CN219429719U - Cold hydrogenation slag slurry treatment system - Google Patents

Cold hydrogenation slag slurry treatment system Download PDF

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CN219429719U
CN219429719U CN202320630749.9U CN202320630749U CN219429719U CN 219429719 U CN219429719 U CN 219429719U CN 202320630749 U CN202320630749 U CN 202320630749U CN 219429719 U CN219429719 U CN 219429719U
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tank
export
outlet
inlet
retort
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崔祥超
周迎春
王正云
高小银
陈朝霞
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Ningxia Runyang Silicon Material Technology Co ltd
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Ningxia Runyang Silicon Material Technology Co ltd
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Abstract

The utility model relates to a cold hydrogenation sediment thick liquid processing system, sediment thick liquid discharge line links to each other with the import of flash tank, the light fraction export of flash tank links to each other with the import of retort, the light fraction export of retort links to each other with cold hydrogenation system, the heavy fraction export of retort is high boiling recovery export, the heavy fraction export of flash tank links to each other with the import of ground jar, the supernatant export of ground jar links to each other with the import of retort, the blowdown exit linkage of ground jar has drying device, drying device's gaseous phase export links to each other with the import of retort, drying device's solid phase export is the silica mud export. The retort evaporates chlorosilane in the liquid light component, realizes the recycle of chlorosilane, avoids the waste of chlorosilane, obtains the silicon mud after drying and discharges through the silicon mud outlet, realizes the recovery of silica flour through retrieving the silicon mud, avoids the waste of silica flour, and chlorosilane and silica flour in the sediment thick liquid can be retrieved to this technical scheme, avoids the direct outward discharge of sediment thick liquid or simple dry hydrolysis to cause the wasting of resources.

Description

Cold hydrogenation slag slurry treatment system
Technical Field
The application relates to the technical field of polysilicon production, in particular to a cold hydrogenation slag slurry treatment system.
Background
The technology for preparing the polysilicon at the current stage in China is basically Siemens technology, and one important link in the technology is that the silicon tetrachloride is subjected to cold hydrogenation to produce trichlorosilane (one of raw materials for preparing the polysilicon). The cold hydrogenation system is the system adopted by most of domestic factories at present. The system sequentially comprises a silicon tetrachloride storage tank, a vaporizer, a heat exchanger, a primary heater, a secondary heater, a tertiary heater, a fluidized bed reactor, a quenching tower, an air cooler, a water cooler and a Freon cooler according to the trend of materials; the method comprises the steps that silicon tetrachloride liquid is gasified through a vaporizer in sequence, high-temperature gaseous silicon tetrachloride is formed after a heat exchanger, a primary heater, a secondary heater and a tertiary heater are heated, then the silicon tetrachloride gas, hydrogen and silicon powder are sent into a fluidized bed reactor for hydrogenation, part of silicon tetrachloride is converted into trichlorosilane, and a reaction equation is as follows: 3SiCl 4 +Si+2H 2 =4SiHCl 3 The method comprises the steps of carrying out a first treatment on the surface of the The converted mixed gas is cooled by a quenching tower, an air cooler, a water cooler and a Freon cooler in sequence to obtain mixed chlorosilane liquid, and the mixed chlorosilane liquid is separated by a separation system to obtain trichlorosilane; after the reaction in the fluidized bed reactor is finished, chlorosilane gas and a small amount of silicon powder are generated, the chlorosilane gas carries the silicon powder and enters a quenching tower, spraying cooling is carried out, the silicon powder is removed, waste residue solution at the bottom of the quenching tower is sent to a stripping tower for stripping, and slag slurry is obtained after stripping.
