CN218951475U - High-precision evaporation counterpoint system and evaporation equipment - Google Patents

High-precision evaporation counterpoint system and evaporation equipment Download PDF

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CN218951475U
CN218951475U CN202223471261.0U CN202223471261U CN218951475U CN 218951475 U CN218951475 U CN 218951475U CN 202223471261 U CN202223471261 U CN 202223471261U CN 218951475 U CN218951475 U CN 218951475U
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glass substrate
vapor deposition
mask plate
electrostatic
precision
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李有亮
奉洛阳
丁威
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Chengdu Junchuang Technology Co ltd
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Chengdu Junchuang Technology Co ltd
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Abstract

The application discloses high accuracy evaporation counterpoint system and evaporation equipment, include: a glass substrate support frame for supporting an edge portion of a glass substrate to form an upper vapor deposition region in a middle portion of the glass substrate; the mask plate supporting frame supports the edge part of the metal mask plate so as to form a lower evaporation area in the middle of the metal mask plate; the upper part of the glass substrate supporting frame is provided with: an electrostatic adsorption device for adsorbing the glass substrate to planarize the upper vapor deposition region; the magnetic adsorption device is used for adsorbing the metal mask plate so as to level the lower evaporation area; wherein the electrostatic adsorption device and the magnetic adsorption device are configured so that the glass substrate and the metal mask plate are kept flatly attached in the evaporation process. The high-precision vapor deposition alignment system and the vapor deposition equipment can improve the alignment precision in the vapor deposition process.

