CN202230270U - Silicon substrate liquid crystal screen production line ultraviolet frame glue exposure machine structure - Google Patents
Silicon substrate liquid crystal screen production line ultraviolet frame glue exposure machine structure Download PDFInfo
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- CN202230270U CN202230270U CN2011203243257U CN201120324325U CN202230270U CN 202230270 U CN202230270 U CN 202230270U CN 2011203243257 U CN2011203243257 U CN 2011203243257U CN 201120324325 U CN201120324325 U CN 201120324325U CN 202230270 U CN202230270 U CN 202230270U
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Abstract
The utility model discloses a silicon substrate liquid crystal screen production line ultraviolet frame glue exposure machine structure, which comprises an exposure table, an exposure control system, an exposure scanning power system and an ultraviolet lamp integrator. The exposure table comprises a silicon substrate liquid crystal screen bearing plate air cylinder with the bottom fixed on an exposure table base. An exposure table column A and an exposure table column B are fixed on two sides of the top of the silicon substrate liquid crystal screen bearing plate air cylinder, and the lower portion of a silicon substrate liquid crystal screen bearing plate is inserted into the silicon substrate liquid crystal screen bearing plate air cylinder. A sealed space formed by the silicon substrate liquid crystal screen bearing plate, a silicon substrate liquid crystal screen bearing plate sealing ring and the silicon substrate liquid crystal screen bearing plate air cylinder forms a silicon substrate liquid crystal screen bearing plate air cavity. The exposure table further comprises a cover plate support, transparent quartz glass is embedded at the center of the exposure table, and the cover plate support can be contacted with the top face of the exposure table column A to be matched with the exposure table column A in contact mode. The structure obtains molding through extrusion of the silicon liquid crystal screen to achieve specified gas value between a silicon wafer and indium tin oxide glass and a mode of exposure and curing of ultraviolet frame glue.
Description
Technical field
The utility model relates to a kind of frame glue exposure machine structure, particularly liquid crystal on silicon screen production line ultraviolet frame glue exposure machine structure.
Background technology
LCOS (Liquid Crystal on Silicon; Liquid crystal on silicon) lcd technology is LCD (Liquid Crystal Display; Liquid crystal display) the novel display technique of reflection-type of technology and CMOS (complementary metal oxide semiconductor, complementary metal oxide semiconductor (CMOS)) integrated circuit technique combination.The pixel of at first on Silicon Wafer, using CMOS technology to make every row or every row all has the LCOS chip of reflecting electrode; Then LCOS chip and the glass substrate that has transparency electrode are kept suitably distance applying; And at the LCOS chip and have between the glass substrate of transparency electrode and pour into liquid crystal material; And be fixed on the LCOS chip to liquid crystal material and have between the glass substrate of transparency electrode with an amount of sealed knot glue and form reflection type lcd panel; Be pressed on the reflecting electrode of the pixel of every row on the LCOS chip or every row through the transmission different electric, thereby control liquid crystal material leaded light is strong and weak, carries out to the reflection of incident light degree modulation and accomplish (gray scale) image and show.Portable mobile communication that emerges rapidly in recent years and wireless demonstration product increase the demand of liquid crystal on silicon screen day by day, and the intrinsic advantage of liquid crystal on silicon screen has determined the development prospect of mobile demonstration product.The method of producing at present the liquid crystal on silicon screen in batches has and (sees application for a patent for invention prospectus (application number 200610032920.7) for details; Denomination of invention " method for making of liquid crystal LCOS and press fit device thereof "): mainly be on the full wafer silicon substrate, to make the LCOS LCD; Main material is; Design a plurality of LCOS Die full wafer silicon substrate and as the indium oxide tin glass plate of Liquiid crystal on silicon (lcos) display public electrode, working surface is respectively through cleaning and vacuum is coated with SiO
2Alignment films; The corresponding liquid crystal cell frame adhesive of coating on silicon substrate is fitted in the indium oxide tin glass plate on the silicon substrate more then, after pressing precuring and heat curing, is integral; Carry out lower surface (silicon substrate) sawing then respectively; Upper surface (glass) diamant cut, sliver becomes liquid crystal cell one by one again, after to the liquid crystal cell perfusion, just becomes finished product.
