CN220372978U - Lifting check ring of grinding equipment - Google Patents
Lifting check ring of grinding equipment Download PDFInfo
- Publication number
- CN220372978U CN220372978U CN202321863319.8U CN202321863319U CN220372978U CN 220372978 U CN220372978 U CN 220372978U CN 202321863319 U CN202321863319 U CN 202321863319U CN 220372978 U CN220372978 U CN 220372978U
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- Prior art keywords
- lifting
- lift
- retaining ring
- ring
- water
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 87
- 239000007788 liquid Substances 0.000 abstract description 15
- 238000005406 washing Methods 0.000 abstract description 7
- 238000002425 crystallisation Methods 0.000 abstract description 5
- 230000008025 crystallization Effects 0.000 abstract description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052710 silicon Inorganic materials 0.000 abstract description 3
- 239000010703 silicon Substances 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 238000004140 cleaning Methods 0.000 description 9
- 238000005498 polishing Methods 0.000 description 8
- 238000012986 modification Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003020 moisturizing effect Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
Landscapes
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
The application provides a lift retaining ring of grinding equipment relates to semiconductor grinding equipment technical field, the lift retaining ring of grinding equipment includes lift retaining ring, one or more cylinder and one or more delivery pipe, the cylinder is located the bottom of lift retaining ring is used for the drive the lift retaining ring goes up and down, the delivery pipe is located the bottom of lift retaining ring, still be equipped with one or more water jet, one or more basin on the lift retaining ring, the water jet set up in the top of lift retaining ring, one or more basin set up in the water jet with between the delivery pipe. This novel lift retaining ring can be when stopping the lapping liquid that splashes, realizes the washing of lift retaining ring, reduces the lapping liquid crystallization scratch silicon chip on the lift retaining ring and the risk that the board internal environment is variation to promote grinding equipment's grinding work efficiency.
Description
Technical Field
The application relates to the technical field of semiconductor grinding equipment, in particular to a lifting check ring of grinding equipment.
Background
The lift retaining ring cover is in grinding equipment (like the grinding disc) outside, and when the grinding disc carries out moisturizing or polishing process, lift retaining ring can rise to stop from grinding disc splash high-pressure water and polishing solution, prevents that the polishing solution from splashing elsewhere. At present, the main stream of grinding equipment does not clean the inner wall and the outer wall of the lifting check ring, and after a long period of time, splashed grinding liquid can form crystals on the inner wall of the lifting check ring, and in the lifting process of the lifting check ring, the crystals can fall on a large disc or be dispersed into small particles (particles) to form scratches or pollution of the internal environment of a cavity, so that the grinding efficiency is affected.
Disclosure of Invention
In view of this, the embodiments of the present disclosure provide a lifting retainer ring of a polishing apparatus, which can realize cleaning of the lifting retainer ring while blocking splashed polishing liquid, thereby improving polishing work efficiency of the polishing apparatus.
The embodiment of the specification provides the following technical scheme:
providing a lifting check ring of grinding equipment, comprising a lifting check ring;
the cylinder is positioned at the bottom of the lifting check ring and used for driving the lifting check ring to lift;
one or more water supply pipes positioned at the bottom of the lifting check ring;
one or more water jets disposed on top of the lifting collar;
one or more water tanks disposed between the water jet and the water supply pipe.
In some embodiments, the lifting collar is fixedly connected to the water supply pipe such that the cylinder may drive the lifting collar to lift with the water supply pipe.
In some embodiments, three cylinders are uniformly distributed at equal intervals at the bottom of the lifting check ring, wherein two cylinders are respectively positioned at two ends of the bottom of the lifting check ring, and one cylinder is respectively arranged at two ends of the bottom of the lifting check ring.
In some embodiments, the water tank includes a horizontal water tank and a vertical water tank, the horizontal water tank is located in the lower portion of the lifting retainer ring, the vertical water tank is located in the upper portion of the lifting retainer ring, the vertical water tank is communicated with the horizontal water tank, the top end of the vertical water tank is communicated with the water spraying port, and the horizontal water tank is communicated with the water supply port of the water supply pipe.
In some embodiments, the cylinder is spaced from the water supply pipe at the bottom of the lifting retainer ring.
In some embodiments, the water jets are located inside and/or outside of the lift ring.
Compared with the prior art, the beneficial effects that above-mentioned at least one technical scheme that this description embodiment adopted can reach include at least: through the delivery pipe, with the basin and the water jet of its intercommunication, realize the washing of washing liquid to lifting check ring to fully wash the lapping liquid and the high-pressure water that splash, prevent to form crystallization, this novel lifting check ring can be when stopping splashing the lapping liquid from this, realizes lifting check ring's washing, reduces the lapping liquid crystallization scratch silicon chip (Wafer) on the lifting check ring and the risk that the board internal environment is variation, thereby promotes grinding equipment (like the lapping plate that is located inside) and grinds work efficiency.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a side view block diagram of a lift ring of a grinding apparatus provided in an embodiment of the present application;
FIG. 2 is a cross-sectional block diagram of a lift ring of a polishing apparatus provided in an embodiment of the present application;
fig. 3 is a top view block diagram of a lift ring of a polishing apparatus according to an embodiment of the present application.
Detailed Description
Embodiments of the present application are described in detail below with reference to the accompanying drawings.
Other advantages and effects of the present application will become apparent to those skilled in the art from the present disclosure, when the following description of the embodiments is taken in conjunction with the accompanying drawings. It will be apparent that the described embodiments are only some, but not all, of the embodiments of the present application. The present application may be embodied or carried out in other specific embodiments, and the details of the present application may be modified or changed from various points of view and applications without departing from the spirit of the present application. It should be noted that the following embodiments and features in the embodiments may be combined with each other without conflict. All other embodiments, which can be made by one of ordinary skill in the art based on the embodiments herein without making any inventive effort, are intended to be within the scope of the present application.
It is noted that various aspects of the embodiments are described below within the scope of the following claims. It should be apparent that the aspects described herein may be embodied in a wide variety of forms and that any specific structure and/or function described herein is merely illustrative. Based on the present application, one skilled in the art will appreciate that one aspect described herein may be implemented independently of any other aspect, and that two or more of these aspects may be combined in various ways. For example, apparatus may be implemented and/or methods practiced using any number and aspects set forth herein. In addition, such apparatus may be implemented and/or such methods practiced using other structure and/or functionality in addition to one or more of the aspects set forth herein.
It should also be noted that the illustrations provided in the following embodiments merely illustrate the basic concepts of the application by way of illustration, and only the components related to the application are shown in the drawings and are not drawn according to the number, shape and size of the components in actual implementation, and the form, number and proportion of the components in actual implementation may be arbitrarily changed, and the layout of the components may be more complicated.
In addition, in the following description, specific details are provided in order to provide a thorough understanding of the examples. However, it will be understood by those skilled in the art that the present utility model may be practiced without these specific details.
As shown in fig. 1 to 3, the lifting retainer ring of the grinding device provided by the embodiment of the application includes a lifting retainer ring 1 located at the periphery of a grinding disc 4, one or more air cylinders 2 and one or more water supply pipes 3, wherein the air cylinders 2 are located at the bottom of the lifting retainer ring 1 and are used for driving the lifting retainer ring 1 to lift, the water supply pipes 3 are located at the bottom of the lifting retainer ring 1 and are communicated with one or more water tanks arranged in the lifting retainer ring 1, one or more water spray ports 13 are further arranged on the lifting retainer ring 1 and are arranged at the top of the lifting retainer ring 1, cleaning liquid is supplied by the water supply pipes 3, and the cleaning liquid is preferably sprayed out through the one or more water tanks arranged in the lifting retainer ring 1, namely, between the water spray ports 13 and the water supply pipes 3, and preferably comprises a transverse water tank 12 located at the lower part of the lifting retainer ring 1 and a vertical water tank 13 located at the upper part of the lifting retainer ring 1, and then the cleaning liquid is sprayed out through the one or more water spray ports 13 to realize cleaning of the lifting retainer ring 1.
In some embodiments, the water jet 13 is located inside and/or outside the lifting collar 1, and preferably a plurality of water jets 13 are provided at different positions inside and outside the lifting collar 1, and the inner and outer side walls of the lifting collar 1 are cleaned at the same time, so as to achieve more uniform and efficient cleaning of the lifting collar 1. In other embodiments, a nozzle structure can be arranged outwards or inwards of the lifting retainer ring 1 from the position of the water spraying port 13, so that the lifting retainer ring 1 can be cleaned conveniently, and the cleaning efficiency is improved.
In some embodiments, the cylinders 2 are uniformly distributed at equal intervals at the bottom of the lifting retainer ring 1, wherein two ends of the bottom of the lifting retainer ring 1 are respectively provided with one cylinder 2. In some embodiments, as shown in fig. 2, three cylinders 2 are uniformly distributed at equal intervals at the bottom of the lifting collar 1, wherein two cylinders 1 are respectively located at two ends of the bottom of the lifting collar 1, so as to achieve a better stable lifting operation. In some embodiments, the lifting check ring 1 is fixedly connected with the water supply pipe 3, so that the air cylinder 2 can drive the lifting check ring 1 to lift together with the water supply pipe 3, that is, when the lifting check ring 1 is lifted to a high position, the water supply pipe 3 is lifted to a high position along with the lifting check ring synchronously, so that the lifting check ring 1 is cleaned efficiently.
In some embodiments, to facilitate the delivery of the cleaning solution to the water jet 13, a transverse water tank 12 may be disposed at the bottom end of the lifting collar 1, the lower end of the transverse water tank 12 is communicated with the water supply port of the water supply pipe 3, and then the transverse water tank 12 is communicated with the flow channels of the plurality of vertical water tanks 11, and then a plurality of water jet 13 are respectively disposed at the top ends of the plurality of vertical water tanks 11.
In some embodiments, the cleaning solution may be deionized water (DIW). In some embodiments, for reasonable arrangement, the cylinder 2 and the water supply pipe 3 may be disposed at a distance from the bottom of the lifting collar 1, so as to avoid unnecessary interference. It should be noted that the manner of this example is only illustrative, and any other possible manner may be adopted without departing from the inventive concept of the present application, regarding the specific structural shapes of the lift ring 1, the cylinder 2, the water supply pipe 3, the lateral water tank 12, the vertical water tank 11, and the water jet 13, or the specific number or arrangement of the cylinder 2, the water supply pipe 3, the lateral water tank 12, the vertical water tank 11, and the water jet 13.
To sum up, the lifting retainer ring of the grinding device provided by the embodiment of the application has at least the following beneficial effects compared with the prior art: through the delivery pipe, with the basin and the water jet of its intercommunication, realize the washing of washing liquid to lifting check ring to fully wash the lapping liquid and the high-pressure water that splash, prevent to form crystallization, this novel lifting check ring can be when stopping splashing the lapping liquid from this, realizes lifting check ring's washing, reduces the lapping liquid crystallization scratch silicon chip (Wafer) on the lifting check ring and the risk that the board internal environment is variation, thereby promotes grinding equipment (like the lapping plate that is located inside) and grinds work efficiency.
In this specification, identical and similar parts of the embodiments are referred to each other, and each embodiment focuses on the differences from the other embodiments. Meanwhile, the specification uses specific words to describe the embodiments of the specification. Reference to "one embodiment," "an embodiment," and/or "some embodiments" means that a particular feature, structure, or characteristic is associated with at least one embodiment of the present description. Thus, it should be emphasized and should be appreciated that two or more references to "an embodiment" or "one embodiment" or "an alternative embodiment" in various positions in this specification are not necessarily referring to the same embodiment. Furthermore, certain features, structures, or characteristics of one or more embodiments of the present description may be combined as suitable.
Furthermore, the order in which the elements and sequences are processed, the use of numerical letters, or other designations in the description are not intended to limit the order in which the processes and methods of the description are performed unless explicitly recited in the claims. While certain presently useful inventive embodiments have been discussed in the foregoing disclosure, by way of various examples, it is to be understood that such details are merely illustrative and that the appended claims are not limited to the disclosed embodiments, but, on the contrary, are intended to cover all modifications and equivalent arrangements included within the spirit and scope of the embodiments of the present disclosure. For example, while the system components described above may be implemented by hardware devices, they may also be implemented solely by software solutions, such as installing the described system on an existing processing device or mobile device.
While the basic concepts have been described above, it will be apparent to those skilled in the art that the foregoing detailed disclosure is by way of example only and is not intended to be limiting. Although not explicitly described herein, various modifications, improvements, and adaptations to the present disclosure may occur to one skilled in the art. Such modifications, improvements, and modifications are intended to be suggested within this specification, and therefore, such modifications, improvements, and modifications are intended to be included within the spirit and scope of the exemplary embodiments of the present utility model.
Claims (6)
1. A lifting collar for a grinding apparatus, comprising:
lifting check rings;
the cylinder is positioned at the bottom of the lifting check ring and used for driving the lifting check ring to lift;
one or more water supply pipes positioned at the bottom of the lifting check ring;
one or more water jets disposed on top of the lifting collar;
one or more water tanks disposed between the water jet and the water supply pipe.
2. The lift ring of claim 1, wherein the lift ring is fixedly connected to the water supply pipe such that the cylinder drives the lift ring to lift with the water supply pipe.
3. The lifting retainer ring according to claim 1, wherein the cylinders are uniformly distributed at equal intervals at the bottom of the lifting retainer ring, and two ends of the bottom of the lifting retainer ring are respectively provided with one cylinder.
4. The lifting collar of claim 1, wherein the water tank comprises a transverse water tank and a vertical water tank, the transverse water tank is located at the lower portion of the lifting collar, the vertical water tank is located at the upper portion of the lifting collar, the vertical water tank is communicated with the transverse water tank, the top end of the vertical water tank is communicated with the water jet, and the transverse water tank is communicated with the water supply port of the water supply pipe.
5. The lift ring of claim 1, wherein the cylinder is disposed at a bottom of the lift ring spaced apart from the water supply pipe.
6. A lifting collar according to any one of claims 1 to 5, wherein the water jets are located internally and/or externally of the lifting collar.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202321863319.8U CN220372978U (en) | 2023-07-14 | 2023-07-14 | Lifting check ring of grinding equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202321863319.8U CN220372978U (en) | 2023-07-14 | 2023-07-14 | Lifting check ring of grinding equipment |
Publications (1)
Publication Number | Publication Date |
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CN220372978U true CN220372978U (en) | 2024-01-23 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN202321863319.8U Active CN220372978U (en) | 2023-07-14 | 2023-07-14 | Lifting check ring of grinding equipment |
Country Status (1)
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CN (1) | CN220372978U (en) |
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2023
- 2023-07-14 CN CN202321863319.8U patent/CN220372978U/en active Active
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