CN219485336U - Gas circuit structure and gas circuit control system - Google Patents
Gas circuit structure and gas circuit control system Download PDFInfo
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- CN219485336U CN219485336U CN202320443719.7U CN202320443719U CN219485336U CN 219485336 U CN219485336 U CN 219485336U CN 202320443719 U CN202320443719 U CN 202320443719U CN 219485336 U CN219485336 U CN 219485336U
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- 230000001105 regulatory effect Effects 0.000 claims abstract description 47
- 238000001179 sorption measurement Methods 0.000 claims abstract description 30
- 238000005498 polishing Methods 0.000 claims description 30
- 230000001276 controlling effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 7
- 230000002159 abnormal effect Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 230000003313 weakening effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The utility model provides a gas circuit structure and a gas circuit control system. The gas circuit structure includes: a gas source; the first vacuum generator is connected to a gas source through a first pipeline; the second vacuum generator is connected to the first pipeline through a second pipeline; the adsorption device is arranged at one end of the first vacuum generator and the second vacuum generator, which is far away from the air source; air pressure regulating valves are arranged between the first vacuum generator and the air source, and are used for independently controlling the air flow so as to stabilize the vacuum state of the adsorption device; the third vacuum generator is connected to an air source through a third pipeline and a fourth pipeline, a normally open valve is arranged on the third pipeline, and a normally closed valve and a throttle valve are arranged on the fourth pipeline; the fourth vacuum generator is connected to the air source through a fifth pipeline and a sixth pipeline, a normally open valve is arranged on the fifth pipeline, and a normally closed valve and a throttle valve are arranged on the sixth pipeline. According to the technical scheme, each pipeline can independently control the air flow, so that the vacuum state of the adsorption device is stabilized, and the influence caused by vacuum fluctuation is avoided.
Description
Technical Field
The utility model relates to the field of semiconductors, in particular to a gas circuit structure and a gas circuit control system.
Background
Chemical mechanical polishing (Chemical Mechanical Polishing, CMP for short), which is a processing technique combining chemical etching and mechanical removal, is widely used in semiconductor chip manufacturing. Typically, the polishing head may include a vacuum chamber capable of having a negative pressure to adsorb the wafer on a Membrane (MM) surface of the polishing head for polishing. The negative pressure within the vacuum chamber may be created by, for example, a grinding vacuum generator using positive pressure gas from a gas source.
Fig. 1 is a schematic diagram of a gas path structure in a grinding machine in the prior art. As shown in fig. 1, the polishing machine is designed to supply a Clean Dry Air (CDA) to the machine 11, and then the polishing machine is divided into four parts, one part supplies Air to all Air plates and a Robot arm (Robot) vacuum generator 12, two parts supplies Air to an External Chamber (EC) vacuum generator 13 of the polishing head, three parts supply Air to an Upper Chamber (UC) vacuum generator 14 of the polishing head, and four parts supply Air to a wafer temporary storage platform (HCLU pendal) vacuum generator 15.
The vacuum capacity of the polishing head is created by the CDA as the adsorption capacity. However, abnormal fluctuations when vacuum capability is weak or Wafer (Wafer) is adsorbed may cause Wafer adsorption failure (Load Fail), pre-Polish adsorption failure (Before Polish), post-Polish adsorption failure (De-chunk Fail), and other polishing head related problems and trigger an alarm. In addition, it has been found that although the front end of the EC/UC has a pressure regulating valve, the robot and wafer staging platform use approximately 20psi CDA when creating vacuum, which still results in weakening and fluctuating EC/UC vacuum. Referring to fig. 2, the abscissa is polishing time, the ordinate is voltage corresponding to air pressure, reference numeral 21 is vacuum waveform of the wafer temporary storage stage vacuum generator 15, reference numeral 22 is vacuum waveform of the polishing head EC vacuum generator 13, reference numeral 23 is vacuum waveform of the polishing head UC vacuum generator 14, and reference numeral 24 is vacuum waveform of the robot vacuum generator 12. As shown in fig. 2, when the robot arm vacuum generator 12 and the wafer temporary storage platen vacuum generator 15 start to operate, the vacuum waveform of the polishing head EC vacuum generator 13 and the vacuum waveform of the polishing head UC vacuum generator 14 have significant fluctuations, as indicated by the region 20. The vacuum pipeline is of a one-to-four structure and is not mutually independent, so that the phenomenon of gas robbing can also exist between the grinding heads, frequent downtime of the grinding heads is caused, and trouble of duty and equipment maintenance is caused. The downtime of the product affects the yield and the frequent shutdown affects the productivity.
