CN218585922U - Ion beam equipment, ion source device and grid structure thereof - Google Patents
Ion beam equipment, ion source device and grid structure thereof Download PDFInfo
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- CN218585922U CN218585922U CN202223183902.2U CN202223183902U CN218585922U CN 218585922 U CN218585922 U CN 218585922U CN 202223183902 U CN202223183902 U CN 202223183902U CN 218585922 U CN218585922 U CN 218585922U
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Abstract
The utility model discloses an ion beam device, an ion source device and a grid structure thereof, wherein the grid structure comprises a screen grid and an accelerating grid which are arranged in parallel; the support device also comprises a first support ring, a second support ring and a support column; the first support ring and the second support ring are arranged in parallel, and the screen grid and the acceleration grid are positioned between the first support ring and the second support ring; the supporting column is an insulating column, two ends of the supporting column are respectively abutted against the first supporting ring and the second supporting ring, and the screen grid and the accelerating grid are arranged on the supporting column in a spaced manner; the first support ring and the second support ring are fixedly connected through a plurality of fasteners. Through the optimization to the grid structure, make things convenient for the dismantlement of grid structure to change, reduced the maintenance cost.
Description
Technical Field
The utility model relates to an ion beam equipment technical field especially relates to an ion beam equipment, ion source device and grid structure thereof.
Background
Ion beam machining is one of the important processes of the modern micro-nano precision machining. The ion source apparatus is a key component of ion beam processing, wherein an ion grid structure is one of the key components of the ion source apparatus, and in order to obtain a required ion beam during processing, ions need to be extracted from a discharge chamber, and the grid structure is a main apparatus for extracting the ions from the discharge chamber.
The grid structure is used for beam extraction and modification in the ion source device, generally graphite or molybdenum and the like are used for manufacturing a mesh electrode which is positioned at the front end of an ion source outlet, and ions can be extracted from an ion source discharge chamber by changing the geometric characteristics and relative positions of a grid mesh and controlling the potential distribution on the grid mesh, so that the ions have certain spatial concentration and spatial distribution shape.
The grid structure has a 2-layer or 3-layer structure, wherein a screen grid and an accelerating grid are necessary components for leading out and accelerating ions, and a decelerating grid can be arranged for protecting the accelerating grid, reducing a divergence angle and adjusting the beam current track of the ion beam.
In related design, the acceleration grid, the screen grid and the deceleration grid are connected in a mode of insulating beads or insulating rings and the like, so that the grids can be insulated, and risks of mutual conduction, short circuit and the like between the grids are avoided. In practical application, when the gate structure is used for a long time, the gate material is sputtered onto insulating materials such as insulating beads, and a layer of conductive medium is plated on the insulating materials, so that the gates are mutually conducted, and the normal operation of the gate structure is affected, therefore, the insulating materials of the gate structure need to be replaced regularly to ensure the normal operation of the ion source device. However, the aforementioned method of connecting the insulating beads or rings to the gate structure has the problems of inconvenient detachment and incapability of accurately controlling the distance between the gates.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing an ion beam equipment, ion source device and grid structure thereof through the optimization to the grid structure, makes things convenient for the dismantlement of grid structure to change, has reduced the maintenance cost.
In order to solve the above technical problem, the present invention provides a grid structure of an ion source device, which includes a screen grid and an acceleration grid, both of which are arranged in parallel; the support device also comprises a first support ring, a second support ring and a support column;
the first support ring and the second support ring are arranged in parallel, and the screen grid and the acceleration grid are positioned between the first support ring and the second support ring;
the supporting column is an insulating column, two ends of the supporting column are respectively abutted against the first supporting ring and the second supporting ring, and the screen grid and the accelerating grid are arranged on the supporting column in a spaced manner;
the first support ring and the second support ring are fixedly connected through a plurality of fasteners.
The grid structure of the ion source device further comprises a limiting structure for limiting the relative position between the accelerating grid and the screen grid.
The grid structure of the ion source device comprises a first support column and a second support column;
the first support column is provided with a first step surface facing the first support ring, and the first step surface presses the screen grid against the first support ring;
the second support column has a second step surface facing the second support ring, and the second step surface presses the acceleration grid against the second support ring.
