CN218412144U

CN218412144U - Wafer substrate performance detection equipment

Info

Publication number: CN218412144U
Application number: CN202222573484.1U
Authority: CN
Inventors: 韩五静; 王思远; 陈磊
Original assignee: Anhui Fulede Changjiang Semiconductor Material Co ltd
Current assignee: Anhui Fulede Changjiang Semiconductor Material Co ltd
Priority date: 2022-09-28
Filing date: 2022-09-28
Publication date: 2023-01-31
Anticipated expiration: 2032-09-28

Abstract

The utility model discloses a wafer substrate performance check out test set, including detection device and the conveying equipment who carries the determinand, detection device installs in the conveying equipment upper end, detection device includes testing platform, the testing platform lower extreme rotates and is connected with the mounting disc, the test tube is installed to the mounting disc lower extreme, the test tube is divided into first end and second end according to vertical height, the first end of test tube is located one side near conveying equipment, the first end of test tube is provided with the test section, the intermediate position of test section is opened there is the opening, the second end intercommunication of test tube has gaseous controlling means, the conveying equipment upper end is provided with drive arrangement, through drive arrangement is with drive testing platform linear movement. The utility model discloses it has solved the problem of how to carry out high efficiency detection in succession to substrate surface defect.

Description

Wafer substrate performance detection equipment

Technical Field

The utility model relates to a check out test set technical field especially relates to a wafer substrate performance check out test set.

Background

The substrate is a raw material for processing the wafer, the quality of the substrate directly influences the quality of the wafer, the substrate needs to be subjected to multiple steps of cutting, grinding, polishing and the like, and finally, a preset size is produced according to the processing of the wafer; mechanical extrusion and mechanical friction of the substrate during processing are difficult to avoid, damage is generated on the surface of the substrate, the phenomena of uneven thickness of the substrate, scratches, warping and the like on the surface are caused, and the quality of the substrate is influenced.

The substrate detection method has various modes, wherein the thickness of multiple points of the substrate can be detected by a mechanical detection instrument, so that whether the thickness and the surface flatness of the substrate meet the requirements or not can be judged visually; in the patent document, a step profiler (publication No. CN 110763129A) for detecting the thickness of a chip substrate detects the thickness of a wafer through the step profiler, so that the related parameters of the substrate can be visually displayed, and in the detection process, a detection person needs to continuously adjust the position of the substrate, so that the detection efficiency is low, and in the similar mechanical detection process, it is difficult to avoid direct contact with the surface of the substrate in the detection process, which easily causes scratches on the surface of the substrate and affects the quality performance of the substrate.

SUMMERY OF THE UTILITY MODEL

The utility model aims at solving the defects existing in the prior art, and providing a wafer substrate performance detection device, which solves the problem of how to continuously and efficiently detect the surface defects of a substrate.

In order to realize the purpose, the utility model adopts the following technical scheme:

the utility model provides a wafer substrate performance detection equipment, includes detection device and the conveying equipment of carrying the determinand, detection device installs in the conveying equipment upper end, detection device includes testing platform, the testing platform lower extreme rotates and is connected with the mounting disc, the test tube is installed to the mounting disc lower extreme, the test tube is divided into first end and second end according to vertical height, the first end of test tube is located one side near conveying equipment, the first end of test tube is provided with the detection portion, the intermediate position of detection portion is opened there is the opening, the second end intercommunication of test tube has gaseous controlling means, the conveying equipment upper end is provided with drive arrangement, through drive arrangement is with drive testing platform linear movement, the inside pressure detection component that is provided with of test tube, through pressure detection component is in order to reflect the testing tube internal pressure size.

Preferably, the detection part is detachably fixed with the first end of the detection tube.

Preferably, the conveying equipment upper end fixedly connected with first mount pad, first mount pad upper end detachably installs the second mount pad that is used for placing the determinand.

Preferably, the first mounting seat side wall is provided with a level detection instrument, and the level detection instrument is used for detecting the levelness of the second mounting seat.

Preferably, the number of the detection tubes is two, the two detection tubes are located at the lower end of the mounting plate, and an adjusting device for controlling the two detection tubes to move synchronously is arranged on the side wall of the lower end of the mounting plate.

Preferably, adjusting device includes the regulation base, it is provided with the installation slider respectively to adjust the base both sides, the installation slider all with mounting disc lower extreme surface sliding connection, it is connected with double threaded rod to adjust the base lateral wall rotation, two threaded portion of double threaded rod respectively with two installation slider threaded connection, it installs control double threaded rod pivoted electrically controlled device to adjust the base lateral wall.

