CN220468136U - Gas distribution device and chemical vapor deposition equipment - Google Patents

Gas distribution device and chemical vapor deposition equipment Download PDF

Info

Publication number
CN220468136U
CN220468136U CN202223453619.7U CN202223453619U CN220468136U CN 220468136 U CN220468136 U CN 220468136U CN 202223453619 U CN202223453619 U CN 202223453619U CN 220468136 U CN220468136 U CN 220468136U
Authority
CN
China
Prior art keywords
air
gas
air distribution
distribution
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202223453619.7U
Other languages
Chinese (zh)
Inventor
余仲
赵步举
谭晓华
张海涛
刘顺
杨福满
程培勇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Headquarter SC New Energy Technology Corp
Original Assignee
Shenzhen Headquarter SC New Energy Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen Headquarter SC New Energy Technology Corp filed Critical Shenzhen Headquarter SC New Energy Technology Corp
Priority to CN202223453619.7U priority Critical patent/CN220468136U/en
Application granted granted Critical
Publication of CN220468136U publication Critical patent/CN220468136U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

The utility model discloses a gas distribution device and chemical vapor deposition equipment, wherein the gas distribution device comprises: the air distribution assembly is provided with an air distribution cavity, one side of the air distribution assembly is provided with a plurality of air distribution holes, the other side of the air distribution assembly is provided with a plurality of air inlet holes, the plurality of air distribution holes and the plurality of air inlet holes are communicated with the air distribution cavity, and the plurality of air distribution holes and the plurality of air inlet holes are respectively positioned on two opposite sides of the air distribution assembly; and the air inlet pipe assembly is connected with the air distribution assembly, and is provided with a plurality of air outlets which are communicated with the air inlets in a one-to-one correspondence manner. The gas distribution device can primarily disperse the gas in the gas distribution cavity more uniformly, so that the gas is not concentrated in a certain position of the gas distribution cavity, and then the gas in the gas distribution cavity can be more uniformly diffused into the process cavity of the chemical vapor deposition equipment through a plurality of gas distribution holes, so that the effect of improving the gas distribution uniformity is achieved.

