CN218957670U - Transmission cavity and coating equipment - Google Patents

Transmission cavity and coating equipment Download PDF

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Publication number
CN218957670U
CN218957670U CN202223447911.8U CN202223447911U CN218957670U CN 218957670 U CN218957670 U CN 218957670U CN 202223447911 U CN202223447911 U CN 202223447911U CN 218957670 U CN218957670 U CN 218957670U
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infrared spectrum
transmission cavity
spectrum detector
wafer
transmission
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CN202223447911.8U
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Chinese (zh)
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黄勇
谭华强
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Tuojing Technology Shanghai Co ltd
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Tuojing Technology Shanghai Co ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Abstract

The utility model provides a transmission cavity and coating equipment, and relates to the technical field of coating equipment, wherein the transmission cavity comprises a transmission cavity body, a transmission mechanism and an infrared spectrum detector; the transmission mechanism and the infrared spectrum detector are both arranged in the transmission cavity; the transfer mechanism is capable of transferring a wafer under the infrared spectrum detector. After the thin film deposition of the wafer is completed in the deposition cavity, the wafer is taken out into the transmission cavity from the deposition cavity by the vacuum mechanical arm, and the wafer can be transmitted to the lower part of the infrared spectrum detector by the vacuum mechanical arm, so that the wafer stays below the infrared spectrum detector, the thin film performance on the wafer can be detected by the infrared spectrum detector, and the thin film performance can be obtained by the wafer in the transmission cavity, and the film coating effect can be fed back in time. Moreover, the wafer is subjected to film performance detection in the vacuum environment in the transmission cavity, so that the pollution to the film can be effectively reduced.

