CN218989391U

CN218989391U - Air inlet structure of tubular vapor deposition table and vapor deposition equipment

Info

Publication number: CN218989391U
Application number: CN202222241108.2U
Authority: CN
Inventors: 徐聪; 付少剑; 郁寅珑; 张明明
Original assignee: Chuzhou Jietai New Energy Technology Co ltd
Current assignee: Chuzhou Jietai New Energy Technology Co ltd
Priority date: 2022-08-24
Filing date: 2022-08-24
Publication date: 2023-05-09
Anticipated expiration: 2032-08-24

Abstract

The utility model provides an air inlet structure of a tubular vapor deposition table and vapor deposition equipment, and relates to the technical field of vapor deposition. The air inlet structure of the tubular vapor deposition table comprises a furnace tube, an air inlet main pipe and air inlet branch pipes, wherein the furnace tube comprises a furnace mouth and a furnace tail, the air inlet main pipe is arranged at the furnace mouth, the number of the air inlet branch pipes is at least two, the air inlet branch pipes are positioned in the furnace tube, the air inlet main pipe is communicated with the furnace mouth, air inlet holes are formed in the air inlet branch pipes, and the air inlet holes are communicated with the inside of the furnace tube. Compared with the prior art, the technical scheme of the application can enable the gas in the furnace tube to be more uniform, and then the plating and the film reduction of the battery plates in different position areas in the furnace tube are uniform and the chromatic aberration is lower.

Description

Air inlet structure of tubular vapor deposition table and vapor deposition equipment

Technical Field

The utility model relates to the technical field of vapor deposition, in particular to an air inlet structure of a tubular vapor deposition table and vapor deposition equipment.

Background

Photovoltaic cell technology is continuously developed, industry researchers are always pursuing higher photoelectric conversion efficiency, and deposition of an antireflection film on the surface of a cell can increase more light absorption, increase photocurrent and improve photoelectric conversion efficiency.

At present, a tubular plasma enhanced chemical vapor deposition (Plasma Enhanced Chemical Vapor Deposition, PECVD) machine is mainly adopted as equipment for depositing an anti-reflectivity film in the industry, an air inlet structure on the machine is that an air inlet pipe is arranged at a furnace mouth of a quartz tube for air inlet, air is pumped from a furnace tail, air is fed from a single-point furnace mouth in the air inlet structure, and the air inlet structure is easy to cause uneven gas distribution in the quartz tube, so that plating and film reduction of battery plates in different position areas in the quartz tube are uneven, and the color difference proportion is high.

Disclosure of Invention

The embodiment of the utility model provides an air inlet structure of a tubular vapor deposition table and vapor deposition equipment, which are used for solving the problem of uneven film plating and film reduction of battery pieces in different position areas in a furnace tube of the conventional vapor deposition table.

In order to solve the technical problems, the utility model is realized as follows:

in a first aspect, the utility model provides an air inlet structure of a tubular vapor deposition table, the air inlet structure comprises a furnace tube, an air inlet main pipe and air inlet branch pipes, the furnace tube comprises a furnace mouth and a furnace tail, the air inlet main pipe is arranged at the furnace mouth, the number of the air inlet branch pipes is at least two, the air inlet branch pipes are positioned in the furnace tube along the furnace mouth and are communicated with the air inlet main pipe, air inlet holes are formed in the air inlet branch pipes, and the air inlet holes are communicated with the interior of the furnace tube.

In the air inlet structure of the tubular vapor deposition table, each air inlet branch pipe extends along the axial direction of the furnace tube.

In the air inlet structure of the tubular vapor deposition table, at least two air inlet branch pipes are uniformly arranged in the circumferential direction of the furnace tube.

According to the air inlet structure of the tubular vapor deposition table, the air inlet branch pipe is arranged on the pipe wall of the furnace pipe.

According to the air inlet structure of the tubular vapor deposition table, the opening of the air inlet is away from the tube wall of the furnace tube and faces the axis of the furnace tube.

In the air inlet structure of the tubular vapor deposition table, the diameter of the air inlet hole is between 0.2mm and 0.5 mm.

In the air inlet structure of the tubular vapor deposition table, the density of the air inlet holes is gradually reduced from the furnace mouth to the furnace tail.

In the air inlet structure of the tubular vapor deposition table, the furnace tube is a quartz tube.

The air inlet structure of the tubular vapor deposition table is used for a vapor deposition device of plasma enhanced chemistry.

In a second aspect, the present utility model provides a vapor deposition apparatus, including the gas inlet structure of the tubular vapor deposition station described above.

The utility model provides an air inlet structure of a tubular vapor deposition table, which can achieve the following technical effects:

in this application, air inlet branch sets up in the boiler tube and quantity is two at least, and air inlet branch intercommunication is located the air inlet header pipe of fire door department and has seted up the inlet port for inlet port quantity is a plurality of and sets up in the boiler tube, and rather than single inlet port and inlet port in like prior art are located fire door department, compare prior art, and gaseous more even in the boiler tube can be made to this technical scheme of application, and then in the boiler tube regional battery piece of different positions plates and subtracts the membrane even and the colour difference is lower.

