CN219916176U - Photoetching light source device and photoetching machine - Google Patents

Photoetching light source device and photoetching machine Download PDF

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Publication number
CN219916176U
CN219916176U CN202321287017.0U CN202321287017U CN219916176U CN 219916176 U CN219916176 U CN 219916176U CN 202321287017 U CN202321287017 U CN 202321287017U CN 219916176 U CN219916176 U CN 219916176U
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China
Prior art keywords
light source
mounting
photoetching
mounting seat
frame
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Active
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CN202321287017.0U
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Chinese (zh)
Inventor
李海虹
初守庆
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Guangdong Zhongtu Semiconductor Technology Co ltd
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Guangdong Zhongtu Semiconductor Technology Co ltd
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Priority to CN202321287017.0U priority Critical patent/CN219916176U/en
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Abstract

The utility model discloses a photoetching light source device and a photoetching machine, and belongs to the technical field of photoetching machines. The photoetching light source device comprises a bearing frame, wherein the bearing frame comprises an annular main body, a first mounting seat and a plurality of connecting guide rods which extend along the radial direction of the annular main body, the first ends of the connecting guide rods are connected with the inner wall surface of the annular main body, the second ends of the connecting guide rods are connected with the outer wall surface of the first mounting seat, and the first mounting seat is used for mounting a first LED photoetching light source; the second installation seats are arranged on the connecting guide rod in a sliding manner and are used for installing a second LED photoetching light source; the vergence adjusting assembly is in transmission connection with the second installation seats and used for driving the second installation seats to be close to or far away from the first installation seats at the same time. The utility model can adjust the divergence of the light source, so that the thickness of the pattern formed by the photoresist after exposure is uniform, and the yield of the product is improved.

Description

Photoetching light source device and photoetching machine
Technical Field
The present utility model relates to the field of photolithography machines, and in particular, to a photolithography light source device and a photolithography machine.
Background
Microlithography in semiconductor manufacturing uses an optical system to precisely project and expose a pattern on a reticle onto a photoresist-coated silicon wafer. The light source module of the lighting system provides exposure energy for the photoetching machine, the light power of the lighting source directly influences the production efficiency of the photoetching machine, along with the continuous development of LED chips and packaging technology, the LED light source is possible as the lighting source of the photoetching machine, and the LED light source has a plurality of advantages in comparison with a mercury lamp: the light source has a simple structure and no complex lamp room; the LED light source has the advantages of high safety coefficient, no toxicity, no high temperature and no explosion risk, and the LED light source needs to be installed through a specific fixing device during installation. In the use process of the light source device of the existing lithography equipment, the following problems exist:
as shown in fig. 1, in the conventional light source installation apparatus, in the exposure process, the divergence of the light source element 180 cannot be adjusted according to the requirement, and the illuminance distribution of the light emitted by the light source element 180 at the edge and the middle part of the mask plate is uneven, so that the thickness of the pattern formed by the photoresist after exposure is uneven, the subsequent process is affected, and the yield of the product is low.
For this reason, it is necessary to provide a lithographic light source apparatus and a lithographic apparatus to solve the above-mentioned problems.
Disclosure of Invention
The utility model aims to provide a photoetching light source device and a photoetching machine, which can adjust the divergence of a light source, so that the thickness of a pattern formed by photoresist after exposure is uniform, and the yield of products is improved.
In order to achieve the above object, the following technical scheme is provided:
a lithographic light source apparatus comprising:
the bearing frame comprises an annular main body, a first mounting seat and a plurality of connecting guide rods extending along the radial direction of the annular main body, wherein the first ends of the connecting guide rods are connected with the inner wall surface of the annular main body, the second ends of the connecting guide rods are connected with the outer wall surface of the first mounting seat, and the first mounting seat is used for mounting a first LED photoetching light source;
the second installation seats are arranged on the connecting guide rod in a sliding manner and are used for installing a second LED photoetching light source;
and the vergence adjusting assembly is in transmission connection with the plurality of second installation seats and is used for driving the plurality of second installation seats to be close to or far away from the first installation seats at the same time.
As the optional scheme of photoetching light source device, still include the mounting bracket, vergence adjusting part includes first rotation screw rod, drive ring, first connecting rod, second connecting rod and cover locate telescopic link in the second connecting rod, first rotation screw rod's first end with the mounting bracket rotates to be connected, first rotation screw rod's second end with first mount pad rotates to be connected, the second connecting rod keep away from the one end of telescopic link with the mounting bracket articulates, the telescopic link keep away from the one end of second connecting rod with the second mount pad articulates, the inner circle threaded connection of drive ring in on the first rotation screw rod, the one end of first connecting rod with the outer lane of drive ring articulates, the other end of first connecting rod with the second connecting rod articulates.
As an alternative to the lithographic light source apparatus, the vergence adjustment assembly further comprises a first motor, which is arranged in the mounting frame and is in driving connection with the first rotating screw.
As an alternative scheme of the photoetching light source device, the device further comprises an irradiation angle adjusting component, the second LED photoetching light source is rotationally connected with the second mounting seat through a supporting shaft, and the irradiation angle adjusting component is in transmission connection with the supporting shaft so that the second LED photoetching light source rotates for a set angle relative to the second mounting seat.
As an alternative scheme of photoetching light source device, shine angle adjustment subassembly includes annular lift alignment jig, solid fixed ring and rack, annular lift alignment jig's internal face is provided with a plurality of along radial extension's guide rail, gu fixed ring's one end slip set up in the first guide way of guide rail, the locating part of second mount pad wears to locate gu fixed ring's second guide way, the rack set up in gu fixed ring's external face, the one end of back shaft is provided with the gear, the gear with the rack engagement.
As an alternative scheme of the photoetching light source device, the irradiation angle adjusting component comprises a connecting hanging bracket and a second rotating screw rod, the second rotating screw rod is rotationally arranged on the mounting bracket, two ends of the connecting hanging bracket are connected with the annular lifting adjusting bracket, and the middle section of the connecting hanging bracket is in threaded connection with the second rotating screw rod.
As an alternative of the lithographic light source device, the illumination angle adjusting assembly further comprises a second motor, the second motor is arranged in the mounting frame, and the second motor is in transmission connection with the second rotating screw.
As an alternative scheme of the photoetching light source device, the annular main body is provided with a guide column, the annular lifting adjusting frame is provided with a guide hole, and the guide column is arranged in the guide hole in a penetrating manner.
As an alternative to the lithographic light source apparatus, a limit head is provided at an end of the guide post remote from the annular body, and the annular lifting adjusting frame is stopped at the limit head.
A lithographic apparatus comprising a housing and a lithographic light source device according to any one of the preceding claims, the lithographic light source device being mounted in the housing.
Compared with the prior art, the utility model has the beneficial effects that:
according to the photoetching light source device provided by the utility model, the first mounting seat is arranged at the central position of the annular main body, the plurality of connecting guide rods are arranged between the first mounting seat and the annular main body along the radial direction, the second mounting seat can slide along the connecting guide rods, and the vergence adjusting component is in transmission connection with the plurality of second mounting seats, so that the second LED photoetching light source on the second mounting seat is simultaneously close to or far away from the first LED photoetching light source on the first mounting seat. The vergence adjusting component can adjust the divergence of the light source, is suitable for exposure of mask plates of different specifications, ensures that the illuminance distribution of light emitted by the light source at the edge and the middle part of the mask plate is uniform, ensures that the thickness of patterns formed by photoresist after exposure is uniform, and improves the yield of products.
According to the photoetching machine provided by the utility model, the photoetching light source device is arranged in the machine case, the divergence of the light source can be adjusted according to different specifications of masks, and the defective rate of products is reduced.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the following description will briefly explain the drawings needed in the description of the embodiments of the present utility model, and it is obvious that the drawings in the following description are only some embodiments of the present utility model, and other drawings may be obtained according to the contents of the embodiments of the present utility model and these drawings without inventive effort for those skilled in the art.
Fig. 1 is a schematic view of a conventional light source mounting apparatus in the prior art;
FIG. 2 is a schematic diagram illustrating an assembly of a lithographic light source apparatus according to an embodiment of the utility model at a first viewing angle;
FIG. 3 is a schematic diagram illustrating an assembly of a lithographic light source apparatus according to an embodiment of the utility model at a second viewing angle;
FIG. 4 is an enlarged view of a portion of FIG. 3 at A;
FIG. 5 is a schematic view of an assembly of a mounting bracket, a vergence adjustment assembly, and a carrier in an embodiment of the present utility model;
FIG. 6 is a partial enlarged view at B in FIG. 5;
fig. 7 is a schematic structural view of an annular lifting adjusting frame and a connecting hanger of an irradiation angle adjusting assembly in an embodiment of the present utility model.
Reference numerals:
180. a light source element;
1. a carrier; 2. a first LED lithography light source; 3. a second mounting base; 4. a second LED lithography light source; 5. a vergence adjustment assembly; 6. a mounting frame; 61. a mounting hole; 7. an illumination angle adjustment assembly; 8. a support shaft; 81. a gear;
11. an annular body; 12. a first mount; 13. connecting a guide rod; 14. a guide post; 15. a positioning head;
31. a limiting piece;
51. a first rotating screw; 52. a drive ring; 53. a first link; 54. a second link; 55. a telescopic rod; 56. a first motor;
71. an annular lifting adjusting frame; 711. a guide hole; 72. a fixing ring; 721. a second guide groove; 73. a rack; 74. a guide rail; 75. a first guide groove; 76. a connecting hanger; 761. a screw hole; 77. a second rotating screw; 78. and a second motor.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present utility model more apparent, the technical solutions of the embodiments of the present utility model will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present utility model, and it is apparent that the described embodiments are some embodiments of the present utility model, but not all embodiments of the present utility model. The components of the embodiments of the present utility model generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the utility model, as presented in the figures, is not intended to limit the scope of the utility model, as claimed, but is merely representative of selected embodiments of the utility model. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
It should be noted that: like reference numerals and letters denote like items in the following figures, and thus once an item is defined in one figure, no further definition or explanation thereof is necessary in the following figures.
In the description of the present utility model, it should be noted that, directions or positional relationships indicated by terms such as "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., are directions or positional relationships based on those shown in the drawings, or are directions or positional relationships conventionally put in use of the inventive product, are merely for convenience of describing the present utility model and simplifying the description, and are not indicative or implying that the apparatus or element to be referred to must have a specific direction, be configured and operated in a specific direction, and thus should not be construed as limiting the present utility model. Furthermore, the terms "first," "second," "third," and the like are used merely to distinguish between descriptions and should not be construed as indicating or implying relative importance. In the description of the present utility model, unless otherwise indicated, the meaning of "a plurality" is two or more.
In the description of the present utility model, it should also be noted that, unless explicitly specified and limited otherwise, the terms "disposed", "connected" and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected or integrally connected; either mechanically or electrically. The specific meaning of the above terms in the present utility model will be understood in specific cases by those of ordinary skill in the art.
In the present utility model, unless expressly stated or limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, as well as the first and second features not being in direct contact but being in contact with each other through additional features therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly under and obliquely below the second feature, or simply means that the first feature is less level than the second feature.
Embodiments of the present utility model are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are illustrative only and are not to be construed as limiting the utility model.
In order to adjust the divergence of the light source, so that the thickness of the pattern formed by the photoresist after exposure is uniform, and the yield of the product is improved, the embodiment provides a lithography light source device and a lithography machine, and the details of the embodiment are described in detail below with reference to fig. 2 to 7.
As shown in fig. 2, the lithographic light source apparatus comprises a carrier 1, a number of second mounts 3 and a vergence adjustment assembly 5. The bearing frame 1 comprises an annular main body 11, a first mounting seat 12 and a plurality of connecting guide rods 13 extending along the radial direction of the annular main body 11, wherein first ends of the connecting guide rods 13 are connected with the inner wall surface of the annular main body 11, second ends of the connecting guide rods 13 are connected with the outer wall surface of the first mounting seat 12, and the first mounting seat 12 is used for mounting the first LED lithography light source 2. The plurality of second mounting seats 3 are slidably arranged on the connecting guide rod 13, and the second mounting seats 3 are used for mounting the second LED lithography light sources 4. The vergence adjusting assembly 5 is in transmission connection with the plurality of second mounting seats 3, and the vergence adjusting assembly 5 is used for driving the plurality of second mounting seats 3 to be close to or far away from the first mounting seat 12 at the same time.
In short, in the lithographic light source device provided by the utility model, the first mounting seat 12 is arranged at the central position of the annular main body 11, a plurality of connecting guide rods 13 are arranged between the first mounting seat 12 and the annular main body 11 along the radial direction, the second mounting seat 3 can slide along the connecting guide rods 13, and the vergence adjusting assembly 5 is in transmission connection with the plurality of second mounting seats 3, so that the second LED lithographic light source 4 on the second mounting seat 3 is simultaneously close to or far away from the first LED lithographic light source 2 on the first mounting seat 12. The vergence adjusting component 5 can adjust the divergence of the light source, is suitable for exposure of mask plates of different specifications, ensures that the illuminance distribution of light emitted by the light source at the edge and the middle part of the mask plate is uniform, ensures that the thickness of a pattern formed by photoresist after exposure is uniform, and improves the yield of products.
It should be noted here that the specifications of the first LED lithography light source 2 and the second LED lithography light source 4 may be set as needed.
Further, the lithography light source device further comprises a mounting frame 6, and a mounting hole 61 is formed in the top of the mounting frame 6, so that the mounting frame 6 can be conveniently hung on the lithography machine in an inverted mode. The vergence adjusting assembly 5 comprises a first rotating screw 51, a driving ring 52, a first link 53, a second link 54 and a telescopic link 55 sleeved in the second link 54, wherein the telescopic link 55 can be extended or retracted relative to the second link 54 for changing the total length of the second link 54 and the telescopic link 55. The first end of first rotation screw rod 51 rotates with mounting bracket 6 to be connected, and the second end of first rotation screw rod 51 rotates with first mount pad 12 to be connected, and the one end that the telescopic link 55 was kept away from to the second connecting rod 54 is articulated with mounting bracket 6, and the one end that the telescopic link 55 kept away from second connecting rod 54 is articulated with second mount pad 3, and the inner circle threaded connection of driving ring 52 is on first rotation screw rod 51, and the one end of first connecting rod 53 articulates with the outer lane of driving ring 52, and the other end of first connecting rod 53 articulates with second connecting rod 54. The upper end of the first rotating screw rod 51 rotates relative to the mounting frame 6, the lower end of the first rotating screw rod 51 rotates relative to the first mounting seat 12, the driving ring 52 can move up and down relative to the first rotating screw rod 51, the second connecting rod 54 with the telescopic rod 55 swings relative to the mounting frame 6, and the second mounting seat 3 is driven to be close to or far from the first mounting seat 12. Under the interaction of the first connecting rod 53, the second connecting rod 54 and the telescopic rod 55, the distances between the plurality of groups of second LED photoetching light sources 4 and the first LED photoetching light sources 2 can be synchronously adjusted, the purpose of adjusting the divergence of the light sources is further achieved, the exposure device is applicable to masks with different specifications, and the yield of products is increased.
Further, the vergence adjusting assembly 5 further comprises a first motor 56, the first motor 56 is arranged in the mounting frame 6, and the first motor 56 is in transmission connection with the first rotating screw 51. The controller is electrically connected to the first motor 56, and drives the first rotary screw 51 to rotate by controlling the forward and reverse rotation of the first motor 56.
The traditional light source installation device can not adjust the irradiation angle of the light source according to different lithography machines in the exposure process, so that the light source can not be converged, and further the applicability is poor, and the actual use requirement is difficult to meet.
In order to solve the above problem, further, the lithographic light source device in this embodiment further includes an illumination angle adjusting assembly 7, the second LED lithographic light source 4 is rotatably connected with the second mount 3 through a support shaft 8, and the illumination angle adjusting assembly 7 is in transmission connection with the support shaft 8 so that the second LED lithographic light source 4 rotates by a set angle with respect to the second mount 3. Through the irradiation angle adjusting part that sets up, can adjust the irradiation angle of second LED photoetching light source 4 to be applicable to the installation of different light source demands, increased the practicality of device, solved among the prior art unable irradiation angle to the light source according to different photoetching machines and adjusted, make the light source unable to assemble, and then make its suitability relatively poor, be difficult to satisfy the problem of in-service use demand.
Further, the irradiation angle adjusting assembly 7 comprises an annular lifting adjusting frame 71, a fixed ring 72 and a rack 73, wherein a plurality of guide rails 74 extending along the radial direction are arranged on the inner wall surface of the annular lifting adjusting frame 71, one end of the fixed ring 72 is slidably arranged in a first guide groove 75 of the guide rails 74, a limiting piece 31 of the second mounting seat 3 is arranged in a second guide groove 721 of the fixed ring 72 in a penetrating mode, the rack 73 is arranged on the outer wall surface of the fixed ring 72, a gear 81 is arranged at one end of the supporting shaft 8, and the gear 81 is meshed with the rack 73. The annular lifting adjusting frame 71 drives the rack 73 on the fixed ring 72 to move up and down, so that the gear 81 drives the second LED lithography light source 4 on the supporting shaft 8 to rotate by a set angle, and the actual use requirement is met. Since the fixing ring 72 can slide along the first guide groove 75 of the guide rail 74, the stopper 31 can slide along the second guide groove 721 of the fixing ring 72, so that the vergence adjustment and the irradiation angle adjustment do not affect each other, and the rationality of the structure is increased.
The combination of the gear 81 and the rack 73 evenly sets up the multiunit along annular lift adjustment frame 71 inside, and the setting quantity of the combination of gear 81 and rack 73 is corresponding with connecting guide arm 13, can carry out synchronous adjustment to the irradiation angle of all second LED photoetching light sources 4 to be applicable to the installation of different light source demands, increased the practicality of device.
Illustratively, in the present embodiment, gears 81 are disposed on both sides of the support shaft 8, and an avoidance space is formed between two adjacent guide rails 74, through which the telescopic rod 55 passes, so that structural interference is avoided.
Further, the irradiation angle adjusting assembly 7 comprises a connecting hanging bracket 76 and a second rotating screw 77, the second rotating screw 77 is rotatably arranged on the mounting frame 6, two ends of the connecting hanging bracket 76 are connected with the annular lifting adjusting frame 71, and the middle section of the connecting hanging bracket 76 is in threaded connection with the second rotating screw 77. Illustratively, in the present embodiment, a screw hole 761 is provided in the connection hanger 76, and the second rotation screw 77 is connected to the screw hole 761. The rotation of the second rotating screw 77 can drive the connecting hanger 76 and the lifting adjusting frame to move up and down together, so that the irradiation angle of the second LED lithography light source 4 is adjusted.
Further, the irradiation angle adjusting assembly 7 further comprises a second motor 78, the second motor 78 is arranged in the mounting frame 6, and the second motor 78 is in transmission connection with the second rotating screw 77. The controller is electrically connected to the second motor 78, and drives the second rotary screw 77 to rotate by controlling the forward and reverse rotation of the second motor 78. It should be noted that the model and specification of the first motor 56 and the second motor 78 need to be selected according to the actual use situation.
Further, the annular main body 11 is vertically provided with a guide post 14, the annular lifting adjusting frame 71 is provided with a guide hole 711, and the guide post 14 is penetrated in the guide hole 711. By the cooperation of the guide posts 14 and the guide holes 711, it is ensured that the annular lifting adjusting frame 71 can only move up and down in the vertical direction, and the annular lifting adjusting frame 71 is restricted from rotating.
Further, a stopper 15 is provided at one end of the guide post 14 away from the annular body 11, and the annular lifting adjusting frame 71 is stopped at the stopper 15. Specifically, the outer diameter of the limiting head 15 is larger than the inner diameter of the guide hole 711, so that the lifting travel of the annular lifting adjusting frame 71 is limited, and the annular lifting adjusting frame 71 is prevented from slipping off the guide post 14.
Specifically, the first rotating screw 51 and the second rotating screw 77 are coaxially disposed. The number of the connecting guide rods 13 arranged on the inner wall of the bearing frame 1 and the number of the second installation seats 3 are six groups. In other embodiments, there may be two, three or four groups, without undue limitation.
The embodiment also provides a photoetching machine, which comprises a machine case and the photoetching light source device, wherein the photoetching light source device is arranged in the machine case. According to the photoetching machine provided by the utility model, the photoetching light source device is arranged in the machine case, the divergence and the irradiation angle of the light source can be adjusted according to different specifications of masks, and the defective rate of products is reduced.
To sum up, the working principle of the lithography light source device is as follows: when the device is used, the device is mounted at a proper position on the photoetching machine through the mounting frame 6, when the divergence of a light source is required to be adjusted, the first motor 56 is controlled to rotate forwards or reversely, the first screw fixedly connected with the output end of the first driving motor is driven to rotate, the driving ring 52 connected with the outer wall of the first screw is driven to move up and down, the first connecting rod 53 is driven to pull the second connecting rod 54 and the telescopic rod 55 to drive the second mounting seat 3 to move on the connecting guide rod 13 of the bearing frame 1, and the second LED photoetching light sources 4 are driven to synchronously move, so that the purposes of synchronously adjusting the divergence of the light sources relative to the distances of the first LED photoetching light sources 2 are achieved, exposure applicable to masks of different specifications can be achieved, and the yield of products is increased. After the adjustment is finished, the second motor 78 is controlled to rotate positively and reversely according to the requirement, and the annular lifting adjusting frame 71 is pulled to slide on the outer wall of the guide post 14 through the connecting hanging frame 76, so that the guide rail 74 drives the fixed ring 72 to move synchronously, and the second LED lithography light source 4 is driven to rotate under the interaction of the rack 73, the gear 81 and the supporting shaft 8, so that the aim of synchronously adjusting the irradiation angles of all the second LED lithography light sources 4 is fulfilled.
Note that the above is only a preferred embodiment of the present utility model and the technical principle applied. It will be understood by those skilled in the art that the present utility model is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the utility model. Therefore, while the utility model has been described in connection with the above embodiments, the utility model is not limited to the embodiments, but may be embodied in many other equivalent forms without departing from the spirit or scope of the utility model, which is set forth in the following claims.

Claims (10)

1. A lithographic light source apparatus, comprising:
the bearing frame (1) comprises an annular main body (11), a first mounting seat (12) and a plurality of connecting guide rods (13) which extend along the radial direction of the annular main body (11), wherein the first ends of the connecting guide rods (13) are connected with the inner wall surface of the annular main body (11), the second ends of the connecting guide rods (13) are connected with the outer wall surface of the first mounting seat (12), and the first mounting seat (12) is used for mounting a first LED photoetching light source (2);
the second installation seats (3) are arranged on the connecting guide rod (13) in a sliding mode, and the second installation seats (3) are used for installing second LED photoetching light sources (4);
and the vergence adjusting assembly (5) is in transmission connection with the plurality of second mounting seats (3) and is used for driving the plurality of second mounting seats (3) to be close to or far away from the first mounting seat (12) at the same time.
2. The lithographic light source device according to claim 1, further comprising a mounting frame (6), wherein the vergence adjusting assembly (5) comprises a first rotating screw (51), a driving ring (52), a first connecting rod (53), a second connecting rod (54) and a telescopic rod (55) sleeved in the second connecting rod (54), a first end of the first rotating screw (51) is rotatably connected with the mounting frame (6), a second end of the first rotating screw (51) is rotatably connected with the first mounting seat (12), one end of the second connecting rod (54) away from the telescopic rod (55) is hinged with the mounting frame (6), one end of the telescopic rod (55) away from the second connecting rod (54) is hinged with the second mounting seat (3), an inner ring of the driving ring (52) is in threaded connection with the first rotating screw (51), one end of the first connecting rod (53) is hinged with the driving ring (52), and the other end of the first connecting rod (53) is hinged with the second connecting rod (54).
3. A lithographic light source apparatus according to claim 2, wherein the vergence adjustment assembly (5) further comprises a first motor (56), the first motor (56) being arranged in the mounting frame (6), and the first motor (56) being in driving connection with the first rotation screw (51).
4. The lithographic light source device according to claim 2, further comprising an illumination angle adjustment assembly (7), wherein the second LED lithographic light source (4) is rotatably connected to the second mount (3) via a support shaft (8), and wherein the illumination angle adjustment assembly (7) is drivingly connected to the support shaft (8) to rotate the second LED lithographic light source (4) a set angle relative to the second mount (3).
5. The lithographic light source device according to claim 4, wherein the irradiation angle adjusting assembly (7) comprises an annular lifting adjusting frame (71), a fixing ring (72) and a rack (73), wherein a plurality of guide rails (74) extending along the radial direction are arranged on the inner wall surface of the annular lifting adjusting frame (71), one end of the fixing ring (72) is slidably arranged in a first guide groove (75) of the guide rails (74), a limiting piece (31) of the second mounting seat (3) is arranged in a second guide groove (721) of the fixing ring (72) in a penetrating manner, the rack (73) is arranged on the outer wall surface of the fixing ring (72), a gear (81) is arranged at one end of the supporting shaft (8), and the gear (81) is meshed with the rack (73).
6. The lithographic light source device according to claim 5, wherein the irradiation angle adjusting assembly (7) comprises a connection hanger (76) and a second rotating screw (77), the second rotating screw (77) is rotatably arranged on the mounting frame (6), both ends of the connection hanger (76) are connected with the annular lifting adjusting frame (71), and a middle section of the connection hanger (76) is in threaded connection with the second rotating screw (77).
7. The lithographic light source apparatus according to claim 6, wherein the illumination angle adjustment assembly (7) further comprises a second motor (78), the second motor (78) is arranged in the mounting frame (6), and the second motor (78) is in driving connection with the second rotation screw (77).
8. A lithographic light source apparatus according to claim 5, wherein the annular body (11) is provided with a guiding post (14), the annular lifting adjustment frame (71) is provided with a guiding hole (711), and the guiding post (14) is arranged in the guiding hole (711) in a penetrating manner.
9. A lithographic light source apparatus according to claim 8, wherein an end of said guiding stud (14) remote from said annular body (11) is provided with a limit head (15), said annular lifting adjustment frame (71) being stopped at said limit head (15).
10. A lithographic apparatus comprising a housing and a lithographic light source device according to any one of claims 1 to 9, the lithographic light source device being mounted in the housing.
CN202321287017.0U 2023-05-25 2023-05-25 Photoetching light source device and photoetching machine Active CN219916176U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202321287017.0U CN219916176U (en) 2023-05-25 2023-05-25 Photoetching light source device and photoetching machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202321287017.0U CN219916176U (en) 2023-05-25 2023-05-25 Photoetching light source device and photoetching machine

Publications (1)

Publication Number Publication Date
CN219916176U true CN219916176U (en) 2023-10-27

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CN202321287017.0U Active CN219916176U (en) 2023-05-25 2023-05-25 Photoetching light source device and photoetching machine

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