CN218969426U - Single crystal furnace cleaning device - Google Patents
Single crystal furnace cleaning device Download PDFInfo
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- CN218969426U CN218969426U CN202320052125.3U CN202320052125U CN218969426U CN 218969426 U CN218969426 U CN 218969426U CN 202320052125 U CN202320052125 U CN 202320052125U CN 218969426 U CN218969426 U CN 218969426U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Abstract
The utility model provides a single crystal furnace cleaning device which is used for cleaning an insulating layer arranged in a main furnace chamber of a single crystal furnace and comprises a jacking device, a centering mechanism and a cleaning mechanism, wherein: the centering mechanism is arranged at the driving end of the jacking device, and the cleaning mechanism is arranged on the movable part of the centering mechanism; the jacking device is used for jacking the centering mechanism, so that the cleaning mechanism enters the heat preservation layer; the centering mechanism is used for centering the cleaning mechanism, so that the central axis of the cleaning mechanism is aligned with the central axis of the heat insulation layer within a preset error; the cleaning mechanism is used for cleaning the heat insulation layer. Through the cooperation of the jacking device, the centering mechanism and the cleaning mechanism, the automatic cleaning of the heat-insulating layer of the single crystal furnace is realized, so that the cleaning efficiency is improved, and the potential safety hazard is eliminated.
Description
Technical Field
The utility model relates to the field of single crystal furnaces, in particular to a single crystal furnace cleaning device.
Background
The single crystal furnace is a device for growing dislocation-free single crystals by using a Czochralski method in an inert gas environment by melting polycrystalline materials such as polysilicon with a graphite crucible.
In order to preserve the temperature of the silicon liquid in the crucible, an annular heat-preserving layer is generally arranged between the crucible and the main furnace chamber. After the heat preservation layer is used for a long time, the heat preservation layer needs to be cleaned. At present, cleaning of the heat insulation layer is generally implemented in a manual operation mode, and the manual operation mode is low in safety and efficiency.
Disclosure of Invention
In order to solve the technical problems, the utility model provides a single crystal furnace cleaning device, which has the following detailed technical scheme:
the utility model provides a single crystal growing furnace cleaning device for the heat preservation of cleaning up the main furnace chamber of installing at single crystal growing furnace, including jacking device, centering mechanism and cleaning mechanism, wherein:
the centering mechanism is arranged at the driving end of the jacking device, and the cleaning mechanism is arranged on the movable part of the centering mechanism;
the jacking device is used for jacking the centering mechanism, so that the cleaning mechanism enters the heat preservation layer; the centering mechanism is used for centering the cleaning mechanism, so that the central axis of the cleaning mechanism is aligned with the central axis of the heat insulation layer within a preset error;
the cleaning mechanism is used for cleaning the heat insulation layer.
Through the cooperation of the jacking device, the centering mechanism and the cleaning mechanism, the automatic cleaning of the heat-insulating layer of the single crystal furnace is realized, so that the cleaning efficiency is improved, and the potential safety hazard is eliminated.
In some embodiments, the centering mechanism comprises a pallet, a mounting plate, and a centering drive assembly, wherein: the mounting plate is rotatably mounted on the supporting plate, the mounting plate is fixedly connected with the driving end of the jacking device, and the cleaning mechanism is mounted on the mounting plate; the centering driving assembly comprises a fluted disc, a fluted disc driving mechanism, N gears, N sliding grooves and N sliding rails, wherein: the fluted disc is arranged on the mounting plate and is in transmission connection with the driving end of the fluted disc driving mechanism, and the fluted disc driving mechanism is used for driving the fluted disc to rotate relative to the mounting plate; each gear is arranged on the mounting plate and meshed with the fluted disc; the sliding grooves are fixedly formed in the supporting plate, the sliding rails are slidably mounted on the supporting plate through the sliding grooves and are correspondingly arranged with the gears, and racks meshed with the corresponding gears are arranged on each sliding rail.
When the fluted disc driving mechanism drives the fluted disc to rotate, the fluted disc drives each gear to synchronously rotate, so that each sliding rail is driven to slide towards the middle or slide around and separate. When the sliding rail stretches out and draws back, touching can be generated between the sliding rail and the inner wall of the main furnace chamber of the single crystal furnace, the central position of the cleaning mechanism is continuously adjusted by adjusting the stretching amount of the sliding rail until the stretching amount of each sliding rail enables each sliding rail to be propped against the inner wall of the main furnace chamber, and the centering of the cleaning mechanism is completed.
In some embodiments, the end of each slide rail is provided with a holding claw for holding the bottom of the main furnace chamber.
The bottom of the main furnace chamber is supported by the supporting claw, and the supporting claw synchronously moves along with the sliding rail in the sliding process of the sliding rail.
In some embodiments, an annular retainer ring is arranged at the edge of the supporting plate, and a plurality of buckles are arranged on the retainer ring; the retainer ring is used for supporting the heat preservation layer, and the buckle is used for erecting the retainer ring on the inner wall of the main furnace chamber.
Through setting up the retainer plate in the edge of layer board, the buckle is set up the retainer plate on the inner wall of main stove chamber, and then has realized the support of retainer plate to the heat preservation. In some embodiments, the cleaning mechanism comprises a positioning barrel, an outer sleeve, at least one sidewall brush, and a jacking rotation mechanism, wherein: the positioning cylinder is arranged on the mounting plate; the outer sleeve is movably sleeved on the outer side of the positioning cylinder and connected with the movable part of the jacking rotating mechanism, and the side wall hairbrush is arranged on the outer wall of the outer sleeve; the jacking and rotating mechanism is used for driving the outer sleeve to lift relative to the positioning cylinder so as to drive the side wall hairbrush to reach a preset cleaning height; the jacking rotating mechanism is also used for driving the outer sleeve to rotate relative to the positioning cylinder so as to drive the side wall hairbrush to synchronously rotate to clean the heat insulation layer.
The cleaning mechanism with the simple structure is provided, and the outer sleeve is driven to rotate relative to the inner sleeve through the jacking rotating mechanism, so that the side wall hairbrush on the outer sleeve is driven to be clung to the inner wall of the heat preservation layer to move, and the heat preservation layer is cleaned.
In some embodiments, a brush mounting plate is provided on the outer wall of the outer sleeve, an adjusting assembly is provided on the brush mounting plate, the side wall brush is mounted on the adjusting assembly, and the adjusting assembly is used for adjusting the distance between the side wall brush and the heat insulation layer.
The distance between the side wall hairbrush and the heat preservation is adjusted through the adjusting component, so that the side wall hairbrush can be abutted on the inner wall of the heat preservation, the cleaning of the heat preservation with different sizes is met, and the compatibility of the heat preservation brush is improved.
In some embodiments, each sidewall brush includes a first sidewall brush and a second sidewall brush, the first sidewall brush and the second sidewall brush being mounted on the brush mounting plate, respectively, by an adjustment assembly configured to individually adjust a spacing between the first sidewall brush and the second sidewall brush and the insulation layer.
The common heat preservation layer comprises an upper heat preservation layer, a middle heat preservation layer and a lower heat preservation layer which are stacked up and down, wherein the lower heat preservation layer is fixed at the bottom of the furnace, so the heat preservation layers to be cleaned in the utility model are the upper heat preservation layer and the middle heat preservation layer. However, the diameters of the inner cavities of the upper heat-insulating layer and the middle heat-insulating layer are not equal, so that the first side wall brush and the second side wall brush are respectively abutted on the inner walls of the upper heat-insulating layer and the middle heat-insulating layer by arranging the brushes to comprise the first side wall brush and the second side wall brush and adopting respective adjusting components to adjust the first side wall brush and the second side wall brush.
In some embodiments, the supporting plate is provided with a dust removing opening, the cleaning device of the single crystal furnace further comprises a dust extracting mechanism, and the dust extracting opening of the dust extracting mechanism is connected with the dust removing opening.
Through setting up dust removal mouth and dust extraction mechanism, can in time take away the dust under the clearance, prevent that the dust from causing secondary pollution to components such as heat preservation.
In some embodiments, the cleaning mechanism further comprises a top plate fixedly arranged at the top end of the outer sleeve, an annular top brush is arranged at the peripheral edge of the top plate, and the top brush is abutted to the heat insulation layer.
