CN219409895U - Chemical vapor deposition equipment - Google Patents

Abstract

The application relates to the field of chemical vapor deposition, in particular to chemical vapor deposition equipment, which comprises a base, a reaction zone cover arranged on the base, a reflecting cover arranged on the base and covered outside the reaction zone cover, a heating lamp arranged between the reaction zone cover and the reflecting cover, a reaction gas pipe positioned in the reaction zone cover and communicated with the outside, and a rotary supporting table arranged on the base and positioned in the reaction zone cover, wherein the reaction zone cover is provided with a plurality of reflecting holes; wherein the reflecting cover reflects at least part of the light emitted by the heating lamp, and a heating surface surrounding the rotary supporting table is formed on the periphery of the rotary supporting table. The method has the effects of saving raw materials and being heated uniformly when the parts with irregular shapes and high raw material cost are produced.

Description

Chemical vapor deposition equipment

Technical Field

The present application relates to the field of chemical vapor deposition, and in particular to chemical vapor deposition apparatus.

Background

The chemical vapor deposition process is one kind of chemical technology, and is mainly one or several kinds of vapor phase compounds or simple substances containing film elements are used in chemical reaction to form film on the surface of the substrate.

The chemical vapor deposition is classified into cold wall chemical vapor deposition and hot wall chemical vapor deposition. Cold wall chemical vapor deposition mostly adopts induction heating, and parts are directly heated through eddy current, so that the efficiency is high, and the temperature rise is rapid. Induction heating can only heat parts with more regular shapes, and under the condition that the shapes of the parts are irregular, particularly materials forming the parts are different or effective vortex cannot be formed, the temperature is very uneven, so that deposited films are uneven, and the process requirements cannot be met. There are also indirect methods such as induction heating of the crucible to heat the part. However, induction heating crucibles are often used in cases where the size of the part is small or where the part is thin, the difficulty in achieving the temperature uniformity requirement is relatively high for irregular and relatively large parts.

The hot wall chemical vapor deposition generally adopts a hot wall mode for heating, the temperature and the air flow can be well controlled by the hot wall mode for heating, and the obtained film layer is uniform. However, the temperature of the hot wall is higher than the temperature of the part, and raw materials are deposited on the hot wall, so that the raw material utilization rate is low. Therefore, parts with lower raw material cost and higher temperature uniformity requirements are usually processed by adopting a hot wall chemical vapor deposition mode.

With respect to the related art, the inventors consider that, for parts having irregular shapes, being made of different materials, having a large volume and having a high cost of raw materials, the production cost is increased when the hot wall chemical vapor deposition process is used for manufacturing the parts, and the uniformity of the film layer is poor when the cold wall chemical vapor deposition process is used for manufacturing the parts.

Disclosure of Invention

In order to save raw materials and uniformly heat during the production of parts with irregular and high raw material cost, the application provides chemical vapor deposition equipment.

The chemical vapor deposition equipment provided by the application adopts the following technical scheme:

the chemical vapor deposition equipment comprises a base, a reaction zone cover arranged on the base, a reflecting cover arranged on the base and covered outside the reaction zone cover, a heating lamp arranged between the reaction zone cover and the reflecting cover, a reaction gas pipe positioned in the reaction zone cover and communicated with the outside, and a rotary supporting table arranged on the base and positioned in the reaction zone cover; wherein the reflecting cover reflects at least part of the light emitted by the heating lamp, and a heating surface surrounding the rotary supporting table is formed on the periphery of the rotary supporting table.

By adopting the technical scheme, when the parts with irregular shapes and higher raw material cost are produced and processed, unreacted reaction gas is input into the reaction zone cover by the reaction gas pipe and the reaction gas after reaction is output, the heating surface is arranged around the reaction zone cover, so that substances formed by the reaction gas during heating are deposited on the rotary supporting table, the heated positions of the parts are more concentrated and more uniform, the reflection cover can reflect the light which is not irradiated on the parts by the heating lamp tube part, and the power loss is reduced. In addition, the part can radiate energy outwards after being heated, and the reflecting cover can reflect part of energy back into the reaction zone cover at the same time, so that the power loss is reduced. When the rotary supporting table rotates, the parts to be produced rotate along with the rotary supporting table, and the light source and the air source are uniformly received, so that the parts are heated more uniformly, further, the deposited film is more uniform, and the effects of saving raw materials and being heated uniformly when the parts with irregular shapes and higher raw material cost are produced are achieved. In the process, the reaction zone cover is used for separating the heating lamp and the reaction gas, the material of the reaction zone cover can be selected according to requirements, for example, the reaction zone cover can be selected as a cold wall reaction zone cover, so that the aim of reducing the deposition of the reaction gas on the reaction zone cover is fulfilled.

Preferably, the heating lamps are provided in plurality, and the heating lamps are all installed on the bottom support and are arranged around the reaction zone cover at intervals.

By adopting the technical scheme, the heating lamps are arranged in a surrounding manner, so that the reaction zone cover is heated more uniformly and stably, the reaction gas is reacted more fully in the reaction zone cover, the production of parts is facilitated, and the raw materials are saved; and be convenient for set up heating lamp and reflector moreover, realize even more stable heating effect.

Preferably, the light emitting surface of each heating lamp faces the reaction zone cover, wherein after the light of the heating lamp is reflected by the reflecting cover, the reflected light enters the reaction zone cover through a gap between every two adjacent heating lamps opposite to each other.

Through adopting above-mentioned technical scheme, there is the space between a plurality of heating lamps, and the space department can exist inhomogeneous condition to the heating in the reaction zone cover, and the reflecting cover can reflect the heating lamp this moment for transmitting the light in the reaction zone cover to and pass the reaction zone cover and shine the light on the reflecting cover, make the light after the reflection enter into in the reaction zone cover, reach the effect more even to the heating in the reaction zone cover, and simple structure is convenient for realize the effect of even heating moreover.

Preferably, the light transmittance of the reaction zone cover is higher than 75%.

By adopting the technical scheme, the heating lamp and the reflecting cover are matched, so that the effect of stable and uniform heating can be realized; the higher the transmittance of the reaction zone cover is, the lower the power lost by the heating lamp is, and the better the heating effect on the space in the reaction zone cover is.

Preferably, a surface of the reflecting cover facing the reaction zone cover is a reflecting surface, and the reflecting surface of the reflecting cover is a specular reflecting surface.

By adopting the technical scheme, the specular reflection surface reflects all light arriving from a given direction at the same angle, the reflection effect is better, the power loss is reduced, the effect that the reflected light enters the reaction zone cover is better, and the purpose of better heating the space in the reaction zone cover is achieved; and the arrangement structure of each part is simple, so that the effect of uniform heating is realized.

Preferably, the reflecting cover and the reaction zone cover are both cylindrical.

By adopting the technical scheme, the reaction zone cover is cylindrical, and the heating lamp tube is arranged around the reaction zone cover, so that the heated positions of the parts are centralized and uniform.

Preferably, the reaction zone cover further comprises a heat dissipation channel, and the heat dissipation channel communicates the space between the reflection cover and the reaction zone cover with the outside.

Through adopting above-mentioned technical scheme, heat dissipation passageway and external intercommunication make external gas enter into between reflector and the reaction zone cover, play the heat dissipation effect.

Preferably, a heating section is arranged between the reflecting cover and the reaction zone cover, an air inlet and an air outlet are arranged in the heating section, and the air inlet, the heating section and the air outlet form the heat dissipation channel.

By adopting the technical scheme, cold air enters from the air inlet, is discharged from the air outlet after passing through the heating zone, and plays a role in heat dissipation for the heating zone.

Preferably, the reaction zone enclosure is a cold wall reaction zone enclosure.

By adopting the technical scheme, the cold wall ensures that raw materials are not easy to deposit on the reaction zone cover during reaction, thereby reducing loss and lowering cost.

Preferably, the reaction zone cover is made of quartz.

By adopting the technical scheme, the light transmittance of quartz reaches more than 85%, and the energy and power loss of the light emitted by the heating lamp tube after entering the reaction zone cover are reduced.

