CN220376775U - Spraying device and coating equipment - Google Patents

Spraying device and coating equipment Download PDF

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Publication number
CN220376775U
CN220376775U CN202320952577.7U CN202320952577U CN220376775U CN 220376775 U CN220376775 U CN 220376775U CN 202320952577 U CN202320952577 U CN 202320952577U CN 220376775 U CN220376775 U CN 220376775U
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plate
spaces
flow
air
buffer
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CN202320952577.7U
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Chinese (zh)
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戴佳
林佳继
朱鹤囡
董雪迪
张武
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Laplace Wuxi Semiconductor Technology Co Ltd
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Laplace Wuxi Semiconductor Technology Co Ltd
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Abstract

The utility model belongs to the technical field of ALD (atomic layer deposition) coating and discloses a spraying device and coating equipment. The spraying device comprises at least two air inlet structures and a spraying structure, wherein the air inlet structures are used for introducing different reaction sources, the spraying structure is provided with an air storage space, a plurality of buffer spaces and a plurality of uniform flow spaces, the reaction sources are filled with the air storage space after entering the air storage space through the air inlet structures, then enter the plurality of buffer spaces, the reaction sources are further buffered, the reaction sources are uniformly distributed in the spraying structure, then enter the plurality of uniform flow spaces respectively in the buffer spaces, the reaction sources are further buffered, the reaction sources in the spraying device are uniformly distributed, and finally the reaction sources output through the air outlet device can be uniformly distributed, so that the air outlet effect is ensured, and the deposition effect can be improved.

Description

Spraying device and coating equipment
Technical Field
The utility model relates to the technical field of ALD (atomic layer deposition) coating, in particular to a spraying device and coating equipment.
Background
ALD (atomic layer deposition) technology is a technology of forming a thin film by alternately introducing pulses of a vapor phase precursor into a reaction chamber and performing surface chemical reaction on a deposition substrate, and is a technology of depositing a substance layer by layer on the surface of the substrate in the form of a monoatomic film. The spray device of ALD is one of the core components of an ALD apparatus, which affects the deposition efficiency.
The traditional ALD spraying device can mix chemical gas phase precursors firstly and then enter a reaction chamber, and the precursors react in advance in the mixing process to generate dust, so that on one hand, the dust falls on the surface of a substrate to influence the deposition effect and reduce the quality of the substrate; on the other hand, dust can gradually block the spray pipe, and the normal air outlet can not be realized, so that the deposition effect is reduced.
Therefore, a spraying device and a coating apparatus are needed to solve the above problems.
Disclosure of Invention
The utility model aims to provide a spraying device which enables different reaction sources to independently enter a reaction cavity, so that dust generated by mixing the different reaction sources can be prevented from blocking air outlet holes, and the deposition effect is improved.
To achieve the purpose, the utility model adopts the following technical scheme:
the spraying device comprises at least two air inlet structures and a spraying structure, wherein the two air inlet structures are used for introducing different reaction sources, the spraying structure is provided with an air storage space, a plurality of buffer spaces and a plurality of uniform flow spaces, the spraying structure further comprises an air outlet structure, the air inlet structure is communicated with the air storage space and is used for inputting the reaction sources into the air storage space, the reaction sources in the air storage space can enter different buffer spaces, the reaction sources in the buffer spaces can enter different uniform flow spaces, and the air outlet structure is communicated with the uniform flow spaces and is used for outputting different reaction sources respectively.
As an optional technical scheme, spray the structure and include intake plate and mounting plate, the intake plate with intake structure connects, the intake plate with mounting plate connects, the intake plate is close to mounting plate's one side has seted up the air inlet groove, the air inlet groove with mounting plate forms the gas storage space, mounting plate has seted up the intercommunication the gas storage space with buffer space's first venthole.