Through setting up roof and top brush, realized sheltering from the heat preservation inner space, prevent the dust that is cleared up down from the top escape of heat preservation, cause the pollution to the surrounding environment.
In some embodiments, the single crystal furnace cleaning device further comprises a transfer trolley, the jacking device is arranged on the transfer trolley, and the transfer trolley is used for assisting the single crystal furnace cleaning device to disassemble and assemble the heat preservation layer.
When the heat preservation is required to be replaced, after the centering mechanism finishes centering the cleaning mechanism, the heat preservation is lifted, and after the lifting mechanism lifts the upper main furnace chamber to rotate a certain angle, the buckle is controlled to be separated from the inner wall of the main furnace chamber. Then, the lifting mechanism lifts the main furnace chamber upwards, and the heat insulating layer is separated from the main furnace chamber.
Drawings
FIG. 1 is a schematic cross-sectional view of a cleaning apparatus for a single crystal furnace according to an embodiment of the present utility model;
FIG. 2 is a schematic diagram of the external structure of a cleaning device for a single crystal furnace according to an embodiment of the utility model;
FIG. 3 is a schematic cross-sectional view of a cleaning apparatus for a single crystal furnace according to an embodiment of the present utility model;
FIG. 4 is a schematic view of an assembled structure of a centering drive assembly and a positioning cylinder in an embodiment of the present utility model;
FIG. 5 is a bottom view of the centering drive assembly in an embodiment of the present utility model;
fig. 1 to 5 include:
jacking device 1:
centering mechanism 2:
pallet 21: a backing ring 211, a buckle 212;
a mounting plate 22;
centering drive assembly 23: fluted disc 231, fluted disc driving mechanism 232, gear 233, chute 234, slide rail 235, rack 236, and holding claw 237;
cleaning mechanism 3:
a positioning cylinder 31;
an outer sleeve 32;
a first side wall brush 33, a second side wall brush 34;
a jack-up rotation mechanism 35;
a brush mounting plate 36;
a top plate 37;
a top brush 38;
a main furnace chamber 400;
insulation layer 500: an upper heat insulating layer 501 and a middle heat insulating layer 502;
the transfer cart 600.
Detailed Description
In order that the above-recited objects, features and advantages of the present utility model will become more readily apparent, a more particular description of the utility model will be rendered by reference to the appended drawings and appended detailed description.
In order to preserve the temperature of the silicon liquid in the crucible, an annular heat-preserving layer is generally arranged between the crucible and the main furnace chamber. After the heat preservation layer is used for a long time, the heat preservation layer needs to be cleaned. At present, cleaning of the heat insulation layer is generally implemented in a manual operation mode, and the manual operation mode is low in safety and efficiency.
Therefore, the utility model provides a single crystal furnace cleaning device which is used for cleaning an insulating layer arranged in a main furnace chamber of a single crystal furnace.
As shown in fig. 1 to 5, the cleaning device for a single crystal furnace in the embodiment of the utility model includes a jacking device 1, a centering mechanism 2 and a cleaning mechanism 3, wherein:
the centering mechanism 2 is mounted on the driving end of the jacking device 1, and the cleaning mechanism 3 is mounted on a movable part of the centering mechanism 2.
The jacking device 1 is used for jacking the centering mechanism 2, so that the cleaning mechanism 3 enters the heat insulation layer 500. The centering mechanism 2 is used for centering the cleaning mechanism 3, so that the central axis of the cleaning mechanism 3 is aligned with the central axis of the heat insulation layer 500 within a preset error.
The cleaning mechanism 3 is used for cleaning the heat insulation layer 500.
The working process of the single crystal furnace cleaning device is as follows:
first, the present utility model is moved to the lower side of the main furnace chamber 400 from which the bottom of the furnace is removed.
Then, the main furnace chamber 400 is controlled to descend, and the jacking device 1 is controlled to jack upwards until the bottom of the main furnace chamber 400 abuts against the centering mechanism 2, and the cleaning mechanism 3 enters the heat insulation layer 500.
