CN219483258U - Adjustable carrying platform for coating film - Google Patents

Adjustable carrying platform for coating film Download PDF

Info

Publication number
CN219483258U
CN219483258U CN202222565722.4U CN202222565722U CN219483258U CN 219483258 U CN219483258 U CN 219483258U CN 202222565722 U CN202222565722 U CN 202222565722U CN 219483258 U CN219483258 U CN 219483258U
Authority
CN
China
Prior art keywords
platform
base
coating
utility
coating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202222565722.4U
Other languages
Chinese (zh)
Inventor
刘志亮
杨少飞
汪小岗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suzhou Maxwell Technologies Co Ltd
Original Assignee
Suzhou Maxwell Technologies Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suzhou Maxwell Technologies Co Ltd filed Critical Suzhou Maxwell Technologies Co Ltd
Priority to CN202222565722.4U priority Critical patent/CN219483258U/en
Application granted granted Critical
Publication of CN219483258U publication Critical patent/CN219483258U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

The utility model discloses an adjustable carrying platform for coating, and belongs to the field of photovoltaic devices. The utility model relates to an adjustable carrying platform for coating, which comprises a base, a base platform and a platform, wherein the base platform is arranged on the base; the bottom of the base station is fixedly connected to the base; the lifting mechanism is arranged on the platform, and the platform is connected to the base through the lifting mechanism. The utility model overcomes the defects of uneven flatness of a coated film and film repeatability in the process of re-coating the product caused by the height difference between a sample and a carrying platform in the prior art, and the coating tool bit always covers the film at the same height in the process of coating the film by arranging the liftable platform at the periphery of the sample, so that the height difference is effectively avoided, and the occurrence of edge effect is avoided.