As an optional technical scheme, spray the structure still include the cab apron, the cab apron with mounting plate is connected, mounting plate is close to one side of cab apron has seted up a plurality of buffer recesses, a plurality of buffer recesses with the cab apron forms a plurality of buffer space, a plurality of buffer space parallel and the interval sets up, first venthole is used for the intercommunication buffer space with the gas storage space, the last intercommunication of seting up of cab apron buffer space with even second venthole in flow space.
As an optional technical solution, each buffer space extends along a first direction, and a plurality of buffer spaces are arranged at intervals along a second direction.
As an optional technical scheme, spray the structure still include the even flow board, even flow board with the transition board is connected, even flow board is close to one side of transition board has seted up the even flow groove, even flow groove with a side of transition board forms the even flow space, even flow space with the buffering space is the angle setting, even flow inslot offer with the third venthole of structure intercommunication of giving vent to anger.
As an optional technical scheme, the flow homogenizing groove is provided with a plurality of, a plurality of flow homogenizing grooves and the other side face of the transition plate form a plurality of flow homogenizing spaces, each flow homogenizing space extends along the second direction, and a plurality of flow homogenizing spaces are arranged at intervals along the first direction.
As an optional technical scheme, the air inlet structure comprises an air inlet pipe, the air inlet pipe is connected to the air inlet plate, and the air outlet end of the air inlet pipe is communicated with the air storage space.
As an optional technical scheme, the mounting base plate is provided with an input hole, the air inlet end of the air inlet pipe is connected with the mounting base plate, and the reaction source enters the air inlet pipe after passing through the input hole.
As an optional technical scheme, the air outlet structure is an air outlet plate, and at least one deposition groove is arranged on two sides of the air outlet groove of the air outlet plate.
The utility model adopts the following technical scheme:
the coating equipment comprises the spraying device.
The utility model has the beneficial effects that:
the utility model discloses a spraying device, which comprises at least two air inlet structures and a spraying structure, wherein the at least two air inlet structures are used for introducing different reaction sources, the spraying structure is provided with an air storage space, a plurality of buffer spaces and a plurality of uniform flow spaces, the spraying structure also comprises an air inlet structure and an air outlet structure, the air inlet structure is communicated with the air storage space and is used for inputting the reaction sources into the air storage space, the reaction sources in the air storage space can enter different buffer spaces, the reaction sources in the buffer spaces can enter different uniform flow spaces, and the air outlet structure is communicated with the uniform flow spaces and is used for outputting the reaction sources. This kind of setting can make different gases get into the reaction chamber through respective spraying structure, the reaction source is full of the gas storage space after entering the gas storage space through inlet structure, then get into a plurality of buffer spaces, a plurality of buffer spaces are further buffering with the reaction source, make the reaction source equipartition in spray set's inside, then the reaction source gets into a plurality of uniform flow spaces respectively in the buffer space, further buffer the reaction source, make the reaction source evenly distributed in the spray set, the reaction source through the structure output of giving vent to anger at last can evenly arranged, not only ensure the effect of giving vent to anger, make at the different reaction sources of whole process each other in spraying structure contactless, avoid producing the dust and block up the passageway, can promote the deposition effect again.
The utility model also discloses a coating device which comprises the spraying device and has good spraying effect and deposition effect.
Drawings
FIG. 1 is a schematic illustration of a spray device according to an embodiment of the present utility model;
FIG. 2 is a schematic diagram II of a spray device according to an embodiment of the present utility model;
FIG. 3 is an enlarged view of a portion of FIG. 2A;
FIG. 4 is a schematic view III of a spray device according to an embodiment of the present utility model;
FIG. 5 is a schematic diagram of a spray apparatus according to an embodiment of the present utility model;
fig. 6 is a schematic view of a first intake pipe according to an embodiment of the utility model;
FIG. 7 is a schematic view of a first intake plate according to an embodiment of the utility model;
FIG. 8 is a cross-sectional view of B-B in FIG. 7;
FIG. 9 is a schematic view of a mounting base plate of an embodiment of the present utility model;
FIG. 10 is an enlarged view of a portion of C in FIG. 9;
FIG. 11 is a schematic view of a transition plate according to an embodiment of the present utility model;
FIG. 12 is a schematic view of a flow-homogenizing plate of an embodiment of the present utility model;
FIG. 13 is a partial cross-sectional view of FIG. 12;
FIG. 14 is a schematic view of an outlet plate according to an embodiment of the present utility model;
FIG. 15 is a partial cross-sectional view of FIG. 14;
fig. 16 is a partial enlarged view of D in fig. 15;
fig. 17 is a partial enlarged view of E in fig. 15.