Description

High-precision evaporation counterpoint system and evaporation equipment
Technical Field
The application relates to the technical field of vapor deposition processing, in particular to a high-precision vapor deposition alignment system and vapor deposition equipment.
Background
With the rapid development of society, the OLED panel is widely applied to the fields of communication products, consumer electronic products, instruments and meters and the like. The evaporation process is used as a core process in the OLED panel display industry, plays a decisive role in the production yield of the whole panel, is used as core equipment of the evaporation process, and is further used as core equipment in the panel industry, and can be divided into three systems, namely an evaporation source system, an ultrahigh vacuum system and an alignment system, wherein the alignment system has the most technical content.
In the vapor deposition process of the OLED, a special vapor deposition device is required, that is, a crucible containing a material is placed in a vacuum-tight chamber, and after the crucible is placed in a heating source, the material is heated and evaporated, and deposited at a specific position on a glass substrate after passing through a mask plate. Before the material is deposited on the glass substrate, the mask plate and the glass substrate need to be subjected to mark alignment, the purpose of alignment is to align a specific position on the glass substrate with the opening position of the mask plate, the alignment precision is in the order of 20um, the alignment precision is critical to the product, and the main factor influencing the alignment precision is sagging of the glass substrate and the mask plate due to gravity. The traditional solution is to design the magnetic plate directly over the glass substrate, because the material of the mask plate mainly uses alloy, the magnetic field of the magnetic plate can produce the magnetic attraction effect on the mask plate through glass, so that the mask plate can be attracted to be flat, then the mask plate is moved upwards, and then the glass is lifted to be flat through the attracted mask plate. However, in this process, the process materials attached to the surfaces of the mask plate and the glass substrate inevitably scratch, which can cause dust particles to be generated on the glass substrate and cause poor structure on the product surface.
Disclosure of Invention
The application provides a high accuracy evaporation counterpoint system and evaporation equipment can guarantee the counterpoint precision of glass substrate and mask plate in the evaporation technology and promote product quality simultaneously.
In a first aspect, the present application provides a high accuracy evaporation counterpoint system, it is used for the production processing of screen assembly, and it includes:
a glass substrate support frame for supporting an edge portion of a glass substrate to form an upper vapor deposition region in a middle portion of the glass substrate; and
the mask plate support frame supports the edge part of the metal mask plate so as to form a lower evaporation zone in the middle part of the metal mask plate;
the upper part of the glass substrate supporting frame is provided with:
an electrostatic adsorption device for adsorbing the glass substrate to planarize the upper vapor deposition region; and
the magnetic adsorption device is used for adsorbing the metal mask plate so as to level the lower evaporation area;
wherein the electrostatic adsorption device and the magnetic adsorption device are configured so that the glass substrate and the metal mask plate are kept flatly attached in the evaporation process.
Through adopting above-mentioned technical scheme, can overcome the gravity of glass self through electrostatic adsorption power, inhale the flat with glass, can permeate glass substrate through the magnetic field that magnetic adsorption device produced simultaneously and act on the metal mask plate for the mask plate is horizontal, can avoid mask plate and glass substrate to be because the technical problem of the counterpoint precision that self gravity sags caused like this in counterpoint in-process, simultaneously because glass substrate and mask plate are the horizontality, eliminated the friction of both in the counterpoint in-process, effectively eliminated the product bad.
Further, a cooling element is arranged between the electrostatic adsorption device and the magnetic adsorption device.
By adopting the technical scheme, the purpose of the cooling piece is to cool the glass substrate, so that the glass substrate is prevented from generating thermal expansion due to the influence of high-temperature process gas, and the alignment precision is prevented from being influenced.
In a further development, the cooling element is provided with cooling channels for circulating a cooling medium.
By adopting the technical scheme, the cooling is more uniform, and the cooling effect is better.
Further, the magnetic attraction device is arranged at one side of the surface away from the electrostatic attraction device for attracting the glass substrate, and the magnetic attraction force generated by the magnetic attraction device is used for penetrating through the electrostatic attraction device and the glass substrate to enable the mask plate to be closely attached to the glass substrate.
By adopting the technical scheme, the magnetic adsorption device is easy to arrange in structure, and the magnetic adsorption device and the electrostatic adsorption device can exert attraction force respectively and are not mutually interfered.
In a further scheme, the electrostatic adsorption devices and the magnetic adsorption devices are arranged in a staggered manner.
By adopting the technical scheme, the electrostatic attraction force and the magnetic attraction force are uniformly distributed, so that the attraction force of the glass substrate and the mask plate is staggered, the overlap of the force of the glass substrate and the mask plate is reduced, and the uniformity and the flatness of the lamination of the glass substrate and the mask plate are improved.
Further, the electrostatic adsorption device is arranged in a crisscross grid structure, and the magnetic adsorption device is arranged so as not to overlap with the electrostatic adsorption device in the projection direction of the surface of the glass substrate adsorbed by the electrostatic adsorption device.
Through adopting above-mentioned technical scheme, electrostatic adsorption device and magnetism adsorption device structure are regular, and the processing of being convenient for also is convenient for assemble.
Further, the magnetic attraction device is provided on one side or the opposite side of the surface of the glass substrate attracted by the electrostatic attraction device.
Through adopting above-mentioned technical scheme, magnetic adsorption device can overlap the setting with electrostatic adsorption device, also can magnetic adsorption device and electrostatic adsorption device embedding set up, can be according to actual need, and the setting mode is nimble changeable.
Further, the electrostatic adsorption device comprises at least two electrostatic adsorption parts, at least one of which is connected with the positive electrode and at least one of which is connected with the negative electrode.
By adopting the technical scheme, the electrostatic charges generated by the two electrodes are more convenient to adsorb, and the static electricity is also convenient to eliminate after processing.
Further, an insulating member is provided between the adjacent electrostatic adsorbing members connected to the different electrodes.
By adopting the technical scheme, the safety and reliability of the electrification of the two electrodes can be realized, and the electrostatic attraction of the respective electrodes is ensured.
In a second aspect, the application further provides an evaporation device, which comprises the high-precision evaporation alignment system.
By adopting the technical scheme, the vapor deposition equipment has high alignment precision, the quality influence of alignment on the glass substrate is small, and the product quality of vapor deposition is ensured.
In summary, the present application has at least one of the following beneficial technical effects:
1. the high-precision evaporation alignment system can avoid the technical problem of alignment precision of the mask plate and the glass substrate due to self gravity sagging in the alignment process.
2. According to the high-precision evaporation counterpoint system, as the glass substrate and the mask plate are in a horizontal state during counterpoint, friction between the glass substrate and the mask plate during counterpoint is eliminated, and product defects are effectively eliminated.
3. According to the high-precision evaporation alignment system, the cooling piece cools the glass substrate, so that the glass substrate is prevented from being influenced by high-temperature process gas, thermal expansion is generated, and alignment precision is influenced.
4. The evaporation equipment is high in alignment precision, small in quality influence on the glass substrate, and ensures the quality of evaporation products.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the following brief description of the drawings of the embodiments will make it apparent that the drawings in the following description relate only to some embodiments of the present utility model and are not limiting of the present utility model.
FIG. 1 is a schematic diagram of a high-precision vapor deposition alignment system according to an embodiment of the present application;
FIG. 2 is a schematic structural diagram of a high-precision vapor deposition alignment system according to an embodiment of the present application after adsorption;
FIG. 3 is a schematic diagram of a second embodiment of a high-precision vapor deposition alignment system according to the present disclosure;
FIG. 4 is a schematic diagram illustrating an assembly of a second electrostatic chuck, a magnetic chuck, and a cooling member in accordance with an embodiment of the high-precision vapor deposition alignment system of the present application;
FIG. 5 is a top view of a second embodiment of a high precision vapor deposition alignment system of the present application after assembly of an electrostatic chuck, a magnetic chuck, and a cooling member;
fig. 6 is an exploded view of fig. 5.
Reference numerals:
1. a mask plate; 2. mask plate supporting frame; 3. a glass substrate; 4. a glass substrate support frame; 5. an electrostatic adsorption device; 51. a first suction cup; 52. a second suction cup; 53. an insulating member; 6. a cooling member; 61. an inlet; 62. an outlet; 63. a cooling channel; 7. a magnetic adsorption device; 8. and a power supply.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present utility model more apparent, the present utility model will be described in further detail with reference to the accompanying drawings. The components of the embodiments of the present utility model generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
It should be noted that: like reference numerals and letters denote like items in the following figures, and thus once an item is defined in one figure, no further definition or explanation thereof is necessary in the following figures.
Unless defined otherwise, technical or scientific terms used in this patent document should be given the ordinary meaning as understood by one of ordinary skill in the art to which this utility model belongs. The terms "first," "second," and the like in the description and in the claims, do not denote any order, quantity, or importance, but rather are used to distinguish one element from another. Likewise, the terms "a," "an," or "the" and similar terms do not denote a limitation of quantity, but rather denote the presence of at least one. The words "curved surface screen fitting tool includes" or "curved surface screen fitting tool contains" and the like mean that the elements or objects appearing in front of "curved surface screen fitting tool includes" or "curved surface screen fitting tool contains" are covered by the elements or objects listed in back of "curved surface screen fitting tool includes" or "curved surface screen fitting tool contains" and equivalents thereof, and do not exclude other elements or objects. "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. are used merely to denote relative positional relationships, which may be changed accordingly when the absolute position of the object being described is changed, merely to facilitate description of the present utility model and to simplify description, and not to indicate or imply that the apparatus or elements being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the utility model.
In the description of the present utility model, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present utility model will be understood in specific cases by those of ordinary skill in the art.
Some embodiments of the present utility model are described in detail below with reference to the accompanying drawings. Features of the embodiments described below may be combined with each other without conflict.
Example 1
Referring to fig. 1, a schematic structure of a high-precision vapor deposition alignment system before adsorption is shown, which is used for manufacturing screen components, and the high-precision vapor deposition alignment system comprises a glass substrate support frame 4, a mask plate support frame 2, an adsorption component, a glass substrate 3 and a mask plate 1. The glass substrate support 4 supports an edge portion of the glass substrate 3 to form an upper vapor deposition region in a middle portion of the glass substrate 3. The mask plate support frame 2 supports the edge part of the metal mask plate 1 so as to form a lower evaporation zone in the middle part of the metal mask plate 1. The adsorption component comprises an electrostatic adsorption device 5, a cooling piece 6 and a magnetic adsorption device 7 which are sequentially connected, wherein the outer end of the cooling piece 6 is connected with an inlet 61 and an outlet 62, and the inlet 61 and the outlet 62 are used for allowing a cooled fluid medium to enter and flow out. The glass substrate 3 is placed on the glass substrate support frame 4, and the mask plate 1 is arranged on the mask plate support frame 2. Due to gravity, the mask plate 1 and the glass substrate 3 can all show different degrees of radian sagging.
In the process of alignment of the traditional evaporation process, as the mask plate 1 is mainly made of alloy, the magnetic field of the magnetic adsorption device 7 can generate a magnetic attraction effect on the mask plate 1 through glass, so that the mask plate 1 can be attracted flat, then the mask plate 1 is moved upwards, and then the glass is lifted flat through the attracted flat mask plate 1. However, in this process, the translation generated relatively during the contact between the mask plate 1 and the glass substrate 3 may cause dust particles to be generated on the glass substrate 3, and meanwhile, may cause defects on the product surface. And this approach can only solve the problem of the small-sized glass substrate 3, severely limiting productivity.
Referring to fig. 2, a schematic structure of the high-precision vapor deposition alignment system according to the present embodiment after adsorption is shown. The mode that this embodiment adopts electrostatic absorption and magnetic force to combine together can overcome the gravity of glass substrate 3 self through the adsorption force of electrostatic adsorption device 5, inhale the flat glass substrate 3, simultaneously through the mode of arranging of adjustment magnetic adsorption device 7 and the size of magnetic force of magnetic stripe, can be through the magnetic field that magnetic adsorption device 7 produced on permeating glass substrate 3 acts on metal mask plate 1 for mask plate 1 level. Therefore, the technical problem of alignment precision caused by sagging of the mask plate 1 and the glass substrate 3 due to self gravity can be avoided in the alignment process, and meanwhile, the friction between the mask plate 1 and the glass substrate 3 in the alignment process is reduced due to the fact that the mask plate 1 and the glass substrate 3 are in horizontal states, so that poor products are effectively avoided. It should be noted that, because the magnetic field of the magnetic adsorption device 7 passes through the cooling plate and the electrostatic adsorption device 5, the sum of the thicknesses of the cooling plate and the electrostatic adsorption device cannot be too large, and the sum of the thicknesses should be controlled below 15mm, so that too large attenuation of magnetic force is avoided, and the alignment effect is prevented from being affected.
The working process and principle of the embodiment are as follows: the glass substrate 3 is placed on the glass substrate support frame 4, and the mask plate 1 is placed on the mask plate support frame 2. The alignment device composed of the electrostatic adsorption device 5, the cooling piece 6 and the magnetic adsorption device 7 is slowly close to the glass substrate 3, the electrostatic adsorption device 5 is close to the glass substrate 3, so that opposite charges are induced on the surface of the glass substrate 3, and the electrostatic adsorption force is generated to counteract the gravity sagging of the glass substrate 3, so that the surface of the glass substrate 3 is adsorbed and leveled. The magnetic attraction device 7 generates magnetic attraction to the mask plate 1 to counteract the gravity of the mask plate 1, so that the mask plate 1 is contacted and attached with the glass substrate 3 after being leveled. The electrostatic attraction means 5 and the magnetic attraction means 7 thus jointly keep the glass substrate 3 and the mask plate 1 in a flat contact during the vapor deposition process.
Example two
Referring to fig. 3, a structure of another embodiment of a high-precision vapor deposition alignment system is shown, which is different from the first embodiment in that a plurality of magnetic attraction devices 7 are embedded in an electrostatic attraction device 5, and the magnetic attraction surfaces of the magnetic attraction devices 7 are aligned with the attraction surfaces of the electrostatic attraction device 5 and face the glass substrate 3. After the magnetic attraction device 7 is embedded in the electrostatic attraction device 5, it is necessary to ensure that the attraction surface of the electrostatic attraction device 5 and the magnetic attraction surface of the magnetic attraction device 7 have a flatness of 30um or less.
Referring to fig. 4, a cooling channel 63 is disposed in the cooling member 6, and a cooling liquid is introduced into the cooling channel 63 to prevent the glass substrate 3 from thermal expansion due to the influence of high temperature process gas, thereby affecting alignment accuracy. The cooling pipes are uniformly distributed in the cooling piece 6 so that the cooling piece 6 can realize uniform cooling.
Referring to fig. 5 and 6, the electrostatic adsorbing device 5 is divided into two parts, namely a first sucker 51 and a second sucker 52, an insulating member 53 is disposed between the first sucker 51 and the second sucker 52, magnetic adsorbing devices 7 and cooling members 6 with cooling channels 63 are disposed in the first sucker 51 and the second sucker 52, and a plurality of rectangular magnetic adsorbing devices 7 are uniformly distributed in the electrostatic adsorbing device 5. The first sucker 51 and the second sucker 52 are also connected with electrodes of the power supply 8, and the first sucker 51 and the second sucker 52 can be connected with electrodes of the same polarity or respectively connected with different electrodes. For example, the first suction cup 51 and the second suction cup 52 may be connected to the positive electrode or the negative electrode, the first suction cup 51 may be connected to the positive electrode and the second suction cup 52 may be connected to the negative electrode, or the first suction cup 51 may be connected to the negative electrode and the second suction cup 52 may be connected to the positive electrode.
The first difference between this embodiment and the first embodiment is that the plurality of magnetic adsorption devices 7 are uniformly embedded in the electrostatic adsorption device 5, and at least two electrostatic adsorption devices 5 are provided, so that the same electrodes can be simultaneously connected in the working process, or different electrodes can be respectively connected, and other specific working processes are the same as those of the first embodiment.
[ other embodiments ]
The magnetic attraction device 7 may be uniformly distributed in the electrostatic attraction device 5 in a long stripe shape, or may be in other shapes such as a hexagon. The insulating member 53 may also employ a sufficient electrical clearance to provide insulation between the first suction cup 51 and the second suction cup 52.
The foregoing is merely illustrative of the present utility model, and the present utility model is not limited thereto, and any changes or substitutions easily contemplated by those skilled in the art within the scope of the present utility model should be included in the present utility model. Therefore, the protection scope of the utility model is subject to the protection scope of the claims.

