CN218423651U

CN218423651U - Nozzle structure and rubber coating developing equipment

Info

Publication number: CN218423651U
Application number: CN202222053372.3U
Authority: CN
Inventors: 马杰; 赵定云
Original assignee: Wuxi Yisheng Semiconductor Co ltd
Current assignee: Wuxi Yisheng Semiconductor Co ltd
Priority date: 2022-08-04
Filing date: 2022-08-04
Publication date: 2023-02-03
Anticipated expiration: 2032-08-04

Abstract

The utility model discloses a nozzle structure and rubber coating developing equipment, the nozzle structure is including spraying the main part and wasing the subassembly, the lower extreme that sprays the main part is provided with the jet, the jet is used for spraying liquid, wash the subassembly including wash the seat and locate the washing nozzle who washs the seat, the one end of wasing the seat is articulated mutually with spraying the main part, so that in the rotation stroke of wasing the seat, it can set up relatively with the jet to wash the nozzle, and be used for spraying water to the jet, in order to wash the jet, when needs wash the jet, rotate and wash the seat, make and wash the seat and move to washing nozzle and jet set up relatively, through washing nozzle water spray, in order to wash the jet, after wasing the completion, rotate and wash the seat, make and wash nozzle and jet dislocation mutually, avoid interfering with the jet, guarantee that the jet normally sprays glue, moreover, the steam generator is simple structure, and easy operation.

Description

Nozzle structure and rubber coating developing equipment

Technical Field

The utility model relates to a rubber coating development art field, concretely relates to nozzle structure and rubber coating development equipment.

Background

In the field of semiconductor production, glue spreading is a process for coating photoresist on a semiconductor wafer, belongs to a photoetching process, and forms a most critical technological process with the most repetition times in the whole semiconductor manufacturing process together with an exposure and development system, so that the glue spreading has an important influence on the improvement of the product integration level and the yield; the glue spreading and developing equipment is essential processing equipment in the manufacturing process of semiconductor chips, the glue spreading and developing equipment utilizes a mechanical arm to realize the transmission and processing of wafers among systems, and the glue spreading and developing equipment is perfectly matched with a photoetching machine so as to complete the technological processes of photoresist coating, curing, developing and the like of the wafers.

The rubber coating development equipment during operation need use the nozzle to process, among the prior art, need dismantle the nozzle after the long-time use of nozzle and wash, assemble the nozzle again after the washing is accomplished, so complex operation, greatly increased workman's work burden.

SUMMERY OF THE UTILITY MODEL

The utility model aims at providing a nozzle structure and rubber coating development equipment, aim at solving prior art, need dismantle the nozzle and wash after the long-time use of nozzle, assemble the nozzle again after wasing the completion, so complex operation, greatly increased workman's the problem of work burden.

In order to achieve the above object, the present invention provides a nozzle structure, including:

the liquid ejecting device comprises an ejecting main body, wherein the lower end of the ejecting main body is provided with an ejecting opening, and the ejecting opening is used for ejecting liquid; and the number of the first and second groups,

and the cleaning assembly comprises a cleaning seat and a cleaning nozzle arranged on the cleaning seat, one end of the cleaning seat is hinged with the jet main body, so that in the rotation stroke of the cleaning seat, the cleaning nozzle can be arranged opposite to the jet orifice and is used for spraying water to the jet orifice to clean the jet orifice.

Optionally, the cleaning seat is formed with a groove, and the periphery of the groove is used for being in sealing abutment with the lower end face of the injection main body.

Optionally, the cleaning seat is further formed with a water accumulation cavity, the water accumulation cavity is located below the containing groove, and the water accumulation cavity is communicated with the containing groove through a communication hole;

the cleaning assembly further comprises a one-way conduction structure, and the one-way conduction structure is installed in the communication hole and used for conducting in the direction from the containing groove to the water accumulation cavity.

Optionally, the communication hole has an inlet and an outlet sequentially arranged from top to bottom, the one-way conduction structure includes a main flow channel section and a sub-flow channel section, the main flow channel section communicates the inlet and the outlet, the sub-flow channel section is formed with a sub-channel inlet and a sub-channel outlet both communicating with the main flow channel section, and the sub-channel inlet and the sub-channel outlet are both arranged towards the outlet; and/or the presence of a gas in the gas,

the communicating hole is arranged in the middle of the bottom of the containing groove, and the bottom of the containing groove is gradually inclined downwards from the edge to the middle; and/or the presence of a gas in the gas,

the cleaning seat is further provided with a water outlet which is communicated with the water accumulation cavity, and the water outlet is positioned above the communicating hole.

