CN217881425U - Wafer shaking and rotating device - Google Patents
Wafer shaking and rotating device Download PDFInfo
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- CN217881425U CN217881425U CN202222190830.8U CN202222190830U CN217881425U CN 217881425 U CN217881425 U CN 217881425U CN 202222190830 U CN202222190830 U CN 202222190830U CN 217881425 U CN217881425 U CN 217881425U
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Abstract
The utility model belongs to the technical field of automatic cleaning machine, concretely relates to wafer rocks rotary device, and this wafer rocks rotary device includes: the lifting mechanism, the rotating mechanism and the shaking mechanism; wherein the rocking mechanism is provided with at least one box body placing groove for placing the wafer box, and the rocking mechanism is immersed in the wafer cleaning groove; the lifting mechanism drives the rotating mechanism and the shaking mechanism to move longitudinally so as to enable the wafer box to move longitudinally in the wafer cleaning tank; the rotating mechanism drives the corresponding eccentric rods in the shaking mechanism to rotate so that the eccentric rods push the corresponding wafers in the wafer box to rotate in the corresponding box body placing grooves; the utility model discloses an adopt elevating system, rotary mechanism, can overcome traditional rotary mechanism action easy jamming, the structure is perishable, easy jamming, the big yielding scheduling problem of structure space when the wafer is rotatory, realize the rotation of wafer in the wafer box by rocking the mechanism simultaneously, make wafer and washing liquid fully contact improvement cleaning performance.
Description
Technical Field
The utility model belongs to the technical field of automatic cleaning machine, concretely relates to wafer rocks rotary device.
Background
Automatic cleaning machine need set up and rock rotary device, and the drive of the lifting unit that rotary device was rocked to the tradition is chain drive, easily produces metal particle, and the rotation is passed to the actuating lever through servo and bevel gear, and the structure is huge. And has high requirement on the rigidity of the whole mechanism, and is easy to generate metal ions,
meanwhile, the shaking and rotating device does not perform transmission, which can lead to insufficient cleaning, especially on the contact part of the wafer and the wafer box.
Therefore, it is desirable to develop a new wafer wobbling rotation apparatus to solve the above problems.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a rotary device is rocked to wafer to solve the problem that how to make the wafer abundant and washing liquid contact.
In order to solve the technical problem, the utility model provides a wafer rocks rotary device, it includes: the lifting mechanism, the rotating mechanism and the shaking mechanism; the lifting mechanism is movably connected with the rotating mechanism, and the rotating mechanism is movably connected with the shaking mechanism; the rocking mechanism is provided with at least one box body placing groove for placing a wafer box and is suitable for being immersed in the wafer cleaning groove; the lifting mechanism is suitable for driving the rotating mechanism and the shaking mechanism to move longitudinally so as to enable the wafer box to move longitudinally in the wafer cleaning tank; and the rotating mechanism is suitable for driving the corresponding eccentric rods in the shaking mechanism to rotate so as to enable each eccentric rod to push the corresponding wafer in the wafer box to rotate in the corresponding box body placing groove.
Further, the lifting mechanism includes: the device comprises a servo motor, a synchronous belt pulley set, a screw rod assembly, a transmission supporting block, a linear guide rail and a lifting rod; an output shaft of the servo motor is connected with a driving wheel of a synchronous pulley set, and a driven wheel of the synchronous pulley set is connected with a rotating shaft of the lead screw assembly; the transmission support block is movably arranged on the screw rod assembly, the linear guide rails are positioned on two sides of the screw rod assembly and are arranged in parallel with the screw rod assembly, and two sides of the transmission support block are movably limited on the linear guide rails; the lifting rod is positioned at the bottom of the transmission supporting rod; the servo motor is suitable for driving the synchronous belt pulley group to rotate so as to drive the screw rod assembly to rotate, and further drives the transmission supporting block to move along the transmission direction of the screw rod assembly under the limit of the linear guide rail so as to drive the lifting rod to longitudinally move.
Furthermore, the servo motor, the synchronous pulley group, the screw rod assembly, the transmission supporting block, the linear guide rail and the lifting rod are all installed on the fixed bottom plate, and the fixed bottom plate is connected with the cladding.