Description

Gas distribution device and chemical vapor deposition equipment
Technical Field
The utility model relates to the technical field of chemical vapor deposition equipment, in particular to a gas distribution device and chemical vapor deposition equipment.
Background
With the continuous development of the photovoltaic industry, the requirements of the solar cell on film uniformity and film thickness errors are continuously improved. Since chemical vapor deposition (HWCVD) is performed by hot wire pyrolysis gas, gas distribution uniformity of the gas can significantly affect film growth uniformity.
In the related art, most of chemical vapor deposition equipment adopts a gas distribution box to distribute gas, wherein a plurality of gas distribution holes are formed in the gas distribution box, and gas is injected into the gas distribution box, so that the gas enters a process cavity of the chemical vapor deposition equipment through the plurality of gas distribution holes to complete gas distribution, but when the gas is injected into the gas distribution box, the uniformity of the gas in the gas distribution box is lower, and the uniformity of the gas entering the process cavity from the gas distribution holes of the gas distribution box is still lower.
Disclosure of Invention
The present utility model aims to solve at least one of the technical problems existing in the prior art. Therefore, the utility model provides the gas distribution device which can improve the gas distribution uniformity.
The utility model also provides chemical vapor deposition equipment with the gas distribution device.
An air distribution device according to an embodiment of the first aspect of the present utility model includes: the air distribution assembly is provided with an air distribution cavity, one side of the air distribution assembly is provided with a plurality of air distribution holes, the other side of the air distribution assembly is provided with a plurality of air inlet holes arranged at intervals, the plurality of air distribution holes and the plurality of air inlet holes are communicated with the air distribution cavity, and the plurality of air distribution holes and the plurality of air inlet holes are respectively positioned on two sides of the air distribution assembly opposite to each other; and the air inlet pipe assembly is connected with the air distribution assembly, and is provided with a plurality of air outlets which are correspondingly communicated with the air inlets one by one.
The air distribution device provided by the embodiment of the utility model has at least the following beneficial effects:
in the gas distribution device, after the gas in the gas inlet pipe assembly is respectively discharged from the plurality of gas outlets, the gas can respectively enter the gas distribution cavity through the plurality of gas inlets, so that the gas can be primarily and uniformly dispersed in the gas distribution cavity without being concentrated at a certain position of the gas distribution cavity, and then the gas in the gas distribution cavity can be more uniformly dispersed into the process cavity of the chemical vapor deposition equipment through the plurality of gas distribution holes, so that the effect of improving the gas distribution uniformity is achieved.
According to some embodiments of the utility model, among the plurality of air intake holes, a middle air intake hole and a plurality of side air intake holes arranged around the middle air intake hole are included;
the air equalizing cavity comprises a middle area and a plurality of side areas distributed on the periphery of the middle area, the middle air inlet is arranged opposite to the middle area, and the side air inlets are arranged opposite to the side areas in a one-to-one correspondence manner.
According to some embodiments of the utility model, the number of the side air inlets is four, and the four side air inlets are arranged in an array.
According to some embodiments of the utility model, the intake pipe assembly comprises an intake main path, and a plurality of intake branches each communicating with the intake main path;
the air outlets comprise a middle air outlet formed in the air inlet main path and a plurality of side air outlets respectively formed in the air inlet branches, wherein the middle air outlet is communicated with the middle air inlet, and the side air outlets are respectively communicated with the side air inlets.
According to some embodiments of the utility model, the number of the air inlet branches is four, the air inlet main path comprises a first connecting node and a second connecting node, wherein two air inlet branches are connected to the first connecting node, the other two air inlet branches are connected to the second connecting node, and the middle air outlet is formed between the first connecting node and the second connecting node.
According to some embodiments of the utility model, a plurality of the air distribution holes are uniformly arranged.
According to some embodiments of the utility model, the air distribution assembly comprises a mounting piece and an air distribution plate, wherein the mounting piece is provided with an inner cavity with an opening, the air distribution plate is covered on the opening, the air inlet hole is formed in the mounting piece, the air distribution hole is formed in the air distribution plate, and the air inlet pipe assembly is mounted on the mounting piece.
According to some embodiments of the utility model, the mounting piece comprises a mounting plate and a bending part bent at the edge of the mounting plate, and the mounting plate and the bending part are matched to form the inner cavity.
A chemical vapor deposition apparatus according to an embodiment of the second aspect of the present utility model includes the gas distribution device as described above.
The chemical vapor deposition equipment provided by the embodiment of the utility model has at least the following beneficial effects:
in the gas distribution device, after the gas in the gas inlet pipe assembly is respectively discharged from the plurality of gas outlets, the gas can be respectively introduced into the gas distribution cavity through the plurality of gas inlets, so that the gas can be primarily and uniformly dispersed in the gas distribution cavity without being concentrated at a certain position of the gas distribution cavity, and then the gas in the gas distribution cavity can be more uniformly dispersed into the process cavity of the chemical vapor deposition device through the plurality of gas distribution holes, so that the effect of improving the gas distribution uniformity is achieved.