Therefore, how to ensure the vacuum capability, avoid abnormal fluctuation of the vacuum, reduce the mutual influence between pipelines and solve the problem in the prior art.
Disclosure of Invention
The utility model aims to solve the technical problems of ensuring vacuum capacity, avoiding abnormal fluctuation of vacuum, reducing mutual influence among pipelines and providing a gas circuit structure and a gas circuit control system.
In order to solve the above problems, the present utility model provides a gas path structure, including: a gas source; a first vacuum generator connected to the gas source through a first line; a second vacuum generator connected to the first line through a second line; the adsorption device is arranged at one end of the first vacuum generator and one end of the second vacuum generator, which are far away from the air source; a first air pressure regulating valve is arranged between the first vacuum generator and the air source, and a second air pressure regulating valve is arranged between the second vacuum generator and the air source so as to independently control the air flow and further stabilize the vacuum state of the adsorption device; the third vacuum generator is connected to the air source through a third pipeline and a fourth pipeline respectively, a first normally-open valve is arranged on the third pipeline, and a first normally-closed valve and a first throttle valve are arranged on the fourth pipeline; the fourth vacuum generator is connected to the air source through a fifth pipeline and a sixth pipeline respectively, a second normally open valve is arranged on the fifth pipeline, and a second normally closed valve and a second throttle valve are arranged on the sixth pipeline.
In some embodiments, a first pressure regulating valve is disposed between the first pressure regulating valve and the gas source, and an intersection of the second line and the first line is located between the first pressure regulating valve and the gas source; a second pressure regulating valve is arranged between the second air pressure regulating valve and the intersection point of the second pipeline and the first pipeline.
In some embodiments, the first and second normally open valves are open in response to a first signal and closed in response to a second signal; the first and second normally closed valves are closed in response to a first signal and open in response to a second signal.
In some embodiments, the third vacuum generator is a robotic vacuum generator; the fourth vacuum generator is a wafer temporary storage platform vacuum generator.
In some embodiments, the adsorption device is a polishing head, a robot arm, or a wafer temporary storage stage.
In some embodiments, the first air pressure regulating valve and the second air pressure regulating valve are respectively provided with a digital gauge head for detecting air flow fluctuation and outputting an alarm signal when the air flow fluctuation exceeds a preset upper limit or lower limit.
In order to solve the problems, the utility model provides a gas path control system which comprises the gas path structure.
In some embodiments, the first air pressure regulating valve and the second air pressure regulating valve are respectively provided with a digital gauge head, and the digital gauge heads are used for detecting air flow fluctuation and outputting an alarm signal when the air flow fluctuation exceeds a preset upper limit or lower limit; the system also comprises a controller, wherein the input end of the controller is connected to the digital gauge outfit, the output end of the controller is connected to the first normally open valve, the second normally open valve, the first normally closed valve and the second normally closed valve, the controller receives an alarm signal output by the digital gauge outfit and outputs a control signal, and the control signal comprises a first signal and a second signal so as to control the opening and closing states of the first normally open valve, the second normally open valve, the first normally closed valve and the second normally closed valve.
In some embodiments, the controller outputs the first signal and the second signal alternately according to the alarm signal, so that the open and close states of the first normally-open valve and the first normally-closed valve and/or the second normally-open valve and the second normally-closed valve are repeatedly switched, and air flow is repeatedly switched between the third pipeline and the fourth pipeline and/or between the fifth pipeline and the sixth pipeline, so that the air pressure influence on the first vacuum generator and the second vacuum generator when the third vacuum generator and/or the fourth vacuum generator work is reduced.
In some embodiments, solenoid valves are provided between the output of the controller and the first, second, first and second normally-closed valves.