The defective of the method is: adopt heat curing frame glue, need the stable baking about 200 degree could solidify frame glue usually, cause Silicon Wafer easily and deformation difference appears in glass, thereby influence the quality that liquid crystal on silicon shields; Said processing apparatus does not have concrete structure to follow, thereby lacks practical value.
Liquid crystal on silicon screen production line all adopts heat curing frame glue at present.
Summary of the invention
The purpose of the utility model is to overcome the deficiency of prior art; Provide under a kind of normal temperature condition and can accomplish the frame adhesive curing, avoided the liquid crystal on silicon screen production line ultraviolet frame glue exposure machine structure of the different deformation difference phenomenons of bringing of Silicon Wafer with the indium oxide tin glass material.
In order to achieve the above object, the technical scheme of the utility model employing is:
Liquid crystal on silicon screen production line ultraviolet frame glue exposure machine structure; It comprises exposure desk, Exposure Control Module, exposure desk scanning power system and uviol lamp integrator; Said exposure desk comprises that its bottom is fixed on the liquid crystal on silicon screen carrier cylinder on the exposure desk pedestal; Both sides, top at described liquid crystal on silicon screen carrier cylinder are fixed with exposure desk A post and exposure desk B post respectively; The bottom of liquid crystal on silicon screen carrier is inserted in the described liquid crystal on silicon screen carrier cylinder; Liquid crystal on silicon screen carrier piston packing is arranged between said liquid crystal on silicon screen carrier cylinder inner wall and the said liquid crystal on silicon screen carrier outer wall and with said liquid crystal on silicon screen carrier cylinder and liquid crystal on silicon screen carrier surface of contact and all forms wringing fit; The confined space that is formed by liquid crystal on silicon screen carrier, liquid crystal on silicon screen carrier piston packing and liquid crystal on silicon screen carrier cylinder constitutes liquid crystal on silicon screen carrier air cavity; Air admission hole B is arranged on the said liquid crystal on silicon screen carrier cylinder and with liquid crystal on silicon screen carrier air cavity and is connected; Have liquid crystal on silicon screen carrier vacuum chamber on the top of described liquid crystal on silicon screen carrier; A plurality of liquid crystal on silicon screen carrier vacuum holes are opened on liquid crystal on silicon screen carrier end face and with liquid crystal on silicon screen carrier vacuum chamber and are connected; The vacuum vent holes C that is installed on the liquid crystal on silicon screen carrier is connected with liquid crystal on silicon screen carrier vacuum chamber; The two ends of exposure desk hinge rotating shaft are rotatedly connected with two hinge support that are fixed on the described exposure desk B capital face respectively; Said exposure desk comprises that also its central authorities are inlaid with the cover plate frame that diameter dimension is not less than the transparency silica glass of indium oxide tin glass diameter dimension; One side of said cover plate frame and the rotating shaft of described exposure desk hinge are rotatedly connected and the opposite side of cover plate frame is erected on the exposure desk C post that is installed on the exposure desk pedestal; Described cover plate frame can touch the cooperation that contacts with it of said exposure desk A capital face after said exposure desk hinge axis is rotated counterclockwise 180 degree; Said exposure desk pedestal links to each other with exposure desk scanning power system and under the driving of said exposure desk scanning power system, can move along x axle and y direction of principal axis; Industrial computer B links to each other with the uviol lamp integrator that is made up of 6 uviol lamps at least through the ultraviolet source bus, and said exposure desk and described uviol lamp integrator are oppositely arranged so that uviol lamp can shine the ultraviolet frame glue that is installed in liquid crystal on silicon screen carrier top, and industrial computer B is connected with said exposure desk scanning power system through scanning power system bus and industrial computer B is connected with the exposure machine panel controller through exposure machine panel control bus.
The advantage of the utility model is: adopt this device in liquid crystal on silicon screen molding process flow process; The liquid crystal on silicon screen of having realized extruding on one side reaches Silicon Wafer and the gap width between the indium oxide tin glass and the moulding of regulation; The pattern of on one side ultraviolet frame glue being made public and solidifying; Thereby be achieved and accomplish the frame adhesive curing under the normal temperature condition; Avoided the different deformation difference phenomenons of bringing of Silicon Wafer, can improve liquid crystal on silicon screen assembling quality, had the great practical value of batch process with the indium oxide tin glass material.
