CN217677757U - Sputtering coating target heating platform - Google Patents
Sputtering coating target heating platform Download PDFInfo
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- CN217677757U CN217677757U CN202221664317.1U CN202221664317U CN217677757U CN 217677757 U CN217677757 U CN 217677757U CN 202221664317 U CN202221664317 U CN 202221664317U CN 217677757 U CN217677757 U CN 217677757U
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Abstract
The utility model provides a sputtering coating target heating platform, which comprises a bottom plate, a heating platform arranged on the bottom plate and auxiliary heaters arranged on two sides of the bottom plate; the auxiliary heater is a movable auxiliary heater. The auxiliary heaters are arranged on the two sides of the heating platform, so that the target is heated more uniformly, the problem of large warping degree around the target in the manufacturing process is reduced, the welding combination rate is favorably improved, and the subsequent correction difficulty of heating in the manufacturing process is reduced; meanwhile, the auxiliary heater is arranged in a movable mode, so that the utilization rate is improved, and the uniformity of the target in the heating process is further improved.
Description
Technical Field
The utility model belongs to the technical field of the target material for the liquid crystal display panel sputtering, a sputter coating target material heating platform is related to.
Background
The target material is composed of a copper back plate and a target blank, the size of the G6 target blank is generally 2300 × 1800mm, and the area reaches about 4 square meters. The back plate and the target blank are respectively placed on a left heating platform and a right heating platform, the heating is carried out until the temperature is raised to a certain temperature, the solder is respectively added in the process, the surface infiltration treatment is carried out after the solder is melted, and then the infiltration effect is confirmed. The target blank is supported off the heating platform by a support rod. Have turning device in the middle of 2 heating platform, there is the vacuum chuck combination on the turning device crossbeam, and vacuum chuck holds non-welding face, then shifts out heating platform and does the upset to middle zone for the target welding face is downward, and inclines to certain angle, then moves to above the backplate, looks for the position, slowly puts down the lock. The structure of the heating platform is crucial in the preparation of the target material.
CN 209537611U discloses a sputter target heating platform relates to heating platform, including the frame, be fixed with a plurality of heating blocks in the frame, the interpolation of heating block has connect a plurality of electric rods, a plurality of heating block one side butt joint have a plurality of backing plates that are used for heating the sputter target, a plurality of heating blocks set up along the length direction of backing plate, frame week side is fixed with the collecting vat that is used for collecting unnecessary solder, the frame all is fixed with the fixed subassembly that is used for fixed splash board at the both ends of backing plate. To the problem that there is too much solder to drip to the workshop in prior art after melting, this utility model effectively avoids unnecessary solder to drip to the workshop in through set up the collecting vat in frame week side, ensures the health and the cleanness in the workshop.
CN 210305714U discloses a target casting heating device, including heating platform and automatically controlled cabinet, three group heating tube group and three thermocouple are installed to the heating platform, be equipped with temperature control circuit in the automatically controlled cabinet, temperature control circuit is provided with three-phase power input port, heating branch and temperature feedback branch, the heating branch is provided with three-phase voltage regulating module, three-phase voltage regulating module and heating tube group branch establish ties and form a heating branch, temperature feedback branch is provided with three temperature controller, first contactor KM2, second contactor KM3 and third contactor KM4, the coil of first contactor KM2, the coil of second contactor KM3 and the coil of third contactor KM4 electricity respectively connect the signal output interface of three temperature controller, each thermocouple is distinguished to the signal input interface of each temperature controller, in order to realize receiving the current signal or the voltage signal of each thermocouple. The utility model discloses an adopt and to make heating platform be in the constant temperature state to the realization is to the accurate control of temperature.
CN 211036081U discloses a sputter target heating platform, including PMKD, the fixed battery that is equipped with in PMKD below, the PMKD top is equipped with sputter target heating platform, sputter target heating platform includes outer box, the bottom of outer box is equipped with down the hot plate, the hot plate is equipped with the protective housing outward down, the protective housing closely laminates with hot plate down, be equipped with sputter target body on the hot plate down, the both sides that lie in sputter target heating platform on the PMKD all are equipped with fixed curb plate, fixed curb plate top is equipped with the support diaphragm, all be equipped with the nut in the support diaphragm, it is equipped with the threaded rod to run through in the nut, the bottom of threaded rod all is equipped with connecting bearing, connecting bearing below is equipped with the hot plate, it is equipped with the heat-conducting plate to go up the hot plate bottom, beneficial effect: the device has the advantages of simple structure, convenience in use, capability of uniformly heating the sputtering target body, fixation function, and no influence on the sanitation and cleanness inside a workshop.