According to some embodiments of the utility model, the chemical vapor deposition apparatus further comprises a hot wire and a carrier plate, wherein the gas distribution device, the hot wire and the carrier plate are sequentially arranged side by side, and the gas distribution holes are arranged towards the hot wire and the carrier plate.
Additional aspects and advantages of the utility model will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the utility model.
Drawings
The utility model is further described with reference to the accompanying drawings and examples, in which:
FIG. 1 is a schematic diagram of an air distribution device according to an embodiment of the present utility model;
FIG. 2 is a schematic diagram of an exploded structure of an air distribution device according to an embodiment of the present utility model;
FIG. 3 is a schematic view of an air intake pipe assembly according to an embodiment of the present utility model;
fig. 4 is a schematic structural view of a mounting member according to an embodiment of the present utility model.
Reference numerals:
100. a gas distribution assembly; 101. air holes are distributed; 102. an air inlet hole; 1021. a middle air inlet hole; 1022. a side air inlet; 110. a mounting member; 111. a mounting plate; 112. a bending part; 120. an air distribution plate;
200. an air inlet pipe assembly; 201. an air outlet; 2011. a middle air outlet; 2012. a side air outlet; 202. an air inlet; 210. an air inlet main path; 211. a first connection node; 212. a second connection node; 220. an air inlet branch.
Detailed Description
Embodiments of the present utility model are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are illustrative only and are not to be construed as limiting the utility model.
In the description of the present utility model, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "axial", "radial", "circumferential", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings are merely for convenience in describing the present utility model and to simplify the description, and do not indicate or imply that the device or element being referred to must have a specific orientation, be configured and operated in a specific orientation, and therefore should not be construed as limiting the present utility model. Furthermore, features defining "first", "second" may include one or more such features, either explicitly or implicitly. In the description of the present utility model, unless otherwise indicated, the meaning of "a plurality" is two or more.
In the description of the present utility model, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present utility model will be understood in specific cases by those of ordinary skill in the art.
As shown in fig. 1, the air distribution device according to an embodiment of the present utility model includes an air distribution assembly 100 and an air intake pipe assembly 200.
Referring to fig. 1 and 2, the air distribution assembly 100 is provided with an air distribution cavity, one side of the air distribution assembly 100 is provided with a plurality of air distribution holes 101, the other side of the air distribution assembly 100 is provided with a plurality of air inlet holes 102 arranged at intervals, the plurality of air distribution holes 101 and the plurality of air inlet holes 102 are all communicated with the air distribution cavity, and the plurality of air distribution holes 101 and the plurality of air inlet holes 102 are respectively positioned on two opposite sides of the air distribution assembly 100.
Specifically, the air distribution assembly 100 is a hollow structure with an air distribution cavity, and the air distribution assembly 100 has two opposite sides, the air distribution holes 101 are arranged on one side of the air distribution assembly 100 and are all communicated with the air distribution cavity, the air inlet holes 102 are arranged on the other side of the air distribution assembly 100 and are all communicated with the air distribution cavity, and the air inlet holes 102 and the air distribution holes 101 are respectively positioned on the two opposite sides of the air distribution assembly 100.
The air inlet pipe assembly 200 is connected with the air distribution assembly 100, the air inlet pipe assembly 200 is provided with a plurality of air outlets 201, and the air outlets 201 are communicated with the air inlets 102 in a one-to-one correspondence manner.
Specifically, the gas can enter the gas distribution assembly 100 through the gas inlet pipe assembly 200 and then be discharged from the gas distribution assembly 100. Specifically, the air in the air inlet pipe assembly 200 may be discharged from the plurality of air outlets 201, respectively, and enter the air distribution assembly 100 through the plurality of air inlet holes 102, and then be discharged from the air distribution holes 101.
As shown in fig. 2 and 4, in the gas distribution device of the present utility model, after the gas in the gas inlet pipe assembly 200 is respectively exhausted from the plurality of gas outlets 201, the gas can be respectively introduced into the gas distribution assembly 100 through the plurality of gas inlets 102 arranged at intervals, so that the gas can be primarily and uniformly dispersed in the gas distribution cavity, and the gas is not concentrated in a certain position of the gas distribution cavity, and then the gas in the gas distribution cavity can be more uniformly dispersed into the process cavity of the chemical vapor deposition apparatus through the plurality of gas distribution holes 101, so as to achieve the effect of improving the uniformity of the gas distribution.
As shown in fig. 4, among the plurality of intake holes 102, there are included a center intake hole 1021, and a plurality of side intake holes 1022 provided around the center intake hole 1021.
As shown in fig. 2 and 4, after the air in the air inlet pipe assembly 200 is respectively discharged from the plurality of air outlets 201, the air can enter the air equalizing cavity through the middle air inlet 1021 and the plurality of side air inlet 1022, so that the air can be primarily and uniformly dispersed in the air equalizing cavity, and the air is not concentrated at a certain position of the air equalizing cavity.
Specifically, the air equalizing cavity includes a middle region, and a plurality of side regions distributed around the middle region, wherein the middle air intake holes 1021 are disposed opposite to the middle region, and the plurality of side air intake holes 1022 are disposed opposite to the plurality of side regions in a one-to-one correspondence. Therefore, the gas entering the air-equalizing cavity through the middle air inlet 1021 directly enters the middle area and then diffuses in the air-equalizing cavity, and the gas entering the air-equalizing cavity through the side air inlet 1022 directly enters the side area and then diffuses in the air-equalizing cavity, so that the gas can be primarily and uniformly dispersed in the air-equalizing cavity.