Description of drawings
Fig. 1 is the system chart of the liquid crystal on silicon screen production line ultraviolet frame glue exposure machine structure of the utility model;
Fig. 2 is the schematic top view that device shown in Figure 1 is written into liquid crystal on silicon when screen exposure desk;
Fig. 3 is the schematic cross-section of device shown in Figure 2;
Fig. 4 is the schematic top view of exposure desk when adopting device shown in Figure 1 to carry out liquid crystal on silicon mask adhesive curing exposure;
Fig. 5 is the schematic cross-section of device shown in Figure 4.
Embodiment
Below in conjunction with specific embodiment the utility model is described in detail.
Liquid crystal on silicon screen production line ultraviolet frame glue exposure machine structure like the utility model shown in the drawings; It comprises exposure desk 66, Exposure Control Module 89, exposure desk scanning power system 86 and uviol lamp integrator 87; Said exposure desk 66 comprises that its bottom is fixed on the liquid crystal on silicon screen carrier cylinder 54 on the exposure desk pedestal 59; Both sides, top at described liquid crystal on silicon screen carrier cylinder 54 are fixed with exposure desk A post 58 and exposure desk B post 64 respectively; The bottom of liquid crystal on silicon screen carrier 53 is inserted in the described liquid crystal on silicon screen carrier cylinder 54; Liquid crystal on silicon screen carrier piston packing 55 is arranged between said liquid crystal on silicon screen carrier cylinder 54 inwalls and said liquid crystal on silicon screen carrier 53 outer walls and with said liquid crystal on silicon screen carrier cylinder 54 and liquid crystal on silicon screen carrier 53 surface of contact and all forms wringing fit; Constitute liquid crystal on silicon screen carrier air cavity 56 by liquid crystal on silicon screen carrier 53, liquid crystal on silicon screen carrier piston packing 55 with the confined space that liquid crystal on silicon screen carrier cylinder 54 forms; Air admission hole B57 is arranged on the said liquid crystal on silicon screen carrier cylinder 54 and with liquid crystal on silicon screen carrier air cavity 56 and is connected, and said liquid crystal on silicon screen carrier air cavity 56 fills, exits through said air admission hole B57.Have liquid crystal on silicon screen carrier vacuum chamber 52 on the top of described liquid crystal on silicon screen carrier 53; A plurality of liquid crystal on silicon screen carrier vacuum holes 51 are opened on liquid crystal on silicon screen carrier 53 end faces and with liquid crystal on silicon screen carrier vacuum chamber 52 and are connected; The vacuum vent holes C50 that is installed on the liquid crystal on silicon screen carrier 53 is connected with liquid crystal on silicon screen carrier vacuum chamber 52, through said vacuum vent holes C50 said liquid crystal on silicon (LCOS) screen carrier vacuum chamber 52 is vacuumized or inflates.Exposure desk hinge rotating shaft 60 links to each other with two hinge support 94 on being connected described exposure desk B post 64 end faces; Exposure desk hinge rotating shaft 60 is rotatedly connected with two hinge support 94 that are fixed on described exposure desk B post 64 end faces; Said exposure desk 66 comprises that also its central authorities are inlaid with the cover plate frame 62 that diameter dimension is not less than the transparency silica glass 61 of indium oxide tin glass 40 diameter dimensions; One side of said cover plate frame 62 and described exposure desk hinge rotating shaft 60 are rotatedly connected and the opposite side of cover plate frame 62 is erected on the exposure desk C post 63 that is installed on the exposure desk pedestal, and described cover plate frame 62 can touch the cooperation that contacts of said exposure desk A post 58 end faces after said exposure desk hinge axis 48 is rotated counterclockwise 180 degree.Cover plate frame 62 1 ends contact with said exposure desk C post 63 and can after said exposure desk hinge axis 48 is rotated counterclockwise 180 degree, touch said exposure desk A post 58; And can stop, and after 48 turnbacks of said exposure desk hinge axis, touch said exposure desk C post 63 clockwise again.Can be placed on the liquid crystal on silicon screen carrier 53 by indium oxide tin glass 40, pattern frame glue 37, the liquid crystal on silicon screen 46 that Silicon Wafer 24 constitutes with the brilliant mouth 47 of filling.Said exposure desk pedestal 59 links to each other with exposure desk scanning power system 86 and under the driving of said exposure desk scanning power system 86, can move along x axle 92 and y axle 91 directions; Said Exposure Control Module 89 comprises ultraviolet source bus 80, industrial computer B 81, scanning power system bus 82, exposure machine panel control bus 83 and exposure machine panel controller 84; Wherein said industrial computer B 81 links to each other with the said uviol lamp integrator 85 that is made up of 6 uviol lamps 87 at least through said ultraviolet source bus 80; Said exposure desk 66 is oppositely arranged with described uviol lamp integrator 85 so that uviol lamp can shine the ultraviolet frame glue that is installed in liquid crystal on silicon screen carrier 53 tops, and industrial computer B 81 is connected with said exposure desk scanning power system 86 through scanning power system bus 82 and industrial computer B 81 is connected with the input motion control signal with exposure machine panel controller 84 through exposure machine panel control bus 83.
