CN111341639A - Hand-held plasma processing apparatus - Google Patents
Hand-held plasma processing apparatus Download PDFInfo
- Publication number
- CN111341639A CN111341639A CN202010263109.XA CN202010263109A CN111341639A CN 111341639 A CN111341639 A CN 111341639A CN 202010263109 A CN202010263109 A CN 202010263109A CN 111341639 A CN111341639 A CN 111341639A
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- baffle
- base
- guide plate
- plasma processing
- medium pipe
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32348—Dielectric barrier discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
Abstract
The invention discloses a handheld plasma processing device, which comprises a shell and a base component, and further comprises a gas mixing box, a guide plate component, a ceramic medium pipe and an electrode column, wherein a containing cavity is enclosed between the shell and the base component; the gas mixing box is characterized in that a groove is formed in the base assembly, the guide plate assembly is erected on the groove, the ceramic medium pipe is arranged at the bottom of the guide plate assembly, a gap is formed between the ceramic medium pipe and the groove, a guide hole is formed in the guide plate assembly and is respectively communicated with the gas mixing box and the gap, and a flame outlet hole is formed in the bottom of the groove. The device has the advantages of simple structure, small overall size, convenience in carrying and installation and good treatment effect.
Description
Technical Field
The invention relates to the technical field of plasma processing, in particular to handheld plasma processing equipment.
Background
Plasma is an ionized gaseous substance consisting of positive and negative ions generated after atoms and radicals are ionized after a part of electrons are deprived, and a macroscopic electrically neutral ionized gas with the dimension larger than the Debye length has the movement mainly dominated by electromagnetic force and shows remarkable collective behavior. It is widely present in the universe and is often considered to be the fourth state in which substances exist in addition to solids, liquids and gases. The plasma is a good electric conductor, and the plasma can be captured, moved and accelerated by utilizing a magnetic field which is skillfully designed. The development of plasma physics provides new technology and process for the further development of science such as materials, energy, information, environmental space, space physics, geophysical and the like. Plasma is a fourth state of matter different from solid, liquid and gas. A substance is composed of molecules, which are composed of atoms, which are composed of a positively charged nucleus and negatively charged electrons surrounding it. When heated to a sufficiently high temperature or for other reasons, the outer electrons become free electrons bound free of the nuclei. The electrons leave the nucleus, a process known as "ionization". At this point, the material becomes a uniform "paste" of positively charged nuclei and negatively charged electrons, and is thus called ion paste by chance, which has equal total positive and negative charges and is therefore nearly electrically neutral. Therefore, the application of the plasma is very wide, including the digital industry, the electronic industry, the automobile industry, the printing and packaging industry and the like.
The existing plasma processing equipment mainly comprises a rotary spray gun, a direct current spray gun and a wide-width plasma machine. The plasma flame of the direct-current spray gun can only process a small range of products, and the maximum range is 6-8 mm wide; although the range of the rotating spray gun nozzle can be expanded, the larger the treatment range is, the poorer the treatment effect is, and the lower the plasma utilization rate is; the wide-width plasma machine is not beneficial to processing small and medium-sized products due to too large size area, the installation is inconvenient, the length of plasma flame is limited, and the wide-width plasma machine is not beneficial to processing diversified products.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: the handheld plasma processing equipment is good in processing effect and convenient to carry and install.
In order to solve the technical problems, the invention adopts the technical scheme that:
a handheld plasma processing device comprises a shell, a base component, a gas mixing box, a guide plate component, a ceramic medium tube and an electrode column, wherein a containing cavity is defined between the shell and the base component; the gas mixing box is characterized in that a groove is formed in the base assembly, the guide plate assembly is erected on the groove, the ceramic medium pipe is arranged at the bottom of the guide plate assembly, a gap is formed between the ceramic medium pipe and the groove, a guide hole is formed in the guide plate assembly and is respectively communicated with the gas mixing box and the gap, and a flame outlet hole is formed in the bottom of the groove.
Furthermore, two rows of flame outlet holes are formed in the bottom of the groove, and the flame outlet holes in each row are formed along the length direction of the ceramic medium pipe.
Furthermore, one side surface of the ceramic medium pipe close to the flame outlet hole is a plane.
Further, the guide plate assembly comprises a first guide plate and a second guide plate, the grooved shape is Y-shaped, the first guide plate is located in the groove, the second guide plate is arranged on the first guide plate, the gas mixing box is arranged on one side, away from the first guide plate, of the second guide plate, the first guide plate and the second guide plate are both provided with the guide holes, and a mixing space is arranged between the first guide plate and the second guide plate.
Furthermore, the diversion holes on the first diversion plate are arranged in a staggered mode relative to the diversion holes on the second diversion plate.
Furthermore, the second guide plate is T-shaped.
Furthermore, the electrode column is made of copper.
Further, the base component comprises a first base and a second base, the first base is arranged on the second base, a sealing groove is formed in one side face, close to the second base, of the first base, and a sealing strip is arranged in the sealing groove.
Furthermore, the minimum width of a gap between the ceramic medium pipe and two side walls of the groove is 0.5-1 mm.
Furthermore, the shell is provided with two air inlets which are arranged at intervals, and the two air inlets are respectively communicated with the gas mixing box.
Further, still be equipped with high-pressure input port and cooling water inlet on the base subassembly, high-pressure input port with electrode column electrical connection, just high-pressure input port with the distance between the cooling water inlet is greater than 10 mm.
The invention has the beneficial effects that: working gas enters a gap between the ceramic medium pipe and the groove through the flow guide holes after being mixed by the gas mixing box, the ceramic medium pipe is used as a medium layer to react with the working gas to generate plasma, the generated plasma reaches the surface of a product to be processed through the flame outlet holes, and the positions of the flame outlet holes can be set into a linear shape as required to improve the processing effect. The plasma processing equipment has the advantages of simple structure, small integral volume, capability of being held by hands, convenience in carrying and installation and good processing effect.
Drawings
Fig. 1 is a schematic overall structure diagram of a handheld plasma processing apparatus according to a first embodiment of the present invention;
FIG. 2 is an exploded view of a hand-held plasma processing apparatus according to a first embodiment of the present invention;
fig. 3 is a cross-sectional view of a handheld plasma processing apparatus according to a first embodiment of the present invention.
Description of reference numerals:
1. a housing; 11. an air inlet; 2. a base assembly; 21. a high voltage input port; 22. a cooling water port; 23. a first base; 231. a sealing groove; 24. a second base; 3. a gas mixing box; 4. a ceramic dielectric tube; 5. an electrode column; 6. a gap; 7. a first baffle; 8. a second baffle; 9. a flow guide hole; 10. a mixing space.
Detailed Description
In order to explain technical contents, achieved objects, and effects of the present invention in detail, the following description is made with reference to the accompanying drawings in combination with the embodiments.
Referring to fig. 1 to 3, a handheld plasma processing apparatus includes a housing 1 and a base assembly 2, and further includes a gas mixing box 3, a baffle assembly, a ceramic medium tube 4 and an electrode column 5, wherein a receiving cavity is defined between the housing 1 and the base assembly 2, the gas mixing box 3, the baffle assembly, the ceramic medium tube 4 and the electrode column 5 are all disposed in the receiving cavity, and the electrode column 5 is disposed in the ceramic medium tube 4; the gas mixing box is characterized in that a groove is formed in the base component 2, the guide plate component is erected on the groove, the ceramic medium pipe 4 is arranged at the bottom of the guide plate component, a gap 6 is formed between the ceramic medium pipe 4 and the groove, a guide hole 9 is formed in the guide plate component, the guide hole 9 is communicated with the gas mixing box 3 and the gap 6 respectively, and a flame outlet hole is formed in the bottom of the groove.
From the above description, the beneficial effects of the present invention are: working gas enters a gap between the ceramic medium pipe and the groove through the flow guide holes after being mixed by the gas mixing box, the ceramic medium pipe is used as a medium layer to react with the working gas to generate plasma, the generated plasma reaches the surface of a product to be processed through the flame outlet holes, and the positions of the flame outlet holes can be set into a linear shape as required to improve the processing effect. The plasma processing equipment has the advantages of simple structure, small integral volume, capability of being held by hands, convenience in carrying and installation and good processing effect.
Furthermore, two rows of flame outlet holes are formed in the bottom of the groove, and the flame outlet holes in each row are formed along the length direction of the ceramic medium pipe 4.
As can be seen from the above description, the arrangement of two rows of flame holes can increase the treatment area and improve the treatment efficiency.
Furthermore, one side surface of the ceramic medium pipe 4 close to the flame outlet hole is a plane.
As can be seen from the above description, the arrangement as a plane may make the generated plasma more uniform.
Further, the guide plate assembly comprises a first guide plate 7 and a second guide plate 8, the grooved shape is Y-shaped, the first guide plate 7 is located in the groove, the second guide plate 8 is arranged on the first guide plate 7, the gas mixing box 3 is arranged on one side, far away from the first guide plate 7, of the second guide plate 8, the first guide plate 7 and the second guide plate 8 are both provided with guide holes 9, and a mixing space 10 is arranged between the first guide plate 7 and the second guide plate 8.
As can be seen from the above description, the arrangement of the two guide plates can prolong the gas path, and the mixing space is arranged between the first guide plate and the second guide plate, so that the gas can be mixed more uniformly.
Further, the diversion holes 9 on the first diversion plate 7 are arranged in a staggered manner relative to the diversion holes 9 on the second diversion plate 8.
It can be known from the above description, after gas gets into the cavity inside from the gas mixing box, at first atmospheric pressure can be used in the surface of second guide plate, make gas diffusion open, then get into the space at first guide plate place through the water conservancy diversion hole on the second guide plate, because water conservancy diversion hole dislocation set, gas will be used in the dispersion on first guide plate, at last from the water conservancy diversion hole on the first guide plate get into in the gap again, can increase gaseous mobility like this, make gas distribution more even, thereby make plasma reaction more thoroughly and even.
The gas flow path can be prolonged, so that the gas mixing is more uniform, and the plasma reaction is more thorough and uniform.
Further, the second baffle 8 is T-shaped.
Further, the base assembly 2 includes a first base 23 and a second base 24, the first base 23 is disposed on the second base 24, a side surface of the first base 23 close to the second base 24 is provided with a sealing groove 231, and a sealing strip is disposed in the sealing groove 231.
From the above description, it can be known that the provision of the sealing strip can prevent gas from leaking out from the gap between the first base and the second base, prevent the internal gas pressure from being too low or prevent the plasma concentration from being too low, and improve the stability of the plasma.
Further, the electrode column 5 is made of copper.
Further, the minimum width of a gap between the ceramic medium pipe 4 and two side walls of the groove is 0.5-1 mm.
As can be seen from the above description, the width of the gap should not be too large or too small, and too large would result in excessive gas and incomplete plasma reaction, thereby causing plasma instability; too small results in lack of medium during plasma reaction, resulting in short flame and poor treatment effect.
Further, the shell 1 is provided with two air inlets 11 arranged at intervals, and the two air inlets 11 are respectively communicated with the gas mixing box 3.
As can be seen from the above description, the two air inlets may be respectively disposed at one-third and two-thirds positions along the length direction of the housing, so that the air distribution is relatively uniform during air inlet.
Further, still be equipped with high pressure input port 21 and cooling water inlet 22 on the base subassembly 2, high pressure input port 21 with electrode column 5 electrical connection, just high pressure input port 21 with the distance between the cooling water inlet 22 is greater than 10 mm.
As can be seen from the above description, the distance between the high-voltage input port and the cooling water inlet is greater than 10mm, so that the high voltage during working can be prevented from discharging to the edge, and the plasma processing equipment is safer and more stable during working.
Referring to fig. 1 to fig. 3, a first embodiment of the present invention is:
the utility model provides a hand-held type plasma treatment equipment, as shown in fig. 1 and fig. 2, includes casing 1 and base subassembly 2, still includes gas mixing box 3, guide plate subassembly, ceramic medium pipe 4 and electrode column 5, enclose between casing 1 and the base subassembly 2 and enclose and hold the chamber, gas mixing box 3, guide plate subassembly, ceramic medium pipe 4 and electrode column 5 all set up in hold the intracavity. The electrode column 5 is arranged in the ceramic medium tube 4, and the electrode column 5 is made of copper. Be equipped with the air inlet 11 that two intervals set up on casing 1, two air inlet 11 respectively with gas mixing box 3 intercommunication, two air inlets 11 can set up respectively in casing length direction's one-third position and two-thirds position department, make when admitting air gas distribution more even like this. . Be equipped with cooling water inlet 22 and high pressure input port 21 on the base subassembly 2, high pressure input port 21 with 5 electrical connection of electrode post can let in the cooling water through cooling water inlet 22 and cool down equipment, just high pressure input port 21 with distance between the cooling water inlet 22 is greater than 10mm, and in this embodiment, the figure of cooling water inlet 22 is two, is located high pressure input port 21's both sides respectively.
As shown in fig. 3, a slot is formed in the base component 2, the guide plate component is erected on the slot, the ceramic medium tube 4 is arranged at the bottom of the guide plate component, a gap 6 is formed between the ceramic medium tube 4 and the slot, and the minimum width of the gap between the ceramic medium tube 4 and the two side walls of the slot is 0.5-1 mm. The guide plate assembly is provided with guide holes 9, the guide holes 9 are respectively communicated with the gas mixing box 3 and the gap 6, and the bottom of the groove is provided with a flame outlet. Preferably, two rows of flame outlet holes are formed in the bottom of the groove, the flame outlet holes in each row are arranged along the length direction of the ceramic medium pipe 4, and the number of the flame outlet holes in each row can be set according to requirements. One side surface of the ceramic medium pipe 4 close to the flame outlet hole is a plane.
In this embodiment, the base assembly 2 includes a first base 23 and a second base 24, the first base 23 is disposed on the second base 24, a side surface of the first base 23 close to the second base 24 is provided with a sealing groove 231, a sealing strip is disposed in the sealing groove 231, and the sealing strip is disposed to prevent gas from flowing out from a gap between the first base 23 and the second base 24.
In this embodiment, the baffle assembly includes a first baffle 7 and a second baffle 8, the slotted shape is Y-shaped, the first baffle 7 is located in the slot, the second baffle 8 is disposed on the first baffle 7, the shape of the first baffle 7 is matched with the slotted shape, and the shape of the second baffle 8 is T-shaped. First guide plate 7 is in the same place with the mode installation of inlaying when first base cooperation, need not to fix convenient and fast through screw or other modes. The gas mixing box 3 set up in one side that first guide plate 7 was kept away from to second guide plate 8, all be equipped with on first guide plate 7 and the second guide plate 8 water conservancy diversion hole 9, just be equipped with mixing space 10 between first guide plate 7 and the second guide plate 8, working gas can further the misce bene in mixing space 10. The diversion holes 9 on the first diversion plate 7 are arranged in a staggered mode relative to the diversion holes 9 on the second diversion plate 8, so that the gas flowing path can be prolonged. Offer the inside groove with 8 looks adaptations of second guide plate on the gas mixing box 3, directly withhold and can make gas mixing box 3 and second guide plate 8 just inlay together, then just can realize seamless pressfitting when installing gas mixing box 3 and base subassembly 2 again, need not extra fixed mode, the installation is simple swift.
The working principle of the handheld plasma processing equipment of the embodiment is as follows: when the device works, working gas and cooling water are introduced, the working gas is mixed by the gas mixing box 3 and then enters the gap 6 between the ceramic medium pipe 4 and the groove through the diversion hole 9, a plasma power supply is started, energy reaches the electrode column 5 through the high-voltage input port 21, then the ceramic medium pipe 4 is used as a medium layer to react with the working gas to generate plasma, and the generated plasma reaches the surface of a product to be processed through the flame outlet.
In conclusion, the handheld plasma processing equipment provided by the invention has the advantages of simple structure, small overall size, convenience in carrying and installation and good processing effect.
The above description is only an embodiment of the present invention, and not intended to limit the scope of the present invention, and all equivalent changes made by using the contents of the present specification and the drawings, or applied directly or indirectly to the related technical fields, are included in the scope of the present invention.
Claims (10)
1. A handheld plasma processing device comprises a shell and a base component, and is characterized by further comprising a gas mixing box, a guide plate component, a ceramic medium pipe and an electrode column, wherein a containing cavity is formed between the shell and the base component in a surrounding mode, the gas mixing box, the guide plate component, the ceramic medium pipe and the electrode column are arranged in the containing cavity, and the electrode column is arranged in the ceramic medium pipe; the gas mixing box is characterized in that a groove is formed in the base assembly, the guide plate assembly is erected on the groove, the ceramic medium pipe is arranged at the bottom of the guide plate assembly, a gap is formed between the ceramic medium pipe and the groove, a guide hole is formed in the guide plate assembly and is respectively communicated with the gas mixing box and the gap, and a flame outlet hole is formed in the bottom of the groove.
2. The handheld plasma processing apparatus of claim 1, wherein the bottom of the slot is provided with two rows of flame holes, and the flame holes of each row are arranged along the length direction of the ceramic medium pipe.
3. The hand-held plasma processing apparatus according to claim 2, wherein a side surface of the ceramic medium pipe near the flame outlet hole is a flat surface.
4. The apparatus of claim 1, wherein the baffle assembly comprises a first baffle and a second baffle, the slot is Y-shaped, the first baffle is located in the slot, the second baffle is disposed on the first baffle, the gas mixing box is disposed on the second baffle on a side away from the first baffle, the first baffle and the second baffle are both provided with the baffle holes, and a mixing space is disposed between the first baffle and the second baffle.
5. The hand-held plasma processing apparatus of claim 4 wherein the baffle holes of the first baffle plate are offset from the baffle holes of the second baffle plate.
6. The hand-held plasma processing apparatus of claim 4, wherein the second baffle is T-shaped.
7. The hand-held plasma processing apparatus of claim 1, wherein the base assembly comprises a first base and a second base, the first base is disposed on the second base, a sealing groove is disposed on a side of the first base adjacent to the second base, and a sealing strip is disposed in the sealing groove.
8. The handheld plasma processing apparatus according to claim 1, wherein a minimum width of a gap between the ceramic medium pipe and both side walls of the slot is 0.5 to 1 mm.
9. The hand-held plasma processing apparatus as recited in claim 1, wherein the housing has two spaced apart gas inlets, the two gas inlets being in communication with the gas mixing box, respectively.
10. The hand-held plasma processing apparatus according to claim 1, wherein the base assembly further comprises a high voltage input port and a cooling water inlet, the high voltage input port is electrically connected to the electrode column, and a distance between the high voltage input port and the cooling water inlet is greater than 10 mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010263109.XA CN111341639A (en) | 2020-04-07 | 2020-04-07 | Hand-held plasma processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010263109.XA CN111341639A (en) | 2020-04-07 | 2020-04-07 | Hand-held plasma processing apparatus |
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| Publication Number | Publication Date |
|---|---|
| CN111341639A true CN111341639A (en) | 2020-06-26 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010263109.XA Pending CN111341639A (en) | 2020-04-07 | 2020-04-07 | Hand-held plasma processing apparatus |
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| CN (1) | CN111341639A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114489168A (en) * | 2022-03-21 | 2022-05-13 | 上海淳禧应用技术股份有限公司 | High-precision humidity calibration device and humidity calibration method |
| CN115151012A (en) * | 2022-07-13 | 2022-10-04 | 广东澳地特电气技术有限公司 | Plasma generator |
-
2020
- 2020-04-07 CN CN202010263109.XA patent/CN111341639A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114489168A (en) * | 2022-03-21 | 2022-05-13 | 上海淳禧应用技术股份有限公司 | High-precision humidity calibration device and humidity calibration method |
| CN114489168B (en) * | 2022-03-21 | 2023-03-28 | 上海淳禧应用技术股份有限公司 | High-precision humidity calibration device and humidity calibration method |
| CN115151012A (en) * | 2022-07-13 | 2022-10-04 | 广东澳地特电气技术有限公司 | Plasma generator |
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