CN219725569U - Semi-circular ring work piece rough surface grinding device - Google Patents

Abstract

The utility model relates to a semi-circular workpiece rough surface polishing device, which belongs to the technical field of automobile spare and accessory part processing and comprises a base, a clamping mechanism and a polishing mechanism, wherein an objective table for placing a semi-circular workpiece is connected to the base in a sliding manner, the polishing mechanism is connected with the base and comprises a polishing piece and a motor, the motor is fixedly arranged on the base, the polishing piece is rotationally connected to the base, the motor is fixedly connected with the polishing piece in a coaxial manner, the polishing piece is positioned below the semi-circular workpiece, a through hole for the polishing piece to extend out is formed in one end of the objective table far away from the base, the polishing piece is used for polishing an inner ring of the semi-circular workpiece, and the clamping mechanism is connected to the objective table in a sliding manner and is used for limiting the position of the semi-circular workpiece. The utility model has the effects of facilitating the rough surface polishing of the inner ring of the semicircular workpiece and improving the processing efficiency of the semicircular workpiece.

Description

Semi-circular ring work piece rough surface grinding device

Technical Field

The utility model relates to the technical field of automobile spare and accessory part machining, in particular to a semi-circular ring workpiece rough surface polishing device.

Background

Referring to fig. 1, the semicircular workpiece is widely applied to automobile parts, in a machining process, the rough surfaces of the outer ring and the inner ring of the semicircular workpiece are required to be polished, an existing semicircular workpiece polishing device requires a worker to hold the semicircular workpiece during polishing, and a polishing tool is used for polishing.

Disclosure of Invention

In order to facilitate rough surface polishing of an inner ring of a semicircular workpiece and improve the processing efficiency of the semicircular workpiece, the utility model provides a semicircular workpiece rough surface polishing device.

The utility model provides a semi-circular workpiece rough surface polishing device, which adopts the following technical scheme:

the utility model provides a semicircle ring work piece rough surface grinding device, includes base, fixture and grinding machanism, sliding connection has the objective table that is used for placing semicircle ring work piece on the base, grinding machanism with base fixed connection, grinding machanism includes grinding piece and motor, motor and grinding piece all fixed set up in on the base, the motor with the coaxial fixed connection of grinding piece, the grinding piece is located the below of semicircle ring work piece, the objective table is kept away from the one end of base has been offered and has been used for supplying the through-hole that the grinding piece stretched out, the grinding piece is used for right the inner circle of semicircle ring work piece is polished, fixture sliding connection in on the objective table, fixture is used for prescribing the position of semicircle ring work piece.

Through adopting above-mentioned technical scheme, the through-hole has been seted up to the objective table, semicircle ring work piece inner circle is placed on the objective table towards the through-hole, the piece of polishing stretches out in the objective table through the through-hole to polish the inner circle of work piece, and fixture's setting can inject the position of a plurality of work pieces, objective table and base sliding connection can make objective table drive the work piece and remove, makes the piece of polishing polish in batches the work piece, need not the manual taking of operating personnel, convenient and fast has promoted the machining efficiency of work piece.

Preferably, the objective table comprises a carrying plate and a sliding plate, the carrying plate is fixedly connected with the sliding plate, the carrying plate is parallel to the sliding plate, a placing space for accommodating the polishing piece is formed between the carrying plate and the sliding plate, and the sliding plate is in sliding connection with the base.

Through adopting above-mentioned technical scheme, sliding connection of board and base slides on the base can realize the objective table, and polisher mechanism is placed between carrying the thing board and the board that slides, can not make operating personnel touch by mistake and lead to injured.

Preferably, the carrier plate is fixedly arranged at a position close to the through hole and is used for placing the semi-circular ring workpiece, and the height between the carrier plate and the sliding plate is smaller than the height between the carrier plate and the sliding plate.

Through adopting above-mentioned technical scheme, because semicircle ring work piece is the arc, the setting of layer board can supply semicircle ring work piece's both ends to place, and highly be less than between the board that carries thing board and the board that slides between the board, can be convenient for semicircle ring work piece both ends place steadily, and the inner circle of work piece is placed towards the opening to realize polishing assembly to the work of polishing of work piece.