Next, the centering mechanism 2 is controlled to perform centering of the cleaning mechanism 3, and after the centering is completed, the cleaning mechanism 3 abuts against the inner wall of the heat insulating layer 500. That is, the alignment degree of the central axis and the central axis of the heat insulation layer 500 is limited by the fact that the cleaning mechanism 3 can be abutted against the inner wall of the heat insulation layer 500.
Finally, the cleaning mechanism 3 is controlled to clean the insulation layer 500.
Therefore, through the cooperation of the jacking device 1, the centering mechanism 2 and the cleaning mechanism 3, the automatic cleaning of the heat-insulating layer of the single crystal furnace is realized, so that the cleaning efficiency is improved, and the potential safety hazard is eliminated.
Optionally, the centering mechanism 2 comprises a pallet 21, a mounting plate 22 and a centering drive assembly 23, wherein: the mounting plate 22 is rotatably mounted on the supporting plate 21, the mounting plate 22 is fixedly connected with the driving end of the jacking device 1, and the cleaning mechanism 3 is mounted on the mounting plate 22. The mounting plate 22 is rotatable relative to the supporting plate 21, so that the cleaning mechanism 3 is driven to rotate, and the mounting plate 22 can also lift with the cleaning mechanism 3 under the driving of the jacking device 1. Alternatively, the mounting plate 22 is mounted on the pallet 21 by bearings.
The jacking device 1 can adopt jacking equipment such as a jacking cylinder, a jacking hydraulic cylinder and the like.
As shown in fig. 4 and 5, the centering driving assembly 23 includes a toothed disc 231, a toothed disc driving mechanism 232, three gears 233, three sliding grooves 234 and three sliding rails 235, wherein:
the fluted disc 231 is mounted on the mounting plate 22 and is in transmission connection with the driving end of the fluted disc driving mechanism 232, and the fluted disc driving mechanism 232 is used for driving the fluted disc 231 to rotate relative to the mounting plate 22.
Each gear 233 is mounted on mounting plate 22 and is engaged with toothed disk 231.
The sliding grooves 234 are fixedly arranged on the supporting plate 21, the sliding rails 235 are slidably arranged on the supporting plate 21 through the sliding grooves 234 and are correspondingly arranged with the gears 233, and each sliding rail 235 is provided with a rack 236 meshed with the corresponding gear 233.
When the centering operation of the cleaning mechanism 3 is required, the fluted disc 231 is driven to rotate by the fluted disc driving mechanism 232, and the fluted disc 231 drives the three gears 233 to synchronously rotate, so that the three sliding rails 235 are driven to slide towards the middle or slide around and separate. When the sliding rails 235 stretch out and draw back, touch is generated between the sliding rails 235 and the inner wall of the main furnace chamber of the single crystal furnace, the central position of the cleaning mechanism 3 is continuously adjusted by adjusting the stretching amount of the sliding rails 235 until the stretching amount of each sliding rail 235 enables each sliding rail 235 to be abutted to the inner wall of the main furnace chamber, and therefore the centering of the cleaning mechanism 3 is completed. Of course, in other embodiments, more than three other numbers of gears, runners and rails may be provided.
As shown in fig. 5, alternatively, the toothed disc driving mechanism 232 is a rotary rod, one end of the rotary rod is fixedly connected to the toothed disc 231 via a connecting block, and the other end of the rotary rod is an operation end. Pushing the rotating rod can manually drive the fluted disc 231 to rotate. Of course, other driving devices capable of automatically driving the toothed disc 231 to rotate may be used for the toothed disc driving mechanism 232.
As shown in fig. 2 and 4, optionally, the end of each slide rail 235 is provided with a holding claw 237, and the holding claw 237 is used for holding the bottom of the main furnace chamber 400. Of course, the holding claw 237 can move synchronously with the slide rail 235 during the sliding process of the slide rail 235.
As shown in fig. 3, an annular retainer ring 211 is provided at the edge of the pallet 21, and a plurality of buckles 212 are provided on the retainer ring 211. The retainer ring 211 is used for supporting the heat insulation layer 500, the buckle 212 is used for erecting the retainer ring 211 on the inner wall of the main furnace chamber 200, for example, a hook is arranged on the inner wall of the main furnace chamber 200, and the buckle 212 can be clamped into the hook, so that the support of the retainer ring 211 is realized.