In the production process, a large amount of silicon tetrachloride slurry waste containing more than 5% of silicon powder is discharged by a cold hydrogenation system every day, and the slurry contains silicon powder, chlorosilane, polymers, high-boiling substances and other components, so that the direct discharge of the silicon powder, the chlorosilane and other useful resources can cause waste. At present, the polysilicon enterprises generally dry the slag slurry containing the silicon powder directly and properly to obtain mud-like silicon slag, then hydrolyze the mud-like silicon slag by lime milk, discharge a large amount of slag-containing hydrolysates after hydrolysis, separate out silicon dioxide slag materials by press filtration, treat a large amount of wastewater with high chloride ions and calcium ions, have higher cost, and can cause the waste of silicon powder and chlorosilane in the slag slurry, thereby causing the waste of resources.
Disclosure of Invention
Based on this, there is a need to solve the problem of resource waste caused by direct discharge or simple drying hydrolysis treatment without recovering useful components in the slurry in the prior art. The cold hydrogenation slag slurry treatment system can recycle chlorosilane, high-boiling residues and silicon powder in slag slurry, avoid resource waste caused by direct discharge of slag slurry or simple drying hydrolysis treatment, and solve the related problems in the prior art.
The utility model provides a cold hydrogenation sediment stuff processing system, includes sediment stuff discharge pipeline, flash tank, retort and ground jar, sediment stuff discharge pipeline with the import of flash tank links to each other, the light fraction export of flash tank with the import of retort links to each other, the light fraction export of retort links to each other with cold hydrogenation system, the heavy fraction export of retort is high boiling recovery export, the heavy fraction export of flash tank with the import of ground jar links to each other, the supernatant export of ground jar with the import of retort links to each other, the bottom of ground jar has the blowdown export, the blowdown export is connected with drying device, drying device's gaseous phase export with the import of retort links to each other, drying device's solid phase export is the silica mud export.
Preferably, the cold hydrogenated slurry treatment system further comprises a filter, wherein the slurry discharge pipeline is further connected with an inlet of the filter, a gas-liquid outlet of the filter is connected with an inlet of the distillation tank, and a solid-phase outlet of the filter is connected with an inlet of the drying device.
Preferably, the cold hydrogenated slag slurry processing system further comprises a clear liquid tank, wherein the light component outlet of the flash tank, the supernatant outlet of the ground tank and the gas phase outlet of the drying device are all connected with the inlet of the clear liquid tank, and the outlet of the clear liquid tank is connected with the inlet of the distillation tank.
Preferably, the cold hydrogenated slag slurry processing system further comprises a first cooling device, wherein the light component outlet of the flash tank, the supernatant outlet of the ground tank and the gas phase outlet of the drying device are all connected with the inlet of the first cooling device, and the outlet of the first cooling device is connected with the inlet of the supernatant tank.
Preferably, the cold hydrogenation slag slurry treatment system further comprises a condensate cooling tank, wherein a light component outlet of the distillation tank is connected with an inlet of the condensate cooling tank, and an outlet of the condensate cooling tank is connected with the cold hydrogenation system.
Preferably, the cold hydrogenated slag slurry processing system further comprises a second cooling device, wherein the heavy component outlet of the flash tank is connected with the inlet of the second cooling device, and the outlet of the second cooling device is connected with the inlet of the ground tank.
Preferably, in the cold hydrogenated slag slurry processing system, the distillation tank and the flash tank are both of an outer coil heating structure, and a steam heating outlet of the distillation tank is connected with a steam heating inlet of the flash tank.
Preferably, in the cold hydrogenated slag slurry processing system, the drying device is an outer coil heating structure, and the steam heating outlet of the distillation tank is also connected with the steam heating inlet of the drying device.
