CN219603667U

CN219603667U - Long-life rotary cathode magnetron sputtering target material

Info

Publication number: CN219603667U
Application number: CN202223098113.9U
Authority: CN
Inventors: 刘阳; 刘彬; 王磊磊
Original assignee: Beijing Powertech Co Ltd
Current assignee: Beijing Powertech Co Ltd
Priority date: 2022-11-22
Filing date: 2022-11-22
Publication date: 2023-08-29
Anticipated expiration: 2032-11-22

Abstract

The utility model relates to a long-life rotary cathode magnetron sputtering target which is characterized by comprising a cylindrical target, an embedded annular target and a target plug, wherein the cylindrical target is a straight-section target, the embedded annular target is nested outside the cylindrical target, and the embedded annular target is positioned at the end parts of two ends of the cylindrical target. The consumption rate of the end targets at the two ends of the cylindrical target is reduced, and the etching difference between the end parts and the middle part of the cylindrical target is reduced, so that the target utilization rate is improved, the cost of producing products is greatly reduced, the production resources are saved, and the product competitiveness is improved; meanwhile, an inner groove structure embedded into the annular target is tightly matched with the outer convex positioning block of the target plug, so that the heat dissipation problem at the joint of the cylindrical target is solved, and the service life of the rotary cathode magnetron sputtering target is comprehensively prolonged.

Description

Long-life rotary cathode magnetron sputtering target material

Technical Field

The utility model relates to a magnetron sputtering coating target, in particular to a long-life rotary cathode magnetron sputtering target.

Background

The magnetron sputtering coating is a coating technology that solid target material is bombarded by charged particles, so that target material atoms are sputtered out and deposited on the surface of a substrate to form a film. In the magnetron sputtering coating technology, a magnetic field is provided by placing a magnetic pole in the center of a target, the magnetic field is fixed to rotate the target, the target is used as a cathode, a substrate is used as an anode, and an electric field is formed between the target and the substrate by applying negative high pressure to the target. The magnetron sputtering coating is to make electrons run spirally on the target surface by utilizing the interaction of a magnetic field and an electric field, and to continuously strike argon to generate ions, the generated ions strike the target surface to sputter the target material under the action of the electric field, and the target material is deposited on the substrate to obtain the required conductive film layer. When a conventional rotary cylindrical target is used for magnetron sputtering coating, magnetic lines of force generated by a magnetic field are unevenly distributed on the target surface, plasmas are strongest at a place where the magnetic lines of force are concentrated, a V-shaped channel is formed on the corresponding target surface by sputtering, the target material is fastest to consume, the whole target can not be used any more, a vulnerable part is formed, and the utilization rate of the target material is low due to the problems. Particularly, due to the effect of the cathode end, the uniformity of the plasma on the surface of the cathode end is influenced by the turning position of the plasma electronic runway, the consumption of the strong plasma target is more in the end region of the target facing corner line, and the consumption of the target is less in the straight passage region of the target, so that the phenomenon of uneven sputtering channel depth in the end region and the straight passage region of the target is formed. Particularly for more expensive sputtering metal targets, the utilization rate directly affects the rise of the product cost. Therefore, improving the target utilization rate is a problem to be solved, and the prior methods for solving the uneven sputtering of the cylindrical target mainly comprise the following modes: firstly, the thickness of a local target is increased in a mode of spraying and processing a boss, the spraying is limited to a special target, and the purity of the target can be ensured; secondly, the target material is processed into a boss, which causes waste of the target material; thirdly, processing lantern rings made of the same material and fixing the lantern rings by using a binding or pouring method, wherein the method can solve the problem that the small-power work is performed, but the working time is long or gaps are formed at the joint of the high-power work targets, and the targets are partially melted when the phenomenon of poor heat dissipation of the targets is serious. There is still room for improvement in the availability of targets and targets.

Disclosure of Invention

The utility model provides a long-life rotary cathode magnetron sputtering target structure and a method aiming at the existing problems, and aims to improve the target consumption speed of a sputtering depth region by a method of simply connecting targets. The aim is also to improve the heat dissipation problem at the joint of the targets. The target utilization at the position where the cylindrical sputtering consumes more and the position where the cylindrical sputtering consumes less is maximized.

In order to solve the problems, the utility model provides a long-life rotary cathode magnetron sputtering target material, which comprises the following components:

the utility model provides a rotatory cathode magnetron sputtering target of long-life, its characterized in that includes cylinder target, embedded annular target and target end cap, the cylinder target is straight section target, embedded annular target nestification is in the cylinder target outside, embedded annular target is located the tip at cylinder target both ends.

Further, the inner surface of one end of the embedded annular target is attached to the outer surface of the cylindrical target, and the target plugs are used for connecting the embedded annular target with the end parts of the two ends of the cylindrical target through bolts.

Further, the inner surface of the other end of the embedded annular target material is of an inner groove structure.

Further, one end of the embedded annular target material, which is attached to the outer surface of the cylindrical target material, is of an oblique angle structure.

Further, one end of the embedded annular target material, which is attached to the outer surface of the cylindrical target material, is of a bulge structure.