In the grid structure of the ion source device, the support column includes the first support column and the second support column, both of which are in a truncated cone-shaped structure;
the small-diameter end of the first support column is abutted against the first support ring, the screen grid is provided with a first limiting hole, and the screen grid is tangent to and limited by the side surface of the first support column through the first limiting hole;
the small-diameter end of the second supporting column is abutted to the second supporting ring, the accelerating grid is provided with a first positioning hole, and the accelerating grid is tangent and limited to the side surface of the second supporting column through the first positioning hole.
In the gate structure of the ion source device, the screen further has a second limiting hole, and the screen is further tangent to and limited by the second limiting hole and the side surface of the second supporting column.
In the above gate structure of the ion source device, the acceleration grid further has a second positioning hole, and the acceleration grid is further tangentially limited with the side surface of the first support column through the second positioning hole.
The grid structure of the ion source device further comprises a deceleration grid, wherein the deceleration grid is positioned on one side of the acceleration grid, which is far away from the screen grid, and the deceleration grid is sleeved on the supporting column.
The grid structure of the ion source device further comprises a limiting structure, and the limiting structure is used for limiting the relative position between the acceleration grid and the screen grid and limiting the relative position between the acceleration grid and the deceleration grid.
The grid structure of the ion source device, wherein the support column comprises a first support column and a second support column;
the first support column is provided with a first step surface and a second step surface which face the first support ring, and the first step surface is close to the first support ring relative to the second step surface;
the second support column is provided with a third step surface and a fourth step surface which face the second support ring, and the third step surface is close to the second support ring relative to the fourth step surface;
the first step surface presses the screen grid against the first support ring;
the second step surface and the fourth step surface clamp two side surfaces of the accelerating grid;
the third step surface presses the speed reducing grid against the second support ring.
In the grid structure of the ion source device, the support column includes a first support column and a second support column, both of which are in a truncated cone-shaped structure;
the small-diameter end of the first support column is abutted against the first support ring, the screen grid is provided with a first limiting hole, and the screen grid is tangent to and limited by the side surface of the first support column through the first limiting hole;
the small-diameter end of the second supporting column abuts against the second supporting ring, the deceleration grid is provided with a first limiting hole, and the deceleration grid is tangentially limited with the side surface of the second supporting column through the first limiting hole;
the accelerating grid is provided with two positioning holes which are respectively tangent and limited with the first supporting column and the second supporting column.
In the gate structure of the ion source device, the screen further has a second limiting hole, and the screen is further tangent to and limited by the second limiting hole and the side surface of the second supporting column.
The grid structure of the ion source device, the deceleration grid is also provided with a second limiting hole, and the deceleration grid is also tangentially limited with the side surface of the first support column through the second limiting hole.
In the grid structure of the ion source device, each of the fastening members is provided with one of the first support columns and one of the second support columns on both sides.
In the above grid structure of the ion source device, at least one of the first support ring and the second support ring has a limiting groove, and the support column is limited and inserted into the limiting groove.
In the grid structure of the ion source apparatus, the first support ring and the second support ring are both provided with a limiting groove.
In the above gate structure of the ion source apparatus, the support pillar is a ceramic support pillar.
In the grid structure of the ion source device, the first support ring and the second support ring are both conductive support rings, and the first support ring and the second support ring are insulated from each other.
The grid structure of the ion source device comprises a screw and a nut, wherein the screw penetrates through the first support ring and the second support ring and is screwed and fixed by the nut;
the nut is positioned on one side, away from the second support ring, of the first support ring, an insulating cap is arranged between the nut and the first support ring, and the insulating cap is sleeved on the screw; or the nut is positioned on one side, far away from the first support ring, of the second support ring, an insulating cap is arranged between the nut and the second support ring, and the insulating cap is sleeved on the screw in an outer mode.
The utility model also provides an ion source device, including the grid structure, the grid structure is located the front end of ion source export, the grid structure be above-mentioned arbitrary any the grid structure.
