CN217143841U

CN217143841U - Vacuum adsorption workbench and vacuum adsorption device

Info

Publication number: CN217143841U
Application number: CN202220210178.9U
Authority: CN
Inventors: 宋勇超; 周伟; 李志强; 黄蓉; 陈楚杰; 胡洋; 黄金鹏; 俞勤; 曹汉富
Original assignee: Shenzhen Hi Test Semiconductor Equipment Co ltd
Current assignee: Shenzhen Hi Test Semiconductor Equipment Co ltd
Priority date: 2022-01-25
Filing date: 2022-01-25
Publication date: 2022-08-09
Anticipated expiration: 2032-01-25

Abstract

The utility model relates to a semiconductor manufacturing equipment field specifically provides a vacuum adsorption workstation and vacuum adsorption device. Wherein the vacuum adsorption workstation includes the workstation body, and the top of workstation body is equipped with the independent adsorption structure of a plurality of, the inside of workstation body is equipped with the gas circuit passageway, the adsorption structure is equipped with inside sunken adsorption tank, the bottom of adsorption tank seted up with the first gas pocket of gas circuit passageway intercommunication, the bottom of workstation body seted up with the second gas pocket of gas circuit passageway intercommunication, the edge of adsorption structure still is equipped with the water drainage tank that is used for the drainage. The vacuum adsorption workbench of the utility model has the advantages that the plurality of independent adsorption structures are arranged on the workbench body, so that each adsorption structure can form an independent sealed space with one substrate, and the processing flexibility is greatly increased; the edge of the adsorption structure is provided with a drainage channel, so that water remained on the workbench body in the machining process can be drained.

Description

Vacuum adsorption workbench and vacuum adsorption device

Technical Field

The utility model relates to a semiconductor manufacturing equipment field especially relates to vacuum adsorption workstation and vacuum adsorption device.

Background

With the continuous development of modern industry, the automation level of the semiconductor industry is gradually improved. In an automated process, it is often necessary to secure the substrate to be processed. At present, two common fixing modes are provided, one is clamping fixing, and the other is adsorption fixing. Wherein adsorb fixed can not damage base plate and mechanical structure simple, be prepared in favour when the higher device of cutting process precision. The adsorption fixed workbench generally adopts a body provided with an adsorption groove, the adsorption groove is connected with a vacuum generator, the adsorption groove on the body is communicated, the adsorption groove is paved with a substrate to process, air leakage is easy to occur, and the air tightness is poor. Furthermore, in the cutting process, water is generally required to be added for cutting, which causes the problem that the cutting is easily affected due to untimely water drainage.

In view of the above, there is a need in the art for a new solution to solve the above technical problems.

SUMMERY OF THE UTILITY MODEL

The utility model provides a vacuum adsorption workstation and vacuum adsorption device to solve the problem that exists among the prior art.

The utility model provides a vacuum adsorption workstation, comprises a workbench body, the top of workstation body is equipped with the independent adsorption structure of a plurality of, the inside of workstation body is equipped with the gas circuit passageway, adsorption structure is equipped with inside sunken adsorption tank, the bottom in adsorption tank seted up with the first gas pocket of gas circuit passageway intercommunication, the bottom of workstation body seted up with the second gas pocket of gas circuit passageway intercommunication, adsorption structure's edge still is equipped with the water drainage tank that is used for the drainage.

Preferably, the adsorption structure is provided with a plurality of adsorption structures, the adsorption structures are distributed in an array mode, gaps exist among the adsorption structures, and the drainage grooves are located in the gaps.

Preferably, the depth of the drain groove gradually becomes deeper from the center of the table body to the outside.

Preferably, the edge of the top of the workbench body is further provided with a calibration part, and the top of the calibration part is consistent with the top of the adsorption structure in height.