The technical scheme that this application adopted can reach following beneficial effect:
according to the cold hydrogenation slag slurry treatment system disclosed by the embodiment of the application, the light components obtained by flash evaporation of the slag slurry through the flash evaporation tank are introduced into the distillation tank, the distillation tank is used for evaporating chlorosilane in the liquid light components and is introduced into the cold hydrogenation system to convert the chlorosilane into trichlorosilane, so that recycling of the chlorosilane is realized, waste of the chlorosilane is avoided, and the effect of rectification and purification is achieved through the distillation tank, so that the purity of the recovered chlorosilane is higher, the situation that the yield is lower due to lower purity when the part of recovered chlorosilane is introduced into the cold hydrogenation system is avoided, the efficiency of the cold hydrogenation system is influenced, unreacted chlorosilane returns to the slag slurry, the load of the cold hydrogenation slag slurry treatment system is larger, the part of unreacted chlorosilane is caused to circulate in the system but is not recovered, the meaning of the cold hydrogenation slag slurry treatment system is poor, high-boiling substances which are not evaporated in the distillation tank are introduced into the high-boiling recovery system through the high-boiling recovery outlet, the high-boiling substances are cracked and are recovered, the waste of resources is avoided, the recycling of the silane is realized through the distillation tank, the silicon powder is introduced into the distillation tank from the bottom of the distillation tank, the silicon powder is discharged into the distillation tank through the distillation tank, the drying tank is discharged into the drying tank, and the drying tank is prevented from the drying tank, and the silicon is recovered through the drying tank, and the silicon is dried, and the waste of the silicon is recovered.
Therefore, the chlorosilane, high-boiling residues and silicon powder in the slag slurry can be recovered by the cold hydrogenation slag slurry treatment system disclosed by the embodiment of the application, so that the resource waste caused by direct discharge of the slag slurry or simple drying hydrolysis treatment is avoided, the related problems in the prior art are solved, the treatment and recovery of the cold hydrogenation slag slurry are realized, the economic benefit in the production of the polysilicon is improved, and the resource-saving polysilicon production mode is constructed.
Drawings
FIG. 1 is a schematic diagram of a cold hydrogenated slurry treatment system as disclosed in an embodiment of the present application.
Wherein: slurry discharge line 100, flash tank 200, distillation tank 300, ground tank 400, drying device 510, filter 520, clear liquid tank 530, first cooling device 540, condensate cooling tank 550, and second cooling device 560.
Description of the embodiments
In order to facilitate an understanding of the present application, a more complete description of the present application will now be provided with reference to the relevant figures. Preferred embodiments of the present application are shown in the accompanying drawings. This application may, however, be embodied in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
It will be understood that when an element is referred to as being "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," "top," "bottom," "top," and the like are used herein for illustrative purposes only and are not meant to be the only embodiment.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the description of the application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. The term "and/or" as used herein includes any and all combinations of one or more of the associated listed items.
Referring to fig. 1, an embodiment of the present application discloses a cold hydrogenated slurry processing system, comprising a slurry discharge pipe 100, a flash tank 200, a distillation tank 300, and a ground tank 400, wherein:
the slurry discharge pipe 100 is connected to the inlet of the flash tank 200, the slurry discharged from the cold hydrogenation system is introduced into the flash tank 200 through the slurry discharge pipe 100, and when the flash tank 200 is operated, the temperature is about 70 ℃ to 80 ℃ so as to flash light components (chlorosilane) in the slurry into a gaseous state, part of high-boiling substances can enter the light components during the flash evaporation, and heavy components (silicon powder, polymers, high-boiling substances and the like) in the slurry exist at the bottom of the flash tank 200 in the form of a solid-liquid mixture.
The light component outlet of the flash tank 200 is connected with the inlet of the distillation tank 300, so that the light component obtained by flash evaporation of the slurry through the flash tank 200 is introduced into the distillation tank 300, and gradually cooled into a liquid state in the pipeline in the process of introducing the light component into the distillation tank 300 through the pipeline, the light component entering the distillation tank 300 is in the liquid state, and the temperature is about 120 ℃ when the distillation tank 300 works, so that chlorosilane in the liquid light component is distilled out, and the distillation tank 300 has the effect of rectification and purification. The light component outlet of the distillation tank 300 is connected with the cold hydrogenation system, so that chlorosilane distilled out of the distillation tank 300 is introduced into the cold hydrogenation system to be converted into trichlorosilane, the trichlorosilane is introduced into the reduction furnace to be produced into polycrystalline silicon, recycling of the chlorosilane is further achieved, waste of the chlorosilane is avoided, meanwhile, the distillation tank 300 has the effect of rectifying and purifying, the purity of the recycled chlorosilane is higher, the effect that the recycled chlorosilane is introduced into the cold hydrogenation system to react is avoided, the efficiency of the cold hydrogenation system is affected due to lower purity and lower yield, unreacted chlorosilane is returned into slurry, the load of the cold hydrogenation slurry treatment system is caused to be larger, the unreacted chlorosilane is caused to be recycled in the system but not recycled, and the meaning of setting the cold hydrogenation slurry treatment system is poor. Most of the non-steamed parts of the distillation tank 300 are high-boiling residues, and the heavy component outlet of the distillation tank 300 is a high-boiling recovery outlet, so that the non-steamed high-boiling residues of the distillation tank 300 are introduced into a high-boiling recovery system through the high-boiling recovery outlet, and the high-boiling residues are cracked, converted and recovered, so that resource waste is avoided.
The heavy component outlet of the flash tank 200 is connected with the inlet of the ground tank 400, so that heavy components obtained by passing the slurry through the flash tank 200 are introduced into the ground tank 400 from the bottom of the flash tank 200, the heavy components are gradually cooled to normal temperature in a pipeline in the process of being introduced into the ground tank 400 through the pipeline, the temperature of the heavy components entering the ground tank 400 is normal temperature, the heavy component solid-liquid mixture in the ground tank 400 is subjected to standing precipitation to realize layering, the upper layer is supernatant, the main component is chlorosilane, the lower layer is turbid, and the main components are silicon powder, polymers, high-boiling substances and the like. The supernatant outlet of the ground tank 400 is connected with the inlet of the distillation tank 300, so that the supernatant in the ground tank 400 is introduced into the distillation tank 300, the supernatant is mixed with the light component liquid obtained by flash evaporation of the flash tank 200, the chlorosilane is distilled out through the distillation tank 300, and the distillation tank 300 has the effect of rectification and purification, so that the purity of the recovered chlorosilane is higher. The bottom of the ground tank 400 is provided with a drain outlet, the lower turbid material after standing and layering of the ground tank 400 is discharged through the drain outlet, the drain outlet is connected with a drying device 510, the lower turbid material is introduced into the drying device 510 for drying, the drying device 510 is mainly heated by steam for drying, a gas phase outlet of the drying device 510 is connected with an inlet of the distillation tank 300, liquid substances (mainly chlorosilane) in the lower turbid material are all changed into gas in the drying process, then part of gaseous chlorosilane is introduced into the distillation tank 300, and similarly, in the process of introducing into the distillation tank 300, the part of gaseous chlorosilane is gradually cooled into liquid in a pipeline, and enters into the distillation tank 300 for rectification and purification.
In the drying process, solid matters (mainly silicon powder, polymers, high-boiling matters and the like) in the turbid matters at the lower layer are all changed into solid matters, the silicon mud is obtained after drying, a solid-phase outlet of the drying device 510 is a silicon mud outlet, and the dried silicon mud is discharged through the silicon mud outlet.