The utility model also provides an ion beam equipment, including the aforesaid ion source device.
Aiming at the problem of inconvenient disassembly of a grid structure in the related technology, the utility model discloses improve the connection structure of the grid structure, specifically, be equipped with first support ring and second support ring, set screen bars and acceleration bars between the first support ring and the second support ring, the screen bars and the acceleration bars are set at the support columns made of insulating materials by spacer bushes, the two ends of the support columns are respectively abutted with the first support ring and the second support ring, the first support ring and the second support ring are fixedly connected through fasteners; therefore, after the grid structure is used for a period of time, the related structure of the grid structure can be replaced by detaching the fastening piece, the maintenance is convenient, and the cost is effectively reduced.
The utility model provides an ion source device and ion beam equipment includes above-mentioned grid structure, has the same technological effect, and is no longer repeated.
Drawings
Fig. 1 is a schematic structural diagram of a gate structure according to a first embodiment of the present invention;
FIG. 2 is an exploded view of the gate structure shown in FIG. 1;
FIG. 3 is a partial cross-sectional view of the gate structure shown in FIG. 1;
FIG. 4 is a schematic structural view of the first support column of FIG. 3;
FIG. 5 is a schematic structural view of the second support column in FIG. 3;
fig. 6 is a partial cross-sectional view of a gate structure according to a second embodiment of the present invention;
fig. 7 is a partial cross-sectional view of a gate structure according to a third embodiment of the present invention;
FIG. 8 is a schematic structural view of the first support column or the second support column of FIG. 7;
fig. 9 is a partial cross-sectional view of a gate structure according to a fourth embodiment of the present invention.
Description of the reference numerals:
a screen grid 11, an acceleration grid 12 and a deceleration grid 13;
a first support ring 21, first limit grooves 211a and 211b, a second support ring 22, and second limit grooves 221a and 221b;
the first support column 31A, the first step surface 311A, the second step surface 312A, the second support column 32A, the third step surface 321A and the fourth step surface 322A;
a first support column 31B, a first step surface 311B, a second support column 32B, a second step surface 321B;
Detailed Description
Aiming at the problem of inconvenient disassembly of a grid structure in the related technology, the grid structure of the ion source device provided by the utility model comprises a screen grid and an accelerating grid which are arranged in parallel, and also comprises a first support ring, a second support ring and a support column; the first support ring and the second support ring are arranged in parallel, and the screen grid and the acceleration grid are positioned between the first support ring and the second support ring; the supporting column is an insulating column, two ends of the supporting column are respectively abutted against the first supporting ring and the second supporting ring, and the screen grid and the accelerating grid are arranged on the supporting column in a spaced manner; the first support ring and the second support ring are fixedly connected through a plurality of fasteners. When the grid structure is provided with the deceleration grid, the support column is also sleeved with the deceleration grid, and the deceleration grid is positioned on one side of the acceleration grid, which is far away from the screen grid, and is spaced from the acceleration grid by a certain distance.
The insulation is realized through the support column between each grid mesh structure of above-mentioned grid structure, realizes fixedly through fixed first support ring of fastener and second support ring, when using a period and need maintain the change relevant structure, just can realize through dismantling the fastener, easy operation is convenient again, can reduce the maintenance cost effectively.
In order to make the technical field better understand the solution of the present invention, the following detailed description of the present invention is provided with reference to the accompanying drawings and the detailed description.
The first embodiment:
referring to fig. 1 to 5, fig. 1 is a schematic structural diagram of a gate structure according to a first embodiment of the present invention; FIG. 2 is an exploded view of the gate structure shown in FIG. 1; FIG. 3 is a partial cross-sectional view of the gate structure shown in FIG. 1; FIG. 4 is a schematic structural view of the first support column of FIG. 3; fig. 5 is a schematic structural diagram of the second supporting column in fig. 3.
In this embodiment, the gate structure includes a screen 11, an acceleration grid 12 and a deceleration grid 13, which are arranged in parallel at intervals, wherein the acceleration grid 12 is located between the screen 11 and the deceleration grid 13.
