CN219010438U

CN219010438U - Baffle adjusting device and coating equipment comprising same

Info

Publication number: CN219010438U
Application number: CN202222575743.4U
Authority: CN
Inventors: 魏国军; 肖畅; 李景薇
Original assignee: Buhler Leybold Optics Equipment Beijing Co ltd
Current assignee: Buhler Leybold Optics Equipment Beijing Co ltd
Priority date: 2022-09-28
Filing date: 2022-09-28
Publication date: 2023-05-12
Anticipated expiration: 2032-09-28

Abstract

The utility model provides a baffle adjusting device which is arranged in coating equipment, wherein the coating equipment comprises two sputtering sources and a substrate which are arranged at intervals, the device comprises two baffle adjusting structures, the two baffle adjusting structures are respectively arranged on two sides of the two sputtering sources, each baffle adjusting structure comprises N baffle adjusting components which are arranged side by side along a first direction, each baffle adjusting component comprises a driving part and a baffle connected with the driving part, the driving part is used for controlling the corresponding baffle to move in a second direction so that the baffle is positioned between the substrate and the sputtering source, the first direction is a vertical direction, and the second direction is perpendicular to the first direction. The utility model can simply and conveniently realize the accurate adjustment of the uniformity of the coating.

Description

Baffle adjusting device and coating equipment comprising same

Technical Field

The utility model relates to the field of vacuum coating, in particular to a baffle adjusting device and coating equipment comprising the baffle adjusting device.

Background

Existing vacuum system configurations generally include a backing vacuum, a vacuum chamber, a high vacuum pump, and a sputtering target. When the vacuum system works, the vacuum cavity is pumped to a certain vacuum degree through the forevacuum, after the high vacuum pump is started, the forevacuum is switched to the front end of the high vacuum pump, the high vacuum pump is started, and meanwhile, the high vacuum pump pumps the vacuum cavity, so that the vacuum cavity 3 reaches a lower vacuum degree, and the sputtering pump is ready to work. When a certain vacuum degree is reached, the workpiece disc starts to rotate at a high speed, the rotating target material starts to sputter out the material, and molecules of the material sputtered on the substrate are recombined. Because the rotating target material is at a certain distance from the substrate, the divergence angle of the sputtering ions is not equidistant from the substrate, and the circumferential and radial non-uniformity is formed, so that some products with high uniformity in the axial and radial directions are not produced.

Aiming at the problem, the existing solution is to arrange a manual adjustment uniform baffle plate in a vacuum cavity, namely, a certain number of uniform baffle plates are distributed from top to bottom, and when the uniformity problem occurs in the production process or a new product is in the debugging process, the uniformity of the whole furnace product is realized by adjusting the uniformity. The specific adjustment process comprises the following steps: firstly, the high vacuum pump is required to be stopped, then the backing pump is stopped, the vacuum cavity is changed into an atmospheric state through the opening of the vacuum chamber door, and then an operator enters the vacuum cavity to integrally detach the manual uniform baffle. Then, all fixing screws are loosened by using a tool, the size to be adjusted at each position is calculated according to a single-layer coating process, and the distribution of sputtering ions on the substrate is adjusted by adjusting the area of the shielding target 108 such as each uniform baffle plate. However, this solution of manually adjusting the uniformity of the coating by opening the vacuum chamber door can result in a change in the environment after evacuation, thus causing a change in the quality of the product and inefficiency.

Another prior art solution is an electrically adjustable coated baffle device as disclosed in patent document CN106399964a, which enables automatic adjustment of the baffle, but which is complex in structure and control.

Disclosure of Invention

Aiming at the technical problems, the utility model adopts the following technical scheme:

the embodiment of the utility model provides a baffle adjusting device which is arranged in coating equipment, wherein the coating equipment comprises two sputtering sources and a substrate which are arranged at intervals, the device comprises two baffle adjusting structures, the two baffle adjusting structures are respectively arranged at two sides of the two sputtering sources, each baffle adjusting structure comprises N baffle adjusting components which are arranged side by side along a first direction, each baffle adjusting component comprises a driving part and a baffle connected with the driving part, the driving part is used for controlling the corresponding baffle to move in a second direction so that the baffle is positioned between the substrate and the sputtering source, the first direction is a vertical direction, and the second direction is perpendicular to the first direction.