According to the cold hydrogenation slag slurry treatment system disclosed by the embodiment of the application, the light components obtained by flash evaporation of the slag slurry through the flash evaporation tank 200 are introduced into the distillation tank 300, the distillation tank 300 is used for evaporating chlorosilane in the liquid light components and is introduced into the cold hydrogenation system for conversion into trichlorosilane, and further recycling of the chlorosilane is realized, the chlorosilane is avoided to be wasted, and the effect of rectification purification is achieved through the distillation tank 300, so that the purity of the recovered chlorosilane is higher, the phenomenon that the reaction is carried out in the cold hydrogenation system due to lower purity and lower yield, the efficiency of the cold hydrogenation system is influenced, unreacted chlorosilane is returned to the slag slurry, the load of the cold hydrogenation slag slurry treatment system is larger, the unreacted chlorosilane can be caused to circulate in the system but is not recovered, the meaning of the cold hydrogenation slag slurry treatment system is poor, high-boiling substances which are not discharged from the distillation tank 300 are introduced into the high-boiling recovery system through the high-boiling recovery outlet, the high-boiling substances are cracked and are recycled, the resource waste is avoided, the slag slurry is discharged from the flash evaporation tank 200 to the bottom of the distillation tank 200 to the distillation tank, the silicon powder is discharged from the bottom of the distillation tank 200 through the distillation tank, the silicon powder is prevented from being discharged into the distillation tank, and the silicon powder is dried through the distillation tank, and the silicon powder is recovered through the distillation tank 400, and the drying layer is discharged to the silicon dust is recovered after the silicon powder is dried, and the silicon powder is recovered through the distillation tank is discharged to the drying layer, and the silicon powder is recovered, and the silicon dust is recovered.
Therefore, the chlorosilane, high-boiling residues and silicon powder in the slag slurry can be recovered by the cold hydrogenation slag slurry treatment system disclosed by the embodiment of the application, so that the resource waste caused by direct discharge of the slag slurry or simple drying hydrolysis treatment is avoided, the related problems in the prior art are solved, the treatment and recovery of the cold hydrogenation slag slurry are realized, the economic benefit in the production of the polysilicon is improved, and the resource-saving polysilicon production mode is constructed.
For the slag slurry with the solid content of more than 5% by adopting the cold hydrogenation slag slurry treatment system disclosed above, for the slag slurry with the solid content of less than 5%, because the slag slurry has fewer solid particles, namely silicon powder, most of the slag slurry is recyclable chlorosilane, if the slag slurry treatment system disclosed above is adopted, the slag slurry treatment process with the solid content of less than 5% is complicated, and the treatment cost is high, therefore, in an alternative embodiment, the cold hydrogenation slag slurry treatment system disclosed herein can further comprise a filter 520, the slag slurry discharge pipeline 100 is also connected with the inlet of the filter 520, so that the slag slurry with the solid content of less than 5% is introduced into the filter 520, in the filter 520, the slag slurry realizes solid-liquid separation, the separated slag slurry is a gas-liquid mixture and a solid-liquid slurry mixture, the gas-liquid outlet of the filter 520 is connected with the inlet of the distillation pot 300, so that the gas-liquid mixture (mainly chlorosilane) separated in the filter 520 is introduced into the distillation pot 300, and the chlorosilane is discharged from the distillation pot 300, so that the distilled silane is purified, and the distilled silane is recovered. The solid phase outlet of the filter 520 is connected with the inlet of the drying device 510, so that the solid-liquid mud-like mixture separated in the filter 520 is introduced into the drying device 510 for drying, the gaseous chlorosilane obtained by drying is introduced into the distillation tank 300, the chlorosilane in the gaseous chlorosilane is recovered, the silicon mud obtained after drying is discharged through the silicon mud outlet, and the silicon powder is recovered through the recovery of the silicon mud, so that the silicon powder is recovered, and the waste of the silicon powder is avoided.
Above adopts different processing systems to the sediment thick liquid of solid content difference to convenient high-efficient processing sediment thick liquid avoids redundant processing, avoids processing cost higher.