The grid structure further comprises a first support ring 21, a second support ring 22 and support columns, wherein the first support ring 21 and the second support ring 22 are both in an annular structure, the screen grid 11, the acceleration grid 12 and the deceleration grid 13 are respectively sleeved on the support columns, two ends of each support column are abutted against the first support ring 21 and the second support ring 22, and the first support ring 21 and the second support ring 22 are fixedly connected through a fastener 40, so that the screen grid 11, the acceleration grid 12 and the deceleration grid 13 are fixed together. It is evident that the screen 11, the acceleration grid 12 and the deceleration grid 13 are located between the first support ring 21 and the second support ring 22.
The screen 11, the acceleration grid 12 and the deceleration grid 13 are generally circular, and grid holes (not shown) are formed in the screen, the acceleration grid 12 and the deceleration grid 13, and the first support ring 21 and the second support ring 22 are circular structures, so that the normal operation of the screen 11, the acceleration grid 12 and the deceleration grid 13 is not affected.
In the example shown in fig. 1, there are 8 fasteners 40 uniformly arranged along the circumferential direction of the first support ring 21 and the second support ring 22 to reliably and stably assemble the components of the grid structure together. It is understood that in other embodiments, the number of the fastening members 40 may be adjusted according to the requirement, and is not limited to the number shown in the drawings, and in practical applications, the plurality of fastening members 40 may not be uniformly arranged along the circumferential direction, but are preferably symmetrically arranged with respect to the center of the grid structure to ensure the force stability and the assembling reliability.
In this embodiment, the supporting columns are insulating columns to ensure mutual insulation among the screen grid 11, the accelerating grid 12 and the decelerating grid 13 sleeved thereon, so as to ensure normal operation. Specifically, the support columns can be made of ceramic materials.
In a specific scheme, the grid structure comprises a limiting structure, and the limiting structure is used for limiting the relative position between the accelerating grid 12 and the screen grid 11 and limiting the relative position between the accelerating grid 12 and the decelerating grid 13 so as to realize the accurate control of the distance between the screen grid 11 and the accelerating grid 12 and the distance between the accelerating grid 12 and the decelerating grid 13 and realize the stability of the density of the extracted ion beam.
In this embodiment, the support columns include a first support column 31A and a second support column 32A, and it is understood that the first support column 31A and the second support column 32A are made of insulating materials.
The first support column 31A has a first step surface 311A and a second step surface 312A facing the first support ring 21, wherein the first step surface 311A is close to the first support ring 21 relative to the second step surface 312A, in other words, the first support column 31A has a stepped structure and includes three portions with sequentially decreasing radial dimensions, and the aforementioned step surfaces are formed between the two adjacent portions, and obviously, the small diameter end of the first support column 31A abuts against the first support ring 21, and the large diameter end abuts against the second support ring 22, so that the step surface thereof may face the first support ring 21.
Wherein the second supporting pillar 32A has a third step surface 321A and a fourth step surface 322A facing the second supporting ring 22, the third step surface 321A is close to the second supporting ring 22 relative to the fourth step surface 322A, in other words, the second supporting pillar 32A has a stepped structure and includes three portions with sequentially decreasing radial dimensions, the aforementioned step surfaces are formed between two adjacent portions, obviously, the small diameter end of the second supporting pillar 32A abuts against the second supporting ring 22, and the large diameter end abuts against the first supporting ring 21, so that the step surfaces thereof can face the second supporting ring 22.
As can be seen from the above, as shown in fig. 5, the first support column 31A and the second support column 32A are similar in structure, but, in conjunction with fig. 2 to 4, the first support column 31A and the second support column 32A are oppositely oriented when assembled. In the concrete application, first support column 31A and second support column 32A can adopt identical structure, and the processing of being convenient for only need confirm when reassembling that the equipment direction can.