In summary, the present application includes at least one of the following beneficial technical effects:

1. when the parts with irregular shapes and higher raw material cost are produced and processed, unreacted reaction gas is input into the reaction zone cover by the reaction gas pipe and the reaction gas after reaction is output, the heating surface is arranged around the reaction zone cover, so that substances formed by the reaction gas during heating are deposited on the rotary supporting table, the heated positions of the parts are concentrated and uniform, the reflection cover can reflect the light which is not irradiated on the parts by the heating lamp tube part, and the power loss is reduced. In addition, the part can radiate energy outwards after being heated, and the reflecting cover can reflect part of energy back into the reaction zone cover at the same time, so that the power loss is reduced. When the rotary supporting table rotates, the parts to be produced rotate along with the rotary supporting table, and the light source and the air source are uniformly received, so that the parts are heated more uniformly, further, the deposited film is more uniform, and the effects of saving raw materials and being heated uniformly when the parts with irregular shapes and higher raw material cost are produced are achieved. In the process, the reaction zone cover is used for separating the heating lamp and the reaction gas, the material of the reaction zone cover can be selected according to requirements, for example, the reaction zone cover can be selected as a cold wall reaction zone cover, so that the aim of reducing the deposition of the reaction gas on the reaction zone cover is fulfilled.

2. There is the space between a plurality of heating lamps, and the space department can exist inhomogeneous condition to the heating in the reaction zone cover, and the reflecting cover can reflect the heating lamp this moment for transmitting the light in the reaction zone cover to and pass the reaction zone cover and shine the light on the reflecting cover, make the light after the reflection enter into the reaction zone cover in, reach the effect more even to the heating in the reaction zone cover, simple structure is convenient for realize the effect of even heating moreover.

3. The mirror surface reflects all light arriving from a given direction at the same angle, so that the reflection effect is better, the power loss is reduced, the effect that the reflected light enters the reaction zone cover is better, and the aim of better heating the space in the reaction zone cover is fulfilled; and the arrangement structure of each part is simple, so that the effect of uniform heating is realized.

Drawings

FIG. 1 is a schematic cross-sectional front view of a chemical vapor deposition apparatus embodying embodiments of the present application.

Reference numerals illustrate: 1. a bottom support; 2. a reaction zone cover; 3. a reflection cover; 4. a heating lamp; 5. a reaction gas pipe; 51. a reaction gas outlet pipe; 52. a reaction air inlet pipe; 6. a rotary support table; 7. a heat dissipation channel; 71. an air inlet; 72. and an air outlet.

Detailed Description

The present application is described in further detail below in conjunction with fig. 1.

In the prior art, the induction heating mode can meet the requirement of a cold wall, but the temperature uniformity is poor when the part with irregular shape is heated, and the temperature uniformity requirement of chemical vapor deposition equipment is difficult to meet; the hot wall type heating temperature has good uniformity, but the utilization rate of the raw materials is low, and the method is not suitable for the popularization and the use of the technology for chemical vapor deposition with high raw material cost and overhigh cost. The chemical vapor deposition of irregular parts has high requirements on the air flow, and if the air flow is uneven, the thickness of a film layer is uneven. Besides higher requirements on the gas spray head, the uniformity of the contact gas flow of parts is generally improved by adopting a part rotation mode. If induction heating is used, coils are generally required to be designed according to the shape of the part in order to ensure the uniformity of the heating of the part, but irregular coils can lead to unrotatable parts, and the design of air flow is difficult.

The electromagnetic wave pollution treatment of induction heating needs to be higher in investment, and special materials are generally adopted for shielding. If the types and structural designs of the materials are unreasonable, the better shielding effect is difficult to achieve, electromagnetic wave pollution is easy to cause, and the body damage to operators is caused. The power utilization rate of hot wall heating is lower, most of the heat is dissipated by heat conduction, convection, radiation and the like, and the part obtains only less heat. The hot wall type heating equipment has larger structure and size due to the structures such as the heat insulation layer, the shell and the like, so that the occupied space is larger. The induction heating has higher requirements on the electrical properties of the heated material, and is not suitable for the material with high electric resistance and conductivity and low magnetic permeability in an induction heating mode.