According to the technical scheme, the air pressure regulating valves are arranged on the first pipeline and the second pipeline, so that each pipeline can independently control the air flow, the vacuum state of the adsorption device is stabilized, and the influence caused by vacuum fluctuation is avoided. The digital meter head is adopted to detect air flow fluctuation, an alarm signal is output when the air flow fluctuation exceeds a preset upper limit or lower limit, the alarm signal is transmitted to the controller, the controller outputs a control signal according to the alarm signal, and the opening and closing states of the first normally-open valve and the first normally-closed valve and/or the second normally-open valve and the second normally-closed valve are switched, so that the air flow is repeatedly switched between the third pipeline and the fourth pipeline, and the air pressure influence on the first vacuum generator and the second vacuum generator when the third vacuum generator works is reduced. The other output end of the controller is directly integrated into a signal input/output circuit of the grinding machine, a standby signal point is taken, the standby signal point is set in a user event, when the digital gauge head is abnormal, the machine needs to give an alarm, the machine can not stop at the same time, and the product is not influenced when the equipment is notified. The utility model solves the problem of related alarm of the grinding head caused by weakening or fluctuation of the vacuum of the grinding head to a great extent, reduces the burden of equipment maintenance personnel and improves the utilization rate of the machine.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the utility model as claimed. Techniques, methods, and apparatus known to one of ordinary skill in the relevant art may not be discussed in detail, but should be considered part of the specification where appropriate.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present utility model, the drawings that are required to be used in the description of the embodiments will be briefly described below. It is evident that the drawings in the following description are only some embodiments of the present utility model and that other drawings may be obtained from these drawings without inventive effort for a person of ordinary skill in the art.
Fig. 1 is a schematic structural view of a gas path structure in a grinding machine in the prior art.
Fig. 2 is a vacuum waveform diagram of a gas circuit structure in the prior art.
Fig. 3 is a schematic structural diagram of an embodiment of the air path structure according to the present utility model.
Fig. 4 is a schematic structural diagram of an embodiment of the gas circuit control system according to the present utility model.
Fig. 5 is a vacuum waveform diagram of the gas circuit control system according to the present utility model.
Detailed Description
The technical solutions of the embodiments of the present utility model will be clearly and completely described below with reference to the accompanying drawings. It will be apparent that the described embodiments are only some, but not all, embodiments of the utility model. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to fall within the scope of the utility model.
Please refer to fig. 3, which is a schematic diagram illustrating an embodiment of the air path structure according to the present utility model. As shown in fig. 3, the air path structure includes: a gas source 30, a first vacuum generator 31, a second vacuum generator 32, a third vacuum generator 33, a fourth vacuum generator 34, and an adsorption device 35. The gas source 30 is used to supply clean dry gas. The first vacuum generator 31 is connected to the gas source 30 via a first line 311. The second vacuum generator 32 is connected to the first line 311 through a second line 321. The adsorption device 35 is disposed at one end of the first vacuum generator 31 and the second vacuum generator 32 away from the air source 30.
The air source 30 is used for introducing high-pressure air into the first vacuum generator 31 by using the first pipeline 311, the spray pipe of the first vacuum generator 31 sprays compressed air at a high speed, and jet flow is formed at the outlet of the spray pipe to generate entrainment flow. Under the entrainment effect, the air in the adsorption device 35 connected with the vacuum port is continuously sucked away, the pressure in the adsorption device 35 and the first pipeline 311 is reduced to be lower than the atmospheric pressure, a certain vacuum degree is formed, and the adsorption fixation of the wafer is satisfied.
A first air pressure regulating valve 312 is disposed between the first vacuum generator 31 and the air source 30, and a second air pressure regulating valve 322 is disposed between the second vacuum generator 32 and the air source 30, so as to independently control the air flow and further stabilize the vacuum state of the adsorption device. By arranging the air pressure regulating valves on the first pipeline 311 and the second pipeline 321, each pipeline can independently control the air flow, so that the vacuum state of the adsorption device is stabilized, and the influence caused by vacuum fluctuation is avoided.