Further, threaded holes are formed in the two end portions of the cylindrical target, and the threaded holes are used for fixing the embedded annular target with the two end portions of the cylindrical target through the bolts.

Further, the inner diameter of the embedded annular target is larger than or equal to the outer diameter of the cylindrical target, so that the embedded annular target can be smoothly nested outside the cylindrical target.

Further, the target plug is provided with a sealing groove, a sealing rubber ring, a fixing hole and an outer convex positioning block.

Further, the target plugs are divided into front target plugs and rear target plugs.

Further, the outer convex positioning block is inlaid and closely attached to the inner groove structure embedded in the annular target, and a sufficient cooling effect can be achieved after the outer convex positioning block is heated.

The utility model has the technical effects that: the defect of uneven etching at the two ends of the rotary cathode magnetron sputtering target is overcome, the utilization rate of the target can be improved, and the service life of the target can be prolonged. And the problem of poor heat dissipation caused by the connection of the target material is solved, the use power of the rotary cathode magnetron sputtering target is greatly improved, the production cost is reduced, and the coating production efficiency is also improved.

Drawings

In order to more clearly illustrate the embodiments of the present utility model or the technical solutions in the prior art, the drawings that are needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present utility model, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

FIG. 1 is a schematic diagram of a prior art rotary cathode magnetron sputtering target.

FIG. 2 is a schematic diagram of the prior art rotating cathode magnetron sputtering target channel profile consumption.

FIG. 3 is a schematic diagram of a part of the structure of a long-life rotary cathode magnetron sputtering target material.

Fig. 4: the utility model is a schematic diagram of the section consumption of the long-life rotary cathode magnetron sputtering target material.

Fig. 5: the utility model relates to a long-life rotating cathode magnetron sputtering target structure schematic diagram.

Fig. 6: the utility model relates to a long-life rotating cathode magnetron sputtering target structure schematic diagram.

See fig. 1, wherein 1 is a schematic diagram of a conventional cylindrical target, fig. 2 is a schematic diagram of the surface depletion of the conventional cylindrical magnetron sputtering target, 3 is a deeper consumption depth of a sputtering channel in an end region of the target, and 4 is a shallower and uniform consumption depth of a sputtering channel in a middle region. Fig. 3, 5 and 6 show the cylindrical target 11 in the middle region, the target plug 31, the convex positioning block 311, the sealing rubber ring 32 for fixing the cylindrical target 11 and the target plug 31, and the connecting bolts 33, embedded in the annular target 21, the bevel structure 211, the bulge structure 212 and the inner groove structure 213. Fig. 4 is a schematic representation of the depletion of the surface of a modified cylindrical target.

Detailed Description

The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

Example 1:

the conventional rotating cathode cylindrical magnetic field sputtering target material is used for depositing a pure copper film by a flexible film winding system.

The rotary cathode cylindrical magnetron sputtering target comprises a target head, a magnetic steel seat, an insulating sleeve, a target motor, a target material plug and the like; firstly, measuring the consumed target material 2 which adopts the whole cylindrical target material, and fig. 2 is a schematic diagram showing the consumption of the channel section of the cylindrical target material magnetic control sputtering target material under the general use condition, wherein: the consumption depth of the sputtering groove in the end part area is deeper and is marked as 3, the consumption depth of the sputtering groove in the straight-channel cylindrical area is shallower and uniform and is marked as 4, a cylindrical copper target material with the size of phi 165mm of outer diameter, 400mm of length and 125mm of inner diameter is taken as a reference, and the measurement of the target period is carried out continuously for a plurality of times, wherein 3 is 2 mm-4 mm,4 is 5 mm-6 mm, and L1=120 mm; the original target structure has the end effect that sputtering grooves in two end regions of the target consume 3mm more depth, and the thick target in the middle region of the target is not completely consumed.

Example 2:

as shown in fig. 3 and fig. 5, a long-life rotary cathode magnetron sputtering target is characterized by comprising a cylindrical target 11, an embedded annular target 21 and a target plug 31, wherein the cylindrical target 11 is a straight-section target, the embedded annular target 21 is nested outside the cylindrical target 11, and the embedded annular target 21 is positioned at the end parts of two ends of the cylindrical target 11. The inner surface of one end of the embedded annular target 21 is attached to the outer surface of the cylindrical target 11, preferably, the outer surface of one end of the embedded annular target 21 is an oblique angle structure 211 or a bulge structure 212, when in use, the embedded annular target 21 can be consumed first, and after the embedded annular target 21 is consumed, the cylindrical target 11 is consumed again, so that the problem of short service life caused by fast consumption of the end of the current target is solved. The target plugs 31 connect the embedded annular targets 21 with the two end parts of the cylindrical targets 11 through bolts; the inner surface of the other end of the embedded annular target 21 is provided with an inner groove structure 213. Screw holes are formed in the two end portions of the cylindrical target 11 and used for fixing the embedded annular target 21 and the two end portions of the cylindrical target 11. The inner diameter of the embedded annular target 21 is larger than or equal to the outer diameter of the cylindrical target 11, so that the embedded annular target 21 can be smoothly nested outside the cylindrical target 11. The target plug 31 is provided with a sealing groove, a sealing rubber ring, a fixing hole and a convex positioning block 311. The target plugs 31 are divided into front target plugs and rear target plugs, and the front target plugs and the rear target plugs are used for fixing the embedded annular targets 21 and the cylindrical targets 11, and are also connected with a rotary cathode target seat; the rear target plug is connected with the magnetic steel seat and plays a role in positioning the magnetic steel seat, and meanwhile, the cooling waterway is sealed and plays a role in no leakage. The convex positioning block 311 is embedded and tightly attached with the inner groove structure 213 embedded in the annular target 21. It should be noted that after being heated, the convex positioning block and the inner groove structure of the embedded annular target will be matched more tightly, so that the embedded annular target 21 and the cylindrical target 11 are better in contact, have good thermal conductivity, and can timely and fully utilize the circulation of cooling water to take away the heat of the cylindrical target 11, thereby solving the technical problem of poor heat dissipation effect after the embedded annular target 21 is added.