Furthermore, a position sensing assembly is arranged on the fixed bottom plate and is arranged in parallel with the linear guide rail; the position sensing assembly is suitable for detecting the relative movement distance between the transmission supporting block and the initial position on the linear guide rail so as to detect the rising height or the falling height of the rotating mechanism and the shaking mechanism.
Further, the rotation mechanism includes: the device comprises a fixed support, a rotating motor, a gear box, a transition rod, a gear set and at least one concentric rod; the fixed support is horizontally arranged and fixed at the bottom of the lifting rod, and the rotating motor is arranged in the fixed support; the gear box is vertically arranged, the top of the gear box is fixed with the fixed support, the transition rod and the gear set are sequentially installed in the gear box from top to bottom, the movable shaft of the rotating motor is connected with the transition rod, the transition rod is meshed with a gear at the top of the gear set, and each gear of the gear set is meshed with an adjacent gear; the concentric rod is coaxially arranged with a gear at the bottom of the wheel set, the shaking mechanism is horizontally arranged and connected to the bottom of the gear box, and the concentric rod is connected with a corresponding eccentric rod in the shaking mechanism; the rotating motor is suitable for driving the transition rod to rotate so as to drive the gears in the gear set to rotate and further drive the concentric rod to rotate, namely the concentric rod is suitable for driving the eccentric rod to rotate.
Further, the shaking mechanism includes: the device comprises a material frame, at least one wafer supporting piece and at least one eccentric rod; the material frame is horizontally arranged and fixed at the bottom of the gear box, each wafer supporting piece is arranged in the material frame, and each wafer supporting piece and the material frame form a corresponding box body placing groove; the eccentric rod is positioned in the box body placing groove and is divided into two sections, one section of the eccentric rod is coaxially arranged with the gear at the bottom of the wheel set and is connected with one end of the eccentric rod, and the other section of the eccentric rod is connected with the material frame through a sliding bearing and is connected with the other end of the eccentric rod; the wafer supporting piece is suitable for supporting a wafer box placed in the box body placing groove, namely the concentric rod drives the eccentric rod to rotate in the box body placing groove, so that the eccentric rod abuts against a wafer exposed at the bottom of the wafer box to rotate in the wafer box.
Further, the material frame is inboard to set up the backup pad, wafer support piece includes: four limiting blocks; and the four limiting blocks are fixed on the supporting plate at four corners so as to limit the wafer box placed in the box body placing groove.
The beneficial effects of the utility model are that, the utility model discloses an adopt elevating system, rotary mechanism, can overcome traditional rotary mechanism action easy jamming, the structure is perishable, easy jamming when the wafer is rotatory, the big yielding scheduling problem of structural space, realize the rotation of wafer in the wafer box by rocking mechanism simultaneously, make wafer and washing liquid fully contact improvement cleaning performance.
Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by the practice of the invention.
In order to make the aforementioned and other objects, features and advantages of the present invention comprehensible, preferred embodiments accompanied with figures are described in detail below.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the technical solutions in the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a structural diagram of the wafer rocking and rotating apparatus of the present invention;
FIG. 2 is a structural view of the elevating mechanism of the present invention;
fig. 3 is a structural view of the rotating mechanism of the present invention;
FIG. 4 is a structural diagram of the rocking mechanism of the present invention;
FIG. 5 is a block diagram of the support plate of the present invention;
fig. 6 is a structural view of the wafer cassette of the present invention.
In the figure:
1. a lifting mechanism; 11. a servo motor; 12. a synchronous pulley group; 13. a lead screw assembly; 14. a transmission supporting block; 15. a linear guide rail; 16. a lifting rod; 17. fixing the bottom plate; 18. a position sensing assembly;
2. a rotation mechanism; 21. fixing a bracket; 22. a rotating electric machine; 23. a gear case; 24. a transition rod; 25. a gear set; 26. a concentric rod;
3. a shaking mechanism; 31. material frame; 311. a support plate; 312. reserving a hole; 32. a wafer support; 33. an eccentric rod;
4. a wafer box; 41. and (5) a wafer.
Detailed Description
To make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions of the present invention will be described clearly and completely with reference to the accompanying drawings, and obviously, the described embodiments are some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts all belong to the protection scope of the present invention.