More specifically, the air equalizing cavity comprises a middle area and four side areas which are respectively distributed around the middle area; among the plurality of intake holes 102, there are a middle intake hole 1021 facing the middle region, and four side intake holes 1022 provided around the middle intake hole 1021, the four side intake holes 1022 being provided to face the four side regions one by one.
Wherein, four lateral air inlets 1022 are arranged in an array.
Of course, in other embodiments, the number of the side air inlets 1022 may be four or more, and the side air inlets 1022 may be arranged in a circumferential array or in a rectangular array.
Referring to fig. 2 and 3, in one embodiment, an intake pipe assembly 200 includes an intake main passage 210, and a plurality of intake branches 220 each communicating with the intake main passage 210; the plurality of air outlets 201 include a middle air outlet 2011 formed in the air inlet main path 210, and a plurality of side air outlets 2012 formed in the plurality of air inlet branches 220, wherein the middle air outlet 2011 is communicated with the middle air inlet 1021, and the plurality of side air outlets 2012 are respectively communicated with the plurality of side air inlets 1022.
Specifically, the gas can first enter the main intake path 210 and then enter each of the intake branches 220, where the gas in the main intake path 210 can enter the gas equalizing cavity through the middle intake hole 1021, and the gas in each of the intake branches 220 can enter the gas equalizing cavity through each of the side gas outlets 2012.
More specifically, the air inlet 202 of the air inlet pipe assembly 200 is opened on the air inlet main path 210, and the air enters the air inlet main path 210 through the air inlet 202, and enters each air inlet branch path 220 along with the flow of the air.
In this embodiment, the number of the air inlet branches 220 is four, the air inlet main path 210 includes a first connection node 211 and a second connection node 212, two air inlet branches 220 are connected to the first connection node 211, the other two air inlet branches 220 are connected to the second connection node 212, and a middle air outlet 2011 is formed between the first connection node 211 and the second connection node 212.
In one embodiment, the plurality of air distribution holes 101 are uniformly arranged. In this way, the gas can enter the process chamber of the chemical vapor deposition equipment more uniformly.
Specifically, the number of rows of air distribution holes 101 is multiple, and each row of air distribution holes 101 includes a plurality of air distribution holes 101 that are uniformly and alternately arranged.
Of course, in other embodiments, the arrangement of the gas distribution holes 101 may be changed according to the uniformity of the gas actually entering the process chamber of the chemical vapor deposition apparatus. For example, in the case where a plurality of gas distribution holes 101 are uniformly provided, if the gas concentration in some regions of the process chamber is still large, the gas distribution holes 101 corresponding to the regions are provided more sparsely accordingly.
As shown in fig. 2, in one embodiment, the air distribution assembly 100 includes a mounting member 110 and an air distribution plate 120, wherein the mounting member 110 is formed with an inner cavity having an opening, and the air distribution plate 120 is covered on the opening. Thus, the mounting member 110 cooperates with the air distribution plate 120 to form an air equalizing cavity.
Further, the air inlet hole 102 is formed in the mounting member 110, the air distribution hole 101 is formed in the air distribution plate 120, and the air inlet pipe assembly 200 is mounted on the mounting member 110.
Wherein the gas distribution device can be disposed in a process chamber of the chemical vapor deposition apparatus through the mounting member 110.
Further, the mounting member 110 includes a mounting plate 111, and a bending portion 112 bent at an edge of the mounting plate 111, and the mounting plate 111 and the bending portion 112 cooperate to form an inner cavity.
Specifically, the bending portion 112 is provided at an edge of the mounting plate 111, and the bending portion 112 is formed by bending an edge of the mounting plate 111.
The utility model also relates to chemical vapor deposition equipment which comprises the gas distribution device, wherein the gas distribution device is arranged in a process cavity of the chemical vapor deposition equipment.
In the gas distribution device, after the gas in the gas inlet pipe assembly 200 is respectively discharged from the plurality of gas outlets 201, the gas can be respectively introduced into the gas distribution cavity through the plurality of gas inlets 102, so that the gas can be primarily and uniformly dispersed in the gas distribution cavity without being concentrated at a certain position of the gas distribution cavity, and then the gas in the gas distribution cavity can be more uniformly dispersed into the process cavity of the chemical vapor deposition device through the plurality of gas distribution holes 101, so that the effect of improving the gas distribution uniformity is achieved.
Further, the chemical vapor deposition apparatus further includes a hot filament and a carrier plate, the gas distribution device, the hot filament and the carrier plate are sequentially arranged side by side, and the gas distribution hole 101 is arranged towards the hot filament and the carrier plate. Therefore, the gas from the gas distribution holes 101 can be directly blown towards the hot wires and the carrier plate, so that the uniformity of the gas concentration in the reaction area is effectively improved, and the uniformity of the coating film is effectively improved.
In the description of the present specification, reference to the terms "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the utility model. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
While embodiments of the present utility model have been shown and described, it will be understood by those of ordinary skill in the art that: many changes, modifications, substitutions and variations may be made to the embodiments without departing from the spirit and principles of the utility model, the scope of which is defined by the claims and their equivalents.