Preferably, the clamping mechanism comprises a first clamping assembly, the first clamping assembly comprises a first air cylinder, a first pushing plate and a second pushing plate, the first air cylinder is mounted on the carrying plate, a piston rod of the first air cylinder is detachably connected with the first pushing plate, the second pushing plate is fixedly connected to the carrying plate, the first pushing plate and the second pushing plate are parallel to each other, and the first air cylinder is used for driving the first pushing plate to slide.

Through adopting above-mentioned technical scheme, the setting of first clamping assembly can make the work piece centre gripping of more quantity between first push pedal and second push pedal, both can inject the space of placing of more quantity work piece, can avoid in the rough surface in-process of polishing again, and grinding machanism's power makes first push pedal shift.

Preferably, the clamping mechanism comprises a second clamping assembly, the second clamping assembly comprises a second cylinder and a limiting push plate, the second cylinder is mounted on the carrying plate, a piston rod of the second cylinder is detachably connected with the limiting push plate, the second cylinder is used for driving the limiting push plate to slide, and the pushing direction of the first clamping assembly is perpendicular to the pushing direction of the second clamping assembly.

Through adopting above-mentioned technical scheme, through the cooperation setting of first clamping component and second clamping component, with semicircle ring work piece centre gripping in the centre gripping space, inject the position of work piece, avoid the in-process work piece shift that polishes at the frosted surface.

Preferably, the clamping mechanism comprises a fixing assembly, the fixing assembly comprises a first connecting piece and a second connecting piece, one end of the first connecting piece is fixedly connected with a piston rod of the first cylinder, the other end of the first connecting piece is detachably connected with the second connecting piece, the first connecting piece is parallel to the second connecting piece, and the second connecting piece is fixedly connected with the first push plate.

Through adopting above-mentioned technical scheme, the second connecting piece can dismantle with first cylinder and be connected, can be convenient for change first cylinder, and because semicircle ring work piece is put in batches between first push pedal and second push pedal, and quantity is more to lead to weight increase, and first cylinder promotes the very easily damage that causes the piston rod of heavier body, so first connecting piece and second connecting piece can reduce the possibility that the piston rod damaged.

Preferably, the polishing mechanism comprises a mounting assembly for limiting the position of the polishing member, the mounting assembly comprises a mounting frame and a bearing seat, the mounting frame is fixedly connected to the base, the bearing seat is fixedly connected to the mounting frame, and an output shaft of the motor is rotatably connected with the bearing seat through a bearing.

Through adopting above-mentioned technical scheme, the position of polishing piece can be fixed in setting up of installation component, avoids polishing piece aversion and influences machining efficiency at the work piece rough surface in-process of polishing.

Preferably, the base is fixedly provided with a sliding rail and a third air cylinder, the sliding plate is slidably connected to the sliding rail, a piston rod of the third air cylinder is fixedly connected with the sliding plate, and the third air cylinder is used for driving the objective table to move along the sliding rail.

Through adopting above-mentioned technical scheme, because the work piece centre gripping of a lot of semicircle ring is between first push pedal and second push pedal, the cooperation setting of third cylinder and slide rail can drive the objective table and remove along the slide rail, under the equal fixed circumstances of work piece and grinding machanism, realizes the work of polishing to the inner circle of a lot of semicircle ring work piece.

In summary, the present utility model includes at least one of the following beneficial technical effects:

1. through the cooperation setting of first clamping component and second clamping component, can make once place the semicircle ring work piece of a relatively large number between first push pedal and the second push pedal, form one and place the space of placing of a relatively large number work piece, and spacing push pedal offsets with the one end of semicircle ring work piece, can avoid the work piece to shift at the frosting in-process of polishing, reduce machining efficiency, because can produce a lot of piece at the in-process that the frosting polished, first push pedal, second push pedal and spacing push pedal can prevent piece entering first cylinder and second cylinder.