Described exposure desk scanning power system 86 can or can be conventional existing structures such as feed screw nut for the guide rail slide block structure.
The course of work of this device is following:
1) said liquid crystal on silicon screen 46 being delivered into the Silicon Wafer 24 that said liquid crystal on silicon shields on the carrier 53 and liquid crystal on silicon shields in 46 structures contacts with said liquid crystal on silicon screen carrier 53; Following said liquid crystal on silicon screen carrier vacuum chamber 52 is adsorbed on the liquid crystal on silicon screen 46 that carries on the said liquid crystal on silicon screen carrier 53 through said vacuum vent holes C50 exhaust formation vacuum state and through said liquid crystal on silicon screen carrier vacuum hole 51
2) said cover plate frame 62 (being embedded with transparency silica glass 61) is around said exposure desk hinge axis 48 counterclockwise at least after the Rotate 180 degree, and makes a termination of said cover plate frame 62 contact said exposure desk A post 58, and keeps in touch with said exposure desk A post 58,
3) said liquid crystal on silicon screen carrier air cavity 56 makes the said liquid crystal on silicon screen carrier 53 that adsorbing said liquid crystal on silicon screen 46 closely contact with said transparency silica glass 61 until the indium oxide tin glass 40 of said liquid crystal on silicon screen 46 near the embedded said transparency silica glass 61 of said cover plate framves 62 through said air admission hole B57 inflation
4) the pattern frame glue 37 material situation of using according to said liquid crystal on silicon screen 46; Gap requirement between Silicon Wafer 24 and the indium oxide tin glass 40; Maintenance has 1 atmospheric pressure～2 atmospheric pressure 1 minute～10 minutes to said air admission hole B57; And pass through the control of Exposure Control Module 89 pre-set programs simultaneously; Make said exposure desk 66 receive the effect of said exposure desk scanning power system 86; Said liquid crystal on silicon screen 46 perhaps moved 30 seconds～2 minutes along y axle 91 in 92 motions of the said uviol lamp of lighting 87 irradiation lower edge x axles; Make said pattern frame glue 37 under said uviol lamp 87 irradiations, solidify
5) after said pattern frame glue 37 solidifies; At this moment make the said liquid crystal on silicon screen carrier 53 that is adsorbing said liquid crystal on silicon screen 46 under the effect of self gravitation, leave embedded said transparency silica glass 61 certain distances of said cover plate frame 62 to said air admission hole B57 venting; Then with said cover plate frame 62 around said exposure desk hinge axis 48 clockwise at least after the Rotate 180 degree; And make a termination of said cover plate frame 62 contact said exposure desk C post 63; And to the suction-operated of vacuum vent holes C50 inflation, be accomplished frame glue exposure technology process simultaneously until 51 pairs of said liquid crystal on silicon screens 46 of the said liquid crystal on silicon screen of releasing carrier vacuum hole.
Claims (1)
1. liquid crystal on silicon shields production line ultraviolet frame glue exposure machine structure; It comprises exposure desk, Exposure Control Module, exposure desk scanning power system and uviol lamp integrator; It is characterized in that: said exposure desk comprises that its bottom is fixed on the liquid crystal on silicon screen carrier cylinder on the exposure desk pedestal; Both sides, top at described liquid crystal on silicon screen carrier cylinder are fixed with exposure desk A post and exposure desk B post respectively; The bottom of liquid crystal on silicon screen carrier is inserted in the described liquid crystal on silicon screen carrier cylinder; Liquid crystal on silicon screen carrier piston packing is arranged between said liquid crystal on silicon screen carrier cylinder inner wall and the said liquid crystal on silicon screen carrier outer wall and with said liquid crystal on silicon screen carrier cylinder and liquid crystal on silicon screen carrier surface of contact and all forms wringing fit; The confined space that is formed by liquid crystal on silicon screen carrier, liquid crystal on silicon screen carrier piston packing and liquid crystal on silicon screen carrier cylinder constitutes liquid crystal on silicon screen carrier air cavity; Air admission hole B is arranged on the said liquid crystal on silicon screen carrier cylinder and with liquid crystal on silicon screen carrier air cavity and is connected; Have liquid crystal on silicon screen carrier vacuum chamber on the top of described liquid crystal on silicon screen carrier; A plurality of liquid crystal on silicon screen carrier vacuum holes are opened on liquid crystal on silicon screen carrier end face and with liquid crystal on silicon screen carrier vacuum chamber and are connected; The vacuum vent holes C that is installed on the liquid crystal on silicon screen carrier is connected with liquid crystal on silicon screen carrier vacuum chamber; The two ends of exposure desk hinge rotating shaft are rotatedly connected with two hinge support that are fixed on the described exposure desk B capital face respectively; Said exposure desk also comprises the cover plate frame that has groove on it; One side of said cover plate frame and the rotating shaft of described exposure desk hinge are rotatedly connected and the opposite side of cover plate frame is erected on the exposure desk C post that is installed on the exposure desk pedestal; Described cover plate frame can touch the cooperation that contacts with it of said exposure desk A capital face after said exposure desk hinge axis is rotated counterclockwise 180 degree; Said exposure desk pedestal links to each other with exposure desk scanning power system and under the driving of said exposure desk scanning power system, can move along x axle and y direction of principal axis; Industrial computer B links to each other with the uviol lamp integrator that is made up of 6 uviol lamps at least through the ultraviolet source bus, and said exposure desk and described uviol lamp integrator are oppositely arranged so that uviol lamp can shine the ultraviolet frame glue that is installed in liquid crystal on silicon screen carrier top, and industrial computer B is connected with said exposure desk scanning power system through scanning power system bus and industrial computer B is connected with the exposure machine panel controller through exposure machine panel control bus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203243257U CN202230270U (en) | 2011-08-31 | 2011-08-31 | Silicon substrate liquid crystal screen production line ultraviolet frame glue exposure machine structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203243257U CN202230270U (en) | 2011-08-31 | 2011-08-31 | Silicon substrate liquid crystal screen production line ultraviolet frame glue exposure machine structure |
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| CN202230270U true CN202230270U (en) | 2012-05-23 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2011203243257U Expired - Fee Related CN202230270U (en) | 2011-08-31 | 2011-08-31 | Silicon substrate liquid crystal screen production line ultraviolet frame glue exposure machine structure |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI548909B (en) * | 2014-02-17 | 2016-09-11 | 晶典有限公司 | Wafer level assembly structure of display module for liquid crystal on silicon and method for manufacturing the same |
| CN105974655A (en) * | 2016-07-25 | 2016-09-28 | 武汉华星光电技术有限公司 | Manufacturing method of color film substrate |
-
2011
- 2011-08-31 CN CN2011203243257U patent/CN202230270U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI548909B (en) * | 2014-02-17 | 2016-09-11 | 晶典有限公司 | Wafer level assembly structure of display module for liquid crystal on silicon and method for manufacturing the same |
| CN105974655A (en) * | 2016-07-25 | 2016-09-28 | 武汉华星光电技术有限公司 | Manufacturing method of color film substrate |
| CN105974655B (en) * | 2016-07-25 | 2019-05-28 | 武汉华星光电技术有限公司 | A kind of manufacturing method of color membrane substrates |
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Legal Events
| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| PP01 | Preservation of patent right |
Effective date of registration: 20150525 Granted publication date: 20120523 |
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| RINS | Preservation of patent right or utility model and its discharge | ||
| PD01 | Discharge of preservation of patent |
Date of cancellation: 20161125 Granted publication date: 20120523 |
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| RINS | Preservation of patent right or utility model and its discharge | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120523 Termination date: 20150831 |
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| CF01 | Termination of patent right due to non-payment of annual fee |