CN217491935U - Optical substrate cleaning equipment - Google Patents

Abstract

The utility model discloses an optical substrate cleaning equipment, which is applied to the field of optical masks and comprises an equipment frame, wherein a plurality of first cleaning tanks are arranged on the equipment frame, the openings of the first cleaning tanks are upward, the bottoms of the first cleaning tanks are provided with first interfaces, the first interfaces are communicated with the inner cavities of the first cleaning tanks, the bottoms of the inner cavities of the first cleaning tanks are provided with air equalizing pipes, and the pipe walls of the air equalizing pipes are provided with a plurality of air passing holes; the equipment frame is provided with a plurality of second cleaning tanks, and a single second cleaning tank is arranged between two adjacent first cleaning tanks, so that the first cleaning tanks and the second cleaning tanks are alternately arranged, the openings of the second cleaning tanks are upward, the bottoms of the second cleaning tanks are provided with second interfaces, the second interfaces are communicated with the inner cavities of the second cleaning tanks, the bottoms of the inner cavities of the second cleaning tanks are provided with liquid equalizing pipes, and the pipe walls of the liquid equalizing pipes are provided with a plurality of liquid passing holes; the utility model discloses an optical substrate cleaning equipment, it is good to clear away the dirty ability in optical substrate surface, is difficult for damaging the substrate surface, can not remain water stain on optical substrate surface.

Description

Optical substrate cleaning equipment

Technical Field

The utility model relates to an optical mask version technical field, in particular to optical substrate cleaning equipment.

Background

The optical mask is a graphic mask used in a photoetching process commonly used in a micron or nanometer processing technology, and a mask graphic structure is formed on a transparent substrate by an opaque shading film.

Before the optical mask plate is produced, the main body part, namely the optical substrate, needs to be carefully cleaned to obtain a clean surface, and the optical substrate needs to be protected from being scratched while being cleaned, so that the irradiation light path is prevented from being influenced by pollutants or scratches on the surface of the optical substrate.

The existing cleaning equipment adopts a water flow flushing mode, but is difficult to control flushing force, the cleanliness cannot be improved due to light force, and scratches are easily left on the surface of an optical substrate due to high force. Meanwhile, by adopting a water flow flushing mode, water can be remained on the surface of the optical substrate and forms water stain after being dried, and the irradiation light path can be influenced.

SUMMERY OF THE UTILITY MODEL

The utility model discloses aim at solving one of the technical problem that exists among the prior art at least. Therefore, the utility model provides an optical substrate cleaning equipment, it is good to clear away the dirty ability in optical substrate surface, is difficult for damaging the substrate surface, can not remain water stain on the optical substrate surface.

According to the utility model discloses optical substrate cleaning equipment, include: an equipment rack;

the equipment frame is provided with a plurality of first cleaning tanks, the openings of the first cleaning tanks are upward, the bottoms of the first cleaning tanks are provided with first interfaces, the first interfaces are communicated with the inner cavities of the first cleaning tanks, the bottoms of the inner cavities of the first cleaning tanks are provided with air equalizing pipes, the air equalizing pipes are communicated with an air supply device, and the pipe walls of the air equalizing pipes are provided with a plurality of air passing holes;

the second washing tank, be equipped with a plurality ofly on the equipment rack the second washing tank, it is single the second washing tank sets up adjacent two between the first washing tank, make first washing tank with second washing tank alternate arrangement, the opening of second washing tank up, the bottom is equipped with the second interface, the second interface with the inner chamber intercommunication of second washing tank, the inner chamber bottom of second washing tank is equipped with the liquid equalizing pipe, liquid equalizing pipe and water supply installation intercommunication, a plurality of liquid hole of crossing has been seted up on the pipe wall of liquid equalizing pipe.

According to the utility model discloses optical substrate cleaning equipment has following technological effect at least: the first cleaning tank and the second cleaning tank are used for filling clear water; the air equalizing pipe communicated with the air supply device releases a plurality of small bubbles into the first cleaning tank through the air holes, and the small bubbles drive the clean water to impact the surface of the optical substrate so as to remove surface dirt; the liquid equalizing pipe communicated with the water supply device continuously introduces constant-temperature clean water into the second cleaning tank through the liquid passing hole, the optical substrate is soaked and maintained at a certain temperature, the infiltration effect of water on the surface of the optical substrate is reduced, when the optical substrate is taken out from the second cleaning tank, the clean water on the surface of the optical substrate easily flows and slides, the liquid residue on the surface is reduced, and the water stain is avoided.

The utility model discloses an in some embodiments, equal tracheal pipe wall has seted up a plurality ofly cross the gas pocket, cross the gas pocket with equal tracheal axis direction parallel distribution, the pipe wall of liquid-distributing pipe has seted up a plurality ofly cross the liquid hole, cross the liquid hole with the axis direction parallel distribution of liquid-distributing pipe.

In some embodiments of the present invention, the air passing holes are distributed in two rows on the air equalizing pipe, each row of the air passing holes is parallel to the axis of the air equalizing pipe, two rows of the air passing holes have upward openings and are symmetrically distributed according to a vertical central plane in the cross section direction of the air equalizing pipe, the included angle of the air passing holes is a, and the angle a is 30-50 °.

In some embodiments of the present invention, the liquid passing holes are distributed in two rows on the liquid equalizing tube, each row of the liquid passing holes is parallel to the axis of the liquid equalizing tube, the two rows of the liquid passing holes are distributed symmetrically according to a vertical central plane with openings facing downward in the cross-sectional direction of the liquid equalizing tube, and the two rows of the liquid passing holes have an included angle b and an angle b of 30 to 50 degrees.

The utility model discloses an in some embodiments, the opening part cover of first washing tank is equipped with the overflow launder, the opening orientation of overflow launder with the opening orientation of first washing tank is unanimous, the bottom of overflow launder is less than the open end face of first washing tank for accept the rivers that first washing tank overflows, the bottom of overflow launder is equipped with the outlet.

In some embodiments of the present invention, the opening end surface of the first cleaning tank is provided with a ring of wavy overflow teeth.

In some embodiments of the present invention, the bottom of the first cleaning tank and the bottom of the second cleaning tank are respectively provided with a guiding inclined plane, the guiding inclined plane makes one side of the bottom lower than the other side, and the first interface and the second interface are respectively correspondingly disposed at the low side position of the guiding inclined plane.

In some embodiments of the present invention, the outer wall of at least one of the first cleaning tank or the second cleaning tank is provided with a plurality of rings of reinforcing ribs.

Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.

Drawings

The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:

fig. 1 is a top view of the structure of the embodiment of the present invention;

FIG. 2 is a schematic structural view of a first cleaning tank according to an embodiment of the present invention;

FIG. 3 is a schematic view of a second cleaning tank according to an embodiment of the present invention;

FIG. 4 is a schematic view of a partial structure of an overflow trough according to an embodiment of the present invention;

FIG. 5 is a schematic view of the gas-equalizing pipe according to the embodiment of the present invention;

FIG. 6 is a schematic cross-sectional view of the gas equalizing pipe according to the embodiment of the present invention;

fig. 7 is a schematic cross-sectional view of a liquid-distributing pipe according to an embodiment of the present invention.

Reference numerals:

the cleaning apparatus comprises an equipment frame 100, a first cleaning tank 200, a first interface 210, an air equalizing pipe 220, an air passing hole 221, a second cleaning tank 300, a second interface 310, an air equalizing pipe 320, a liquid passing hole 321, an overflow trough 400, a water outlet 410, overflow teeth 420 and reinforcing ribs 500.

Detailed Description

Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are exemplary only for the purpose of explaining the present invention, and should not be construed as limiting the present invention.

In the description of the present invention, it should be understood that the orientation or positional relationship indicated with respect to the orientation description, such as up, down, front, rear, left, right, etc., is based on the orientation or positional relationship shown in the drawings, and is only for convenience of description and simplification of description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.

In the description of the present invention, a plurality of meanings are one or more, a plurality of meanings are two or more, and the terms greater than, smaller than, exceeding, etc. are understood as excluding the number, and the terms greater than, lower than, within, etc. are understood as including the number. If the first and second are described for the purpose of distinguishing technical features, they are not to be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.

In the description of the present invention, unless there is an explicit limitation, the words such as setting, installation, connection, etc. should be understood in a broad sense, and those skilled in the art can reasonably determine the specific meanings of the above words in combination with the specific contents of the technical solution.

Referring to fig. 1, an optical substrate cleaning apparatus according to an embodiment of the present invention includes: an equipment rack 100;

the first cleaning tank 200, the equipment rack 100 is provided with a plurality of first cleaning tanks 200, the openings of the first cleaning tanks 200 are upward, the bottoms of the first cleaning tanks 200 are provided with first connectors 210, the first connectors 210 are communicated with the inner cavities of the first cleaning tanks 200, the bottoms of the inner cavities of the first cleaning tanks 200 are provided with air equalizing pipes 220, the air equalizing pipes 220 are communicated with an air supply device, and the pipe walls of the air equalizing pipes 220 are provided with a plurality of air passing holes 221;

the second cleaning tank 300, be equipped with a plurality of second cleaning tanks 300 on the equipment rack 100, single second cleaning tank 300 sets up between two adjacent first cleaning tanks 200, make first cleaning tank 200 and second cleaning tank 300 alternate arrangement, the opening of second cleaning tank 300 up, the bottom is equipped with second interface 310, the inner chamber intercommunication of second interface 310 and second cleaning tank 300, the inner chamber bottom of second cleaning tank 300 is equipped with the liquid-equalizing pipe 320, the liquid-equalizing pipe 320 communicates with water supply installation, a plurality of liquid-passing hole 321 has been seted up on the pipe wall of liquid-equalizing pipe 320.

The first cleaning tanks 200 and the second cleaning tanks 300 are alternately arranged on the equipment rack 100, and before cleaning the optical substrate, all the first cleaning tanks 200 and the second cleaning tanks 300 are filled with clean water with proper temperature, and the temperature of the clean water is higher than the ambient temperature.

Firstly, the optical substrate is placed in the first cleaning tank 200, the gas supply device is communicated with the gas equalizing pipe 220, the gas is released into the first cleaning tank 200 through the gas passing hole 221, and is mixed with the clean water contained in the first cleaning tank 200 to form small bubbles, and the small bubbles drive the clean water to impact the surface of the optical substrate to remove the dirt on the surface. After the optical substrate is cleaned in the first cleaning tank 200, the optical substrate is taken out, clean water remains on the surface of the optical substrate, if the optical substrate is not directly dried or baked, water stains are formed on the surface of the optical substrate, and the optical substrate needs to be immersed in the second cleaning tank 300 for further treatment. The water supply device is communicated with the liquid equalizing pipe 320, and constant temperature clean water is continuously introduced into the second cleaning tank 300 through the liquid passing hole 321 to maintain the water temperature in the second cleaning tank 300 and to equalize the water temperature in each part of the second cleaning tank 300 as much as possible; after the optical substrate is placed in the second cleaning tank 300, the optical substrate is subjected to heat exchange with the clear water, after the temperature of the optical substrate is raised to be consistent with that of the clear water, the optical substrate can be slowly taken out, the clear water on the surface of the optical substrate is easy to slide down due to poor wettability, and water stains are prevented from being formed on the optical substrate.

After the cleaning work is performed for a certain period of time, the first and second cleaning tanks 200 and 300 themselves need to be cleaned. The first and second interfaces 210 and 310 are opened to discharge the mixture accumulated in the cleaning of the first and second cleaning tanks 200 and 300.

The utility model discloses a plurality of gas holes 221 have been seted up to the pipe wall of gas equalizing pipe 220 in some embodiments, cross the axis direction parallel distribution of gas hole 221 and gas equalizing pipe 220, and the pipe wall of liquid equalizing pipe 320 has been seted up a plurality of liquid holes 321 of crossing, crosses the axis direction parallel distribution of liquid holes 321 and liquid equalizing pipe 320.

The air passing holes 221 are distributed in parallel with the axis direction of the air equalizing pipe 220, a plurality of air passing holes 221 can generate more air bubbles, and the air bubbles can be uniformly distributed in the first cleaning tank 200 along the axis direction as much as possible, so that the cleaning effect on the optical substrate is improved; the liquid passing holes 321 and the liquid equalizing pipe 320 are distributed in parallel in the axial direction, and the plurality of liquid passing holes 321 can disperse and convey constant-temperature water flow to the second cleaning tank 300 as much as possible, so that temperature dead angles in the second cleaning tank 300 are reduced, the water temperature balance is maintained, the optical substrates are heated uniformly, the infiltration degree of the contact part of the clean water and the optical substrates is reduced uniformly, when the optical substrates are taken out, the clean water on the surface can flow as far as possible, and water stain is prevented from being formed.

Referring to fig. 5 and 6, in some embodiments of the present invention, the air holes 221 are distributed in two rows on the air equalizing pipe 220, each air hole 221 is parallel to the axis of the air equalizing pipe 220, the openings of the two air holes 221 are upward in the cross-sectional direction of the air equalizing pipe 220 and are symmetrically distributed according to the vertical central plane, the included angle of the two air holes 221 is a, and the angle a is 30 ° to 50 °.

Because the gas equalizing pipe 220 is arranged at the bottom of the first cleaning tank 200, and the openings of the air passing holes 221 face upward, the gas flow directly moves upward after coming out of the air passing holes 221 to obtain the maximum kinetic energy to impact the surface of the optical substrate positioned above, the included angle between the two rows of air passing holes 221 is 30-50 degrees, so that when the optical substrate is arranged between the two rows of air passing holes 221, the gas bubbles can impact the surface of the optical substrate exactly, and preferably, the angle a takes 45 degrees.

Referring to fig. 7, in some embodiments of the present invention, the liquid passing holes 321 are distributed in two rows on the liquid equalizing tube 320, each row of the liquid passing holes 321 is parallel to the axis of the liquid equalizing tube 320, in the cross-sectional direction of the liquid equalizing tube 320, the two rows of the liquid passing holes 321 have openings facing downward and are symmetrically distributed according to a vertical central plane, the included angle b of the two rows of the liquid passing holes 321 is 30 ° to 50 °.

The openings of the two rows of liquid passing holes 321 face downwards, constant-temperature water flows into the second cleaning tank 300 through the liquid passing holes 321, and then turns to flow upwards after flowing downwards, so that the temperature in the second cleaning tank 300 is more balanced; the optical substrate is arranged above the liquid equalizing pipe 320, and the liquid passing hole 321 with the downward opening can ensure that the water flow above the liquid equalizing pipe 320 can be replaced by newly conveyed constant-temperature water flow so as to realize the balance of temperature. The included angle of the two rows of liquid passing holes 321 is 30-50 degrees, the optical substrate is arranged above the liquid equalizing pipe 320 and between the two rows of liquid passing holes 321, constant-temperature water flow can flow close to the surface of the optical substrate as far as possible after being conveyed out, the surface temperature of the optical substrate is kept consistent with the water flow temperature, the infiltration effect is reduced, and when the optical substrate is taken out, water cannot remain on the surface and water stains cannot remain on the surface.

Referring to fig. 4, in some embodiments of the present invention, an overflow tank 400 is sleeved on an opening of the first cleaning tank 200, an opening direction of the overflow tank 400 is the same as an opening direction of the first cleaning tank 200, a bottom of the overflow tank 400 is lower than an opening end surface of the first cleaning tank 200 for receiving a water flow overflowing from the first cleaning tank 200, and a water outlet 410 is disposed at the bottom of the overflow tank 400.

The overflow bath 400 is sleeved at the opening of the first cleaning tank 200, and when an optical substrate is placed in the first cleaning tank 200, water contained in the first cleaning tank 200 is extruded and overflowed so as to enter the overflow bath 400 and be discharged from the water discharge opening 410, so that the treatment is facilitated; it is understood that the same type of overflow trough 400 can be nested in the opening of the second cleaning tank 300.

In some embodiments of the present invention, the opening end surface of the first cleaning tank 200 is provided with a ring of wavy overflow teeth 420.

The wavy overflow teeth 420 can break the surface tension of the clean water, so that the clean water can overflow into the overflow groove 400 more easily when the optical substrate is taken out, and is not attached to the optical substrate; it is understood that the same type of overflow teeth 420 can also be provided on the open end surface of the second wash tank 300.

Referring to fig. 2 or 3, in some embodiments of the present invention, the bottom of the first cleaning tank 200 and the bottom of the second cleaning tank 300 are respectively provided with a guiding inclined plane, the guiding inclined plane makes one side of the bottom lower than the other side, and the first interface 210 and the second interface 310 are respectively correspondingly arranged at the low side position of the guiding inclined plane.

The guide slope of the bottom can guide the water to the low side position, and the first interface 210 and the second interface 310 are correspondingly arranged at the low side position of the guide slope, so that the water in the first cleaning tank 200 and the second cleaning tank 300 can be completely drained.

In some embodiments of the present invention, the outer wall of at least one of the first cleaning tank 200 or the second cleaning tank 300 is provided with a plurality of rings of reinforcing ribs 500.

The reinforcing rib 500 can support and protect the first cleaning tank 200 and the second cleaning tank 300, and prevent the first cleaning tank and the second cleaning tank from being deformed due to stress after containing clean water.

In the description herein, references to the description of the term "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

While embodiments of the present invention have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.

Claims (8)

1. An optical substrate cleaning apparatus, comprising:

an equipment rack (100);

the cleaning device comprises a first cleaning tank (200), wherein a plurality of first cleaning tanks (200) are arranged on the equipment frame (100), the openings of the first cleaning tanks (200) are upward, first connectors (210) are arranged at the bottoms of the first cleaning tanks (200), the first connectors (210) are communicated with the inner cavity of the first cleaning tanks (200), air equalizing pipes (220) are arranged at the bottoms of the inner cavities of the first cleaning tanks (200), the air equalizing pipes (220) are communicated with an air supply device, and a plurality of air passing holes (221) are formed in the pipe walls of the air equalizing pipes (220);

second washing tank (300), be equipped with a plurality ofly on equipment rack (100) second washing tank (300), it is single second washing tank (300) sets up adjacent two between first washing tank (200), make first washing tank (200) with second washing tank (300) alternate arrangement, the opening of second washing tank (300) up, the bottom is equipped with second interface (310), second interface (310) with the inner chamber intercommunication of second washing tank (300), the inner chamber bottom of second washing tank (300) is equipped with liquid-sharing pipe (320), liquid-sharing pipe (320) and water supply installation intercommunication, liquid-passing hole (321) have been seted up a plurality of on the pipe wall of liquid-sharing pipe (320).

2. The optical substrate cleaning apparatus according to claim 1, wherein the gas distributing pipe (220) has a plurality of gas passing holes (221) formed in a pipe wall thereof, the gas passing holes (221) are distributed in parallel with an axial direction of the gas distributing pipe (220), the liquid distributing pipe (320) has a plurality of liquid passing holes (321) formed in a pipe wall thereof, and the liquid passing holes (321) are distributed in parallel with the axial direction of the liquid distributing pipe (320).

3. The optical substrate cleaning device according to claim 2, wherein the plurality of air passing holes (221) are distributed in two rows on the air equalizing pipe (220), each row of air passing holes (221) is parallel to the axis of the air equalizing pipe (220), in the cross-sectional direction of the air equalizing pipe (220), the openings of the two rows of air passing holes (221) are upward and are symmetrically distributed according to a vertical central plane, the included angle of the two rows of air passing holes (221) is a, and the angle a is 30-50 °.

4. The optical substrate cleaning device according to claim 2, wherein the plurality of liquid passing holes (321) are distributed on the liquid averaging tube (320) in two rows, each row of liquid passing holes (321) is parallel to the axis of the liquid averaging tube (320), the openings of the two rows of liquid passing holes (321) face downwards in the cross-sectional direction of the liquid averaging tube (320) and are symmetrically distributed according to a vertical central plane, the included angle b between the two rows of liquid passing holes (321) is 30-50 °.

5. The apparatus for cleaning an optical substrate according to claim 1, wherein an overflow tank (400) is sleeved at an opening of the first cleaning tank (200), an opening direction of the overflow tank (400) is consistent with an opening direction of the first cleaning tank (200), a bottom of the overflow tank (400) is lower than an opening end face of the first cleaning tank (200) and is used for receiving water flow overflowing from the first cleaning tank (200), and a water outlet (410) is arranged at the bottom of the overflow tank (400).

6. The optical substrate cleaning apparatus according to claim 5, wherein the open end face of said first cleaning tank (200) is provided with a ring of undulated overflow teeth (420).

7. The optical substrate cleaning apparatus according to claim 1, wherein the first cleaning tank (200) and the second cleaning tank (300) are respectively provided at the bottom thereof with guide slopes such that one side of the bottom is lower than the other side thereof, and the first port (210) and the second port (310) are respectively correspondingly provided at the lower side positions thereof.

8. The optical substrate cleaning apparatus according to claim 1, wherein the outer wall of at least one of the first cleaning tank (200) or the second cleaning tank (300) is provided with a plurality of turns of the reinforcing ribs (500).

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