The system further comprises a third vacuum generator 33 connected to the air source 30 through a third pipe 331 and a fourth pipe 332, wherein a first normally-open valve 333 is arranged on the third pipe 331, and a first normally-closed valve 334 and a first throttle valve 335 are arranged on the fourth pipe 332; and a fourth vacuum generator 34 connected to the air source 30 through a fifth pipeline 341 and a sixth pipeline 342, wherein a second normally open valve 343 is arranged on the fifth pipeline 341, and a second normally closed valve 344 and a second throttle valve 345 are arranged on the sixth pipeline 342. In some embodiments, the third vacuum generator 33 is a robotic vacuum generator; the fourth vacuum generator 34 is a wafer temporary storage stage vacuum generator.
According to the technical scheme, the air pressure regulating valves are arranged on the first pipeline 311 and the second pipeline 321, so that each pipeline can independently control the air flow, the vacuum state of the adsorption device is stabilized, and the influence caused by vacuum fluctuation is avoided.
In some embodiments, four first vacuum generators 31 are disposed after the first pressure regulating valve 312 of the first pipeline 311, and each first vacuum generator 31 corresponds to one adsorption device 35. The first vacuum generator 31 is a polishing head upper chamber vacuum generator, and the corresponding adsorption device 35 is an upper chamber polishing head. Four second vacuum generators 32 are disposed after the first air pressure regulating valve 322 of the second pipeline 321, and each second vacuum generator 32 corresponds to one adsorption device 35. The second vacuum generator 32 is a polishing head external chamber generator, and the corresponding suction device 35 is an external chamber polishing head. The first vacuum generator 31 and the second vacuum generator 32 are used for providing vacuum capability for the polishing head to adsorb the wafer to be polished.
In some embodiments, a first pressure regulating valve 313 is disposed between the first pressure regulating valve 312 and the gas source 30. The intersection 301 of the second pipe 321 and the first pipe 311 is located between the first pressure regulating valve 313 and the air source 30; a second pressure regulating valve 323 is provided between the second air pressure regulating valve 322 and the intersection 301 of the second pipe 321 and the first pipe 311. In this embodiment, the first pressure regulating valve 313 is an upper chamber pressure regulating valve for regulating the air flow of the vacuum generator in the upper chamber of the polishing head; the second pressure regulating valve 323 is an external chamber pressure regulating valve and is used for regulating the air flow of the vacuum generator of the external chamber of the grinding head.
In some embodiments, the suction device 35 is a polishing head, a robot arm, or a wafer platen. In this embodiment, the adsorption device 35 corresponding to the first vacuum generator 31 is a chamber at the upper part of the polishing head, the adsorption devices 35 corresponding to the second vacuum generator 32 are all chambers at the outer part of the polishing head, and the adsorption device 35 corresponding to the third vacuum generator 33 is a mechanical arm; the adsorption device 35 corresponding to the fourth vacuum generator 34 is a temporary wafer storage platform.
In some embodiments, the first air pressure regulating valve 312 and the second air pressure regulating valve 322 are respectively provided with a digital gauge head 314 for detecting air flow fluctuation and outputting an alarm signal when the air flow fluctuation exceeds a preset upper limit or lower limit.
In some embodiments, the first and second normally open valves 333, 343 are open in response to the first signal G1 and closed in response to the second signal G2; the first and second normally closed valves 334 and 344 are closed in response to the first signal G1 and open in response to the second signal G2. In a normal state, the first normally open valve 333 and/or the second normally open valve 343 are opened in response to the first signal G1, and the first normally closed valve 334 and/or the second normally closed valve 344 are closed in response to the first signal G1, so that the air flow passes through the third pipeline 331 and/or the fifth pipeline 341, and the pipeline corresponds to a straight pipeline. When an alarm signal sent by the digital header 314 is received, the first normally-open valve 333 and/or the second normally-open valve 343 are closed in response to the second signal G2, the first normally-closed valve 334 and/or the second normally-closed valve 344 are opened in response to the second signal G2, and air flows through the fourth pipeline 332 and/or the sixth pipeline 342, and passes through the first normally-closed valve 334 and/or the second normally-closed valve 344 and the first throttle valve 335 and/or the second throttle valve 345. The first throttle valve 335 and/or the second throttle valve 345 control the air flow in the pipeline, so that the occupation of the total air flow is reduced, and the influence on other pipelines is reduced.