The embodiment of the application discloses chemical vapor deposition equipment. Referring to fig. 1, the chemical vapor deposition apparatus includes a susceptor 1, a reaction zone cover 2 mounted on the susceptor 1, a reflection cover 3 mounted on the susceptor 1 and covered outside the reaction zone cover 2, a heating lamp 4 disposed between the reaction zone cover 2 and the reflection cover 3, a reaction gas pipe 5 located in the reaction zone cover 2 and communicating with the outside, and a rotation support table 6 mounted on the susceptor 1 and located in the reaction zone cover 2.

Referring to fig. 1, the shoe 1 may be circular, square, or irregular, as long as the mountable condition is satisfied, and the circular shoe 1 is exemplified in this embodiment. The rotary supporting table 6 is arranged at the center of the bottom support 1, and the rotary supporting table 6 comprises a rotating shaft rotatably arranged on the bottom support 1 and a rotary table rotatably connected to one end of the rotating shaft far away from the rotary supporting table 6; the turntable may be a circular table, a square table, or other shapes as long as it is capable of satisfying the convenience of rotation. In the embodiment, the rotating table is cylindrical, the rotating table is overlapped with the axis of the bottom support 1, one end of the rotating shaft, which is far away from the bottom support 1, is rotatably installed at the center of the circular end face of the cylinder, one end of the opening of the cylinder is rotatably connected with the bottom support 1, during operation, parts are deposited on the rotating table, because the reaction zone cover 2 is cylindrical, the heating lamp 4 pipe is arranged around the reaction zone cover 2, the heated parts are more concentrated and more uniform, the rotating support table 6 rotates along with the rotating support table 6 when rotating, the parts to be produced uniformly receive the light source and the air source, the parts are heated more uniformly, further, the deposited film is more uniform, and the effects of saving raw materials and being heated uniformly when the parts with irregular and higher raw material cost are produced are achieved.

Referring to fig. 1, the reaction zone cover 2 is a cylinder with an opening at one end and hollow inside, when in use, the opening is placed towards the direction of the bottom support 1, the reaction zone cover 2 is overlapped with the axis of the turntable, the light transmittance of the reaction zone cover 2 is higher than 75%, and the effect of stable and uniform heating can be realized through the cooperation of the heating lamp 4 and the reflecting cover 3; the higher the transmittance of the reaction zone cover 2 is, the lower the power lost by the heating lamp 4 is, and the better the heating effect on the space in the reaction zone cover 2 is, in this embodiment, the reaction zone cover 2 is made of quartz, and the transmittance of quartz is more than 85%, so that the energy and power loss after the light emitted by the heating lamp 4 enters the reaction zone cover 2 can be reduced. Because quartz heats up slowly and the luminousness is good when using, so reaction zone cover 2 is cold wall reaction zone cover 2, and then makes the raw and other materials not deposit on quartz cover surface, improves material utilization.

Referring to fig. 1, the reaction gas pipe 5 includes a reaction gas inlet pipe 52 and a reaction gas outlet pipe 51, and the reaction gas inlet pipe 52 and the reaction gas outlet pipe 51 are disposed opposite to each other with the axis of the rotary support table 6 as the center. The reaction air inlet pipe 52 and the reaction air outlet pipe 51 are all penetrated through the collet 1 and extend into the reaction zone cover 2, and the heights of the reaction air inlet pipe 52 and the reaction air outlet pipe 51 can be adjusted according to parts to be processed. The reaction air inlet pipe 52 is provided with a plurality of air inlets, the plurality of air inlets 71 are uniformly distributed along the length direction of the reaction air inlet pipe 52, and the plurality of air inlets 71 are arranged towards the rotary supporting table 6; the reaction air outlet pipe 51 is provided with a plurality of air outlet holes, and the plurality of air outlet holes are arranged along the length direction of the reaction air outlet pipe 51. The material of the reaction air inlet pipe 52 and the reaction air outlet pipe 51 is quartz, and the quartz is not easy to heat, so that raw materials cannot be deposited on the reaction air inlet pipe 52 and the reaction air outlet pipe 51 in the reaction process, and the air inlet hole and the air outlet hole are prevented from being blocked.

