CN217844725U - Furnace tube equipment - Google Patents
Furnace tube equipment Download PDFInfo
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- CN217844725U CN217844725U CN202221917382.0U CN202221917382U CN217844725U CN 217844725 U CN217844725 U CN 217844725U CN 202221917382 U CN202221917382 U CN 202221917382U CN 217844725 U CN217844725 U CN 217844725U
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Abstract
A furnace tube apparatus, comprising: the furnace body is internally provided with a furnace chamber and comprises an exhaust port and a blowing-in port; the wafer base is positioned in the furnace cavity and used for placing wafers; the exhaust pipe is detachably connected with the exhaust port of the furnace body and is communicated with the furnace chamber; and at least one stage of quartz inner tube arranged on the inner wall of the exhaust tube, wherein the quartz inner tube is communicated with the furnace chamber. Because the quartz inner tube has good corrosion resistance, when corrosive gas for cleaning the furnace tube is discharged, corrosion byproducts generated in the quartz inner tube are effectively reduced, moreover, the surface of the quartz inner tube is smooth, and the generated overlooking byproducts are not easy to adhere and accumulate, so that the adsorption and accumulation of the corrosive gas are effectively reduced. In addition, the quartz inner tube is communicated with the furnace chamber, and the furnace body is made of quartz materials, so that the gas flow path of the quartz inner wall can be effectively increased, and the quality of the deposited film is improved.
Description
Technical Field
The utility model relates to the field of semiconductor technology, especially, relate to a furnace tube equipment.
Background
The semiconductor manufacturing process mainly comprises multiple photoetching processes, etching processes and film formingAnd (4) stacking semiconductor elements with special structures on the surface of the semiconductor wafer. Among them, a thermal oxidation method and a Chemical Vapor Deposition (CVD) process are generally used as a film forming process for forming various thin films. The thermal oxidation method is mainly a furnace tube thermal oxidation method, and after reaction gas is introduced into a high-temperature furnace tube, the reaction gas and a semiconductor wafer in the furnace are subjected to chemical reaction, so that a layer of film is deposited on the surface of the wafer. The process is used for growing SiO 2 、Si 3 N 4 And SiCON, polysilicon, etc., and metal layers, ferroelectric materials, barrier layers, high dielectric constant materials, low dielectric constant materials, etc. have also been grown by this process in recent years.
Furnace tube (burn) equipment used in the furnace tube thermal oxidation process generally has various forms such as a horizontal type, a vertical type, a barrel type and the like. Taking a vertical deposition furnace as an example, a plurality of wafers are usually placed in the furnace, and a reaction gas such as oxygen, nitrogen, etc. is introduced to grow a dielectric film on the wafer surface in a high temperature environment. In this process, some metal ions (ions) and polymer residues are generated on the inner wall of the furnace tube. As semiconductor processes enter the deep submicron era, the integration of semiconductor devices is higher and higher, and the diameter of semiconductor wafers is from 6 inches to 8 inches to 12 inches at present. The increase of the wafer diameter leads to the trend of the large-scale furnace tube equipment, the diameter of the furnace tube is correspondingly increased, and after a plurality of film forming reactions are carried out, metal ions and high molecular polymers accumulated on the inner wall of the furnace tube are more and more accumulated to form a large amount of residues. If these residues are not removed, they are likely to be a source of particles (particles) due to heat in the subsequent process, thereby affecting the yield of the subsequent process and the stability of the product.
However, the prior art still has many problems in the cleaning process of the furnace tube equipment.
SUMMERY OF THE UTILITY MODEL
The utility model provides a problem provide a boiler tube equipment to reduce the corruption accessory substance in the blast pipe and pile up and corrosive gas's absorption accumulation.
In order to solve the above problems, the utility model provides a furnace tube device, include: the furnace body is internally provided with a furnace chamber and comprises an exhaust port and a blowing gas port; the wafer base is positioned in the furnace cavity and used for placing wafers; the exhaust pipe is detachably connected with an exhaust port of the furnace body and is communicated with the furnace chamber; and at least one stage of quartz inner tube assembled on the inner wall of the exhaust tube, wherein the quartz inner tube is communicated with the furnace chamber.
Optionally, the quartz inner tube comprises a plurality of sections of sub-grade quartz inner tubes which are clamped in sequence, and clamping protrusions are arranged between the adjacent clamping sub-grade quartz inner tubes.