Based on the same inventive concept, the utility model also provides a gas path control system.
Please refer to fig. 4, which is a schematic diagram illustrating a structure of the air path control system according to the present utility model. As shown in fig. 4, the gas path control system includes: a gas circuit structure 40; the air path structure 40 is shown in fig. 3, and is described in detail in the foregoing, and will not be described herein.
In some embodiments, the first air pressure regulating valve 312 and the second air pressure regulating valve 322 are respectively provided with a digital gauge head 314 for detecting air flow fluctuation and outputting an alarm signal when the air flow fluctuation exceeds a preset upper limit or lower limit; the system further comprises a controller 41, wherein an input end of the controller 41 is connected to the digital header 314, an output end of the controller 41 is connected to the first normally-open valve 333 and the second normally-open valve 343 and the first normally-closed valve 334 and the second normally-closed valve 344, the controller 41 receives an alarm signal output by the digital header 314 and outputs a control signal, and the control signal comprises a first signal G1 and a second signal G2 to control the opening and closing states of the first normally-open valve 333 and the second normally-open valve 343 and the first normally-closed valve 334 and the second normally-closed valve 344. In a normal state, the first normally open valve 333 and/or the second normally open valve 343 are opened in response to the first signal G1, and the first normally closed valve 334 and/or the second normally closed valve 344 are closed in response to the first signal G1, so that the air flow passes through the third pipeline 331 and/or the fifth pipeline 341, and the pipeline corresponds to a straight pipeline. Upon receiving the alarm signal from the digital header 314, the first and/or second normally-closed valves 334 and 344 are closed in response to the second signal G2, and the first and/or second normally-closed valves 334 and 344 are opened in response to the second signal G2, and air flows through the fourth and/or sixth pipelines 332 and 342 and past the first and/or second normally-closed valves 334 and 335 and/or 344 and the second throttle valve 345. The first throttle valve 335 and/or the second throttle valve 345 control the air flow in the pipeline, so that the occupation of the total air flow is reduced, and the influence on other pipelines is reduced.
It should be noted that when the first normally open valve 333 and the first normally closed valve 334 switch their open/close states in response to a control signal, the air flow is not directly switched from the third pipeline 331 to the fourth pipeline 332, but the air flow is repeatedly switched between the third pipeline 331 and the fourth pipeline 332 by setting the open/close states of the first normally open valve 333 and the first normally closed valve 334 to be rapidly and repeatedly switched, so as to reduce the air pressure influence on the first vacuum generator 31 and the second vacuum generator 32 when the third vacuum generator 33 is operated; when the second normally open valve 343 and the second normally closed valve 344 switch the open/close state in response to the control signal, the air flow is not directly switched from the fifth pipeline 341 to the sixth pipeline 342, but the air flow is repeatedly switched between the fifth pipeline 341 and the sixth pipeline 342 by setting the open/close state of the second normally open valve 343 and the second normally closed valve 344 to be rapidly and repeatedly switched, so as to reduce the air pressure influence on the first vacuum generator 31 and the second vacuum generator 32 when the fourth vacuum generator 34 works. Referring to fig. 5, the abscissa is polishing time, the ordinate is voltage magnitude corresponding to air pressure, and as an embodiment, reference numeral 51 is a vacuum waveform of a wafer temporary storage platform vacuum generator, reference numeral 52 is a vacuum waveform of a polishing head EC vacuum generator, reference numeral 53 is a vacuum waveform of a polishing head UC vacuum generator, and reference numeral 54 is a vacuum waveform of a robot vacuum generator. As shown in fig. 5, after the introduction of the controller 41 to control the air path structure, the fluctuation of the vacuum waveform is reduced, and the vacuum fluctuation is stabilized as shown in the area indicated by reference numeral 50.