Preferably, the driving device comprises an electric sliding rail, the side wall of the electric sliding rail is connected with an electric sliding block in a sliding mode, and the electric sliding block is fixedly connected with the detection platform through a mounting workpiece.

Preferably, the rotary sealing element is installed at the upper end of the detection platform, the first end of the rotary sealing element is communicated with the detection pipe through a first connecting pipeline, and the second end of the rotary sealing element is communicated with the gas control device through a second connecting pipeline.

Compared with the prior art, the utility model, its beneficial effect does:

the object to be detected can be continuously detected in the conveying process, and the detection tube can continuously rotate, so that the surface of the object to be detected can be continuously detected, and the detection efficiency is improved; the detection tube is arranged to be close to the surface of the object to be detected, the detection end blows air, when the surface of the object to be detected has defects, the pressure in the detection tube fluctuates due to the change of the air discharge rate, the pressure detection element can detect the pressure, and the quality of the object to be detected can be visually judged; the detection tube does not need to be in contact with the object to be detected in a gas detection mode, so that the surface of the object to be detected is not damaged in the detection process, and defective products caused by detection are avoided; through setting up two detection tubes synchronous rotation, two detection tubes are located the both ends symmetric position of determinand, can improve detection rate in the middle of rotating the process, detect the both sides that the gas force that blows out acted on the determinand, can guarantee the relatively stable of determinand in the middle of the testing process, guarantee the precision of testing result, improve the detection accuracy.

Drawings

Fig. 1 is a schematic perspective view of a wafer substrate performance inspection apparatus according to the present invention;

fig. 2 is a schematic side view of a first side of a wafer substrate performance inspection apparatus according to the present invention;

fig. 3 is a schematic top view of the wafer substrate performance testing apparatus according to the present invention;

fig. 4 is a schematic side view of a wafer substrate performance inspection apparatus according to the present invention;

fig. 5 isbase:Sub>A schematic sectional view ofbase:Sub>A-base:Sub>A line ofbase:Sub>A wafer substrate performance inspection apparatus according to the present invention.

In the figure: 1. a conveying device; 2. an object to be tested; 201. a first mounting seat; 202. a second mounting seat; 3. a detection platform; 301. mounting a disc; 4. a detection tube; 401. a detection unit; 5. a drive device; 501. an electric slide rail; 502. an electric slider; 6. an adjustment device; 601. an adjusting base; 602. a double-headed threaded rod; 603. installing a sliding block; 7. a second connecting pipe; 701. the seal is rotated.

Detailed Description

In order to make the above objects, features and advantages of the present invention more comprehensible, embodiments of the present invention are described in detail below with reference to the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. The present invention can be embodied in many different forms other than those specifically described herein, and it will be apparent to those skilled in the art that similar modifications can be made without departing from the spirit and scope of the invention, and it is therefore not to be limited to the specific embodiments disclosed below.

It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and the like as used herein are for illustrative purposes only and do not represent the only embodiments.

Referring to fig. 1-5, a wafer substrate performance testing apparatus includes a testing device and a conveying apparatus 1 for conveying an object 2 to be tested, the object 2 to be tested is a substrate, hereinafter, the substrate is referred to as the object 2, wherein the testing device is installed at the upper end of the conveying apparatus 1, the testing device includes a testing platform 3, the lower end of the testing platform 3 is rotatably connected with a mounting plate 301, a testing tube 4 is installed at the lower end of the mounting plate 301, the testing tube 4 is divided into a first end and a second end according to a vertical height, the first end of the testing tube 4 is located at a side close to the conveying apparatus 1, a testing portion 401 is provided at the first end of the testing tube 4, a through hole is opened at a middle position of the testing portion 401, the through hole is preferably circular, a position of the through hole is located at a middle portion of the testing portion 401, a predetermined distance is provided between an edge position of the through hole and an outer edge position of the testing tube 4, a distance through which a gas can be extended to improve a resistance of the gas in a flowing process, when a gap is increased due to a defect on the surface of the object 2 to be tested, a rate of the gas flowing out becomes larger, and accordingly, a surface quality of the object 2 can be tested.

The second end of the detection tube 4 is communicated with a gas control device, wherein the gas control device can control gas to enter the detection tube 4, the upper end of the conveying device 1 is provided with a driving device 5, the driving device 5 is used for driving the detection platform 3 to linearly move, a pressure detection element is arranged in the detection tube 4, the pressure detection element is used for reflecting the pressure in the detection tube 4, when the object 2 to be detected is required to be detected, the driving device 5 is used for driving the detection platform 3 to descend, so that the detection tube 4 is positioned at a preset position above the object 2 to be detected, a preset gap is formed between the object 2 to be detected and the detection tube 4, the gas is blown out through the gas control device, when the surface of the object 2 to be detected has defects of unevenness, warping and the like, the speed of the gas blown out from the corresponding detection tube 4 is changed, the pressure in the detection tube 4 can be monitored and recorded through the pressure detection element in the detection tube 4, the detected pressure can reflect the flatness of the surface of the detection tube 4, and further can visually reflect the quality performance of the object 2 to be detected; the pressure detection device is the prior art, and does not relate to improvement, and is not detailed here.

The detecting part 401 is detachably fixed with the first end of the detecting tube 4, wherein the detecting parts 401 with different specifications can be installed to meet the detecting requirements under different conditions.

The upper end of the conveying equipment 1 is fixedly connected with a first mounting seat 201, the upper end of the first mounting seat 201 is detachably provided with a second mounting seat 202 for placing the object to be detected 2, when detection is needed, the object to be detected 2 and the second mounting seat 202 are only required to be synchronously placed at the upper end of the first mounting seat 201, and damage caused by direct contact with the object to be detected 2 is avoided; be provided with horizontal detection instrument at first mount pad 201 lateral wall, through the levelness of horizontal detection instrument in order to detect second mount pad 202, in the middle of the process that detecting tube 4 detected, parallelism to between detecting tube 4 and the determinand 2 has certain requirement, in the middle of the process of actual detection, require that the border position of detecting tube 4 is unanimous with the interval between the determinand 2, can avoid placing the detection error that the unevenness leads to because determinand 2 through horizontal detection instrument.

Preferably, two detection tubes 4 are arranged, the two detection tubes 4 are both positioned at the lower end of the mounting plate 301, the side wall of the lower end of the mounting plate 301 is provided with an adjusting device 6 for controlling the two detection tubes 4 to move synchronously, wherein the two detection tubes 4 are arranged, the two detection tubes 4 are respectively positioned at two sides of the object to be detected 2 in the detection process, and the adjusting device 6 can control the two detection tubes 4 to approach or separate from each other so as to complete the detection of the inner ring and the outer ring of the wafer; through controlling 3 rotations of testing platform, can detect 2 surperficial a week of determinand, under the unchangeable condition in determinand 2 positions, satisfied the detection demand.

As one of optional adjustment modes, the adjusting device 6 includes an adjusting base 601, two sides of the adjusting base 601 are respectively provided with a mounting slider 603, the mounting sliders 603 are all slidably connected to the lower end surface of the mounting plate 301, the side wall of the adjusting base 601 is rotatably connected with a double-threaded rod 602, two threaded portions of the double-threaded rod 602 are respectively in threaded connection with the two mounting sliders 603, an electric control device for controlling the double-threaded rod 602 to rotate is mounted on the side wall of the adjusting base 601, the double-threaded rod 602 can be driven to rotate by the electric control device, and the two mounting sliders 603 can be controlled to synchronously move outwards or inwards in the middle of the rotating process of the double-threaded rod 602, so as to drive the two detection tubes 4 to synchronously move, and achieve the adjustment purpose.

Wherein drive arrangement 5 includes electronic slide rail 501, and electronic slide rail 501 lateral wall sliding connection has electronic slider 502, and electronic slider 502 is in different positions through installation work piece and testing platform 3 fixed connection through electronic slide rail 501 control electronic slider 502, can control testing platform 3 and detecting tube 4, and control detecting tube 4 removes to different positions to the completion is to the detection of determinand 2.

The rotary sealing element 701 is installed at the upper end of the detection platform 3, the first end of the rotary sealing element 701 is communicated with the detection pipe 4 through a first connecting pipeline, the second end of the rotary sealing element 701 is communicated with the gas control device through a second connecting pipeline 7, the rotary sealing element 701 is the prior art and can be used for connecting the first connecting pipeline and the second connecting pipeline to guarantee that gas is normally conveyed in the rotating process of the installation disc 301.

