CN217474219U

CN217474219U - Rotating and spraying device for effectively achieving single-wafer cleaning process

Info

Publication number: CN217474219U
Application number: CN202123428581.3U
Authority: CN
Inventors: 廖世保; 邓信甫; 杨嘉斌; 林忠宝
Original assignee: Zhiwei Semiconductor Shanghai Co Ltd
Current assignee: Zhiwei Semiconductor Shanghai Co Ltd
Priority date: 2021-12-31
Filing date: 2021-12-31
Publication date: 2022-09-23
Anticipated expiration: 2031-12-31

Abstract

The utility model discloses an effectively reach rotation of single crystal circle cleaning process and spray set relates to the technical field of the spray set of single crystal, include: the waste liquid collecting mechanism is arranged on the mounting seat, a cleaning cavity is formed in the waste liquid collecting mechanism, the rotating mechanism is arranged in the cleaning cavity, a placing plate is arranged at the upper end of the rotating mechanism and located in the cleaning cavity, the clamping mechanism is arranged on the placing plate, the two spraying mechanisms are arranged on one side of the waste liquid collecting mechanism, and the two spraying mechanisms are located at the upper end of the mounting seat. The rotary motion of realizing three-dimensional space makes the contact and the reaction of the solution that sprays out more even with the crystal, and fixed effectual preventing crystal when rotatory drops, and rotary sprinkler is more comprehensive to spun solution and crystal contact.

Description

Rotating and spraying device for effectively achieving single-wafer cleaning process

Technical Field

The utility model relates to the technical field of the spray set of single crystal especially involves an effectively reach the rotation of single crystal circle cleaning process and spray set.

Background

The prior art is mostly the rotating electrical machines drive the board thereby to drive the crystal and rotate to react with the solution that sprays out, but rotation in the motor rotation time two-dimentional, the inhomogeneous of crystal and solution contact.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide an effectively reach the rotatory and spray set of single crystal circle cleaning process for solve above-mentioned technical problem.

The utility model adopts the technical scheme as follows:

a rotating and spraying device for effectively achieving a single-wafer cleaning process comprises an installation seat, a rotating mechanism, a clamping mechanism, a waste liquid collecting mechanism and spraying mechanisms, wherein the waste liquid collecting mechanism is arranged on the installation seat, a cleaning cavity is formed in the waste liquid collecting mechanism, the rotating mechanism is arranged in the cleaning cavity, a placing plate is arranged at the upper end of the rotating mechanism and is positioned in the cleaning cavity, the clamping mechanism is arranged on the placing plate, two spraying mechanisms are arranged on one side of the waste liquid collecting mechanism, and the two spraying mechanisms are both positioned at the upper end of the installation seat;

the rotary mechanism comprises an upper plate, a lower plate, first steel balls, second steel balls and a spring, the lower plate is arranged on the bottom wall of the cleaning cavity, a first concave groove is formed in the lower plate and is formed in the width direction of the lower plate, the first steel balls are arranged in the first concave groove, one end of the spring is connected with the first steel balls, the upper plate is arranged on the upper side of the lower plate, a second concave groove is formed in the lower surface of the upper plate and is formed in the length direction of the upper plate, the second steel balls are slidably arranged in the second concave groove, and the upper end of the upper plate is provided with the placing plate.

Preferably, the inner wall of the cleaning cavity is provided with two oil cylinders, and telescopic rods of the two oil cylinders are connected with the first steel ball and the second steel ball and used for driving the first steel ball and the second steel ball to slide.

Preferably, the waste liquid collecting mechanism comprises a collecting box, a supporting rod is arranged at the upper end of the mounting seat, the collecting box is arranged at the upper end of the supporting rod, the cleaning cavity is formed in the collecting box, a through hole is formed in the bottom of the collecting box, and the through hole is communicated with the cleaning cavity.

Preferably, the lower end of the collecting box is provided with a drainage tube, and the drainage tube is communicated with the through hole.

Preferably, each spraying mechanism comprises a support frame, a connecting rod and a spray head, the support frame is arranged at the upper end of the mounting seat, the connecting rod is arranged at one side, close to the placing plate, of the support frame, and the spray heads are rotatably arranged at the lower ends of the connecting rods.

As a further preference, connecting pipes are arranged inside the support frame and the connecting rod, the connecting pipes are communicated with the spray head, and the connecting pipes are used for connecting external solution.