Claims (10)

1. A high precision vapor deposition alignment system for production processing of screen components, comprising:
a glass substrate support frame for supporting an edge portion of a glass substrate to form an upper vapor deposition region in a middle portion of the glass substrate; and
the mask plate support frame supports the edge part of the metal mask plate so as to form a lower evaporation zone in the middle part of the metal mask plate;
the glass substrate supporting frame is characterized in that the upper part of the glass substrate supporting frame is provided with:
an electrostatic adsorption device for adsorbing the glass substrate to planarize the upper vapor deposition region; and
the magnetic adsorption device is used for adsorbing the metal mask plate so as to level the lower evaporation area;
wherein the electrostatic adsorption device and the magnetic adsorption device are configured so that the glass substrate and the metal mask plate are kept flatly attached in the evaporation process.
2. The high-precision vapor deposition alignment system according to claim 1, wherein a cooling member is further provided between the electrostatic adsorption device and the magnetic adsorption device.
3. The high-precision vapor deposition alignment system according to claim 2, wherein the cooling member is provided with a cooling passage for circulating a cooling medium.
4. The high-precision vapor deposition alignment system according to claim 1, wherein the magnetic attraction device is arranged on one side of a surface facing away from the surface of the glass substrate attracted by the electrostatic attraction device, and the magnetic attraction force generated by the magnetic attraction device is used for penetrating through the electrostatic attraction device and the glass substrate to enable the mask plate to be closely attached to the glass substrate.
5. The high-precision vapor deposition alignment system of claim 1, wherein the electrostatic adsorption devices and the magnetic adsorption devices are arranged in a staggered manner.
6. The high-precision vapor deposition alignment system according to claim 5, wherein the electrostatic adsorbing devices are arranged in a crisscross grid structure, and the magnetic adsorbing devices are arranged so as not to overlap with the electrostatic adsorbing devices in a projection direction of a surface of the glass substrate to which the electrostatic adsorbing devices adsorb.
7. The high-precision vapor deposition alignment system according to claim 6, wherein the magnetic attraction device is provided on one side or the opposite side of the surface of the glass substrate attracted by the electrostatic attraction device.
8. The high precision vapor deposition alignment system of claim 1, wherein the electrostatic adsorption device comprises at least two electrostatic adsorption pieces, at least one of the at least two electrostatic adsorption pieces being connected to a positive electrode and at least one being connected to a negative electrode.
9. The high-precision vapor deposition alignment system of claim 8, wherein an insulator is disposed between adjacent electrostatic absorbing members connecting different electrodes.
10. A vapor deposition apparatus comprising the high-precision vapor deposition alignment system according to any one of claims 1 to 9.
CN202223471261.0U 2022-12-23 2022-12-23 High-precision evaporation counterpoint system and evaporation equipment Active CN218951475U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202223471261.0U CN218951475U (en) 2022-12-23 2022-12-23 High-precision evaporation counterpoint system and evaporation equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202223471261.0U CN218951475U (en) 2022-12-23 2022-12-23 High-precision evaporation counterpoint system and evaporation equipment

Publications (1)

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CN218951475U true CN218951475U (en) 2023-05-02

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