After the retainer ring 211 is locked by the buckle 212, the supporting plate 21 is fixed on the inner wall of the main furnace chamber 200.
As shown in fig. 3 and 4, the cleaning mechanism 3 optionally includes a positioning cylinder 31, an outer sleeve 32, at least one sidewall brush, and a lift-up rotation mechanism 35, wherein:
the positioning cylinder 31 is mounted on the mounting plate 22. The outer sleeve 32 is movably sleeved on the outer side of the positioning cylinder 31 and is connected with a movable part of the jacking and rotating mechanism 35, and the side wall hairbrush is arranged on the outer wall of the outer sleeve 32.
After the centering mechanism 2 finishes centering the cleaning mechanism 3, the central axis of the positioning cylinder 31 is aligned with the central axis of the heat insulation layer 500 within a preset error, so that the side wall brush abuts against the inner wall of the heat insulation layer 500.
The jacking and rotating mechanism 35 is used for driving the outer sleeve 32 to lift relative to the positioning barrel 31 so as to drive the side wall brush to reach a preset cleaning height. The jacking and rotating mechanism 35 is further used for driving the outer sleeve 32 to rotate relative to the positioning barrel 31, so as to drive the side wall brushes to synchronously rotate to clean the heat insulation layer 500.
Alternatively, the jacking rotation mechanism 35 includes a jacking driving part and a rotation driving part, wherein the jacking driving part is mounted on the mounting plate 22, the rotation driving part is connected to a driving end of the rotation driving part, and the outer sleeve 32 is connected to a driving end of the rotation driving part. The lifting driving part is used for driving the outer sleeve 32 to lift relative to the positioning cylinder 31, and the rotating driving part is used for driving the outer sleeve 32 to rotate relative to the positioning cylinder 31.
The dimensions of the thermal insulation layer 500 are generally different for different types of single crystal furnaces. In order to ensure that the side wall brushes can be abutted on the inner walls of the heat preservation layers with different sizes. Optionally, a brush mounting plate 36 is disposed on the outer wall of the outer sleeve 32, an adjusting assembly is disposed on the brush mounting plate 36, and the sidewall brush is mounted on the adjusting assembly, and the adjusting assembly is used for adjusting the distance between the sidewall brush and the heat insulation layer 500.
The distance between the side wall hairbrush and the heat preservation layer is adjusted through the adjusting component, so that the side wall hairbrush can be enabled to be abutted against the inner wall of the heat preservation layer, the heat preservation layers with different sizes can be cleaned, and compatibility of the heat preservation layer cleaning machine is improved.
The common heat preservation comprises an upper heat preservation layer, a middle heat preservation layer and a lower heat preservation layer which are sequentially arranged from top to bottom, wherein the lower heat preservation layer is fixed on the furnace bottom, and the lower heat preservation layer is removed along with the furnace bottom before cleaning. Thus, as shown in fig. 1, the insulation 500 to be cleaned by the present utility model includes an upper insulation 501 and an insulation 502. However, the diameters of the inner cavities of the upper thermal insulation layer 501 and the thermal insulation layer 502 are not equal. For example, as shown in fig. 1, the diameter of the inner cavity of the upper thermal insulation layer 501 is smaller than the diameter of the inner cavity of the middle thermal insulation layer 502.
Therefore, in order to ensure that the sidewall brushes can meet the cleaning requirements for both the upper insulation layer 501 and the middle insulation layer 502. As shown in fig. 3, optionally, each side wall brush includes a first side wall brush 33 and a second side wall brush 34, the first side wall brush 33 and the second side wall brush 34 being mounted on a brush mounting plate 36, respectively, by an adjustment assembly configured to individually adjust the spacing between the first side wall brush 33 and the second side wall brush 34 and the insulation layer. In this way, the first side wall brush 33 and the second side wall brush 34 are respectively abutted against the inner walls of the heat insulation layer 502 and the upper heat insulation layer 501.
