CN219670638U - Chemical vapor deposition reactor with sectional connection - Google Patents
Chemical vapor deposition reactor with sectional connection Download PDFInfo
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- CN219670638U CN219670638U CN202320124021.9U CN202320124021U CN219670638U CN 219670638 U CN219670638 U CN 219670638U CN 202320124021 U CN202320124021 U CN 202320124021U CN 219670638 U CN219670638 U CN 219670638U
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- reactor
- vapor deposition
- chemical vapor
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- 238000005229 chemical vapour deposition Methods 0.000 title claims abstract description 25
- 238000010438 heat treatment Methods 0.000 claims abstract description 9
- 238000003756 stirring Methods 0.000 claims description 20
- 238000007789 sealing Methods 0.000 claims description 15
- 238000003466 welding Methods 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 238000007599 discharging Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 3
- 239000011810 insulating material Substances 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 3
- 239000002912 waste gas Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 230000011218 segmentation Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000002035 prolonged effect Effects 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000012774 insulation material Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical compound [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 description 1
- HFCVPDYCRZVZDF-UHFFFAOYSA-N [Li+].[Co+2].[Ni+2].[O-][Mn]([O-])(=O)=O Chemical compound [Li+].[Co+2].[Ni+2].[O-][Mn]([O-])(=O)=O HFCVPDYCRZVZDF-UHFFFAOYSA-N 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The utility model relates to a chemical vapor deposition reactor with sectional connection, which comprises a reactor main body and a heating device, wherein the reactor main body comprises a plurality of sub-shell sections which are connected up and down, all the sub-shell sections are concentrically arranged, the heating device comprises a plurality of sub-heaters which are connected up and down, and each sub-heater surrounds the outer periphery of one or more sub-shell sections; adjacent sub-shell sections are connected through flanges. The shell segments of the reactor main body are processed in a segmented manner, so that concentricity of each segment is guaranteed, concentricity and precision of the whole reactor main body can be better guaranteed, and the size of the reactor main body can be made larger.
Description
Technical Field
The utility model belongs to the technical field of chemical vapor deposition reactors, and particularly relates to a chemical vapor deposition reactor with sectional connection.
Background
Currently, reactors for chemical vapor deposition reactions are mostly in the form of integral forging, and as production processes are improved, the required yield is increased and the size of the reactors is increased, and since most reactors are cylindrical, in the process of processing large reactors, in order to maintain the same concentricity/coaxiality, severe tests are put into place on reactor processing equipment and processes. If the concentricity/coaxiality precision of the large-scale reactor cannot meet the requirement, the contact position of the stirring shaft and the sealing surface of the reactor can generate irregular-direction runout during production, the runout can cause damage to the sealing surface, the integral tightness of the reactor is seriously affected, the service life of the reactor is shortened, and the leakage of high-temperature gas in the reactor is also caused, so that the production safety is seriously threatened.
Disclosure of Invention
The utility model aims to solve the technical problem that concentricity/coaxiality accuracy is not high during integral processing of a large-scale reactor.
The utility model provides a chemical vapor deposition reactor with sectional connection, which comprises a reactor main body and a heating device, wherein the reactor main body comprises a plurality of sub-shell sections which are connected up and down, all the sub-shell sections are concentrically arranged, the heating device comprises a plurality of sub-heaters which are connected up and down, and each sub-heater correspondingly surrounds the periphery of the outer part of one or more sub-shell sections.
Optionally, adjacent sub-shell sections are connected through flanges, the length of the flanges in the horizontal direction is larger than the thickness of the upper and lower adjacent sub-heaters, the positions of the flange mounting bolts are located outside the upper and lower adjacent sub-heaters, and sealing gaskets are arranged at the positions of the bolts inside the flanges.
Optionally, a heat insulation material is arranged between the flange and the two upper and lower adjacent sub-heaters, and is used for protecting the flange from heat.
Optionally, the length of the sub-heater is less than the length of the corresponding sub-housing section.
Optionally, adjacent sub-shell sections are connected through flanges, sealing welding connection is carried out between upper and lower adjacent flanges, and positions of flange mounting bolts are wrapped by the sub-heaters.
Optionally, the upper portion of reactor main part is equipped with a plurality of saddle, and a plurality of saddle evenly sets up along the circumference of reactor main part, and the saddle is fixed on the support frame for fixed reactor main part, the lower part of reactor main part is unsettled.
Optionally, the chemical vapor deposition reactor further comprises a stirrer, wherein a motor of the stirrer is arranged above the reactor main body, and a stirring paddle connected with the motor extends into the reactor main body and penetrates through all the sub-shell sections for stirring materials in the reactor main body.
Optionally, the stirring shaft is hollow, and a cold medium inlet and a cold medium outlet are arranged at the position of the stirring shaft outside the reactor main body and used for inputting and outputting cold medium; the cold medium is selected from cold water or cold air for protecting the stirring shaft.
Optionally, an air inlet and a feed inlet are arranged at the bottom of the reactor main body and used for inputting reaction raw materials; the upper portion or lower part of reactor main part is equipped with the discharge gate for output product, and the top is equipped with the gas outlet, is used for discharging waste gas.
The segmented-connection chemical vapor deposition reactor has the following beneficial effects:
(1) The shell segments of the reactor main body are processed in a segmented manner, so that the concentricity of each segment is ensured, the concentricity and the precision of the whole reactor main body can be better ensured, and the size of the reactor main body can be made larger;
(2) Each sub-heater correspondingly surrounds the periphery of the outer part of one sub-shell section, so that the size of the heating device is reduced, a certain sub-heater is convenient to maintain, the specific temperature of different sub-shell sections is convenient to control, and the reaction temperature is adjusted in a targeted manner.
Drawings
FIG. 1 is a schematic structural diagram of a staged connected chemical vapor deposition reactor;
FIG. 2 is a schematic structural view of another staged connected chemical vapor deposition reactor.
In the drawing, a shell section 1-part, a heater 2-part, a flange 3-part, a bolt 4-part, a heat insulation material 5-part, a motor 6-part, a stirring paddle 7-part, an air inlet 8-part, a feeding hole 9-part, a discharging hole 10-part, an air outlet 11-part and a saddle 12-part.
Detailed Description
The embodiment provides a chemical vapor deposition reactor with sectional connection, as shown in fig. 1-2, comprising a reactor main body and a heating device, wherein the reactor main body comprises a plurality of sub-shell sections 1 which are connected up and down, all the sub-shell sections 1 are concentrically arranged, the heating device comprises a plurality of sub-heaters 2 which are connected up and down, and each sub-heater 2 surrounds the outer periphery of one or more sub-shell sections 1.
Optionally, adjacent sub-shell sections 1 are connected through flanges 3, the length of each flange 3 is larger than the thickness of each sub-heater 2 adjacent to each other up and down, the influence of each sub-heater 2 on each flange 3 is reduced, and the service life of each flange is prolonged;
the position of the mounting bolts 4 of the flange 3 is positioned outside the upper and lower adjacent sub-heaters 2, and sealing gaskets are arranged at the positions of the bolts 4 in the flange 3, so that the sealing performance and stability of the adjacent sub-shell sections 1 are improved, the thermal influence of the sub-heaters 2 on the bolts 4 and the sealing gaskets is reduced, and the service life of the sub-heaters is prolonged.
Optionally, a heat insulating material 5 is arranged between the flange 3 and the two upper and lower adjacent sub-heaters 2 for protecting the flange 3 from heat, and the heat insulating material 5 is selected from asbestos or fireproof bricks.
Optionally, the length of the sub-heaters 2 is smaller than the length of the corresponding sub-housing section 1, and each sub-heater 2 is enclosed around the outside of one sub-housing section 1.
Optionally, the adjacent sub-shell sections are connected through flanges 3, the upper and lower adjacent flanges 3 are connected in a sealing welding way, the positions of flange mounting bolts are wrapped by the sub-heaters 2, and sealing gaskets are arranged at the positions of the bolts in the flanges. Specifically, the opposite ends of the adjacent sub-shell sections are respectively provided with an upper flange and a lower flange, bolt holes are formed in positions corresponding to the upper flange and the lower flange and are used for installing bolts, the bolts can play a role of fixing the flanges before welding, sealing gaskets can be arranged between the upper flange and the lower flange, the sealing gaskets can be arranged between the upper flange and the lower flange, gaps between the upper flange and the lower flange are aligned from the outside, sealing welding is performed, the bolts basically do not play a role after welding, can be removed or not removed, and the bolts are positioned inside the flanges after most of the flanges are welded, so that the bolts are basically not removed. Seal welding is a conventional technique in the art, and a person skilled in the art can refer to relevant data according to actual needs to perform operations.
When the upper flange 3 and the lower flange 3 are in sealing welding connection, the connection between the adjacent sub-shell sections 1 is smooth, the sub-shell sections can be integrally wrapped in the sub-heater 2, the flanges and the bolts are also arranged in the sub-heater 2, one sub-heater 2 can correspond to one sub-shell section 1, a plurality of sub-shell sections 1 can also correspond to one sub-shell section 1, the sub-shell sections can also be arranged between the adjacent sub-shell sections 1, and the setting positions of the sub-heaters 2 are flexible.
Optionally, the upper portion of reactor main part is equipped with a plurality of saddle 12, and a plurality of saddle 12 evenly sets up along the circumference of reactor main part, and saddle 12 is fixed on the support frame for fixed reactor main part, and the lower part of reactor main part is unsettled. The support frame is fixed on the ground and used for fixedly supporting the chemical vapor deposition reactor. Because the inside of the reactor main body is high-temperature reaction, each sub-shell section can be prolonged due to thermal expansion, and the saddle is used for fixing the upper part of the reactor, so that the lower part of the reactor can be freely stretched, and the safety of the reactor is ensured. This is more true for large reactors.
Further alternatively, the support frame is connected to support each sub-housing section 1.
Optionally, the chemical vapor deposition reactor further comprises a stirrer, a motor 6 of the stirrer is arranged above the reactor main body, and a stirring paddle 7 connected with the motor 6 stretches into the reactor main body and penetrates through all the sub-shell sections 1 to stir materials in the reactor main body and promote mass and heat transfer.
Optionally, the stirring shaft is hollow, and a cold medium inlet and a cold medium outlet are arranged at the position of the stirring shaft outside the reactor main body and used for inputting and outputting cold medium; the cold medium is selected from cold water or cold air for protecting the stirring shaft, reducing the influence of the high temperature in the sub-shell section 1 on the stirring shaft, on the other hand, allowing a higher reaction temperature to be reached inside the reactor body.
In order to avoid the pipeline winding connecting the cold medium inlet and the cold medium outlet caused by the rotation of the stirring shaft in the same direction all the time, the motor 6 can control the stirring shaft to rotate clockwise for a period of time and then rotate anticlockwise for a period of time, so that the condition of pipeline winding is relieved.
Optionally, an air inlet 8 and a feed inlet 9 are arranged at the bottom of the reactor main body and are used for inputting reaction raw materials; the upper or lower part of the reactor body is provided with a discharge port 10 for outputting products, and the top is provided with an air outlet 11 for discharging waste gas.
The chemical vapor deposition reactor can be used for the chemical vapor deposition processes such as the production of carbon nanotubes, the surface carbon coating of silicon/silicon oxide and silicon carbon materials, the surface coating modification of nickel cobalt lithium manganate materials and the like.
The non-disclosed parts of the utility model are all prior art, and the specific structure, materials and working principle thereof are not described in detail. It will be evident to those skilled in the art that the utility model is not limited to the details of the foregoing illustrative embodiments, and that the present utility model may be embodied in other specific forms without departing from the spirit or essential characteristics thereof; the above-described embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the utility model being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein.
Claims (9)
1. The utility model provides a chemical vapor deposition reactor of segmentation connection, its characterized in that includes reactor main part and heating device, the reactor main part includes a plurality of branch casing sections of connecting from top to bottom, and all branch casing sections set up with one heart, heating device includes a plurality of branch heaters of connecting from top to bottom, and every branch heater surrounds around the outside of one or more branch casing sections.
2. The segmented connected chemical vapor deposition reactor according to claim 1, wherein adjacent shell segments are connected through flanges, the horizontal length of each flange is larger than the thickness of each upper and lower adjacent sub-heater, the positions of the flange mounting bolts are located outside the upper and lower adjacent sub-heaters, and sealing gaskets are arranged at the bolts inside the flanges.
3. The segmented connected chemical vapor deposition reactor of claim 2, wherein the length of the sub-heaters is less than the length of the corresponding sub-shell segments, each sub-heater surrounding the exterior circumference of one sub-shell segment.
4. A segmented connected chemical vapor deposition reactor according to claim 3, wherein a heat insulating material is provided between the flange and the two sub-heaters adjacent to each other up and down for protecting the flange from heat.
5. The segmented connected chemical vapor deposition reactor according to claim 1, wherein adjacent shell segments are connected by flanges, and sealing welding connection is performed between upper and lower adjacent flanges.
6. The segmented connected chemical vapor deposition reactor according to claim 1, wherein a plurality of saddles are arranged at the upper part of the reactor main body, the saddles are uniformly arranged along the circumferential direction of the reactor main body, the saddles are fixed on a support frame for fixing the reactor main body, and the lower part of the reactor main body is suspended.
7. The segmented chemical vapor deposition reactor of claim 1, further comprising a stirrer, wherein a motor of the stirrer is disposed above the reactor body, and wherein a stirring paddle coupled to the motor extends into the reactor body and through all of the segmented housing segments for stirring the material within the reactor body.
8. The segmented connected chemical vapor deposition reactor according to claim 7, wherein the stirring shaft of the stirrer is hollow, and a cold medium inlet and a cold medium outlet are arranged at the position of the stirring shaft outside the reactor main body and used for inputting and outputting cold medium; the cold medium is selected from cold water or cold air for protecting the stirring shaft.
9. The segmented connected chemical vapor deposition reactor according to claim 1, wherein the bottom of the reactor body is provided with an air inlet and a feed inlet for inputting reaction raw materials; the upper portion or lower part of reactor main part is equipped with the discharge gate for output product, and the top is equipped with the gas outlet, is used for discharging waste gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320124021.9U CN219670638U (en) | 2023-01-11 | 2023-01-11 | Chemical vapor deposition reactor with sectional connection |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320124021.9U CN219670638U (en) | 2023-01-11 | 2023-01-11 | Chemical vapor deposition reactor with sectional connection |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219670638U true CN219670638U (en) | 2023-09-12 |
Family
ID=87893502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202320124021.9U Active CN219670638U (en) | 2023-01-11 | 2023-01-11 | Chemical vapor deposition reactor with sectional connection |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219670638U (en) |
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2023
- 2023-01-11 CN CN202320124021.9U patent/CN219670638U/en active Active
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