Description

Transmission cavity and coating equipment
Technical Field
The utility model relates to the technical field of coating equipment, in particular to a transmission cavity and coating equipment.
Background
In semiconductor manufacturing processes, it is often necessary to coat a wafer using a coating apparatus.
The coating equipment comprises a transmission cavity (TM) and a deposition cavity (PM), wherein a vacuum manipulator is arranged in the transmission cavity and can transfer wafers between the transmission cavity and the deposition cavity.
After the deposition process of the wafer is completed in the deposition cavity, the performance of the film on the wafer cannot be obtained before the wafer is taken out of the film plating equipment, so that the film plating effect cannot be judged in time.
Disclosure of Invention
The utility model aims to provide a transmission cavity so as to solve the technical problem that the coating effect cannot be judged in time in the prior art.
The transmission cavity comprises a transmission cavity body, a transmission mechanism and an infrared spectrum detector;
the transmission mechanism and the infrared spectrum detector are both arranged in the transmission cavity; the transfer mechanism is capable of transferring a wafer under the infrared spectrum detector.
Further, the infrared spectrum detector is slidably connected with the transmission cavity, and the infrared spectrum detector can slide relative to the transmission cavity along the horizontal direction.
Further, the transmission cavity further comprises a sliding mechanism;
the sliding mechanism comprises a sliding rail and a sliding piece; the sliding rail is arranged in the transmission cavity, the sliding piece is in sliding connection with the sliding rail, and the infrared spectrum detector is connected with the sliding piece.
Further, the sliding piece is a magnetic coupling sliding piece.
Further, the sliding mechanism further comprises a driving piece; the driving piece is connected with the sliding piece, and the driving piece can drive the sliding piece to slide along the sliding rail.
Further, the infrared spectrum detector is detachably connected with the slider.
Further, the slide rail is detachably connected with the transmission cavity.
Further, the infrared spectrum detector is connected with the top surface of the transmission cavity.
Further, the infrared spectrum detectors and the transmission mechanisms are multiple, and the infrared spectrum detectors and the transmission mechanisms are arranged in one-to-one correspondence.
The utility model also aims to provide a coating device which comprises the transmission cavity provided by the utility model.
The transmission cavity comprises a transmission cavity body, a transmission mechanism and an infrared spectrum detector; the transmission mechanism and the infrared spectrum detector are both arranged in the transmission cavity; the transfer mechanism is capable of transferring a wafer under the infrared spectrum detector. After the thin film deposition of the wafer is completed in the deposition cavity, the wafer is taken out into the transmission cavity from the deposition cavity by the vacuum mechanical arm, and the wafer can be transmitted to the lower part of the infrared spectrum detector by the vacuum mechanical arm, so that the wafer stays below the infrared spectrum detector, the thin film performance on the wafer can be detected by the infrared spectrum detector, and the thin film performance can be obtained by the wafer in the transmission cavity, and the film coating effect can be fed back in time. Moreover, the wafer is subjected to film performance detection in the vacuum environment in the transmission cavity, so that the pollution to the film can be effectively reduced.
Drawings
In order to more clearly illustrate the embodiments of the present utility model or the technical solutions in the prior art, the drawings that are needed in the description of the embodiments or the prior art will be briefly described, and it is obvious that the drawings in the description below are some embodiments of the present utility model, and other drawings can be obtained according to the drawings without inventive effort for a person skilled in the art.
FIG. 1 is a cross-sectional view of a transfer chamber provided in an embodiment of the present utility model;
fig. 2 is a top view of a transfer chamber provided in an embodiment of the present utility model.
Icon: 1-a transmission cavity; 2-a transmission mechanism; a 3-infrared spectrum detector; 4-wafer; 5-sliding rails; 6-slide.
Detailed Description
The following description of the embodiments of the present utility model will be made apparent and fully in view of the accompanying drawings, in which some, but not all embodiments of the utility model are shown. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
In the description of the present utility model, it should be noted that, if terms such as "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like are used, the indicated orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, only for convenience of describing the present utility model and simplifying the description, and does not indicate or imply that the indicated apparatus or element must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present utility model. Furthermore, the terms "first," "second," and the like, as used herein, are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. Wherein the terms "first position" and "second position" are two different positions.
In the description of the present utility model, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present utility model will be understood in specific cases by those of ordinary skill in the art.
The utility model provides a transmission cavity and coating equipment, and a plurality of embodiments are provided below to describe the transmission cavity and the coating equipment in detail.
Example 1
The transmission cavity provided by the embodiment, as shown in fig. 1 to 2, comprises a transmission cavity body 1, a transmission mechanism 2 and an infrared spectrum detector 3; the transmission mechanism 2 and the infrared spectrum detector 3 are both arranged in the transmission cavity 1; the transfer mechanism 2 is capable of transferring the wafer 4 under the infrared spectrum detector 3.
The conveying mechanism 2 can convey the wafer 4 between the deposition cavity and the conveying cavity and drive the wafer 4 to move in the conveying cavity. In this embodiment, the transmission mechanism 2 is a vacuum manipulator, and the vacuum manipulator can drive the wafer 4 to move along a vertical direction, move along a first direction and move along a second direction, wherein the first direction and the second direction are both set along a horizontal direction, and the first direction is perpendicular to the second direction.
After the thin film deposition of the wafer 4 is completed in the deposition cavity, the wafer 4 is taken out into the transmission cavity 1 from the deposition cavity by the vacuum mechanical arm, and the wafer 4 can be transmitted to the lower part of the infrared spectrum detector 3 by the vacuum mechanical arm, so that the wafer 4 stays below the infrared spectrum detector 3, the thin film performance on the wafer 4 can be detected by the infrared spectrum detector 3, and the thin film performance can be obtained by the wafer 4 in the transmission cavity, and the film coating effect can be fed back timely.
Moreover, if the wafer 4 is taken out of the film plating apparatus for film performance inspection, the wafer 4 leaves the vacuum environment, which may cause film contamination on the wafer 4. According to the transmission cavity provided by the embodiment, the wafer 4 is subjected to film performance detection in the vacuum environment in the transmission cavity, so that the pollution to the film can be effectively reduced.
In addition, the transmission cavity provided by the embodiment is provided with the infrared spectrum detector 3 in the transmission cavity 1, so that the structure is simple, the modification to the original transmission cavity 1 is small, and the manufacturing is easy.
The infrared spectrum detector 3 may be an infrared spectrometer or any suitable form such as an infrared spectrum sensor.
The infrared spectrum detector 3 can test the infrared spectrum of the film on the wafer 4, compare the infrared spectrum obtained by the test with the standard infrared spectrum, and judge the similarity and purity of the two compounds according to the consistency of the characteristics such as spectrum peak position, wave number, peak shape and the like, thereby judging the flowability of the film.
The infrared spectrum detector 3 may be fixedly connected with the transmission cavity 1, after the infrared spectrum detector 3 is fixed at a suitable position, the wafer 4 may be driven by the vacuum manipulator to be transmitted below the infrared spectrum detector 3, in the detection process, after the detection of the first detection position is completed, the wafer 4 may be driven by the manipulator to move along the first direction or the second direction relative to the infrared spectrum detector 3, so that other multiple positions of the thin film on the wafer 4 may be detected.
Further, the infrared spectrum detector 3 is slidably connected to the transmission cavity 1, and the infrared spectrum detector 3 can slide in the horizontal direction with respect to the transmission cavity 1.
In this embodiment, the infrared spectrum detector 3 can slide along the first direction, and in the detection process, after the detection of the first detection position is completed, the wafer 4 can be driven by the manipulator to move along the second direction relative to the infrared spectrum detector 3, and the infrared spectrum detector 3 moves along the first direction, so that the infrared spectrum detector 3 and the manipulator cooperate to measure infrared spectra of a plurality of position points on the thin film on the wafer 4.
The first direction is indicated by an arrow ab in fig. 2, and the second direction is indicated by an arrow cd in fig. 2.
Wherein, infrared spectrum detector 3 and transmission cavity 1 sliding connection can set up the spout on the internal surface of transmission cavity 1, infrared spectrum detector 3 and spout sliding connection.
In this embodiment, the transmission cavity further includes a sliding mechanism; the sliding mechanism comprises a sliding rail 5 and a sliding piece 6; the slide rail 5 sets up in transmission cavity 1, and slider 6 and slide rail 5 sliding connection, infrared spectrum detector 3 are connected with slider 6.
The extending direction of the sliding rail 5 is set along the first direction, and the sliding piece 6 can slide along the sliding rail 5, so that the infrared spectrum detector 3 is driven to slide along the sliding rail 5.
The slider 6 may have a block shape or any suitable form such as a plate shape.
In order to drive the slide 6 to slide along the slide rail 5, in one embodiment the slide 6 may be a magnetically coupled slide that is capable of sliding on the slide rail 5 under the influence of magnetic force.
In another embodiment, the sliding mechanism further comprises a driver; the driving member is connected with the sliding member 6, and the driving member can drive the sliding member 6 to slide along the sliding rail 5.
The driving member may be in any suitable form such as an electric push rod, an electromagnet or a cylinder. The extension and retraction of the driving member can drive the sliding member 6 to slide along the sliding rail 5.
The infrared spectrum detector 3 may be fixedly connected to the slide 6, for example welded or glued; or may be detachably connected to the sliding member 6, for example, by a clamping connection or a threaded connection, so that the infrared spectrum detector 3 can be conveniently detached from the sliding member 6.
The slide rail 5 can be fixedly connected with the transmission cavity, for example welded or glued; and the sliding rail 5 can be detachably connected with the transmission cavity 1, such as clamping or threaded connection, and can be conveniently detached from the sliding piece 6.
The infrared spectrum detector 3 may be connected to the side wall of the transmission cavity 1 or may be connected to the top surface of the transmission cavity 1.
In this embodiment, slide rail 5 is connected on the top surface of transmission cavity 1, and infrared spectrum detector 3 is connected with slide rail 5 through slider 6, is connected infrared spectrum detector 3 with the top surface of transmission cavity 1, can be convenient for arrange infrared spectrum detector 3, reduces the structural modification in transmission cavity 1 other positions.
Further, the infrared spectrum detectors 3 and the transmission mechanisms 2 are multiple, and the infrared spectrum detectors 3 and the transmission mechanisms 2 are arranged in a one-to-one correspondence.
Specifically, the number of the transfer mechanisms 2 is plural, the plural transfer mechanisms 2 are arranged at intervals, and each transfer mechanism 2 can transfer the wafer 4 between the deposition chamber and the transfer chamber corresponding to the transfer mechanism 2; and each transport mechanism 2 is capable of transporting a wafer 4 under its corresponding infrared spectrum detector 3.
In this embodiment, the plurality of transmission mechanisms 2 are arranged at intervals along the first direction, the plurality of infrared spectrum detectors 3 are arranged at intervals along the first direction, and the plurality of infrared spectrum detectors 3 are arranged in one-to-one correspondence with the plurality of transmission mechanisms 2.
Example 2
The coating equipment provided by the embodiment comprises the transmission cavity provided by the embodiment 1. After the thin film deposition of the wafer 4 is completed in the deposition cavity, the wafer 4 is taken out into the transmission cavity 1 from the deposition cavity by the vacuum mechanical arm, and the wafer 4 can be transmitted to the lower part of the infrared spectrum detector 3 by the vacuum mechanical arm, so that the wafer 4 stays below the infrared spectrum detector 3, the thin film performance on the wafer 4 can be detected by the infrared spectrum detector 3, and the thin film performance can be obtained by the wafer 4 in the transmission cavity, and the film coating effect can be fed back timely.
Moreover, if the wafer 4 is taken out of the film plating apparatus for film performance inspection, the wafer 4 leaves the vacuum environment, which may cause film contamination on the wafer 4. According to the film plating equipment provided by the embodiment, the wafer 4 is subjected to film performance detection in the vacuum environment in the transmission cavity, so that the pollution of the film can be effectively reduced.
In addition, the coating equipment provided by the embodiment is provided with the infrared spectrum detector 3 in the transmission cavity 1, so that the structure is simple, the modification to the original transmission cavity 1 is small, and the manufacturing is easy.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present utility model, and not for limiting the same; although the utility model has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some or all of the technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit of the utility model.

Claims (10)

1. A transmission cavity is characterized by comprising a transmission cavity body (1), a transmission mechanism (2) and an infrared spectrum detector (3);
the transmission mechanism (2) and the infrared spectrum detector (3) are both arranged in the transmission cavity (1); the transfer mechanism (2) is capable of transferring a wafer (4) to below the infrared spectrum detector (3).
2. The transmission chamber according to claim 1, characterized in that the infrared spectrum detector (3) is slidingly connected to the transmission chamber (1), the infrared spectrum detector (3) being slidable in a horizontal direction with respect to the transmission chamber (1).
3. The transfer chamber of claim 2, wherein the transfer chamber further comprises a sliding mechanism;
the sliding mechanism comprises a sliding rail (5) and a sliding piece (6); the sliding rail (5) is arranged in the transmission cavity (1), the sliding piece (6) is in sliding connection with the sliding rail (5), and the infrared spectrum detector (3) is connected with the sliding piece (6).
4. A transfer chamber according to claim 3, characterized in that the slide (6) is a magnetically coupled slide.
5. A transfer chamber according to claim 3, wherein the slide mechanism further comprises a drive member; the driving piece is connected with the sliding piece (6), and the driving piece can drive the sliding piece (6) to slide along the sliding rail (5).
6. A transmission chamber according to claim 3, characterized in that the infrared spectrum detector (3) is detachably connected to the slide (6).
7. A transfer chamber according to claim 3, characterized in that the slide rail (5) is detachably connected with the transfer chamber (1).
8. The transmission cavity according to any of the claims 1-7, characterized in that the infrared spectrum detector (3) is connected to the top surface of the transmission cavity (1).
9. The transmission cavity according to any one of claims 1 to 7, wherein the infrared spectrum detector (3) and the transmission mechanism (2) are plural, and the plural infrared spectrum detectors (3) are arranged in one-to-one correspondence with the plural transmission mechanisms (2).
10. A coating apparatus comprising a transfer chamber according to any one of claims 1 to 9.
CN202223447911.8U 2022-12-22 2022-12-22 Transmission cavity and coating equipment Active CN218957670U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202223447911.8U CN218957670U (en) 2022-12-22 2022-12-22 Transmission cavity and coating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202223447911.8U CN218957670U (en) 2022-12-22 2022-12-22 Transmission cavity and coating equipment

Publications (1)

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CN218957670U true CN218957670U (en) 2023-05-02

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118326348A (en) * 2024-06-13 2024-07-12 常州市好利莱光电科技有限公司 Wafer vacuum sputtering coating device and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118326348A (en) * 2024-06-13 2024-07-12 常州市好利莱光电科技有限公司 Wafer vacuum sputtering coating device and method

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