Referring to fig. 1, the reflecting cover 3 is cylindrical, one side of the reflecting cover 3 facing the reaction zone cover 2 is a reflecting surface, the reflecting surface of the reflecting cover 3 is a specular reflecting surface, and the specular reflecting surface reflects all light arriving from a given direction at the same angle, so that the reflecting effect is better, the power loss is reduced, the effect of the reflected light entering the reaction zone cover 2 is better, and the purpose of better heating the space in the reaction zone cover 2 is further achieved; the arrangement structure of each part is simple, so that the effect of uniform heating is convenient to realize; in addition, the parts can radiate energy outwards after being heated, and the reflecting cover 3 can reflect part of the energy back into the reaction zone cover 2 at the same time, so that the power loss is reduced.

Referring to fig. 1, a plurality of heating lamps 4 are provided, at least part of light emitted by the heating lamps 4 is reflected by the reflecting cover 3, a heating surface surrounding the rotary supporting table 6 is formed on the periphery of the rotary supporting table 6, the plurality of heating lamps 4 are all arranged on the base 1 and are arranged at intervals surrounding the reaction zone cover 2, the heating lamps 4 are arranged in a surrounding manner, so that the reaction zone cover 2 is uniformly and stably heated, the reaction gas is fully reacted in the reaction zone cover 2, the production of parts is facilitated, and the raw materials are saved; and be convenient for set up heating lamp 4 and reflector 3, realize even more stable heating effect. The heating lamps 4 are arranged in various modes, one adopts the circumferential arrangement of straight lamp tubes, the other adopts the axial arrangement of circular lamp tubes, and the heating lamps can be selected and adjusted according to the sizes and the shapes of the parts.

Referring to fig. 1, there are various arrangements of the light emitting surface of the heating lamp 4, and when the light emitting surface of the heating lamp 4 is arranged toward the reflecting cover 3, the reflecting cover 3 specularly reflects all light emitted from the heating lamp 4, and the reflected light passes through the reaction zone cover 2 to enter the reaction zone cover 2 to heat the reaction zone; when the light emergent surface of the heating lamp 4 faces the reaction zone cover 2 and partially faces the reflecting cover 3, the reflecting cover 3 reflects the light emitted by the heating lamp 4 facing the reflecting cover 3 and the light which passes through the reaction zone cover 2 and reaches the reflecting surface of the reflecting cover 3, and the reflected light enters the reaction zone cover 2 to heat the reaction zone cover 2; when the light emergent surfaces of the heating lamps 4 are all arranged at a certain angle, part of light generated by the heating lamps 4 passes through the reaction zone cover 2, and part of light generated by the heating lamps 4 enters the reaction zone cover 2 after being reflected by the reflecting surfaces of the reflecting covers 3;

referring to fig. 1, when the light emitting surfaces of the heating lamps 4 face the reaction zone cover 2, part of the light generated by the heating lamps 4 is reflected by the reflecting cover 3, and the reflected light enters the reaction zone cover 2 through a gap between two adjacent heating lamps 4; in this embodiment, the condition that the light emitting surface of the heating lamp 4 faces the reaction zone cover 2 is described, gaps exist between the heating lamps 4, the heating in the reaction zone cover 2 is uneven at the gaps, at this time, the reflection cover 3 reflects the light emitted into the reaction zone cover 2 by the heating lamp 4 and the light emitted onto the reflection cover 3 through the reaction zone cover 2, so that the reflected light enters the reaction zone cover 2 to achieve the effect of heating more uniformly in the reaction zone cover 2, and the reaction zone cover has a simple structure and is convenient for realizing the effect of uniform heating.

Referring to fig. 1, a space between the reflecting cover 3 and the reaction zone cover 2 is set as a heating zone, an air inlet 71 and an air outlet 72 are arranged in the heating zone, the air inlet 71, the air outlet 72 and the heating zone jointly form a heat dissipation channel 7, and devices for promoting the air circulation of the heat dissipation channel 7 can be arranged at the air inlet 71 and the air outlet 72. In this embodiment, a fan is taken as an example for illustration, an air inlet fan for sucking cold air from the outside into the heating region is installed at the air inlet 71, an air outlet fan for sucking hot air from the heating region to the outside is installed at the air outlet 72, so as to accelerate the cold air circulation of the heat dissipation channel 7, achieve the effect of cooling and dissipating heat of the reaction region cover 2, and avoid the waste of raw materials caused by the deposition of raw materials on the reaction region cover 2.