2. Through the arrangement of the fixing component, the first cylinder is convenient to replace when damaged, and the fixing component can prevent the piston rod from being damaged due to the fact that the first cylinder directly pushes a large number of workpieces;

3. through the cooperation setting of slide rail and third cylinder, can realize the removal to the objective table to realize carrying out the polishing of more a lot of work piece inner circles under the fixed circumstances of grinding machanism.

Drawings

FIG. 1 is a schematic view of a semi-circular ring workpiece according to the background of the utility model;

FIG. 2 is a schematic structural view of a rough surface grinding device for a semicircular workpiece according to an embodiment of the present utility model;

FIG. 3 is a schematic view of a clamping mechanism according to an embodiment of the present utility model;

FIG. 4 is a schematic view of a fixing assembly according to an embodiment of the present utility model;

fig. 5 is a schematic structural view of a polishing mechanism according to an embodiment of the present utility model.

Reference numerals illustrate: 1. a base; 11. a third cylinder; 12. a slide rail; 2. a clamping mechanism; 21. a first clamping assembly; 211. a first cylinder; 212. a first push plate; 2121. a third connecting block; 213. a second push plate; 22. a second clamping assembly; 221. a second cylinder; 222. a limit push plate; 223. a side plate; 224. a connecting column; 23. a fixing assembly; 231. a first connector; 2311. a first connection block; 232. a second connector; 2321. a second connection block; 24. a through hole; 3. a polishing mechanism; 31. a polishing member; 32. a motor; 33. a mounting assembly; 331. a mounting frame; 332. a bearing; 333. a bearing seat; 34. a transmission shaft; 4. an objective table; 41. a carrying plate; 411. a through port; 412. a supporting plate; 413. a first base plate; 414. a second base plate; 42. a slip plate; 43. placing space; 100. a semicircular workpiece; 1001. an outer ring; 1002. an inner ring.

Detailed Description

The present utility model is described in further detail below with reference to fig. 1-5.

In the description of the present utility model, it should be understood that the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In the description of the present utility model, the meaning of "plurality" means at least two, for example, two, three, etc., unless specifically defined otherwise.

The terms "upper," "lower," "left," "right," and the like are used for convenience in describing and simplifying the present utility model based on the orientation or positional relationship shown in the drawings, and do not denote or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the present utility model.

Referring to fig. 1 and 2, a semi-circular workpiece rough surface polishing device comprises a base 1, a clamping mechanism 2 and a polishing mechanism 3, wherein an objective table 4 is slidably connected to the base 1, the objective table 4 comprises an objective table 41 and a sliding plate 42, the objective table 41 and the sliding plate 42 are fixedly connected, the sliding plate 42 is slidably connected to the base 1, the objective table 41 is arranged at one end, far away from the base 1, of the sliding plate 42, the polishing mechanism 3 is fixedly connected to the base 1, the polishing mechanism 3 is used for polishing an inner ring 1002 of the semi-circular workpiece 100, a placing space 43 for placing the polishing mechanism 3 is formed between the objective table 41 and the sliding plate 42, the semi-circular workpiece 100 is placed on the objective table 41, the clamping mechanism 2 is slidably connected to the objective table 41, and the clamping mechanism 2 is used for limiting the position of the semi-circular workpiece 100.

Referring to fig. 1 and 3, a through hole 411 is formed in the carrier plate 41 along the length direction thereof, a supporting plate 412 for placing the semicircular workpiece 100 is fixedly arranged at a position, close to the through hole 411, of the carrier plate 41, the vertical height between the supporting plate 412 and the sliding plate 42 is smaller than that between the carrier plate 41 and the sliding plate 42, two supporting plates 412 are arranged along the length direction of the carrier plate 41, the two supporting plates 412 are oppositely arranged, two ends of the semicircular workpiece 100 are respectively placed on the two supporting plates 412, and an inner ring 1002 of the semicircular workpiece 100 faces the through hole 411 when placed.