In the technical scheme, the heating platform is only slightly larger than the target blank, and the thermal field caused by the heating wires at the edges is different from the central part, so that the temperature at the periphery of the heating platform is lower than that of the central part because part of heat is easily taken away at the periphery of the heating platform. The unevenness of the temperature distribution exacerbates the unevenness of the heat transfer. Finally, the central temperature and the peripheral temperature of the Ti target blank are high, so that the periphery of the Ti target blank is warped upwards, and poor welding is caused after welding.
Therefore, how to provide a suitable heating platform device, solve the target blank and heat up the back, the big problem of warpage all around is that liquid crystal display panel sputtering is with target technical field needs a solution urgently.
SUMMERY OF THE UTILITY MODEL
Not enough to prior art exists, the utility model aims to provide a sputter coating target heating platform sets up auxiliary heater through the both sides at heating platform for it is more even to the target heating, has reduced the problem that the angularity is big all around in the target makes, is favorable to promoting the welding and bonds the rate and reduces the subsequent correction degree of difficulty of heating in the manufacturing process.
To achieve the purpose, the utility model adopts the following technical proposal:
the utility model provides a sputtering coating target heating platform, which comprises a bottom plate, a heating platform arranged on the bottom plate and auxiliary heaters arranged on two sides of the bottom plate;
the auxiliary heater is a movable auxiliary heater.
The auxiliary heaters are arranged on the two sides of the heating platform, so that the target is heated more uniformly, the problem of large warping degree around the target in the manufacturing process is reduced, the welding combination rate is favorably improved, and the subsequent correction difficulty of heating in the manufacturing process is reduced; meanwhile, the auxiliary heater is arranged to be movable, so that the utilization rate is improved, and the uniformity of the target in the heating process is further improved.
Preferably, the auxiliary heater has an inverted L-shape.
Through above-mentioned technical scheme, during the use, the minor face of the auxiliary heater of type of falling L is vertical to be placed, installs on the bottom plate, and long limit plane is parallel with the bottom plate plane. The auxiliary heaters are respectively arranged on two sides of the sputtering coating target heating platform, so that the target is surrounded by the auxiliary heaters when being placed on the heating platform.
Preferably, the auxiliary heater comprises a heat transfer matrix, a heater and an insulating layer;
the heater is arranged inside the heat transfer matrix;
the heat-insulating layer is arranged on the surface of the heat-transfer substrate.
The utility model provides a heat transfer base member self possesses certain weight, can play the effect of load, in the use, is favorable to reverse correction target warpage all around.
Preferably, the heater comprises a heating tube and/or a heating wire.
The heater is arranged inside the heat transfer matrix.
Through the technical scheme, the heater heats the heat transfer matrix, and after the temperature of the heat transfer matrix rises, the heat transfer matrix is contacted with the edge surface of the target to heat the surface of the target, so that the temperature of the edge of the target is increased, the uniformity of the target is ensured when the target is heated on the heating platform, the possibility of warping around the target is further reduced, the yield of the target is increased, the loss is reduced, and the improvement of the welding bonding rate and the reduction of the heating subsequent correction difficulty in the manufacturing process are facilitated.
The heat-insulating layer is arranged on the surface of the heat-transfer substrate.
Preferably, the thickness of the heat transfer matrix is 1.5 to 3m, and may be, for example, 1.5m, 1.8m, 2m, 2.5m or 3m, but is not limited to the recited values, and other values not recited within the range of values are equally applicable.
Preferably, the heater comprises a heating tube and/or a heating wire.
Preferably, the thickness of the insulating layer is 0.2 to 1m, and may be, for example, 0.2m, 0.5m, 0.7m, 0.9m or 1m, but is not limited to the values listed, and other values not listed in the numerical range are also applicable.
Preferably, the insulating layer is glued to the heat transfer matrix.
Preferably, the gluing is performed by: high temperature resistant glue is arranged between the heat preservation layer and the heat transfer matrix.
Through above-mentioned technical scheme, the heat transfer base member is in the same place through the high temperature resistant glue bonding between heat preservation, and high temperature resistant glue has played the effect to the firm bonding of heat preservation. After the heater begins to heat, the heat preservation will play the effect of gathering together to the heat that auxiliary heater generated, has further promoted thermal effective utilization to when having guaranteed that the target is heated on heating platform, the homogeneity of target has reduced the possibility of taking place the warpage all around.
Preferably, the two side edges of the bottom plate are provided with slideways for installing the auxiliary heater.
Preferably, the depth of the slide is 10 to 50cm, for example 10cm, 20cm, 30cm, 40cm or 50cm, but is not limited to the values recited, and other values not recited within the range of values are equally applicable.
Preferably, the width of the slideway is from 20 to 100cm, for example 20cm, 40cm, 60cm, 80cm or 100cm, but is not limited to the values recited, and other values not recited within the range of values are equally applicable.
Through the technical scheme, when the sputtering coating target heating platform is used, the position of the auxiliary heater is moved and changed according to the length of the target, so that the use flexibility of the sputtering coating target heating platform is improved, and the uniformity of the target in the heating process is further improved.
Compared with the prior art, the beneficial effects of the utility model are that:
(1) The auxiliary heaters are arranged on the two sides of the heating platform, so that the target is heated more uniformly, the problem of large warping degree around the target in the manufacturing process is reduced, the welding combination rate is favorably improved, and the subsequent correction difficulty of heating in the manufacturing process is reduced; meanwhile, the auxiliary heater is arranged in a movable mode, so that the utilization rate is improved, and the uniformity of the target in the heating process is further improved.
(2) The utility model provides a heat transfer base member self possesses certain weight, can play the effect of load, in the use, is favorable to reverse correction target warpage all around.
(3) The heat transfer base body and the heat preservation layer are bonded together through the high temperature resistant glue, and the high temperature resistant glue plays a role in firmly bonding the heat preservation layer. After the heater begins to heat, the heat preservation will play the effect of gathering together to the heat that auxiliary heater generated, has further promoted thermal effective utilization to when having guaranteed that the target is heated on heating platform, the homogeneity of target has reduced the possibility of taking place the warpage all around.
Drawings
Fig. 1 is a schematic structural view of a sputtering coating target heating platform provided by the present invention.
Fig. 2 is a front view of the auxiliary heater provided by the present invention.
Wherein:
1-bottom plate, 2-heating platform, 3-auxiliary heater, 4-slideway, 5-heat transfer base body, 6-heater and 7-heat-insulating layer.
Detailed Description
It is to be understood that in the description of the present invention, the terms "central," "longitudinal," "lateral," "up," "down," "front," "back," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in the orientation or positional relationship indicated in the drawings only for the convenience of description and simplicity of description, and are not intended to indicate or imply that the device or element so referred to must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be considered limiting.
It should be noted that, unless explicitly stated or limited otherwise, the terms "disposed," "connected" or "connected" in the description of the present invention are to be construed broadly, and may be, for example, a fixed connection, a detachable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.
The technical solution of the present invention is further explained by the following embodiments with reference to the drawings.
Example 1
The embodiment provides a heating platform for a sputtering coating target, and a schematic structural diagram of the heating platform for the sputtering coating target is shown in fig. 1.
The sputtering coating target heating platform comprises a bottom plate 1, a heating platform 2 arranged on the bottom plate 1 and auxiliary heaters 3 arranged on two sides of the bottom plate 1.
The two side edges of the bottom plate 1 are provided with slideways 4, the depth of each slideway is 30cm, the width of each slideway is 50cm, and the slideways are used for installing the auxiliary heaters 3. The auxiliary heater 3 is a movable auxiliary heater. The auxiliary heater 3 moves along the edge of the soleplate 1.
The auxiliary heater 3 is in an inverted L shape, the short edge is vertically arranged and is arranged on the bottom plate 1, and the plane of the long edge is parallel to the plane of the bottom plate 1. The auxiliary heaters 3 are respectively arranged on two sides of the sputtering coating target material heating platform, so that when the target material is placed on the heating platform 2, the periphery of the target material is surrounded by the auxiliary heaters 3.
The auxiliary heater 3 is shown in a front view in fig. 2.
The auxiliary heater 3 comprises a heat transfer matrix 5, a heater 6 and an insulating layer 7. The heater 6 is a heating pipe and is arranged inside the heat transfer matrix 5. The heat-insulating layer 7 is arranged on the surface of the heat-transfer base body 5, and high-temperature-resistant glue is arranged between the heat-insulating layer and the heat-transfer base body and used for firm adhesion. The thickness of the heat transfer matrix is 2m, and the thickness of the heat preservation layer 7 is 0.5m.
After the heater begins to heat, the heat preservation will play the effect of gathering together to the heat that auxiliary heater generated, has further promoted thermal effective utilization to when having guaranteed that the target is heated on heating platform, the homogeneity of target has reduced the possibility of taking place the warpage all around.
In the embodiment, the auxiliary heaters which are in accordance with the edge length of the target material are arranged on the two sides of the heating platform, so that the target material is heated more uniformly, the problem of large warping degree of the periphery of the target material in the manufacturing process is solved, the welding bonding rate is improved, and the subsequent correction difficulty of heating in the manufacturing process is reduced; meanwhile, the auxiliary heater is arranged in a movable mode, so that the utilization rate is improved, and the uniformity of the target in the heating process is further improved.
Example 2
The embodiment provides a heating platform for a sputtering coating target, and a schematic structural diagram of the heating platform for the sputtering coating target is shown in fig. 1.
The sputtering coating target heating platform comprises a bottom plate 1, a heating platform 2 arranged on the bottom plate 1 and auxiliary heaters 3 arranged on two sides of the bottom plate 1.
The two side edges of the bottom plate 1 are provided with slideways 4, the depth of each slideway is 50cm, the width of each slideway is 100cm, and the slideways are used for installing the auxiliary heaters 3. The auxiliary heater 3 is a movable auxiliary heater. The auxiliary heater 3 moves along the edge of the soleplate 1.
The auxiliary heater 3 is in an inverted L shape, the short edge is vertically arranged and is arranged on the bottom plate 1, and the plane of the long edge is parallel to the plane of the bottom plate 1. The auxiliary heaters 3 are respectively arranged on two sides of the sputtering coating target material heating platform, so that when the target material is placed on the heating platform 2, the periphery of the target material is surrounded by the auxiliary heaters 3.
The auxiliary heater 3 is shown in a front view in fig. 2.
The auxiliary heater 3 comprises a heat transfer matrix 5, a heater 6 and an insulating layer 7. The heater 6 is a heating wire and is arranged inside the heat transfer matrix 5. The heat-insulating layer 7 is arranged on the surface of the heat-transfer base body 5, and high-temperature-resistant glue is arranged between the heat-insulating layer and the heat-transfer base body and used for firm adhesion. The thickness of the heat transfer matrix 5 is 1.5m, and the thickness of the heat insulation layer 7 is 1m.
After the heater begins to heat, the heat preservation will play the effect of gathering together to the heat that auxiliary heater generated, has further promoted thermal effective utilization to when having guaranteed that the target is heated on heating platform, the homogeneity of target has reduced the possibility of taking place warpage all around.
In the embodiment, the auxiliary heaters which are in accordance with the edge length of the target material are arranged on the two sides of the heating platform, so that the target material is heated more uniformly, the problem of large warping degree of the periphery of the target material in the manufacturing process is solved, the welding bonding rate is improved, and the subsequent correction difficulty of heating in the manufacturing process is reduced; meanwhile, the auxiliary heater is arranged in a movable mode, so that the utilization rate is improved, and the uniformity of the target in the heating process is further improved.
The above description is only the specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto, and it should be understood by those skilled in the art that any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are all within the protection scope and the disclosure scope of the present invention.
Claims (10)
1. A sputtering coating target heating platform is characterized by comprising a bottom plate, a heating platform arranged on the bottom plate and auxiliary heaters arranged on two sides of the bottom plate;
the auxiliary heater is a movable auxiliary heater.
2. The sputter coating target heating stage according to claim 1, wherein said auxiliary heater is shaped as an inverted L.
3. The sputter coating target heating stage according to claim 1, wherein the auxiliary heater comprises a heat transfer substrate, a heater and a heat insulating layer;
the heater is arranged in the heat transfer matrix;
the heat-insulating layer is arranged on the surface of the heat-transfer substrate.
4. The sputter coating target heating platform according to claim 3, wherein the thickness of the heat transfer substrate is 1.5 to 3m.
5. The sputter coating target heating stage according to claim 3, wherein said heater comprises a heating tube and/or a heating wire.
6. The sputter coating target heating platform according to claim 3, wherein the thickness of the insulating layer is 0.2 to 1m.
7. The sputter coating target heating platform according to claim 3, wherein the insulating layer is glued to the heat transfer substrate.
8. The sputter coating target heating stage according to claim 1, wherein the bottom plate is provided with slideways at both side edges for mounting auxiliary heaters.
9. The sputter coating target heating stage according to claim 8, wherein said slide has a depth of 10 to 50cm.
10. The sputter coating target heating stage according to claim 8, wherein the width of said slide is 20-100 cm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221664317.1U CN217677757U (en) | 2022-06-29 | 2022-06-29 | Sputtering coating target heating platform |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221664317.1U CN217677757U (en) | 2022-06-29 | 2022-06-29 | Sputtering coating target heating platform |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217677757U true CN217677757U (en) | 2022-10-28 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221664317.1U Active CN217677757U (en) | 2022-06-29 | 2022-06-29 | Sputtering coating target heating platform |
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|---|---|
| CN (1) | CN217677757U (en) |
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- 2022-06-29 CN CN202221664317.1U patent/CN217677757U/en active Active
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