Another embodiment of the present utility model provides a coating apparatus comprising a sputtering source and the aforementioned baffle plate adjusting device.

The utility model has at least the following beneficial effects:

because each baffle is controlled by an independent linear servo motor and is arranged side by side from top to bottom, the device has a simple structure. When the phenomenon of uneven coating occurs, the corresponding baffle plate can be driven to move by controlling the corresponding linear servo motor, and the accurate adjustment of the uniformity of the coating can be simply and conveniently realized.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the drawings required for the description of the embodiments will be briefly described below, and it is apparent that the drawings in the following description are only some embodiments of the present utility model, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

Fig. 1 is a schematic structural diagram of a baffle adjusting device according to an embodiment of the present utility model.

Fig. 2 is a schematic structural view of a baffle adjusting assembly.

Fig. 3 is a schematic structural view of a film plating apparatus provided with a baffle plate adjusting device according to an embodiment of the present utility model.

Detailed Description

The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to fall within the scope of the utility model.

Fig. 1 is a schematic structural diagram of a baffle adjusting device according to an embodiment of the present utility model. Fig. 2 is a schematic structural view of a baffle adjusting assembly. Fig. 3 is a schematic structural view of a film plating apparatus provided with a baffle plate adjusting device according to an embodiment of the present utility model.

As shown in fig. 1 to 3, an embodiment of the present utility model provides a baffle adjusting device 1 provided in a coating apparatus 2. The coating apparatus 2 may include two sputtering sources 201, a vacuum chamber 202, and a forevacuum 203 disposed at intervals. A workpiece tray 204 and a substrate 205 disposed on the workpiece tray 204 are disposed in the vacuum chamber 203. The sputtering source 201 is fixed on the vacuum cavity 202 through a screw, the workpiece disc 204 is used as a carrier for carrying the substrate 205, the workpiece disc 204 is connected with a power mechanism on the vacuum cavity 202 through the screw so as to rotate at a high speed under the drive of the power mechanism, and the substrate 205 can be fixed on the workpiece disc 204 in a pasting mode.

As shown in fig. 1 and 2, the apparatus may include two shutter adjusting structures disposed at both sides of the two sputtering sources, respectively. Each baffle adjusting structure may include N baffle adjusting assemblies disposed side by side along a first direction, each baffle adjusting assembly may include a driving portion 110 and a baffle plate 112 connected to the driving portion, where the driving portion is configured to control the corresponding baffle plate to move in a second direction so that the baffle plate 112 is located between the substrate 205 and the sputtering source 201, the first direction is a vertical direction, specifically, an axial direction of a rotation axis of the workpiece tray 204, and the second direction is a horizontal direction perpendicular to the first direction.

Further, in the embodiment of the present utility model, the width of the barrier formed by the N barrier pieces may be equal to the height of the sputtering source. The number of N may be set according to actual needs, for example, may be determined according to the positions where the substrate needs to be adjusted, and in an exemplary embodiment, the number of positions where the substrate needs to be adjusted is 70, where n=70. Because the separation blades are arranged side by side from top to bottom, each separation blade can correspond to one monitoring position of the substrate, and therefore the uniformity of the coating can be accurately regulated.

Further, in an embodiment of the present utility model, the driving part may be a linear servo motor.

Further, in the embodiment of the present utility model, the N baffle adjusting assemblies are disposed on the fixed base 113, for example, fixed on the fixed base 113 by screws. The fixed base 113 is fixed to the mounting plate. In one exemplary embodiment, the stationary base 113 may be a stationary flange.

As shown in fig. 2, the fixed base is formed with N mounting holes, and the telescopic shaft 1101 of the linear servo motor is connected to the corresponding blocking piece through the corresponding mounting hole. In an embodiment of the utility model, the baffle and the telescopic shaft 1101 may be connected by a jackscrew 114.