Preferably, the air passage comprises a transverse air passage and a longitudinal air passage which penetrate through the workbench body in the horizontal direction, the transverse air passage and the longitudinal air passage are communicated and are perpendicular to each other, and a sealing element is arranged on an opening cover of the surface of the workbench body, which is positioned on the transverse air passage and the longitudinal air passage.

Preferably, the bottom of the workbench body is provided with a first positioning hole.

Preferably, the bottom of workstation body still is equipped with first spacing portion, first spacing portion includes a plurality of annular arch that are used for spacingly, and is a plurality of annular arch is concentric, and is a plurality of annular arch interval sets up, adjacent two form annular spacing groove between the annular arch.

The utility model also provides a vacuum adsorption device, which comprises a vacuum generator and the vacuum adsorption workbench, wherein the vacuum generator is connected with the first air hole; when the substrate is placed on the adsorption structure, the vacuum generator extracts air in the adsorption groove to fix the substrate.

Preferably, the vacuum adsorption device further comprises a base arranged at the bottom of the vacuum adsorption workbench and a rotating motor fixedly connected with the base, and the rotating motor is used for driving the base and the vacuum adsorption workbench to rotate; the top of the base is provided with a second limiting part matched with the first limiting part in shape, the top of the base is further provided with a second positioning hole corresponding to the first positioning hole, and the first positioning hole and the second positioning hole are positioned through positioning bolts.

Preferably, a sealed cavity is formed between the first limiting part and the second limiting part, a third air hole is formed in the bottom of the second limiting part, the third air hole is connected with the vacuum generator, and the vacuum generator extracts air in the sealed cavity to fix the base and the vacuum adsorption workbench.

The utility model has the advantages that: the vacuum adsorption workbench of the utility model has the advantages that the plurality of independent adsorption structures are arranged on the workbench body, and the adsorption structures are provided with the adsorption grooves, so that each adsorption structure can form an independent sealed space with one substrate, one substrate can be taken and placed independently without influencing other substrates, and the processing flexibility is greatly increased; the whole workbench body is not required to be paved with the substrate to realize adsorption and fixation; set up water drainage tank at adsorption structure's edge, can in time will remain the water discharge on the workstation body in the course of working, prevent to produce the influence to cutting process.

Drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.

Fig. 1 is a schematic structural view of a vacuum adsorption workbench according to an embodiment of the present invention;

fig. 2 is a schematic structural view of another angle of the vacuum adsorption workbench according to the embodiment of the present invention;

fig. 3 is a front view of a vacuum adsorption table according to an embodiment of the present invention;

FIG. 4 is a cross-sectional view taken along plane A-A of FIG. 3;

FIG. 5 is a cross-sectional view taken along plane B-B of FIG. 3;

fig. 6 is a schematic structural diagram of a vacuum adsorption device according to an embodiment of the present invention;

fig. 7 is an exploded view of a vacuum adsorption unit according to an embodiment of the present invention;

fig. 8 is a schematic structural diagram of a substrate according to an embodiment of the present invention.

Detailed Description

In order to facilitate understanding of the present invention, the present invention will be described more fully hereinafter with reference to the accompanying drawings. The preferred embodiments of the present invention are shown in the drawings. The invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.

It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.

Please refer to fig. 1-5, which are schematic structural views of a vacuum adsorption workbench 71 according to an embodiment of the present invention. The vacuum suction table 71 of the present embodiment is used for suction-fixing the substrate 201. Referring to fig. 1-2, the vacuum adsorption table 71 of the present embodiment includes a table body 711, and the table body 711 is a rectangular metal plate. In other embodiments, the shape of the table body 711 may also be circular or other shapes. It should be noted that, as shown in fig. 8, the substrate 201 is a material carrier, on which the material to be processed is attached, and the substrate 201 may be glass.

