CN218146393U

CN218146393U - Clear look subtracts reflection coated glass

Info

Publication number: CN218146393U
Application number: CN202221442136.4U
Authority: CN
Inventors: 杨宏斌; 李忠祥; 齐丽婧; 李玉忠; 冷庆吉; 张振兴
Original assignee: Beijing Wuhua Tianbao Glass Co ltd
Current assignee: Beijing Wuhua Tianbao Glass Co ltd
Priority date: 2022-06-07
Filing date: 2022-06-07
Publication date: 2022-12-27
Anticipated expiration: 2032-06-07

Abstract

The utility model relates to a clear look subtracts reflection coated glass belongs to coated glass technical field. The clear color antireflection coated glass comprises a glass substrate, and a first silicon nitride SiNx layer, a first silicon oxide SiOx layer, a second silicon nitride SiNx layer, a second silicon oxide SiOx layer, a third silicon nitride SiNx layer and a zirconium nitride ZrNx layer which are sequentially plated on the glass substrate; the glass substrate is a float glass substrate. The utility model provides a clear-color antireflection coated glass. The net color antireflection coated glass is obtained by reasonably optimizing the multi-layer conversion of the refractive index layer and the low refractive index layer. The utility model discloses can realize the function that coated glass net look subtracts reflection through control high refracting index layer and the conversion of low refracting index layer multilayer, realize that the rete is wear-resisting and anti-oxidant to be used through the protective layer.

Description

Clear look subtracts reflection coated glass

Technical Field

The utility model relates to a clear look subtracts reflection coated glass belongs to coated glass technical field.

Background

It is known that, due to the interface between the glass and the air, about 4% of sunlight reflection is caused, and this part of sunlight cannot participate in the photoelectric conversion process, which causes a certain light loss. And as the display cabinet glass, the display cabinet can not be perfectly displayed under the light of the exhibit. When the optical path difference of the reflected light is exactly equal to half the wavelength of the incident light, the reflected light can be mutually counteracted, thereby greatly reducing the light reflection loss of the optical device and enhancing the intensity of the transmitted light. The antireflection film glass has very wide application in the fields of optical lenses, display showcase glass and the like.

The principle of destructive interference of the antireflection film is started, the superiority of the antireflection glass is reflected through optical tests on the antireflection glass with single sheets and composite structures, the analysis test result is combined with production and application, feasible measures for improving the visible light transmittance of the antireflection glass and reducing the visible light reflectance are provided, and the method aims to provide ideas for application and optimization of the antireflection glass. The antireflection film can effectively inhibit the light reflection loss caused by the refractive index difference existing at the interface, so that the antireflection film needs to be plated on the glass, and the antireflection film has important practical significance and great economic value. However, due to the wide spectrum characteristic of sunlight, the photovoltaic module is subject to severe outdoor environment use requirements, which requires that the photovoltaic glass antireflection film not only has good antireflection characteristics, but also needs to be stable in a complex environment, and meets the technical requirements of large-area, low-cost and uniform film formation in the film coating industry.The existing antireflection film can not meet the technical requirements of large-area, low-cost and uniform film forming in the industry, and needs to be designed The above requirements are achieved by a novel membrane system structure.

SUMMERY OF THE UTILITY MODEL

The utility model aims at providing a novel clean look subtract reflection coated glass satisfies market photovoltaic and show demand, and is fit for large tracts of land industrialization production and processing.

In order to realize the purpose, the utility model discloses a technical scheme is:

the clear color antireflection coated glass comprises a glass substrate, and a first silicon nitride SiNx layer, a first silicon oxide SiOx layer, a second silicon nitride SiNx layer, a second silicon oxide SiOx layer, a third silicon nitride SiNx layer and a zirconium nitride ZrNx layer which are sequentially plated on the glass substrate; the glass substrate is a float glass substrate.

The utility model discloses technical scheme's further improvement does: the thickness of the first silicon nitride SiNx layer is 50nm, the thickness of the first silicon oxide SiOx layer is 40nm, the thickness of the second silicon nitride SiNx layer is 50nm, the thickness of the second silicon oxide SiOx layer is 40nm, the thickness of the third silicon nitride SiNx layer is 50nm, and the thickness of the zirconium nitride ZrNx layer is 30nm.

The utility model discloses technical scheme's further improvement does: the thickness of the first silicon nitride SiNx layer is 60nm, the thickness of the first silicon oxide SiOx layer is 45nm, the thickness of the second silicon nitride SiNx layer is 60nm, the thickness of the second silicon oxide SiOx layer is 45nm, the thickness of the third silicon nitride SiNx layer is 60nm, and the thickness of the zirconium nitride ZrNx layer is 20nm.

Since the technical scheme is used, the utility model discloses the technological effect who gains has:

the utility model discloses coated glass provides a net look antireflection coated glass. The net color antireflection coated glass is obtained by reasonably optimizing the multi-layer conversion of the refractive index layer and the low refractive index layer.

The utility model discloses can realize the function that coated glass net look subtracts reflection through control high refracting index layer and the conversion of low refracting index layer multilayer, realize that the rete is wear-resisting and anti-oxidant to be used through the protective layer.

The utility model provides the high transmissivity of float glass substrate originally reduces the reflectivity on glass surface, when having better antireflection characteristic, still need remain stable under the complex environment to accord with the technical requirement of coating film industry large tracts of land, low-cost, even filming, have important realistic meaning and huge economic value.

Drawings

FIG. 1 is a schematic view of the structure of the clear antireflection coated glass of the present invention;

the silicon nitride multilayer structure comprises a glass substrate 1, a first silicon nitride SiNx layer 2, a first silicon oxide SiOx layer 3, a first silicon oxide SiOx layer 4, a second silicon nitride SiNx layer 5, a second silicon oxide SiOx layer 6, a third silicon nitride SiNx layer 7 and a zirconium nitride ZrNx layer.

Detailed Description

In order to make the technical means, creation features, achievement purposes and functions of the present invention easy to understand, the present invention is further described below with reference to the following embodiments.

The utility model relates to a clear look subtracts reflection coated glass is a functional type glass, as shown in figure 1, this coated glass is a clear look subtracts reflection coated glass, include glass substrate 1 and in proper order plating first silicon nitride SiNx layer 2, first silicon oxide SiOx layer 3, second silicon nitride SiNx layer 4, third silicon nitride SiNx layer 5, third silicon nitride SiNx layer 6 and zirconium nitride ZrNx layer 7 on glass substrate 1; the glass substrate 1 is a float glass substrate. The functional film layers are connected in sequence to form an integral coating film.

The thickness of the first silicon nitride SiNx layer 2 is 50nm, the thickness of the first silicon oxide SiOx layer 3 is 40nm, the thickness of the second silicon nitride SiNx layer 4 is 50nm, the thickness of the second silicon oxide SiOx layer 5 is 40nm, the thickness of the third silicon nitride SiNx layer 6 is 50nm, and the thickness of the zirconium nitride ZrNx layer 7 is 30nm.

In a specific implementation, the thickness of the first silicon nitride SiNx layer 2 is 60nm, the thickness of the first silicon oxide SiOx layer 3 is 45nm, the thickness of the second silicon nitride SiNx layer 4 is 60nm, the thickness of the second silicon oxide SiOx layer 5 is 45nm, the thickness of the third silicon nitride SiNx layer 6 is 60nm, and the thickness of the zirconium nitride ZrNx layer 7 is 20nm.

The coated glass adopts a large-area glass coating production line and utilizes a vacuum magnetron sputtering coating process, and the thickness of a high refractive index layer, a low refractive index layer and a protective layer is accurately controlled by utilizing 19 cathode target positions under a negative pressure environment to form a new film system.

The high-refractive-index layer corresponds to the silicon nitride SiNx layer, sputtering is carried out in a nitrogen argon atmosphere through a silicon-aluminum alloy target of the alternating current cathode, and the ratio of silicon-aluminum alloy is Si: al = 90. The process gas nitrogen to argon ratio was 60.

A layer of low-refractive-index layer silicon oxide SiOx, sputtered in an argon-oxygen atmosphere with a pure silicon target of an alternating current cathode, process gas argon-oxygen 80.

The protective layer corresponds to a zirconium nitride ZrNx layer, and the zirconium nitride target of the alternating current cathode is sputtered in a nitrogen-argon atmosphere, wherein the nitrogen-argon ratio of the process gas is 55.

The utility model discloses be fit for large tracts of land industrialization production and processing.

The production process parameters of the coated glass are as follows:

the foregoing shows and describes the basic principles and principal features of the invention, together with the advantages thereof. It should be understood by those skilled in the art that the present invention is not limited to the above embodiments, and the above embodiments and descriptions are only illustrative of the principles of the present invention, and that various changes and modifications may be made without departing from the spirit and scope of the present invention, and all such changes and modifications fall within the scope of the present invention as claimed. The scope of the invention is defined by the appended claims and equivalents thereof.

Claims

1. The clear antireflection coated glass is characterized in that: comprises a glass substrate, a first silicon nitride SiNx layer, a first silicon oxide SiOx layer, a second silicon oxide SiOx layer, a first silicon nitride SiNx layer, a second silicon oxide SiOx layer, a third silicon oxide SiOx layer and a fourth silicon oxide layer the second silicon nitride SiNx layer, the second silicon dioxide SiOx layer, the third silicon nitride SiNx layer and the zirconium nitride ZrNx layer; the glass substrate is a float glass substrate.

2. The clear antireflection coated glass according to claim 1, characterized in that: the thickness of the first silicon nitride SiNx layer is 50nm, the thickness of the first silicon oxide SiOx layer is 40nm, the thickness of the second silicon nitride SiNx layer is 50nm, the thickness of the second silicon oxide SiOx layer is 40nm, the thickness of the third silicon nitride SiNx layer is 50nm, and the thickness of the zirconium nitride ZrNx layer is 30nm.

3. The clear antireflection coated glass according to claim 1, characterized in that: the thickness of the first silicon nitride SiNx layer is 60nm, the thickness of the first silicon oxide SiOx layer is 45nm, the thickness of the second silicon nitride SiNx layer is 60nm, the thickness of the second silicon oxide SiOx layer is 45nm, the thickness of the third silicon nitride SiNx layer is 60nm, and the thickness of the zirconium nitride ZrNx layer is 20nm.