CN219260183U - Chemical vapor deposition horizontal reactor with split shell - Google Patents
Chemical vapor deposition horizontal reactor with split shell Download PDFInfo
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- CN219260183U CN219260183U CN202320126522.0U CN202320126522U CN219260183U CN 219260183 U CN219260183 U CN 219260183U CN 202320126522 U CN202320126522 U CN 202320126522U CN 219260183 U CN219260183 U CN 219260183U
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Abstract
The utility model relates to a chemical vapor deposition horizontal reactor with split shells, which comprises a plurality of split shells, a plurality of heating devices and a stirrer, wherein the split shells are horizontally arranged and connected front and back end to form a reactor body, and the split shells are concentrically arranged; each heating device surrounds the outer periphery of one or more split shells and is used for heating the split shells; shaft seals are respectively arranged at the positions of the stirring shaft penetrating through the two ends of the reactor body, and a cooling interlayer is arranged at least one end of the reactor body. Each split shell can be processed according to the unified size or standard, and the processing precision of concentricity/coaxiality can be improved.
Description
Technical Field
The utility model belongs to the technical field of chemical vapor deposition reactors, and particularly relates to a chemical vapor deposition horizontal reactor with a split shell.
Background
At present, the main reason for preventing the industrialized mass production of the chemical vapor deposition reaction is that the problem of the enlargement of the reactor is solved, the difficulty of the integrated processing of the reactor with the diameter of several meters and the height of tens of meters is high, and particularly, the chemical vapor deposition reactor is generally cylindrical for the convenience of internal mass transfer, heat transfer and stirring. One of the difficulties in manufacturing large cylindrical reactors is maintaining the same concentricity/coaxiality throughout the reactor. For the horizontal chemical vapor deposition reactor, a horizontal stirrer needs to be arranged, a horizontal stirring shaft is positioned at the center of the reactor, and two ends of the stirring shaft are fixedly fixed by matching with accessories such as shaft seals and the like, so that the stirring shaft can normally rotate and is free from air leakage. If the concentricity/coaxiality precision of the large-scale reactor cannot meet the requirement, the stirring shaft cannot be kept horizontal, irregular-direction runout can be generated during rotation, and the gravity of the horizontal stirring shaft is increased, so that the sealing part bears larger impact, the service life of the sealing part is shortened, and the sealing performance and the safety production of the reactor are not guaranteed.
Disclosure of Invention
The utility model aims to solve the technical problem that the concentricity/coaxiality precision is not high when the large-scale chemical vapor deposition horizontal reactor is integrally processed.
The utility model provides a chemical vapor deposition horizontal reactor with split shells, which comprises a plurality of split shells, a plurality of heating devices and a stirrer, wherein the split shells are horizontally arranged and connected front and back end to form a reactor body, and the split shells are concentrically arranged; each heating device surrounds the outer periphery of one or more split shells and is used for heating the split shells;
shaft seals are respectively arranged at the positions of the stirring shaft penetrating through the two ends of the reactor body, and a cooling interlayer is arranged at least one end of the reactor body.
Optionally, adjacent split shells are connected in a sealing manner by an intermediate flange, and the height of the intermediate flange in the vertical direction is larger than the thickness of the heating devices on two sides of the intermediate flange.
Preferably, the middle flange mounting bolts are positioned outside the heating devices on two sides, so that the middle flange is convenient to mount.
Optionally, a heat insulation material is arranged between the middle flange and the heating devices at two sides.
Optionally, the length of the heating device is smaller than the length of the corresponding split housing, such that each heating device surrounds the outer periphery of one split housing.
Optionally, adjacent split shells are connected through intermediate flanges, and the adjacent intermediate flanges are connected in a sealing welding mode.
Optionally, a side wall close to the front end of the reactor body is provided with an air inlet and a feed inlet for inputting raw materials required by the chemical vapor deposition reaction; the side wall close to the rear end of the reactor body is provided with an air outlet and a discharge outlet which are respectively used for outputting waste gas and products.
Optionally, the rear end of the reactor body is provided with an end flange and a cooling interlayer, and the stirring shaft and the corresponding shaft seal sequentially penetrate through the cooling interlayer and the end flange from outside to inside;
the cooling interlayer is provided with a cooling medium inlet and a cooling medium outlet for inputting cooling medium into the cooling interlayer.
Optionally, a fixed support body is arranged at the outer side of the bottom of one end of the reactor body, and a movable support body is arranged at the outer side of the bottom of the other end of the reactor body; the movable support body is provided with a plurality of oblong holes, the position of the reactor body corresponding to the movable support body is provided with corresponding oblong holes, and the oblong holes of the reactor body and the movable support body are combined and fixed through bolt connection.
The chemical vapor deposition horizontal reactor with the split shell has the following beneficial effects:
(1) The reactor body is formed by connecting the front and back of the split shells, and each split shell can be processed respectively according to the unified size or standard;
(2) Each split shell corresponds to one heating device, so that the temperature of one split shell can be accurately controlled;
(3) At least one end of the reactor body is provided with a cooling interlayer, so that the shaft seal position and the end flange of the stirring shaft can be cooled, and the shaft seal and the end flange are protected.
Drawings
FIG. 1 is a schematic structural view of a chemical vapor deposition horizontal reactor with a split shell;
fig. 2 is a schematic perspective view of fig. 1.
In the drawing, a 1-split shell, a 2-heating device, a 3-stirring shaft, a 4-reactor body, a 5-cooling interlayer, a 6-intermediate flange, a 7-end flange, an 8-heat insulation material, a 9-air inlet, a 10-feed inlet, a 11-air outlet, a 12-discharge outlet, a 13-oblong hole, a 14-cold medium inlet, a 15-cold medium outlet, a 16-fixed support body and a 17-movable support body are arranged.
Detailed Description
The embodiment provides a chemical vapor deposition horizontal reactor with split shells, as shown in fig. 1-2, which comprises a plurality of split shells 1, a plurality of heating devices 2 and a stirrer, wherein the split shells 1 are horizontally arranged and connected front and back in an end-to-end manner to form a reactor body 4, and the split shells 1 are concentrically arranged; each heating device 2 surrounds the outer periphery of one or more split shells 1 and is used for heating the split shells 1;
shaft seals are respectively arranged at the positions of the stirring shaft 3 penetrating through the two ends of the reactor body 4, and a cooling interlayer 5 is arranged at least one end of the reactor body 4.
Optionally, adjacent split shells 1 are in sealing connection through an intermediate flange 6, the height of the intermediate flange 6 in the vertical direction is larger than the thickness of the heating devices 2 on two sides of the intermediate flange 6, the sealing position of the intermediate flange 6 is protected from being far away from the heating devices 2 as much as possible, and the tightness of the split shells 1 is maintained.
Preferably, the mounting bolts of the intermediate flange 6 are positioned outside the heating device 2 at two sides, so that the intermediate flange 6 is convenient to mount.
Optionally, a heat insulation material 8, such as fire brick or asbestos net, is arranged between the intermediate flange 6 and the heating devices 2 on both sides, so as to further protect the intermediate flange 6.
Optionally, the length of the heating devices 2 is smaller than the length of the corresponding split housing 1, so that each heating device 2 surrounds the outside of one split housing 1.
Optionally, adjacent split shells 1 are connected through intermediate flanges 6, the adjacent intermediate flanges 6 are connected in a sealing welding way, the positions of the mounting bolts of the intermediate flanges 6 are wrapped by the heating device 2, and sealing gaskets are arranged at the positions of the bolts inside the intermediate flanges 6. Specifically, the opposite ends of the adjacent split shells 1 are provided with a left flange and a right flange respectively, the positions of the left flange and the right flange, which correspond to each other, are provided with bolt holes for installing bolts, the bolts can play a role of fixing the middle flange before welding, sealing gaskets can be arranged between the left flange and the right flange, the sealing gaskets can be arranged between the left flange and the right flange, gaps between the left flange and the right flange are aligned from the outside, sealing welding is performed, the bolts basically do not play a role after welding, can be removed, and can not be removed, and because most of the bolts are positioned inside the middle flange after welding, the bolts are basically not removed. Seal welding is a conventional technique in the art, and a person skilled in the art can refer to relevant data according to actual needs to perform operations.
When the middle flange 6 is in sealing welding connection, the connection between the adjacent split shells 1 is smooth, the split shells can be integrally wrapped in the heating device 2, the middle flange 6 and the bolts are also arranged in the heating device 2, one heating device 2 can correspond to one split shell 1, a plurality of split shells 1 can also correspond to one split shell 1, the split shells can also be arranged between the adjacent split shells 1, and the setting positions of the heating devices 2 are flexible.
Optionally, a gas inlet 9 and a feed inlet 10 are arranged on the side wall near the front end of the reactor body 4 and are used for inputting raw materials required by chemical vapor deposition reaction; the side wall near the rear end of the reactor body 4 is provided with an air outlet 11 and a discharge outlet 12 for outputting waste gas and products, respectively.
Optionally, the rear end of the reactor body 4 is sequentially provided with an end flange 7 and a cooling interlayer 5, and the stirring shaft 3 and the corresponding shaft seal sequentially penetrate through the cooling interlayer 5 and the end flange 7 from outside to inside;
the cooling insert 5 is provided with a cooling medium inlet 14 and a cooling medium outlet 15 for feeding cooling medium, for example cold air, cold water, into the cooling insert 5.
Optionally, a fixed support 16 is arranged at the outer side of the bottom of one end of the reactor body 4, and a movable support 17 is arranged at the outer side of the bottom of the other end; the movable support body 17 is provided with a plurality of oblong holes 13, the position of the reactor body 4 corresponding to the movable support body 17 is provided with corresponding oblong holes, and the oblong holes of the two are combined and fixed through bolt connection.
The chemical vapor deposition reaction needs high temperature, the inside of the split shell 1 is in a high temperature environment, the length of the whole reactor body 4 has some change under the action of thermal expansion and cold contraction, and the larger the size of the reactor body 4 is, the more obvious the change is. The movable supporting body 17 supports the reactor body 4, and meanwhile, the long round hole 13 can be utilized to adjust the specific position of the long round hole for butt joint of the reactor body 4 and the movable supporting body 17 according to the specific length of the reactor body 4, so that the safety of the reactor body 4 is ensured.
The specific shapes of the fixed support body 16 and the movable support body 17 are not particularly limited, so long as the cylindrical reactor body 4 can be supported, for example, the bottom is parallel to the ground and is horizontally placed on the ground, the top is provided with a groove with the same radian as the outer side surface of the reactor body 4, and the reactor body 4 is placed in the groove, so that the stability is better.
The chemical vapor deposition horizontal reactor can be used for the chemical vapor deposition processes of carbon nanotube production, surface carbon coating of silicon/silicon oxide and silicon carbon materials, surface coating modification of nickel cobalt lithium manganate materials and the like.
The non-disclosed parts of the utility model are all prior art, and the specific structure, materials and working principle thereof are not described in detail. It will be evident to those skilled in the art that the utility model is not limited to the details of the foregoing illustrative embodiments, and that the present utility model may be embodied in other specific forms without departing from the spirit or essential characteristics thereof; the above-described embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the utility model being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein.
Claims (8)
1. The chemical vapor deposition horizontal reactor is characterized by comprising a plurality of split shells, a plurality of heating devices and a stirrer, wherein the split shells are horizontally arranged and connected front and back in an end-to-end manner to form a reactor body, and the split shells are concentrically arranged; each heating device surrounds the outer periphery of one or more split shells and is used for heating the split shells;
shaft seals are respectively arranged at the positions of the stirring shaft penetrating through the two ends of the reactor body, and a cooling interlayer is arranged at least one end of the reactor body.
2. The horizontal reactor for chemical vapor deposition with split shells according to claim 1, wherein adjacent split shells are connected by an intermediate flange in a sealing manner, and the height of the intermediate flange in the vertical direction is larger than the thickness of the heating devices at both sides of the intermediate flange.
3. The horizontal reactor for chemical vapor deposition with split shell according to claim 2, wherein the mounting bolts of the intermediate flange are positioned outside the heating means at both sides to facilitate the mounting of the intermediate flange.
4. A chemical vapor deposition horizontal reactor with a split shell according to claim 3, wherein a heat insulating material is arranged between the middle flange and the heating devices at both sides.
5. The horizontal reactor of claim 1 wherein adjacent split shells are joined by an intermediate flange and adjacent intermediate flanges are joined by a seal weld.
6. The horizontal reactor for chemical vapor deposition with a split shell according to claim 1, wherein a gas inlet and a feed inlet are provided on a side wall near the front end of the reactor body for inputting raw materials required for the chemical vapor deposition reaction; the side wall close to the rear end of the reactor body is provided with an air outlet and a discharge outlet which are respectively used for outputting waste gas and products.
7. The horizontal reactor for chemical vapor deposition with split shell according to claim 6, wherein the rear end of the reactor body is provided with an end flange and a cooling interlayer, and the stirring shaft and the corresponding shaft seal sequentially penetrate through the cooling interlayer and the end flange from outside to inside;
the cooling interlayer is provided with a cooling medium inlet and a cooling medium outlet for inputting cooling medium into the cooling interlayer.
8. The horizontal reactor for chemical vapor deposition with a split shell according to claim 1, wherein a fixed support is arranged at the outer side of the bottom of one end of the reactor body, and a movable support is arranged at the outer side of the bottom of the other end of the reactor body; the movable support body is provided with a plurality of oblong holes, the position of the reactor body corresponding to the movable support body is provided with corresponding oblong holes, and the oblong holes of the reactor body and the movable support body are combined and are connected through bolts.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202320126522.0U CN219260183U (en) | 2023-01-11 | 2023-01-11 | Chemical vapor deposition horizontal reactor with split shell |
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CN202320126522.0U CN219260183U (en) | 2023-01-11 | 2023-01-11 | Chemical vapor deposition horizontal reactor with split shell |
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CN219260183U true CN219260183U (en) | 2023-06-27 |
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CN202320126522.0U Active CN219260183U (en) | 2023-01-11 | 2023-01-11 | Chemical vapor deposition horizontal reactor with split shell |
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2023
- 2023-01-11 CN CN202320126522.0U patent/CN219260183U/en active Active
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