In some embodiments, a solenoid valve 42 is disposed between the output of the controller 41 and the first normally-open valve 333, the first normally-closed valve 334, the second normally-open valve 343, and the second normally-closed valve 344. The solenoid valve 42 is used for converting a voltage signal output by the controller 41 into a switch control signal.
In addition, the other output end of the controller 41 is directly incorporated into a signal input/output circuit of the grinding machine, a standby signal point is taken and set in a User Event (User Event), when the digital header 314 is abnormal, the machine needs to alarm, the machine can not stop at the same time, and the product is not affected while the equipment is notified.
According to the technical scheme, the air pressure regulating valves are arranged on the first pipeline 311 and the second pipeline 321, so that each pipeline can independently control the air flow, the vacuum state of the adsorption device is stabilized, and the influence caused by vacuum fluctuation is avoided. The digital meter 314 is used for detecting the air flow fluctuation, and transmitting an alarm signal output when the air flow fluctuation exceeds a preset upper limit or lower limit to the controller 41, wherein the controller 41 outputs a control signal according to the alarm signal, and switches the open/close states of the first normally-open valve 333 and the first normally-closed valve 334, and the second normally-open valve 343 and the second normally-closed valve 344, so that the air flow is repeatedly switched between the third pipeline 331 and the fourth pipeline 332, and between the fifth pipeline 341 and the sixth pipeline 342, and the air pressure influence on the first vacuum generator 31 and the second vacuum generator 32 when the third vacuum generator 33 and the fourth vacuum generator 34 work is reduced. The other output end of the controller 41 is directly incorporated into a signal input/output circuit of the grinding machine, a standby signal point is taken, the standby signal point is set in a user event, when the digital gauge head 314 is abnormal, the machine needs to alarm, the machine can not stop at the same time, and the product is not influenced when the equipment is notified. The utility model solves the problem of related alarm of the grinding head caused by weakening or fluctuation of the vacuum of the grinding head to a great extent, reduces the burden of equipment maintenance personnel and improves the utilization rate of the machine.
It should be noted that references in the specification to "one embodiment," "an example embodiment," "some embodiments," etc., indicate that the embodiment described may include a particular feature, structure, or characteristic, but every embodiment may not necessarily include the particular feature, structure, or characteristic. Moreover, such phrases are not necessarily referring to the same embodiment. Furthermore, when a particular feature, structure, or characteristic is described in connection with an embodiment, it is submitted that it is within the knowledge of one skilled in the relevant art to effect such feature, structure, or characteristic in connection with other embodiments whether or not explicitly described.
Generally, the terms may be understood, at least in part, from the usage in the context. For example, the term "one or more" as used herein, depending at least in part on the context, may be used to describe any feature, structure, or characteristic in a singular sense, or may be used to describe a feature, structure, or combination of features in a plural sense. Similarly, terms such as "a," "an," or "the" may also be construed to express singular usage or plural usage depending at least in part on the context. In addition, the term "based on" may be understood as not necessarily intended to express a set of exclusive factors, but may instead, depending at least in part on the context, allow for other factors that are not necessarily explicitly described. It should also be noted in this specification that "connected/coupled" means not only that one component is directly coupled to another component, but also that one component is indirectly coupled to another component through intervening components.
It should be noted that the terms "comprising" and "having" and their variants are referred to in the document of the present utility model and are intended to cover non-exclusive inclusion. The terms "first," "second," and the like are used to distinguish similar objects and not necessarily to describe a particular order or sequence unless otherwise indicated by context, it should be understood that the data so used may be interchanged where appropriate. In addition, the embodiments of the present utility model and the features in the embodiments may be combined with each other without collision. In addition, in the above description, descriptions of well-known components and techniques are omitted so as to not unnecessarily obscure the present utility model. In the foregoing embodiments, each embodiment is mainly described for differences from other embodiments, and the same/similar parts between the embodiments are referred to each other.
The foregoing is merely a preferred embodiment of the present utility model and it should be noted that modifications and adaptations to those skilled in the art may be made without departing from the principles of the present utility model, which are intended to be comprehended within the scope of the present utility model.
