CN219811124U - Positioning workbench for laser direct writing lithography - Google Patents

Abstract

The utility model relates to the technical field of positioning motion control, and particularly discloses a positioning workbench for laser direct-writing lithography, which comprises a scanning positioning motion platform, a stepping positioning motion platform and an alignment positioning motion platform.

Description

Positioning workbench for laser direct writing lithography

Technical Field

The utility model belongs to the technical field of positioning motion control, and particularly relates to a positioning workbench for laser direct writing lithography.

Background

In the mechanical manufacturing on the market at present, the imaging quality of the laser direct imaging technology is clearer than that of the traditional exposure technology, so that the laser direct imaging technology has obvious advantages in the manufacturing of middle-high-end printed circuit boards. The laser direct imaging technology is to directly project a circuit pattern on a circuit board coated with photoresist in the form of a laser beam, so as to realize pattern transfer lithography on the circuit board. The technology saves the working procedure of manufacturing film negative films or photomasks, and realizes the advantages of high productivity, high alignment precision and good exposure quality.

However, the prior art solutions described above have the following drawbacks: the positioning motion platform of the laser direct imaging device in the prior art mainly comprises a scanning positioning motion platform, a stepping positioning motion platform and an alignment positioning motion platform, wherein an optical path system cantilever moving on the upper part of the stepping positioning motion platform is fixedly installed, the optical path system is installed on the side edge of an optical path installation bottom plate, and the exposure center position of the optical path system is far away from the center position of the stepping positioning motion platform. Meanwhile, the marble is arranged on the stepping positioning moving platform and the alignment positioning moving platform as a separation structure, the long-term stability and the small deformation of the marble are considered, the marble size of the stepping positioning moving platform and the marble size of the alignment positioning moving platform are large, the effective stroke of the scanning positioning moving platform is increased, the exposure center position of the optical path system is further and further far away from the movement center position of the positioning platform, the Abbe error (the axis of the measuring instrument and the axis of the workpiece to be measured are required to be on the same straight line, otherwise, an error is generated, the error is called Abbe error) is also larger, and therefore the error of the exposure precision of the laser direct imaging equipment is larger, and the exposure yield of the direct-writing photoetching machine is reduced.

Disclosure of Invention

The embodiment of the utility model aims to provide a positioning workbench for laser direct-writing lithography, which is used for solving the problem that the center position of exposure of an optical path system is far away from the center position of a positioning motion platform in the conventional laser direct-imaging equipment positioning motion platform provided in the background technology.

The embodiment of the utility model is realized in such a way that the positioning workbench for laser direct-writing lithography comprises a scanning positioning motion platform, and the positioning workbench for laser direct-writing lithography further comprises:

a step positioning motion platform positioned above the scanning positioning motion platform and an alignment positioning motion platform; and

the optical path system is arranged on the step positioning motion platform and is used for driving the optical path system to perform step motion exposure; wherein, the light path system movement center line coincides with the center line of the stepping positioning motion platform.

Preferably, the positioning workbench for laser direct writing lithography comprises a scanning positioning motion platform, the scanning positioning motion platform is installed on a scanning base, and the positioning workbench for laser direct writing lithography further comprises:

the vertical lifting shaft is arranged on the scanning positioning motion platform, and is provided with a working sucker which is used for placing a workpiece to be processed or detected;

the device comprises a stepping positioning motion platform and an alignment positioning motion platform, wherein a stepping base is arranged at the edge position of the upper part of the scanning base, and the stepping positioning motion platform and the alignment positioning motion platform are arranged on the same stepping base;

the stepping positioning motion platform is used for driving the optical path system to perform stepping motion exposure; the output end of the alignment positioning motion platform is provided with CCD measuring equipment for positioning and measuring a workpiece to be processed or detected; the scanning positioning motion platform is used for carrying a vertical lifting shaft to move forward and backward relative to the scanning base.

Preferably, the alignment positioning motion platform comprises a limiting motion guide rail, wherein an alignment motion assembly capable of moving along the side line direction of the limiting motion guide rail is arranged on the limiting motion guide rail, and the alignment motion assembly is used for bearing the CCD measuring device.

Preferably, the step positioning motion platform comprises a linear guide rail, a linear motor stator, a linear motor rotor, a linear grating ruler, a reading head and an optical path installation bottom plate, wherein the linear guide rail is installed on the upper portion of the step base, the optical path installation bottom plate is installed on the linear guide rail, and the optical path system is installed on the optical path installation bottom plate.

The beneficial effects of the utility model are as follows:

compared with the prior art, the positioning workbench for laser direct-writing lithography, provided by the embodiment of the utility model, comprises a scanning positioning motion platform, a stepping positioning motion platform and an alignment positioning motion platform, has a compact structure and small equipment space size, and reduces the influence of dynamic characteristics and Abbe errors of the positioning motion platform on the position precision of the device due to the coincidence of the moving center line of the optical path system and the center line of the stepping positioning motion platform, and improves the exposure precision and yield of laser direct-imaging equipment, thereby improving the practicability of the device.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the following description will briefly introduce the drawings that are needed in the embodiments or the description of the prior art, and it is obvious that the drawings in the following description are only some embodiments of the present utility model.

FIG. 1 is a schematic diagram of a positioning stage for laser direct-write lithography according to an embodiment of the present utility model.

FIG. 2 is a schematic diagram of a step positioning motion stage in a positioning stage for laser direct-write lithography according to an embodiment of the present utility model.

FIG. 3 is a cross-sectional view of a hollow structure of a stepper positioning motion platform in a positioning table for laser direct-write lithography, according to an embodiment of the present utility model.

FIG. 4 is a schematic diagram of a positioning stage for alignment and positioning in a positioning stage for laser direct-write lithography according to an embodiment of the present utility model.

In the figure: 1-scanning and positioning a motion platform; 2-step positioning a motion platform; 3-aligning and positioning the motion platform; 4-an optical path system; 5-an optical path mounting base plate; 6-stepping a base; 7-scanning a base; 8-a vertical lifting shaft; 9-a working sucker; 10-linear guide rails; 11-a linear motor stator; 12-a linear motor mover; 13-a linear grating ruler; 14-reading head; 15-aligning the motion assembly; 16-CCD measuring device.

Detailed Description

In order to make the technical problems, technical solutions and advantageous effects to be solved by the present utility model more clear, the technical solutions in the present embodiments will be clearly and completely described below with reference to the drawings in the present embodiments, and it is apparent that the described embodiments are only some embodiments of the present utility model, but not all embodiments. All other embodiments, based on the embodiments herein, which would be within the purview of one of ordinary skill in the art without the creative effort, are contemplated as falling within the scope of the present utility model.

In the description of the present utility model, it is to be understood that unless explicitly specified and limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, as well as the first and second features not being in direct contact but being in contact by another feature therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly under and obliquely below the second feature, or simply means that the first feature is less level than the second feature. The above indicated azimuth or positional relationship is based on the azimuth or positional relationship shown in the drawings, and is merely for convenience of description and simplification of description, and thus is not to be construed as limiting the utility model. Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first", "a second", etc. may explicitly or implicitly include one or more such feature. In the description of the present utility model, unless otherwise indicated, the meaning of "a plurality" is two or more.

Specific implementations of the utility model are described in detail below in connection with specific embodiments.

Firstly, it should be noted that, the positioning motion platform of the laser direct imaging device in the prior art mainly includes a scanning positioning motion platform, a stepping positioning motion platform and an alignment positioning motion platform, the cantilever of an optical path system moving on the upper portion of the stepping positioning motion platform is fixedly installed, the optical path system is installed at the side edge of an optical path installation bottom plate, the exposure center position of the optical path system is far away from the center position of the stepping positioning motion platform, the dynamic characteristic of the positioning motion platform, namely Yaw, pitch, roll (the euler angle is composed of three angles, namely Yaw, pitch, roll, the three angles are respectively, wherein, yaw represents an angle rotating around the y axis, pitch represents an angle rotating around the x axis, roll represents an angle rotating around the z axis), and the like all have an important influence on the position accuracy of the positioning motion platform, and the further the exposure center position of the optical path system is away from the motion center position of the precise positioning platform, the abbe error value is larger, the error of the exposure accuracy of the laser direct imaging device is larger, and the exposure yield of the direct imaging device is reduced.

In addition, the marble platform is a precise reference measuring tool made of natural stone materials, the main mineral components of the marble platform are pyroxene, plagioclase, a small amount of olivine, biotite and trace magnetite, the marble platform has the advantages of good stability, high strength and high hardness, can keep high precision under heavy load, is an ideal reference surface for instrument and meter, laboratory measurement, precise tool and mechanical part inspection, and particularly is used for high-precision measurement, and mechanical parts and marble can be naturally combined, so that the positioning movement platform of the laser direct imaging device in the prior art is made of marble, and the mechanical positioning precision is higher. However, there is a problem in that the marble is installed on the step positioning moving platform and the alignment positioning moving platform as a separate structure, and in consideration of the long-term stability and small deformation of the marble, the marble size of the step positioning moving platform and the alignment positioning moving platform is large, and the effective stroke of the scanning positioning moving platform is increased, which is disadvantageous to the reduction of the space size of the laser direct imaging device, and further results in that the further the farther the exposure center position of the optical path system is from the movement center position of the precise positioning platform, the larger the abbe error value is, and the larger the error of the exposure precision of the laser direct imaging device is.

In order to solve the above problems, the present utility model provides a positioning workbench for laser direct-writing lithography, as shown in fig. 1-4, which is a structural diagram of a positioning workbench for laser direct-writing lithography according to an embodiment of the present utility model, and in particular, is a positioning motion platform of a laser direct-writing lithography apparatus, which can improve exposure precision and yield of the laser direct-imaging apparatus, and is not only suitable for the laser direct-writing lithography apparatus, but also suitable for the plate-making lithography technology field, the PCB direct-writing lithography technology field, or other technology fields applied to the positioning motion platform, where the positioning workbench for laser direct-writing lithography includes a scanning positioning motion platform 1, and the positioning workbench for laser direct-writing lithography further includes:

a step positioning motion platform 2 and an alignment positioning motion platform 3 which are positioned above the scanning positioning motion platform 1; and

the optical path system 4 is arranged on the step positioning motion platform 2, and the step positioning motion platform 2 is used for driving the optical path system 4 to perform step motion exposure; wherein the moving center line of the optical path system 4 coincides with the center line of the stepping positioning motion platform 2.

Further, as a preferred embodiment of the present utility model, the positioning table for laser direct writing lithography includes a scanning positioning motion platform 1, the scanning positioning motion platform 1 is mounted on a scanning base 7, a vertical lifting shaft 8 is disposed on the scanning positioning motion platform 1, a working chuck 9 is mounted on the vertical lifting shaft 8, the working chuck 9 is used for placing a workpiece to be processed or detected, and the positioning table for laser direct writing lithography further includes:

the device comprises a stepping positioning motion platform 2 and an alignment positioning motion platform 3, wherein a stepping base 6 is arranged at the edge position of the upper part of a scanning base 7, and the stepping positioning motion platform 2 and the alignment positioning motion platform 3 are arranged on the same stepping base 6;

the stepping positioning motion platform 2 is provided with an optical path system 4, and the stepping positioning motion platform 2 is used for driving the optical path system 4 to perform stepping motion exposure; the output end of the alignment positioning motion platform 3 is provided with CCD measuring equipment 16 for positioning and measuring a workpiece to be processed or detected; the scanning positioning moving platform 1 is used for carrying a vertical lifting shaft 8 to move forward and backward relative to the scanning base 7.