Optionally, the one-way conduction structure is provided in plurality, and a plurality of main flow channel sections of the one-way conduction structure are communicated with each other.

Optionally, the main flow channel sections of two adjacent unidirectional conduction structures are arranged in an included angle; and/or the presence of a gas in the gas,

and the secondary flow channel sections of two adjacent unidirectional conduction structures are respectively arranged on two sides of the primary flow channel section in the width direction.

Optionally, the injection main body is further provided with a liquid inlet and a flow channel communicated with the liquid inlet and the injection port, a separation block is arranged in the flow channel, the separation block separates the flow channel into a liquid storage flow channel and a liquid drainage flow channel which are arranged at intervals in the left-right direction and are communicated with each other, the liquid storage flow channel is communicated with the liquid inlet, the liquid drainage flow channel is communicated with the injection port, and the liquid drainage flow channel is arranged in an assembly inclined downward manner in the direction from the liquid storage flow channel to the liquid drainage flow channel.

Optionally, the nozzle structure further comprises a heating assembly mounted to the spray body for heating the liquid discharge flow channel.

Optionally, the injection main body is further provided with an installation cavity, the installation cavity is annularly arranged and surrounds the periphery of the liquid discharge flow channel, and the installation cavity is used for storing a heat exchange medium;

the heating assembly comprises a heater, and the heater is arranged on the injection main body and used for heating the heat exchange medium in the installation cavity.

In order to achieve the above object, the utility model provides a rubber coating developing device, rubber coating developing device includes as above nozzle structure, nozzle structure includes:

the liquid spraying device comprises a spraying main body, a liquid spraying nozzle and a liquid discharging nozzle, wherein the lower end of the spraying main body is provided with a spraying port used for spraying liquid; and (c) a second step of,

The utility model provides an among the technical scheme, right as needs when the jet washs, rotate the washing seat, make the washing seat move extremely the washing nozzle with the jet sets up relatively, through wash the nozzle water spray, so that right the jet nozzle washs, when wasing the completion back, rotates the washing seat, make the washing nozzle with the jet misplaces mutually, avoids with the jet takes place to disturb, guarantees the jet normally sprays glue, simple structure, and easy operation.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the structures shown in the drawings without creative efforts.

Fig. 1 is a schematic structural diagram of an embodiment of a nozzle structure provided in the present invention;

fig. 2 is a partially enlarged view of a point a in fig. 1.

The reference numbers illustrate:

the object of the present invention is to provide a novel and advantageous solution for the above mentioned problems.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.

It should be noted that, if the present invention relates to a directional indication, the directional indication is only used to explain the relative position relationship between the components, the motion situation, etc. in a specific posture, and if the specific posture is changed, the directional indication is changed accordingly.

In addition, if there is a description relating to "first", "second", etc. in the embodiments of the present invention, the description of "first", "second", etc. is for descriptive purposes only and is not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In addition, the technical solutions in the embodiments may be combined with each other, but it must be based on the realization of those skilled in the art, and when the technical solutions are contradictory to each other or cannot be realized, such a combination should not be considered to exist, and is not within the protection scope of the present invention.

In the field of semiconductor production, glue coating is a process for coating photoresist on a semiconductor wafer, belongs to a photoetching procedure, and forms the most critical technological process with the most repeated times in the whole semiconductor manufacturing process together with an exposure and development system, thereby having important influence on improving the integration level and the yield of products; the glue spreading and developing equipment is essential processing equipment in the manufacturing process of semiconductor chips, the glue spreading and developing equipment utilizes a mechanical arm to realize the transmission and processing of wafers among systems, and the glue spreading and developing equipment is perfectly matched with a photoetching machine so as to complete the technological processes of photoresist coating, curing, developing and the like of the wafers.

The nozzle is needed to be used for spraying glue when the gluing developing equipment works for gluing, in the prior art, the nozzle needs to be disassembled for cleaning after long-time use, the nozzle is assembled again after cleaning is completed, so that the operation is complex, and the labor burden of workers is greatly increased.

In view of this, the utility model provides a rubber coating developing device, rubber coating developing device includes nozzle structure, and fig. 1 to fig. 2 are the utility model provides a schematic diagram of an embodiment of nozzle structure.

Referring to fig. 1 to 2, the nozzle structure 100 includes a spraying body 1 and a cleaning assembly 2, a spraying port 11 is disposed at a lower end of the spraying body 1, the spraying port 11 is used for spraying liquid, the cleaning assembly 2 includes a cleaning seat 21 and a cleaning nozzle 22 disposed on the cleaning seat 21, and one end of the cleaning seat 21 is hinged to the spraying body 1, so that the cleaning nozzle 22 can be disposed opposite to the spraying port 11 in a rotation stroke of the cleaning seat 21 and is used for spraying water to the spraying port 11 to clean the spraying port 11.

The utility model provides an among the technical scheme, right as required when the jet 11 washs, rotate wash seat 21, make wash seat 21 move extremely wash nozzle 22 with jet 11 sets up relatively, through wash the nozzle water spray, it is right to wash the jet nozzle, after wasing the completion, rotate wash seat 21, make wash nozzle 22 with jet 11 misplaces mutually, avoid with jet 11 takes place to disturb, guarantees jet 11 normally sprays glue, simple structure, and easy operation.

Specifically, referring to fig. 1, the cleaning seat 21 is formed with a receiving groove 211, and when the ejection opening 11 needs to be cleaned, the periphery of the receiving groove 211 is in sealing contact with the lower end surface of the ejection body 1, so as to prevent splashing of water ejected during cleaning from contaminating the workbench.

Further, wash seat 21 and still be formed with ponding chamber 212, ponding chamber 212 is located the below of holding groove 211, ponding chamber 212 with hold and be linked together through intercommunicating pore a between the groove 211, it still includes one-way conduction structure to wash subassembly 2, one-way conduction structure install in the intercommunicating pore a, through one-way conduction structure 3 by hold groove 211 extremely ponding chamber 212 direction switches on intercommunicating pore a so sets up for wash the sewage behind the jet orifice 11 can directly by intercommunicating pore a arranges extremely ponding chamber 212, and avoid rotating during washing seat 21, lead to the rivers play in the ponding chamber 212, pollute the workstation, effectual.

Specifically, the one-way guiding structure 3 may include a one-way valve, and specifically, in the embodiment of the present application, the communication hole a has an inlet a1 and an outlet a2 that are sequentially arranged from top to bottom, the one-way guiding structure 3 includes a main flow channel section 31 and a secondary flow channel section 32, the main flow channel section 31 communicates with the inlet a1 and the outlet a2, the secondary flow channel section 32 is formed with a secondary channel inlet 321 and a secondary channel outlet 322 that both communicate with the main flow channel section 31, the secondary channel inlet 321 and the secondary channel outlet 322 are both arranged toward the outlet a2, so that when the sewage flows from the inlet a1 to the outlet a2, the sewage in the secondary flow channel section 32 flows from the secondary channel inlet 321 to the secondary channel outlet 322, the sewage flow direction in the main flow channel section 32 is the same as the sewage flow direction in the secondary channel section 31, and thus the sewage flow in the sewage containing channel 211 is fast toward the sewage containing cavity 212, and when the sewage flows from the secondary channel inlet 321 to the secondary channel outlet 322, the secondary channel inlet 321 and the secondary channel outlet 322 is opposite to the sewage flow direction in the main flow channel section 31, so that the sewage flow resistance of the secondary channel section is increased, and the sewage containing channel section 211 is increased.

In order to enable the sewage to flow to the water-collecting cavity 212 quickly, referring to fig. 1, the communication hole a is arranged in the middle of the bottom of the accommodating groove 211, and the bottom of the accommodating groove 211 is inclined downwards gradually from the edge to the middle, so that the sewage can flow to the water-collecting cavity 212 quickly, and the structure is simple and the effect is good.

Considering that when the sewage in the water collecting cavity 212 is fully collected, the sewage needs to be discharged, the cleaning seat 21 is further provided with a sewage discharge port 213, the sewage discharge port 213 is communicated with the water collecting cavity 212, and the sewage discharge port 213 is positioned above the communicating hole a, so that the capability of collecting the sewage in the water collecting cavity 212 is increased, and the sewage is discharged through the sewage discharge port 213, the structure is simple, and the operation is easy.