Description

Adjustable carrying platform for coating film
Technical Field
The utility model relates to the technical field of photovoltaic devices, in particular to an adjustable carrying platform for coating films.
Background
The slit coating mask of the coating machine is a key part for adjusting the height of a sample and a sample table to be consistent in the coating process of the coating machine. The most commonly used mode at present is to place the product on the base station, and in the coating process, there is the difference in height between product and the base station, and in the coating tool bit coating to the product process from the base station, this difference in height can lead to the product to take place the marginal effect, and the tectorial membrane on the product is all around and the thickness in centre inconsistent, causes the uneven and problem of film repeatability of film of coating to produce.
Chinese patent application No.: CN202110611754.0, filing date: 2021, 06, 02, the utility model is named: the utility model provides an thing networking intelligent chip and production system thereof, this application includes the silicon chip and covers in the peripheral rete of silicon chip, the silicon chip includes core circuit body, seal cover and scribing groove, the seal cover sets up in the periphery of core circuit body and is provided with the interval between the core circuit body, the scribing groove sets up in the periphery of seal cover and is located between magic cover and the core circuit body, the through-hole has been seted up on the sealing washer, the wire has been arranged to through-hole department, the one end of wire with core circuit body coupling, and the other end extends to the scribing groove, the intra-layer conductive particle that has added of rete, the physical unclonable function of chip is more stable, and coating film production and rete drying efficiency are higher.
In the above patent, the problems of uneven flatness and repeatability of the coated film exist in the practical coating process of the film layer on the periphery of the re-silicon wafer
Disclosure of Invention
1. Technical problem to be solved by the utility model
The utility model aims to overcome the defects of uneven flatness of a coated film and film repeatability in the process of re-coating a product due to the height difference between a sample and a carrying platform in the prior art, and provides an adjustable carrying platform for coating a silicon wafer.
2. Technical proposal
In order to achieve the above purpose, the technical scheme provided by the utility model is as follows:
an adjustable stage for coating a film of the present utility model includes,
the base is provided with a base station;
the base station, the said base station bottom is fixedly connected to base; the method comprises the steps of,
the platform is provided with a lifting mechanism and is connected to the base through the lifting mechanism;
the platform is arranged on the periphery of the base station.
As a further improvement of the utility model, the lifting mechanism is composed of a plurality of lifting pieces, and the lifting pieces are uniformly distributed around the platform.
As a further improvement of the utility model, the lifting members are lifting screws.
As a further improvement of the utility model, a window is arranged on the platform, and the base station is positioned at the middle position of the window.
As a further improvement of the utility model, a gap is arranged between the window of the platform and the base station.
As a further improvement of the utility model, the gap is provided with a liquid baffle plate, and the liquid baffle plate is arranged around the base station.
As a further improvement of the utility model, the platform is provided with a horizontal mechanism.
As a further improvement of the utility model, the horizontal mechanism is a plurality of level meters, and the level meters are uniformly arranged on the upper surface of the platform.
As a further improvement of the present utility model, the base is provided with an adsorption mechanism.
As a further improvement of the utility model, the adsorption mechanism is a plurality of vacuum adsorption holes, and the vacuum adsorption holes are uniformly distributed on the upper surface of the base.
3. Advantageous effects
Compared with the prior art, the technical scheme provided by the utility model has the following beneficial effects:
(1) According to the utility model, the liftable platform is arranged on the periphery of the product to be coated, so that the coated tool bit is always coated at the same height in the coating process, and the surface of the product to be coated and the surface of the platform are in the same plane, thereby improving the uniformity of the film thickness around the product and in the center of the product in the coating process.
(2) According to the utility model, the liftable platform is arranged on the periphery of the product to be coated, and the gap is arranged between the platform and the product, so that the coating tool bit starts to move from the platform to the product in the coating process, the area design of the base surface is smaller, the condition that the coating material flows to the back of the product in the coating process is avoided, and the yield of the product is ensured.
Drawings
FIG. 1 is a top view of a carrier;
FIG. 2 is a side view of a carrier;
FIG. 3 is a schematic view of the overall structure of the stage;
FIG. 4 is a schematic view of the structure of the platform when attached to the base;