In the figure:
1. a spraying device;
10. a first air inlet pipe; 11. a second air inlet pipe;
20. a first air intake plate; 21. a first air inlet groove; 22. a second air intake plate; 23. a second air inlet groove; 24. a first seal groove;
30. a mounting base plate; 31. a first buffer groove; 311. a first oxygen source gas outlet port; 32. a second buffer groove; 321. a first organic source gas outlet; 35. a second seal groove;
40. a transition plate; 41. a second oxygen source gas outlet hole; 42. a second organic source gas outlet;
50. a flow homogenizing plate; 51. a first homogenizing groove; 511. a third oxygen source gas outlet hole; 52. a second homogenizing groove; 521. a third organic source gas outlet; 53. a third seal groove;
60. an air outlet plate; 61. a first air outlet groove; 611. a first deposition bath; 62. a second air outlet groove; 621. a second deposition bath; 622. an inclined surface; 63. reinforcing ribs.
Detailed Description
The utility model is described in further detail below with reference to the drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the utility model and are not limiting thereof. It should be further noted that, for convenience of description, only some, but not all of the structures related to the present utility model are shown in the drawings.
In the description of the present utility model, unless explicitly stated and limited otherwise, the terms "connected," "connected," and "fixed" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present utility model will be understood in specific cases by those of ordinary skill in the art.
In the present utility model, unless expressly stated or limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, as well as the first and second features not being in direct contact but being in contact with each other through additional features therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly under and obliquely below the second feature, or simply means that the first feature is less level than the second feature.
In the description of the present embodiment, the terms "upper", "lower", "right", etc. orientation or positional relationship are based on the orientation or positional relationship shown in the drawings, and are merely for convenience of description and simplicity of operation, and do not indicate or imply that the apparatus or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the utility model. Furthermore, the terms "first," "second," and the like, are used merely for distinguishing between descriptions and not for distinguishing between them.
As shown in fig. 1 to 5, this embodiment provides a spray device 1, this spray device 1 includes two at least inlet structures and spray structure, two inlet structures are used for letting in different reaction sources, spray structure is provided with gas storage space, buffer space and even flow space, spray structure still includes inlet structure and gas outlet structure, inlet structure and gas storage space intercommunication are used for importing the reaction source to the gas storage space, the reaction source in the gas storage space can get into different buffer space, the reaction source in the buffer space can get into different even flow space, the gas outlet structure and even flow space intercommunication, and be used for exporting different reaction sources respectively. Specifically, in this embodiment, the spraying device 1 includes two air inlet structures, which are respectively used for introducing a first reaction source and a second reaction source, and more specifically, the first reaction source is an oxygen source gas, and the second reaction source is an organic source gas. The gas storage space, the buffer space and the uniform flow space of the first reaction source and the second reaction source in the spraying structure are all independently arranged, so that dust generated by mixing oxygen source gas and organic source gas in the spraying device 1 can be prevented from blocking the gas outlet hole of the gas outlet structure, and the influence on the deposition effect caused by unsmooth gas outlet is avoided. The gas inlet structure is communicated with the gas storage space, the gas storage space can perform a certain buffer effect on the reaction source entering through the gas inlet structure, so that the reaction source in the gas storage space can enter the buffer space through the first gas outlet, the gas storage space is communicated with the uniform flow space, the reaction source in the gas storage space can enter different uniform flow spaces, the reaction source is further buffered, the reaction source can be uniformly distributed in the spraying structure, the reaction source in the uniform flow space can be uniformly distributed in the reaction cavity after being output through the gas outlet structure, and the deposition effect is improved. In other embodiments, the number of the air inlet structures may be 3, 4 or more according to the number of the reaction sources to be sprayed, and the number of the air storage spaces, the buffer spaces and the uniform flow spaces in the spraying structures are correspondingly set, so that the types of the air outlet grooves of the air outlet structures are adaptively modified, which is not described herein.
