CN217876909U - Drying device for monocrystalline silicon production - Google Patents
Drying device for monocrystalline silicon production Download PDFInfo
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- CN217876909U CN217876909U CN202221254101.8U CN202221254101U CN217876909U CN 217876909 U CN217876909 U CN 217876909U CN 202221254101 U CN202221254101 U CN 202221254101U CN 217876909 U CN217876909 U CN 217876909U
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Abstract
The utility model relates to a drying device technical field just discloses a drying device is used in monocrystalline silicon production, the power distribution box comprises a box body, be provided with dehumidification mechanism and rotary mechanism in the box, dehumidification mechanism includes quick-witted case one, motor one, pivot one, fan, connecting pipe, backup pad one, placer, slot, ventilation hole, a motor fixed mounting is in the inner wall bottom of quick-witted case one, the output of motor one passes through the one end fixed connection of shaft coupling and pivot one, the fan fixed cover is established at the one end outer wall of keeping away from motor one in pivot one, the bottom of connecting pipe and the outer wall top fixed connection and the intercommunication setting of quick-witted case one. Through opening motor one, make the pivot drive fan rotatory to blow wind-force from the connecting pipe to the placer in, then discharge along the ventilation hole, weather the surface of monocrystalline silicon piece, prevent the processing influence that moist dewfall brought, guarantee production quality.
Description
Technical Field
The utility model relates to a drying device technical field specifically is a drying device is used in monocrystalline silicon production.
Background
Monocrystalline silicon is a relatively active non-metallic element, is an important component of crystal materials, and is in the front of the development of new materials. The solar photovoltaic power generation and heat supply semiconductor material is mainly used as a semiconductor material and utilizes solar photovoltaic power generation, heat supply and the like.
The existing monocrystalline silicon drying equipment is characterized in that a monocrystalline silicon piece is placed on a trolley, and then the trolley is pushed into a drying box to be dried, although the mode is simple and convenient, the moisture in the environment can cause the surface of the monocrystalline silicon piece to dewfall in the production process, the production quality is influenced, and the drying surface is unevenly heated, so that the drying efficiency is influenced.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a drying device is used in monocrystalline silicon production to solve the problem that proposes in the above-mentioned background art.
In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a drying device is used in monocrystalline silicon production, includes the box, be provided with dehumidification mechanism and rotary mechanism in the box, dehumidification mechanism includes quick-witted case one, motor one, pivot one, fan, connecting pipe, backup pad one, placer, slot, ventilation hole, a motor fixed mounting is in the inner wall bottom of quick-witted case one, the output of motor one passes through the one end fixed connection of shaft coupling and pivot one, the fan fixed cover is established and is kept away from the one end outer wall of motor one in pivot one, the bottom of connecting pipe and the outer wall top fixed connection of quick-witted case one and intercommunication setting, the outer wall bottom of placer and the top fixed connection of backup pad one, the fixed bottom that runs through backup pad one in top of connecting pipe and the bottom intercommunication setting with the placer, slot and ventilation hole are seted up in proper order at the outer wall top of placer.
Preferably, the rotating mechanism comprises a second case, a second motor, a second rotating shaft, a bearing and a second supporting plate, the second motor is fixedly installed at the bottom of the inner wall of the second case, the output end of the second motor is fixedly connected with one end of the second rotating shaft through a coupler, the bearing is fixedly installed at the top of the inner wall of the second case, the other end of the second rotating shaft is rotatably connected with the inner wall of the bearing and extends to the outer side of the top of the second case, and the bottom of the second supporting plate is fixedly connected with the extending end of the second rotating shaft.
Preferably, the bottom of the outer wall of the first case is fixedly connected with the top of the second support plate, and the bottom of the outer wall of the second case is fixedly connected with the bottom of the inner wall of the box body.
Preferably, heating plates are arranged on two sides of the inner wall of the box body.
Preferably, the top of the outer wall of the box body is provided with a heat dissipation port. The hot gas generated at high temperature can be discharged from the heat dissipation port, so that the risk of frying the box is avoided.
Preferably, the front surface of the outer wall of the box body is provided with a box door. And opening the box door to sequentially insert the monocrystalline silicon wafers into the slots of the placer.