Claims (10)

1. An air distribution device, comprising:
the air distribution assembly is provided with an air distribution cavity, one side of the air distribution assembly is provided with a plurality of air distribution holes, the other side of the air distribution assembly is provided with a plurality of air inlets arranged at intervals, the plurality of air distribution holes and the plurality of air inlets are communicated with the air distribution cavity, and the plurality of air distribution holes and the plurality of air inlets are respectively positioned on two sides of the air distribution assembly opposite to each other; and
The air inlet pipe assembly is connected with the air distribution assembly, and is provided with a plurality of air outlets which are correspondingly communicated with the air inlets one by one.
2. The air distribution device according to claim 1, wherein among the plurality of air intake holes, a central air intake hole, and a plurality of side air intake holes provided around the central air intake hole;
the air equalizing cavity comprises a middle area and a plurality of side areas distributed on the periphery of the middle area, the middle air inlet is arranged opposite to the middle area, and the side air inlets are arranged opposite to the side areas in a one-to-one correspondence manner.
3. The air distribution device according to claim 2, wherein the number of the side air inlet holes is four, and the four side air inlet holes are arranged in an array.
4. The air distribution device according to claim 2, wherein the air intake pipe assembly includes an air intake main passage, and a plurality of air intake branches each communicating with the air intake main passage;
the air outlets comprise a middle air outlet formed in the air inlet main path and a plurality of side air outlets respectively formed in the air inlet branches, wherein the middle air outlet is communicated with the middle air inlet, and the side air outlets are respectively communicated with the side air inlets.
5. The air distribution device according to claim 4, wherein the number of the air inlet branches is four, the air inlet main path comprises a first connecting node and a second connecting node, two air inlet branches are connected to the first connecting node, the other two air inlet branches are connected to the second connecting node, and the middle air outlet is formed between the first connecting node and the second connecting node.
6. The air distribution device according to claim 1, wherein a plurality of the air distribution holes are uniformly provided.
7. The air distribution device according to claim 1, wherein the air distribution assembly comprises a mounting piece and an air distribution plate, the mounting piece is formed with an inner cavity with an opening, the air distribution plate is covered on the opening, the air inlet hole is formed in the mounting piece, the air distribution hole is formed in the air distribution plate, and the air inlet pipe assembly is mounted on the mounting piece.
8. The air distribution device according to claim 7, wherein the mounting member includes a mounting plate and a bending portion bent at an edge of the mounting plate, and the mounting plate and the bending portion cooperate to form the inner cavity.
9. A chemical vapor deposition apparatus comprising a gas distribution device according to any one of claims 1 to 8.
10. The chemical vapor deposition apparatus according to claim 9, further comprising a hot wire and a carrier plate, wherein the gas distribution device, the hot wire and the carrier plate are arranged side by side in sequence, and the gas distribution holes are arranged toward the hot wire and the carrier plate.
CN202223453619.7U 2022-12-22 2022-12-22 Gas distribution device and chemical vapor deposition equipment Active CN220468136U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202223453619.7U CN220468136U (en) 2022-12-22 2022-12-22 Gas distribution device and chemical vapor deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202223453619.7U CN220468136U (en) 2022-12-22 2022-12-22 Gas distribution device and chemical vapor deposition equipment