Further, as shown in fig. 7 to 10, the spraying structure includes an air inlet plate and a mounting base plate 30, the air inlet plate is connected with the air inlet structure, the air inlet plate is connected with the mounting base plate 30, an air inlet groove is formed on one side of the air inlet plate, which is close to the mounting base plate 30, the air inlet groove and the mounting base plate 30 form an air storage space, and the mounting base plate 30 is provided with a first air outlet hole which is communicated with the air storage space and the buffer space. Specifically, in this embodiment, the air intake plate includes a first air intake plate 20 and a second air intake plate 22, the first air intake plate 20 is provided with a first air intake groove 21, the first air intake groove 21 and the mounting base plate 30 form a first air storage space, the second air intake plate 22 is provided with a second air intake groove 23, and the second air intake groove 23 and the mounting base plate 30 form a second air storage space.
As shown in fig. 6, the air inlet structure includes an air inlet pipe, the air inlet pipe is connected to the air inlet plate, and an air outlet end of the air inlet pipe is communicated with the air storage space. Specifically, the air inlet pipe in the present embodiment includes a first air inlet pipe 10 and a second air inlet pipe 11, the first air inlet pipe 10 is connected to the first air inlet plate 20 and is communicated with the first air storage space for inputting oxygen source gas into the first air storage space, and the second air inlet pipe 11 is connected to the second air inlet plate 22 and is communicated with the second air storage space for inputting organic source gas into the second air storage space. The first venthole includes first oxygen source gas venthole 311 and first organic source gas venthole 321 for export oxygen source gas and organic source gas respectively, first oxygen source gas venthole 311 evenly arranges in first gas storage space, can make the oxygen source gas in the first gas storage space comparatively even get into corresponding first buffer space, and first buffer space can cushion oxygen source gas for oxygen source gas evenly distributed in first buffer space, first organic source gas venthole 321 evenly arranges in the second gas storage space, can make the organic source gas in the second gas storage space comparatively even get into corresponding second buffer space, and second buffer space can cushion organic source gas, make organic source gas evenly distributed in the second buffer space. Specifically, the first air inlet groove 21 and the second air inlet groove 23 are both provided with a first step on the periphery, and a first sealing ring is arranged between the first step and the mounting base plate 30.
Further, as shown in fig. 11, the spraying structure further includes a transition plate 40, the transition plate 40 is connected with the mounting bottom plate 30, a plurality of buffer grooves are formed on a side, far away from the air inlet plate, of the mounting bottom plate 30, the plurality of buffer grooves and the transition plate 40 form a plurality of buffer spaces, the plurality of buffer spaces are parallel and are arranged at intervals, the first air outlet holes are used for communicating the buffer spaces with the air storage spaces, and the second air outlet holes communicating the buffer spaces with the uniform flow spaces are formed in the transition plate 40. Specifically, in this embodiment, the transition plate 40 is provided with a plurality of first buffer grooves 31 and a plurality of second buffer grooves 32, the plurality of first buffer grooves 31 and the plate surface of the transition plate 40 form a plurality of first buffer spaces, the plurality of second buffer grooves 32 and the plate surface of the transition plate 40 form a plurality of second buffer spaces, the first buffer spaces are communicated with the first gas storage spaces through the first oxygen source gas outlet holes 311, so that the oxygen source gas in the first gas storage spaces enters different first buffer spaces after passing through the first oxygen source gas outlet holes 311, the oxygen source gas can be distributed more uniformly inside the spray device 1 through the arrangement, and similarly, the second buffer spaces are communicated with the second gas storage spaces through the first organic source gas outlet holes 321, so that the organic source gas in the second gas storage spaces enters different second buffer spaces through the first organic source gas outlet holes 321, the oxygen source gas