Preferably, fixture includes fixed block, flexible hydro-cylinder and fixed disk, the upper end of placing the board is equipped with two the fixed block, two the standing groove has all been seted up to the one side that the fixed block is close to each other, each the interior diapire of standing groove all is equipped with one flexible hydro-cylinder, one side that two flexible hydro-cylinders are close to each other all is equipped with one the fixed disk, the fixed disk with the telescopic link of flexible hydro-cylinder is connected.

The technical scheme has the following advantages or beneficial effects:

the rotary spray nozzle has the advantages that the rotation of the single-wafer cleaning process and the three-dimensional space of the spray device are realized, so that the contact and the reaction of the sprayed solution and the crystals are more uniform, the crystals are effectively prevented from dropping when the single-wafer cleaning process is rotated, and the rotary spray nozzle is more comprehensive in contact with the sprayed solution and the crystals.

Drawings

FIG. 1 is a schematic view of the rotary and spray apparatus of the present invention for effectively cleaning a single wafer;

FIG. 2 is a schematic view of a first structure of a rotating mechanism of the present invention for effectively achieving a single wafer cleaning process with a spray device;

FIG. 3 is a second schematic structural view of the rotating mechanism of the spin and spray apparatus of the present invention for effectively achieving a single wafer cleaning process;

FIG. 4 is a schematic view of the engagement of the collection chamber with the spray head in another preferred embodiment.

In the figure: 1. a mounting seat; 2. a rotation mechanism; 21. an upper plate; 22. a lower plate; 23. a first steel ball; 24. a second steel ball; 25. a spring; 26. a first concave groove; 27. a second concave groove; 3. a clamping mechanism; 31. a fixed block; 32. a telescopic oil cylinder; 33. fixing the disc; 4. a waste liquid collection mechanism; 41. a collection box; 42. a support bar; 43. a drainage tube; 5. placing the plate; 6. a spraying mechanism; 61. a support frame; 62. a connecting rod; 63. a spray head; 7. a wafer carrying platform.

Detailed Description

The technical solution of the present invention will be described clearly and completely with reference to the accompanying drawings, and obviously, the described embodiments are some, but not all embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts all belong to the protection scope of the present invention.

In the description of the present invention, it should be noted that, as the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. appear, the indicated orientation or positional relationship thereof is based on the orientation or positional relationship shown in the drawings, and is only for convenience of description and simplification of description, but does not indicate or imply that the indicated device or element must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" as appearing herein are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.

In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" should be interpreted broadly, e.g., as being either fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.

Fig. 1 is the structural schematic diagram of the utility model discloses an effectively reach the rotatory and spray set of single crystal circle cleaning process, fig. 2 is the utility model discloses an effectively reach the rotatory first structural schematic diagram with spray set's of single crystal circle cleaning process, fig. 3 is the utility model discloses an effectively reach the rotatory second structural schematic diagram with spray set's of single crystal circle cleaning process rotary mechanism, fig. 4 is the complex schematic diagram of collecting box and shower nozzle in the embodiment of other preferred, please refer to fig. 1 to fig. 4 and show, show the embodiment of a preferred, a shown effectively reaches the rotation of single crystal circle cleaning process and spray set, include: mount pad 1, rotary mechanism 2, fixture 3, waste liquid collection mechanism 4 and spray mechanism 6, be provided with waste liquid collection mechanism 4 on the mount pad 1, waste liquid collection mechanism 4 is used for collecting the reaction after and the unnecessary solution that sprays out. The cleaning cavity is formed in the waste liquid collecting mechanism 4, the rotating mechanism 2 is arranged in the cleaning cavity, the placing plate 5 is arranged at the upper end of the rotating mechanism 2, the placing plate 5 is located in the cleaning cavity, the placing plate 5 is used for placing crystals, and the rotating mechanism 2 is used for driving the placing plate 5 in a three-dimensional space to drive the crystals to rotate together, so that the crystals and a solution base are more uniform, and the reaction is more uniform. The holding mechanism 3 is arranged on the placing plate 5, two spraying mechanisms 6 are arranged on one side of the waste liquid collecting mechanism 4, and the two spraying mechanisms 6 are both positioned at the upper end of the mounting seat 1. The clamping mechanism 3 is used for clamping the crystal, and the spraying mechanism 6 is used for spraying reaction solution.