Specifically, one-way conduction structure 3 sets up a plurality ofly, and is a plurality of one-way conduction structure 3's mainstream passageway section 31 intercommunication sets up, so sets up, through a plurality of one-way conduction structure 3 combined action has increased sewage by outfall a2 to the resistance of inflow mouth a1 circulation, avoids sewage by outfall a2 gets into inflow mouth a1 leads to the sewage outflow, pollutes the workstation.

Furtherly, adjacent two the mainstream passageway section 31 of unidirectional flux structure 3 is the contained angle setting, so sets up for unidirectional flux blowdown is effectual.

Furthermore, the secondary flow channel sections 32 of two adjacent unidirectional conduction structures 3 are respectively arranged on two sides of the primary flow channel section 31 in the width direction, so that the structure is compact, and the volume of the unidirectional conduction structure 3 is reduced to a certain extent.

Specifically, referring to fig. 2, the injection main body 1 is further formed with a liquid inlet 12 and a flow channel 13 communicating the liquid inlet 12 with the injection port 11, a partition block 4 is disposed in the flow channel 13, the partition block 4 partitions the flow channel 13 into a liquid storage flow channel 13a and a liquid drainage flow channel 13b which are disposed at intervals in the left-right direction and are communicated with each other, the liquid storage flow channel 13a communicates with the liquid inlet 12, the liquid drainage flow channel 13b communicates with the injection port 11, and the liquid drainage flow channel 13b is disposed in a downward-inclined manner in the direction from the liquid storage flow channel 13a to the liquid drainage flow channel 13b, so that after the liquid to be injected enters the liquid storage flow channel 13a from the liquid inlet 12, the liquid to be injected slowly gathers until the liquid to flow through the partition block 4 into the liquid drainage flow channel 13b, so that the liquid to be injected is uniformly distributed, the liquid to be injected can play a role of buffering when the liquid to be injected passes through a slope, so as to prevent the liquid to be injected from affecting the distribution uniformity too fast, and finally the liquid to be injected from flowing out through the injection port 11, thereby achieving uniform injection of the liquid.

In order to improve the spraying effect, the spraying opening 11 is arranged in a longitudinal shape, so that the liquid sprayed by the spraying opening 11 forms a water curtain, the spraying efficiency is improved, the spraying is uniform, and the spraying collision is easy to control.

Considering that the temperature will affect the spraying effect, the nozzle structure 100 further includes a heating component, the heating component is installed on the spraying main body 1, and the heating component heats the liquid discharge flow channel, so that the liquid to be sprayed in the liquid discharge flow channel is at a proper temperature, and the liquid spraying effect is ensured.

It should be noted that the heating assembly is of various types, for example, the liquid discharge flow channel is heated by the hot end of the semiconductor refrigeration chip, specifically, in the embodiment of the present application, the injection main body 1 is further provided with an installation cavity 14, the installation cavity 14 is annularly disposed and surrounds the periphery of the liquid discharge flow channel 13b, the installation cavity 14 is used for storing a heat exchange medium, the heating assembly includes a heater, the heater is installed in the injection main body 1, the heat exchange medium in the installation cavity 14 is heated by the heater, so that the temperature of the heat exchange medium is raised by the heater, the liquid to be injected in the liquid discharge flow channel is heated by the heat exchange medium raised by the temperature, and the heating effect is good.

It should be noted that the heater may be installed in the installation cavity, and directly heats the heat exchange medium in the installation cavity, and certainly, the heater may also be installed outside the installation cavity, and is communicated with the installation cavity through a circulation pipeline arranged on the injection main body, the heater is used to heat the circulation pipeline, a circulation pump is arranged on the circulation pipeline, and the circulation pump enables the heat exchange medium in the installation cavity to flow out through the circulation pipeline and be heated, and then the heated heat exchange medium flows into the installation cavity again, so that the heat exchange effect is good.

Set up wash seat 21 and move to making wash nozzle 22 can with the relative position that sets up of jet 11 is for wasing the position, for the convenience of washing, spray main part 1 with still be provided with first spacing joint structure between the wash seat 21, through first spacing joint structure will wash seat 21 spacing in wash the position, so, be convenient for wash nozzle 22 right jet 11 washs.