In the embodiment of the utility model, the scanning positioning motion platform 1 is used for carrying the vertical lifting shaft 8 to move forward and backward relative to the scanning base 7, so as to drive the working sucker 9 arranged on the vertical lifting shaft 8 to move forward and backward, thereby driving the workpiece to be processed or detected placed on the working sucker 9 to move forward and backward, meanwhile, the stepping positioning motion platform 2 drives the optical path system 4 to move in a stepping manner so as to realize exposure, and in addition, the alignment positioning motion platform 3 drives the CCD measuring device 16 to move so as to realize alignment positioning, so that the workpiece to be processed or detected is positioned and measured.

In one example of the utility model, the positioning workbench for laser direct-writing lithography is provided with the scanning positioning motion platform 1, the stepping positioning motion platform 2 and the alignment positioning motion platform 3, so that the structure is compact, the equipment space size is small, the moving center line of the optical path system 4 coincides with the center line of the stepping positioning motion platform 2, the exposure center position of the optical path system 4 can be infinitely close to the motion center position of the whole device, the problem that the exposure center position of the optical path system is far away from the center position of the positioning motion platform in the existing laser direct-imaging equipment positioning motion platform is solved, the influence of the dynamic characteristic and Abbe error of the positioning motion platform on the position precision of the device is reduced, and the exposure precision and the yield of the laser direct-imaging equipment are improved.

In yet another embodiment of the present utility model, the CCD (Charge-coupled Device) in the CCD measuring Device 16 is a Charge-coupled Device, and is actually an optical sensor, which is made of a semiconductor material with high sensitivity, and can convert light into electric charges, and convert the electric charges into digital signals through an analog-to-digital converter chip, that is, can convert optical images into digital signals, and the digital signals can easily transmit data to a computer, and the processing means of the computer is used. In practical applications, the CCD measuring device 16 may be an existing product, for example, an existing CCD detector, or an industrial high-speed CCD camera, which is specifically selected according to needs, and is not limited herein, for example, a photo-electric correction sensor of type CCD-5000A of micin mechanical tin-free limited company may be used, which is illustrated in the embodiment of the present utility model, but is not limited thereto.

In yet another example of the present utility model, the materials of the scanning base (7) and the stepping base (6) may be metal, stone, plastic, etc., and are specifically selected according to need, but the present utility model is not limited thereto, however, it has been said that the marble stage is a precision reference measuring tool made of natural stone material, and is particularly suitable for high-precision measurement, so in this embodiment, the scanning base (7) and the stepping base (6) are both made of marble material, i.e., the scanning marble base 7 and the stepping marble base.

Further, as a preferred embodiment of the present utility model, the alignment motion platform 3 includes a limiting motion rail, on which an alignment motion assembly 15 capable of moving along a side line direction of the limiting motion rail is disposed, and the alignment motion assembly 15 is used for carrying the CCD measuring device 16.

In the embodiment of the utility model, the alignment motion assembly 15 is driven to reciprocate through the limit motion guide rail, so that the position of the CCD measuring device 16 can be flexibly adjusted according to the requirement, and the exposure center position of the optical path system 4 is close to the motion center position of the whole device, thereby reducing the influence of dynamic characteristics and Abbe errors on the position precision of the whole device.

Further, as a preferred embodiment of the present utility model, the stepping positioning motion platform 2 includes a linear guide rail 10, a linear motor stator 11, a linear motor mover 12, a linear grating ruler 13, a reading head 14, and an optical path mounting base plate 5, wherein the linear guide rail 10 is mounted on the upper portion of the stepping base 6, the optical path mounting base plate 5 is mounted on the linear guide rail 10, and the optical path system 4 is mounted on the optical path mounting base plate 5.

In the embodiment of the present utility model, specifically, the optical path installation base plate 5 is installed on the upper portion of the linear guide rail 10, the optical path system 4 is installed on the upper portion of the optical path installation base plate 5, and by setting the linear guide rail 10, the optical path installation base plate 5 can move relative to the linear guide rail 10, so as to drive the optical path system 4 to perform step motion exposure.