Example 1
In this embodiment, as shown in fig. 1 to 6, the present embodiment provides a wafer wobbling rotating device, which includes: the lifting mechanism 1, the rotating mechanism 2 and the shaking mechanism 3; the lifting mechanism 1 is movably connected with the rotating mechanism 2, and the rotating mechanism 2 is movably connected with the shaking mechanism 3; the shaking mechanism 3 is provided with at least one box body placing groove for placing the wafer box 4, and the shaking mechanism 3 is suitable for being immersed in the wafer cleaning groove; the lifting mechanism 1 is suitable for driving the rotating mechanism 2 and the shaking mechanism 3 to move longitudinally so as to enable the wafer box 4 to move longitudinally in the wafer cleaning tank; and the rotating mechanism 2 is suitable for driving the corresponding eccentric rods 33 in the shaking mechanism 3 to rotate, so that each eccentric rod 33 pushes the corresponding wafer 41 in the wafer box 4 to rotate in the corresponding box body placing groove.
In this embodiment, the automatic cleaning machine is provided with a wafer cleaning tank, the wafer cleaning tank is filled with a reaction solution, the shaking mechanism 3 is driven by the lifting mechanism 1 and the rotating mechanism 2 to be immersed in the wafer cleaning tank, and the shaking mechanism 3 moves up and down in the wafer cleaning tank within a certain range during cleaning, so that the wafer is fully contacted with the reaction solution.
In this embodiment, the lifting mechanism 1 and the rotating mechanism 2 are adopted in this embodiment, so that the problems of easy clamping stagnation, easy corrosion of structure, easy clamping during wafer rotation, large structural space and easy deformation of the conventional rotating mechanism 2 can be overcome, and meanwhile, the wafer 41 is rotated in the wafer box 4 by the shaking mechanism 3, so that the wafer 41 is fully contacted with the cleaning liquid to improve the cleaning effect.
In the present embodiment, the lifting mechanism 1 includes: the device comprises a servo motor 11, a synchronous pulley group 12, a screw rod assembly 13, a transmission support block 14, a linear guide rail 15 and a lifting rod 16; an output shaft of the servo motor 11 is connected with a driving wheel of a synchronous pulley set 12, and a driven wheel of the synchronous pulley set 12 is connected with a rotating shaft of a lead screw component 13; the transmission supporting block 14 is movably arranged on the lead screw component 13, the linear guide rails 15 are positioned at two sides of the lead screw component 13 and are arranged in parallel with the lead screw component 13, and two sides of the transmission supporting block 14 are movably limited on the linear guide rails 15; the lifting rod 16 is positioned at the bottom of the transmission supporting rod; the servo motor 11 is suitable for driving the synchronous pulley set 12 to rotate so as to drive the screw rod assembly 13 to rotate, and further drive the transmission support block 14 to move along the transmission direction of the screw rod assembly 13 under the limit of the linear guide rail 15 so as to drive the lifting rod 16 to move longitudinally.
In this embodiment, the servo motor 11, the synchronous pulley set 12, the screw assembly 13, the transmission support block 14, the linear guide 15, and the lifting rod 16 are all installed on a fixed bottom plate 17, and the fixed bottom plate 17 is connected with the cladding.
In the present embodiment, the fixing base plate 17 connects the wafer wobbling rotating device and the cover, and can support the entire wafer wobbling rotating device.
In this embodiment, a protective cover is covered on the fixed bottom plate 17 to protect the servo motor 11, the synchronous pulley set 12, the screw rod assembly 13, the transmission support block 14, the linear guide rail 15 and the lifting rod 16, and prevent acid and alkali gas from corroding the lifting mechanism 1.
In this embodiment, the synchronous pulley set 12 can connect the servo motor 11 and the lead screw assembly 13 to perform the function of transmitting power; the servo motor 11 mainly plays a role of providing power; the synchronous pulley group 12 can mainly drive the rotating mechanism 2 and the shaking mechanism 3 to move longitudinally; the transmission supporting block 14 mainly plays a role of connecting the screw rod assembly 13, the linear guide rail 15 and the lifting rod 16; the linear guide rail 15 can fix the transmission support block 14, and the support lead screw component 13 is connected with the lifting rod 16 to move longitudinally.
In this embodiment, a position sensing assembly 18 is disposed on the fixed base plate 17, and the position sensing assembly 18 is disposed in parallel with the linear guide 15; the position sensing assembly 18 is adapted to detect a relative movement distance between the transmission support block 14 and the initial position on the linear guide 15, so as to detect a rising height or a falling height of the rotating mechanism 2 and the shaking mechanism 3.
In this embodiment, the position sensing component 18 can position and detect the position of the transmission support block 14, so as to position and detect the position and accuracy of the rotating mechanism 2 and the shaking mechanism 3.
In the present embodiment, the rotation mechanism 2 includes: a fixed support 21, a rotating motor 22, a gear box 23, a transition rod 24, a gear set 25 and at least one concentric rod 26; the fixed support 21 is horizontally arranged and fixed at the bottom of the lifting rod 16, and the rotating motor 22 is arranged in the fixed support 21; the gear box 23 is vertically arranged, the top of the gear box 23 is fixed with the fixing support 21, the transition rod 24 and the gear set 25 are sequentially installed in the gear box 23 from top to bottom, the movable shaft of the rotating motor 22 is connected with the transition rod 24, the transition rod 24 is meshed with a gear at the top of the gear set 25, and each gear in the gear set 25 is meshed with an adjacent gear; the concentric rod 26 is coaxially arranged with a gear at the bottom of the wheel set, the shaking mechanism 3 is horizontally arranged and connected to the bottom of the gear box 23, and the concentric rod 26 is connected with a corresponding eccentric rod 33 in the shaking mechanism 3; the rotating motor 22 is adapted to drive the transition rod 24 to rotate, so as to drive the gears of the gear set 25 to rotate, and further drive the concentric rod 26 to rotate, i.e. the concentric rod 26 is adapted to drive the eccentric rod 33 to rotate.
In the embodiment, the fixing bracket 21 mainly plays a role of installation, can be connected with the lifting mechanism 1, and is used for installing the rotating motor 22 and the protective cover; the rotary motor 22 mainly provides rotary power to the gear set 25; the transition rod 24 is connected with the rotating motor 22 through a coupler, transmits power to the gear set 25 and plays a role in corrosion prevention; the gear set 25 mainly functions to smoothly transmit power to the concentric rod 26 and the eccentric rod 33; the gear box 23 is primarily carried as a cantilever and is the mounting carrier for the gear train 25.
In the present embodiment, the shaking mechanism 3 includes: a material frame 31, at least one wafer support 32 and at least one eccentric rod 33; the material frame 31 is horizontally arranged and fixed at the bottom of the gear box 23, each wafer support piece 32 is arranged in the material frame 31, and each wafer support piece 32 and the material frame 31 form a corresponding box body placing groove; the eccentric rod 33 is positioned in the box body placing groove, the concentric rod 26 is divided into two sections, one section of the concentric rod 26 is coaxially arranged with a gear at the bottom of the wheel set and is connected with one end of the eccentric rod 33, and the other section of the concentric rod 26 is connected with the material frame 31 through a sliding bearing and is connected with the other end of the eccentric rod 33; the wafer support 32 is adapted to support the wafer cassette 4 placed in the cassette placing slot, that is, the eccentric rod 33 is driven by the eccentric rod 26 to rotate in the cassette placing slot, so that the eccentric rod 33 abuts against the wafer 41 exposed at the bottom of the wafer cassette 4 to rotate in the wafer cassette 4.
In this embodiment, the concentric rod 26 and the eccentric rod 33 can contact the wafer 41 under the action of gravity, and the eccentric rod 33 drives the wafer 41 to rotate in the wafer box 4 by the static friction force; the wafer support 32 is capable of supporting and positioning the wafer cassette 4.
In this embodiment, a supporting plate 311 is disposed inside the material frame 31, and the wafer supporting member 32 includes: four limiting blocks; the four limiting blocks are fixed on the supporting plate 311 at four corners so as to limit the wafer cassette 4 placed in the cassette placing groove.
In this embodiment, the support plate 311 is provided with a preformed hole 312 at the inner side of each stopper, so that the wafer cassette 4 with a standard size can be compatible with the corresponding downward direction.
In this embodiment, the wafer shaking rotating device is fixed on the cladding through the fixing bottom plate 17, so that the whole wafer shaking rotating device is suspended in the groove, the servo motor 11 drives the screw assembly 13 to drive the transmission supporting block 14 connected with the screw assembly to move longitudinally under the support of the linear guide rail 15, so as to drive the lifting rod 16 connected with the transmission supporting block 14 to move longitudinally, thereby realizing that the rotating mechanism 2 shakes up and down, the rotating motor 22 is fixed on the fixing support 21, the rotating motor 22 is connected with the transition rod 24 through the coupler, power is transmitted into the gear set 25, and is transmitted to the concentric rod 26 and the eccentric rod 33 step by step through the gear set 25, so as to drive the wafer 41 to rotate. This rotary device is rocked to wafer adopts unilateral mode of hanging, simple structure, and occupation space is little, and the installation and maintenance of being convenient for, whole wafer rocks the outside cladding PVDF of the inside steel of rotary device, and the rigidity and the intensity of both effectual assurance whole structure have also guaranteed corrosion resistance, adopt gear train 25 transmission power, have guaranteed rotatory stationarity. In the aspect of corrosion resistance, the gear box 23 is sealed by a sealing ring, the gear box is uniformly in contact with the liquid medicine by a corrosion-resistant material, space division processing is carried out on the fixed support 21, and positive pressure is applied to the inside of the gear box to prevent acid and alkali gas from corroding driving elements. The use of the eccentric rods 26 and 33 ensures the effectiveness of the rotation of the non-circular wafer 41. In the cleaning process, the wafer box 4 is placed in the material frame 31, the lifting mechanism 1 drives the rotating mechanism 2 to drive the wafer box 4 to move up and down in a certain range in the groove during cleaning, so that the wafer 41 is fully contacted with a reaction solution, the wafer 41 in the wafer box 4 is fixed, two ends of the wafer 41 are clamped in the wafer box 4, the bottom of the wafer 41 is exposed to be directly contacted with the eccentric rod 33, and the rotating motor 22 drives the concentric rod 26 and the eccentric rod 33 to rotate through the gear set 25 to drive the wafer 41 to rotate inside the wafer box 4.
To sum up, the utility model discloses an adopt elevating system, rotary mechanism, can overcome traditional rotary mechanism action easy jamming, the structure is perishable, easy jamming, the big yielding scheduling problem of structure space when the wafer is rotatory, realize the rotation of wafer in the wafer box by rocking the mechanism simultaneously, make the wafer fully contact with the washing liquid and improve the cleaning performance.
The components selected for use in the present application (components not illustrated for specific structures) are all common standard components or components known to those skilled in the art, and the structure and principle thereof can be known to those skilled in the art through technical manuals or through routine experimentation. Moreover, the software programs referred to in the present application are all prior art, and the present application does not relate to any improvement of the software programs.
In the description of the embodiments of the present invention, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as being fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the several embodiments provided in the present application, it should be understood that the disclosed system, apparatus and method may be implemented in other ways.
In light of the foregoing, it will be apparent to those skilled in the art from this disclosure that various changes and modifications can be made without departing from the spirit and scope of the invention. The technical scope of the present invention is not limited to the content of the specification, and must be determined according to the scope of the claims.
Claims (7)
1. A wafer wobbling rotation device, comprising:
the lifting mechanism, the rotating mechanism and the shaking mechanism; wherein
The lifting mechanism is movably connected with the rotating mechanism, and the rotating mechanism is movably connected with the shaking mechanism;
the shaking mechanism is provided with at least one box body placing groove for placing a wafer box, and the shaking mechanism is suitable for being immersed into the wafer cleaning groove;
the lifting mechanism is suitable for driving the rotating mechanism and the shaking mechanism to move longitudinally so as to enable the wafer box to move longitudinally in the wafer cleaning tank; and
the rotating mechanism is suitable for driving the corresponding eccentric rods in the shaking mechanism to rotate so that the eccentric rods push the corresponding wafers in the wafer box to rotate in the corresponding box body placing grooves.
2. The wafer wobble rotation apparatus as claimed in claim 1,
the lifting mechanism comprises: the device comprises a servo motor, a synchronous belt pulley set, a screw rod assembly, a transmission supporting block, a linear guide rail and a lifting rod;
an output shaft of the servo motor is connected with a driving wheel of a synchronous pulley set, and a driven wheel of the synchronous pulley set is connected with a rotating shaft of the lead screw assembly;
the transmission support block is movably arranged on the screw rod assembly, the linear guide rails are positioned on two sides of the screw rod assembly and are arranged in parallel with the screw rod assembly, and two sides of the transmission support block are movably limited on the linear guide rails;
the lifting rod is positioned at the bottom of the transmission supporting rod;
the servo motor is suitable for driving the synchronous belt pulley group to rotate so as to drive the screw rod assembly to rotate, and further drives the transmission supporting block to move along the transmission direction of the screw rod assembly under the limit of the linear guide rail so as to drive the lifting rod to longitudinally move.
3. The wafer wobble rotation apparatus as claimed in claim 2,
the servo motor, the synchronous belt pulley group, the screw rod assembly, the transmission supporting block, the linear guide rail and the lifting rod are all installed on the fixed bottom plate, and the fixed bottom plate is connected with the cladding.
4. The wafer wobble rotation apparatus as claimed in claim 3,
a position sensing assembly is arranged on the fixed bottom plate and is parallel to the linear guide rail;
the position sensing assembly is suitable for detecting the relative movement distance between the transmission supporting block and the initial position on the linear guide rail so as to detect the rising height or the falling height of the rotating mechanism and the shaking mechanism.
5. The wafer wobble rotation apparatus as claimed in claim 2,
the rotating mechanism includes: the device comprises a fixed support, a rotating motor, a gear box, a transition rod, a gear set and at least one concentric rod;
the fixed support is horizontally arranged and fixed at the bottom of the lifting rod, and the rotating motor is arranged in the fixed support;
the gear box is vertically arranged, the top of the gear box is fixed with the fixed support, the transition rod and the gear set are sequentially installed in the gear box from top to bottom, the movable shaft of the rotating motor is connected with the transition rod, the transition rod is meshed with a gear at the top of the gear set, and each gear of the gear set is meshed with an adjacent gear;
the concentric rod is coaxially arranged with a gear at the bottom of the wheel set, the shaking mechanism is horizontally arranged and connected to the bottom of the gear box, and the concentric rod is connected with a corresponding eccentric rod in the shaking mechanism;
the rotating motor is suitable for driving the transition rod to rotate so as to drive each gear in the gear set to rotate and further drive the concentric rod to rotate, namely
The eccentric rod is suitable for driving the eccentric rod to rotate.
6. The wafer wobbling rotation device of claim 5,
the shaking mechanism comprises: the device comprises a material frame, at least one wafer supporting piece and at least one eccentric rod;
the material frame is horizontally arranged and fixed at the bottom of the gear box, each wafer supporting piece is arranged in the material frame, and each wafer supporting piece and the material frame form a corresponding box body placing groove;
the eccentric rod is positioned in the box body placing groove and is divided into two sections, one section of the eccentric rod is coaxially arranged with the gear at the bottom of the wheel set and is connected with one end of the eccentric rod, and the other section of the eccentric rod is connected with the material frame through a sliding bearing and is connected with the other end of the eccentric rod;
the wafer support is adapted to support a wafer cassette placed in the cassette receiving slot, i.e.
The eccentric rod drives the eccentric rod to rotate in the box body placing groove, so that the eccentric rod abuts against the wafer exposed at the bottom of the wafer box, and the wafer rotates in the wafer box.
7. The wafer wobble rotation apparatus as claimed in claim 6,
the material frame is inboard to set up the backup pad, wafer support piece includes: four limiting blocks;
and the four limiting blocks are fixed on the supporting plate at four corners so as to limit the wafer box placed in the box body placing groove.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222190830.8U CN217881425U (en) | 2022-08-15 | 2022-08-15 | Wafer shaking and rotating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222190830.8U CN217881425U (en) | 2022-08-15 | 2022-08-15 | Wafer shaking and rotating device |
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| Publication Number | Publication Date |
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| CN217881425U true CN217881425U (en) | 2022-11-22 |
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| CN202222190830.8U Active CN217881425U (en) | 2022-08-15 | 2022-08-15 | Wafer shaking and rotating device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115841977A (en) * | 2023-02-22 | 2023-03-24 | 上海果纳半导体技术有限公司 | Wafer conveying device |
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2022
- 2022-08-15 CN CN202222190830.8U patent/CN217881425U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115841977A (en) * | 2023-02-22 | 2023-03-24 | 上海果纳半导体技术有限公司 | Wafer conveying device |
| CN115841977B (en) * | 2023-02-22 | 2023-05-02 | 上海果纳半导体技术有限公司 | Wafer carrying device |
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