It should be noted that the first limiting clamping structure may be of various types, for example, the first limiting clamping structure may be configured as a clamping groove and a clamping protrusion adapted to the clamping groove, and may further be a magnetic attraction portion and a magnetic attraction portion, where the magnetic attraction portion is magnetically attracted to each other and the magnetic attraction portion is matched to the magnetic attraction portion, where the magnetic attraction portion is not specifically limited in this application.

Further, it is set that the cleaning seat 21 moves to a position where the cleaning nozzle 22 and the jet orifice 11 are staggered with each other, and the jet orifice 11 is a avoiding position, in order to spray liquid, a second limiting clamping structure is further arranged between the jet main body 1 and the cleaning seat 21, and the cleaning seat 21 is limited at the avoiding position by the second limiting clamping structure, so that the cleaning nozzle 22 is prevented from interfering the jet orifice 11.

It should be noted that the second limit clamping structure may be of various types, for example, the second limit clamping structure may be configured as a clamping groove and a clamping protrusion adapted to the clamping groove, and may further be a magnetic attraction portion and a magnetic attraction portion cooperating with the magnetic attraction portion, and specifically, the present application does not limit this.

The above is only the optional embodiment of the present invention, and not therefore the limit to the patent scope of the present invention, all the equivalent structures made by the contents of the specification and the drawings, or directly or indirectly applied to other related technical fields, are included in the patent protection scope of the present invention.

Claims

1. A nozzle arrangement, comprising:

2. The nozzle structure according to claim 1, wherein the purge seat is formed with a receiving groove having a peripheral edge for sealing abutment with a lower end surface of the spray main body.

3. The nozzle structure as claimed in claim 2, wherein the cleaning seat is further formed with a water accumulation cavity which is located below the containing groove, and the water accumulation cavity is communicated with the containing groove through a communication hole;

the cleaning assembly further comprises a one-way conduction structure, and the one-way conduction structure is arranged in the communication hole and used for conducting in the direction from the containing groove to the water accumulation cavity.

4. The nozzle structure according to claim 3, wherein the communication hole has an inlet and an outlet arranged in order from top to bottom, the one-way communication structure includes a main flow passage section and a sub flow passage section, the main flow passage section communicates the inlet and the outlet, the sub flow passage section is formed with a sub passage inlet and a sub passage outlet both communicating with the main flow passage section, and the sub passage inlet and the sub passage outlet are both arranged toward the outlet; and/or the presence of a gas in the gas,

the cleaning seat is further provided with a water outlet which is communicated with the water accumulation cavity, and the water outlet is located above the communicating holes.

5. The nozzle structure according to claim 4, wherein the one-way conduction structure is provided in plurality, and the main flow passage sections of the one-way conduction structure are provided in communication.

6. The nozzle structure of claim 5, wherein the main flow channel segments of two adjacent one-way conduction structures are arranged at an included angle; and/or the presence of a gas in the gas,

and the secondary flow channel sections of two adjacent one-way conduction structures are respectively arranged at two sides of the primary flow channel section in the width direction.

7. The nozzle structure according to claim 1, wherein the injection body further comprises a liquid inlet and a flow channel connecting the liquid inlet and the injection port, a partition block is disposed in the flow channel, the partition block divides the flow channel into a liquid storage flow channel and a liquid discharge flow channel spaced from each other in a left-right direction and connected to each other, the liquid storage flow channel is connected to the liquid inlet, the liquid discharge flow channel is connected to the injection port, and the liquid discharge flow channel is inclined downward from the liquid storage flow channel to the liquid discharge flow channel.

8. The nozzle structure of claim 7, further comprising a heating assembly mounted to the spray body for heating the liquid discharge flow path.

9. The nozzle structure according to claim 8, wherein the spray body is further provided with a mounting cavity, the mounting cavity is arranged in an annular shape and surrounds the periphery of the liquid discharge flow channel, and the mounting cavity is used for storing a heat exchange medium;

the heating assembly comprises a heater, and the heater is mounted on the injection main body and used for heating the heat exchange medium in the mounting cavity.

10. A paste developing apparatus comprising the nozzle arrangement according to any one of claims 1 to 9.