In the process of cleaning the heat preservation, a large amount of dust can fall down in the heat preservation, so as to remove the dust in time, and prevent the dust from causing secondary pollution to the heat preservation and other parts in the furnace. Optionally, a dust removing port is formed on the supporting plate 21, and the cleaning device for the single crystal furnace further comprises a dust extracting mechanism, wherein the dust extracting port of the dust extracting mechanism is connected with the dust removing port. The dust extraction mechanism is started, so that the cleaned dust in the heat preservation layer can be timely extracted.
Optionally, as shown in fig. 3, the cleaning mechanism 3 in the embodiment of the present utility model further includes a top plate 37, the top plate 37 is fixedly disposed at the top end of the outer sleeve 32, an annular top brush 38 is disposed at the peripheral edge of the top plate 37, and the top brush 38 abuts against the top of the heat insulation layer. Through setting up roof 37 and top brush 38, realized sheltering from the heat preservation inner space, prevent the dust escape from the top of heat preservation under the clearance, cause the pollution to the surrounding environment.
In some embodiments, the single crystal furnace cleaning device of the present utility model further includes a transfer trolley 600, the jacking device is disposed on the transfer trolley 600, and the transfer trolley 600 is used for assisting the single crystal furnace cleaning device to disassemble the thermal insulation layer 500. Can be used for disassembling and assembling the heat insulation layer into the main furnace chamber 400 in cooperation with the hoisting equipment. The process of disassembling the heat preservation layer by the single crystal furnace cleaning device matched with the hoisting equipment is as follows:
the lifting device moves the main furnace chamber from which the furnace bottom is removed to the upper part of the utility model.
The lifting device drives the main furnace chamber 400 to descend, and the jacking device 1 jacks up until the bottom of the main furnace chamber 400 is abutted on the centering mechanism 2, and the buckle 212 is clamped on a hook on the furnace wall.
The centering mechanism 2 completes centering of the cleaning mechanism 3 so that the cleaning mechanism 3 lifts the heat insulating layer 500.
The hoisting mechanism hoistes the main furnace chamber to rotate for a certain angle, so that the buckle is separated from the hook on the furnace wall. The lifting mechanism drives the main furnace chamber 400 to rise until the heat preservation layer 500 is completely separated from the main furnace chamber 400.
The transfer cart 600 carries the insulation 500 to one side, and the insulation 500 is removed from the main furnace chamber 400.
The process of installing the heat preservation layer by the single crystal furnace cleaning device matched with the hoisting equipment is as follows:
the transfer cart 600 carries the insulation 500 to just below the main furnace chamber 400.
The lifting device drives the main furnace chamber 400 to descend, the jacking device 1 jacks up until the bottom of the main furnace chamber 400 is abutted on the centering mechanism 2, the buckle 212 is clamped on a hook on the furnace wall, and the installation of the heat insulation layer 500 is completed.
The utility model has been described above in sufficient detail with a certain degree of particularity. It will be appreciated by those of ordinary skill in the art that the descriptions of the embodiments are merely exemplary and that all changes that come within the true spirit and scope of the utility model are desired to be protected. The scope of the utility model is indicated by the appended claims rather than by the foregoing description of the embodiments.
Claims (10)
1. The utility model provides a single crystal growing furnace cleaning device which characterized in that, single crystal growing furnace cleaning device is used for the clearance to install at the heat preservation in the main furnace chamber of single crystal growing furnace, including jacking device, centering mechanism and cleaning mechanism, wherein:
the centering mechanism is arranged at the driving end of the jacking device, and the cleaning mechanism is arranged on a movable part of the centering mechanism;
the jacking device is used for jacking the centering mechanism so that the cleaning mechanism enters the heat insulation layer; the centering mechanism is used for centering the cleaning mechanism, so that the central axis of the cleaning mechanism is aligned with the central axis of the heat insulation layer within a preset error;
the cleaning mechanism is used for cleaning the heat insulation layer.