The implementation principle of the embodiment of the application is as follows: when the irregular parts are processed, the arrangement mode of the heating lamp 4 tubes is selected and adjusted according to the sizes and the shapes of the parts. The reflecting surface of the reflecting cover 3 is in specular reflection, so that a good light wave reflecting effect is achieved, and the reflecting cover can reflect part of light which does not irradiate on the part to the inside of the reaction zone cover 2, so that power loss is reduced; in addition, the parts can radiate energy outwards after being heated, so that the reflecting cover 3 can reflect the energy back, and the power loss can be reduced. The light transmittance of the reaction zone cover 2 is extremely high, and the temperature rising speed is slower; the heat dissipation channel 7 reduces the temperature of the reaction zone cover 2, so that raw materials are not deposited on the surface of the quartz cover, and the material utilization rate is improved. The rotary supporting table 6 is driven by the rotary shaft to rotate, and at the moment, the parts placed on the rotary supporting table 6 can also rotate, so that the light source and the air source can be more uniformly received, and the deposited film is more uniform.

The foregoing are all preferred embodiments of the present application, and are not intended to limit the scope of the present application in any way, therefore: all equivalent changes in structure, shape and principle of this application should be covered in the protection scope of this application.

Claims (10)

1. The chemical vapor deposition equipment is characterized by comprising a bottom support (1), a reaction zone cover (2) arranged on the bottom support (1), a reflecting cover (3) arranged on the bottom support (1) and covered outside the reaction zone cover (2), a heating lamp (4) arranged between the reaction zone cover (2) and the reflecting cover (3), a reaction gas pipe (5) positioned in the reaction zone cover (2) and communicated with the outside, and a rotary supporting table (6) arranged on the bottom support (1) and positioned in the reaction zone cover (2); wherein the reflecting cover (3) reflects at least part of the light emitted by the heating lamps (4) and forms a continuous heating surface surrounding the rotary supporting table (6) in the reaction zone cover (2).

2. The chemical vapor deposition apparatus according to claim 1, wherein: the heating lamps (4) are arranged in a plurality, and the heating lamps (4) are arranged on the base (1) and are arranged around the reaction zone cover (2) at intervals.

3. The chemical vapor deposition apparatus according to claim 2, wherein: the light emitting surface of each heating lamp (4) faces the reaction zone cover (2), wherein after the light of the heating lamp (4) is reflected by the reflecting cover (3), the reflected light enters the reaction zone cover (2) through a gap between every two adjacent heating lamps (4) opposite to each other.

4. A chemical vapor deposition apparatus according to claim 3, wherein: the light transmittance of the reaction zone cover (2) is higher than 75%.

5. A chemical vapor deposition apparatus according to claim 3, wherein: one surface of the reflecting cover (3) facing the reaction zone cover (2) is a reflecting surface, and the reflecting surface of the reflecting cover (3) is a specular reflecting surface.

6. A chemical vapor deposition apparatus according to claim 3, wherein: the reflecting cover (3) and the reaction zone cover (2) are cylindrical.

7. The chemical vapor deposition apparatus according to claim 1, wherein: the reaction zone cover also comprises a heat dissipation channel (7), wherein the heat dissipation channel (7) is used for communicating the space between the reflecting cover (3) and the reaction zone cover (2) with the outside.

8. The chemical vapor deposition apparatus according to claim 7, wherein: the heat radiation device is characterized in that a heating interval is arranged between the reflecting cover (3) and the reaction zone cover (2), an air inlet (71) and an air outlet (72) are arranged in the heating interval, and the air inlet (71), the heating interval and the air outlet (72) form the heat radiation channel (7).

9. The chemical vapor deposition apparatus according to any one of claims 1 to 8, wherein: the reaction zone cover (2) is a cold wall reaction zone cover (2).

10. The chemical vapor deposition apparatus according to claim 9, wherein: the reaction zone cover (2) is made of quartz.