After the above arrangement, with reference to fig. 3 to 5, the screen 11 is pressed against the first support ring 21 by the first step surface 311A of the first support column 31A, that is, the first step surface 311A of the first support column 31A and the first support ring 21 limit the position of the screen 11 in the axial direction; the two side surfaces of the acceleration grid 12 are clamped by the step surface two 312A of the first support column 31A and the step surface four 322A of the second support column 32A, and because the directions of the step surface two 312A and the step surface four 322A are opposite, the position of the acceleration grid 12 in the axial direction can be limited after the step surface two 312A and the step surface four 322A are respectively abutted against the two side surfaces of the acceleration grid 12, so that the distance between the acceleration grid 12 and the screen 11 can be accurately controlled; the third stepped surface 321A of the second support pillar 32A presses the reduction grid 13 against the second support ring 22, that is, the third stepped surface 321A of the second support pillar 32A and the second support ring 22 limit the position of the reduction grid 13 in the axial direction, so that the spacing between the acceleration grid 12 and the reduction grid 13 can be accurately controlled.
The above-mentioned axial direction refers to the arrangement direction of the screen 11, the acceleration grid 12, and the deceleration grid 13, and is the up-down direction in the drawing in the orientation shown in fig. 3.
In this embodiment, the limiting structures for limiting the relative positions of the screen 11, the acceleration grid 12 and the deceleration grid 13 are formed on the first support column 31A and the second support column 32A, so that the structure is simplified.
In a specific application, in order to ensure the accuracy of the position control among the screen 11, the acceleration grid 12 and the deceleration grid 13, the support columns may be provided in a plurality of sets, and specifically, as shown in fig. 3, a first support column 31A and a second support column 32A are provided on both sides of each fastener 40 fixedly connecting the first support ring 21 and the second support ring 22.
In a specific scheme, at least one of the first support ring 21 and the second support ring 22 is provided with a limiting groove, and the support columns (including the first support column 31A and the second support column 32A) are inserted into the limiting groove through limiting, so that the support columns can be prevented from being deviated between the first support ring 21 and the second support ring 22, and the stability and reliability of grid structure assembly can be further improved.
As shown in fig. 3, the first support ring 21 and the second support ring 22 are both provided with a limiting groove, specifically, the first support ring 21 is provided with a first limiting groove 211A, 211b, the second support ring 22 is provided with a second limiting groove 221A, 221b, two ends of the first support column 31A are respectively inserted into the first limiting groove 211A and the second limiting groove 221A to effectively limit the relative positions of the first support column 31A, the first support ring 21 and the second support ring 22, two ends of the second support column 32A are respectively inserted into the first limiting groove 211b and the second limiting groove 221b to effectively limit the relative positions of the second support column 32A, the first support ring 21 and the second support ring 22.
In a specific application, the first support ring 21 and the second support ring 22 are both conductive support rings, i.e. the first support ring 21 and the second support ring 22 are both made of conductive material, such as stainless steel. Therefore, the grid electrode can be connected through the first support ring 21 and the second support ring 22, the arrangement is convenient, and the problem that the grid electrode is connected on the grid electrode directly and difficultly is solved.
On this basis, an insulating arrangement is required between the first support ring 21 and the second support ring 22.
Specifically, the fastening member 40 for fixedly connecting the first support ring 21 and the second support ring 22 includes a screw 41 and a nut 42, with the structure shown in fig. 3, the screw 41 passes through the first support ring 21, the screen 11, the acceleration grid 12, the deceleration grid 13 and the second support ring 22 in sequence and then is screwed and fixed by the nut 42, the nut 42 is located on one side of the second support ring 22 away from the first support ring 21, in order to avoid the conduction between the first support ring 21 and the second support ring 22 through the screw 41, an insulating cap 43 is sleeved outside the screw 41, and the insulating cap 43 is disposed between the nut 42 and the second support ring 22.
In practical applications, the screw 41 may also pass through the second support ring 22 towards the first support ring 21, and after assembly, the nut 42 is located on a side of the first support ring 21 away from the second support ring 22, and at this time, the insulation cap 43 is disposed between the nut 42 and the first support ring 21 and is sleeved on the screw 41.
The second embodiment:
referring to fig. 6, fig. 6 is a partial cross-sectional view of a gate structure according to a second embodiment of the present invention.
The embodiment shown in fig. 6 provides a gate structure without a deceleration grid compared to the gate structure of the first embodiment, and accordingly, the structure of the supporting pillars is slightly different, and other connection structures and connection relationships can be understood with reference to the description of the first embodiment. Only the differences will be explained below.
As shown in fig. 6, in the present embodiment, the support columns include a first support column 31B and a second support column 32B, the first support column 31B has a first step surface 311B facing the first support ring 21, the second support column 32B has a second step surface 321B facing the second support ring 22, and the first support column 31B and the second support column 32B are in a convex shape in cross section.
The screen 11 is pressed against the first support ring 21 by the first step face 311B of the first support column 31B, and the acceleration grid 12 is pressed against the second support ring 22 by the second step face 321B of the second support column 32B, so that the relative positions of the screen 11 and the acceleration grid 12 can be defined by the structures of the first support column 31B and the second support column 32B.
The first support column 31B and the second support column 32B are also insulating columns; specifically, in this embodiment, the first support ring 21 and the second support ring 22 are also provided with limiting grooves for limiting the positions of the first support columns 31B and the second support columns 32B.
Similarly, in a specific application, the first support ring 21 and the second support ring 22 are also made of conductive material to facilitate grid connection.
The structural form of the fastener fixedly connected to the first and second support rings 21 and 22 and the insulation manner therebetween are the same as those of the first embodiment described above, and will not be repeated.
The third embodiment:
referring to fig. 7 and 8, fig. 7 is a partial cross-sectional view of a gate structure according to a third embodiment of the present invention; fig. 8 is a schematic structural view of the first supporting column or the second supporting column in fig. 7.
The basic structure composition and connection relationship of this embodiment are similar to those of the first embodiment, and the gate structure also includes a screen 11, an acceleration grid 12 and a deceleration grid 13, which are different in the specific structural form of the support posts, and only the differences will be described below, and the rest can be understood by referring to the description of the first embodiment.
In this embodiment, the supporting columns include a first supporting column 31C and a second supporting column 32C, both of which are truncated cone-shaped structures, as shown in fig. 8, and when assembled, the first supporting column 31C and the second supporting column 32C are also similar to the first supporting column 31A and the second supporting column 32A in the foregoing first embodiment, and the orientations of the first supporting column 31C and the second supporting column 32C are opposite.
In the example shown in fig. 7 in particular, the small diameter end of the first support column 31C abuts against the first support ring 21, and correspondingly, the large diameter end of the first support column 31C abuts against the second support ring 22; the small diameter end of the second support column 32C abuts the second support plate 22, and accordingly, the large diameter end of the second support column 32C abuts the first support plate 21.
The screen 11 has a first limiting hole, and the screen 11 is tangent to and limited by the side surface of the first support column 31C through the first limiting hole.
The deceleration grid 13 has a first limiting hole through which the deceleration grid 13 is tangentially restrained to the side of the second supporting column 32C.
The accelerating grid 12 has two positioning holes, which are respectively tangent to the first supporting column 31C and the second supporting column 32C for limiting.
As above, the support columns with the circular truncated cone-shaped structures are matched with the hole structures of the grids to realize dislocation fixation.
In a specific scheme, the screen 11 further has a second limiting hole, and the screen 11 is tangent to and limited by the side surface of the second supporting column 32C through the second limiting hole.
In a specific scheme, the deceleration grid 13 further has a second limiting hole, and the deceleration grid 13 is further tangential and limited with the side surface of the first support column 31C through the second limiting hole.
It can be understood that the screen 11 needs to be matched with both the first support column 31C and the second support column 32C, the screen 11 has two hole structures to be matched with the first support column 31C and the second support column 32C, and in actual setting, position limitation can be realized only through the first limiting hole matched with the first support column 31C, or both the two holes have a limiting function; the case of the deceleration grid 13 is also similar and will not be described again.
Likewise, the first support ring 21 and the second support ring 22 are also provided with a stopper groove for restricting the first support column 31C and the second support column 32C.
The fourth embodiment:
referring to fig. 9, fig. 9 is a partial cross-sectional view of a gate structure according to a fourth embodiment of the present invention.