One end of the embedded annular target 21 attached to the outer surface of the cylindrical target 11 is an oblique angle structure 211. One end of the embedded annular target 31 is turned into an oblique angle, and the oblique angle is 10-30 degrees. For example, the outer diameter of the cylindrical target 11 is unchanged, the length is 400mm, the inner diameter is 125mm, the two ends are changed into the outer diameter of the embedded annular target 21, which is 195mm, the width is 63mm, one end of the inner diameter, which is 165mm, is turned into an oblique angle, and preferably, the embedded annular target 21 and the cylindrical target 11 are spliced at an angle of 25 degrees.

The embedded annular targets 21 at the two end parts of the cylindrical target 11 are nested on the outer surface of the cylindrical target 11 and are mutually attached, and the target plugs 31 are used for connecting the embedded annular targets 21 with the two end parts of the cylindrical target 11 through the bolts 33 and sealing the cylindrical target cooling water and vacuum sealing through the sealing rubber rings 32.

After the rotary cathode cylindrical magnetic field sputtering target structure obtained in the embodiment is adopted, after the embedded annular target 21 is exhausted, the cylindrical target 11 is directly consumed until the target is exhausted; the cylindrical target 11 can be improved from original 5mm to 6mm to 4mm to 3.5mm, and no target is required to be replaced in the whole target consumption process until the whole target is extremely consumed, so that the utilization rate of the whole cylindrical target can be improved by 10% -15% again, and the service life is effectively prolonged.

Embodiment 3 as shown in fig. 3 and 6, the end of the embedded annular target 21 attached to the outer surface of the cylindrical target 11 is a bulge structure 212. One end of the embedded annular target 31 is turned into an arc, and the radius of the arc is R20-R40. For example, the outer diameter of the cylindrical target 11 is unchanged, the length is 400mm, the inner diameter is 125mm, the two ends are changed into the outer diameter of the embedded annular target 21 to 195mm, the width is 63mm, one end of the inner diameter 165mm is turned into an arc R angle, and preferably, one end of the embedded annular target 21 is turned into an arc R40.

It is to be understood that the utility model is not limited to the precise arrangements and instrumentalities shown in the drawings, which have been described above, and that various modifications and changes may be effected without departing from the scope thereof. The scope of the utility model is limited only by the appended claims.

Claims

1. The utility model provides a rotatory cathode magnetron sputtering target of long-life, its characterized in that includes cylinder target, embedded annular target and target end cap, the cylinder target is straight section target, embedded annular target nestification is in the cylinder target outside, embedded annular target is located the tip at cylinder target both ends.

2. The long-life rotary cathode magnetron sputtering target according to claim 1, wherein one end inner surface of the embedded annular target is attached to the outer surface of the cylindrical target, and the target plugs connect the embedded annular target with two end parts of the cylindrical target through bolts; the inner surface of the other end of the embedded annular target is of an inner groove structure.

3. The long life rotary cathode magnetron sputtering target of claim 1, wherein the end of the embedded annular target attached to the outer surface of the cylindrical target is of an oblique angle structure.

4. The long-life rotary cathode magnetron sputtering target of claim 1, wherein one end of the embedded annular target attached to the outer surface of the cylindrical target is of a bulge structure.

5. The long life rotary cathode magnetron sputtering target of claim 2, wherein threaded holes are provided at both ends of the cylindrical target.

6. The long life rotary cathode magnetron sputtering target of claim 2, wherein the inner diameter of the embedded annular target is greater than or equal to the outer diameter of the cylindrical target.

7. The long-life rotary cathode magnetron sputtering target of claim 2, wherein the target plug is provided with a sealing groove, a sealing rubber ring, a fixing hole and a convex positioning block.

8. The long life rotary cathode magnetron sputtering target of claim 7, wherein said target plugs are divided into front and rear target plugs.

9. The long life rotary cathode magnetron sputtering target of claim 8, wherein said male positioning block is in close fit with said female groove structure of said embedded annular target.