In one embodiment of the present utility model, the reading head 14 may be a product in the prior art, because the reading head 14 is a sensor for reading a grating scale, its position and distance from the grating are precisely adjusted, and the linear grating scale 13 is correspondingly used as a scale to be matched with the reading head 14, specifically, a product with a corresponding model may be used, and a specific model is selected according to needs, which is not limited herein, for example, a model of the kunsan industrial equipment limited company is RGH22B50L00A reading head product, which is actually a high-precision displacement sensor, and of course, other products may also be used, so long as displacement detection control with high precision and good stability can be achieved.

Further, as a preferred embodiment of the present utility model, the optical path system 4 is installed at an upper portion of the optical path installation base plate 5, and the optical path system 4 can perform step motion exposure through the optical path installation base plate 5 and the step base 6.

In the embodiment of the utility model, the optical path system 4 is arranged at the upper part of the optical path mounting base plate 5, and the stepping positioning motion platform 2 drives the optical path system 4 to perform stepping motion so as to realize exposure, and the optical path system 4 performs stepping motion exposure through the optical path mounting base plate 5 and the stepping base 6.

Further, as a preferred embodiment of the present utility model, the step positioning motion platform 2 is mounted on the upper portion of the step base 6, the alignment positioning motion platform 3 is mounted on the side surface of the step base 6, and the alignment positioning motion platform 3 includes a plurality of sets of alignment motion assemblies 15 mounted thereon; by arranging the multiple groups of alignment motion assemblies 15, simultaneous detection of multiple workpieces can be realized, and the working efficiency is effectively improved.

Further, as a preferred embodiment of the present utility model, the vertical lifting shaft 8 and the working chuck 9 are installed at the upper portion of the scan positioning stage 1.

In one example of the utility model, a plurality of working suckers 9 are arranged, so that a plurality of workpieces can be placed at the same time by arranging a plurality of working suckers 9, and the plurality of workpieces can be detected at the same time by matching with the plurality of groups of alignment motion assemblies 15.

Further, as a preferred embodiment of the present utility model, a hollow structure is formed in the middle of the step base 6, so that the optical path system 4 can move forward and backward along the step positioning motion platform 2; through having set up hollow structure, can provide the light path system 4 along the activity space of step by step positioning motion platform 2 forward and backward movement, effectively guaranteed the security of operation.

Further, as a preferred embodiment of the present utility model, the moving center line of the optical path system 4 coincides with the center line of the stepping positioning moving platform 2, and in general, the exposure center position of the optical path system of the precision positioning platform in the prior art is far away from the movement center position of the precision positioning platform, and the positioning workbench for laser direct writing lithography is configured such that the further the exposure center position of the optical path system is away from the movement center position of the precision positioning platform, the greater the error of the exposure precision of the generated laser direct imaging device and the lower the exposure yield of the direct writing lithography machine are avoided.

As a preferred embodiment of the present utility model, the linear motor stator 11 is mounted on the side wall of the hollow structure of the stepping base 6, and the linear motor mover 12 can move relative to the linear motor stator 11; through the cooperation of the linear motor stator 11 and the linear motor rotor 12, the light path installation bottom plate 5 can be driven to move relative to the linear guide rail 10, so that the light path system 4 is driven to perform stepping motion exposure.

Further, as a preferred embodiment of the present utility model, the alignment motion assembly 15 may drive the installed CCD measuring device 16 to move forward and backward on the alignment motion platform 3.

The implementation principle of the embodiment is as follows: the scanning positioning motion platform 1 carries the vertical lifting shaft 8 to move forward and backward relative to the scanning base 7, and then the working sucker 9 arranged on the vertical lifting shaft 8 is driven to move forward and backward, so that the workpiece to be processed or detected placed on the working sucker 9 is driven to move forward and backward, meanwhile, the stepping positioning motion platform 2 drives the optical path system 4 to perform stepping motion so as to realize exposure, in addition, the alignment positioning motion platform 3 drives the CCD measuring equipment 16 to perform motion so as to realize alignment positioning, so that the workpiece to be processed or detected is positioned and measured, and as the moving center line of the optical path system 4 coincides with the center line of the stepping positioning motion platform 2, the influence of dynamic characteristics of the positioning motion platform and Abbe errors on the position accuracy of the device is reduced, and the exposure accuracy and the yield of the laser direct imaging equipment are improved.

In the description of the present utility model, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present utility model can be understood by those of ordinary skill in the art in a specific case.

It should be further noted that standard parts used in the utility model can be purchased from market, special-shaped parts can be customized according to the description of the specification and the drawings, and specific connection modes of the parts can be conventional means such as mature bolts, rivets, welding and the like in the prior art, and are not described in detail herein.

The foregoing has shown and described the basic principles, principal features and advantages of the utility model. It will be understood by those skilled in the art that the present utility model is not limited to the above-described embodiments, and that the above-described embodiments and descriptions are only preferred embodiments of the present utility model, and are not intended to limit the utility model, and that various changes and modifications may be made therein without departing from the spirit and scope of the utility model as claimed. The scope of the utility model is defined by the appended claims and equivalents thereof.

Claims (10)

1. A positioning table for laser direct-write lithography, comprising a scanning positioning motion stage (1), characterized in that the positioning table for laser direct-write lithography further comprises:

a step positioning motion platform (2) and an alignment positioning motion platform (3) which are positioned above the scanning positioning motion platform (1); and

the optical path system (4) is arranged on the step positioning motion platform (2), and the step positioning motion platform (2) is used for driving the optical path system (4) to perform step motion exposure; wherein the moving center line of the light path system (4) coincides with the center line of the stepping positioning motion platform (2).

2. Positioning stage for laser direct write lithography according to claim 1, characterized in that the alignment positioning motion stage (3) comprises a limit motion rail on which an alignment motion assembly (15) is arranged, which is movable in the direction of the limit motion rail edge.

3. Positioning table for laser direct write lithography according to claim 2, characterized in that the positioning table for laser direct write lithography further comprises a vertical lift shaft (8) arranged on the scanning positioning motion platform (1), on which vertical lift shaft (8) a working chuck (9) is mounted, the scanning positioning motion platform (1) being adapted to move forward and backward carrying the vertical lift shaft (8).

4. A positioning table for laser direct writing lithography according to claim 3, wherein the scanning positioning motion stage (1) is mounted on a scanning base (7), a step base (6) is provided at an upper edge position of the scanning base (7), and the step positioning motion stage (2) and the alignment positioning motion stage (3) are mounted on the same step base (6).

5. The positioning workbench for laser direct writing lithography according to claim 4, wherein the stepping positioning motion platform (2) comprises a linear guide rail (10), a linear motor stator (11), a linear motor rotor (12), a linear grating ruler (13), a reading head (14) and an optical path mounting base plate (5), the linear guide rail (10) is mounted on the upper portion of the stepping base plate (6), the optical path mounting base plate (5) is mounted on the linear guide rail (10), and the optical path system (4) is mounted on the optical path mounting base plate (5).

6. Positioning stage for laser direct write lithography according to claim 5, characterized in that the light path system (4) is mounted on top of a light path mounting plate (5) and that the light path system (4) is stepwisely movable for exposure through the light path mounting plate (5) and the step base (6).

7. A positioning table for laser direct write lithography according to claim 6, wherein the step positioning motion stage (2) is mounted on top of the step base (6), the alignment positioning motion stage (3) is mounted on the side of the step base (6), and the alignment positioning motion stage (3) comprises a plurality of sets of alignment motion assemblies (15) mounted.

8. The positioning workbench for laser direct writing lithography according to claim 7, wherein a hollow structure is formed in the middle of the stepping base (6) for forward and reverse movement of the optical path system (4) along the stepping positioning motion platform (2).

9. Positioning table for laser direct write lithography according to claim 8, characterized in that the alignment positioning motion stage (3) output is provided with a CCD measuring device (16) for positioning the work piece to be processed or inspected.

10. Positioning table for laser direct write lithography according to claim 8, characterized in that the alignment motion assembly (15) can drive the mounted CCD measuring device (16) to move forward and backward on the alignment positioning motion platform (3).