Further, in the embodiment of the present utility model, a sealing member 113, such as a sealing ring, is provided between the telescopic shaft 1101 and the mounting hole. The sealing ring is used for realizing the vacuum and atmosphere sealing of the linear servo motor.

The installation flow of the baffle adjusting assembly of the embodiment of the utility model is as follows: firstly, all sealing rings are installed in the installation holes of the fixing flange, then, the linear servo motor is fixed on the fixing flange through motor fixing screws, the baffle plate is fixed on the linear servo motor through jackscrews, finally, the installed integral fixing flange is installed on the vacuum cavity through flange fixing screws, and the atmosphere and the vacuum sealing are realized through the sealing rings 115.

Further, in the embodiment of the present utility model, a controller (not shown) connected to the driving part is further included, for controlling the driving part to perform a corresponding operation. The controller may be a PLC controller or a computer, etc. In the embodiment of the utility model, the positions of the N baffle plates are numbered according to the sequence from top to bottom and stored in the memory.

The working principle of the baffle adjusting device provided by the embodiment of the utility model is as follows: if the substrate has uniformity problem or the new process has uniformity problem, the single-layer process can be used for calculating which position of the substrate has uniformity problem from top to bottom, for example, the position of the fifth baffle plate has problem, and the problem is that the film layer is plated thick, at this time, the controller needs to start two linear servo motors corresponding to the 5# position respectively to push the corresponding baffle plate integrally to the center position of the sputtering source by corresponding size, and the specific pushed size can be calculated through uneven film thickness. Similarly, each position can be adjusted in the same way, so that the coating film of the substrate from top to bottom is uniform.

According to the baffle adjusting device provided by the embodiment of the utility model, each baffle is controlled by the independent linear servo motor and is arranged side by side from top to bottom, so that the device is simple in structure. When the phenomenon of uneven coating occurs, the corresponding baffle plate can be driven to move by controlling the corresponding linear servo motor, and the accurate adjustment of the uniformity of the coating can be simply and conveniently realized.

Another embodiment of the present utility model provides a coating apparatus comprising a sputtering source and the aforementioned baffle plate adjusting device. The coating equipment provided by the embodiment of the utility model can simply and conveniently realize the accurate adjustment of the uniformity of the coating due to the baffle adjusting device.

While certain specific embodiments of the utility model have been described in detail by way of example, it will be appreciated by those skilled in the art that the above examples are for illustration only and are not intended to limit the scope of the utility model. Those skilled in the art will also appreciate that many modifications may be made to the embodiments without departing from the scope and spirit of the utility model. The scope of the present disclosure is defined by the appended claims.

Claims

1. The utility model provides a baffle adjusting device, its characterized in that sets up in coating film equipment, coating film equipment includes two sputtering sources and the substrate that the interval set up, the device includes two baffle adjusting structure, two baffle adjusting structure set up respectively in the both sides of two sputtering sources, and every baffle adjusting structure includes N baffle adjusting part that sets up side by side along first direction, every baffle adjusting part include drive division and with the separation blade that drive division is connected, drive division is used for controlling the separation blade that corresponds in the second direction motion so that the separation blade is located between substrate and the sputtering source, first direction is vertical direction, second direction perpendicular to first direction.

2. The apparatus of claim 1, wherein the N baffles form a baffle having a width equal to a height of the sputter source.

3. The apparatus of claim 1, wherein the drive is a linear servo motor.

4. The device of claim 3, wherein the N baffle adjusting assemblies are disposed on a fixed base, N mounting holes are formed in the fixed base, and the telescopic shaft of the linear servo motor passes through the corresponding mounting holes to be connected with the corresponding baffle.

5. The device of claim 4, wherein a seal is disposed between the telescoping shaft and the mounting hole.

6. The apparatus of claim 4, wherein the stationary base is secured to a mounting plate.

7. The apparatus of claim 1, further comprising a controller coupled to the drive.

8. A coating apparatus comprising a sputtering source and a baffle plate adjustment device according to any one of claims 1 to 7.