fig. 5 is a schematic view of the structure of the liquid baffle on the base.
Reference numerals in the schematic drawings illustrate:
10. a base;
20. a base station; 21. an adsorption mechanism;
30. a platform; 31. a lifting mechanism; 311. a lifting member; 32. a window;
40. a liquid baffle;
50. a horizontal mechanism; 51. and (5) a level gauge.
Detailed Description
For a further understanding of the present utility model, the present utility model will be described in detail with reference to the drawings and examples.
The structures, proportions, sizes, etc. shown in the drawings are shown only in connection with the present disclosure, and are not intended to limit the scope of the utility model, since any modification, variation in proportions, or adjustment of the size, etc. of the structures, proportions, etc. should be considered as falling within the spirit and scope of the utility model, without affecting the effect or achievement of the objective. Also, the terms "upper", "lower", "left", "right", "middle", and the like are used herein for descriptive purposes only and are not intended to limit the scope of the utility model for modification or adjustment of the relative relationships thereof, as they are also considered within the scope of the utility model without substantial modification to the technical context.
The utility model is further described below with reference to examples.
Example 1
The utility model relates to an adjustable carrying platform for coating, as shown in fig. 1-2, fig. 1 is a top view of the carrying platform, fig. 2 is a side view of the carrying platform, the adjustable carrying platform comprises a base 10, a base 20 and a platform 30, and the base 20 is arranged on the base 10; the bottom of the base 20 is fixedly connected to the base 10; the platform 30 is provided with a lifting mechanism 31, the platform 30 is connected to the base 10 through the lifting mechanism 31, and the platform 30 is arranged on the outer side of the base 20, and can be in two L-shaped structures or frame-shaped structures, so that the base 20 is surrounded.
Specifically, the base 20 is disposed on the base 10, the bottom of the base 20 is fixedly connected to the base 10, the connection mode is generally a connection which is not easy to disassemble, such as welding, and the base 10 has a supporting function on the base 20. The window for accommodating the base 20 is arranged on the platform 30, the lifting mechanism 31 is further arranged on the platform 30, the lifting mechanism 31 is arranged below the platform 30, the upper end of the lifting mechanism 31 is fixedly connected to the lower surface of the platform 30, the lower end of the lifting mechanism 31 is fixedly connected to the upper surface of the base 10, and the base 10 supports the platform 30. The lifting mechanism 31 can be manually adjusted by an operator, and the lifting of the lifting mechanism 31 can also be realized by a numerical control lifting table.
When the platform 30 is not used, the area of the base 20 needs to be increased, at least the area of the coated surface of the product coated with the film is larger than the area of the coated surface of the product coated with the film, when the product is coated with the film by the coating knife, the film needs to be coated from the base 20, because the product has a certain thickness, the height difference exists between the product and the base 20, when the coating knife is coated on the product from the base 20, the film output amount cannot be changed, so that an edge effect is generated on the product, namely the thickness of the periphery of the coated film on the product is larger than the thickness of the middle position, and the flatness of the product at the moment is insufficient, so that the performance requirement cannot be met. The product may be glass, silicon wafer, or other substrate material.
In this embodiment, after the product is placed on the base 20 and the liftable platform 30 is disposed on the base 10, the lifting mechanism 31 is adjusted to adjust the platform 30 to be at the same height as the plane of the product to be coated before coating, and the coating knife can directly start coating on the platform 30, at this time, the function of the platform 30 is equivalent to that of the base 20, and the coating knife does not have any height difference in the moving process, so that no edge effect occurs, and the flatness of the product is better.
Example 2
As shown in fig. 1 to 2, this embodiment is based on embodiment 1, and differs from embodiment 1 in that:
the lifting mechanism 31 is composed of a plurality of lifting pieces 311, and the lifting pieces 311 are uniformly distributed around the platform 30. The lifting members 311 are lifting screws. The lifting mechanism 31 is composed of a plurality of lifting pieces 311, wherein the lifting pieces 311 are uniformly arranged on the bottom surface of the platform 30 and close to the edge of the platform 30, and the lifting pieces 311 are specifically lifting screws. Be equipped with a plurality of deep grooves on platform 30, fix the lifting screw inside the deep groove, when the lifting screw was in the minimum, guarantee to laminate for the accuracy in actual tectorial membrane in-process for complete between platform 30 and the base 10.
Wherein, the lifting screw can be mechanically screwed to adjust the up-and-down movement of the platform 30.
Example 3
As shown in fig. 3 to 4, this embodiment is based on embodiments 1 and 2, which differ from embodiments 1 and 2 in that:
the lower surface of the platform 30 is provided with a groove, the bottom end of the lifting screw is fixedly connected to the upper plane of the base 10, the mode of the fixed connection can be a connection which is not easy to detach, such as welding, and the top end of the lifting screw is fixedly connected to the groove on the platform 30. The grooves may be elongated grooves disposed at intermediate positions of the two ends of the lower surface of the platform 30, and in another embodiment, the grooves may be a plurality of grooves disposed at the two ends of the lower surface of the platform 30 in a segmented and equidistant manner.
Example 4
As shown in fig. 1 to 4, the present embodiment is based on embodiments 1 to 3, which differ from embodiments 1 to 3 in that:
the platform 30 is provided with a window 32, and the base 20 is positioned at the middle position of the window 32. A gap is provided between the window 32 of the platform 30 and the base 20. The gap is provided with a liquid baffle 40, and the liquid baffle 40 is arranged around the base 20.
The platform 30 is provided with the window 32, and the base 20 is located at the middle position of the window 32, that is, the platform 30 surrounds the base 20, when a product is placed on the base 20, that is, the sample is located in the window 32 of the platform 30, the coating knife can start to coat the product from any angle, in the traditional coating mode, the coating knife needs to start to coat from the base 20, and because the base 20 is attached to the product, the capillary adsorption force of the connecting gap adsorbs the coated solution to the back of the product, so that the appearance of the sample is influenced and the overall performance of the sample is influenced.
Because the platform 30 exists, the original base 20 only needs to support the sample, the volume of the base 20 can be greatly reduced, the upper top surface area of the base 20 is smaller than the lower bottom surface of a product, a gap is arranged between the window 32 of the platform 30 and the base 20, after a liquid film is uniformly coated on the product by a coating knife, the liquid film falls into the base 10 from the gap, the base 10 is provided with the liquid baffle 40, the liquid baffle 40 is arranged around the base 20, the bottom of the liquid baffle 40 is tightly attached to the upper surface of the base 10, the liquid baffle 40 is detachably connected with the base 10, the liquid baffle 40 is conveniently detached for cleaning, and the specific detachable connection can be splicing or butt joint. The liquid film cannot enter the connection part between the base 20 and the product due to the blocking of the liquid baffle 40, so that the back of the product cannot be contaminated by the liquid film, and the appearance of the product and the overall performance of the sample cannot be affected.
The liquid baffle 40 and the base 10 may be fixedly connected, and the connection mode may be a connection mode which is not easy to detach, such as welding, and has no gap between the bottom and the base 10. Further, the liquid baffle 40 may be provided with a slope to prevent the liquid film from exceeding the highest point of the slope, and also to prevent the back of the product from being contaminated by the liquid film.
Example 5
As shown in fig. 1 to 5, the present embodiment is based on embodiments 1 to 4, which differ from embodiments 1 to 4 in that:
a horizontal mechanism 50 is provided on the platform 30. The level mechanism 50 is a plurality of levels 51, and the levels 51 are uniformly arranged on the upper surface of the platform 30. The base 20 is provided with an adsorption mechanism 21. The adsorption mechanism 21 is a plurality of vacuum adsorption holes, the vacuum adsorption holes are uniformly distributed on the upper surface of the base 20, the platform 30 is provided with the horizontal mechanism 50, and as the lifting mechanism 31 is arranged around the platform 30, whether the platform 30 is horizontal is particularly important, and therefore whether the platform 30 is leveled or not can be conveniently observed by the horizontal mechanism 50 arranged on the platform 30.
Further, the leveling mechanism 50 is a plurality of levels 51, the levels 51 are symmetrically distributed on the platform 30, and whether the levels 51 in each direction are horizontal is observed to determine whether the platform 30 is horizontal, in another embodiment, the levels 51 may be replaced by digital levels, which is beneficial to more precise operation.
Be equipped with adsorption equipment 21 on the base station 20, adsorption equipment 21 can fix the product on the base station 20, prevents that the product from taking place the displacement and causing the coating failure at the coating in-process, and preferably, adsorption equipment 21 is a plurality of vacuum adsorption holes, vacuum adsorption hole below intercommunication vacuum adsorber, utilizes the effect of atmospheric pressure to closely laminate product and base station 20.
The utility model and its embodiments have been described above by way of illustration and not limitation, and the utility model is illustrated in the accompanying drawings and described in the drawings in which the actual structure is not limited thereto. Therefore, if one of ordinary skill in the art is informed by this disclosure, the structural mode and the embodiments similar to the technical scheme are not creatively designed without departing from the gist of the present utility model.

