CN217507262U - Powerful plasma processing device - Google Patents
Powerful plasma processing device Download PDFInfo
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- CN217507262U CN217507262U CN202221208355.6U CN202221208355U CN217507262U CN 217507262 U CN217507262 U CN 217507262U CN 202221208355 U CN202221208355 U CN 202221208355U CN 217507262 U CN217507262 U CN 217507262U
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Abstract
The utility model discloses a powerful plasma processing apparatus, including consecutive apron, main part and air discharge plate, the apron, main part and air discharge plate enclose into a cavity, the interval is equipped with a plurality of exhaust holes that communicate with the cavity on the air discharge plate, be equipped with ceramic plate and flow distribution plate in the cavity, the interval is equipped with two metal sheets on having clearance and the ceramic plate between ceramic plate and the air discharge plate, the flow distribution plate is located the apron and is close to the one side of cavity, the flow distribution plate has the reposition of redundant personnel passageway with the cavity intercommunication, the interval is equipped with first joint and second joint on the apron, first joint high-voltage line stretches into respectively in the cavity with two metal sheet electric connection, the second connects and supplies the air delivery pipe to pass apron and reposition of redundant personnel passageway intercommunication. The plasma sprayed by the powerful plasma processing device can cover a wide range, and the sufficient plasma generated in the chamber can effectively improve the energy intensity of the flame of the sprayed plasma, so that the powerful plasma processing device is ensured to have a good processing effect in the wide range.
Description
Technical Field
The utility model relates to a plasma treatment technical field especially relates to a imitate plasma processing apparatus by force.
Background
The plasma is an ionized gaseous substance consisting of positive and negative ions generated after atoms and radicals are ionized after partial electrons are deprived, the plasma is a good electric conductor, the plasma can be captured, moved and accelerated by utilizing a magnetic field which is skillfully designed, and the development of the plasma physics provides new technology and process for the further development of materials, energy sources, information, environmental space, space physics, geophysical and other science, so that the application of the plasma is very wide, including the digital industry, the electronic industry, the automobile industry, the printing and packaging industry and the like.
The spray guns on the existing plasma treatment equipment are divided into a direct current spray gun and a rotary spray gun, wherein the direct current spray gun is suitable for products with small and narrow treatment range, the treatment range is generally 6-8mm, the rotary spray gun is suitable for products with large treatment range, the treatment range can reach 80-90mm, but with the increase of the treatment range, plasmas sprayed out of the spray gun can be dispersed, so that the energy of the plasmas after reaching the surface of the products to be treated is weakened, and the plasma treatment effect is poor
SUMMERY OF THE UTILITY MODEL
The utility model discloses the technical problem that will solve is: a powerful plasma processing apparatus is provided.
In order to solve the technical problem, the utility model discloses a technical scheme be: the utility model provides a powerful plasma processing apparatus, including the apron that links to each other in proper order, main part and air discharge plate, the apron, main part and air discharge plate enclose into a cavity, the interval is equipped with a plurality ofly and the exhaust hole of cavity intercommunication on the air discharge plate, be equipped with ceramic plate and flow distribution plate in the cavity, the interval is equipped with two metal sheets on having clearance and the ceramic plate between ceramic plate and the air discharge plate, the flow distribution plate is located the apron and is close to the one side of cavity, the flow distribution plate has the reposition of redundant personnel passageway with the cavity intercommunication, the interval is equipped with first joint and second joint on the apron, first joint is high-voltage line stretch into respectively in the cavity with two metal sheet electric connection, the second connects and supplies the gas transmission pipe to pass apron and reposition of redundant personnel passageway intercommunication.
Furthermore, a connecting piece is further arranged in the cavity and used for conducting the two metal plates with the high-voltage line respectively.
Furthermore, two containing grooves are formed in one side, far away from the exhaust plate, of the ceramic plate at intervals, and one metal plate is contained in each containing groove.
Furthermore, a pouring sealant layer is further arranged in the accommodating groove, and covers the opening of the accommodating groove and wraps the metal plate.
Furthermore, an insulating block is further arranged on the cover plate and located between the first joint and the cover plate and arranged around the first joint.
Furthermore, a first sealing ring is arranged between the insulating block and the cover plate, the first sealing ring is arranged around the insulating block, and the insulating block compresses the first sealing ring on the cover plate.
Furthermore, be equipped with convex spacing portion on the internal perisporium of main part, the air discharge plate is close to the one side interval of ceramic plate is equipped with a plurality of support columns, the support column reaches spacing portion follows respectively the relative two sides of ceramic plate support and hold the ceramic plate.
Furthermore, still be equipped with a plurality of silencers at the interval on the flow distribution plate, the silencer communicates respectively the reposition of redundant personnel passageway with the cavity.
Further, a first sealing strip is arranged between the cover plate and the main body, the first sealing strip surrounds the opening on one side, close to the cover plate, of the main body, and the cover plate compresses the first sealing strip on the main body.
Further, a second sealing strip is arranged between the exhaust plate and the main body, the second sealing strip surrounds the opening, close to one side of the exhaust plate, of the main body, and the second sealing strip is tightly pressed on the main body through the exhaust plate.
The beneficial effects of the utility model reside in that: the utility model provides a powerful plasma processing device adopts the apron, mainboard and air discharge plate enclose into confined cavity, be equipped with the ceramic plate as the insulating medium that discharges and the flow distribution plate of guide working gas reposition of redundant personnel in the cavity, the high-voltage line gets into in the cavity with the metal sheet on the ceramic plate switch on in the first joint on the apron, the gas-supply pipe passes through the second joint on the apron and shunts the passageway switch on with the reposition of redundant personnel on the flow distribution plate, working gas flows into reposition of redundant personnel passageway by the gas-supply pipe after working gas is followed the reposition of redundant personnel and is switched on and gets into in the cavity, so that working gas evenly fills up the cavity and produces plasma under the excitation of ceramic plate, make the interior plasma that produces the capacity of cavity, plasma again gets into the exhaust hole and from the exhaust hole outside powerful plasma processing device, and through exhaust hole guide spun plasma cover wide region, and sufficient plasma generated in the chamber can effectively improve the energy intensity of the flame of the sprayed plasma, and the strong plasma processing device is ensured to have good processing effect in a wide range.
Drawings
Fig. 1 is a schematic structural diagram of a high-performance plasma processing apparatus according to a first embodiment of the present invention;
fig. 2 is an exploded view of a high performance plasma processing apparatus according to a first embodiment of the present invention;
fig. 3 is a cross-sectional view of a high-performance plasma processing apparatus according to a first embodiment of the present invention;
fig. 4 is a cross-sectional view of another cross-section of a high-performance plasma processing apparatus according to a first embodiment of the present invention;
fig. 5 is a schematic structural view of an exhaust plate in a high-performance plasma processing apparatus according to a first embodiment of the present invention;
fig. 6 is a schematic structural diagram of a ceramic plate in a high-performance plasma processing apparatus according to a first embodiment of the present invention.
Description of reference numerals:
1. a main body; 11. a limiting part; 12. a first seal strip; 13. a second seal strip; 2. a cover plate; 21. a first joint; 22. a second joint; 23. an insulating block; 24. a first seal ring; 25. a second seal ring; 3. an exhaust plate; 31. an exhaust hole; 32. a support pillar; 4. a ceramic plate; 41. a containing groove; 42. pouring a sealing adhesive layer; 5. a flow distribution plate; 51. a flow dividing channel; 52. a muffler; 6. a metal plate; 7. a connecting member; 8. a chamber; 9. a high-voltage line; 91. and (6) inserting pins.
Detailed Description
In order to explain the technical content, the objects and the effects of the present invention in detail, the following description is made with reference to the accompanying drawings in combination with the embodiments.
Referring to fig. 1 to 6, a powerful plasma processing apparatus includes a cover plate 2, a main body 1 and an exhaust plate 3 connected in sequence, the cover plate 2, the main body 1 and the exhaust plate 3 enclose a chamber 8, a plurality of exhaust holes 31 communicated with the chamber 8 are formed in the exhaust plate 3 at intervals, a ceramic plate 4 and a splitter plate 5 are arranged in the chamber 8, a gap is formed between the ceramic plate 4 and the exhaust plate 3, two metal plates 6 are arranged on the ceramic plate 4 at intervals, the splitter plate 5 is located on one side of the cover plate 2 close to the chamber 8, the splitter plate 5 has a splitter channel 51 communicated with the chamber 8, a first connector 21 and a second connector 22 are arranged on the cover plate 2 at intervals, the first connector 21 is used for extending a high voltage line 9 into the chamber 8 to be electrically connected with the two metal plates 6, and the second connector 22 is used for communicating a gas transmission pipe with the splitter channel 51 through the cover plate 2.
From the above description, the beneficial effects of the present invention are: the utility model provides a powerful plasma processing apparatus can make working gas be full of cavity 8 uniformly and produce plasma under the excitation of ceramic plate 4, make the interior plasma of production capacity of cavity 8 to guide spun plasma through exhaust hole 31 and cover the wide range, and the sufficient plasma that produces in the cavity 8 can effectively promote the energy intensity of spun plasma flame, ensure that powerful plasma processing apparatus has good treatment effect in the wide range.
Further, a connecting piece 7 is further arranged in the cavity 8, and the connecting piece 7 is used for conducting the two metal plates 6 with the high-voltage line 9 respectively.
As can be seen from the above description, the connection members 7 are disposed in the chamber 8 to connect the two metal plates 6 to the high voltage lines 9, respectively, for facilitating the assembly of the high performance plasma processing apparatus.
Furthermore, two containing grooves 41 are formed in one side of the ceramic plate 4, which is far away from the exhaust plate 3, at intervals, and one metal plate 6 is contained in each containing groove 41.
As is apparent from the above description, the ceramic plate 4 is provided with the receiving groove 41 for receiving the metal plate 6 so that the position of the metal plate 6 on the ceramic plate 4 is maintained stable.
Further, a potting adhesive layer 42 is further arranged in the accommodating groove 41, and the potting adhesive layer 42 covers the opening of the accommodating groove 41 and wraps the metal plate 6.
As can be seen from the above description, wrapping the metal plate 6 with the potting adhesive layer 42 can fix the metal plate 6, and can also perform insulation treatment to prevent electric leakage.
Further, an insulating block 23 is further disposed on the cover plate 2, and the insulating block 23 is located between the first joint 21 and the cover plate 2 and surrounds the first joint 21.
As can be seen from the above description, the insulating block 23 is disposed between the cover plate 2 and the first connector 21 for performing an insulating process to prevent a safety accident caused by leakage of the high voltage line 9.
Further, a first sealing ring 24 is arranged between the insulating block 23 and the cover plate 2, the first sealing ring 24 is arranged around the insulating block 23, and the insulating block 23 presses the first sealing ring 24 onto the cover plate 2.
As can be seen from the above description, the sealing of the gap between the insulating block 23 and the cover plate 2 by the first sealing ring 24 can improve the airtightness of the chamber 8, and prevent the plasma in the chamber 8 from leaking from the gap between the insulating block 23 and the cover plate 2.
Further, be equipped with convex spacing portion 11 on the internal perisporium of main part 1, exhaust plate 3 is close to one side interval of ceramic plate 4 is equipped with a plurality of support columns 32, support column 32 reaches spacing portion 11 is followed respectively the relative two sides of ceramic plate 4 support and hold ceramic plate 4.
As is apparent from the above description, the ceramic plate 4 is fixed in position by being sandwiched by the stopper 11 provided on the main body 1 and the support pillars 32 provided on the exhaust plate 3, and the ceramic plate 4 is supported by the support pillars 32 so that a gap for plasma to move is formed between the ceramic plate 4 and the exhaust plate 3.
Further, a plurality of silencers 52 are further disposed on the flow dividing plate 5 at intervals, and the silencers 52 respectively communicate the flow dividing passage 51 with the chamber 8.
As can be seen from the above description, the silencer 52 disposed at the opening of the diversion passage 51 communicating with the chamber 8 can reduce the sound of the working gas flowing in the high-performance plasma processing apparatus, and reduce the noise generated when the high-performance plasma processing apparatus operates.
Further, a first sealing strip 12 is arranged between the cover plate 2 and the main body 1, the first sealing strip 12 surrounds the opening on one side, close to the cover plate 2, of the main body 1, and the cover plate 2 compresses the first sealing strip 12 on the main body 1.
Further, be equipped with second sealing strip 13 between the discharge plate 3 and the main part 1, second sealing strip 13 encircles the main part 1 is close to the opening setting of discharge plate 3 one side just discharge plate 3 will second sealing strip 13 compresses tightly on the main part 1.
Example one
Referring to fig. 1 to 6, a first embodiment of the present invention is: a powerful plasma processing device is used for exciting working gases such as nitrogen, oxygen, hydrogen, argon, helium, methane or propane and the like to generate plasma, and spraying the generated plasma to the surface of a product to be processed so as to achieve the effects of cleaning the surface of the product, activating the surface of the product or removing static electricity on the surface of the product and the like.
As shown in fig. 1 and 2, the powerful plasma processing apparatus includes a cover plate 2, a main body 1 and an exhaust plate 3 which are connected in sequence, the cover plate 2, the main body 1 and the exhaust plate 3 enclose a closed chamber 8, wherein the main body 1 is a frame structure of one-piece type, the exhaust plate 3 covers the opening of one side of the main body 1 and the exhaust plate 3 is provided with a plurality of exhaust holes 31 communicated with the chamber 8 at intervals, the cover plate 2 covers the opening of the other side of the main body 1, a ceramic plate 4 serving as a discharge insulating medium and a flow distribution plate 5 for guiding the working gas to flow separately are arranged in the chamber 8, the ceramic plate 4 is installed in the chamber 8, the ceramic plate 4 and the exhaust plate 3 are provided with a gap for plasma to pass through, two metal plates 6 are arranged on the ceramic plate 4 at intervals, the flow distribution plate 5 is installed on the cover plate 2 close to the chamber 8 and the flow distribution plate 5 is provided with the chamber 8 The reposition of redundant personnel passageway 51 that leads to, still be equipped with the confession on the apron 2 first joint 21 that plasma processing apparatus is connected with high-voltage line 9 by the powerful and connect 22 with the second of gas-supply pipe switch-on, high-voltage line 9 passes stretch into behind the first joint 21 in the cavity 8 respectively with two 6 electric connection of metal sheet, gas-supply pipe with second joint 22 cooperation back working gas by the gas-supply pipe input reposition of redundant personnel passageway 51 is followed reposition of redundant personnel passageway 51 gets into cavity 8.
Specifically, the powerful plasma processing apparatus moves, by the gas-supply pipe with the working gas input reposition of redundant personnel passageway 51, working gas follows reposition of redundant personnel passageway 51 removes and follows each opening part of reposition of redundant personnel passageway 51 gets into respectively in the cavity 8 to make working gas evenly be full of cavity 8 and with ceramic plate 4 contact, then with high-voltage line 9 electric connection the sheetmetal discharges and arouses working gas and forms plasma, along with working gas's injection, plasma follows ceramic plate 4 with the clearance of air discharge plate 3 gets into each in the exhaust hole 31 and follow spout the surface that reaches the product to be processed in the exhaust hole 31, and then form plasma flame and handle the surface of product.
Referring to fig. 2, 4 and 6, two receiving grooves 41 are formed at an interval on a side of the ceramic plate 4 away from the exhaust plate 3, each receiving groove 41 receives one metal plate 6, so that the position of the metal plate 6 on the ceramic plate 4 is stable, a potting adhesive layer 42 is further disposed in the receiving groove 41, the potting adhesive layer 42 covers an opening of the receiving groove 41 and wraps the metal plate 6, the metal plate 6 is fixed in the receiving groove 41 by bonding the potting adhesive layer 42 to the metal plate 6 and an inner peripheral wall of the receiving groove 41, and the potting adhesive layer 42 can also play a role in insulation protection. Optionally, both of the two metal plates 6 are copper sheets.
In detail, still be equipped with in the cavity 8 and be used for two metal sheet 6 respectively with high-voltage line 9 electric connection's connecting piece 7, be equipped with on the metal sheet 6 respectively with connecting piece 7 matched with double-screw bolt, high-voltage line 9 stretch into the one end of cavity 8 have with connecting piece 7 matched with contact pin 91, equipment insert contact pin 91 with high-voltage line 9 tip during the plasma processing apparatus is imitated by force connecting piece 7 can be with two metal sheet 6 switches on with high-voltage line 9 respectively, and is convenient plasma processing apparatus is imitated by force assembles.
As shown in fig. 2 and 3, in order to improve the safety of the high-performance plasma processing apparatus, an insulating block 23 is disposed between the cover plate 2 and the first connector 21, the insulating block 23 is a PTFE member, and the insulating block 23 is disposed around the first connector 21 to prevent a safety accident caused by leakage of the high-voltage line 9. Still be equipped with first sealing washer 24 and second sealing washer 25 on insulating block 23, first sealing washer 24 sets up insulating block 23 with between the apron 2 and encircle insulating block 23 sets up, second sealing washer 25 sets up between insulating block 23 and the high-voltage line 9, just second sealing washer 25 cover is established on high-voltage line 9, after the plasma processing unit combination of potent is accomplished insulating block 23 will first sealing washer 24 compress tightly on apron 2, high-voltage line 9 will second sealing washer 25 compresses tightly on insulating block 23, in order to fill insulating block 23 with the clearance between apron 2 and high-voltage line 9 with the clearance between insulating block 23, prevent the plasma leakage in the chamber 8, make plasma processing unit of potent is safe and reliable more in the use.
Referring to fig. 2, 3 and 5, a convex position-limiting portion 11 is disposed on an inner peripheral wall of the main body 1, a plurality of support sets are spaced apart from one side of the exhaust plate 3 close to the ceramic plate 4, the ceramic plate 4 and the exhaust plate 3 are sequentially mounted on the main body 1, and then the position-limiting portion 11 and the support posts 32 respectively clamp the ceramic plate 4 from opposite sides of the ceramic plate 4 to fix the ceramic plate 4 in the chamber 8, so as to ensure that the position of the ceramic plate 4 in the chamber 8 is fixed, and the ceramic plate 4 is supported by the support posts 32 to ensure that the ceramic plate 4 and the exhaust plate 3 are spaced apart from each other, so as to form a gap between the ceramic plate 4 and the exhaust plate 3 for plasma to move, thereby ensuring that plasma can smoothly enter the exhaust hole 31 and be ejected.
Specifically, in the embodiment, the exhaust holes 31 are arranged in four rows on the exhaust plate 3 along the length direction of the exhaust plate 3, and a certain interval is provided between two adjacent exhaust holes 31 in each row, so that the plasma ejected from the exhaust holes 31 can cover a wide range, and the processing efficiency of the powerful plasma processing apparatus is improved.
As shown in fig. 2 and 3, a plurality of silencers 52 are further disposed on the dividing plate 5 at intervals, the silencers 52 are located at positions where the dividing passages 51 are communicated with the chamber 8 and communicate the dividing passages 51 with the chamber 8, and the working gas in the dividing passages 51 passes through the silencers 52 and enters the chamber 8, so that noise generated when the working gas flows in the powerful plasma processing apparatus can be reduced, and noise generated when the powerful plasma processing apparatus operates can be reduced. The silencer 52 is made of porous copper to ensure that the gas in the flow dividing passage 51 can pass through smoothly.
Referring to fig. 3 and 4, the main body 1 is further provided with a first sealing strip 12 and a second sealing strip 13, wherein the first sealing strip 12 is positioned between the cover plate 2 and the main body 1 and is arranged around the opening of the main body 1 at the side close to the cover plate 2, the second sealing strip 13 is positioned between the exhaust plate 3 and the main body 1 and is arranged around the opening of one side of the main body 1 close to the exhaust plate 3, after the powerful plasma processing device is assembled, the cover plate 2 presses the first sealing strip 12 on the main body 1, the exhaust plate 3 presses the second sealing strip 13 on the main body 1, so as to fill the gap between the cover plate 2, the main body 1 and the exhaust plate 3 through the first sealing strip 12 and the second sealing strip 13, thereby ensuring that the powerful plasma processing device has good air tightness.
Preferably, the cover plate 2, the main body 1 and the exhaust plate 3 are all fixed by screws, so that the powerful plasma processing device is stable in overall structure and convenient to use and carry.
To sum up, the utility model provides a powerful plasma processing apparatus is by the apron, mainboard and air discharge plate enclose into confined cavity, evenly be full of the cavity after the flow distribution plate guide working gas entering cavity through setting up on the apron, produce the plasma of the capacity when making working gas arouse by the ceramic plate, plasma gets into the exhaust hole and spouts out the powerful plasma processing apparatus from the exhaust hole from the clearance between ceramic plate and the air discharge plate again, and guide spun plasma through the exhaust hole and cover the wide range, and the capacity plasma that produces in the cavity can effectively promote the energy intensity of spun plasma flame, ensure that powerful plasma processing apparatus has good treatment effect in the wide range; the main part of the powerful plasma processing device adopts an integrated structure, and adopts the first sealing ring, the second sealing ring, the first sealing strip, the second sealing strip and the like for sealing, so that the powerful plasma processing device is convenient to assemble, good air tightness and safety are ensured, and the powerful plasma processing device is convenient to use and carry.
The above mentioned is only the embodiment of the present invention, and not the limitation of the patent scope of the present invention, all the equivalent transformations made by the contents of the specification and the drawings, or the direct or indirect application in the related technical field, are included in the patent protection scope of the present invention.
Claims (10)
1. A kind of strong plasma processing unit, characterized by that: including consecutive apron, main part and air discharge plate, the apron, main part and air discharge plate enclose into a cavity, the interval is equipped with a plurality of exhaust holes that communicate with the cavity on the air discharge plate, be equipped with ceramic plate and flow distribution plate in the cavity, it is equipped with two metal sheets to have the interval on clearance and the ceramic plate between ceramic plate and the air discharge plate, the flow distribution plate is located the apron and is close to the one side of cavity, the flow distribution plate has the reposition of redundant personnel passageway with the cavity intercommunication, the interval is equipped with first joint and second joint on the apron, first joint high-voltage line stretches into respectively with two metal sheet electric connection in the cavity, the second connects and supplies the gas transmission pipe to pass apron and reposition of redundant personnel passageway intercommunication.
2. The powerful plasma processing apparatus according to claim 1, wherein: and a connecting piece is further arranged in the cavity and used for conducting the two metal plates with the high-voltage wire respectively.
3. The powerful plasma processing apparatus according to claim 1, wherein: two containing grooves are formed in one side, far away from the exhaust plate, of the ceramic plate at intervals, and one metal plate is contained in each containing groove.
4. The aggressive plasma treatment apparatus according to claim 3, wherein: and a pouring sealant layer is further arranged in the accommodating groove, covers the opening of the accommodating groove and wraps the metal plate.
5. The powerful plasma processing apparatus according to claim 1, wherein: the cover plate is further provided with an insulating block, and the insulating block is located between the first joint and the cover plate and arranged around the first joint.
6. The powerful plasma processing apparatus according to claim 5, wherein: a first sealing ring is arranged between the insulating block and the cover plate, the first sealing ring surrounds the insulating block, and the insulating block compresses the first sealing ring on the cover plate.
7. The powerful plasma processing apparatus according to claim 1, wherein: the utility model discloses a ceramic plate, including main part, exhaust plate, support column, spacing portion, ceramic plate, the internal perisporium of main part is equipped with convex spacing portion, the exhaust plate is close to the one side interval of ceramic plate is equipped with a plurality of support columns, the support column reaches spacing portion follows respectively the relative two sides of ceramic plate support and hold the ceramic plate.
8. The powerful plasma processing apparatus according to claim 1, wherein: still be equipped with a plurality of silencers at the interval on the flow distribution plate, the silencer communicates respectively the reposition of redundant personnel passageway with the cavity.
9. The powerful plasma processing apparatus according to claim 1, wherein: the cover plate and be equipped with first sealing strip between the main part, first sealing strip encircles the main part is close to the opening setting of one side of cover plate just the cover plate will first sealing strip compresses tightly in on the main part.
10. The powerful plasma processing apparatus according to claim 1, wherein: the exhaust plate with be equipped with the second sealing strip between the main part, the second sealing strip encircles the main part is close to the opening setting of exhaust plate one side just the exhaust plate will the second sealing strip compresses tightly in on the main part.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221208355.6U CN217507262U (en) | 2022-05-18 | 2022-05-18 | Powerful plasma processing device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221208355.6U CN217507262U (en) | 2022-05-18 | 2022-05-18 | Powerful plasma processing device |
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| CN217507262U true CN217507262U (en) | 2022-09-27 |
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| CN202221208355.6U Active CN217507262U (en) | 2022-05-18 | 2022-05-18 | Powerful plasma processing device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115613140A (en) * | 2022-12-16 | 2023-01-17 | 江苏邑文微电子科技有限公司 | Transverse plasma generating chamber and multifunctional high-temperature reaction device |
-
2022
- 2022-05-18 CN CN202221208355.6U patent/CN217507262U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115613140A (en) * | 2022-12-16 | 2023-01-17 | 江苏邑文微电子科技有限公司 | Transverse plasma generating chamber and multifunctional high-temperature reaction device |
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