The utility model provides a drying device is used in monocrystalline silicon production. The method has the following beneficial effects:
(1) The utility model discloses an open motor one, make the pivot drive the fan rotatory to blow wind-force to the placer in from the connecting pipe, then discharge along the ventilation hole, weather monocrystalline silicon piece's surface, prevent the processing influence that moist dewfall brought, guarantee production quality.
(2) The utility model discloses an open motor two, make two drive two rotations of backup pad of pivot to it is rotatory to drive the placer on the quick-witted case one, and open the hot plate and heat and dry, makes monocrystalline silicon piece evenly receive the hot side in rotatory process, improves drying efficiency.
Drawings
Fig. 1 is a schematic structural view of a front view of the present invention;
fig. 2 is a schematic structural view of a cross-sectional front view of the present invention;
fig. 3 is a sectional front view of the dehumidifying mechanism and the rotating mechanism of the present invention.
In the figure: 1. a box body; 2. a dehumidification mechanism; 201. a first case; 202. a first motor; 203. a first rotating shaft; 204. a fan; 205. a connecting pipe; 206. a first support plate; 207. a placer; 208. inserting slots; 209. a vent hole; 3. a rotation mechanism; 301. a second case; 302. a second motor; 303. a second rotating shaft; 304. a bearing; 305. a second support plate; 4. heating plates; 5. a heat dissipation port; 6. and a box door.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts all belong to the protection scope of the present invention.
As shown in fig. 1-3, the utility model provides a technical solution: a drying device for monocrystalline silicon production comprises a box body 1, heating plates 4 are arranged on two sides of the inner wall of the box body 1, a heat dissipation port 5 is formed in the top of the outer wall of the box body 1, hot gas generated at high temperature can be discharged from the heat dissipation port 5, the risk of box explosion is avoided, a box door 6 is arranged on the front face of the outer wall of the box body 1, the box door 6 is opened, monocrystalline silicon wafers are sequentially inserted into a slot 208 of a placing device 207, a dehumidifying mechanism 2 and a rotating mechanism 3 are arranged in the box body 1, the dehumidifying mechanism 2 comprises a box body I201, a motor I202, a rotating shaft I203, a fan 204, a connecting pipe 205, a supporting plate I206, a placing device 207, the slot 208 and a ventilation hole 209, the rotating shaft I203 drives the fan 204 to rotate by opening the motor I202, wind power is blown into the placing device 207 from the connecting pipe 205 and then is discharged along the ventilation hole 209, the surface of the monocrystalline silicon wafers is dried, and the processing influence caused by moisture and dew condensation is prevented, the production quality is ensured, the first motor 202 is fixedly installed at the bottom of the inner wall of the first case 201, the output end of the first motor 202 is fixedly connected with one end of the first rotating shaft 203 through a coupler, the fan 204 is fixedly sleeved on the outer wall of one end, far away from the first motor 202, of the first rotating shaft 203, the bottom end of the connecting pipe 205 is fixedly connected and communicated with the top of the outer wall of the first case 201, the bottom of the outer wall of the first case 207 is fixedly connected with the top of the first supporting plate 206, the top end of the connecting pipe 205 fixedly penetrates through the bottom of the first supporting plate 206 and is communicated with the bottom of the first placing device 207, the inserting groove 208 and the air vent 209 are sequentially arranged at the top of the outer wall of the placing device 207, the rotating mechanism 3 comprises a second case 301, a second motor 302, a second rotating shaft 303, a bearing 304 and a second supporting plate 305, the second rotating shaft 302 is opened to drive the second supporting plate 305 to rotate, so as to drive the placing device 207 on the first case 201 to rotate, and the heating plate 4 is opened for heating and drying, so that the heating surface of the monocrystalline silicon wafer in the rotation process is uniform, and the drying efficiency is improved, the motor II 302 is fixedly arranged at the bottom of the inner wall of the case II 301, the output end of the motor II 302 is fixedly connected with one end of the rotating shaft II 303 through a coupler, the bearing 304 is fixedly arranged at the top of the inner wall of the case II 301, the other end of the rotating shaft II 303 is rotatably connected with the inner wall of the bearing 304 and extends to the outer side of the top of the case II 301, the bottom of the supporting plate II 305 is fixedly connected with the extending end of the rotating shaft II 303, the bottom of the outer wall of the case I201 is fixedly connected with the top of the supporting plate II 305, and the bottom of the outer wall of the case II 301 is fixedly connected with the bottom of the inner wall of the box body 1.
When the single crystal silicon wafer drying box is used, the box door 6 is opened, the single crystal silicon wafers are sequentially inserted into the slot 208 of the placing device 207, the first motor 202 is then opened, the first rotating shaft 203 drives the fan 204 to rotate to blow air, the wind power is blown into the placing device 207 from the connecting pipe 205 and is discharged along the vent hole 209, the discharged wind power can blow the surfaces of the single crystal silicon wafers, the second motor 302 is then opened, the second rotating shaft 303 drives the second supporting plate 305 to rotate, the first box 201 is then rotated, the placing device 207 is simultaneously driven to rotate, finally the heating plate 4 is opened, the box door 6 is closed to be heated and dried, hot air generated at high temperature can be discharged from the heat dissipation port 5, and the risk of box explosion is avoided.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (6)
1. The utility model provides a drying device is used in monocrystalline silicon production, includes box (1), its characterized in that: be provided with dehumidification mechanism (2) and rotary mechanism (3) in box (1), dehumidification mechanism (2) are including quick-witted case one (201), motor one (202), pivot one (203), fan (204), connecting pipe (205), backup pad one (206), placer (207), slot (208), ventilation hole (209), motor one (202) fixed mounting is in the inner wall bottom of quick-witted case one (201), the output of motor one (202) passes through the shaft coupling and the one end fixed connection of pivot one (203), the one end outer wall of motor one (202) is kept away from in pivot one (203) is established to fan (204) fixed cover, the bottom of connecting pipe (205) and the outer wall top fixed connection and the intercommunication setting of quick-witted case one (201), the outer wall bottom and the top fixed connection of backup pad one (206) of placer (207) are run through to the top of connecting pipe (205) is fixed and is set up with the bottom intercommunication of placer (207), slot (208) and ventilation hole (209) are opened in proper order and are established at the top of placer (207).
2. The drying device for producing monocrystalline silicon of claim 1, characterized in that: rotary mechanism (3) include quick-witted case two (301), motor two (302), pivot two (303), bearing (304), backup pad two (305), motor two (302) fixed mounting is in the inner wall bottom of quick-witted case two (301), the one end fixed connection of shaft coupling and pivot two (303) is passed through to the output of motor two (302), bearing (304) fixed mounting is at the inner wall top of quick-witted case two (301), the inner wall rotation of the two (303) other ends of pivot and bearing (304) is connected to extend to the top outside of quick-witted case two (301), the bottom of backup pad two (305) and the extension end fixed connection of pivot two (303).
3. The drying device for producing monocrystalline silicon of claim 2, characterized in that: the bottom of the outer wall of the first case (201) is fixedly connected with the top of the second support plate (305), and the bottom of the outer wall of the second case (301) is fixedly connected with the bottom of the inner wall of the box body (1).
4. The drying device for producing monocrystalline silicon according to claim 1, characterized in that: heating plates (4) are arranged on two sides of the inner wall of the box body (1).
5. The drying device for producing monocrystalline silicon of claim 1, characterized in that: the top of the outer wall of the box body (1) is provided with a heat dissipation port (5).
6. The drying device for producing monocrystalline silicon according to claim 1, characterized in that: the front side of the outer wall of the box body (1) is provided with a box door (6).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202221254101.8U CN217876909U (en) | 2022-05-23 | 2022-05-23 | Drying device for monocrystalline silicon production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN202221254101.8U CN217876909U (en) | 2022-05-23 | 2022-05-23 | Drying device for monocrystalline silicon production |
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CN217876909U true CN217876909U (en) | 2022-11-22 |
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CN202221254101.8U Active CN217876909U (en) | 2022-05-23 | 2022-05-23 | Drying device for monocrystalline silicon production |
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2022
- 2022-05-23 CN CN202221254101.8U patent/CN217876909U/en active Active
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