CN218307186U - Washing system - Google Patents
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- CN218307186U CN218307186U CN202221998111.2U CN202221998111U CN218307186U CN 218307186 U CN218307186 U CN 218307186U CN 202221998111 U CN202221998111 U CN 202221998111U CN 218307186 U CN218307186 U CN 218307186U
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Abstract
The utility model belongs to the technical field of the environmental protection, a washing system for handling polycrystalline silicon production accessory substance is disclosed. The washing system includes: chemical washing tower, chemical washing tower include first casing, are located alkali liquid layer, first packing layer and the first circulation that sets gradually from bottom to top in the first casing and spray the layer, and the air outlet of chemical washing tower is linked together with the air inlet of washing tower to and fan, fan are linked together with the air outlet of washing tower. Wherein, the alkali liquor layer comprises a sludge storage layer and a reaction layer which are arranged from bottom to top in sequence, a pipeline for conveying gas to be treated is inserted into the junction of the sludge storage layer and the reaction layer through an air inlet of the chemical washing tower, and the first circulating spraying layer is connected with the reaction layer through a circulating pumping pipeline. The washing system of the utility model can better treat the by-products produced in the polysilicon production process.
Description
Technical Field
The utility model relates to the technical field of environmental protection, concretely relates to a washing system for handling polycrystalline silicon production accessory substance.
Background
At present, the solar photovoltaic industry and the semiconductor industry develop rapidly, and polycrystalline silicon is an important industrial raw material in the solar industry and the semiconductor industry. SiCl 4 Silicon tetrachloride (STC for short) is used as a byproduct with the largest yield in the polycrystalline Silicon production process, silicic acid and hydrogen chloride gas are generated immediately when the polycrystalline Silicon is exposed to humid air, and the polycrystalline Silicon tetrachloride has strong irritation and belongs to toxic and harmful substances.
In the prior art, high concentrations of SiCl 4 Can be generally recycled and reused, is used for preparing products such as fumed silica, organic silicon products, trichlorosilane and the like, and has higher economic benefit. But a small amount of residual low concentration SiCl 4 Because of the high recycling cost, the treatment is usually carried out in a local treatment mode, which brings great safety hazards to the surrounding ecological environment and operators. In addition, cl is also present as a by-product generated in the polysilicon production process 2 Acid gases such as HCl and the like, and the direct discharge of the acid gases can bring about no small potential safety hazard to the surrounding ecological environment and operators.
SUMMERY OF THE UTILITY MODEL
In order to better treat the byproducts generated in the polysilicon production process, especially the SiCl with low concentration 4 Waste liquid and Cl 2 Acid gases such as HCl, the utility model provides a washing system.
According to the utility model discloses a washing system includes: chemical washing tower, chemical washing tower includes first casing, be located the alkali liquor layer that sets gradually from bottom to top in the first casing, first packing layer and first circulation spray the layer, the washing tower, the gas outlet of chemical washing tower is linked together with the air inlet of washing tower, and the fan, the fan is linked together with the gas outlet of washing tower, wherein, the alkali liquor layer is including the storage mud layer and the reaction layer that set gradually from bottom to top, a juncture for carrying pending gaseous pipeline to insert to storage mud layer and reaction layer through the air inlet of chemical washing tower, first circulation sprays and links to each other through circulation pump sending pipeline between layer and the reaction layer.
Further, the air inlet of the chemical scrubbing tower is arranged in the area between the reaction layer and the first packing layer on the first shell, the outlet of the pipeline is located at the junction of the sludge storage layer and the reaction layer, and the axis of the outlet of the pipeline is vertical to the horizontal plane.
Furthermore, the circulating pumping pipeline comprises a liquid inlet end connected with the first circulating spraying layer and a liquid outlet end connected with the reaction layer, and the vertical distance between the liquid outlet end and the top surface of the reaction layer is larger than the vertical distance between the liquid outlet end and the bottom surface of the reaction layer.
Further, the height of the sludge storage layer, the vertical distance between the liquid outlet end and the bottom surface of the reaction layer and the vertical distance between the liquid outlet end and the top surface of the reaction layer are sequentially increased.
Furthermore, the area of the first shell body, which is located between the reaction layer and the first packing layer, is also provided with an air supplementing valve.
Furthermore, the circulating pumping pipeline comprises a first pipeline body connected between the first circulating spraying layer and the reaction layer, a first spraying pump device arranged on the pipeline body, and an alkali liquor adding device communicated between the first spraying pump device and the first circulating spraying layer.
Further, the washing system further comprises a control system, an online monitoring device used for monitoring the concentration of the discharged gas is arranged at the gas outlet of the washing tower, a first PH meter is arranged in the reaction layer, and the control system is configured to control the alkali liquor adding device to be started when the gas concentration value detected by the online monitoring device is larger than a preset gas concentration value or the PH value displayed by the first PH meter is smaller than the preset PH value.
Further, the bottom of first casing is provided with the mud discharging mouth, and mud discharging mouth department intercommunication has the dredge pump, is provided with the mud valve between dredge pump and the mud discharging mouth, still is provided with the mud concentration meter in the reaction layer, and control system still constructs to be can when the mud concentration value that the mud concentration meter detected is greater than predetermineeing the mud concentration value, control mud valve and dredge pump open.
Furthermore, a first liquid level meter is further arranged in the reaction layer, a first water replenishing valve is further communicated with an area, located between the reaction layer and the first packing layer, of the first shell, the first water replenishing valve is communicated with an external water source, and the control system is further configured to be capable of opening the first water replenishing valve when the liquid level value displayed by the first liquid level meter is smaller than a preset liquid level value.
Furthermore, the washing tower comprises a second shell, a water storage layer, a second packing layer and a second circulating spraying layer which are arranged in the second shell from bottom to top in sequence, and a second spraying pump device communicated between the second circulating spraying layer and the water storage layer, wherein a second water replenishing valve is arranged in the area, located between the water storage layer and the second packing layer, of the second shell and connected with an external water source.
The washing system of the utility model solves the problem of low-concentration SiCl in by-products generated in the production process of polycrystalline silicon 4 The difficult problem of waste liquid treatment and the removal of Cl in by-products 2 And acid gases such as HCl and the like eliminate potential safety hazards of the byproducts to the surrounding environment ecology and operators. The washing system of the utility model can run fully automatically without additional staff; the control system intelligently controls the operation of the alkali liquor adding device and the circulating spray pump device, so that the consumption of alkaline agents can be greatly reduced, and the operation cost is reduced; meanwhile, the sediment areas such as the sludge storage layer and the water storage layer are arranged inside the washing tower, so that the capital investment is reduced; in addition, by designing the position of the air inlet of the chemical washing tower and the mode of inserting the pipeline into the chemical washing tower, the problem that the produced precipitate blocks the outlet of the pipeline is avoided, and the problems of anti-leakage construction in engineering and backflow of circulating alkali liquor are solved.
Drawings
Fig. 1 is a schematic structural diagram of a washing system according to an embodiment of the present invention;
fig. 2 shows a structure of a water storage layer of the chemical scrubber shown in fig. 1.
Detailed Description
For better understanding of the purpose, structure and function of the present invention, the present invention will be described in detail with reference to the accompanying drawings.
Fig. 1 shows a structure of a washing system 100 according to an embodiment of the present invention. The washing system 100 includes: the chemical washing tower 1 comprises a first shell 11, an alkali liquor layer 12, a first packing layer 13 and a first circulating spraying layer 14 which are arranged in the first shell 11 from bottom to top in sequence, a water washing tower 2, a gas outlet 15 of the chemical washing tower 1 is communicated with a gas inlet 25 of the water washing tower 2, and a fan 8, wherein the fan 8 is communicated with a gas outlet 26 of the water washing tower 2. As shown in fig. 2, the alkaline solution layer 12 includes a sludge storage layer 121 and a reaction layer 122, which are sequentially disposed from bottom to top, a pipeline 3 for conveying the gas a to be treated is inserted into a junction between the sludge storage layer 121 and the reaction layer 122 through an air inlet 19 of the chemical washing tower 1, and the first circulating spray layer 14 is connected to the reaction layer 122 through a circulating pumping pipeline 51.
The embodiment of the utility model provides a washing system 100 is at high concentration SiCl at the during operation 4 After the waste liquid is blown to the recycling system along with the pure nitrogen, the liquid inlet valve 31 is opened, and the residual low-concentration SiCl is obtained 4 Waste liquid and nitrogen, and Cl 2 And the mixture of acid gases such as HCl and the like is sequentially pumped to the chemical washing tower 1 and the water washing tower 2 for treatment under the action of the fan 8, and finally, the clean gas G is discharged to the atmospheric environment. SiCl 4 Waste liquid and Cl 2 The acidic gas such as HCl reacts directly with the alkali liquid in the reaction layer 122 in the chemical scrubber 1, and reacts with the alkali liquid in the reaction layer 122 pumped to the first circulating spray layer 14 through the circulating pumping pipeline 51 to be removed, and the water scrubber 2 removes the circulating alkali liquid carried out from the chemical scrubber 1. SiCl is inserted into the boundary between the sludge storage layer 121 and the reaction layer 122 through the gas inlet 19 of the chemical scrubber 1 by the pipe 3 for transporting the gas A to be treated 4 Waste liquid and Cl 2 And the acidic gas such as HCl reacts with the alkali liquor at the junction to generate a precipitate, the precipitate can directly enter the sludge storage layer 121 downwards and release HCl gas, wherein one part of the HCl gas moves upwards to react with the alkali liquor in the reaction layer 122, and the other part of the HCl gas overflows the reaction layer 122 and then reacts with the alkali liquor circularly sprayed by the first circulating spraying layer 14 in the first packing layer 13. This arrangement can add SiCl on the one hand 4 Waste liquid and Cl 2 Acid gases such as HCl in the reactionReaction time within layer 122, on the other hand due to the introduction of SiCl at the interface 4 Waste liquid and Cl 2 Acid gases such as HCl and the like can generate certain disturbance on a sludge storage layer, so that a small amount of suspended sludge can be generated in a reaction layer, and the small amount of suspended sludge can further delay SiCl 4 Waste liquid and Cl 2 The reaction time of the acid gas such as HCl in the reaction layer 122, thereby contributing to SiCl 4 Waste liquid and Cl 2 Acid gases such as HCl and the like react with the alkali liquor more fully.
The washing system 100 of the utility model solves the problem of low-concentration SiCl in the by-product generated in the polysilicon production process 4 The difficult problem of waste liquid treatment and the removal of Cl in by-products 2 And acid gases such as HCl and the like eliminate potential safety hazards of the byproducts to the surrounding environment ecology and operators. In addition, the chemical washing tower 1 adopts alkali liquor for spraying, the alkali liquor is stored at the bottom of the chemical washing tower 1, and circulating spraying is realized through the circulating pumping pipeline 51, so that the medicament cost is greatly reduced.
In the preferred embodiment shown in fig. 1 and 2, the gas inlet 19 of the chemical scrubber 1 is arranged in the area between the reaction layer 122 and the first packing layer 13 on the first shell 11, the outlet of the pipe 3 is located at the intersection of the sludge storage layer 121 and the reaction layer 122, and the axis of the outlet of the pipe 3 is perpendicular to the horizontal plane. By this arrangement, on the one hand, clogging of the outlet of the conduit 3 by the produced precipitates can be avoided; on the other hand, the pipeline 3 is bent into the reaction layer 122 from the air inlet 19 of the chemical washing tower 1 instead of being directly inserted into the reaction layer 122 from the side, which is beneficial to the anti-leakage construction of engineering and avoids the problem of back flow of circulating alkali liquor.
As shown in fig. 1 and 2, the circulating pumping pipeline 51 may include a liquid inlet end a connected to the first circulating spray layer 14 and a liquid outlet end b connected to the reaction layer 122, and a vertical distance between the liquid outlet end b and the top surface of the reaction layer 122 is greater than a vertical distance between the liquid outlet end a and the bottom surface of the reaction layer 122. With this arrangement, the position of the liquid outlet end b further separates the reaction layer 122 to form the inlet reaction layer 1221 and the circulating alkali liquid layer 1222, and the circulating pumping pipeline 51 can relatively pure at the interface of the inlet reaction layer 1221 and the circulating alkali liquid layer 1222The net lye is pumped cyclically into the first circulating spray layer 14. By making the vertical distance between the liquid outlet end b and the top surface of the reaction layer 122 be greater than or equal to the vertical distance between the liquid outlet end a and the bottom surface of the reaction layer 122, i.e. making the height of the circulating alkali liquid layer 1222 be greater than the height of the water inlet reaction layer 1221, it is advantageous to have enough alkali liquid in the circulating alkali liquid layer 1222 to be pumped to the first circulating spray layer 14 on the one hand, and to increase the amount of SiCl on the other hand 4 Waste liquid and Cl 2 And the reaction time of an acid gas such as HCl in the circulating alkali liquid layer 1222.
Preferably, as shown in fig. 2, in order to achieve the best treatment effect, the height of the sludge storage layer 121, the vertical distance between the liquid outlet end b and the bottom surface of the reaction layer 122, and the vertical distance between the liquid outlet end b and the top surface of the reaction layer 122 may be sequentially increased, that is, the height of the sludge storage layer 121, the height of the water inlet reaction layer 1221, and the height of the circulating alkali liquid layer 1222 are sequentially increased. Specific values of the height of the sludge storage layer 121, the height of the water inlet reaction layer 1221, and the height of the circulating alkali solution layer 1222 may be specifically selected according to actual needs, and are not specifically limited herein.
Returning to fig. 1, the area of the first shell 11 between the reaction layer 12 and the first filler layer 13 is further provided with an air supply valve 6, and the air supply valve 6 can be used for balancing the air pressure in the chemical washing tower 1, so as to avoid dead zones in the tower and ensure that all the generated polluting HCl gas can be pumped away by the fan 8.
Further, as shown in fig. 1, the circulating pumping pipeline 51 may include a first pipeline body 512 connected between the first circulating spraying layer 14 and the reaction layer 122, and a first spraying pump device 511 disposed on the pipeline body 512, the chemical washing tower 1 further includes an alkali liquor adding device 4 communicated between the first spraying pump device 511 and the first circulating spraying layer 14, and the alkali liquor B in the alkali liquor adding device 4 may be pumped into the first circulating spraying layer 14 by an alkali liquor pump 41.
According to the present invention, as shown in fig. 1, the washing system 100 further includes a control system (not shown), which can be controlled by a PLC. The gas outlet 26 of the water washing tower 2 can be provided with an online monitoring device 9 for monitoring the concentration of the discharged gas, the reaction layer 122 is internally provided with a first PH meter 71, the control system is configured to be capable of controlling the opening of the alkali liquor adding device 4 when the gas concentration value detected by the online monitoring device 9 is greater than a preset gas concentration value, or the PH value displayed by the first PH meter 71 is less than a preset PH value, namely, the concentration of the gas discharged from the water washing tower 2 is too high, or the alkalinity in the reaction layer 122 is weakened to a certain degree. The on-line monitoring device 9 may be an on-line hydrogen chloride and chlorine meter. In addition, when the operation of the drain valve 172 of the chemical washing tower 1 is finished, that is, after the liquid in the alkali liquor layer 12 enters the drain pipeline 171 through the drain opening 17 and is drained to the plant sewage treatment system C, the control system can also control the alkali liquor adding device 4 to be opened until the liquid level of the fresh alkali liquor reaches the highest liquid level of the liquid level meter 73.
Preferably, in order to ensure the accuracy of the detection of the on-line monitoring device 9, a demister 261 may be provided between the air outlet 26 of the water washing tower 2 and the on-line monitoring device 9.
Further, as shown in fig. 1, a sludge discharge port 16 is provided at the bottom of the first housing 11, a sludge pump 163 is communicated with the sludge discharge port 16, a sludge discharge valve 162 is provided between the sludge pump 163 and the sludge discharge port 16, a sludge concentration meter 72 is further provided in the reaction layer 122, the sludge concentration meter 72 is preferably located in the water inlet reaction layer 1221, and the control system is further configured to control the opening of the sludge discharge valve 162 and the opening of the sludge discharge pump 163 when the sludge concentration value detected by the sludge concentration meter 72 is greater than a preset sludge concentration value, so that the sludge in the sludge storage layer 121 is discharged to the sludge pond E through the sludge discharge pipeline 161.
Furthermore, a first liquid level meter 73 is further arranged in the reaction layer 122, a first water replenishing valve 101 is further communicated with a region, located between the reaction layer 122 and the first packing layer 13, of the first shell 11, the first water replenishing valve 101 is communicated with an external water source D through a water replenishing pipeline 10, and the control system is further configured to open the first water replenishing valve 101 when a liquid level value displayed by the first liquid level meter 73 is smaller than a preset liquid level value, so as to realize liquid replenishing in the alkaline liquid layer 12.
Further, the area of the first housing 11 between the reaction layer 122 and the first packing layer 13 is provided with a first overflow port 18, the position of the first overflow port 18 being lower than the position of the gas inlet 19 of the chemical scrubber tower 1 to prevent the liquid in the alkali liquid layer 12 from leaking through the gas inlet 19, and the liquid overflowing through the first overflow port 18 can be discharged into the plant sewage treatment system C.
According to the utility model discloses, as shown in fig. 1, washing tower 2 can include second casing 21, be located second casing 21 the reservoir stratum 22, second packing layer 23 and the second circulation that set gradually from bottom to top spray layer 24, and the intercommunication sprays pump unit 52 at the second circulation between layer 24 and reservoir stratum 22, wherein, the region that is located between reservoir stratum 22 and the second packing layer 23 of second casing 21 is provided with second water replenishing valve 102, and second water replenishing valve 102 links to each other with outside water source D.
Preferably, a second liquid level meter 75 and a second PH meter 74 are arranged in the water storage layer 22, a second water outlet 28 is arranged at the bottom of the second casing 21, and when the liquid level value displayed by the second liquid level meter 75 is smaller than a preset liquid level value or when the PH value displayed by the second PH meter 74 is larger than a preset PH value, the control system can control the second water replenishing valve 102 to be opened so as to replenish the water in the water storage layer 22 until the liquid level of the water reaches the highest liquid level of the second liquid level meter 75. When the cleaning solution in the water storage layer 22 needs to be discharged, the control system can control the water discharge valve 281 of the water scrubber 2 to open, so that the liquid in the water storage layer 22 is discharged to the factory sewage treatment system C through the second water discharge port 28.
In addition, the area of the second shell 21 between the water storage layer 22 and the second filler layer 23 is provided with a second overflow port 27, the position of the second overflow port 27 is lower than the position of the air inlet 25 of the washing tower 2, so as to prevent the liquid in the water storage layer 22 from leaking through the air inlet 25, and the liquid overflowing through the second overflow port 27 can be discharged to the factory sewage treatment system C.
It is to be noted that unless otherwise specified, technical or scientific terms used herein shall have the ordinary meaning as understood by those skilled in the art to which the present invention belongs.
In the description of the present application, it is to be understood that the terms "first", "second", and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implying any number of technical features indicated.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; although the present invention has been described in detail with reference to the foregoing embodiments, it should be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the embodiments of the present invention, and they should be construed as being included in the scope of the claims and description of the present invention. In particular, the technical features mentioned in the embodiments can be combined in any way as long as there is no structural conflict. The present invention is not limited to the particular embodiments disclosed herein, but encompasses all technical solutions falling within the scope of the claims.
Claims (10)
1. A washing system, comprising:
the chemical washing tower comprises a first shell, an alkali liquid layer, a first filler layer and a first circulating spraying layer, wherein the alkali liquid layer, the first filler layer and the first circulating spraying layer are sequentially arranged in the first shell from bottom to top,
a water wash tower, the gas outlet of the chemical wash tower being in communication with the gas inlet of the water wash tower, an
A fan communicated with the air outlet of the water washing tower,
the alkali liquid layer comprises a sludge storage layer and a reaction layer which are sequentially arranged from bottom to top, a pipeline for conveying gas to be treated is inserted into the junction of the sludge storage layer and the reaction layer through an air inlet of the chemical washing tower, and the first circulating spraying layer is connected with the reaction layer through a circulating pumping pipeline.
2. The scrubbing system of claim 1, wherein the inlet of the chemical scrubber is located in an area of the first shell between the reaction layer and the first packing layer, the outlet of the pipe is located at a junction of the sludge storage layer and the reaction layer, and an axis of the outlet of the pipe is perpendicular to a horizontal plane.
3. The washing system as claimed in claim 1 or 2, wherein the circulation pumping pipeline comprises a liquid inlet end connected with the first circulation spraying layer and a liquid outlet end connected with the reaction layer, and the vertical distance between the liquid outlet end and the top surface of the reaction layer is larger than the vertical distance between the liquid outlet end and the bottom surface of the reaction layer.
4. The washing system as claimed in claim 3, wherein the height of the sludge storage layer, the vertical distance between the liquid outlet end and the bottom surface of the reaction layer, and the vertical distance between the liquid outlet end and the top surface of the reaction layer increase in sequence.
5. The washing system as claimed in claim 4 wherein the region of the first housing between the reaction layer and the first packing layer is further provided with an air supplement valve.
6. The washing system as claimed in claim 5, wherein the circulating pumping pipeline comprises a first pipeline body connected between the first circulating spraying layer and the reaction layer and a first spraying pump device arranged on the pipeline body, and the chemical washing tower further comprises a lye adding device communicated between the first spraying pump device and the first circulating spraying layer.
7. The washing system as claimed in claim 6, further comprising a control system, wherein an on-line monitoring device for monitoring the concentration of the discharged gas is disposed at the gas outlet of the water washing tower, a first pH meter is disposed in the reaction layer, and the control system is configured to control the alkali liquid adding device to be turned on when the gas concentration value detected by the on-line monitoring device is greater than a preset gas concentration value or the pH value displayed by the first pH meter is less than a preset pH value.
8. The washing system as claimed in claim 7, wherein a sludge outlet is formed at the bottom of the first housing, a sludge pump is communicated with the sludge outlet, a sludge valve is arranged between the sludge pump and the sludge outlet, a sludge concentration meter is further arranged in the reaction layer, and the control system is further configured to control the sludge valve and the sludge pump to be opened when the sludge concentration value detected by the sludge concentration meter is greater than a preset sludge concentration value.
9. The washing system as claimed in claim 8, wherein a first liquid level meter is further disposed in the reaction layer, a first water replenishing valve is further communicated with a region of the first housing between the reaction layer and the first packing layer, the first water replenishing valve is communicated with an external water source, and the control system is further configured to open the first water replenishing valve when a level value displayed by the first liquid level meter is smaller than a preset level value.
10. The washing system as claimed in claim 9, wherein the washing tower comprises a second housing, a water storage layer, a second packing layer and a second circulating spray layer which are arranged in the second housing from bottom to top, and a second spray pump device communicated between the second circulating spray layer and the water storage layer, wherein a second water replenishing valve is arranged in a region of the second housing between the water storage layer and the second packing layer, and the second water replenishing valve is connected with the external water source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221998111.2U CN218307186U (en) | 2022-07-29 | 2022-07-29 | Washing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221998111.2U CN218307186U (en) | 2022-07-29 | 2022-07-29 | Washing system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218307186U true CN218307186U (en) | 2023-01-17 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221998111.2U Active CN218307186U (en) | 2022-07-29 | 2022-07-29 | Washing system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218307186U (en) |
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2022
- 2022-07-29 CN CN202221998111.2U patent/CN218307186U/en active Active
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