Referring to fig. 1, the top of the workbench body 711 is provided with a plurality of independent adsorption structures 712, in this embodiment, the number of the adsorption structures 712 is set to be multiple, specifically 4, or may be other numbers, such as 1, 2, 6, 8, and the like. The shape of the adsorption structure 712 may be rectangular, circular, oval or other shapes, in this embodiment, the adsorption structure 712 is rectangular, and the adsorption structure 712 is formed by cutting on the table body 711. Referring to fig. 1-4, an air passage 714 is disposed inside the worktable body 711, the adsorption structure 712 has an adsorption groove 7121 recessed inward, and a first air hole 713 communicated with the air passage 714 is disposed at the bottom of the adsorption groove 7121. The configuration of the adsorption tank 7121 may be a grid pattern as shown in the present embodiment, or may be a radial pattern, a mesh pattern, or another shape, which is not limited herein. The bottom of the adsorption tank 7121 may be opened with a plurality of first air holes 713, and in this embodiment, each adsorption structure 712 is opened with only one first air hole 713. Specifically, the adsorption groove 7121 is formed by cutting on the adsorption structure 712. The bottom of the workbench body 711 is provided with a second air hole 715 communicated with the air passage 714. The second air hole 715, the air passage 714, the first air hole 713 and the adsorption groove 7121 form a complete air passage.

The edges of the absorbent structure 712 are also provided with drainage channels 716 for drainage. The drain groove 716 is provided to drain water remaining on the table body 711 when the raw material is processed, because water is sprayed to lower the temperature of the tool and the material when the raw material is cut. Specifically, the plurality of adsorption structures 712 are arranged in an array on the table body 711, and gaps are formed between the plurality of adsorption structures 712 and the drain grooves 716 are located in the gaps. More specifically, when manufacturing the vacuum suction table 71 of the present embodiment, the table body 711 is provided, the water drainage groove 716 is formed by directly cutting the top of the table body 711, and the suction groove 7121 is cut at the corresponding position, so that the suction structures 712 distributed in an array and the water drainage groove 716 located at the edge of the suction structures 712 can be formed.

The vacuum adsorption workbench 71 provided by the embodiment of the utility model has the advantages that the plurality of independent adsorption structures 712 are arranged on the workbench body 711, the adsorption structures 712 are provided with the adsorption grooves 7121, each adsorption structure 712 can form an independent sealed space with one substrate 201, one substrate 201 can be taken and placed independently without influencing other substrates 201, and the processing flexibility is greatly increased; the substrate 201 is not required to be paved on the whole workbench body 711 to realize adsorption and fixation; the edge of the adsorption structure 712 is provided with a drainage groove 716, so that water remained on the workbench body 711 in the machining process can be drained in time, and the cutting process is prevented from being influenced.

Further, referring to fig. 5, in order to smoothly discharge the water remaining on the table body 711, the depth of the drainage groove 716 is gradually increased from the center of the table body 711 to the outside, that is, the bottom of the drainage groove 716 is gradually decreased from the center of the table body 711 to the outside. Through the above arrangement, the water can be discharged from the workbench body 711 better by using the water discharge groove 716 with a slope, and the bottom surface and the side surface of the water discharge groove are plated with a layer of teflon, so that the water can be discharged better.

Further, please refer to fig. 1, because the vacuum adsorption workbench 71 of the embodiment of the present invention is mainly used for adsorbing the fixed substrate 201, so that the cutter cuts the material, the height of the cutter is too high and then the cutting is incomplete, and the height of the cutter is too low and then the cutting is too deep, so the height of the adsorption structure 712 needs to be accurately identified. The height of the suction structure 712 can be generally recognized by directly contacting the top of the suction structure 712 with a tool, but the tool cannot recognize the height by directly contacting the suction structure 712 when the substrate 201 is placed on the suction structure 712. In order to solve the above-mentioned technical problem, the vacuum suction table 71 of the present embodiment is provided with the calibration portion 717 at the edge of the top of the table body 711, the calibration portion 717 is actually a portion of the table body 711 outside the drainage groove 716, and the top of the calibration portion 717 coincides with the top height of the suction structure 712. When calibration is required, the top of the suction structure 712 can be determined by directly contacting the tool to the top of the calibration portion 717. The calibration portion 717 may be provided at another position, and the height of the calibration portion 717 may be the same as the height of the top of the adsorption structure 712.