and the organic source gas are arranged at intervals inside the spraying device 1, which is favorable for uniform mixing of the following oxygen source gas and the organic source gas, and the first buffer space and the second buffer space are arranged to buffer the oxygen source gas and the organic source gas respectively, in this embodiment, the second gas outlet hole comprises a second oxygen source gas outlet hole 41 and a second organic source gas outlet hole 42, the second oxygen source gas outlet hole 41 is located in the first uniform flow space, the second oxygen source gas outlet holes 41 are uniformly distributed in the first uniform flow space, the second organic source gas outlet hole 42 is located in the second uniform flow space, the second organic source gas outlet holes 42 are uniformly distributed in the second uniform flow space, the oxygen source gas can be uniformly output to the first uniform flow space through the second oxygen source gas outlet holes 41 in different first buffer spaces, the organic source gas can be uniformly output to the second uniform flow space through the second organic source gas outlet holes 42 in different second gas storage spaces, so that the oxygen source gas in the first uniform flow space can be uniformly distributed, and the organic source gas in the second uniform flow space is also uniformly distributed. Specifically, the outer circumferences of the first buffer groove 31 and the second buffer groove 32 are respectively provided with a second step, a second seal groove 35 is arranged between the second step and the transition plate 40, and a second seal ring is installed in the second seal groove 35.
Further, each buffer space extends along the first direction, and the plurality of buffer spaces are arranged at intervals along the second direction. Specifically, in this embodiment, the first buffer space and the second buffer space extend along the first direction, and the plurality of first buffer spaces and the plurality of second buffer spaces are staggered along the second direction, so that the first buffer space and the second buffer space can be arranged on the entire transition plate 40, and further, oxygen source gas and organic source gas are uniformly distributed on the transition plate 40.
Further, as shown in fig. 12 to 13, the spraying structure further includes a flow homogenizing plate 50, the flow homogenizing plate 50 is connected with the transition plate 40, a flow homogenizing groove is formed on one side of the flow homogenizing plate 50, which is close to the transition plate 40, a flow homogenizing space is formed by the flow homogenizing groove and one side of the transition plate 40, the flow homogenizing space is arranged at an angle with the buffer space, and a third air outlet hole communicated with the air outlet structure is formed in the flow homogenizing groove. Specifically, in this embodiment, the first homogenizing groove 51 and the second homogenizing groove 52 are formed on the side of the homogenizing plate 50 close to the transition plate 40, and the first homogenizing groove 51, the second homogenizing groove 52 and the transition plate 40 respectively form a first homogenizing space and a second homogenizing space, the first homogenizing space is communicated with the first buffer space through the second oxygen source gas outlet hole 41, and since the first homogenizing space and the first buffer space are arranged at an angle, the third outlet hole comprises the third oxygen source gas outlet hole 511 and the third organic source gas outlet hole 521, the third oxygen source gas outlet hole 511 is located in the first homogenizing space, the third organic source gas outlet hole 521 is located in the second homogenizing space, the oxygen source gas in the first buffer space enters the first homogenizing space through the second oxygen source gas outlet hole 41, the first homogenizing space can buffer the oxygen source gas again, the oxygen source gas output through the third oxygen source gas outlet hole 511 is more uniform, the second homogenizing space can uniformly output the organic source gas through the third oxygen source gas outlet hole 511, the third uniform source gas can be more uniformly deposited in the first uniform outlet hole, and the third uniform source gas can be more uniformly distributed in the first air outlet hole 511. Optionally, the peripheries of the first flow homogenizing groove 51 and the second flow homogenizing groove 52 are respectively provided with a third sealing groove 53, and a third sealing ring is arranged between the third sealing groove 53 and the transition plate 40.