As described above, the light components obtained by flash evaporation of the slurry in the flash tank 200 are gradually cooled in the pipeline to be liquid, so that the light components entering the distillation tank 300 are liquid, if the gaseous substances are directly introduced into the distillation tank 300, the gaseous substances are directly discharged from the light component outlet of the distillation tank 300, so that the distillation tank 300 does not rectify and purify the gaseous substances, and the distillation tank 300 is not significant, so that the substances to be rectified and purified introduced into the distillation tank 300 need to be liquid, and in order to ensure that the substances introduced into the distillation tank 300 are liquid, in an alternative embodiment, the cold hydrogenated slurry treatment system disclosed herein may further comprise a clean liquid tank 530, wherein the light component outlet of the flash tank 200, the supernatant outlet of the ground tank 400 and the gas phase outlet of the drying device 510 are all connected with the inlet of the clean liquid tank 530, and the outlet of the clean liquid tank 530 is connected with the inlet of the distillation tank 300. The front end of the inlet of the distillation tank 300 is provided with the clear liquid tank 530 so that gaseous substances are gradually cooled into liquid state in a pipeline, and then the liquid substances are introduced into the clear liquid tank 530 for buffering, even if part of the gaseous substances are not cooled into liquid state, the uncooled gaseous substances are gradually cooled into liquid state in the clear liquid tank 530 due to the existence of the clear liquid tank 530, then the liquid substances are introduced into the distillation tank 300 for rectification and purification, the substances introduced into the distillation tank 300 are ensured to be liquid state, and the phenomenon that the distillation tank 300 does not rectify and purify the gaseous substances due to the fact that the gaseous substances are directly introduced into the distillation tank 300 is avoided, and the recovered chlorosilane is prevented from being lower in purity.
Further, the cold hydrogenated slurry treating system disclosed herein may further include a first cooling device 540, wherein the light component outlet of the flash tank 200, the supernatant outlet of the ground tank 400, and the gas phase outlet of the drying device 510 are all connected to an inlet of the first cooling device 540, and an outlet of the first cooling device 540 is connected to an inlet of the supernatant tank 530. By adding the first cooling device 540, the substances introduced into the distillation tank 300 are cooled by the first cooling device 540 firstly to ensure that the substances are cooled into liquid, then introduced into the clear liquid tank 530 for buffering, and then introduced into the distillation tank 300 for rectification and purification, so that the substances introduced into the distillation tank 300 are further ensured to be liquid, and the reliability of the cold hydrogenated slag slurry treatment system is improved.
As described above, heavy components obtained from slurry passing through the flash tank 200 are introduced into the ground tank 400 from the bottom of the flash tank 200, and the temperature of the heavy components obtained from the flash tank 200 is relatively high due to the relatively high temperature of the flash tank 200, if heat is introduced into the ground tank 400 when the heavy components are introduced into the ground tank 400 directly, part of liquid substances in the ground tank 400 are vaporized, resulting in deterioration of the settling effect of the ground tank 400, and the settling time period of the settling is prolonged.
Preferably, the cold hydrogenation slurry treatment system disclosed in the application may further include a condensate cooling tank 550, wherein the light component outlet of the distillation tank 300 is connected to the inlet of the condensate cooling tank 550, the outlet of the condensate cooling tank 550 is connected to the cold hydrogenation system, and the cache is cooled by the condensate cooling tank 550, so that the chlorosilane introduced into the cold hydrogenation system is in a liquid state, and the chlorosilane can be continuously introduced into the cold hydrogenation system through the condensate cooling tank 550.
As described above, when the flash tank 200 is operated at a temperature of about 70 ℃ to 80 ℃, and when the distillation tank 300 is operated at a temperature of about 120 ℃, the flash tank 200 and the distillation tank 300 are generally heated by steam, so that the flash tank 200 needs to be heated by steam of about 90 ℃, the distillation tank 300 needs to be heated by steam of about 130 ℃, preferably, the distillation tank 300 and the flash tank 200 can be both in an external coil heating structure, and the steam heating outlet of the distillation tank 300 is connected with the steam heating inlet of the flash tank 200, so that the steam after heating the distillation tank 300 is used for heating the flash tank 200, thereby realizing the gradient utilization of heat in the steam, reducing the consumption of the steam and avoiding the waste of heat in the steam.
Further, the drying device 510 may also be an external coil heating structure, and the steam heating outlet of the distillation tank 300 is further connected with the steam heating inlet of the drying device 510, so that the steam after heating the distillation tank 300 is used for providing heat required during drying for the drying device 510, so that the steam can be utilized in two stages, the heat in the steam can be fully utilized, the consumption of the steam can be reduced, and the waste of the heat in the steam can be avoided.