Publications (1)

Publication Number Publication Date
CN220468136U true CN220468136U (en) 2024-02-09

Family

ID=89799770

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202223453619.7U Active CN220468136U (en) 2022-12-22 2022-12-22 Gas distribution device and chemical vapor deposition equipment

Country Status (1)

Country Link
CN (1) CN220468136U (en)

Similar Documents

Publication Publication Date Title
CN102834958B (en) For the humidifier of fuel cell
CN101867053B (en) Fuel cell stack for jointly applying intraplate counter-flow flow field and interpolate counter-flow flow field
CN113314726A (en) Arrow-feather-shaped bipolar plate of proton exchange membrane fuel cell
CN107968211A (en) A kind of flow field plate structure for Proton Exchange Membrane Fuel Cells
CN220468136U (en) Gas distribution device and chemical vapor deposition equipment
US3436272A (en) Stacked fuel cells
US20210189563A1 (en) Flow homogenizing plate and gas homogenizing device for process chamber
CN214830646U (en) LPCVD structure of admitting air
JPS6463271A (en) Fuel cell
US8338048B2 (en) Fuel cell
US20170062849A1 (en) Stack of electrochemical cells divided up into separate groups comprising a homogenization compartment
CN115261823B (en) Air inlet device of process chamber, semiconductor process equipment and semiconductor processing technology
CN214797474U (en) Arrow-feather-shaped bipolar plate of proton exchange membrane fuel cell
CN109244503B (en) Anode runner of proton exchange membrane fuel cell
CN102369307B (en) Apparatus for manufacture of solar cells
CN219449867U (en) Horizontal hot wire chemical vapor deposition equipment
CN211858802U (en) Bipolar plate for fuel cell
CN217026061U (en) Process air supply distribution system for magnetron sputtering
CN210945766U (en) Multi-cavity deposition system for carbon coating of bipolar plate of fuel cell
CN216237271U (en) Even flow plate structure based on aerodynamics
CN212571049U (en) Bipolar plate for fuel cell
CN219260187U (en) Gas spray header device and chemical vapor deposition equipment
CN110165242A (en) A kind of PEM cell flow field plate structure of multi-level width of flow path
CN217997412U (en) Air inlet pipe for diffusion
CN216749926U (en) Air inlet pipe

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant