CN219635812U - Device for preventing photoetching plate from being worn - Google Patents
Device for preventing photoetching plate from being worn Download PDFInfo
- Publication number
- CN219635812U CN219635812U CN202320461403.0U CN202320461403U CN219635812U CN 219635812 U CN219635812 U CN 219635812U CN 202320461403 U CN202320461403 U CN 202320461403U CN 219635812 U CN219635812 U CN 219635812U
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- CN
- China
- Prior art keywords
- plate
- unit
- buffer
- base
- fixedly connected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000001259 photo etching Methods 0.000 title abstract description 50
- 238000005299 abrasion Methods 0.000 claims abstract description 9
- 238000000206 photolithography Methods 0.000 claims description 10
- 230000003139 buffering effect Effects 0.000 claims 2
- 239000006260 foam Substances 0.000 claims 2
- 239000000725 suspension Substances 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 4
- 230000002035 prolonged effect Effects 0.000 abstract description 2
- 229920001821 foam rubber Polymers 0.000 description 8
- 238000010030 laminating Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005381 potential energy Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Mechanical Control Devices (AREA)
Abstract
The utility model discloses a device for preventing a photoetching plate from being worn, and relates to the technical field of photoetching plates; the utility model comprises a base, wherein a suspension mechanism is arranged on the outer side of the base, the suspension mechanism comprises a supporting unit, an electric telescopic rod, a limiting unit, a buffer unit, a moving unit and a spring, the supporting unit is arranged on the outer end of the upper side of the base, the electric telescopic rod is fixedly connected with the two sides of the base, the limiting unit is arranged on the upper side of the electric telescopic rod, the buffer unit is arranged on the upper end of the limiting unit, the moving unit is arranged on the two sides of the buffer unit, one end of the moving unit far away from the buffer unit is arranged in the limiting unit, the spring is arranged on the lower side of the buffer unit, and the suspension mechanism is arranged, so that the storage of the photoetching plate is more convenient, the photoetching plate is suspended, the anti-abrasion effect is enhanced, and the service life of the photoetching plate is effectively prolonged.
Description
Technical Field
The utility model relates to the technical field of photolithography masks, in particular to a device for preventing the photolithography masks from being worn.
Background
Photolithography is commonly used in the electronics industry, which is an integral part of the electronics industry.
In the process of production and processing and subsequent use of the photoetching plate, the material is relatively fragile, so that the photoetching plate needs to be placed on a sponge when placed, and the photoetching plate is prevented from being worn by using the softness of the sponge, so that the service life of the photoetching plate is prolonged.
The sponge is adopted to prevent the photoetching plate from being worn, the protective effect is relatively good, but after the sponge is used for a period of time, more dust and other particles are easily accumulated in the sponge and on the surface of the sponge, so that the photoetching plate is worn in the placing and taking processes, the service life of the photoetching plate is reduced due to the damage of the photoetching plate, and the inventor proposes a device for preventing the photoetching plate from being worn to solve the problems.
Disclosure of Invention
In order to solve the problem of poor protection effect of the anti-abrasion device of the photoetching plate; the utility model aims to provide a device for preventing a photoetching plate from being worn.
In order to solve the technical problems, the utility model adopts the following technical scheme: including the base, the base outside is provided with unsettled mechanism, and unsettled mechanism includes supporting element, electric telescopic handle, spacing unit, buffer unit, mobile unit and spring, and base upside outer end sets up supporting element, and the base both sides link firmly electric telescopic handle, and electric telescopic handle upside sets up spacing unit, and spacing unit upper end sets up buffer unit, and buffer unit both sides set up mobile unit, and mobile unit keeps away from buffer unit's one end setting in spacing unit, and buffer unit downside sets up the spring.
Preferably, the support unit comprises a support and a foam-rubber cushion, the outer side of the upper side of the base is fixedly connected with the support, the upper side of the support is fixedly connected with the foam-rubber cushion, four groups of supports and the foam-rubber cushion are symmetrically arranged on the upper side of the base in pairs, and the upper end of the foam-rubber cushion is provided with an arc chamfer.
Preferably, the limiting unit comprises a push plate and a baffle, the upper side of the electric telescopic rod is fixedly connected with the push plate, one end, far away from the base, of the upper side of the push plate is fixedly connected with the baffle, the upper end of the baffle is provided with an arc-shaped chamfer, and the push plate and the baffle form an L shape.
Preferably, the buffer unit includes buffer board and sponge board, and the inside buffer board that inserts of push pedal middle-end, and the buffer board upside links firmly the sponge board, and buffer board downside both ends link firmly the spring, and the spring lower extreme links firmly in the push pedal, and the mobile unit includes slider and ball, and the buffer board both sides link firmly the slider, and the one end that the buffer board was kept away from to the slider slides in the push pedal, and the inside ball of inserting of slider, and one side laminating push pedal that the slider was kept away from to the ball.
Compared with the prior art, the utility model has the beneficial effects that:
through setting up unsettled mechanism, when making the photoetching plate need place, place the outer end four corners department of photoetching plate on supporting element earlier, then start electric telescopic handle, make electric telescopic handle output shaft promote spacing unit and shift up, drive buffer unit after spacing unit removes and remove, buffer unit and the outer end edge laminating of photoetching plate, buffer unit promotes the photoetching plate along with spacing unit's removal and shifts up afterwards, limit through spacing unit to the edge of photoetching plate, it is more convenient to make the depositing of photoetching plate, can make the photoetching plate unsettled and then strengthen the abrasionproof effect, effectively promote the life of photoetching plate.
Drawings
In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, it being obvious that the drawings in the following description are only some embodiments of the utility model, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of the structure of the present utility model.
Fig. 2 is a schematic cross-sectional elevation view of the present utility model.
FIG. 3 is a schematic diagram of the structure of FIG. 2A according to the present utility model.
In the figure: 1. a base; 2. a bracket; 3. a sponge cushion; 4. an electric telescopic rod; 5. a push plate; 6. a baffle; 7. a buffer plate; 8. a sponge plate; 9. a slide block; 10. a ball; 11. and (3) a spring.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
Embodiment one: as shown in fig. 1-3, the utility model provides a device for preventing a photolithography mask from being worn, which comprises a base 1, wherein a suspension mechanism is arranged on the outer side of the base 1, the suspension mechanism comprises a supporting unit, an electric telescopic rod 4, a limiting unit, a buffer unit, a moving unit and a spring 11, the supporting unit is arranged on the outer end of the upper side of the base 1, the electric telescopic rod 4 is fixedly connected with the two sides of the base 1, the limiting unit is arranged on the upper side of the electric telescopic rod 4, the buffer unit is arranged on the upper end of the limiting unit, the moving unit is arranged on the two sides of the buffer unit, one end of the moving unit far away from the buffer unit is arranged in the limiting unit, and the spring 11 is arranged on the lower side of the buffer unit.
Through adopting above-mentioned technical scheme, when making the photoetching plate need place, place the outer end four corners department of photoetching plate on supporting element earlier, then start electric telescopic handle 4, make electric telescopic handle 4 output shaft promote spacing unit and shift up, drive buffer unit after spacing unit removes and remove, buffer unit and the outer end edge laminating of photoetching plate, buffer unit promotes the photoetching plate to shift up along with spacing unit's removal afterwards, limit through spacing unit to the edge of photoetching plate, through setting up unsettled mechanism, it is more convenient to make the depositing of photoetching plate, can make the photoetching plate unsettled and then strengthen the abrasionproof effect, effectively promote the life of photoetching plate.
The supporting unit comprises a bracket 2 and a foam-rubber cushion 3, the outer side of the upper side of the base 1 is fixedly connected with the bracket 2, and the upper side of the bracket 2 is fixedly connected with the foam-rubber cushion 3.
By adopting the technical scheme, four corners of the photoetching plate are placed on the sponge cushion 3, and the photoetching plate is supported by the support 2 and the sponge cushion 3, so that the photoetching plate is placed in a suspending manner.
Four sets of supports 2 and foam-rubber cushion 3 are arranged on the upper side of base 1 in two-by-two symmetry, and arc chamfer is set up to foam-rubber cushion 3 upper end.
By adopting the technical scheme, four groups of brackets 2 and the sponge cushion 3 are symmetrically arranged in pairs, so that the placement of the photolithography mask is more stable.
The limiting unit comprises a push plate 5 and a baffle 6, the push plate 5 is fixedly connected to the upper side of the electric telescopic rod 4, and the baffle 6 is fixedly connected to one end, far away from the base 1, of the upper side of the push plate 5.
Through adopting above-mentioned technical scheme, electric telescopic handle 4 starts the back and drives push pedal 5 and baffle 6 and shift up, is convenient for carry out spacing to the edge of photoetching plate through push pedal 5 and baffle 6.
The upper end of the baffle 6 is provided with an arc chamfer, and the push plate 5 and the baffle 6 form an L shape.
By adopting the technical scheme, the upper end of the baffle 6 is provided with the arc chamfer, the push plate 5 and the baffle 6 are arranged in an L shape, and the photoetching plate is convenient to limit.
The buffer unit comprises a buffer plate 7 and a sponge plate 8, the buffer plate 7 is inserted into the middle end of the push plate 5, and the sponge plate 8 is fixedly connected to the upper side of the buffer plate 7.
Through adopting above-mentioned technical scheme, after the laminating of sponge board 8 photoetching board, photoetching board utilizes self weight extrusion sponge board 8, makes sponge board 8 promote buffer board 7 compression spring 11, cushions with the help of the elastic potential energy of spring 11.
The two ends of the lower side of the buffer plate 7 are fixedly connected with springs 11, and the lower ends of the springs 11 are fixedly connected to the push plate 5.
Through adopting above-mentioned technical scheme, set up two sets of springs 11 in buffer board 7 downside, make the removal of buffer board 7 more stable.
The mobile unit includes slider 9 and ball 10, and buffer board 7 both sides link firmly slider 9, and the one end that buffer board 7 was kept away from to slider 9 slides in push pedal 5, and the inside ball 10 of inserting of slider 9, and the ball 10 is kept away from one side laminating push pedal 5 of slider 9.
Through adopting above-mentioned technical scheme, drive slider 9 and ball 10 synchronous motion when buffer board 7 removes, the ball 10 rolls with push pedal 5 laminating under the spacing of slider 9 in the removal in-process, and the supplementary buffer board 7 of roll with the help of ball 10 removes.
Working principle: when the photoetching plate is placed, four corners of the photoetching plate are placed on the sponge cushion 3, the photoetching plate is supported and suspended through the support 2 and the sponge cushion 3, then the electric telescopic rod 4 is started, the output shaft of the electric telescopic rod 4 drives the push plate 5 and the baffle 6 to move upwards, the push plate 5 drives the buffer plate 7 and the sponge plate 8 to move after moving, when the sponge plate 8 moves to the position, which is attached to the photoetching plate, of the lower side of the edge of the photoetching plate, the sponge plate 8 is extruded by the self weight, the sponge plate 8 moves downwards to push the buffer plate 7, the buffer plate 7 compresses the spring 11 under the assistance of the sliding block 9 and the ball 10, then the push plate 5 continues to move upwards, so that the push plate 5 drives the edge of the photoetching plate to move upwards, the edge of the photoetching plate is limited through the push plate 5 and the baffle 6, the electric telescopic rod 4 is closed after limiting, and when the photoetching plate is taken out later, the electric telescopic rod 4 is started, the electric telescopic rod 4 is contracted to drive the push plate 5 to move downwards, and the photoetching plate 5 is taken out after reset.
It will be apparent to those skilled in the art that various modifications and variations can be made to the present utility model without departing from the spirit or scope of the utility model. Thus, it is intended that the present utility model also include such modifications and alterations insofar as they come within the scope of the appended claims or the equivalents thereof.
Claims (8)
1. An apparatus for preventing wear of a lithographic plate, comprising a base (1), characterized in that: the utility model discloses a high-speed electric power steering device, including base (1), base (1) outside is provided with unsettled mechanism, and unsettled mechanism includes supporting element, electric telescopic handle (4), spacing unit, buffer unit, mobile unit and spring (11), base (1) upside outer end sets up supporting element, and base (1) both sides link firmly electric telescopic handle (4), electric telescopic handle (4) upside sets up spacing unit, and spacing unit upper end sets up buffer unit, buffer unit both sides set up mobile unit, and the one end that buffer unit was kept away from to mobile unit sets up in spacing unit, buffer unit downside sets up spring (11).
2. A device for preventing abrasion of a lithographic plate according to claim 1, wherein the supporting unit comprises a bracket (2) and a foam pad (3), wherein the bracket (2) is fixedly connected to the outer side of the upper side of the base (1), and the foam pad (3) is fixedly connected to the upper side of the bracket (2).
3. A device for preventing abrasion of a photolithography mask according to claim 2, wherein four groups of the support (2) and the sponge pad (3) are symmetrically arranged on the upper side of the base (1), and the upper end of the sponge pad (3) is provided with an arc chamfer.
4. A device for preventing abrasion of a photolithography plate according to claim 1, wherein the limiting unit comprises a pushing plate (5) and a baffle plate (6), the pushing plate (5) is fixedly connected to the upper side of the electric telescopic rod (4), and one end, far away from the base (1), of the upper side of the pushing plate (5) is fixedly connected to the baffle plate (6).
5. A device for preventing abrasion of a lithographic plate according to claim 4, wherein the upper end of the baffle plate (6) is provided with an arc chamfer, and the push plate (5) and the baffle plate (6) form an L shape.
6. The apparatus for preventing abrasion of a photolithography mask according to claim 4, wherein the buffer unit comprises a buffer plate (7) and a sponge plate (8), and the buffer plate (7) is inserted into the middle end of the pushing plate (5), and the sponge plate (8) is fixedly connected to the upper side of the buffer plate (7).
7. A device for preventing abrasion of a photolithography mask according to claim 6, wherein the springs (11) are fixedly connected to both sides of the lower side of the buffer plate (7), and the lower ends of the springs (11) are fixedly connected to the pushing plate (5).
8. The apparatus for preventing abrasion of a photolithography mask according to claim 6, wherein the moving unit comprises a sliding block (9) and balls (10), the sliding block (9) is fixedly connected to two sides of the buffering plate (7), one end of the sliding block (9) far away from the buffering plate (7) slides in the pushing plate (5), the balls (10) are inserted into the sliding block (9), and one side of the balls (10) far away from the sliding block (9) is attached to the pushing plate (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320461403.0U CN219635812U (en) | 2023-03-09 | 2023-03-09 | Device for preventing photoetching plate from being worn |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320461403.0U CN219635812U (en) | 2023-03-09 | 2023-03-09 | Device for preventing photoetching plate from being worn |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219635812U true CN219635812U (en) | 2023-09-05 |
Family
ID=87816057
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202320461403.0U Active CN219635812U (en) | 2023-03-09 | 2023-03-09 | Device for preventing photoetching plate from being worn |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219635812U (en) |
-
2023
- 2023-03-09 CN CN202320461403.0U patent/CN219635812U/en active Active
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |