CN217562523U

CN217562523U - Device for improving heating effect of cavity

Info

Publication number: CN217562523U
Application number: CN202220685193.9U
Authority: CN
Inventors: 方亮; 王吉奎; 翁林
Original assignee: Wuxi Yubang Semiconductor Technology Co ltd
Current assignee: Wuxi Yubang Semiconductor Technology Co ltd
Priority date: 2022-03-28
Filing date: 2022-03-28
Publication date: 2022-10-11
Anticipated expiration: 2032-03-28

Abstract

The utility model discloses an improve device of cavity heating effect, to plasma etching equipment through the heating wire heating uneven problem of heating in the cavity, provide following technical scheme, including seal chamber with set up the slide holder in seal chamber, the slide holder hangs the inside that is fixed in seal chamber through the support frame, seal chamber's bottom is seted up the printing opacity mouth, the direction that the slide holder was kept away from to the printing opacity mouth sets up a plurality of heating bulbs, the week side setting of heating bulb is used for reflection light source to plasma etching processing area's speculum. By arranging the plurality of heating bulbs, the light heat transfer of the bulbs replaces heating of the electric heating wire, so that the heat transfer efficiency and the heat transfer effect can be greatly improved, the uniform temperature distribution in the sealed cavity is ensured, and the production efficiency of equipment is improved; through setting up the speculum, can make light all assemble the etching processing region, help improving energy efficiency, assemble light through the speculum simultaneously, can also strengthen the intensification ability of heating the light source.

Description

Device for improving heating effect of cavity

Technical Field

The utility model relates to a plasma etching field, more specifically says that it relates to a device of cavity heating effect improves.

Background

Plasma etching, the most common form of dry etching, is based on the principle that a gas exposed to an electron field forms a plasma, thereby generating ionized gas and a gas composed of released energetic electrons, thereby forming plasma or ions, and atoms of the ionized gas, when accelerated by an electric field, release sufficient force to tightly adhere to a material or etch a surface with surface expulsion force.

The equipment for carrying out the dry etching process comprises a reaction chamber, a radio frequency and a vacuum part. The workpiece is fed into a reaction chamber evacuated by a vacuum pump. Gas is introduced to be excited into plasma by radio frequency. The plasma reacts on the surface of the workpiece, and volatile by-products of the reaction are pumped away by the vacuum pump. Temperature is a large factor that affects the etch rate and the rate of by-product volatilization.

At present, chinese patent with publication No. CN214099574U discloses a plasma etching apparatus, which includes an etching chamber, a wafer tray and an upper electrode disposed opposite to the wafer tray are disposed in the etching chamber, the wafer tray is used for supporting and holding a wafer to be etched, and the upper electrode is used for introducing an etching gas and dissociating the introduced etching gas to form a plasma; and a heating module is arranged in the cavity wall of the etching cavity.

Although the plasma etching device heats the wall of the cavity, the temperature in the cavity is kept at a certain temperature, but the phenomenon of low etching efficiency and uneven etching is easily caused by uneven heating in the cavity.

SUMMERY OF THE UTILITY MODEL

Not enough to prior art exists, the utility model aims to provide an improve device of cavity heating effect has the fast even advantage of temperature distribution in just can guaranteeing the cavity of intensification.

In order to achieve the above purpose, the utility model provides a following technical scheme:

the utility model provides an improve device of cavity heating effect, includes seal chamber and sets up the slide holder in seal chamber, and the slide holder hangs the inside of being fixed in seal chamber through the support frame, and light inlet is seted up to seal chamber's bottom, and the direction that the slide holder was kept away from to light inlet sets up a plurality of heating bulbs, and the week side of heating bulb sets up the speculum that is used for reflection light source to plasma etching process area.

By adopting the technical scheme, the plurality of heating bulbs are arranged, and the light heat transfer of the bulbs replaces heating of the heating wires, so that the heat transfer efficiency and the heat transfer effect can be greatly improved, the uniform temperature distribution in the sealed cavity is favorably ensured, the preheating time of the plasma etching equipment can be reduced, and the production efficiency of the equipment is improved; through setting up the speculum, can make light all assemble the etching processing region, reduce the loss of heat source, help improving energy utilization efficiency, energy saving and emission reduction assembles light through the speculum simultaneously, can also strengthen the intensification ability of heating light source, improves the temperature in the sealed cavity, further improves the etching speed and the etching effect of equipment, helps improving the machining efficiency and the yields of equipment.

Furthermore, a baffle plate for sealing the sealed cavity is embedded into the light-transmitting opening, and the baffle plate is made of a light-transmitting material.

The baffle adopts the printing opacity material, can prevent that the baffle from blockking the effect to the production of light, prevents to produce the influence because of setting up the baffle to the heating, and baffle and seal chamber can block the particle beam simultaneously, prevent that the particle beam from damaging the heating bulb, help guaranteeing the normal operating of equipment.

Further, the arrangement mode of the heating bulbs is annular.

By adopting the technical scheme, the heating bulbs are arranged and installed in an annular arrangement mode, so that the light source distribution is more uniform, the light transmitted to the processing area is uniformly distributed, the uniformity of the temperature distribution in the cavity is further guaranteed, and the heating effect and the heat transfer efficiency of the device are improved.

Further, the outer wall of the sealed cavity is provided with a temperature detector.

By adopting the technical scheme, the temperature in the sealed cavity can be monitored conveniently, so that an operator or a hollow computer can adjust the heating power of the heating bulb according to the temperature in the cavity, the temperature in the cavity is prevented from not reaching the standard, and the operation stability of the device is enhanced; because the temperature detector is arranged on the outer wall of the sealed cavity, the particle beams in the sealed cavity cannot influence the temperature detector, and the normal operation of the temperature detector is ensured.

Furthermore, a heat-insulating layer is arranged outside the sealed cavity.

By adopting the technical scheme, the heat preservation layer is arranged outside the sealed cavity, so that heat in the sealed cavity can be prevented from dissipating, the temperature in the cavity can be further kept stable, the energy input is reduced, and the energy conservation and emission reduction can be further realized.

Furthermore, an electric heating element is arranged in the slide holder.

Adopt above-mentioned technical scheme, through installation electric heating assembly in the slide holder, can carry out auxiliary heating, further improve heating efficiency.

Furthermore, the power cord of the electric heating element is arranged in the support frame and is led out from the sealed cavity through the support frame.

By adopting the technical scheme, the power line of the electric heating element is arranged in the support frame, so that the influence of the electron beam on the power line can be effectively reduced, and the normal operation of the electric heating element is ensured.

To sum up, the utility model discloses following beneficial effect has:

1. the device can ensure that the temperature in the sealed cavity is uniformly distributed, and improve the etching efficiency and the etching effect of the plasma etching equipment;

2. the device has the advantages of fast temperature rise and high heating efficiency;

3. the device has good heat preservation effect, can reduce heat loss and realize energy conservation and emission reduction of the device.

Drawings

FIG. 1 is a cross-sectional view of an apparatus for improving the heating effect of a chamber according to the present invention;

FIG. 2 is a schematic view of the arrangement of the heating bulbs of the present invention;

in the figure: 1. sealing the cavity; 2. a heat-insulating layer; 3. a temperature detector; 4. a slide stage; 5. an electric heating element; 6. a power line; 7. a baffle plate; 8. a mirror; 9. heating the bulb; 10. a support frame; 11. a mounting cavity; 12. a light-transmitting opening.

Detailed Description

The present invention will be described in detail with reference to the accompanying drawings and embodiments.

The present embodiment is only for explaining the present invention, and it is not limited to the present invention, and those skilled in the art can make modifications to the present embodiment without inventive contribution as required after reading the present specification, but all of them are protected by patent laws within the scope of the claims of the present invention.

Referring to fig. 1, a device for improving the heating effect of a cavity comprises a sealed cavity 1 and a slide holder 4 arranged in the sealed cavity 1, wherein the slide holder 4 is suspended and fixed inside the sealed cavity 1 through a support frame 10, a light transmission opening 12 is formed in the bottom of the sealed cavity 1, a plurality of heating bulbs 9 are arranged in the direction in which the light transmission opening 12 is far away from the slide holder, and reflectors 8 used for reflecting light to a plasma etching processing area are arranged on the peripheral sides of the heating bulbs 9. The outer wall of the sealed cavity 1 is provided with a temperature detector 3 for detecting the temperature of the sealed cavity 1.

Specifically, referring to fig. 1, the sealed cavity 1 is a cubic cavity, and as a processing place for plasma etching, the sealed cavity 1 needs to be vacuumized before processing. The sealed cavity 1 is coated with the heat-insulating layer 2, and the heat-insulating layer 2 is made of polyurethane foam plastic and has good heat-insulating performance. The slide holder 4 is a cylindrical metal cylinder and is made of an aluminum alloy material, the slide holder 4 is arranged at the central position of the sealed cavity 1, the bottom of the slide holder 4 is fixed on the side wall of the cavity of the sealed cavity 1 through a hollow support frame 10, and the support frame 10 is a metal frame body made of an aluminum alloy material. The area of the top surface of the slide holder 4 is larger than that of the wafer, and the wafer can be stably placed on the slide holder 4. The electric heating element 5 for auxiliary heating is arranged in the slide holder 4, the electric heating element 5 is a ceramic heating rod, the slide holder 4 can be heated in an auxiliary mode, the heating effect of the device can be further improved, and a power line 6 of the electric heating element 5 is arranged in the support frame 10 and is led out from the sealed cavity 1 through the support frame 10.

Referring to fig. 1 to 2, the bottom of the sealed cavity 1 is fixedly connected to an installation cavity 11 for installing the heating bulbs 9, the heating bulbs 9 are installed on the installation cavity 11 in a circular arrangement manner, the number of the heating bulbs 9 is nine, wherein one heating bulb 9 is arranged at the center of the installation cavity 11, the remaining eight heating bulbs 9 are annularly distributed around the heating bulb 9 at the center, and the eight heating bulbs 9 are equidistantly distributed. A ring-shaped reflector 8 is arranged outside the nine heating bulbs 9, the reflector 8 is in a bucket shape and is fixedly connected with the mounting cavity 11, and the reflector 8 is a metal reflector and has excellent light reflectivity.

Referring to fig. 1 to 2, a baffle 7 for sealing the sealed cavity 1 is embedded in the light-transmitting opening 12, the baffle 7 is made of a light-transmitting material, in this embodiment, the light-transmitting material is quartz glass, and the joint of the baffle 7 and the light-transmitting opening 12 needs to be tested for airtightness to ensure airtightness of the sealed cavity 1.

The working process and principle of the embodiment are as follows:

when the device works, a power supply of the heating bulb 9 is switched on to enable the heating bulb 9 to emit light, light rays emitted by the heating bulb 9 are converged by the reflector 8 and then penetrate through the light-transmitting hole 12 to radiate and heat the etching area and the inner wall of the sealed cavity 1, the whole etching area is kept at the same temperature, the temperature of the sealed cavity 1 can be detected in real time through the temperature detector 3, and the output power of the heating bulb 9 is controlled conveniently according to the temperature of the sealed cavity 1.

It is above only the utility model discloses a preferred embodiment, the utility model discloses a scope of protection not only limits in above-mentioned embodiment, and the fan belongs to the utility model discloses a technical scheme under the thinking all belongs to the utility model discloses a scope of protection. It should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.

Claims

1. The utility model provides an improve device of cavity heating effect, includes seal chamber (1) and sets up slide holder (4) in seal chamber (1), its characterized in that: slide holder (4) hang the inside of being fixed in seal chamber (1) through support frame (10), light-transmitting opening (12) are seted up to the bottom of seal chamber (1), the direction of slide holder is kept away from in light-transmitting opening (12) sets up a plurality of heating bulbs (9), week side setting of heating bulb (9) is used for reflection light source to plasma etching processing region's speculum (8).

2. The apparatus of claim 1, wherein the chamber heating effect is improved by: the light-transmitting opening (12) is embedded with a baffle (7) for sealing the sealed cavity (1), and the baffle (7) is made of a light-transmitting material.

3. The apparatus of claim 1, wherein the chamber heating effect is improved by: the arrangement mode of the heating bulbs (9) is annular.

4. The apparatus of claim 1, wherein the chamber heating effect is improved by: and a temperature detector (3) is arranged on the outer wall of the sealed cavity (1).

5. The apparatus of claim 1, wherein the chamber heating effect is improved by: and a heat-insulating layer (2) is arranged outside the sealed cavity (1).

6. The apparatus of claim 1, wherein the chamber heating effect is improved by: an electric heating element (5) is arranged in the slide holder (4).

7. The apparatus of claim 1, wherein the chamber heating effect is improved by: and a power wire (6) of the electric heating element (5) is arranged in the support frame (10) and is led out from the sealed cavity (1) through the support frame (10).