Optionally, the length of the sub-grade quartz inner tube is 150 mm to 250 mm; the thickness of the sub-grade quartz inner tube is 3 mm-6 mm.
Optionally, several sections of the sub-grade quartz inner tube comprise: the first-stage quartz inner tube, the second-stage quartz inner tube and the third-stage quartz inner tube.
Optionally, the first-stage quartz inner tube includes: the first step portion is connected with the first main part.
Optionally, the end of the exhaust pipe has an inner pipe positioning step, the first main body part is in contact with the inner pipe positioning step in an abutting manner, and the first step part covers the inner pipe positioning step.
Optionally, the second-stage quartz inner tube includes: a second body portion and a second step portion connected to the second body portion; the first main body part and the second main body part are in contact with each other, and the second step part covers a part of the first main body part.
Optionally, the third-stage quartz inner tube includes: a third body portion and a third step portion connected to the third body portion; the second main body part is in contact with the third main body part in an abutting mode, and the third step part covers a part of the second main body part.
Optionally, a gap is formed between the exhaust pipe and the furnace body, and a sealing ring is arranged between the gaps.
Optionally, the sealing ring includes: the sealing device comprises a sealing part and a buffering part connected with the sealing part, wherein a clamping groove is formed in the buffering part; the third-stage quartz inner tube further comprises: and the bracket part is connected with the third main body part and is assembled in the clamping groove.
Optionally, the structure that the furnace body and blast pipe fixed connection include: connecting a screw rod; the first clamping plate is fixedly connected with the connecting screw rod; the second clamping plate is sleeved on the connecting screw rod, and a clamping opening is formed between the first clamping plate and the second clamping plate; and the fixing nut is in threaded connection with the connecting screw rod.
Optionally, the exhaust pipe has a first clamping protrusion; the furnace body is provided with a second clamping bulge; the first clamping protrusion and the second clamping protrusion are clamped in the clamping opening, and the size of the clamping opening is adjusted through the fixing nut, so that the exhaust pipe and the furnace body are clamped and fixed.
Compared with the prior art, the technical scheme of the utility model have following advantage:
the utility model discloses in technical scheme's the boiler tube equipment, include: and the quartz inner tube is assembled on the inner wall of the exhaust tube and communicated with the furnace chamber. Because the quartz inner tube has good corrosion resistance, when corrosive gas for cleaning the furnace tube is discharged, corrosion byproducts generated in the quartz inner tube are effectively reduced, moreover, the surface of the quartz inner tube is smooth, and the generated overlooking byproducts are not easy to adhere and accumulate, so that the adsorption and accumulation of the corrosive gas are effectively reduced. In addition, because the quartz inner tube is communicated with the furnace chamber, and the furnace body is made of quartz material, the gas flow path of the quartz inner wall can be effectively increased, so that the quality of the deposited film is improved.
Furthermore, the quartz inner tube comprises a plurality of sections of sub-grade quartz inner tubes which are sequentially clamped, and clamping protrusions are arranged between the inner parts of the sub-grade quartz which are adjacently clamped. By adopting a plurality of sections of the sub-grade quartz inner tubes, the internal stress of each section of the sub-grade quartz inner tube can be effectively reduced, and the quartz inner tubes are effectively prevented from being cracked. And each section the sub-level quartz inner tube is mutually clamped, so that each section can be effectively prevented from displacing, and the stability of the quartz inner tube is further ensured. In addition, adjacent joint the sub-level quartz is inside to have the joint arch between, utilize the arch can produce certain the stopping to the corrosive gas of adverse current, reduces corrosive gas and flows into the furnace chamber and cause the damage to the wafer.
Further, a gap is formed between the exhaust pipe and the furnace body, and a sealing ring is arranged between the gaps. Because the material of blast pipe is metal, the material of furnace body is the quartz material, and the two can not directly weld, consequently can effectively reduce gaseous leakage through the sealing washer.
Further, the seal ring includes: the sealing device comprises a sealing part and a buffering part connected with the sealing part, wherein a clamping groove is formed in the buffering part; the third-stage quartz inner tube further comprises: and the bracket part is connected with the third main body part and is assembled in the clamping groove. The buffer connection between the third-stage quartz inner tube and the exhaust tube can be realized through the buffer part, and the third-stage quartz inner tube is prevented from being cracked due to rigid contact with the exhaust tube.