This embodiment is similar to the third embodiment except that the gate structure is not provided with the deceleration grid, only the screen grid 11 and the acceleration grid 12 are provided, as compared with the third embodiment shown in fig. 7.
Based on the structural arrangement without the deceleration grid, the support columns in the embodiment include a first support column 31D and a second support column 32D, which are also in a circular truncated cone-shaped structure; the small diameter end of the first support column 31D abuts against the first support ring 21, and correspondingly, the large diameter end of the first support column 31D abuts against the second support ring 22; the small diameter end of the second support column 32D abuts the second support ring 22, and accordingly, the large diameter end of the second support column 32D abuts the first support ring 21.
The screen 11 is provided with a first limiting hole, and the screen 11 is tangent to and limited by the side surface of the first support column 31D through the first limiting hole; the accelerating grid 12 has a first positioning hole, and the accelerating grid 12 is tangent to and limited by the side surface of the second supporting column 32D through the first positioning hole.
In a specific scheme, the screen 11 further has a second limiting hole, and the screen 11 is tangent to and limited by the side surface of the second supporting column 32D through the second limiting hole.
In a specific embodiment, the accelerating grid 12 further has a second limiting hole, and the accelerating grid 12 is further tangentially limited to the side surface of the first supporting column 31D through the second limiting hole.
Similarly, the first support ring 21 and the second support ring 22 are each provided with a stopper groove for restricting the first support column 31D and the second support column 32D.
Besides the grid structure, the utility model also provides an ion source device, including above-mentioned grid structure, the grid structure is located the front end that the ion source exported.
The utility model also provides an ion beam equipment, this ion beam equipment include above-mentioned ion source device.
The ion beam equipment and the ion source device comprise the grid structure, have the same technical effects, and are not described again.
It is right above that the utility model provides an ion beam equipment, ion source device and grid structure all introduces in detail. The principles and embodiments of the present invention have been explained herein using specific examples, and the above descriptions of the embodiments are only used to help understand the method and its core ideas of the present invention. It should be noted that, for those skilled in the art, without departing from the principle of the present invention, the present invention can be further modified and modified, and such modifications and modifications also fall within the scope of the appended claims.
Claims (20)
1. The grid structure of the ion source device comprises a screen grid and an accelerating grid which are arranged in parallel; the device is characterized by also comprising a first support ring, a second support ring and a support column;
the first support ring and the second support ring are arranged in parallel, and the screen grid and the acceleration grid are positioned between the first support ring and the second support ring;
the supporting column is an insulating column, two ends of the supporting column are respectively abutted against the first supporting ring and the second supporting ring, and the screen grid and the accelerating grid are arranged on the supporting column in a spaced manner;
the first support ring and the second support ring are fixedly connected through a plurality of fasteners.
2. The ion source apparatus of claim 1, further comprising a spacer structure for defining a relative position between the accelerating grid and the screen grid.
3. The grid structure of an ion source device according to claim 2, wherein the support columns comprise a first support column and a second support column;
the first support column is provided with a first step surface facing the first support ring, and the first step surface presses the screen grid against the first support ring;
the second support column has a second step surface facing the second support ring, the second step surface pressing the acceleration grid against the second support ring.
4. The grid structure of an ion source device according to claim 2, wherein the support column comprises a first support column and a second support column, both of which are in a truncated cone-shaped structure;
the small-diameter end of the first support column is abutted against the first support ring, the screen grid is provided with a first limiting hole, and the screen grid is tangent to and limited by the side surface of the first support column through the first limiting hole;
the small-diameter end of the second supporting column is abutted to the second supporting ring, the accelerating grid is provided with a first positioning hole, and the accelerating grid is tangent and limited to the side surface of the second supporting column through the first positioning hole.
5. The gate structure of claim 4, wherein the screen further comprises a second position-limiting hole, and the screen further tangentially positions the side of the second support pillar through the second position-limiting hole.
6. The grid structure of claim 4, wherein the accelerating grid further comprises a second positioning hole, and the accelerating grid is further tangentially limited to the side of the first support column by the second positioning hole.