Referring to fig. 2 and 4, the clamping mechanism 2 includes a first clamping assembly 21, a second clamping assembly 22 and a fixing assembly 23, the first clamping assembly 21 and the fixing assembly 23 are detachably connected, the first clamping assembly 21 includes a first cylinder 211, a first push plate 212 and a second push plate 213, the first cylinder 211 is detachably connected with the first push plate 212 through the fixing assembly 23, the first cylinder 211 is used for driving the fixing assembly 23 and the first push plate 212 to slide on the carrier plate 41, the second push plate 213 is fixedly connected with the carrier plate 41, the first push plate 212 and the second push plate 213 are parallel to each other, and a clamping space for clamping the semicircular workpiece 100 is formed between the first push plate 212 and the second push plate 213, the fixing assembly 23 in the embodiment of the utility model includes a first connecting piece 231 and a second connecting piece 232, the first connecting piece 231 and the second connecting piece 232 are arranged parallel to each other, the first connecting piece 231 and the second connecting piece 232 are both connected to the carrying board 41 in a sliding manner, one end of the first connecting piece 231 is fixedly connected with a piston rod of the first air cylinder 211, the carrying board 41 is fixedly provided with a first bottom board 413 for placing the first air cylinder 211, the first air cylinder 211 is fixedly arranged on the first bottom board 413, one end of the first connecting piece 231 far away from the first air cylinder 211 is fixedly provided with a first connecting block 2311, one end of the second connecting piece 232 close to the first connecting piece 231 is fixedly provided with a second connecting block 2321, the first connecting block 2311 and the second connecting block 2321 are detachably connected through a fastening piece so as to facilitate replacement of the first air cylinder 211 or the fixing component 23, the first connecting block 2311 and the second connecting block 2321 are both provided with through holes 24, the fastening piece penetrates through the through holes 24, in the embodiment of the utility model, the fastening piece is shown by taking a bolt and a nut as an example, the bolt penetrates through the through holes 24 and is connected with the nut in a threaded manner, the side of the first push plate 212 away from the second push plate 213 is fixedly provided with a third connecting block 2121, and the side of the second connecting piece 232 away from the second connecting block 2321 is fixedly connected with the third connecting block 2121. Before the semicircular workpiece 100 is placed on the polishing device, the piston rod of the first cylinder 211 is in a contracted state, when the semicircular workpiece 100 is placed in the clamping space, the piston rod of the first cylinder 211 stretches out and pushes the first push plate 212 to move towards the second push plate 213, so that the semicircular workpiece 100 is clamped between the first push plate 212 and the second push plate 213, and when the semicircular workpiece 100 needs to be removed, the piston rod of the first cylinder 211 contracts again and drives the first push plate 212 to move towards a direction away from the second push plate 213, so that an operator can remove the workpiece.

Referring to fig. 2 and 3, the second clamping assembly 22 includes a second air cylinder 221 and a limiting push plate 222, a piston rod of the second air cylinder 221 is detachably connected with the limiting push plate 222, the second air cylinder 221 is used for driving the limiting push plate 222 to slide on the carrying plate 41, a piston rod of the second air cylinder 221 is fixedly connected with a side plate 223, the side plate 223 and the limiting push plate 222 are mutually parallel to each other so as to increase the stress area of the second air cylinder 221 for pushing the limiting push plate 222, a second bottom plate 414 for placing the second air cylinder 221 is fixedly arranged on the carrying plate 41, one end of the side plate 223 far away from the second air cylinder 221 is detachably connected with the limiting push plate 222 through a connecting column 224, the piston rod of the second air cylinder 221 pushes the limiting push plate 222 to move towards the semi-circular ring workpiece 100, and the pushing direction of the first clamping assembly 21 is mutually perpendicular to the pushing direction of the second clamping assembly 22. Before the semicircular workpiece 100 is placed on the polishing device, the piston rod of the second cylinder 221 is in a contracted state, and when the semicircular workpiece 100 is placed in the clamping space, the piston rod of the second cylinder 221 stretches out and pushes the limiting push plate 222 to move towards the semicircular workpiece 100, so that one end of the semicircular workpiece 100 is propped against the limiting push plate 222.