Drawings

The accompanying drawings, which are included to provide a further understanding of the utility model and are incorporated in and constitute a part of this specification, illustrate embodiments of the utility model and together with the description serve to explain the utility model and do not constitute a limitation on the utility model. In the drawings:

FIG. 1 is a schematic view of an air intake structure of a tube vapor deposition station in the prior art;

fig. 2 is a schematic diagram of an air inlet structure of a tube-type vapor deposition station according to an embodiment of the present utility model.

Reference numerals:

10' -prior art air intake structure;

1' -quartz tube; 2' -furnace mouth; 3' -tail; 4' -inlet pipe;

10-an air inlet structure of an embodiment of the present utility model;

11-furnace tube; 12-furnace mouth; 13-furnace tail; 14-an intake manifold; 15-a first branch; 16-a second branch; 17-a third branch; 18-fourth branch pipe.

Detailed Description

The following description of the embodiments of the present utility model will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are some, but not all embodiments of the utility model. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

Fig. 1 shows an air inlet structure 10' of a tube type vapor deposition table in the prior art, which comprises a quartz tube 1', wherein a furnace mouth 2' is arranged at the boat inlet end of the quartz tube 1', a furnace tail 3' is arranged at the other end of the quartz tube, and an air inlet tube 4' is arranged at the furnace mouth 2 '. The air inlet structure on the machine is that an air inlet pipe 4' is arranged at a furnace mouth 2' of a quartz tube 1' for air inlet, in the process of preparing the anti-reflectivity film, air enters the quartz tube 1' from the furnace mouth 2', and air is pumped from the furnace tail, and the air inlet mode easily causes uneven air distribution in the quartz tube 1', so that the uniformity of battery piece film coating in different position areas in the quartz tube 1' is poor, and more chromatic aberration pieces are generated. The boat inlet end refers to one end for a carrier to enter the quartz tube 1', and the carrier is used for carrying silicon wafers. Because the air inlet structure 10' of fig. 1 is a single-point furnace inlet air inlet, the air inlet structure is easy to cause uneven air distribution in the quartz tube, so that the plating and film reduction of the battery plates in different position areas in the quartz tube are uneven, and the color difference proportion is high.

Therefore, the embodiment of the utility model provides an air inlet structure of a tubular vapor deposition table and vapor deposition equipment.

In the air inlet structure 10 of the tubular vapor deposition table shown in fig. 2, the air inlet structure comprises a furnace tube 11, an air inlet main pipe 14 and air inlet branch pipes, wherein the furnace tube 11 comprises a furnace mouth 12 and a furnace tail 13, the air inlet main pipe 14 is arranged at the furnace mouth 12, the number of the air inlet branch pipes is at least two, the air inlet branch pipes are positioned in the furnace tube 11 along the furnace mouth 12 and are communicated with the air inlet main pipe 14, air inlet holes (not shown in the drawing) are formed in the air inlet branch pipes, and the air inlet holes are communicated with the inside of the furnace tube 11.

In the embodiment of the utility model, because the air inlet branch pipes are arranged in the furnace tube 11 and at least two air inlet branch pipes are communicated with the air inlet header pipes 14 positioned at the furnace mouth 12 and are provided with the air inlet holes, the number of the air inlet holes is multiple and the air inlet pipes are arranged in the furnace tube 11 instead of a single air inlet hole in the prior art and the air inlet holes are positioned at the furnace mouth 12.

In one embodiment, each of the air intake branches may extend in the axial direction of the furnace tube 11, for example, from the mouth 12 to the tail 13, so that after the air intake holes are provided in the air intake branches, air intake holes can be provided in the furnace tube 11 from the mouth 12 to the tail 13 for air supply. Of course, in some embodiments, the air inlet branches may be disposed circumferentially within the furnace tube 11, or neither circumferentially nor axially, rather than axially along the furnace tube 11.

One section of the inlet manifold 14 is connected to a reactive gas source, and the other section is annularly arranged at the furnace mouth 12, as shown in fig. 2.

In one embodiment, at least two of the inlet branches are uniformly arranged in the circumferential direction of the furnace tube 11 in order to uniformly arrange the inlet branches in the furnace tube 11. The air inlet structure comprises 4 air inlet branch pipes, each air inlet pipe is provided with a plurality of air inlet holes for deposition reaction, and air enters the 4 air inlet branch passages from the air inlet main pipe 14 and enters the furnace tube 11 from the air inlet holes at different positions, so that uniformity of the air in the furnace tube is improved, uniformity of an antireflection film is improved, and chromatic aberration proportion is reduced. As shown in fig. 2, the 4 air inlet branch pipes are a first branch pipe 15, a second branch pipe 16, a third branch pipe 17 and a fourth branch pipe 18, and are respectively arranged on the upper, lower, left and right sides of the furnace pipe 11.

For another example, if one intake manifold is provided on each of the upper and lower (or left and right) sides of the furnace tube 11, the intake structure includes 2 intake manifolds. Of course, the number of the air inlet branch pipes on the air inlet structure can be 3, 5, 6 or more, and the like, and different numbers can be set according to actual requirements.

In one embodiment, to facilitate the installation of the intake manifold, the intake manifold may be disposed on a wall of the furnace tube 11, specifically, an inner wall of the furnace tube 11. Of course, as a modification, the inlet manifold may be spaced apart from the tube wall of the furnace tube 11 instead of being located on the tube wall of the furnace tube 11.

In order to provide the reaction gas into the furnace tube 11, the openings of the gas inlet holes on the gas inlet branch tube should be away from the tube wall of the furnace tube 11, but supply gas toward the axis of the furnace tube 11, that is, toward the center line in the furnace tube 11. In addition, the openings of the air inlet holes on the air inlet branch pipes can be deviated from the central line direction rather than the central line direction in the furnace tube 11.

In the embodiment of the utility model, the diameter of the air inlet hole can be between 0.2 and 0.5 mm; of course, the diameter of the air inlet holes can be increased or decreased appropriately according to actual needs.

In one embodiment, when the tail 13 of the intake structure 10 is exhausted, the density of the intake holes on the intake manifold may gradually decrease from the mouth 12 to the tail 13, that is, the density of the intake holes near the mouth 12 is higher and the density of the intake holes near the tail 13 is lower. For example, the air inlet branch pipe is divided into 20 parts, and air inlets are formed in the positions of 2/20, 3/20, 5/20, 8/20, 12/20 and 17/20 in the direction from the furnace mouth 12 to the furnace tail 13, and the dense-sparse hole structure can greatly improve the uniformity of gas in different areas from the furnace mouth 12 to the furnace tail 13 of the furnace tube 11 and improve the uniformity of coating films. This is because, in the gas intake structure 10 in which the tail 13 is sucked, the time for which the tail 13 stays in the gas is long, so that the uniformity can be improved by the gas inlet density of the furnace mouth 12, and the uniformity can be improved by the gas more by the lower temperature of the furnace mouth 12 due to the opening of the furnace door.

In addition, in some embodiments, the air intake holes of the air intake branch pipes may be arranged uniformly in the direction from the furnace mouth 12 to the furnace tail 13, instead of exhausting air from the furnace tail 13.

According to the embodiment of the utility model, the gas inlet structure of the tubular vapor deposition table can be applied to a vapor deposition device of plasma enhanced chemical, or a vapor deposition device using the gas inlet structure. The furnace tube 11 may be a quartz tube.

In order to realize the vapor deposition function, in the gas inlet structure, carriers are arranged from a furnace mouth 12 to a furnace tail 13, and a graphite boat at the tail of the carriers is used for placing silicon wafers. In the vapor deposition process, gases are reacted and deposited on a silicon wafer to form, for example, a silicon nitride film on the silicon wafer. The gas may be ammonia, nitrogen oxide or silane (silicon hydride).

In the embodiment of the utility model, a vapor deposition device is also provided, and the vapor deposition device comprises the air inlet structure of the tubular vapor deposition table and can realize the technical effect of the air inlet structure of the tubular vapor deposition table.

The foregoing is merely exemplary of the present utility model and is not intended to limit the present utility model. Various modifications and variations of the present utility model will be apparent to those skilled in the art. Any modification, equivalent replacement, improvement, etc. which come within the spirit and principles of the utility model are to be included in the scope of the claims of the present utility model.

Claims

1. The air inlet structure of the tubular vapor deposition table is characterized by comprising a furnace tube, an air inlet main pipe and air inlet branch pipes, wherein the furnace tube comprises a furnace mouth and a furnace tail, the air inlet main pipe is arranged at the furnace mouth, the number of the air inlet branch pipes is at least two, the air inlet branch pipes are positioned in the furnace tube along the furnace mouth and are communicated with the air inlet main pipe, the air inlet branch pipes are provided with air inlet holes, and the air inlet holes are communicated with the interior of the furnace tube;

each air inlet branch pipe extends along the axial direction of the furnace tube;

the opening of the air inlet hole is away from the pipe wall of the furnace pipe and faces the axis of the furnace pipe;

the density of the air inlet holes gradually decreases from the furnace mouth to the furnace tail, so that when the furnace tail of the air inlet structure is pumped, the air from the furnace mouth to different areas of the furnace tail is uniform.

2. The gas inlet structure of a tube type vapor deposition station according to claim 1, wherein at least two of the gas inlet branch pipes are uniformly arranged in a circumferential direction of the furnace tube.

3. The gas inlet structure of the tube type vapor deposition station according to claim 1, wherein the gas inlet branch pipe is provided on a wall of the furnace tube.

4. The gas inlet structure of a tube vapor deposition station of claim 1, wherein the gas inlet hole diameter is between 0.2mm and 0.5 mm.

5. The gas inlet structure of a tube vapor deposition station of claim 1, wherein the furnace tube is a quartz tube.

6. The gas inlet structure of a tube vapor deposition station of claim 1, wherein the gas inlet structure is for a plasma enhanced chemical vapor deposition apparatus.

7. A vapor deposition apparatus comprising the gas inlet structure of the tube vapor deposition station according to any one of claims 1 to 6.