The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.
The above examples only represent a few embodiments of the present application, which are described in more detail and are not to be construed as limiting the scope of the claims. It should be noted that it would be apparent to those skilled in the art that various modifications and improvements could be made without departing from the spirit of the present application, which would be within the scope of the present application. Accordingly, the scope of protection of the present application is to be determined by the claims appended hereto.

Claims (8)

1. The utility model provides a cold hydrogenation sediment stuff processing system, its characterized in that includes sediment stuff discharge pipeline (100), flash tank (200), retort (300) and ground jar (400), sediment stuff discharge pipeline (100) with the import of flash tank (200) links to each other, the light fraction export of flash tank (200) with the import of retort (300) links to each other, the light fraction export of retort (300) links to each other with cold hydrogenation system, the heavy fraction export of retort (300) is high boiling recovery export, the heavy fraction export of flash tank (200) with the import of ground jar (400) links to each other, the supernatant export of ground jar (400) with the import of retort (300) links to each other, the bottom of ground jar (400) has the blowdown export, the blowdown export is connected with drying device (510), the gaseous phase export of drying device (510) with the import of retort (300), the solid phase export of drying device (510) is the mud export.
2. The cold hydrogenated slurry treating system as set forth in claim 1, further comprising a filter (520), wherein the slurry discharge pipe (100) is further connected to an inlet of the filter (520), a gas-liquid outlet of the filter (520) is connected to an inlet of the distillation tank (300), and a solid phase outlet of the filter (520) is connected to an inlet of the drying device (510).
3. The cold hydrogenated slurry treating system as set forth in claim 1, further comprising a clean liquid tank (530), wherein a light component outlet of the flash tank (200), a supernatant outlet of the ground tank (400), and a gas phase outlet of the drying device (510) are all connected to an inlet of the clean liquid tank (530), and an outlet of the clean liquid tank (530) is connected to an inlet of the distillation tank (300).
4. A cold hydrogenated slurry treating system as set forth in claim 3, further comprising a first cooling device (540), wherein the light component outlet of the flash tank (200), the supernatant outlet of the ground tank (400) and the gas phase outlet of the drying device (510) are all connected to the inlet of the first cooling device (540), and the outlet of the first cooling device (540) is connected to the inlet of the supernatant tank (530).
5. The cold hydrogenated slurry processing system as set forth in claim 1, further comprising a condensate cooling tank (550), wherein a light component outlet of the distillation tank (300) is connected to an inlet of the condensate cooling tank (550), and wherein an outlet of the condensate cooling tank (550) is connected to the cold hydrogenation system.
6. The cold hydrogenated slurry treating system as set forth in claim 1, further comprising a second cooling device (560), wherein the heavy component outlet of the flash tank (200) is connected to an inlet of the second cooling device (560), and wherein an outlet of the second cooling device (560) is connected to an inlet of the ground tank (400).
7. The cold hydrogenated slurry treating system as set forth in claim 1, wherein the distillation tank (300) and the flash tank (200) are both of an external coil heating structure, and a steam heating outlet of the distillation tank (300) is connected to a steam heating inlet of the flash tank (200).
8. The cold hydrogenated slurry treating system as set forth in claim 7, wherein the drying device (510) has an outer coil heating structure, and the steam heating outlet of the distillation tank (300) is further connected to the steam heating inlet of the drying device (510).
CN202320630749.9U 2023-03-27 2023-03-27 Cold hydrogenation slag slurry treatment system Active CN219429719U (en)

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CN202320630749.9U CN219429719U (en) 2023-03-27 2023-03-27 Cold hydrogenation slag slurry treatment system

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Application Number Priority Date Filing Date Title
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CN219429719U true CN219429719U (en) 2023-07-28

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