When the utility model is used, when the object 2 to be detected needs to be detected, the conveying equipment 1 drives the object 2 to be detected to move to the lower part of the detection device, the driving equipment 5 controls the detection platform 3 to descend, and the two detection tubes 4 synchronously descend and can be positioned at preset positions above the object 2 to be detected; the detection gas is controlled to be blown out of the detection part 401 through the gas control equipment, all positions of the surface of the object 2 to be detected can be detected in the moving process of the detection tube 4, when the surface of the object 2 to be detected has defects such as scratches, unevenness and warping, the blowing speed of the gas out of the detection part 401 is changed, a pressure detection element in the detection tube 4 can detect and record the defects, and the integrity degree of the surface of the detection tube 4 can be visually judged through data.

Wherein can control two detection tube 4 synchronous motion through parts such as adjusting base 601, double threaded rod 602, installation slider 603, control two detection tube 4 and be located different positions to rotate mounting disc 301 and be in different angles, can carry out circumference detection to the different positions on determinand 2 surface, follow-up data through reading the pressure detection component reaction can judge the quality on determinand 2 surface.

The above, only be the concrete implementation of the preferred embodiment of the present invention, but the protection scope of the present invention is not limited thereto, and any person skilled in the art is in the technical scope of the present invention, according to the technical solution of the present invention and the utility model, the concept of which is equivalent to replace or change, should be covered within the protection scope of the present invention.

Claims

1. The utility model provides a wafer substrate performance check out test set, includes detection device and conveying equipment (1) of carrying determinand (2), detection device installs in conveying equipment (1) upper end, a serial communication port, detection device includes testing platform (3), testing platform (3) lower extreme rotates and is connected with mounting disc (301), detecting tube (4) are installed to mounting disc (301) lower extreme, detecting tube (4) divide into first end and second end according to vertical height, the first end of detecting tube (4) is located the one side of being close to conveying equipment (1), detecting tube (4) first end is provided with detection portion (401), opening has the opening in detection portion (401) intermediate position, the second end intercommunication of detecting tube (4) has gaseous controlling means, conveying equipment (1) upper end is provided with drive arrangement (5), through drive arrangement (5) are with drive testing platform (3) linear movement, detecting tube (4) inside is provided with pressure detection component, through pressure detection component is in order to reflect the detecting tube (4) pressure size.

2. The wafer substrate performance detecting apparatus according to claim 1, wherein the detecting portion (401) is detachably attached and fixed to the first end of the detecting tube (4).

3. The wafer substrate performance detection device according to claim 1, wherein a first mounting seat (201) is fixedly connected to an upper end of the conveying device (1), and a second mounting seat (202) for placing the object to be detected (2) is detachably mounted on an upper end of the first mounting seat (201).

4. The wafer substrate performance testing apparatus of claim 3, wherein the sidewall of the first mounting seat (201) is provided with a level detecting instrument, and the level detecting instrument is used for detecting the levelness of the second mounting seat (202).

5. The wafer substrate performance detection device according to claim 1, wherein the number of the detection tubes (4) is two, the two detection tubes (4) are both located at the lower end of the mounting plate (301), and the side wall of the lower end of the mounting plate (301) is provided with an adjusting device (6) for controlling the two detection tubes (4) to move synchronously.

6. The wafer substrate performance detection equipment according to claim 5, wherein the adjusting device (6) comprises an adjusting base (601), two sides of the adjusting base (601) are respectively provided with a mounting slider (603), the mounting sliders (603) are both connected with the lower end surface of the mounting disc (301) in a sliding manner, the side wall of the adjusting base (601) is rotatably connected with a double-threaded rod (602), two threaded portions of the double-threaded rod (602) are respectively in threaded connection with the two mounting sliders (603), and an electric control device for controlling the rotation of the double-threaded rod (602) is mounted on the side wall of the adjusting base (601).

7. The wafer substrate performance detection device according to any one of claims 1 to 6, wherein the driving device (5) comprises an electric slide rail (501), a side wall of the electric slide rail (501) is slidably connected with an electric slide block (502), and the electric slide block (502) is fixedly connected with the detection platform (3) through a mounting workpiece.

8. A wafer substrate performance testing apparatus according to any one of claims 1-6, wherein a rotary seal member (701) is mounted on the upper end of the testing platform (3), a first end of the rotary seal member (701) is communicated with the testing tube (4) through a first connecting pipe, and a second end of the rotary seal member (701) is communicated with the gas control device through a second connecting pipe (7).