Drawings
FIG. 1 is a schematic view of a furnace apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic cross-sectional view of a seal ring of a furnace tube apparatus according to an embodiment of the present invention;
fig. 3 is a schematic structural view illustrating a fixed connection between an exhaust pipe and a furnace body in a furnace tube apparatus according to an embodiment of the present invention.
Detailed Description
As mentioned in the background, the prior art still has many problems in cleaning the furnace tube equipment. As will be specifically described below.
Furnace tube equipment is widely used in semiconductor manufacturing process, in advanced manufacturing process, as quartz furnace tubes are expensive, in order to reduce damage to quartz in the maintenance, disassembly and assembly process of personnel, the furnace tubes of advanced manufacturing process mostly adopt corrosive gas as cleaning gas. Through the program settingAnd (3) introducing clean gas into the furnace tube cavity under a certain condition, and carrying out dry cleaning on the inner wall of the cavity so as to achieve the purpose of removing the film and impurities on the inner wall of the cavity. The dry cleaning gas includes, but is not limited to, the following gases: 20% of F 2 /N 2 HF, HCL, DCE and NF 3 And the like.
With the development of the manufacturing process, more and more furnace tubes adopt corrosive gas to clean the inner wall of the quartz furnace tube, and are mainly applied to the manufacturing processes of Si3N4, siO2, polysilicon, amorphous silicon and the like. The cleaning with corrosive gases poses the following problems:
1. the gas pipeline of the furnace tube equipment is a metal pipeline: the metal pipeline is corroded by corrosive gas more easily, byproducts are accumulated on the inner wall of the pipeline, and when the crystal boat of the furnace tube is lifted, airflow disturbance is caused, and byproduct particles are lifted easily, so that the granularity of the manufacturing process is influenced.
2. Corrosive gases adhere to the inner wall of the exhaust pipe, and loose byproducts also adsorb the corrosive gases: the residue of the corrosive gas in the exhaust pipe will slowly diffuse toward the chamber, thereby having a serious impact on the wafer.
In order to solve the above problems, in the prior art, a nickel-based alloy with corrosion resistance is used for manufacturing the exhaust pipeline. The exhaust line made of nickel-based alloy has the following disadvantages: the cost is high, the corrosion resistant period is short, the effect is good at the initial stage of use, and the effect is poor at the later stage.
In the prior art, a special material film is also used for forming an anti-corrosion coating on the inner wall of the exhaust pipe. The disadvantages of corrosion resistant coatings are: the coating is easy to damage under the action of long-time high temperature and corrosive gas.
On this basis, the utility model provides a furnace tube equipment, include: and the quartz inner tube is assembled on the inner wall of the exhaust tube and is communicated with the furnace chamber. Because the quartz inner tube has fine corrosion resistance, when the corrosive gas who washs the boiler tube discharges, effectively reduce the quartz inner tube produces the corruption accessory substance, moreover the surface of quartz inner tube is comparatively smooth, even the accessory substance of overlooking that produces is difficult for adhering to the accumulation, and then effectively reduces the absorption accumulation of corrosive gas.
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.
FIG. 1 is a schematic view of a furnace apparatus according to an embodiment of the present invention; FIG. 2 is a schematic cross-sectional view of a seal ring of a furnace tube apparatus according to an embodiment of the present invention; fig. 3 is a schematic structural view illustrating a fixed connection between an exhaust pipe and a furnace body in a furnace tube apparatus according to an embodiment of the present invention.
Referring to fig. 1, a furnace apparatus includes: a furnace body 100, wherein the furnace body 100 is provided with a furnace chamber 101, and the furnace body comprises an exhaust port (not marked in the figure) and a blowing gas port (not marked in the figure); a wafer pedestal 102 located in the furnace chamber 101, wherein the wafer pedestal 102 is used for placing a wafer; an exhaust pipe 103 detachably connected to an exhaust port of the furnace body 100, the exhaust pipe 103 being communicated with the furnace chamber 101; and at least one stage of quartz inner tube mounted on the inner wall of the exhaust pipe 103, the quartz inner tube being in communication with the furnace chamber 101.
In this embodiment, since the quartz inner tube has a good corrosion resistance, when the corrosive gas for cleaning the furnace tube is discharged, the generation of corrosion byproducts in the quartz inner tube is effectively reduced, and the surface of the quartz inner tube is smooth, so that the generated byproducts are not easy to adhere and accumulate even when viewed from above, and further, the adsorption and accumulation of the corrosive gas are effectively reduced. In addition, since the quartz inner tube is communicated with the furnace chamber 101, and the material of the furnace body 100 is also quartz material, the gas flow path of the quartz inner wall can be effectively increased, thereby improving the quality of the deposited film.
With reference to fig. 1, in the present embodiment, the quartz inner tube includes a plurality of sub-grade quartz inner tubes clamped in sequence, and clamping protrusions are disposed between adjacent sub-grade quartz inner tubes clamped in sequence.
In this embodiment, the multiple sections of the sub-level quartz inner tubes are adopted, so that the internal stress of each section of the sub-level quartz inner tube can be effectively reduced, and the quartz inner tubes can be effectively prevented from being cracked. And each section the sub-level quartz inner tube is mutually clamped, so that each section can be effectively prevented from displacing, and the stability of the quartz inner tube is further ensured. In addition, adjacent joint the sub-level quartz is inside to have the joint arch between, utilize the arch can produce certain the stopping to the corrosive gas of adverse current, reduces corrosive gas and flows into the furnace chamber and cause the damage to the wafer.
In the embodiment, the length of the sub-grade quartz inner tube is 150 mm-250 mm; the thickness of the sub-grade quartz inner tube is 3 mm-6 mm.
In this embodiment, several sections of the sub-grade quartz inner tube comprise: a first stage quartz inner tube 104, a second stage quartz inner tube 105, and a third stage quartz inner tube 106.
Referring to fig. 1, in the present embodiment, the first-stage quartz inner tube 104 includes: a first body portion 104a and a first step portion 104b connected to the first body portion 104 a; the end of the exhaust pipe 103 has an inner pipe positioning step 103a, the first body portion 104a is in abutting contact with the inner pipe positioning step 103a, and the first stepped portion 104b covers the inner pipe positioning step 103a.
With continued reference to fig. 1, in the present embodiment, the second-stage quartz inner tube 105 includes: a second body portion 105a and a second step portion 105b connected to the second body portion 105 a; the first main body 105a and the second main body 105b are in contact with each other, and the second step 105b covers a part of the first main body 104a.
In this embodiment, the protrusion includes the second step portion 105b, and the second step portion 105b not only can position the first body portion 104a, but also can block the reverse flow of the corrosive gas to a certain extent, so as to reduce the damage of the wafer caused by the corrosive gas flowing into the furnace chamber 101.
With continued reference to fig. 1, in the present embodiment, the third-stage quartz inner tube 106 includes: a third body portion 106a and a third step portion 106b connected to the third body portion 106 a; the second body portion 105a and the third body portion 106a are in contact with each other, and the third step portion 106b covers a part of the second body portion 105a.
In this embodiment, the protrusion further includes the third step portion 106b, and the third step portion 106b not only can position the second body portion 105a, but also can block the reverse flow of the corrosive gas to a certain extent, so as to reduce the damage of the wafer caused by the corrosive gas flowing into the furnace chamber 101.
Referring to fig. 1, in the present embodiment, a gap 107 is formed between the exhaust pipe 103 and the furnace body 100, and a sealing ring 108 is disposed between the gap 107. Since the exhaust pipe 103 is made of metal and the furnace body 100 is made of quartz, the two cannot be directly welded to each other, and thus, gas leakage can be effectively reduced by the seal ring 108.
Referring to fig. 2, in the present embodiment, the sealing ring 108 includes: a sealing part 108a and a buffer part 108b connected with the sealing part 108a, wherein the buffer part 108b is internally provided with a clamping groove 108c; the third stage quartz inner tube 106 further comprises: and a bracket portion 106c connected to the third body portion 106a, wherein the bracket portion 106c is fitted in the engaging groove 108 c. The buffer part 108b can realize buffer connection between the third-stage quartz inner tube 106 and the exhaust pipe 103, and avoid the third-stage quartz inner tube 106 from being broken due to hard contact between the third-stage quartz inner tube 106 and the exhaust pipe 103.
Referring to fig. 3, in the present embodiment, the structure 109 for fixedly connecting the furnace body 100 and the exhaust pipe 103 includes: a connecting screw 109a; a first clamping plate 109b fixedly connected with the connecting screw 109a; a second clamping plate 109c sleeved on the connecting screw 109a, wherein a clamping opening 109d is formed between the first clamping plate 109b and the second clamping plate 109 c; and a fixing nut 109e in threaded connection with the connecting screw 109 a.
With continued reference to fig. 3, in the present embodiment, the exhaust 103 has a first clamping protrusion 103b; the furnace body 100 has a second holding projection 100a; the first clamping protrusion 103b and the second clamping protrusion 100a are clamped in the clamping opening 109d, and the size of the clamping opening 109d is adjusted through the fixing nut 109e, so that the exhaust pipe 103 and the furnace body 100 are clamped and fixed.
Although the present invention is disclosed above, the present invention is not limited thereto. Various changes and modifications may be effected therein by one of ordinary skill in the pertinent art without departing from the scope or spirit of the present invention, and the scope of the present invention is defined by the appended claims.
Claims (12)
1. A furnace tube apparatus, comprising:
the furnace body is internally provided with a furnace chamber and comprises an exhaust port and a blowing gas port;
the wafer base is positioned in the furnace cavity and used for placing wafers;
the exhaust pipe is detachably connected with the exhaust port of the furnace body and is communicated with the furnace chamber; and at least one stage of quartz inner tube assembled on the inner wall of the exhaust tube, wherein the quartz inner tube is communicated with the furnace chamber.
2. The furnace tube apparatus of claim 1, wherein the quartz inner tube comprises a plurality of sections of sub-grade quartz inner tubes clamped in sequence, and clamping protrusions are arranged between the adjacent clamped sub-grade quartz inner tubes.
3. The furnace tube apparatus of claim 2, wherein the length of the sub-grade quartz inner tube is 150 mm to 250 mm; the thickness of the sub-grade quartz inner tube is 3 mm-6 mm.
4. The furnace apparatus of claim 2, wherein the plurality of sections of sub-grade quartz inner tubes comprise: the first-stage quartz inner tube, the second-stage quartz inner tube and the third-stage quartz inner tube.
5. The furnace apparatus of claim 4, wherein the first quartz inner tube comprises: the first step portion is connected with the first main body portion.
6. The furnace tube apparatus of claim 5, wherein the end of the exhaust tube has an inner tube positioning step, the first main body portion is in abutting contact with the inner tube positioning step, and the first step portion covers the inner tube positioning step.
7. The furnace apparatus of claim 5, wherein the second quartz inner tube comprises: a second body portion and a second step portion connected to the second body portion; the first main body part and the second main body part are in contact with each other, and the second step part covers a part of the first main body part.
8. The furnace apparatus of claim 7, wherein the third stage quartz inner tube comprises: a third body portion and a third step portion connected to the third body portion; the second main body part and the third main body part are in contact with each other, and the third stepped part covers a part of the second main body part.
9. The furnace tube apparatus of claim 8, wherein a gap is provided between the exhaust tube and the furnace body, and a sealing ring is provided between the gaps.
10. The furnace tube apparatus of claim 9, wherein the seal ring comprises: the sealing device comprises a sealing part and a buffering part connected with the sealing part, wherein a clamping groove is formed in the buffering part; the third-stage quartz inner tube further comprises: and the bracket part is connected with the third main body part and is assembled in the clamping groove.
11. The furnace tube apparatus of claim 1, wherein the structure for detachably connecting the furnace body and the exhaust tube comprises: connecting a screw rod; the first clamping plate is fixedly connected with the connecting screw rod; the second clamping plate is sleeved on the connecting screw rod, and a clamping opening is formed between the first clamping plate and the second clamping plate; and the fixing nut is in threaded connection with the connecting screw rod.
12. The furnace tube apparatus of claim 11, wherein the exhaust tube has a first gripping protrusion; the furnace body is provided with a second clamping bulge; the first clamping protrusion and the second clamping protrusion are clamped in the clamping opening, and the size of the clamping opening is adjusted through the fixing nut, so that the exhaust pipe and the furnace body are clamped and fixed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221917382.0U CN217844725U (en) | 2022-07-22 | 2022-07-22 | Furnace tube equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221917382.0U CN217844725U (en) | 2022-07-22 | 2022-07-22 | Furnace tube equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217844725U true CN217844725U (en) | 2022-11-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221917382.0U Active CN217844725U (en) | 2022-07-22 | 2022-07-22 | Furnace tube equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217844725U (en) |
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2022
- 2022-07-22 CN CN202221917382.0U patent/CN217844725U/en active Active
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