Further, a plurality of flow homogenizing grooves are provided, a plurality of flow homogenizing spaces are formed by the plurality of flow homogenizing grooves and the other side surface of the transition plate 40, the plurality of flow homogenizing spaces extend along the second direction, and the plurality of flow homogenizing spaces are arranged at intervals along the first direction. Specifically, in the present embodiment, the first flow homogenizing groove 51 and the second flow homogenizing groove 52 are provided with a plurality of first flow homogenizing spaces, and the plurality of first flow homogenizing grooves 51 and the other side surface of the transition plate 40 form a plurality of first flow homogenizing spaces, and the plurality of first flow homogenizing spaces extend along the second direction, so that the oxygen source gas can be arranged in the second direction, and the plurality of first flow homogenizing spaces are arranged at intervals along the first direction, so that the oxygen source gas can be arranged in the first direction, and further, the oxygen source gas is uniformly distributed on the flow homogenizing plate 50; in the same way, the plurality of second uniform flow grooves 52 and the other side surface of the transition plate 40 form a plurality of second uniform flow spaces, the plurality of second uniform flow spaces are all arranged along the second direction, so that the organic source gas can be arranged along the first direction at intervals, the organic source gas can be arranged along the first direction, and then the organic source gas can be arranged on the uniform flow plate 50, accordingly, the gas outlet grooves on the gas outlet structure comprise a plurality of first gas outlet grooves 61 and a plurality of second gas outlet grooves 62, the plurality of first gas outlet grooves 61 and the plurality of first uniform flow spaces are arranged in one-to-one correspondence, the plurality of second gas outlet grooves 62 and the plurality of second uniform flow spaces are arranged in one-to-one correspondence, the plurality of first gas outlet grooves 61 and the plurality of second gas outlet grooves 62 are also arranged in parallel and in a staggered manner on the gas outlet structure, the oxygen source gas output through the first gas outlet grooves 61 and the organic source gas output through the second gas outlet grooves 62 can be arranged on the gas outlet structure, accordingly, the plurality of first gas outlet grooves 61 and the organic source gas output through the second gas outlet grooves 62 can be uniformly distributed on the oxygen source structure, the oxygen source gas can not be distributed with the organic source gas can be fully distributed in the gas outlet structure, and the gas source can not produce a full mixing effect, and the gas source gas can not produce a full mixing effect of dust in the spraying device 1, and the spraying device can not be guaranteed, and the gas can not be well mixed with the dust the gas source gas can be sprayed and discharged through the device 1.
Alternatively, the flow-homogenizing plates 50 in the present embodiment are provided in plurality, each of which is provided with the plurality of first flow-homogenizing grooves 51 and the plurality of second flow-homogenizing grooves 52, which can facilitate maintenance.
The second air outlet holes in different buffer spaces are also uniformly arranged, so that more uniform reaction sources in the buffer spaces can enter different uniform flow spaces, the reaction sources in different uniform flow spaces can be uniformly distributed, the uniform flow spaces and the buffer spaces are arranged at angles, the different uniform flow spaces and the reaction sources in different buffer spaces can relatively flow, the reaction sources in different uniform flow spaces are ensured to be basically uniform, the third air outlet holes are uniformly distributed in the uniform flow spaces, the uniform flow spaces are connected with the air outlet structure, the air outlet grooves of the air outlet structure are communicated with the third air outlet holes of the uniform flow spaces, the reaction sources in the uniform flow spaces are further uniformly flowed, the reaction sources flowing out through the different air outlet grooves can be uniformly mixed, and the reaction sources in the reaction chamber can be uniformly mixed, so that the deposition effect is improved.