Further, referring to fig. 4, in order to more conveniently form the air passage 714 inside the workbench body 711, in the present embodiment, the air passage 714 is formed by punching a hole in a side surface of the workbench body 711. Specifically, the air passage 714 comprises a plurality of transverse air passages 714a and a plurality of longitudinal air passages 714b which penetrate through the workbench body 711, the transverse air passages 714a and the longitudinal air passages 714b are respectively communicated with the first air holes 713 and are located on the same plane, and the plane is parallel to the plane where the top of the workbench is located. The transverse air passages 714a and the longitudinal air passages 714b are communicated and vertically arranged with each other. Since the transverse air duct 714a and the longitudinal air duct 714b are formed by punching holes on the side surface of the workbench body 711, the transverse air duct 714a and the longitudinal air duct 714b have an opening 714c on the surface of the workbench body 711, and a sealing member (not shown) is covered on the opening 714c to achieve sealing. With the air passage 714 formed in the above manner, the manufacturing process is simpler.

Further, referring to fig. 2, in order to make the vacuum suction table 71 better fit with other devices, a first positioning hole 718 is formed at the bottom of the table body 711.

Further, the bottom of the workbench body 711 is also provided with a first limiting portion 719, the first limiting portion 719 includes a plurality of annular protrusions 719a for limiting, the plurality of annular protrusions 719a are concentric, the plurality of annular protrusions 719a are arranged at intervals, and an annular limiting groove 719b is formed between two adjacent annular protrusions 719 a.

Referring to fig. 6-7, the present invention further provides a vacuum adsorption apparatus, which includes the vacuum adsorption table 71 and a vacuum generator (not shown) according to the above embodiments. Wherein a vacuum generator (not shown) is connected to the first air hole 713, when the substrate 201 is placed on the adsorption structure 712, the substrate 201 is sealed with the adsorption structure 712, and the vacuum generator (not shown) draws air in the adsorption tank 7121 away from an environment forming a vacuum, so that the substrate 201 is fixed on the adsorption structure 712 under the action of atmospheric pressure.

Further, the vacuum suction apparatus of the present embodiment further includes a base 72 disposed at the bottom of the vacuum suction table 71, and a rotating motor 73 fixedly connected to the base 72. The base 72 is used for fixing the vacuum adsorption worktable 71, and the rotating motor 73 is used for driving the base 72 and the vacuum adsorption worktable 71 to rotate, so that the angle of the substrate 201 on the adsorption structure 712 can be adjusted, and the cutting process can be more conveniently carried out.

Specifically, the top of the base 72 is provided with a second limiting portion 721 matched with the first limiting portion 719 in shape, and the structure of the second limiting portion 721 is matched with the annular protrusion 719a and the annular limiting groove 719 b. The top of the base 72 is further provided with a second positioning hole 722 corresponding to the first positioning hole 718, and the first positioning hole 718 and the second positioning hole 722 are fixed by a positioning bolt (not shown).

Further, in order to fix the vacuum adsorption table 71 on the base 72, a sealed cavity is formed between the first limiting portion 719 and the second limiting portion 721 during assembly, a third air hole 723 is formed at the bottom of the second limiting portion 721, and the third air hole 723 is connected to a vacuum generator (not shown). A vacuum generator (not shown) draws air out of the sealed chamber to fix the base 72 and the vacuum adsorption table 71 under the atmospheric pressure.

In the vacuum adsorption device of this embodiment, the base 72 is disposed at the bottom of the vacuum adsorption worktable 71, the second position-limiting part 721 matched with the first position-limiting part 719 and the second positioning hole 722 corresponding to the first positioning hole 718 are disposed at the top of the base 72, so as to position the vacuum adsorption worktable 71; then, by providing a third air hole 723 at the bottom of the second limiting portion 721, a sealed cavity formed between the first limiting portion 719 and the second limiting portion 721 is evacuated by a vacuum generator (not shown), so that the base 72 and the vacuum adsorption worktable 71 are fixed; the bottom of the base 72 is fixedly connected with a rotating motor 73 which can drive the base 72 and the vacuum adsorption workbench 71 to rotate, so that the angle of the substrate 201 placed on the adsorption structure 712 can be adjusted, and the cutting angle can be conveniently adjusted in the cutting process.

The above only is the partial embodiment of the utility model discloses a not therefore restriction the utility model discloses a protection scope, all utilize the utility model discloses equivalent device or equivalent flow transform that the content of description and drawing was done, or direct or indirect application in other relevant technical field, all the same reason is included in the patent protection scope of the utility model.

Claims

1. The utility model provides a vacuum adsorption workbench, includes the workstation body, its characterized in that, the top of workstation body is equipped with the independent adsorption structure of a plurality of, the inside of workstation body is equipped with the gas circuit passageway, adsorption structure is equipped with inside sunken adsorption tank, the bottom of adsorption tank seted up with the first gas pocket of gas circuit passageway intercommunication, the bottom of workstation body seted up with the second gas pocket of gas circuit passageway intercommunication, adsorption structure's edge still is equipped with the water drainage tank that is used for the drainage.

2. The vacuum adsorption workbench according to claim 1, wherein a plurality of said adsorption structures are arranged, a plurality of said adsorption structures are arranged in an array, a gap exists between a plurality of said adsorption structures, and said drainage groove is located in said gap.

3. The vacuum adsorption workbench according to claim 2, wherein the depth of the drain groove gradually becomes deeper from the center of the workbench body to the outer side.

4. The vacuum adsorption workbench according to claim 1, wherein the top of the workbench body is further provided with an alignment part at the edge thereof, and the top of the alignment part is in accordance with the top height of the adsorption structure.

5. The vacuum adsorption workbench according to claim 1, wherein the air passage comprises a transverse air passage and a longitudinal air passage which penetrate through the workbench body in the horizontal direction, the transverse air passage and the longitudinal air passage are communicated and arranged perpendicular to each other, and sealing members are arranged on opening covers of the transverse air passage and the longitudinal air passage on the surface of the workbench body.

6. The vacuum adsorption workbench according to claim 1, wherein the bottom of the workbench body is provided with a first positioning hole.

7. The vacuum adsorption workbench according to claim 1, wherein a first limiting part is further provided at the bottom of the workbench body, the first limiting part comprises a plurality of annular protrusions for limiting, the plurality of annular protrusions are concentric, the plurality of annular protrusions are arranged at intervals, and an annular limiting groove is formed between two adjacent annular protrusions.

8. A vacuum adsorption apparatus comprising a vacuum generator and a vacuum adsorption stage according to any one of claims 1 to 7, the vacuum generator being connected to the first air vent; when the substrate is placed on the adsorption structure, the vacuum generator extracts air in the adsorption groove to fix the substrate.

9. The vacuum adsorption device of claim 8, further comprising a base disposed at the bottom of the vacuum adsorption worktable, and a rotating motor fixedly connected to the base, wherein the rotating motor is configured to drive the base and the vacuum adsorption worktable to rotate; the top of the base is provided with a second limiting part matched with the first limiting part in shape, the top of the base is further provided with a second positioning hole corresponding to the first positioning hole, and the first positioning hole and the second positioning hole are positioned through positioning bolts.

10. The vacuum adsorption device of claim 9, wherein a sealed cavity is formed between the first limiting portion and the second limiting portion, a third air hole is formed in the bottom of the second limiting portion, the third air hole is connected with the vacuum generator, and the vacuum generator draws air in the sealed cavity away to fix the base and the vacuum adsorption worktable.