7. The grid structure of an ion source device according to claim 1, further comprising a deceleration grid, wherein the deceleration grid is located on a side of the acceleration grid away from the screen grid, and the deceleration grid is also sleeved on the support column.
8. The ion source apparatus of claim 7, further comprising a position limiting structure for defining a relative position between the acceleration grid and the screen grid, and for defining a relative position between the acceleration grid and the deceleration grid.
9. The grid structure of an ion source device according to claim 8, wherein the support columns comprise a first support column and a second support column;
the first support column is provided with a first step surface and a second step surface which face the first support ring, and the first step surface is close to the first support ring relative to the second step surface;
the second support column is provided with a third step surface and a fourth step surface which face the second support ring, and the third step surface is close to the second support ring relative to the fourth step surface;
the first step surface presses the screen grid against the first support ring;
the second step surface and the fourth step surface clamp two side surfaces of the accelerating grid;
the third step surface presses the speed reducing grid against the second support ring.
10. The grid structure of claim 8, wherein said support posts comprise a first support post and a second support post, both of which are in a truncated cone-like configuration;
the small-diameter end of the first support column is abutted against the first support ring, the screen grid is provided with a first limiting hole, and the screen grid is tangent to and limited by the side surface of the first support column through the first limiting hole;
the small-diameter end of the second supporting column abuts against the second supporting ring, the deceleration grid is provided with a first limiting hole, and the deceleration grid is tangentially limited with the side surface of the second supporting column through the first limiting hole;
the accelerating grid is provided with two positioning holes which are respectively tangent and limited with the first supporting column and the second supporting column.
11. The ion source apparatus of claim 10, wherein the screen further comprises a second position-limiting hole, and the screen further tangentially positions the side of the second support pillar through the second position-limiting hole.
12. The ion source apparatus of claim 10, wherein said deceleration grid further comprises a second limiting aperture, said deceleration grid further being positioned tangentially to a side of said first support column through said second limiting aperture.
13. The ion source device grid structure according to any one of claims 3 to 6 and 9 to 12, wherein each of said fasteners is provided with one of said first support column and one of said second support column on both sides thereof.
14. The ion source apparatus of any of claims 1-12, wherein at least one of the first support ring and the second support ring has a retaining groove, and the support post is inserted into the retaining groove.
15. The grid structure of claim 14, wherein said first support ring and said second support ring each have a retaining groove.
16. The ion source apparatus grid structure of any of claims 1-12, wherein said support posts are ceramic support posts.
17. The grid structure of an ion source device according to any of claims 1 to 12, wherein said first support ring and said second support ring are both conductive support rings, and said first support ring and said second support ring are insulated from each other.
18. The grid structure of an ion source device according to claim 17, wherein said fasteners comprise screws and nuts, said screws passing through said first support ring and said second support ring and being fastened by said nuts;
the nut is positioned on one side, away from the second support ring, of the first support ring, an insulating cap is arranged between the nut and the first support ring, and the insulating cap is sleeved on the screw in a sleeving manner; or the nut is positioned on one side, far away from the first support ring, of the second support ring, an insulating cap is arranged between the nut and the second support ring, and the insulating cap is sleeved on the screw in an outer mode.
19. An ion source apparatus comprising a grid structure located at the front end of an ion source outlet, wherein the grid structure is as claimed in any one of claims 1 to 18.
20. Ion beam apparatus, characterized in that it comprises an ion source device according to claim 19.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202223183902.2U CN218585922U (en) | 2022-11-29 | 2022-11-29 | Ion beam equipment, ion source device and grid structure thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202223183902.2U CN218585922U (en) | 2022-11-29 | 2022-11-29 | Ion beam equipment, ion source device and grid structure thereof |
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| Publication Number | Publication Date |
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| CN218585922U true CN218585922U (en) | 2023-03-07 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202223183902.2U Active CN218585922U (en) | 2022-11-29 | 2022-11-29 | Ion beam equipment, ion source device and grid structure thereof |
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| Country | Link |
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| CN (1) | CN218585922U (en) |
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