Claims (10)

1. An adjustable stage for coating a film, characterized by: comprising the steps of (a) a step of,
a base (10), wherein a base table (20) is arranged on the base (10);
the base station (20), the bottom of the base station (20) is fixedly connected to the base (10); the method comprises the steps of,
the device comprises a platform (30), wherein a lifting mechanism (31) is arranged on the platform (30), and the platform (30) is connected to a base (10) through the lifting mechanism (31);
the platform (30) is disposed at the periphery of the base (20).
2. The adjustable stage for coating film according to claim 1, characterized in that: the lifting mechanism (31) is composed of a plurality of lifting pieces (311), and the lifting pieces (311) are uniformly distributed around the platform (30).
3. An adjustable stage for coating film according to claim 2, characterized in that: the lifting pieces (311) are lifting screws.
4. The adjustable stage for coating film according to claim 1, characterized in that: the platform (30) is provided with a window (32), and the base station (20) is positioned at the middle position of the window (32).
5. The adjustable stage for coating film according to claim 4, wherein: a gap is arranged between the window (32) of the platform (30) and the base (20).
6. The adjustable stage for coating film according to claim 5, wherein: the gap is internally provided with a liquid baffle (40), and the liquid baffle (40) is arranged around the base (20).
7. The adjustable stage for coating film according to claim 1, characterized in that: the platform (30) is provided with a horizontal mechanism (50).
8. The adjustable stage for coating film according to claim 7, wherein: the level mechanism (50) is a plurality of level meters (51), and the level meters (51) are uniformly arranged on the upper surface of the platform (30).
9. The adjustable stage for coating film according to claim 1, characterized in that: an adsorption mechanism (21) is arranged on the base (20).
10. The adjustable stage for coating film according to claim 9, characterized in that: the adsorption mechanism (21) is provided with a plurality of vacuum adsorption holes, and the vacuum adsorption holes are uniformly distributed on the upper surface of the base (20).
CN202222565722.4U 2022-09-27 2022-09-27 Adjustable carrying platform for coating film Active CN219483258U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202222565722.4U CN219483258U (en) 2022-09-27 2022-09-27 Adjustable carrying platform for coating film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202222565722.4U CN219483258U (en) 2022-09-27 2022-09-27 Adjustable carrying platform for coating film

Publications (1)

Publication Number Publication Date
CN219483258U true CN219483258U (en) 2023-08-08

Family

ID=87515441

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202222565722.4U Active CN219483258U (en) 2022-09-27 2022-09-27 Adjustable carrying platform for coating film

Country Status (1)

Country Link
CN (1) CN219483258U (en)

Similar Documents

Publication Publication Date Title
TW546508B (en) Method for manufacturing liquid crystal display
US10394087B2 (en) Display panel and manufacturing method thereof
CN102854667B (en) Liquid crystal device and manufacture method thereof
CN104317110B (en) A kind of transfer printing board
TW201304038A (en) Support and transport unit for a print substrate for a plant for depositing print tracks, and relative deposition method
CN109750257A (en) Mask plate and its manufacturing method
CN219483258U (en) Adjustable carrying platform for coating film
CN102623371B (en) Chip scale package (CSP) chip mounting loading device and mounting method
US10503081B2 (en) Carrying platform and exposure method
CN108944005B (en) Alignment fixture and alignment method for screen printing preparation of sheet type oxygen sensor
CN110629160A (en) Mask plate assembly
KR101006717B1 (en) Rotary type laminating apparatus
CN209045524U (en) A kind of wafer elevating device
CN205398461U (en) Bottom crown structure and filming equipment of filming equipment
KR20130132262A (en) Liquid crystal panel, method for injecting liquid crystal thereof and apparatus for injecting liquid crystal
CN215656162U (en) Mask plate gluing device
CN215209601U (en) Size-adjustable carrying carrier for coating of photoelectric glass substrate
CN110323170A (en) Adsorbent equipment and the method for adjusting material flatness
CN210803975U (en) High-flatness large-size sucker
CN207581932U (en) Adjustable for height spray system
CN202230270U (en) Silicon substrate liquid crystal screen production line ultraviolet frame glue exposure machine structure
CN202217652U (en) Modular baseplate objective table and equipment applying same
CN209433185U (en) A kind of glass film exposure jig
CN213814290U (en) Positioning auxiliary device for spin coating equipment
CN207993362U (en) A kind of lens location automatic calibration device for roll-to-roll laser direct-writing exposure machine

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant