CN217933703U - Ion source filament structure, ion source device and ion implantation equipment - Google Patents

Ion source filament structure, ion source device and ion implantation equipment Download PDF

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Publication number
CN217933703U
CN217933703U CN202222352327.8U CN202222352327U CN217933703U CN 217933703 U CN217933703 U CN 217933703U CN 202222352327 U CN202222352327 U CN 202222352327U CN 217933703 U CN217933703 U CN 217933703U
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China
Prior art keywords
ion source
filament
section
main body
connecting portion
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CN202222352327.8U
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Chinese (zh)
Inventor
杜建民
邵卫
邵浩
宋文博
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TSMC China Co Ltd
Taiwan Semiconductor Manufacturing Co TSMC Ltd
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TSMC China Co Ltd
Taiwan Semiconductor Manufacturing Co TSMC Ltd
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Priority to CN202222352327.8U priority Critical patent/CN217933703U/en
Priority to PCT/CN2022/120908 priority patent/WO2024050878A1/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08Ion sources; Ion guns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

The application provides an ion source filament structure, an ion source device and ion implantation equipment. The ion source filament structure comprises a filament, a feed connecting rod and a clamping part. The filament includes a body and a mounting terminal. The filament includes a body and a mounting terminal. The feed connecting rod includes main part and the connecting portion that is provided with the mounting hole, and the connecting portion sets up in the main part along the ascending one end of self length direction, and the main part is connected with the power along the ascending other end of self length direction. The clamping part sets up in the mounting hole, and the clamping part is cover tube-shaped structure, and the clamping part includes elastic construction section and canned paragraph, and the canned paragraph sets up in the elastic construction section along the ascending both ends of self length direction, and the elastic construction section has radial deformation volume, and the elastic construction section is connected with the installation terminal plug-in type and provides the clamp force to the installation terminal. According to the embodiment of the application, the heating phenomenon at the contact part of the filament and the feed connecting rod in the ion source filament structure can be improved.

Description

Ion source filament structure, ion source device and ion implantation equipment
Technical Field
The application relates to the technical field of semiconductor preparation, in particular to an ion source filament structure, an ion source device and ion implantation equipment.
Background
Ion implantation equipment is an important fabrication process equipment used to perform ion doping in the fabrication of integrated circuits, and includes an ion source device that converts gaseous or solid materials into an ion beam. The ion source device comprises a power supply, a chamber and an ion source filament structure, wherein the ion source filament structure comprises a filament and a feed connecting rod. One end of the feed connecting rod is connected with the power supply, the other end of the feed connecting rod is connected with the filament, and high-energy current generated by the power supply is introduced into the filament through the feed connecting rod. The filament is heated by energization to generate hot electrons, which react with gaseous or solid materials in the chamber of the ion source apparatus to generate ions.
The connection part of the feed connection rod and the filament in the existing ion source filament structure is a claw-type socket, and the filament is inserted in the claw-type socket. Under the high temperature condition, plastic deformation easily takes place for the claw formula socket of feed connecting rod, can lead to appearing the condition that filament and the claw formula socket area of contact of feed connecting rod reduce, makes the resistance grow of filament and claw formula socket contact department and lead to generating heat seriously, makes other devices (for example power supply cable) in the ion source device be heated and damaged easily. In view of the foregoing, there is a need for improved ion source filament structures.
SUMMERY OF THE UTILITY MODEL
In view of the above problems, the present application provides an ion source filament structure, an ion source device and an ion implantation apparatus, which can improve the heating phenomenon at the contact position of the filament and the feed connection rod in the ion source filament structure.
In a first aspect, an embodiment of the present application provides an ion source filament structure, which includes a filament, a feed connection rod, and a clamping member. The filament includes a body and a mounting terminal. The filament includes a body and a mounting terminal. The feed connecting rod comprises a main body part and a connecting part provided with a mounting hole, the connecting part is arranged at one end of the main body part along the length direction of the main body part, and the other end of the main body part along the length direction of the main body part is connected with a power supply. The clamping part sets up in the mounting hole, and the clamping part is cover tube-shaped structure, and the clamping part includes elastic construction section and canned paragraph, and the canned paragraph sets up in the elastic construction section along the ascending both ends of self length direction, and the elastic construction section has radial deformation volume, and the elastic construction section is connected with the installation terminal plug-in type and provides the clamp force to the installation terminal.
In some embodiments of the first aspect, the inner diameter of the resilient structural section has a decreasing trend in the direction from the fixation section to the resilient structural section.
In some embodiments of the first aspect, the resilient structure section comprises a plurality of spring wires distributed circumferentially and at intervals to form a sleeve-like structure.
In some embodiments of the first aspect, the fixed segment and the flexible structural segment are of an integrally formed structure.
In some embodiments of the first aspect, a boss is disposed on a side of the mounting hole close to the main body, a size shape of the boss matches a size shape of the fixing section, and the fixing section is plugged into the boss.
In some embodiments of the first aspect, a junction between an end surface of the connecting portion on a side away from the main body portion and a circumferential inner side surface of the connecting portion is provided with a chamfered structure.
In some embodiments of the first aspect, the connecting portion is removably connected to the body portion.
In some embodiments of the first aspect, an end of the connecting portion proximate to the main body portion is provided with an insulating structure, the insulating structure being located between the connecting portion and the main body portion.
In a second aspect, embodiments of the present application provide an ion source apparatus comprising an ion source filament structure as provided in any of the first aspect.
In a third aspect, embodiments of the present application provide an ion implantation apparatus, which includes the ion source device provided in the second aspect.
The application provides an ion source filament structure, ion source device and ion implantation equipment, through set up the centre gripping subassembly that has the elastic structure section in the feed connecting rod in the ion source filament structure, the elastic structure section has radial deformation volume, and the filament is pegged graft behind the elastic structure, and the elastic structure section can provide the clamp force to the filament. The elastic structure has elastic deformation, so when the temperature is higher, the elastic structure is difficult to generate permanent deformation, so that the contact area of the elastic structure and the ion source filament is more stable, the resistance of the contact part of the elastic structure and the filament is also difficult to change, the heating phenomenon caused by the overlarge resistance of the contact part of the filament and the feed connecting rod in the ion source filament structure can be improved, and the safety and the reliability of the ion source device are improved.
The foregoing description is only an overview of the technical solutions of the present application, and the present application can be implemented according to the content of the description in order to make the technical means of the present application more clearly understood, and the following detailed description of the present application is given in order to make the above and other objects, features, and advantages of the present application more clearly understandable.
Drawings
Various other advantages and benefits will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments. The drawings are only for purposes of illustrating the preferred embodiments and are not to be construed as limiting the application. Also, like reference numerals are used to refer to like parts throughout the drawings. In the drawings:
fig. 1 is a schematic diagram of an ion source filament structure according to some embodiments of the present disclosure;
fig. 2 is a schematic structural diagram of a feed connection rod of an ion source filament structure according to some embodiments of the present disclosure;
fig. 3 is a schematic structural view of a clamping member of an ion source filament structure according to some embodiments of the present disclosure.
The reference numbers in the detailed description are as follows:
10. a filament; 11. a body; 12. mounting a terminal; 20. a feed connection rod; 21. a main body portion; 22. a connecting portion; 221. mounting holes; 222. a boss; 223. a chamfering structure; 23. a thermally insulating structure; 30. a clamping member; 31. an elastic structure section; 32. and a fixed segment.
Detailed Description
Embodiments of the present invention will be described in detail below with reference to the accompanying drawings. The following examples are merely used to more clearly illustrate the technical solutions of the present application, and therefore are only examples, and the protection scope of the present application is not limited thereby.
It is to be noted that technical terms or scientific terms used in the embodiments of the present application should be taken as a general meaning understood by those skilled in the art to which the embodiments of the present application belong, unless otherwise specified.
In the description of the embodiments of the present application, the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", and the like indicate orientations or positional relationships that are based on the orientations or positional relationships shown in the drawings, merely for convenience of description and simplified description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore should not be construed as limiting the embodiments of the present application.
Furthermore, the technical terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. In the description of the embodiments of the present application, "a plurality" means two or more unless specifically defined otherwise.
In the description of the embodiments of the present application, unless otherwise explicitly specified or limited, the terms "mounted," "connected," "fixed," and the like are to be construed broadly, e.g., as meaning fixedly connected, detachably connected, or integrally formed; mechanical connection or electrical connection is also possible; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the embodiments of the present application can be understood by those of ordinary skill in the art according to specific situations.
In the description of the embodiments of the present application, unless otherwise explicitly specified or limited, a first feature "on" or "under" a second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
Ion implantation equipment is an important fabrication process equipment used to perform ion doping in the fabrication of integrated circuits, and includes an ion source device that converts gaseous or solid materials into an ion beam. The ion source device comprises a power supply, a chamber and an ion source filament structure, wherein the ion source filament structure comprises a filament and a feed connecting rod. One end of the feed connecting rod is connected with the power supply, the other end of the feed connecting rod is connected with the filament, and high-energy current generated by the power supply is introduced into the filament through the feed connecting rod. The filament is heated by energization to generate hot electrons, which react with gaseous or solid materials in the chamber of the ion source apparatus to generate ions.
The inventor of the present application has noticed that the connection portion between the feed connection rod and the filament in the existing filament structure of the ion source is a claw-type socket, and the filament is inserted into the claw-type socket. Under the high temperature condition, plastic deformation easily takes place for the claw formula socket of feed connecting rod, can lead to appearing the condition that filament and the claw formula socket area of contact of feed connecting rod reduce, makes the resistance grow of filament and claw formula socket contact department and lead to generating heat seriously, makes other devices (for example power supply cable) in the ion source device be heated and damaged easily.
The inventor of the application discovers that the clamping assembly with the elastic structure can be arranged in the feed connecting rod in the filament structure of the ion source, the elastic structure has radial deformation, and the filament is inserted into the elastic structure and then the elastic structure section can provide clamping force for the filament. The elastic structure has elastic deformation, so that the contact area of the elastic structure and the ion source filament is stable, the elastic structure and the ion source filament are not easily influenced by temperature, the resistance of the contact position of the elastic structure and the filament is not easily increased, the heating phenomenon caused by overlarge resistance at the contact position of the filament and the feed connecting rod in the ion source filament structure can be improved, and the safety and the reliability of the ion source device are improved.
In order to solve the prior art problem, the embodiment of the application provides an ion source filament structure, an ion source device and ion implantation equipment, can improve the phenomenon of generating heat of filament and feed connecting rod contact department in the ion source filament structure. The following first describes the structure of the filament of the ion source provided in the embodiments of the present application.
Fig. 1 is a schematic structural diagram of an ion source filament structure according to some embodiments of the present disclosure, fig. 2 is a schematic structural diagram of a feed connection rod of an ion source filament structure according to some embodiments of the present disclosure, and fig. 3 is a schematic structural diagram of a clamping member of an ion source filament structure according to some embodiments of the present disclosure.
As shown in fig. 1 to 3, the present embodiment provides an ion source filament 10 structure, and the ion source filament 10 structure includes a filament 10, a feed connection rod 20, and a clamping member 30. The filament 10 includes a body 11 and a mounting terminal 12. The power feeding connection rod 20 includes a main body portion 21 and a connection portion 22 provided with a mounting hole 221, the connection portion 22 is provided at one end of the main body portion 21 in the self length direction, and the other end of the main body portion 21 in the self length direction is connected with a power supply. The clamping member 30 is disposed in the mounting hole 221, the clamping member 30 is of a sleeve-shaped structure, the clamping member 30 includes an elastic structure section 31 and a fixing section 32, the fixing section 32 is disposed at two ends of the elastic structure section 31 along the length direction thereof, the elastic structure section 31 has a radial deformation amount, and the elastic structure section 31 is plug-in connected with the mounting terminal 12 and provides a clamping force to the mounting terminal 12.
The material of the filament 10 may be tungsten, and the shape of the filament 10 may be, but is not limited to, a spiral structure, a U-shaped structure, or a wavy line structure, so as to make the filament 10 more uniform during the heating process, and the specific shape of the filament 10 is not limited in this application, and may be selected according to practical situations. The body 11 of the filament 10 is connected to the feed connection rod 20 by means of mounting terminals 12, which mounting terminals 12 may be rod-like structures.
The feed connection rod 20 is used to connect the filament 10 with an external power supply cable. Specifically, one end of the main body portion 21 of the feed connection rod 20 in the length direction thereof is provided with a connection portion 22, and the connection portion 22 is used for connection with the filament 10. The other end of the main body portion 21 of the feed connection rod 20 in the longitudinal direction thereof is connected to a power supply through a power supply cable. Alternatively, the feed connection rod 20 may use a photo slide bar, and a joint is welded at one end of the main body portion 21 of the feed connection rod 20 connected to a power supply to connect a power supply cable; a screw structure may be formed at one end of the main body 21 of the power feed connection rod 20 connected to the power supply, and a nut may be used to connect the power supply cable. The feed connection rod 20 needs to be routed to the vacuum environment within the ion source apparatus chamber and maintain a vacuum seal and electrical isolation from other components.
The connecting portion 22 is provided with a mounting hole 221, and the clip member 30 is provided in the mounting hole 221. The clamping member 30 is of a sleeve-like structure, and the mounting hole 221 is matched in shape and size with the clamping member 30 so that the clamping member 30 can be fitted into the mounting hole 221. The connection of the clamping member 30 to the connecting portion 22 may be, but is not limited to, a plug, a weld, an adhesive, or the like.
The elastic structure section 31 of the clamping member 30 has a radial deformation amount, the mounting terminal 12 of the filament 10 is inserted into the elastic structure section 31, and the elastic structure section 31 can provide a clamping force to the mounting terminal 12 so that the mounting terminal 12 of the filament 10 is firmly connected to the connection portion 22 of the feed connection rod 20. The fixing sections 32 of the clamping component 30 are arranged at two ends of the elastic structure section 31 along the length direction of the elastic structure section, so that on one hand, the structural firmness of the elastic structure section 31 can be improved; on the other hand, the clamping member 30 can be connected with the connecting portion 22 through the fixing section 32, and the influence of the inner wall of the mounting hole 221 on the radial deformation of the elastic structure section 31 can be reduced.
In the above technical solution, by providing the clamping assembly with the elastic structure section 31 in the feeding connecting rod 20 in the structure of the ion source filament 10, the elastic structure section 31 has a radial deformation amount, and after the filament 10 is inserted into the elastic structure section 31, the elastic structure section 31 can provide a clamping force for the filament 10. The elastic structure section 31 has elastic deformation, so that the contact area between the elastic structure section 31 and the ion source filament 10 is stable, the temperature influence is not easily caused, the resistance of the contact position between the elastic structure section 31 and the filament 10 is not easily changed, the heating phenomenon caused by overlarge resistance at the contact position between the filament 10 and the feed connecting rod 20 in the structure of the ion source filament 10 can be improved, and the safety and the reliability of the ion source device are improved.
In some embodiments, the inner diameter of the elastic structure section 31 gradually decreases along the direction from the fixing section 32 to the elastic structure section 31.
Specifically, along the direction from the fixing section 32 to the elastic structure section 31, the inner diameter of the elastic structure section 31 is gradually decreased, so that the two ends of the elastic structure section 31 along the length direction thereof have larger inner diameters, and the middle part of the elastic structure section 31 has smaller inner diameters. Wherein, the two ends of the elastic structure section 31 along the length direction have larger inner diameters, so that the installation terminal 12 of the filament 10 can be inserted into the clamping part 30 more easily; the middle part of the elastic structure section 31 has a smaller inner diameter, which can provide a larger clamping force for the mounting terminal 12 of the filament 10, and further can further improve the connection firmness between the filament 10 and the feed connection rod 20.
In the above technical solution, by setting the inner diameter of the elastic structure section 31 to be gradually reduced along the direction from the fixing section 32 to the elastic structure section 31, on one hand, the mounting terminal 12 of the filament 10 can be easily inserted into the clamping member 30; on the other hand, a greater clamping force can be provided to the mounting terminal 12 of the filament 10, and thus the connection firmness between the filament 10 and the feed connection rod 20 can be further improved.
In some embodiments, the resilient structure section 31 comprises a plurality of spring wires distributed circumferentially and at intervals to form a sleeve-like structure.
Specifically, the material of the spring wire may be, but is not limited to, one or more of carbon steel, iron, copper, and titanium. A plurality of spring wires are distributed along the circumference to form a sleeve-shaped structure, and both ends of the spring wires along the length direction of the spring wires are fixedly connected with the fixed section 32. Further, a plurality of spring wires are distributed at intervals along the circumferential direction of the sleeve-shaped structure, so that gaps are formed among the spring wires, the heat dissipation performance of the elastic structure section 31 can be improved, and further, the excessive heat of the filament 10 is reduced and is conducted to the connecting part 22 of the feed connecting rod 20 through the clamping part 30.
Among the above-mentioned technical scheme, set up elastic structure section 31 into the form that a plurality of spring wires followed circumference and interval distribution, can also improve clamping part 30's heat dispersion when providing enough pretightning force for filament 10, further reduced the temperature of filament 10 and feed connecting rod 20 contact department in the ion source filament 10 structure, and then can further improve ion source device's security and reliability.
In some embodiments, the fixed segment 32 and the flexible structure segment 31 are of an integrally formed structure.
The clamping member 30 is made by an integral molding manufacturing process such that the fixing section 32 and the elastic structure section 31 are of an integral structure. On one hand, the fixing section 32 and the elastic structure section 31 do not need to be connected through additional welding or bonding and other connecting processes, and the manufacturing process flow of the clamping component 30 is simplified. Simultaneously, compare in being connected canned paragraph 32 and elastic structure section 31 through connection processes such as welding or bonding, have higher firm in connection degree between canned paragraph 32 and the elastic structure section 31 that are the integral type structure, and then can promote the holistic structural strength of clamping part 30.
By integrally molding the fixing section 32 and the elastic structure section 31 of the clamping member 30, not only the manufacturing process of the clamping member 30 can be simplified, but also the structural strength of the whole clamping member 30 can be improved.
In some embodiments, a side of the mounting hole 221 close to the main body 21 is provided with a boss 222, a size and a shape of the boss 222 match a size and a shape of the fixing section 32, and the fixing section 32 is inserted into the boss 222.
The size and shape of the boss 222 match the size and shape of the fixing segment 32. For example, the fixing segment 32 of the clamping member 30 may be a circular ring structure, the boss 222 may be a cylindrical structure, and the outer diameter of the boss 222 matches the inner diameter of the fixing segment 32, so that the fixing segment 32 can be inserted into the boss 222. It can be understood that the fixing section 32 of the clamping member 30 may also be a square ring structure, and the corresponding boss 222 may be a square column structure, and the specific shapes of the fixing section 32 and the boss 222 are not limited in this application, and may be selected according to actual situations, and for brevity, will not be described herein again.
On one hand, the bosses 222 can play a positioning role during the assembly process of the clamping member 30, so as to facilitate the assembly of the clamping member 30 with the mounting hole 221. On the other hand, the fixing section 32 is inserted into the boss 222, and a larger contact area is provided between the circumferential inner side surface of the fixing section 32 and the circumferential outer side surface of the boss 222, which is beneficial to improving the connection firmness between the clamping member 30 and the connection portion 22 of the feed connection rod 20. The connection between the circumferentially inner side surface of the fixing segment 32 and the circumferentially outer side surface of the boss 222 may be, but is not limited to, welding, bonding, or the like.
In the above technical solution, the boss 222 is disposed on one side of the mounting hole 221 close to the main body 21, so that the clamping member 30 and the mounting hole 221 can be assembled conveniently, the connection firmness between the clamping member 30 and the connection portion 22 of the feed connection rod 20 can be improved, and the safety and reliability of the ion source apparatus are further improved.
In some embodiments, a chamfer structure 223 is provided at the intersection of the end surface of the connecting portion 22 on the side away from the main body portion 21 and the circumferential inner side surface of the connecting portion 22.
Specifically, the chamfered structure 223 has an inclined surface, and the inclined surface of the chamfered structure 223 has a guiding function. On one hand, during the assembly of the clamping member 30 with the mounting hole 221, the inclined surface of the chamfered structure 223 can guide the clamping member 30 to accurately enter the inside of the mounting hole 221; on the other hand, during the insertion of the mounting terminal 12 of the filament 10 into the clamping member 30, the inclined surface of the chamfered structure 223 can guide the mounting terminal 12 of the filament 10 to be accurately inserted into the clamping member 30.
In the above technical solution, by providing the chamfer structure 223 at the end of the connecting portion 22 away from the main body portion 21, not only the clamping member 30 can be conveniently assembled into the mounting hole 221, but also the mounting terminal 12 of the filament 10 can be conveniently inserted into the clamping member 30.
In some embodiments, the connecting portion 22 is detachably connected to the body portion 21.
The feeding connecting rod 20 is connected with the filament 10 through the connecting portion 22, the filament 10 has an extremely high temperature after being powered on, the mounting terminal 12 of the filament 10 is partially located in the mounting hole 221 of the connecting portion 22, and therefore, the temperature of the filament 10 is conducted to the connecting portion 22, and the connecting portion 22 is in a risk of overheating damage which may exist in a high temperature environment for a long time.
Alternatively, the detachable connection of the connecting portion 22 and the main body portion 21 may be, but is not limited to, a threaded connection, a snap connection, or the like.
In the above technical solution, the connection mode between the connection portion 22 and the main body portion 21 is set to be detachable, so that when the connection portion 22 is damaged and needs to be replaced, the whole feed connection rod 20 does not need to be detached from the ion source device, and only the connection portion 22 is detached for replacement. Therefore, the replacement efficiency can be improved, and the cost can be reduced.
In some embodiments, an end of the connecting portion 22 near the main body portion 21 is provided with an insulation structure 23, and the insulation structure 23 is located between the connecting portion 22 and the main body portion 21.
The main body 21 of the power feeding connection rod 20 is provided with a connection part 22 at one end in its longitudinal direction, and the connection part 22 is used for connecting with the filament 10. The other end of the main body portion 21 of the feed connection rod 20 in the longitudinal direction thereof is connected to a power supply through a power supply cable. The filament 10 has an extremely high temperature after being powered on, the temperature is conducted from the connection portion 22 to the main body portion 21 along the feeding connection rod 20, and the power supply cable connected to one end of the main body portion 21 is easily burnt by overheating at a high temperature.
Alternatively, the insulation structure 23 may be made of, but not limited to, teflon, polyphenylene sulfide, polyetheretherketone, and polyphenylene ester. The application does not prescribe a limit to the specific material of the heat insulation structure 23, and can be selected according to actual conditions. The thermal insulation structure 23 may be, but is not limited to, a sheet structure or a film layer structure. The heat insulation structure 23 is disposed at one end of the connection portion 22 close to the main body portion 21 and between the connection portion 22 of the power feeding connection rod 20 and the main body portion 21, and the heat insulation structure 23 is used for blocking heat conduction between the main body portion 21 and the connection portion 22 of the power feeding connection rod 20.
Among the above-mentioned technical scheme, through setting up thermal-insulated structure 23 at the one end that connecting portion 22 is close to main part 21, thermal-insulated structure 23 is located between connecting portion 22 and the main part 21 of feed connecting rod 20, can effectively reduce the heat-conduction between main part 21 and the connecting portion 22 of feed connecting rod 20, and then reduced the risk that the power supply cable overheated burnout under high temperature, further improved ion source device's security and reliability.
The present application also provides an ion source apparatus, according to some embodiments of the present application, including the ion source filament 10 structure of the above aspect.
It is understood that the ion source apparatus includes the structure of the ion source filament 10 provided in the embodiments of the present application, and specific details of the structure of the ion source filament 10 can be found in the description of the corresponding parts of the structure of the ion source filament 10 described in the embodiments of the present application, and therefore, for brevity, detailed description is omitted here.
According to some embodiments of the present application, there is also provided an ion implantation apparatus comprising the ion source device of the above aspect.
It is understood that the ion implantation apparatus includes the ion source device provided in the embodiments of the present application, and specific details of the ion source device may be referred to the descriptions of the ion source device and the corresponding parts in the structure of the ion source filament 10 described in the embodiments of the present application, and for brevity, detailed descriptions thereof are omitted.
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict.
Finally, it should be noted that: the above embodiments are only used for illustrating the technical solutions of the present application, and not for limiting the same; although the present application has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the present disclosure, and the present disclosure should be construed as being covered by the claims and the specification. In particular, the technical features mentioned in the embodiments can be combined in any way as long as there is no structural conflict. The present application is not intended to be limited to the particular embodiments disclosed herein but is to cover all embodiments that may fall within the scope of the appended claims.

Claims (10)

1. An ion source filament structure, comprising:
a filament including a body and a mounting terminal;
the feeding connecting rod comprises a main body part and a connecting part provided with a mounting hole, the connecting part is arranged at one end of the main body part along the length direction of the main body part, and the other end of the main body part along the length direction of the main body part is connected with a power supply;
the clamping component is arranged in the mounting hole and is of a sleeve-shaped structure, the clamping component comprises an elastic structure section and a fixed section, the fixed section is arranged at two ends of the elastic structure section along the length direction of the elastic structure section, the elastic structure section has a radial deformation amount, and the elastic structure section is connected with the mounting terminal in a plug-in manner and provides clamping force for the mounting terminal.
2. The ion source filament structure of claim 1, wherein an inner diameter of the resilient structure section is gradually decreasing in a direction from the fixing section to the resilient structure section.
3. The ion source filament structure of claim 1, wherein the resilient structure section comprises a plurality of spring wires circumferentially and spaced apart to form the sleeve-like structure.
4. The ion source filament structure of claim 1, wherein the fixed segment and the resilient structure segment are integrally formed.
5. The ion source filament structure of claim 1, wherein a boss is disposed at a side of the mounting hole close to the main body, the boss has a size and shape matching with those of the fixing section, and the fixing section is inserted into the boss.
6. The ion source filament structure according to claim 1, wherein a chamfer structure is provided at a junction between an end surface of the connecting portion on a side away from the main body portion and a circumferential inner side surface of the connecting portion.
7. The ion source filament structure of claim 1, wherein the connecting portion is removably connected to the body portion.
8. The ion source filament structure of claim 1, wherein an end of the connecting portion near the main body portion is provided with a thermal insulation structure, the thermal insulation structure being located between the connecting portion and the main body portion.
9. An ion source apparatus comprising the ion source filament structure of any of claims 1 to 8.
10. An ion implantation apparatus comprising the ion source device of claim 9.
CN202222352327.8U 2022-09-05 2022-09-05 Ion source filament structure, ion source device and ion implantation equipment Active CN217933703U (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202222352327.8U CN217933703U (en) 2022-09-05 2022-09-05 Ion source filament structure, ion source device and ion implantation equipment
PCT/CN2022/120908 WO2024050878A1 (en) 2022-09-05 2022-09-23 Ion source filament structure, ion source device and ion implantation apparatus

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Application Number Priority Date Filing Date Title
CN202222352327.8U CN217933703U (en) 2022-09-05 2022-09-05 Ion source filament structure, ion source device and ion implantation equipment

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US6204508B1 (en) * 1998-08-07 2001-03-20 Axcelis Technologies, Inc. Toroidal filament for plasma generation
CN105355531B (en) * 2015-10-30 2017-08-04 中国电子科技集团公司第四十八研究所 Filament clamping device for ion gun
CN205211697U (en) * 2015-12-23 2016-05-04 昆山国显光电有限公司 Filament fixing device
CN208923421U (en) * 2018-09-29 2019-05-31 东莞中探探针有限公司 It is preced with spring connector and its adjustable hat spring of outer diameter
CN114156150B (en) * 2021-11-12 2023-10-20 中国电子科技集团公司第十三研究所 Koufman ion source device and control method thereof

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