Further, the mounting base plate 30 has an input hole, an air inlet end of the air inlet pipe is connected to the mounting base plate 30, and the reaction source enters the air inlet pipe after passing through the input hole. Specifically, in this embodiment, because spray device 1 sets up on the chamber door of reaction chamber, and the chamber door of reaction chamber is overhead, the evacuation mouth of reaction chamber sets up in the bottom of reaction chamber, this kind of setting can make oxygen source gas and organic source gas better with the base member contact, promote the deposition effect, because when the chamber door is closed, mounting plate 30 in this embodiment and the frame butt of chamber door, so be provided with the input hole on mounting plate 30, when the chamber door is closed, the input hole on mounting plate 30 can communicate with the air flue that sets up on the frame of chamber door, the inlet end and the mounting plate 30 of intake pipe are connected, make input hole and intake pipe intercommunication, and then make the air flue just can be through mounting plate 30 to intake pipe input gas when the chamber door is closed, can promote work efficiency, again because chamber door and frame have certain extrusion, the leakproofness has been ensured. The two input holes in this embodiment are provided for communicating with the first intake pipe 10 and the second intake pipe 11, respectively, to ensure separate input of the oxygen source gas and the organic source gas.
Further, as shown in fig. 14 to 17, the gas outlet structure is a gas outlet plate 60, and at least one deposition groove is disposed on both sides of the gas outlet groove of the gas outlet plate 60. Specifically, in this embodiment, the air outlet plate 60 is connected to the uniform flow plate 50, the air outlet grooves include a first air outlet groove 61 and a second air outlet groove 62, the first air outlet groove 61 and the second air outlet groove 62 extend along the second direction, the first air outlet grooves 61 and the second air outlet groove 62 are parallel and spaced along the first direction, the second air outlet grooves 62 are parallel and spaced along the first direction, the first air outlet groove 61 and the second air outlet groove 62 are staggered, the first air outlet grooves 61 and the first uniform flow space are communicated through the third oxygen source gas outlet hole 511, the air outlet grooves of the second air outlet plate 60 and the uniform flow space of the uniform flow plate 50 are communicated through the third organic source gas outlet hole 621, the arrangement ensures that the oxygen source gas and the organic source gas can be output from the staggered third oxygen source gas outlet hole 511 and the third organic source gas outlet hole 521, the deposition effect is improved, the first air outlet grooves 611 are arranged on two sides of the first air outlet groove 61, the second air outlet grooves 62 are arranged on two sides of the first air outlet groove 61, the second air outlet groove 621 and the second air outlet groove 621 are uniformly distributed on two sides of the first air outlet groove 621, and the second air outlet groove 621 are prevented from being blocked by the first air outlet groove 621 and the second air outlet groove 1. Optionally, in this embodiment, the number of air outlet plates 60 is set corresponding to the number of uniform flow plates 50, so as to facilitate maintenance.
Alternatively, in the present embodiment, two first deposition grooves 611 are provided at both ends of the first gas outlet groove 61, and two second deposition grooves 621 are provided at both ends of the second gas outlet groove 62. Specifically, since the oxygen source gas introduced into the reaction chamber after the reaction is completed has a part of residual oxygen source gas, the residual oxygen source gas will flow transversely to the direction of the second gas outlet groove 20, and therefore, an inclined surface 622 is disposed on one side of the second deposition groove 621 near the second gas outlet groove 62, so that the residual oxygen source gas can be accumulated in the second deposition groove 621, the oxygen source gas accumulated in the second deposition groove 621 reacts with the organic source gas introduced later to generate dust, and the dust is directly deposited in the second deposition groove 621, so that the generated dust is prevented from being deposited in the second gas outlet groove 62, and the dust is prevented from blocking the second gas outlet groove 62 of the gas outlet plate. Alternatively, the first and second deposition grooves 611 and 621 are provided with the reinforcing ribs 63, so that the strength of the air outlet plate 60 can be ensured.
The embodiment also provides a coating device, which comprises the spraying device 1, wherein different reaction sources can be independently input into the reaction cavity by the spraying device 1, so that the spraying effect of the spraying device 1 is ensured, the generation of dust is effectively reduced, and the deposition effect is ensured.
It is to be understood that the above examples of the present utility model are provided for clarity of illustration only and are not limiting of the embodiments of the present utility model. Various obvious changes, rearrangements and substitutions can be made by those skilled in the art without departing from the scope of the utility model. It is not necessary here nor is it exhaustive of all embodiments. Any modification, equivalent replacement, improvement, etc. which come within the spirit and principles of the utility model are desired to be protected by the following claims.

