CN218675676U - Exposure device for product with wet film - Google Patents

Abstract

The utility model discloses an exposure device for being accompanied with product of wet film belongs to photovoltaic exposure technical field. The device comprises an exposure station and an oxygen isolation mechanism, wherein the exposure station comprises a parallel light source and a mask, and the parallel light source is arranged above the mask; the oxygen isolation mechanism is arranged below the mask plate and comprises an air pipe and a nozzle, the air pipe is fixedly connected with the nozzle, and the nozzle can spray inert gas. The product attached with the wet film is exposed by adopting the parallel light source with larger exposure area, so that the exposure time is reduced, and the productivity is improved. Meanwhile, inert gas is introduced to protect the wet film in the product exposure process, oxygen isolation is achieved as much as possible, the product with the wet film is prevented from being affected by oxygen inhibition, and the yield of the product with the wet film is improved.

Description

Exposure device for product with wet film

Technical Field

The utility model relates to a photovoltaic exposure technical field, more specifically say, relate to an exposure device that is used for having product of wet film.

Background

Currently, in the photovoltaic industry, most of the photo-curing processes are performed in an air environment, when a wet film is exposed, the wet film is not protected by PET of a dry film and can be in direct contact with the atmosphere, and the main application is materials with an extremely large surface/volume ratio such as paint and ink, so that O2 has an inconspicuous polymerization inhibition effect on the free radical polymerization reaction of the photo-curing material, and the oxygen inhibition effect competes with the polymerization reaction of free radicals to consume the free radicals, so that the conditions that the bottom layer of a coating is cured and the surface is uncured and sticky are caused. Oxygen inhibition can also cause a great amount of oxidative structures such as hydroxyl, carbonyl, peroxy and the like on the surface layer of the coating, thereby affecting the long-term stability of the coating and even possibly affecting the properties such as hardness, glossiness, scratch resistance and the like of the cured paint film. Further, in the prior art, in order to reduce or minimize the problem of oxygen inhibition, the wet film is subjected to vacuum evacuation of its upper portion during exposure, and then subjected to exposure by an LDI exposure machine (the exposure area of the LDI exposure machine is 20mm × 5mm) so that the LDI exposure machine moves above the product.

Such as the patent names: an alignment LDI exposure machine (application number: CN201821206130.0, application date: 2018, no. 07 and No. 27) capable of adjusting a laser module discloses a transmission device and the laser module; the laser module includes: the upper laser module and the lower laser module; go up the laser module group and include: the device comprises a driving device, an upper laser module mounting frame, a first laser module and a roller connecting assembly; the longitudinal rack is sequentially provided with a driving device, an upper laser module mounting frame, a roller connecting assembly, a roller pressing assembly, a transverse rack and a lower laser module from top to bottom; the upper laser module and the lower laser module are in mutual correlation, so that the PCB can be exposed at the same time, and the exposure speed is improved; the position of the two-sided exposure of PCB board also can be synchronized, the position error that causes can not appear exposing once more after the PCB board turn-over, and the accessible is adjusted go up the laser module and adjust the exposure distance, can effectively guarantee the exposure precision of LDI exposure machine, improved the quality of product.

Above-mentioned patent is when carrying out wet film exposure to the printing plate, what adopt is LDI exposure machine, and its production efficiency is comparatively low, can't satisfy the productivity demand that rises day by day.

SUMMERY OF THE UTILITY MODEL

1. Technical problem to be solved by the utility model

The utility model aims to overcome the problem that oxygen among the prior art hinders and gathers influence to wet membrane product, provide an exposure device that is used for the product with wet membrane, lead to at the in-process that the product was exposed and protect wet membrane with inert gas, reach oxygen completely cut off as far as possible, ensured that the product with wet membrane can not receive the influence that oxygen hinders and gathers.

2. Technical scheme

In order to achieve the above purpose, the utility model provides a technical scheme does:

the utility model discloses an exposure device for product attached with wet film, including exposure station and oxygen isolation mechanism, the exposure station includes parallel light source and mask version, the parallel light source sets up above the mask version; the oxygen isolation mechanism is arranged below the mask plate and comprises an air pipe and a nozzle, the air pipe is fixedly connected with the nozzle, the distance between the air outlet of the nozzle and the bottom surface of the mask plate is less than 0.2mm, the nozzle can spray inert gas, and the length of the air outlet of the nozzle is greater than that of the edge, closest to the nozzle, of a product to be processed.

As a further improvement of the present invention, the nozzle comprises an air chamber and a nozzle, the air chamber is connected to one end thereof, the air chamber is fixedly connected to the other end thereof, and the volume of the nozzle decreases gradually from the end close to the air chamber to the end away from the air chamber.

As a further improvement of the utility model, the exposure station further comprises a lifting piece, and the lifting piece is fixedly connected with the two sides of the mask plate.

As a further improvement, the exposure station further includes mask plate lateral moving member, mask plate lateral moving member with mask plate connects, mask plate lateral moving member can drive mask plate and remove along the horizontal direction.

As a further improvement, the utility model discloses still include transmission device, transmission device sets up the below at mask version, the last oxygen isolation mechanism that is equipped with of transmission device, oxygen isolation mechanism sets up the one side at transmission device.

As a further improvement, the utility model also comprises a bearing table, the bearing table is arranged below the mask plate, and the bearing table is arranged under the parallel light source.

As a further improvement, the utility model also comprises a transmission mechanism, which is parallel and level with the bearing platform.

As a further improvement, one side of transmission device is equipped with the transfer piece, the transfer piece includes rotating electrical machines, runing rest and sucking disc, rotating electrical machines output shaft fixed connection runing rest, the fixed sucking disc that is equipped with in runing rest both ends.

As a further improvement, the transfer unit is provided with an oxygen isolation mechanism, and the oxygen isolation mechanism is arranged on one side of the transfer unit.

As a further improvement, the transmission mechanism is provided with a positioning camera, the positioning camera is fixed right above the transmission mechanism, and the lens of the positioning camera is right opposite to the transmission mechanism.

As a further improvement of the present invention, a flow meter is provided in the nozzle.

3. Advantageous effects

Adopt the technical scheme provided by the utility model, compare with prior art, have following beneficial effect:

the utility model discloses a possess the parallel light source of bigger exposure size, under the prerequisite of the same exposure energy and graphic line width, the utility model provides a about the analytic line width of parallel light source will be than traditional LDI exposure machine height 8 mu m, its side etching condition is less, and linear comparatively smooth, and the electrical property influence to photovoltaic cell is less. Meanwhile, inert gas is introduced below the product with the wet film to carry out oxygen isolation in the process of exposing the product with the wet film by the parallel light source, the distance between the gas outlet of the nozzle and the bottom surface of the mask is set to be less than 0.2mm, the gas blown out by the nozzle can be ensured to cover the processing surface of the processed product, the influence caused by oxygen inhibition is effectively reduced, on one hand, the productivity is effectively improved, on the other hand, the yield is further improved, the long-term stability of the coating is ensured, and the hardness, the glossiness and the scratch resistance of the paint film are ensured.

Drawings

FIG. 1 is a schematic diagram of an exposure station according to an embodiment;

FIG. 2 is a graph comparing the line width and the undercut of the conventional LDI exposure apparatus under the same exposure energy and pattern line width in one embodiment;

FIG. 3 is a schematic diagram of a transport mechanism in one embodiment;

fig. 4 is a schematic structural diagram of a showerhead according to an embodiment.

The reference numerals in the schematic drawings illustrate:

1. an exposure station; 11. a collimated light source; 12. masking the plate; 13. a lifting member; 14. a mask plate transverse moving member;

2. an oxygen isolation mechanism; 21. an air tube; 22. a nozzle; 221. an air cavity; 222. and (4) a spray head.

3. A bearing table;

4. a transport mechanism; 41. a transfer member; 411. a rotating electric machine; 412. rotating the bracket; 413. and (4) sucking discs.

Detailed Description

For a further understanding of the present invention, reference will be made to the following detailed description taken in conjunction with the accompanying drawings and examples.

The structure, ratio, size and the like shown in the drawings of the present specification are only used for matching with the content disclosed in the specification, so as to be known and read by people familiar with the technology, and are not used for limiting the limit conditions which can be implemented by the present invention, so that the present invention does not have the substantial significance in the technology, and any structure modification, ratio relationship change or size adjustment should still fall within the scope which can be covered by the technical content disclosed by the present invention without affecting the efficacy which can be produced by the present invention and the achievable purpose. In addition, the terms "upper", "lower", "left", "right" and "middle" used in the present specification are for clarity of description, and are not intended to limit the scope of the present invention, and the relative relationship between the terms and the terms is not to be construed as a scope of the present invention.

The present invention will be further described with reference to the following examples.

Example 1

An exposure device for a product attached with a wet film, as shown in figures 1-2, comprises an exposure station 1 and an oxygen isolation mechanism 2, wherein the exposure station 1 comprises a parallel light source 11 and a mask 12, and the parallel light source 11 is arranged above the mask 12; the oxygen isolation mechanism 2 is arranged below the mask 12, the oxygen isolation mechanism 2 comprises an air pipe 21 and a nozzle 22, the air pipe 21 is fixedly connected with the nozzle 22, and the nozzle 22 can spray inert gas.

The exposure station 1 comprises a collimated light source 11 with a larger exposure size (compared to the exposure size of a conventional LDI exposure machine), preferably, the exposure size of the collimated light source 11 is 300mm. The exposure machine of great exposure size is when exposing the product that attaches wet film, and the exposure machine itself need not to remove, and the exposure machine itself need not to set up the support that supplies its to remove promptly, has reduced the whole volume of station. Meanwhile, the parallel light source 11 is fixedly arranged above the mask 12, so that the failure rate of the exposure machine in actual use is reduced, and the stability in the exposure process is improved. More importantly, due to the increase of the exposure area, the area of the product of the common wet film to be exposed is 210mm, and the exposure area of the parallel light source 11 is larger than the whole area of the product with the wet film, so that the product with the wet film can be exposed for one time below the exposure machine, the exposure time is greatly reduced, and the productivity is effectively increased.

On the premise of the same exposure energy and pattern line width, the line width analyzed by the parallel light source 11 is about 8 μm higher than that of the traditional LDI exposure machine, the lateral erosion condition is smaller, the linearity is smoother, and the influence on the electrical performance of the photovoltaic cell is smaller, as shown in fig. 2 (the upper part is an experimental result obtained by the parallel light source in our party), the lateral erosion of the product in our party is better than that of the traditional LDI exposure machine, the observation and observation can obviously show that the effect obtained by the parallel light source 11 in the embodiment is more towards a rectangle, and the effect generated by the traditional LDI exposure machine is more towards a trapezoid.

Further, be equipped with oxygen isolation mechanism 2 on exposure station 1, trachea 21 and nozzle 22 that oxygen isolation mechanism 2 includes, nozzle 22 is connected to trachea 21 one end, the gas holder of inert gas is connected to the trachea 21 other end, inert gas in the gas holder blows to exposure station 1 through nozzle 22, guaranteed that exposure station 1 is full of by inert gas by exposure product position department, will wait to expose and have isolated with oxygen with the product of wet film, the effectual oxygen that has reduced hinders the influence of gathering to the product with the wet film, preferably, foretell inert gas is inert gas such as nitrogen gas or argon gas. The nozzle 22 is provided with a flow meter which can monitor the spraying condition of the inert gas at any time and adjust the proper gas flow according to the production requirement.

Specifically, the one end that the trachea was kept away from to the nozzle sets to the platykurtic, and its width is equivalent to the width of wet film product, has guaranteed that the gas of blowout can be even from the nozzle cover the space between wet film product and the mask version, and the air outlet has also increased here inert gas's atmospheric pressure for the platykurtic, and further more swift keeps apart here oxygen.

In this embodiment, the distance between the air outlet of the nozzle and the bottom surface of the mask is less than 0.2mm, and preferably, the distance between the air outlet of the nozzle and the bottom of the mask is 0.02mm, 0.05mm, 0.08mm, 0.1mm, 0.15mm, or 0.2mm. Specifically, a connecting column fixedly connected with the mask plate is arranged on a shell of the nozzle, and the nozzle can also be in a structure of a screw rod and a servo motor and is used for ensuring that the distance between the lower part of the nozzle and the mask plate is less than 0.2mm all the time. The distance between the nozzle and the mask is short, so that the oxygen isolation of the wet film product can be ensured in a short time.

Experiments prove that when the product attached with the wet film reacts with oxygen in the air, the straightness of the product generates a large difference, and the straightness of the product is shown in table 1:

TABLE 1

Exposure line width	With inert gas protection	Without inert gas protection
			25μm	＜0.2μm	＞1.3μm

When the wet film-attached product was controlled to have the same variables, as the same wet film thickness of 15 μm and light source energy output conditions, 7-stage 21-stage exposure scales were exposed for the difference in exposure time as shown in table 2:

TABLE 2

With inert gas protection	Without inert gas protection
		＜0.8s	＞1.7s

Therefore, according to experimental data, under the protection of inert gas, the method is beneficial to the high quality rate of the product attached with the wet film on one hand, and reduces the exposure time on the other hand, namely effectively improves the productivity.

Example 2

As shown in fig. 1, 2, and 4, the present embodiment is developed based on embodiment 1, the exposure station 1 further includes a lifting member 13, and both sides of the reticle 12 are fixed on the lifting member 13. The exposure station 1 further comprises a mask plate transverse moving member 14, the mask plate transverse moving member 14 is arranged above the bearing table 3, and the mask plate transverse moving member 14 can drive the mask plate 12 to move in the horizontal direction.

The nozzle 22 can eject inert gas, and the length of the gas outlet of the nozzle 22 is longer than that of the edge of the product to be processed, which is closest to the nozzle 22. The nozzle 22 comprises an air cavity 221 and a spray head 222, one end of the air cavity 221 is connected with the air pipe 21, the other side of the air cavity 221 is fixedly connected with the spray head 222, and the volume of the spray head 222 is gradually reduced from one end close to the air cavity 221 to one end far away from the air cavity 221.

Because the length of the air outlet of the nozzle 22 is greater than the length of the edge of the product to be processed closest to the nozzle 22, that is, the width of the air outlet of the nozzle 22 is greater than the longest edge of the product to be processed, the inert gas sprayed out of the nozzle 22 can cover the surface to be processed of the product to be processed, thereby ensuring the uniformity of the product to be processed everywhere, being beneficial to isolating oxygen by the inert gas,

further, the nozzle 22 comprises a spray head 222 and an air cavity 221, inert gas flows into the air cavity 221 from the air pipe 21, the air cavity 221 is full of the inert gas, and then the inert gas is blown out from the air cavity 221 through the spray head 222, the pressure of the inert gas in the air pipe 21 is favorably reduced due to the air cavity 221, so that the inert gas blown to the surface of a product to be processed is more uniform, and the promotion effect on oxygen isolation is achieved.

In another embodiment, the volume of the nozzle 222 is gradually reduced from one end close to the air cavity 221 to one end far away from the air cavity 221, the cross section area of the nozzle 222 is triangular, the gas flow is reduced in the process from the air cavity 221 to the product to be processed, the pressure of the gas is increased, the nozzles 222 with different volumes are arranged according to the requirement of the product to be processed, and the inert gas sprayed onto the product to be processed is enabled to better accord with the gas flow pressure required by oxygen isolation by the cooperation of the nozzles 222 and the air cavity 221, so that the oxygen isolation effect is better.

Supports are arranged on two sides of the mask 12, lifting pieces 13 are arranged on the supports, the lifting pieces 13 drive the mask 12 to lift, the mask 12 capable of lifting is arranged according to the specific situation required by a product to be exposed and provided with a wet film, the diversity of the product exposed and provided with the wet film is enlarged, and the lifting pieces 13 are devices capable of playing a lifting function such as air cylinders or electric cylinders.

Furthermore, mask plate transverse moving members 14 capable of moving horizontally are further arranged on two sides of the mask plate 12, the mask plate transverse moving members 14 can enable the mask plate 12 to move in the horizontal direction, the position of the mask plate 12 can be adjusted according to the exposure area of a product attached with a wet film by the mask plate 12, and the mask plate transverse moving members 14 comprise rails and devices capable of extending out and retracting, such as air cylinders or hydraulic push rods.

Example 3

As shown in fig. 1 to 4, this embodiment is developed based on embodiments 1 and 2, and an exposure apparatus for a product with a wet film further includes a transmission mechanism 4, the transmission mechanism 4 is disposed below the mask 12, an oxygen isolation mechanism 2 is disposed on the transmission mechanism 4, and the oxygen isolation mechanism 2 is disposed on one side of the transmission mechanism 4.

The conveying mechanism 4 is a moving device such as a conveyor belt which can automatically move the product attached with the wet film to the position below the exposure station 1, and is provided with a servo motor for driving the conveying mechanism 4 to operate. One end of the conveyor belt is positioned below the mask 12, a positioning device is arranged on the transmission mechanism 4, for example, a camera is used for positioning or edge finding positioning, after the positioning device detects that the product with the wet film is transported to the exposure station 1, the conveyor belt stops, the parallel light source 11 carries out exposure operation on the product with the wet film, the conveyor belt is restarted after exposure is completed, and the product with the wet film after transportation and exposure is completed enters the next station.

Further, still be equipped with oxygen isolation mechanism 2 on the conveyer belt, oxygen isolation mechanism 2 includes nozzle 22 and trachea 21, and nozzle 22 is connected to trachea 21 one end, and the gas holder is connected to the trachea 21 other end, and inert gas in the gas holder spouts the product that has the wet film on the conveyer belt from nozzle 22, has guaranteed that the product that has the wet film can not receive the influence that oxygen inhibition gathers on the way of the transportation on the conveyer belt, has guaranteed the yields of the product that has the wet film.

Example 4

Referring to fig. 1 to 4, this embodiment is expanded from embodiments 1 and 2, and an exposure apparatus for a product with a wet film includes a stage 3, the stage 3 is disposed below a mask 12, and the stage 3 is disposed directly below a collimated light source 11. Be equipped with oxygen isolation mechanism 2 in plummer 3 one side, oxygen isolation mechanism 2 includes nozzle 22 and trachea 21, and nozzle 22 is located plummer 3's top, and the inert gas of blowout can carry out the oxygen separation to the product that attaches the wet film in the nozzle 22, prevents that oxygen and the product that attaches the wet film from contacting.

Wherein, plummer 3 is located the below of mask work 12 and plummer 3 sets up under parallel light source 11, and in actual production process, operating personnel places the product with the wet film on plummer 3, and parallel light source 11 exposes to the sun to the product with the wet film on plummer 3 and handles, and the product with the wet film is taken off plummer 3 to operating personnel again after the exposure, changes another product with the wet film that does not expose, and the product with the wet film that exposes then puts into next station. A bearing table 3 is arranged below the exposure station 1, the product attached with the wet film is manually placed on the bearing table 3 for exposure, and the occupied position of the machine is small.

Example 5

As shown in fig. 1 to 4, the present embodiment is improved based on embodiment 4, and further includes a transmission mechanism 4, and the transmission mechanism 4 is flush with the carrier table 3. One side of the transmission mechanism 4 is provided with a transfer member 41, the transfer member 41 comprises a rotating motor 411, a rotating bracket 412 and a suction cup 413, an output shaft of the rotating motor 411 is fixedly connected with the rotating bracket 412, and the two ends of the rotating bracket 412 are fixedly provided with the suction cup 413. The transfer member 41 is provided with an oxygen isolation mechanism 2, and the oxygen isolation mechanism 2 is arranged on one side of the transfer member 41.

A transmission mechanism 4 is arranged on one side of the bearing table 3, the transmission mechanism 4 is a moving device such as a conveyor belt and the like which can automatically move a product attached with a wet film to the lower part of the exposure station 1, and a servo motor is arranged and used for driving the transmission mechanism 4 to operate. The wet film-coated product is conveyed to the vicinity of the stage 3 by a belt, and the wet film-coated product is transferred from the belt to the stage 3 by a transfer member 41 to perform an exposure operation.

The rotating motor 411 included in the transferring member 41 is a DD motor, an output shaft of the DD motor is fixedly connected to the rotating bracket 412, two ends of the rotating bracket 412 are both provided with suction cups 413, and the rotating bracket 412 rotates under the action of the servo motor to transport the product with the wet film, which is transported to the predetermined position, from the predetermined position to the carrying platform 3 below the exposure station 1 for exposure treatment. Suction nozzles are arranged on the suction cups 413 at two ends of the rotary support 412, the suction nozzles are used for sucking and fixing the product with the wet film in the process of conveying the product with the wet film, a vacuum extractor is arranged on the suction nozzles, the product with the wet film is sucked on the suction cups 413 by utilizing the atmospheric pressure, and the product with the wet film is prevented from falling off from the suction cups 413 in the process of conveying and being damaged.

Furthermore, a positioning camera is arranged on the transmission mechanism 4, the positioning camera is fixed right above the transmission mechanism 4, and a lens of the positioning camera is right opposite to the transmission mechanism 4. The positioning camera positions the product with the wet film conveyed on the conveying mechanism 4, the conveying belt stops after the positioning device detects that the product with the wet film is conveyed to the exposure station 1, the parallel light source 11 performs exposure operation on the product with the wet film, the conveying belt restarts after exposure is completed, and the product with the wet film after exposure is conveyed enters the next station.

The present invention and its embodiments have been described above schematically, and the description is not limited thereto, and what is shown in the drawings is only one of the embodiments of the present invention, and the actual structure is not limited thereto. Therefore, if the person skilled in the art receives the teaching of the present invention, without departing from the inventive spirit of the present invention, the person skilled in the art should also design the similar structural modes and embodiments without creativity to the technical solution, and all shall fall within the protection scope of the present invention.

Claims (11)

1. An exposure apparatus for a product to which a wet film is attached, characterized in that: comprises the steps of (a) preparing a mixture of a plurality of raw materials,

the exposure device comprises an exposure station (1), wherein the exposure station (1) comprises a parallel light source (11) and a mask (12), and the parallel light source (11) is arranged above the mask (12);

the oxygen isolation mechanism (2) is arranged below the mask plate (12), the oxygen isolation mechanism (2) comprises an air pipe (21) and a nozzle (22), the air pipe (21) is fixedly connected with the nozzle (22), the nozzle (22) can spray inert gas, and the length of an air outlet of the nozzle is greater than that of the edge, closest to the nozzle, of a product to be processed.

2. The exposure apparatus for a product with a wet film attached thereto according to claim 1, wherein: the nozzle (22) comprises an air cavity (221) and a spray head (222), one end of the air cavity (221) is connected with the air pipe (21), the other side of the air cavity (221) is fixedly connected with the spray head (222), and the volume of the spray head (222) is gradually reduced from one end close to the air cavity (221) to one end far away from the air cavity (221).

3. The exposure apparatus for a product with a wet film attached thereto according to claim 1, wherein: the exposure station (1) further comprises a lifting piece (13), and the two sides of the mask (12) are fixedly connected with the lifting piece (13).

4. The exposure apparatus for a product with a wet film attached thereto according to any one of claims 1 to 3, characterized in that: the exposure station (1) further comprises a mask plate transverse moving member (14), the mask plate transverse moving member (14) is connected with the mask plate (12), and the mask plate transverse moving member (14) can drive the mask plate (12) to move in the horizontal direction.

5. The exposure apparatus for a product with a wet film attached thereto according to claim 1, wherein: the mask plate is characterized by further comprising a transmission mechanism (4), wherein the transmission mechanism (4) is arranged below the mask plate (12), an oxygen isolation mechanism (2) is arranged on the transmission mechanism (4), and the oxygen isolation mechanism (2) is arranged on one side of the transmission mechanism (4).

6. The exposure apparatus for a product with a wet film attached thereto according to claim 5, wherein: the mask plate is characterized by further comprising a bearing table (3), wherein the bearing table (3) is arranged below the mask plate (12), and the bearing table (3) is arranged right below the parallel light source (11).

7. The exposure apparatus for a product with a wet film attached thereto according to claim 6, wherein: the automatic bearing platform is characterized by further comprising a transmission mechanism (4), wherein the transmission mechanism (4) is flush with the bearing platform (3).

8. The exposure apparatus for a product with a wet film attached thereto according to claim 7, wherein: one side of transmission device (4) is equipped with shifts piece (41), shift piece (41) includes rotating electrical machines (411), runing rest (412) and sucking disc (413), rotating electrical machines (411) output shaft fixed connection runing rest (412), runing rest (412) both ends are fixed and are equipped with sucking disc (413).

9. The exposure apparatus for a product with a wet film attached thereto according to claim 8, wherein: an oxygen isolation mechanism (2) is arranged on the transfer piece (41), and the oxygen isolation mechanism (2) is arranged on one side of the transfer piece (41).

10. The exposure apparatus for a product with a wet film attached thereto according to any one of claims 5 to 9, characterized in that: the camera positioning device is characterized in that a positioning camera is arranged on the transmission mechanism (4), the positioning camera is fixed right above the transmission mechanism (4), and a lens of the positioning camera is opposite to the transmission mechanism (4).

11. The exposure apparatus for a product with a wet film attached thereto according to claim 1 or 2, characterized in that: a flow meter is arranged in the nozzle (22), and the distance between the air outlet of the nozzle (22) and the bottom surface of the mask (12) is less than 0.2mm.

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