Further, as a preferred embodiment, the rotating mechanism 2 includes an upper plate 21, a lower plate 22, a first steel ball 23, a second steel ball 24 and a spring 25, the lower plate 22 is disposed on the bottom wall of the cleaning cavity, a first concave groove 26 is formed in the lower plate 22 and arranged along the width direction of the lower plate 22, the first steel ball 23 is disposed in the first concave groove 26, one end of the spring 25 is connected to the first steel ball 23, the upper plate 21 is disposed on the upper side of the lower plate 22, a second concave groove 27 is formed in the lower surface of the upper plate 21 and arranged along the length direction of the upper plate 21, the second steel ball 24 is slidably disposed in the second concave groove 27, and the placing plate 5 is disposed at the upper end of the upper plate 21. Two oil cylinders are arranged on the inner wall of the cleaning cavity, telescopic rods of the two oil cylinders are connected with the first steel ball 23 and the second steel ball 24, and the two oil cylinders are used for driving the first steel ball 23 and the second steel ball 24 to slide. The oil cylinder stretches and retracts to drive the first steel ball 23 to slide along the first concave groove 26, the second steel ball 24 slides along the second concave groove 27, and the spring 25 deforms, so that the upper plate 22 is driven to rotate in the three-dimensional space, and the crystal rotates in the three-dimensional space.

Further, as a preferred embodiment, the waste liquid collecting mechanism 4 includes a collecting box 41, a supporting rod 42 is disposed at the upper end of the mounting base 1, the collecting box 41 is disposed at the upper end of the supporting rod 42, a cleaning cavity is disposed on the collecting box 41, a through hole is disposed at the bottom of the collecting box 41, and the through hole is communicated with the cleaning cavity. The depth of the washing chamber of the collecting chamber 41 is greater than the height of the placing plate 5 so that the solution is not thrown away even when the placing plate 5 is rotated. The lower end of the collecting box 41 is provided with a drainage tube 43, and the drainage tube 43 is communicated with the through hole. The solution entered into the holding tank flows into the draft tube 43 from the through hole to be discharged.

Further, as a preferred embodiment, each spraying mechanism 6 comprises a supporting frame 61, a connecting rod 62 and a spray head 63, the supporting frame 61 is arranged at the upper end of the mounting base 1, the connecting rod 62 is arranged at one side of the supporting frame 61 close to the placing plate 5, and the spray head 63 is rotatably arranged at the lower end of the connecting rod 62. The support frame 61 and the connecting rod 62 are internally provided with connecting pipes which are communicated with the spray head 63 and are used for connecting external solution. The external solution flows into the spray head 63 from the connection pipe and is sprayed on the crystal surface through the spray head 63.

Further, as an embodiment of a preferred embodiment, the clamping mechanism 3 includes a fixed block 31, a telescopic cylinder 32 and a fixed plate 33, two fixed blocks 31 are provided at the upper end of the placing plate 5, placing grooves are provided on the mutually adjacent sides of the two fixed blocks 31, a telescopic cylinder 32 is provided on the inner bottom wall of each placing groove, a fixed plate 33 is provided on the mutually adjacent side of the two telescopic cylinders 32, and the fixed plate 33 is connected with the telescopic rod of the telescopic cylinder 32. When the crystal is clamped between the two fixed disks 33, a certain gap exists between the bottom of the crystal and the upper end of the placing plate 5 for contact reaction with the solution.

In other preferred embodiments, the etching device further comprises an etching module, the etching module is arranged inside the collecting tank 41 and between the inner side wall of the collecting tank 41 and the crystal, wherein the etching module comprises an etching spray head and a liquid inlet pipe, the etching spray head is connected with the liquid inlet pipe, and the liquid inlet pipe is used for supplying acid etching liquid to the etching spray head for etching the surface of the crystal. The etching module can be used for etching a crystal with a flat surface or a crystal with a step structure on the outer edge of the surface. When the etching device is applied to crystal etching with a trapezoid structure, the etching spray head is arranged between the edge of the crystal and the inner wall of the collecting box 41, the etching spray head can swing slightly between the inner wall of the collecting box and the edge of the crystal, and the etching spray head can be mutually adjusted by matching with the rotation of the crystal so that the spraying is only at the outer edge of the crystal. Secondly, the etching nozzle can be arranged in an inclined mode, the specific inclined angle can be selected according to requirements, for example, the included angle between the axis of the nozzle and the normal line of the center of the crystal is 60-80 degrees, and the acid etching liquid can be accurately sprayed onto the step surface of the step structure on the crystal.

In other preferred embodiments, the cleaning chamber is not provided with the rotating mechanism 2, the holding mechanism 3 and the placing plate 5, but the cleaning chamber is provided with the wafer supporting platform 7, and the bottom of the wafer supporting platform 7 is provided with a lifting mechanism for driving the wafer supporting platform 7 to lift, wherein the cleaning chamber is provided with an upper layer cavity, a middle layer cavity and a lower layer cavity, the lifting mechanism drives the wafer supporting platform 7 to lift in the cleaning chamber, when different reaction solutions are adopted, the lifting mechanism drives the wafer supporting platform 7 to drive the crystal to correspond to different layer cavities, and the crystal rotates in cooperation, so that the reaction solutions enter different layer cavities, and the recovery of the reaction solutions is realized. Wherein the wafer carrying platform 7 can drive the crystal to rotate.

The above description is only an example of the preferred embodiment of the present invention, and not intended to limit the scope of the present invention, and those skilled in the art should be able to realize the equivalent alternatives and obvious variations of the present invention.

Claims

1. A rotating and spraying device capable of effectively achieving a single-wafer cleaning process is characterized by comprising an installation seat, a rotating mechanism, a clamping mechanism, a waste liquid collecting mechanism and a spraying mechanism, wherein the waste liquid collecting mechanism is arranged on the installation seat, a cleaning cavity is formed in the waste liquid collecting mechanism, the rotating mechanism is arranged in the cleaning cavity, a placing plate is arranged at the upper end of the rotating mechanism and is positioned in the cleaning cavity, the clamping mechanism is arranged on the placing plate, two spraying mechanisms are arranged on one side of the waste liquid collecting mechanism, and the two spraying mechanisms are both positioned at the upper end of the installation seat;

the rotary mechanism comprises an upper plate, a lower plate, a first steel ball, a second steel ball and a spring, the lower plate is arranged on the bottom wall of the cleaning cavity, a first concave groove is formed in the lower plate and arranged in the width direction of the lower plate, the first steel ball is arranged in the first concave groove, one end of the spring is connected with the first steel ball, the upper plate is arranged on the upper side of the lower plate, a second concave groove is formed in the lower surface of the upper plate and arranged in the length direction of the upper plate, the second steel ball is slidably arranged in the second concave groove, and the upper end of the upper plate is provided with the placing plate.

2. The rotating and spraying device of claim 1, wherein two oil cylinders are disposed on the inner wall of the cleaning chamber, and the telescopic rods of the two oil cylinders are connected to the first steel ball and the second steel ball for driving the first steel ball and the second steel ball to slide.

3. The apparatus as claimed in claim 1, wherein the waste liquid collecting mechanism comprises a collecting box, a supporting rod is disposed at the upper end of the mounting seat, the collecting box is disposed at the upper end of the supporting rod, the cleaning chamber is disposed on the collecting box, a through hole is disposed at the bottom of the collecting box, and the through hole is communicated with the cleaning chamber.

4. The apparatus of claim 3, wherein a drain tube is disposed at a lower end of the collection chamber, the drain tube communicating with the through hole.

5. A spin and spray apparatus for efficiently performing a single wafer cleaning process as recited in claim 1, wherein each of said spray mechanisms comprises a support frame, a connecting rod and a nozzle, said support frame is disposed at an upper end of said mounting base, said connecting rod is disposed at a side of said support frame adjacent to said mounting plate, and said nozzle is rotatably disposed at a lower end of said connecting rod.

6. The apparatus of claim 5, wherein the support frame and the connecting rod are provided with connecting tubes therein, the connecting tubes are in communication with the showerhead, and the connecting tubes are used for connecting an external solution.

7. The rotating and spraying apparatus for efficiently performing a single wafer cleaning process as claimed in claim 1, wherein the clamping mechanism comprises a fixed block, a telescopic cylinder and a fixed plate, two fixed blocks are disposed on the upper end of the placing plate, placing grooves are formed on the sides of the two fixed blocks close to each other, a telescopic cylinder is disposed on the inner bottom wall of each placing groove, a fixed plate is disposed on the side of the two telescopic cylinders close to each other, and the fixed plate is connected to the telescopic rod of the telescopic cylinder.