Claims (10)

1. Spray device, characterized in that the spray device (1) comprises:
at least two air inlet structures, wherein the two air inlet structures are used for introducing different reaction sources;
the spraying structure is provided with a gas storage space, a plurality of buffer spaces and a plurality of uniform flow spaces, the spraying structure further comprises a gas outlet structure, each gas inlet structure is correspondingly communicated with one gas storage space and used for inputting reaction sources into the gas storage space, the reaction sources in the gas storage space can enter different buffer spaces, the reaction sources in the buffer spaces can enter different uniform flow spaces, and the gas outlet structure is communicated with the uniform flow spaces and used for respectively outputting different reaction sources.
2. The spraying device according to claim 1, wherein the spraying structure comprises an air inlet plate and a mounting base plate (30), the air inlet plate is connected with the air inlet structure, the air inlet plate is connected with the mounting base plate (30), an air inlet groove is formed in one side, close to the mounting base plate (30), of the air inlet plate, the air inlet groove and the mounting base plate (30) form the air storage space, and the mounting base plate (30) is provided with a first air outlet hole which is communicated with the air storage space and the buffer space.
3. The spraying device according to claim 2, wherein the spraying structure further comprises a transition plate (40), the transition plate (40) is connected with the mounting base plate (30), a plurality of buffer grooves are formed in one side, close to the transition plate (40), of the mounting base plate (30), a plurality of buffer grooves and the transition plate (40) form a plurality of buffer spaces, and a second air outlet hole which is communicated with the buffer spaces and the uniform flow space is formed in the transition plate (40).
4. A spray device as claimed in claim 3 wherein each buffer space extends in a first direction and a plurality of buffer spaces are spaced apart in a second direction.
5. The spraying device according to claim 3, wherein the spraying structure further comprises a flow homogenizing plate (50), the flow homogenizing plate (50) is connected with the transition plate (40), a flow homogenizing groove is formed in one side of the flow homogenizing plate (50) close to the transition plate (40), a flow homogenizing space is formed by the flow homogenizing groove and one side surface of the transition plate (40), the flow homogenizing space is arranged at an angle with the buffer space, and a third air outlet hole communicated with the air outlet structure is formed in the flow homogenizing groove.
6. The spray device of claim 5, wherein a plurality of said flow-homogenizing grooves are provided, a plurality of said flow-homogenizing spaces are formed by a plurality of said flow-homogenizing grooves and the other side surface of said transition plate (40), each of said flow-homogenizing spaces extends in the second direction, and a plurality of said flow-homogenizing spaces are provided at intervals in the first direction.
7. The spray device of claim 2, wherein the air intake structure comprises an air intake pipe connected to the air intake plate, and an air outlet end of the air intake pipe is in communication with the air storage space.
8. The spraying device according to claim 7, wherein the mounting base plate (30) has an input hole, an air inlet end of the air inlet pipe is connected to the mounting base plate (30), and the reaction source enters the air inlet pipe after passing through the input hole.
9. The spraying device according to any one of claims 1-8, wherein the gas outlet structure is a gas outlet plate (60), and at least one deposition groove is provided on both sides of the gas outlet groove of the gas outlet plate (60).
10. Coating installation, characterized in that it comprises a spray device (1) according to any one of claims 1 to 9.
CN202320952577.7U 2023-04-25 2023-04-25 Spraying device and coating equipment Active CN220376775U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202320952577.7U CN220376775U (en) 2023-04-25 2023-04-25 Spraying device and coating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202320952577.7U CN220376775U (en) 2023-04-25 2023-04-25 Spraying device and coating equipment

Publications (1)

Publication Number Publication Date
CN220376775U true CN220376775U (en) 2024-01-23

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Family Applications (1)

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Country Status (1)

Country Link
CN (1) CN220376775U (en)

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