Referring to fig. 5, in order to make the objective table 4 move on the base 1, a third air cylinder 11 and two slide rails 12 are fixedly arranged on the base 1, the two slide rails 12 are arranged in parallel, the third air cylinder 11 is located between the two slide rails 12, one end of the sliding plate 42, which is far away from the carrying plate 41, is slidably connected to the slide rails 12, one end of the sliding plate 42, which is far away from the carrying plate 41, is fixedly connected with a piston rod of the third air cylinder 11, the piston rod of the third air cylinder 11 drives the sliding plate 42 to move along the slide rails 12, and the moving direction of the sliding plate 42 is the same as the pushing direction of the first air cylinder 211, so that the objective table 4 is moved, and the polishing mechanism 3 can polish a plurality of semicircular workpieces 100 at one time.

Referring to fig. 1 and 5, the polishing mechanism 3 includes a polishing member 31, a motor 32 and a mounting assembly 33, the motor 32 is fixedly connected to the base 1, the length direction of an output shaft of the motor 32 is perpendicular to the moving direction of the sliding plate 42, the output shaft of the motor 32 is coaxially and fixedly connected with a transmission shaft 34, the transmission shaft 34 penetrates through the polishing member 31, the motor 32 is used for driving the polishing member 31 to rotate, the polishing member 31 extends out of the carrying plate 41 through a through hole 411, the mounting assembly 33 is provided with two mounting assemblies and is respectively located at two ends of the transmission shaft 34, the mounting assembly 33 includes a mounting frame 331, a bearing 332 and a bearing seat 333, the mounting frame 331 is fixedly connected to the base 1, the bearing seat 333 is fixedly connected with the mounting frame 331, an outer ring 1001 of the bearing 332 is fixedly connected with the bearing seat 333, the transmission shaft 34 penetrates through the bearing 332 and the polishing member 31 and is coaxially and fixedly connected with an inner ring 1002 of the bearing 332, and in the embodiment of the utility model, the polishing member 31 is shown by taking a grinding wheel as an example. The piston rod of the third air cylinder 11 is contracted to drive the object stage 4 to move, so that the grinding wheel can grind the semicircular workpiece 100 placed on the object carrying plate 41.

The embodiment of the utility model provides a semi-circular workpiece rough surface polishing device, which is implemented by the following principle: when the semicircular workpiece 100 needs to be polished, the piston rods of the first cylinder 211 and the second cylinder 221 are in a contracted state, an operator can place the semicircular workpiece 100 in the clamping space, namely, two ends of the semicircular workpiece 100 are respectively placed on the two supporting plates 412, the inner ring 1002 of the semicircular workpiece 100 faces the through hole 411, at the moment, the piston rod of the first cylinder 211 stretches out and pushes the first push plate 212 to move towards the second push plate 213, so that the semicircular workpiece 100 is clamped between the first push plate 212 and the second push plate 213, the piston rod of the second cylinder 221 stretches out and pushes the limiting push plate 222 to move towards the semicircular workpiece 100, one end of the semicircular workpiece 100 is abutted against the limiting push plate 222, the placing position of the semicircular workpiece 100 is limited, the motor 32 drives the polishing piece 31 to rotate, the piston rod of the third cylinder 11 drives the objective table 4 to move along the slide rail 12, the inner ring 1002 of the semicircular workpiece 100 clamped on the objective table 4 sequentially passes through the polishing piece 31, polishing of the inner ring 1002 of the semicircular workpiece 100 is achieved, and the processing efficiency of the semicircular workpiece 100 is improved.

When the polished semicircular workpiece 100 needs to be removed, the piston rod of the first cylinder 211 contracts and drives the first push plate 212 to move towards the direction away from the second push plate 213, the piston rod of the second cylinder 221 contracts and drives the limiting push plate 222 to move towards the direction close to the second cylinder 221, and an operator can remove the semicircular workpiece 100.

The above embodiments are not intended to limit the scope of the present utility model, so: all equivalent changes in structure, shape and principle of the utility model should be covered in the scope of protection of the utility model.

Claims (8)

1. The utility model provides a semicircle ring work piece rough surface grinding device which characterized in that: including base (1), fixture (2) and grinding machanism (3), sliding connection has objective table (4) that are used for placing semicircle ring work piece (100) on base (1), grinding machanism (3) with base (1) are connected, grinding machanism (3) including grinding piece (31) and motor (32), motor (32) fixed set up in on base (1), grinding piece (31) rotate connect in on base (1), the output shaft of motor (32) with grinding piece (31) coaxial fixed connection, grinding piece (31) are located the below of semicircle ring work piece (100), objective table (4) keep away from one end of base (1) is offered and is used for supplying grinding piece (31) to stretch out opening (411), grinding piece (31) are used for right inner circle (1002) of semicircle ring work piece (100) are polished, fixture (2) sliding connection in on objective table (4), fixture (2) are used for semicircle ring work piece (100) location limit for.

2. The semicircular workpiece rough surface polishing device according to claim 1, wherein: objective table (4) are including carrying thing board (41) and slip board (42), carry thing board (41) with slip board (42) fixed connection, carry thing board (41) with slip board (42) are parallel to each other, carry thing board (41) with form between slip board (42) and be used for holding place space (43) of polishing piece (31), slip board (42) with base (1) sliding connection.

3. The semicircular workpiece rough surface polishing device according to claim 2, wherein: the support plate (412) used for placing the semicircular workpiece (100) is fixedly arranged at the position, close to the through hole (411), of the carrying plate (41), and the height between the support plate (412) and the sliding plate (42) is smaller than the height between the carrying plate (41) and the sliding plate (42).

4. The semicircular workpiece rough surface polishing device according to claim 2, wherein: the clamping mechanism (2) comprises a first clamping assembly (21), the first clamping assembly (21) comprises a first air cylinder (211), a first pushing plate (212) and a second pushing plate (213), the first air cylinder (211) is installed on the carrying plate (41), a piston rod of the first air cylinder (211) is detachably connected with the first pushing plate (212), the second pushing plate (213) is fixedly connected with the carrying plate (41), the first pushing plate (212) and the second pushing plate (213) are parallel to each other, and the first air cylinder (211) is used for driving the first pushing plate (212) to slide.

5. The semicircular workpiece rough surface polishing device according to claim 4, wherein: the clamping mechanism (2) comprises a second clamping assembly (22), the second clamping assembly (22) comprises a second air cylinder (221) and a limiting push plate (222), the second air cylinder (221) is mounted on the carrying plate (41), a piston rod of the second air cylinder (221) is detachably connected with the limiting push plate (222), the second air cylinder (221) is used for driving the limiting push plate (222) to slide, and the pushing direction of the first clamping assembly (21) is perpendicular to the pushing direction of the second clamping assembly (22).

6. The semicircular workpiece rough surface polishing device according to claim 4, wherein: the clamping mechanism (2) comprises a fixing assembly (23), the fixing assembly (23) comprises a first connecting piece (231) and a second connecting piece (232), one end of the first connecting piece (231) is fixedly connected with a piston rod of the first cylinder (211), the other end of the first connecting piece (231) is detachably connected with the second connecting piece (232), the first connecting piece (231) and the second connecting piece (232) are parallel to each other, and the second connecting piece (232) is fixedly connected with the first push plate (212).

7. The semicircular workpiece rough surface polishing device according to claim 1, wherein: the polishing mechanism (3) comprises a mounting assembly (33) used for limiting the position of the polishing piece (31), the mounting assembly (33) comprises a mounting frame (331) and a bearing seat (333), the mounting frame (331) is fixedly connected to the base (1), the bearing seat (333) is fixedly connected to the mounting frame (331), and an output shaft of the motor (32) is rotatably connected with the bearing seat (333) through a bearing (332).

8. The semicircular workpiece rough surface polishing device according to claim 2, wherein: the base (1) is fixedly provided with a sliding rail (12) and a third air cylinder (11), the sliding plate (42) is slidably connected to the sliding rail (12), a piston rod of the third air cylinder (11) is fixedly connected with the sliding plate (42), and the third air cylinder (11) is used for driving the objective table (4) to move along the sliding rail (12).