2. The single crystal furnace cleaning apparatus of claim 1, wherein the centering mechanism comprises a pallet, a mounting plate, and a centering drive assembly, wherein:
the mounting plate is rotatably mounted on the supporting plate, the mounting plate is fixedly connected with the driving end of the jacking device, and the cleaning mechanism is mounted on the mounting plate;
the centering driving assembly comprises a fluted disc, a fluted disc driving mechanism, N gears, N sliding grooves and N sliding rails, wherein:
the fluted disc is arranged on the mounting plate and is in transmission connection with the driving end of the fluted disc driving mechanism, and the fluted disc driving mechanism is used for driving the fluted disc to rotate relative to the mounting plate;
each gear is arranged on the mounting plate and meshed with the fluted disc;
the sliding grooves are fixedly formed in the supporting plate, the sliding rails are slidably mounted on the supporting plate through the sliding grooves and are correspondingly arranged with the gears, and racks meshed with the corresponding gears are arranged on each sliding rail.
3. The single crystal furnace cleaning apparatus of claim 2, wherein each of the slide rails is provided with a holding claw at an end portion thereof for holding a bottom portion of the main furnace chamber.
4. The single crystal furnace cleaning device according to claim 2, wherein an annular supporting ring is arranged at the edge of the supporting plate, and a plurality of buckles are arranged on the supporting ring;
the retainer ring is used for supporting the heat insulation layer, and the buckle is used for erecting the retainer ring on the inner wall of the main furnace chamber.
5. The single crystal furnace cleaning apparatus of claim 2, wherein the cleaning mechanism comprises a positioning barrel, an outer sleeve, at least one sidewall brush, and a jacking rotation mechanism, wherein:
the positioning cylinder is arranged on the mounting plate;
the outer sleeve is movably sleeved on the outer side of the positioning cylinder and connected with the movable part of the jacking and rotating mechanism, and the side wall hairbrush is arranged on the outer wall of the outer sleeve;
the jacking and rotating mechanism is used for driving the outer sleeve to lift relative to the positioning cylinder so as to drive the side wall hairbrush to reach a preset cleaning height;
the jacking and rotating mechanism is also used for driving the outer sleeve to rotate relative to the positioning cylinder so as to drive the side wall hairbrush to synchronously rotate to clean the heat insulation layer.
6. The single crystal furnace cleaning apparatus of claim 5, wherein a brush mounting plate is provided on an outer wall of the outer sleeve, an adjusting assembly is provided on the brush mounting plate, the side wall brush is mounted on the adjusting assembly, and the adjusting assembly is used for adjusting a distance between the side wall brush and the heat preservation layer.
7. The single crystal furnace cleaning apparatus of claim 6, wherein each of the sidewall brushes comprises a first sidewall brush and a second sidewall brush, the first sidewall brush and the second sidewall brush are mounted on the brush mounting plate by the adjustment assembly, respectively, the adjustment assembly being configured to individually adjust a spacing between the first sidewall brush and the second sidewall brush and the thermal insulation layer.
8. The single crystal furnace cleaning device of claim 2, wherein the supporting plate is provided with a dust removing opening, the single crystal furnace cleaning device further comprises a dust extraction mechanism, and the dust extraction opening of the dust extraction mechanism is connected with the dust removing opening.
9. The single crystal furnace cleaning apparatus of claim 5, wherein the cleaning mechanism further comprises a top plate fixedly arranged at the top end of the outer sleeve, an annular top brush is arranged at the peripheral edge of the top plate, and the top brush is abutted against the heat insulation layer.
10. The single crystal furnace cleaning apparatus of any one of claims 1-9, further comprising a transfer trolley, wherein the jacking device is disposed on the transfer trolley, and wherein the transfer trolley is configured to assist the single crystal furnace cleaning apparatus in removing the thermal insulation layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320052125.3U CN218969426U (en) | 2023-01-09 | 2023-01-09 | Single crystal furnace cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320052125.3U CN218969426U (en) | 2023-01-09 | 2023-01-09 | Single crystal furnace cleaning device |
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| Publication Number | Publication Date |
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| CN218969426U true CN218969426U (en) | 2023-05-05 |
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ID=86161292
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202320052125.3U Active CN218969426U (en) | 2023-01-09 | 2023-01-09 | Single crystal furnace cleaning device |
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| Country | Link |
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| CN (1) | CN218969426U (en) |
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2023
- 2023-01-09 CN CN202320052125.3U patent/CN218969426U/en active Active
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