bracket, wherein the bracket comprises a base frame and a supporting arm, the supporting arm is connected with the base frame in a sliding way along a first direction, and the probe arm 20 is connected with the supporting arm in a sliding way along a second direction; the first direction and the second direction are perpendicular to each other.

Further, the stand also includes a first motor for driving the support arm to move in a first direction relative to the base frame, and a second motor for driving the probe arm 20 to move in a second direction relative to the support frame. The first motor and the second motor are controlled by a controller.

When the probe arm 20 is moved in the second direction relative to the stage 12 or the stage 12 is rotated, the probe arm 20 is required to be positioned at a high position in the first direction relative to the stage 12 to avoid the occurrence of a doctor blade of the probe 21. Thus, after obtaining the acceleration curve of the first direction uploaded by the gesture sensor 30 mounted on the probe arm 20, the controller controls the second motor to start, so that the probe arm 20 moves along the second direction, or starts the base 11, so that the objective table 12 rotates; and after receiving the acceleration profile of the probe arm 20, which is uploaded by the two attitude sensors 30, and completed in the rotational movement of the base 11 in the second direction, the first motor is restarted to lower the probe arm 20 in the first direction, thereby performing the safety interlock.

The support still includes the supporting seat, and the foundation frame rotates with the supporting seat to be connected. So configured, when loading and unloading wafers, the base frame can be rotated so that the probe arm 20 is no longer positioned in the first direction of the stage 12, avoiding interference with the wafers.

Furthermore, the foregoing description of the preferred embodiments and the principles of the utility model is provided herein. It will be understood by those skilled in the art that the present utility model is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the utility model. Therefore, while the utility model has been described in connection with the above embodiments, the utility model is not limited to the embodiments, but may be embodied in many other equivalent forms without departing from the spirit or scope of the utility model, which is set forth in the following claims.

Claims

1. Four probe resistance measuring apparatu, its characterized in that includes:

the wafer supporting device comprises a supporting platform (10), wherein the supporting platform (10) comprises a base (11) and an objective table (12) which are arranged at intervals along a first direction, the base (11) can rotate around an axis of the base, the objective table (12) is used for placing a wafer, the objective table (12) is connected with the base (11) through a connecting component, the objective table (12) and the base (11) can rotate together, and the connecting component can adjust the inclination angle of the objective table (12) relative to the base (11);

a probe arm (20), wherein the probe arm (20) and the objective table (12) are arranged at intervals along a first direction, and are positioned on one side opposite to the base (11) relative to the objective table (12), the probe arm (20) is provided with a probe (21), and the probe (21) can be contacted with the wafer;

the monitoring assembly comprises two attitude sensors (30), one of which is positioned on one side of the probe arm (20) close to the probe (21) and is used for monitoring an included angle between the probe (21) and the first direction, and the other of which is fixed at the axis position of the objective table (12) and is used for monitoring the included angle between the objective table (12) and the first direction.

2. The four-probe resistance measuring instrument according to claim 1, wherein the connecting assembly comprises a plurality of driving connecting rods (13), the driving connecting rods (13) are distributed at intervals around the axis of the base (11) and located on the same circumference, the driving connecting rods (13) comprise a first supporting rod (131) and a second supporting rod (132), one end of the first supporting rod (131) is movably connected with one end of the second supporting rod (132), the other end of the first supporting rod (131) is in ball hinge joint with the objective table (12), and the other end of the second supporting rod (132) is in ball hinge joint with the base (11).

3. The four-probe resistance measuring instrument according to claim 2, characterized in that the first strut (131) and the second strut (132) are slidingly connected by hydraulic means (133).

4. The four-probe resistance measuring instrument according to claim 2, wherein the first strut (131) is hinged to the second strut (132).

5. The four-probe resistance measuring instrument according to claim 2, wherein the connecting assembly further comprises a plurality of passive connecting rods (14), the passive connecting rods (14) are distributed at intervals around the axis of the base (11) and located on the same circumference with the active connecting rods (13), one end of each passive connecting rod (14) is in ball hinge connection with the object stage (12), the other end of each passive connecting rod is in ball hinge connection with the base (11), the active connecting rods (13) are mounted on one side of the base (11), the passive connecting rods (14) are mounted on the other side of the base (11), and the active connecting rods (13) and the passive connecting rods (14) are in one-to-one correspondence and are symmetrically arranged on the axis of the base (11).

6. Four-probe resistance measuring instrument according to claim 5, characterized in that the active link (13) and/or the passive link (14) are connected to the base (11) and/or the stage (12) by means of a knuckle bearing (15).

7. The four-probe resistance measurement instrument according to claim 1, wherein the attitude sensor (30) is at least a 9-axis attitude sensor (30).

8. Four-probe resistance measuring instrument according to any one of claims 1-7, characterized in that the side of the probe arm (20) facing away from the probe (21) is provided with a mounting groove (22), in which mounting groove (22) the attitude sensor (30) is fixed.

9. The four-probe resistance measurement instrument according to any one of claims 1-7, further comprising a stand comprising a base frame and a support arm, the support arm being slidably connected to the base frame in the first direction, the probe arm (20) being slidably connected to the support arm in a second direction; the first direction and the second direction are perpendicular to each other.

10. The four-probe resistance measuring instrument according to claim 9, wherein the bracket further comprises a support base, the base frame being rotatably connected to the support base.