Claims (10)
1. A gas circuit structure comprising:
a gas source;
a first vacuum generator connected to the gas source through a first line;
a second vacuum generator connected to the first line through a second line;
the adsorption device is arranged at one end of the first vacuum generator and one end of the second vacuum generator, which are far away from the air source;
the vacuum adsorption device is characterized in that a first air pressure regulating valve is arranged between the first vacuum generator and the air source, and a second air pressure regulating valve is arranged between the second vacuum generator and the air source so as to independently control the air flow and further stabilize the vacuum state of the adsorption device;
the third vacuum generator is connected to the air source through a third pipeline and a fourth pipeline respectively, a first normally-open valve is arranged on the third pipeline, and a first normally-closed valve and a first throttle valve are arranged on the fourth pipeline;
the fourth vacuum generator is connected to the air source through a fifth pipeline and a sixth pipeline respectively, a second normally open valve is arranged on the fifth pipeline, and a second normally closed valve and a second throttle valve are arranged on the sixth pipeline.
2. The structure of claim 1, wherein,
a first pressure regulating valve is arranged between the first air pressure regulating valve and the air source, and the intersection point of the second pipeline and the first pipeline is positioned between the first pressure regulating valve and the air source;
a second pressure regulating valve is arranged between the second air pressure regulating valve and the intersection point of the second pipeline and the first pipeline.
3. The structure of claim 1, wherein,
the first normally open valve and the second normally open valve are opened in response to a first signal and closed in response to a second signal; the first and second normally closed valves are closed in response to a first signal and open in response to a second signal.
4. The structure of claim 3, wherein,
the third vacuum generator is a mechanical arm vacuum generator;
the fourth vacuum generator is a wafer temporary storage platform vacuum generator.
5. The structure of claim 1, wherein the suction device is a polishing head, a robot arm, or a wafer temporary storage platen.
6. The structure according to claim 1, wherein the first air pressure regulating valve and the second air pressure regulating valve are respectively provided with a digital gauge head for detecting air flow fluctuation and outputting an alarm signal when the air flow fluctuation exceeds a preset upper limit or lower limit.
7. A gas path control system comprising a gas path structure as claimed in any one of claims 1 to 5.
8. The system of claim 7, wherein the system further comprises a controller configured to control the controller,
the first air pressure regulating valve and the second air pressure regulating valve are respectively provided with a digital gauge outfit, and are used for detecting air flow fluctuation and outputting an alarm signal when the air flow fluctuation exceeds a preset upper limit or lower limit;
the system also comprises a controller, wherein the input end of the controller is connected to the digital gauge outfit, the output end of the controller is connected to the first normally open valve, the second normally open valve, the first normally closed valve and the second normally closed valve, the controller receives an alarm signal output by the digital gauge outfit and outputs a control signal, and the control signal comprises a first signal and a second signal so as to control the opening and closing states of the first normally open valve, the second normally open valve, the first normally closed valve and the second normally closed valve.
9. The system according to claim 8, wherein the controller alternately outputs the first signal and the second signal according to the alarm signal, thereby repeatedly switching the open/close states of the first normally open valve and the first normally closed valve and/or the second normally open valve and the second normally closed valve, and repeatedly switching the air flow between the third pipeline and the fourth pipeline and/or between the fifth pipeline and the sixth pipeline, so as to reduce the air pressure influence on the first vacuum generator and the second vacuum generator when the third vacuum generator and/or the fourth vacuum generator are operated.
10. The system of claim 8, wherein a solenoid valve is disposed between the output of the controller and the first normally open valve, the second normally open valve, the first normally closed valve, and the second normally closed valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320443719.7U CN219485336U (en) | 2023-03-09 | 2023-03-09 | Gas circuit structure and gas circuit control system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320443719.7U CN219485336U (en) | 2023-03-09 | 2023-03-09 | Gas circuit structure and gas circuit control system |
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| Publication Number | Publication Date |
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| CN219485336U true CN219485336U (en) | 2023-08-08 |
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| CN202320443719.7U Active CN219485336U (en) | 2023-03-09 | 2023-03-09 | Gas circuit structure and gas circuit control system |
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2023
- 2023-03-09 CN CN202320443719.7U patent/CN219485336U/en active Active
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